TW201733143A - 具有脈衝摻雜層的太陽能電池 - Google Patents
具有脈衝摻雜層的太陽能電池 Download PDFInfo
- Publication number
- TW201733143A TW201733143A TW106117175A TW106117175A TW201733143A TW 201733143 A TW201733143 A TW 201733143A TW 106117175 A TW106117175 A TW 106117175A TW 106117175 A TW106117175 A TW 106117175A TW 201733143 A TW201733143 A TW 201733143A
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- back surface
- electric field
- pulse
- surface electric
- Prior art date
Links
- 230000005684 electric field Effects 0.000 claims description 60
- 238000000034 method Methods 0.000 claims description 30
- 239000002019 doping agent Substances 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 17
- 238000000407 epitaxy Methods 0.000 claims description 8
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 5
- 229910052799 carbon Inorganic materials 0.000 claims description 5
- 239000000872 buffer Substances 0.000 claims description 4
- 229910052732 germanium Inorganic materials 0.000 claims description 4
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 4
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 2
- 238000001451 molecular beam epitaxy Methods 0.000 claims description 2
- 125000002524 organometallic group Chemical group 0.000 claims description 2
- 229910052707 ruthenium Inorganic materials 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 3
- 229910052718 tin Inorganic materials 0.000 claims 3
- 229910052787 antimony Inorganic materials 0.000 claims 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims 2
- 239000013078 crystal Substances 0.000 claims 1
- 229910052762 osmium Inorganic materials 0.000 claims 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims 1
- 239000010410 layer Substances 0.000 description 122
- 239000000463 material Substances 0.000 description 12
- 238000010586 diagram Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 3
- 230000006798 recombination Effects 0.000 description 3
- 238000005215 recombination Methods 0.000 description 3
- 230000005641 tunneling Effects 0.000 description 3
