GB9221520D0 - A method of treating a semiconductor wafer - Google Patents
A method of treating a semiconductor waferInfo
- Publication number
- GB9221520D0 GB9221520D0 GB929221520A GB9221520A GB9221520D0 GB 9221520 D0 GB9221520 D0 GB 9221520D0 GB 929221520 A GB929221520 A GB 929221520A GB 9221520 A GB9221520 A GB 9221520A GB 9221520 D0 GB9221520 D0 GB 9221520D0
- Authority
- GB
- United Kingdom
- Prior art keywords
- treating
- semiconductor wafer
- wafer
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (13)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB929221520A GB9221520D0 (en) | 1992-10-14 | 1992-10-14 | A method of treating a semiconductor wafer |
DE69327176T DE69327176T2 (en) | 1992-07-04 | 1993-06-30 | TREATMENT METHOD FOR A SEMICONDUCTOR DISC. |
KR1019950700006A KR100286192B1 (en) | 1992-01-01 | 1993-06-30 | Semiconductor Wafer Processing Method |
US08/362,429 US5874367A (en) | 1992-07-04 | 1993-06-30 | Method of treating a semi-conductor wafer |
JP50307594A JP3262334B2 (en) | 1992-07-04 | 1993-06-30 | Method for processing semiconductor wafers |
AU45069/93A AU4506993A (en) | 1992-07-04 | 1993-06-30 | A method of treating a semiconductor wafer |
EP93914846A EP0731982B1 (en) | 1992-07-04 | 1993-06-30 | A method of treating a semiconductor wafer |
CA002137928A CA2137928C (en) | 1992-07-04 | 1993-06-30 | A method of treating a semiconductor wafer |
PCT/GB1993/001368 WO1994001885A1 (en) | 1992-07-04 | 1993-06-30 | A method of treating a semiconductor wafer |
AT93914846T ATE187277T1 (en) | 1992-07-04 | 1993-06-30 | TREATMENT METHOD FOR A SEMICONDUCTOR DISC. |
CN93108147A CN1042577C (en) | 1992-07-04 | 1993-07-03 | A method of treating a semi-conductor wafer |
TW082106311A TW253974B (en) | 1992-07-04 | 1993-08-06 | |
US09/174,578 US6287989B1 (en) | 1992-07-04 | 1998-10-19 | Method of treating a semiconductor wafer in a chamber using hydrogen peroxide and silicon containing gas or vapor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB929221520A GB9221520D0 (en) | 1992-10-14 | 1992-10-14 | A method of treating a semiconductor wafer |
Publications (1)
Publication Number | Publication Date |
---|---|
GB9221520D0 true GB9221520D0 (en) | 1992-11-25 |
Family
ID=10723394
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB929221520A Pending GB9221520D0 (en) | 1992-01-01 | 1992-10-14 | A method of treating a semiconductor wafer |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB9221520D0 (en) |
-
1992
- 1992-10-14 GB GB929221520A patent/GB9221520D0/en active Pending
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