TW260806B - - Google Patents

Info

Publication number
TW260806B
TW260806B TW083110021A TW83110021A TW260806B TW 260806 B TW260806 B TW 260806B TW 083110021 A TW083110021 A TW 083110021A TW 83110021 A TW83110021 A TW 83110021A TW 260806 B TW260806 B TW 260806B
Authority
TW
Taiwan
Application number
TW083110021A
Other languages
Chinese (zh)
Original Assignee
Ushio Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=18107959&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TW260806(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Ushio Electric Inc filed Critical Ushio Electric Inc
Application granted granted Critical
Publication of TW260806B publication Critical patent/TW260806B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • H10P50/287—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0075—Cleaning of glass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
TW083110021A 1993-11-26 1994-10-29 TW260806B (OSRAM)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31923893 1993-11-26

Publications (1)

Publication Number Publication Date
TW260806B true TW260806B (OSRAM) 1995-10-21

Family

ID=18107959

Family Applications (1)

Application Number Title Priority Date Filing Date
TW083110021A TW260806B (OSRAM) 1993-11-26 1994-10-29

Country Status (5)

Country Link
US (1) US5510158A (OSRAM)
EP (1) EP0661110B1 (OSRAM)
KR (1) KR100189794B1 (OSRAM)
DE (2) DE69406103D1 (OSRAM)
TW (1) TW260806B (OSRAM)