- 239000000969 carrier Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 241001674044 Blattodea Species 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000007853 buffer solution Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/184—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIIBV compounds, e.g. GaAs, InP
- H01L31/1844—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof the active layers comprising only AIIIBV compounds, e.g. GaAs, InP comprising ternary or quaternary compounds, e.g. Ga Al As, In Ga As P
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/072—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type
- H01L31/0735—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN heterojunction type comprising only AIIIBV compound semiconductors, e.g. GaAs/AlGaAs or InP/GaInAs solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/0304—Inorganic materials including, apart from doping materials or other impurities, only AIIIBV compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0256—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by the material
- H01L31/0264—Inorganic materials
- H01L31/0304—Inorganic materials including, apart from doping materials or other impurities, only AIIIBV compounds
- H01L31/03042—Inorganic materials including, apart from doping materials or other impurities, only AIIIBV compounds characterised by the doping material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/068—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
- H01L31/0687—Multiple junction or tandem solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/068—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
- H01L31/0693—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells the devices including, apart from doping material or other impurities, only AIIIBV compounds, e.g. GaAs or InP solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/544—Solar cells from Group III-V materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Energy (AREA)
- Manufacturing & Machinery (AREA)
- Photovoltaic Devices (AREA)
Abstract
一種太陽能電池係包含一基極區域、一背面電場層以及一設置在該基極區域與該背面電場層之間的脈衝摻雜層。
Description
此申請案係有關於太陽能電池,並且更具體而言係有關於具有一脈衝摻雜(delta doping)層的太陽能電池,並且甚至更具體而言係有關於具有一在該背面電場區域中的脈衝摻雜層之太陽能電池。
太陽能電池係藉由光伏效應來轉換太陽的能量成為有用的電能。現代的多接面的太陽能電池係以顯著高於傳統的矽太陽能電池的效率來操作,其具有重量輕的附加優點。因此,太陽能電池係提供一種適合用於各種的地面及太空應用的可靠、重量輕且永續的電能來源。
太陽能電池通常包含一種具有某一能量帶隙(bandgap)的半導體材料。在太陽光中具有能量大於該半導體材料的帶隙的光子係被該半導體材料所吸收,藉此釋放在該半導體材料內的電子。被釋放的電子擴散穿過該半導體材料,並且以一電流來流過一電路。
電子-電洞在太陽能電池的背面處之再結合係導致效率損失。因此,太陽能電池通常設置有一位在接近該太陽能電池背面之背面電場層。該背面電場層係作用為防止少數載子流向背面(亦即,朝向穿隧接面或背面電極)的阻障。因此,該背面電場層大致係避免少數載子在太陽能電池的背面的介面或表面處之再結合、或是從該基極逸出,藉此鈍化該基極
背面的介面或表面並且作用為該太陽能電池的一少數載子的阻障。然而,要找出更高帶隙的材料以用作為該背面電場層,尤其是用於例如AlGaInP太陽能電池之高帶隙的太陽能電池變成是越加困難的。
於是,熟習此項技術者繼續在太陽能電池的領域中努力研究與發展。
在一實施例中,所揭露的太陽能電池可包含一基極區域、一背面電場層以及一設置在該基極區域與該背面電場層之間的脈衝摻雜層。
在另一實施例中,所揭露的太陽能電池可包含一具有一前端以及一後端的基極區域、以及一位在接近該基極區域的該後端之脈衝摻雜層。
在又一實施例中,所揭露的是一種用於形成一太陽能電池之方法。該方法可包含以下步驟(1)提供一基板;(2)在該基板上生長一背面電場層;(3)脈衝摻雜該背面電場層以形成一脈衝摻雜層;以及(4)在該脈衝摻雜層之上生長一額外的層。
所揭露的具有脈衝摻雜層之太陽能電池以及用於形成該太陽能電池之方法的其它實施例從以下的詳細說明、所附的圖式以及所附的申請專利範圍將會變成是明顯的。
10‧‧‧太陽能電池
12‧‧‧電池
14‧‧‧上方的結構
16‧‧‧下方的結構
18‧‧‧窗口
20‧‧‧射極區域
22‧‧‧本質或空乏區域
24‧‧‧基極區域
26‧‧‧背面電場(“BSF”)區域
28‧‧‧第一背面電場層
30‧‧‧脈衝摻雜層
32‧‧‧第二背面電場層
100‧‧‧方法
102、104、106、108、110‧‧‧步驟
圖1是所揭露的具有脈衝摻雜層之太陽能電池的一實施例之概要的橫截面圖;
圖2是展示可被用來形成所揭露的具有脈衝摻雜層之太陽能電池的步驟之流程圖;圖3是比較所揭露的太陽能電池(具有一脈衝摻雜層)以及一種不具有在該背面電場區域中的脈衝摻雜層之太陽能電池的照光的電流-電壓(“LIV”)之圖形描繪;圖4是所揭露的太陽能電池(具有一脈衝摻雜層)以及用於對照的一種不具有在該背面電場區域中的脈衝摻雜層之太陽能電池的開路電壓之圖形描繪;圖5A是一種具有一單獨作為該背面電場區域的脈衝摻雜層之太陽能電池之概要的帶隙圖;以及圖5B是一種具有一作為該背面電場區域的部分的脈衝摻雜層之太陽能電池之概要的帶隙圖。
參照圖1,所揭露的具有脈衝摻雜層之太陽能電池的大致以10標示的一實施例可包含一位在一上方的結構14以及一下方的結構16之間的電池12。該電池12可包含一窗口18、一射極區域20,一本質(intrinsic)或空乏區域22、一基極區域24以及一背面電場(“BSF”)區域26。
該上方的結構14可以是任何設置在該電池12之上的結構。熟習此項技術者將會體認到該上方的結構14的特定成分將會是依據該太陽能電池10的特定結構而定。
在一種結構中,該太陽能電池10可以是一種多接面的太陽能電池,並且該電池12可以是該多接面的太陽能電池之上方的子電池。或
者是,該電池12可以是該太陽能電池10的唯一電池。因此,該上方的結構14例如可包含一抗反射的塗層、一蓋層(例如,一GaAs蓋)以及一電接觸層(例如,一金屬格柵)。
在另一結構中,該太陽能電池10可以是一種多接面的太陽能電池,並且該上方的結構14可以是該多接面的太陽能的另一子電池。熟習此項技術者將會體認到相鄰的子電池可藉由一穿隧接面來加以分開。
該下方的結構16可以是任何設置在該電池12之下的結構。熟習此項技術者將會體認到該下方的結構16的特定成分將會是依據該太陽能電池10的特定結構而定。
在一結構中,該太陽能電池10可以是一種多接面的太陽能電池,並且該電池12可以是該多接面的太陽能電池之下方的子電池。或者是,該電池12可以是該太陽能電池10的唯一電池。因此,該下方的結構16例如可包含一緩衝層以及一基板(例如,一鍺基板)。
