TW363332B - Apparatus and method for multi-zone high-density inductively-coupled plasma generation - Google Patents

Apparatus and method for multi-zone high-density inductively-coupled plasma generation

Info

Publication number
TW363332B
TW363332B TW086109690A TW86109690A TW363332B TW 363332 B TW363332 B TW 363332B TW 086109690 A TW086109690 A TW 086109690A TW 86109690 A TW86109690 A TW 86109690A TW 363332 B TW363332 B TW 363332B
Authority
TW
Taiwan
Prior art keywords
coupled plasma
plasma
individually controlled
inductively
zone high
Prior art date
Application number
TW086109690A
Other languages
English (en)
Inventor
Mehrdad M Moslehi
Original Assignee
Cvc Products Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cvc Products Inc filed Critical Cvc Products Inc
Application granted granted Critical
Publication of TW363332B publication Critical patent/TW363332B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
TW086109690A 1996-07-10 1997-07-09 Apparatus and method for multi-zone high-density inductively-coupled plasma generation TW363332B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/678,065 US5846883A (en) 1996-07-10 1996-07-10 Method for multi-zone high-density inductively-coupled plasma generation

Publications (1)

Publication Number Publication Date
TW363332B true TW363332B (en) 1999-07-01

Family

ID=24721236

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086109690A TW363332B (en) 1996-07-10 1997-07-09 Apparatus and method for multi-zone high-density inductively-coupled plasma generation

Country Status (6)

Country Link
US (2) US5846883A (zh)
JP (1) JP2000515304A (zh)
KR (1) KR20000023689A (zh)
GB (1) GB2332979A (zh)
TW (1) TW363332B (zh)
WO (1) WO1998001893A1 (zh)

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CN102473629A (zh) * 2009-08-12 2012-05-23 东京毅力科创株式会社 通过重力引起的气体扩散分离(gigds)技术来控制等离子体产生
TWI383712B (zh) * 2007-05-22 2013-01-21 Advanced Micro Fab Equip Inc An RF power source system and a plasma reaction chamber using the RF power source system
TWI386112B (zh) * 2008-08-21 2013-02-11 Atomic Energy Council 射頻中空陰極電漿源產生裝置
TWI423737B (zh) * 2007-05-22 2014-01-11 Advanced Micro Fab Equip Inc An RF power source system and a plasma reaction chamber using the RF power source system
TWI580323B (zh) * 2010-12-03 2017-04-21 蘭姆研究公司 封入式電漿線圈組件及其操作方法
TWI767935B (zh) * 2016-09-06 2022-06-21 南韓商周星工程股份有限公司 氣體分配裝置以及基材加工設備

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