TW202300241A - 清洗系統及清洗方法 - Google Patents

清洗系統及清洗方法 Download PDF

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Publication number
TW202300241A
TW202300241A TW111106942A TW111106942A TW202300241A TW 202300241 A TW202300241 A TW 202300241A TW 111106942 A TW111106942 A TW 111106942A TW 111106942 A TW111106942 A TW 111106942A TW 202300241 A TW202300241 A TW 202300241A
Authority
TW
Taiwan
Prior art keywords
cleaning
substrate
opening
rollers
cleaning unit
Prior art date
Application number
TW111106942A
Other languages
English (en)
Chinese (zh)
Inventor
大畑桂輔
新井和明
Original Assignee
日商海上股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商海上股份有限公司 filed Critical 日商海上股份有限公司
Publication of TW202300241A publication Critical patent/TW202300241A/zh

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00—Cleaning by methods involving the use of tools
    • B08B1/20—Cleaning of moving articles, e.g. of moving webs or of objects on a conveyor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
TW111106942A 2021-06-28 2022-02-25 清洗系統及清洗方法 TW202300241A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PCT/JP2021/024332 WO2023275927A1 (ja) 2021-06-28 2021-06-28 洗浄システム及び洗浄方法
WOPCT/JP2021/24332 2021-06-28

Publications (1)

Publication Number Publication Date
TW202300241A true TW202300241A (zh) 2023-01-01

Family

ID=84690996

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111106942A TW202300241A (zh) 2021-06-28 2022-02-25 清洗系統及清洗方法

Country Status (5)

Country Link
JP (1) JP7348388B2 (ja)
KR (1) KR20230143999A (ja)
CN (1) CN219040417U (ja)
TW (1) TW202300241A (ja)
WO (1) WO2023275927A1 (ja)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10296200A (ja) 1997-04-30 1998-11-10 Shibaura Eng Works Co Ltd 超音波洗浄方法およびその洗浄装置
JP2000254605A (ja) * 1999-03-11 2000-09-19 Ricoh Co Ltd 可撓性基板の洗浄装置
JP2001029908A (ja) * 1999-07-23 2001-02-06 Dainippon Screen Mfg Co Ltd 超音波処理装置および超音波処理装置の動作監視方法
JP2001170583A (ja) * 1999-12-15 2001-06-26 Kanegafuchi Chem Ind Co Ltd 超音波洗浄装置及び超音波洗浄方法
JP2001340820A (ja) * 2000-05-31 2001-12-11 Shibaura Mechatronics Corp 超音波洗浄装置
JP2005309180A (ja) * 2004-04-23 2005-11-04 Seiko Epson Corp 基板の洗浄方法、基板の製造方法および基板の洗浄装置
JP2020203234A (ja) * 2019-06-14 2020-12-24 凸版印刷株式会社 現像処理装置、及びそれを用いた表示装置の製造方法
JP7293896B2 (ja) * 2019-06-17 2023-06-20 マックス株式会社 ラベルプリンタ、プログラム

Also Published As

Publication number Publication date
JPWO2023275927A1 (ja) 2023-01-05
WO2023275927A1 (ja) 2023-01-05
KR20230143999A (ko) 2023-10-13
CN219040417U (zh) 2023-05-16
JP7348388B2 (ja) 2023-09-20

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