在另一結構中,該太陽能電池10可以是一種多接面的太陽能電池,並且該下方的結構16可以是該多接面的太陽能的另一子電池。電池12可藉由一穿隧接面來和該下面的電池加以分開。
該背面電場區域26可包含一第一背面電場層28、一脈衝摻雜層30以及一第二背面電場層32。因此,該脈衝摻雜層30可被設置在該第一背面電場層28以及該第二背面電場層32之間。
或者是,該背面電場區域26可包含該第一背面電場層28以及該脈衝摻雜層30(亦即,沒有第二背面電場層)。因此,該脈衝摻雜層30可設置在該基極區域24以及該第一背面電場層28之間的介面處。
該脈衝摻雜層30可以是由任何相對於該第一及第二背面電場層28、32作用為一摻雜物的元素所構成。因此,該脈衝摻雜層30的成分可依據該第一及第二背面電場層28、32的成分而定。
作為一個一般且非限制性的例子,該電池12可以用如下所列地加以形成:該窗口18可以是AlInP2,該射極區域20可以是GaInP2,該本質區域22可以是GaInP2,該基極區域24可以是GaInP2,並且該第一及第二背面電場層28、32可以是AlGaAs。因此,由於該第一及第二背面電場層28、32係從第13及15族元素來加以形成,該脈衝摻雜層30可以是由除了在第13及15族中的元素之外的一種元素(或是多種元素)來加以形成。
作為一個特定且非限制性的例子,該電池12的第一及第二背面電場層28、32可以是由AlGaAs來加以形成,並且該脈衝摻雜層30可以是由一種例如是碳、矽或鍺的第14族的元素來加以形成。
作為另一特定且非限制性的例子,該電池12的第一及第二背面電場層28、32可以是由AlGaAs來加以形成,並且該脈衝摻雜層30可以是由碳來加以形成。
該脈衝摻雜層30的層厚度可依據各種的因素而定,該些因素係包含有所使用的脈衝摻雜物以及被施加在該脈衝摻雜層30之上的背面電場材料(例如,該第一背面電場層28的材料)的類型。熟習此項技術者將會體認到,脈衝摻雜的限制可能會限制到脈衝摻雜層30可達成的整體層厚度。
在一表達方式中,該脈衝摻雜層30可具有一從約1奈米到約100奈米的平均的層厚度範圍。在另一表達方式中,該脈衝摻雜層30可
具有一從約5奈米到約50奈米的平均的層厚度範圍。在另一表達方式中,該脈衝摻雜層30可具有一從約5奈米到約25奈米的平均的層厚度範圍。在另一表達方式中,該脈衝摻雜層30可具有一從約5奈米到約15奈米的平均的層厚度範圍。在另一表達方式中,該脈衝摻雜層30可具有一約10奈米的平均的層厚度。
因此,該脈衝摻雜物可被侷限到在該背面電場區域26中之一非常薄的層。
在該脈衝摻雜層30中的脈衝摻雜物的整體濃度亦可依據各種的因素而定,該些因素係包含有所使用的脈衝摻雜物以及該脈衝摻雜層30被施加在其上的該基板的材料(例如,該第一背面電場層28的材料)的類型。
在一表達方式中,在該脈衝摻雜層30中的脈衝摻雜物的整體濃度可以是每cm3至少約1x1018個原子。在另一表達方式中,在該脈衝摻雜層30中的脈衝摻雜物的整體濃度可以是每cm3至少約1x1019個原子。在另一表達方式中,在該脈衝摻雜層30中的脈衝摻雜物的整體濃度可以是每cm3至少約1x1020個原子。在另一表達方式中,在該脈衝摻雜層30中的脈衝摻雜物的整體濃度可以是每cm3至少約1x1021個原子。在又一表達方式中,在該脈衝摻雜層30中的脈衝摻雜物的整體濃度範圍可以從每cm3約1x1018個原子到每cm3約1x1022個原子。
圖2是描繪所揭露的大致標示為100的用於形成所揭露的具有脈衝摻雜層之太陽能電池之方法的一特定態樣的步驟之流程圖。其它用於形成一接近太陽能電池的背面的脈衝摻雜層之方法亦被思及。
該方法100可在方塊102以提供一適當的基板的步驟作為開始。該基板可以是一背面電場層可生長在其上的任何基板。適當的基板之一非限制性的例子是鍺。
在方塊104,一第一背面電場層可生長在該基板上。生長該第一背面電場層的步驟(步驟104)可繼續直到該第一背面電場層之所要的橫截面厚度已經達成為止。
該第一背面電場層可藉由,例如是分子束磊晶、有機金屬氣相磊晶或化學氣相磊晶的磊晶來生長。該磊晶先驅物可被選擇以產生該第一背面電場層之所要的材料。
可選擇的是,在生長該第一背面電場層的步驟(方塊104)之前,一緩衝可被施加至該基板,使得該緩衝係被設置在該第一背面電場層與該基板之間。熟習此項技術者將會體認到一緩衝可被選擇來最小化或消除在該第一背面電場層與該基板之間的晶格不匹配的效應。
在方塊106,磊晶可被停止,並且脈衝摻雜可開始。在該脈衝摻雜步驟(方塊106)期間,所要的脈衝摻雜物可被引入以在該第一背面電場層上形成一脈衝摻雜層。該脈衝摻雜步驟(方塊106)可被執行直到在該脈衝摻雜層中的脈衝摻雜物之一預設的最小整體濃度已經達成為止。
在方塊108,脈衝摻雜可被停止,並且該第二背面電場層的生長可開始。該第二背面電場層可藉由磊晶來生長,直到該第二背面電場層之所要的橫截面厚度已經達成為止。
