TW253974B - - Google Patents

Info

Publication number
TW253974B
TW253974B TW082106311A TW82106311A TW253974B TW 253974 B TW253974 B TW 253974B TW 082106311 A TW082106311 A TW 082106311A TW 82106311 A TW82106311 A TW 82106311A TW 253974 B TW253974 B TW 253974B
Authority
TW
Taiwan
Prior art keywords
vapor
silicon
chamber
hydrogen peroxide
containing gas
Prior art date
Application number
TW082106311A
Other languages
English (en)
Chinese (zh)
Original Assignee
Dobson Christopher David
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB929214243A external-priority patent/GB9214243D0/en
Priority claimed from GB929221520A external-priority patent/GB9221520D0/en
Priority claimed from GB929221519A external-priority patent/GB9221519D0/en
Application filed by Dobson Christopher David filed Critical Dobson Christopher David
Application granted granted Critical
Publication of TW253974B publication Critical patent/TW253974B/zh

Links

Classifications

    • H10P72/0402—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • H10P14/6506—
    • H10P14/6538—
    • H10P14/6548—
    • H10P14/6682—
    • H10P14/6334—
    • H10P14/6686—
    • H10P14/6905—
    • H10P14/69215—
    • H10P14/6922—
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/935—Gas flow control

Landscapes

  • Formation Of Insulating Films (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Element Separation (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
  • Polymerisation Methods In General (AREA)
TW082106311A 1992-07-04 1993-08-06 TW253974B (cg-RX-API-DMAC10.html)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB929214243A GB9214243D0 (en) 1992-07-04 1992-07-04 A method of treating a semi-conductor wafer
GB929221520A GB9221520D0 (en) 1992-10-14 1992-10-14 A method of treating a semiconductor wafer
GB929221519A GB9221519D0 (en) 1992-10-14 1992-10-14 A method of treating a semi-conductor wafer

Publications (1)

Publication Number Publication Date
TW253974B true TW253974B (cg-RX-API-DMAC10.html) 1995-08-11

Family

ID=27266279

Family Applications (1)

Application Number Title Priority Date Filing Date
TW082106311A TW253974B (cg-RX-API-DMAC10.html) 1992-07-04 1993-08-06

Country Status (11)

Country Link
US (2) US5874367A (cg-RX-API-DMAC10.html)
EP (1) EP0731982B1 (cg-RX-API-DMAC10.html)
JP (1) JP3262334B2 (cg-RX-API-DMAC10.html)
KR (1) KR100286192B1 (cg-RX-API-DMAC10.html)
CN (1) CN1042577C (cg-RX-API-DMAC10.html)
AT (1) ATE187277T1 (cg-RX-API-DMAC10.html)
AU (1) AU4506993A (cg-RX-API-DMAC10.html)
CA (1) CA2137928C (cg-RX-API-DMAC10.html)
DE (1) DE69327176T2 (cg-RX-API-DMAC10.html)
TW (1) TW253974B (cg-RX-API-DMAC10.html)
WO (1) WO1994001885A1 (cg-RX-API-DMAC10.html)

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DE69327176T2 (de) 2000-05-31
CA2137928A1 (en) 1994-01-20
DE69327176D1 (de) 2000-01-05
KR100286192B1 (ko) 2001-04-16
ATE187277T1 (de) 1999-12-15
WO1994001885A1 (en) 1994-01-20
EP0731982A1 (en) 1996-09-18
US5874367A (en) 1999-02-23
US6287989B1 (en) 2001-09-11
EP0731982B1 (en) 1999-12-01
CN1089757A (zh) 1994-07-20
JPH09502301A (ja) 1997-03-04
JP3262334B2 (ja) 2002-03-04
AU4506993A (en) 1994-01-31
CN1042577C (zh) 1999-03-17
CA2137928C (en) 2002-01-29

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