Families Citing this family (64)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6007637A (en) * 1993-06-11 1999-12-28 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Process and apparatus for the dry treatment of metal surfaces
DE19503718A1 (de) * 1995-02-04 1996-08-08 Leybold Ag UV-Strahler
US5763892A (en) * 1995-06-19 1998-06-09 Dainippon Screen Manufacturing Company, Ltd. Ultraviolet irradiator for substrate, substrate treatment system, and method of irradiating substrate with ultraviolet light
JP3113797B2 (ja) * 1995-08-28 2000-12-04 インターナショナル・ビジネス・マシーンズ・コーポレ−ション 感光性化学物質膜の改質方法
US5966595A (en) 1995-10-05 1999-10-12 Micron Technology, Inc. Method to form a DRAM capacitor using low temperature reoxidation
IL115931A0 (en) 1995-11-09 1996-01-31 Oramir Semiconductor Ltd Laser stripping improvement by modified gas composition
IL115933A0 (en) 1995-11-09 1996-01-31 Oramir Semiconductor Ltd Process and apparatus for oblique beam revolution for the effective laser stripping of sidewalls
IL115934A0 (en) * 1995-11-09 1996-01-31 Oramir Semiconductor Ltd Laser processing chamber with cassette cell
SE9600524D0 (sv) * 1996-02-14 1996-02-14 Abb Research Ltd A method and a device for oxidation of a semiconductor layer of SiC
AU713054B2 (en) * 1996-03-27 1999-11-25 Ethicon Inc. Process for blackening surgical needles
US5941448A (en) * 1996-06-07 1999-08-24 L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Method for dry fluxing of metallic surfaces, before soldering or tinning, using an atmosphere which includes water vapor
US5693928A (en) * 1996-06-27 1997-12-02 International Business Machines Corporation Method for producing a diffusion barrier and polymeric article having a diffusion barrier
US6143081A (en) * 1996-07-12 2000-11-07 Tokyo Electron Limited Film forming apparatus and method, and film modifying apparatus and method
US5798303A (en) * 1996-09-05 1998-08-25 Micron Technology, Inc. Etching method for use in fabrication of semiconductor devices
US5990006A (en) * 1997-02-10 1999-11-23 Micron Technology, Inc. Method for forming materials
US5863327A (en) * 1997-02-10 1999-01-26 Micron Technology, Inc. Apparatus for forming materials
JP3500050B2 (ja) * 1997-09-08 2004-02-23 東京エレクトロン株式会社 不純物除去装置、膜形成方法及び膜形成システム
US20020098109A1 (en) * 1997-09-17 2002-07-25 Jerry Nelson Method and apparatus for producing purified or ozone enriched air to remove contaminants from fluids
US6015759A (en) * 1997-12-08 2000-01-18 Quester Technology, Inc. Surface modification of semiconductors using electromagnetic radiation
US6787787B1 (en) * 1998-01-23 2004-09-07 Ushiodenki Kabushiki Kaisha Ultraviolet radiation producing apparatus
US6049086A (en) * 1998-02-12 2000-04-11 Quester Technology, Inc. Large area silent discharge excitation radiator
US20050229946A1 (en) * 1998-11-12 2005-10-20 Dainippon Screen Mfg. Co., Ltd. Substrate treating method and apparatus
US6503405B1 (en) * 1999-04-14 2003-01-07 Seagate Technology Llc Surface treatment with ZP process for GMR media
JP2001113163A (ja) * 1999-10-20 2001-04-24 Hoya Schott Kk 紫外光照射装置及び方法
DE19957034B4 (de) 1999-11-26 2006-04-13 Heraeus Noblelight Gmbh Verfahren zur Behandlung von Oberflächen von Substraten und Vorrichtung
US6379024B1 (en) 1999-11-29 2002-04-30 Hoya-Schott Corporation Dielectric barrier excimer lamp and ultraviolet light beam irradiating apparatus with the lamp
TWI227012B (en) * 2000-01-12 2005-01-21 Hitachi Ltd A method of manufacturing an optical disk substrate, an apparatus of manufacturing an optical disk and an optical disk substrate
US6387602B1 (en) 2000-02-15 2002-05-14 Silicon Valley Group, Inc. Apparatus and method of cleaning reticles for use in a lithography tool
JP3683461B2 (ja) 2000-02-16 2005-08-17 Ｈｏｙａ Ｃａｎｄｅｏ Ｏｐｔｒｏｎｉｃｓ株式会社 キセノンエキシマランプの光強度測定装置
JP3385259B2 (ja) * 2000-03-15 2003-03-10 株式会社エム・ディ・コム 誘電体バリヤ放電ランプ及びそれを利用したドライ洗浄装置
DE10036809B4 (de) * 2000-07-28 2004-03-25 Robert Bosch Gmbh Vorrichtung und Verfahren zur Reinigung und/oder Behandlung von Oberflächen
JP2002075980A (ja) * 2000-08-30 2002-03-15 Miyazaki Oki Electric Co Ltd 真空紫外光ｃｖｄによる低誘電体膜の製造方法
JP2002208592A (ja) * 2001-01-09 2002-07-26 Sharp Corp 絶縁膜の形成方法、半導体装置、製造装置
JP2002239484A (ja) * 2001-02-16 2002-08-27 Ushio Inc 誘電体バリア放電ランプを使った基板処理装置
JP2002294456A (ja) * 2001-03-30 2002-10-09 Oki Electric Ind Co Ltd 膜の形成方法及びその方法を実施するためのｃｖｄ装置
US6573199B2 (en) 2001-08-30 2003-06-03 Micron Technology, Inc. Methods of treating dielectric materials with oxygen, and methods of forming capacitor constructions
US20030104171A1 (en) * 2001-11-29 2003-06-05 Maclachlan Julia Method of using short wavelength UV light to selectively remove a coating from a substrate and article produced thereby
FR2835205B1 (fr) * 2002-01-25 2007-02-16 Saint Gobain Traitement de pollution organique sur un substrat inorganique
JP2003224117A (ja) * 2002-01-31 2003-08-08 Advanced Lcd Technologies Development Center Co Ltd 絶縁膜の製造装置
US7015568B2 (en) 2003-08-21 2006-03-21 Texas Instruments Incorporated System for ultraviolet atmospheric seed layer remediation
JP4038557B2 (ja) * 2002-04-16 2008-01-30 リアライズ・アドバンストテクノロジ株式会社 レジスト除去装置及びレジスト除去方法
US6664737B1 (en) 2002-06-21 2003-12-16 Axcelis Technologies, Inc. Dielectric barrier discharge apparatus and process for treating a substrate
AU2003272613A1 (en) * 2002-09-20 2004-04-08 Pete Atwell System and method for removal of materials from an article
TWI287253B (en) * 2002-09-30 2007-09-21 Adv Lcd Tech Dev Ct Co Ltd Substrate processing apparatus and substrate processing method
US6814931B2 (en) * 2002-12-20 2004-11-09 Steris Inc. Method and apparatus for treating an object with ozone
US7268355B2 (en) 2002-12-27 2007-09-11 Franek Olstowski Excimer UV fluorescence detection
US20040171279A1 (en) * 2003-02-27 2004-09-02 Sharp Laboratories Of America Inc. Method of low-temperature oxidation of silicon using nitrous oxide
KR100935401B1 (ko) * 2003-03-06 2010-01-06 엘지디스플레이 주식회사 자외선을 이용하는 기판세정장치 및 이의 구동방법
JP3776092B2 (ja) * 2003-03-25 2006-05-17 株式会社ルネサステクノロジ エッチング装置、エッチング方法および半導体装置の製造方法
KR20060026404A (ko) * 2003-05-08 2006-03-23 에코-알엑스, 인코포레이티드 가스 형태의 유체 정화 방법과 장치
US7737382B2 (en) * 2004-04-01 2010-06-15 Lincoln Global, Inc. Device for processing welding wire
US8240539B2 (en) * 2004-05-28 2012-08-14 Panasonic Corporation Joining apparatus with UV cleaning
US20060196525A1 (en) * 2005-03-03 2006-09-07 Vrtis Raymond N Method for removing a residue from a chamber
TW200921297A (en) * 2007-09-25 2009-05-16 Renesas Tech Corp Method and apparatus for manufacturing semiconductor device, and resist material
WO2009146744A1 (de) * 2008-06-05 2009-12-10 Osram Gesellschaft mit beschränkter Haftung Verfahren zur behandlung von oberflächen, strahler für dieses verfahren sowie bestrahlungssystem mit diesem strahler
CN102476110A (zh) * 2010-11-30 2012-05-30 中国科学院大连化学物理研究所 一种紫外灯灯头透镜外表面清洗装置
JP5348156B2 (ja) * 2011-03-01 2013-11-20 ウシオ電機株式会社 光照射装置
CN103406302B (zh) * 2013-08-23 2015-08-12 深圳市华星光电技术有限公司 基于紫外线的清洗方法及清洗装置
JP6764665B2 (ja) 2016-03-17 2020-10-07 東京応化工業株式会社 表面処理方法、帯電防止剤及び親水化処理剤
CN106975329B (zh) * 2017-04-13 2019-11-15 上海大学 真空等离子体叠式管状空气净化装置
KR102809588B1 (ko) * 2019-02-12 2025-05-16 어플라이드 머티어리얼스, 인코포레이티드 진공 시스템을 세정하기 위한 방법, 기판의 진공 프로세싱을 위한 방법, 및 기판을 진공 프로세싱하기 위한 장치
EP3768048B1 (en) * 2019-07-19 2023-06-07 Université Libre de Bruxelles Dielectric barrier discharge plasma reactor and method for plasma-enhanced vapor deposition
TWI756761B (zh) * 2020-04-06 2022-03-01 香港商正揚科技有限公司 紫外光固化裝置
KR102776310B1 (ko) * 2020-06-30 2025-03-07 캐논 가부시끼가이샤 활성 산소 공급 장치, 활성 산소에 의한 처리 장치 및 활성 산소에 의한 처리 방법

