CN219040417U - 清洗系统 - Google Patents

清洗系统 Download PDF

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Publication number
CN219040417U
CN219040417U CN202190000377.0U CN202190000377U CN219040417U CN 219040417 U CN219040417 U CN 219040417U CN 202190000377 U CN202190000377 U CN 202190000377U CN 219040417 U CN219040417 U CN 219040417U
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CN
China
Prior art keywords
cleaning
substrate
housing
cleaning unit
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202190000377.0U
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English (en)
Chinese (zh)
Inventor
大畑桂辅
新井和明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kaijo Corp
Original Assignee
Kaijo Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kaijo Corp filed Critical Kaijo Corp
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Publication of CN219040417U publication Critical patent/CN219040417U/zh
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B1/00Cleaning by methods involving the use of tools
    • B08B1/20Cleaning of moving articles, e.g. of moving webs or of objects on a conveyor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
CN202190000377.0U 2021-06-28 2021-06-28 清洗系统 Active CN219040417U (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2021/024332 WO2023275927A1 (ja) 2021-06-28 2021-06-28 洗浄システム及び洗浄方法

Publications (1)

Publication Number Publication Date
CN219040417U true CN219040417U (zh) 2023-05-16

Family

ID=84690996

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202190000377.0U Active CN219040417U (zh) 2021-06-28 2021-06-28 清洗系统

Country Status (5)

Country Link
JP (1) JP7348388B2 (ja)
KR (1) KR20230143999A (ja)
CN (1) CN219040417U (ja)
TW (1) TW202300241A (ja)
WO (1) WO2023275927A1 (ja)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10296200A (ja) 1997-04-30 1998-11-10 Shibaura Eng Works Co Ltd 超音波洗浄方法およびその洗浄装置
JP2000254605A (ja) * 1999-03-11 2000-09-19 Ricoh Co Ltd 可撓性基板の洗浄装置
JP2001029908A (ja) * 1999-07-23 2001-02-06 Dainippon Screen Mfg Co Ltd 超音波処理装置および超音波処理装置の動作監視方法
JP2001170583A (ja) * 1999-12-15 2001-06-26 Kanegafuchi Chem Ind Co Ltd 超音波洗浄装置及び超音波洗浄方法
JP2001340820A (ja) * 2000-05-31 2001-12-11 Shibaura Mechatronics Corp 超音波洗浄装置
JP2005309180A (ja) * 2004-04-23 2005-11-04 Seiko Epson Corp 基板の洗浄方法、基板の製造方法および基板の洗浄装置
JP2020203234A (ja) * 2019-06-14 2020-12-24 凸版印刷株式会社 現像処理装置、及びそれを用いた表示装置の製造方法
JP7293896B2 (ja) * 2019-06-17 2023-06-20 マックス株式会社 ラベルプリンタ、プログラム

Also Published As

Publication number Publication date
JPWO2023275927A1 (ja) 2023-01-05
WO2023275927A1 (ja) 2023-01-05
KR20230143999A (ko) 2023-10-13
TW202300241A (zh) 2023-01-01
JP7348388B2 (ja) 2023-09-20

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