TW201945689A - 外觀檢查裝置及外觀檢查方法 - Google Patents

外觀檢查裝置及外觀檢查方法 Download PDF

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Publication number
TW201945689A
TW201945689A TW108114475A TW108114475A TW201945689A TW 201945689 A TW201945689 A TW 201945689A TW 108114475 A TW108114475 A TW 108114475A TW 108114475 A TW108114475 A TW 108114475A TW 201945689 A TW201945689 A TW 201945689A
Authority
TW
Taiwan
Prior art keywords
photomask
defect
main surface
inspection
observation
Prior art date
Application number
TW108114475A
Other languages
English (en)
Chinese (zh)
Inventor
渡辺卓司
村上慎一郎
谷部芳明
Original Assignee
日商大日本印刷股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商大日本印刷股份有限公司 filed Critical 日商大日本印刷股份有限公司
Publication of TW201945689A publication Critical patent/TW201945689A/zh

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
TW108114475A 2018-04-27 2019-04-25 外觀檢查裝置及外觀檢查方法 TW201945689A (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2018087379 2018-04-27
JP2018-087379 2018-04-27
JP2018-184162 2018-09-28
JP2018184162 2018-09-28

Publications (1)

Publication Number Publication Date
TW201945689A true TW201945689A (zh) 2019-12-01

Family

ID=68295588

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108114475A TW201945689A (zh) 2018-04-27 2019-04-25 外觀檢查裝置及外觀檢查方法

Country Status (2)

Country Link
TW (1) TW201945689A (ja)
WO (1) WO2019208808A1 (ja)

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1195409A (ja) * 1997-09-19 1999-04-09 Oki Electric Ind Co Ltd フォトマスク用検査修正装置
JP2002082057A (ja) * 2000-09-07 2002-03-22 Nippon Electric Glass Co Ltd 陰極線管用ガラスパネルの内部欠陥検査方法及び装置
JP2003270155A (ja) * 2002-03-15 2003-09-25 Olympus Optical Co Ltd 基板保持装置及び検査装置
JP4020916B2 (ja) * 2005-02-14 2007-12-12 オリンパス株式会社 基板検査装置
JP4680659B2 (ja) * 2005-04-19 2011-05-11 株式会社ブリヂストン 製品タイヤの外観検査方法と製品タイヤの外観検査補助装置
US20060262295A1 (en) * 2005-05-20 2006-11-23 Vistec Semiconductor Systems Gmbh Apparatus and method for inspecting a wafer
DE102006059190B4 (de) * 2006-12-15 2009-09-10 Vistec Semiconductor Systems Gmbh Vorrichtung zur Wafer-Inspektion
JP2008175548A (ja) * 2007-01-16 2008-07-31 Olympus Corp 外観検査装置および外観検査方法
JP2010139461A (ja) * 2008-12-15 2010-06-24 Toppan Printing Co Ltd 目視検査システム
JP4919307B1 (ja) * 2011-05-13 2012-04-18 レーザーテック株式会社 基板検査装置及びマスク検査装置

Also Published As

Publication number Publication date
WO2019208808A1 (ja) 2019-10-31

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