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3890176A (en) * 1972-08-18 1975-06-17 Gen Electric Method for removing photoresist from substrate
US4028080A (en) * 1976-06-23 1977-06-07 The United States Of America As Represented By The Secretary Of The Army Method of treating optical waveguide fibers
US4265747A (en) * 1979-05-22 1981-05-05 Sterling Drug Inc. Disinfection and purification of fluids using focused laser radiation
JPS5975629A (ja) * 1982-10-25 1984-04-28 Seiko Epson Corp 半導体装置の製造方法
JPS59168642A (ja) * 1983-03-15 1984-09-22 Nec Corp 半導体基板の酸化装置
JPS6058238A (ja) * 1983-09-09 1985-04-04 Ushio Inc 紫外線洗浄方法
JPS60212226A (ja) * 1984-04-06 1985-10-24 Ushio Inc 紫外線処理方法
JPS62160981A (ja) * 1986-01-08 1987-07-16 Mitsubishi Heavy Ind Ltd 石油タンカ−の改造法
JPH0533006Y2 (OSRAM) * 1985-10-28 1993-08-23
CH670171A5 (OSRAM) * 1986-07-22 1989-05-12 Bbc Brown Boveri & Cie
JPS6352411A (ja) * 1986-08-22 1988-03-05 Hitachi Ltd 処理方法および装置
JP2624254B2 (ja) * 1987-05-22 1997-06-25 東京応化工業株式会社 シリカ系被膜の膜質改善方法
US5156884A (en) * 1987-10-23 1992-10-20 Tokyo Ohka Kogyo Co., Ltd. Method for forming a film of oxidized metal
JPH01319944A (ja) * 1988-06-21 1989-12-26 Mitsubishi Electric Corp 半導体基板表面に薄膜を形成する方法およびその装置
CH676168A5 (OSRAM) * 1988-10-10 1990-12-14 Asea Brown Boveri
US5068040A (en) * 1989-04-03 1991-11-26 Hughes Aircraft Company Dense phase gas photochemical process for substrate treatment
DE3942472A1 (de) * 1989-12-22 1991-06-27 Asea Brown Boveri Beschichtungsverfahren
DE4113523A1 (de) * 1991-04-25 1992-10-29 Abb Patent Gmbh Verfahren zur behandlung von oberflaechen
US5178772A (en) * 1991-11-15 1993-01-12 Chemical Waste Management, Inc. Process for destruction of metal complexes by ultraviolet irradiation

Also Published As

Publication number Publication date
EP0661110B1 (en) 1997-10-08
DE69406103D1 (de) 1997-11-13
KR100189794B1 (ko) 1999-06-01
KR950014015A (ko) 1995-06-15
US5510158A (en) 1996-04-23
DE69406103T2 (de) 1998-05-20
DE69406103T4 (de) 2000-07-27
EP0661110A1 (en) 1995-07-05

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Legal Events

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MC4A Revocation of granted patent