如在方塊110所示,在形成該背面電場層以及該脈衝摻雜層後,該方法100可繼續生長該太陽能電池之額外的層的步驟,例如該基極
區域、本質區域、射極區域以及窗口18。
因此,兩種太陽能電池係利用該方法100來加以組裝:一種具有一在該背面電場區域中的脈衝摻雜層以及一種不具有脈衝摻雜層。除了該脈衝摻雜層不是存在、就是不存在之外,兩種太陽能電池大致是相同的。如圖3及4中所示,該具有一脈衝摻雜層之太陽能電池係呈現較高的開路電壓(“Voc”)以及一較佳的填充因子(fill factor)。
圖5A及5B是兩種具有脈衝摻雜作為該背面電場區域的部分之太陽能電池的概要的能帶圖。圖5A是一種其中該脈衝摻雜層是該唯一的背面電場層之太陽能電池的能帶圖。圖5B是一種其中該脈衝摻雜層是額外於該較高帶隙的背面電場層之太陽能電池的能帶圖。在圖5A中,該脈衝摻雜層係引入一能帶的能量尖峰,並且此能量尖峰係阻擋少數載子從該p-n接面逃逸離開。在圖5B中,該脈衝摻雜層所引入的能量尖峰係增強該背面電場阻擋少數載子的功能。
當該脈衝摻雜層被設置在該基極區域以及該背面電場層的介面處時,該脈衝摻雜層可更佳的鈍化該介面,並且因此可降低該介面的再結合,此亦可改善該背面電場的功能。
再者,藉由設置該脈衝摻雜層在該背面電場區域中,該高度的p型脈衝摻雜層可以非常良好地被侷限在一個窄的材料厚度範圍中,使得p型摻雜物的背向擴散到該基極區域中是很小的問題或是不成問題。熟習此項技術者將會體認到摻雜物的擴散到該基極區域中可能會因為縮短少數載子的擴散長度而損害到電池效能。
於是太陽能電池的效率可藉由利用在該太陽能電池的背面
電場區域中的一脈衝摻雜層來加以改良。在不受限於任何特定的理論下,據信利用一在該背面電場區域中的脈衝摻雜層可以使得該背面電場區域更有效率於阻擋在該太陽能電池的基極中之少數載子,並且可以更佳的鈍化在該基極區域與該背面電場區域之間的介面。進一步據信的是利用一在該背面電場區域中的脈衝摻雜層對於難以找到較高帶隙的材料來使用作為該背面電場之高帶隙的太陽能電池而言可能是特別有用的。
在另一替代實施例中,所揭露的脈衝摻雜層可被納入到該太陽能電池的基極區域中,而不是該背面電場區域。該基極區域可包含一前端以及一後端。該脈衝摻雜層可被納入到接近(亦即,位在或附近)該基極區域的後端的基極區域中。
儘管所揭露的具有脈衝摻雜層之太陽能電池的各種實施例已經加以展示與敘述,但熟習此項技術者在閱讀該說明書後可想到一些修改。本申請案係包含此種修改並且只受申請專利範圍的範疇之限制。
10‧‧‧太陽能電池
12‧‧‧電池
14‧‧‧上方的結構
16‧‧‧下方的結構
18‧‧‧窗口
20‧‧‧射極區域
22‧‧‧本質或空乏區域
24‧‧‧基極區域
26‧‧‧背面電場(“BSF”)區域
28‧‧‧第一背面電場層
30‧‧‧脈衝摻雜層
32‧‧‧第二背面電場層
Claims (20)
- 一種用於形成太陽能電池的方法,其包括下列步驟:在一基板上生長一背面電場層;脈衝摻雜該背面電場層以形成一脈衝摻雜層;以及在該脈衝摻雜層之上生長一額外的層。
- 如申請專利範圍第1項之方法,其中前述生長該背面電場層的步驟包含藉由磊晶來生長。
- 如申請專利範圍第1項之方法,其中前述磊晶包含分子束磊晶、有機金屬氣相磊晶以及化學氣相磊晶中之至少一者。
- 如申請專利範圍第1項之方法,其中該背面電場層包括AlGaAs或AlGaInP。
- 如申請專利範圍第4項之方法,其中該脈衝摻雜層包括碳、矽、鍺、錫和鉛中之至少一者。
- 如申請專利範圍第1項之方法,其中該脈衝摻雜層具有至少1奈米的一平均的層厚度。
- 如申請專利範圍第1項之方法,其中該脈衝摻雜層具有一平均的層厚度,其範圍是從約5奈米至約15奈米。
- 如申請專利範圍第1項之方法,其中該脈衝摻雜層包括具有每cm3至少1x1018個原子的濃度之摻雜物。
- 如申請專利範圍第1項之方法,其中該脈衝摻雜層包括具有每cm3至少1x1019個原子的濃度之摻雜物。
- 如申請專利範圍第1項之方法,其中其中該脈衝摻雜層包括具有每 cm3至少1x1020個原子的濃度之摻雜物。
- 如申請專利範圍第1項之方法,其進一步包含在生長該背面電場層的前述步驟之前的施加一緩衝至該基板的步驟。
- 如申請專利範圍第1項之方法,其中該額外的層是一第二背面電場層。
- 如申請專利範圍第12項之方法,其中該第二背面電場層是直接接觸該脈衝摻雜層而生長。
- 如申請專利範圍第1項之方法,其中該額外的層是一基極區域。
- 如申請專利範圍第1項之方法,其中前述生長該額外的層的步驟包含藉由磊晶來生長。
- 如申請專利範圍第1項之方法,其進一步包含生長一窗口、一射極區域和一本質區域。
- 一種用於形成太陽能電池的方法,其包括下列步驟:在一基板上生長一背面電場層,該背面電場層包括AlGaAs或AlGaInP;脈衝摻雜該背面電場層以形成一脈衝摻雜層,該脈衝摻雜層包含一摻雜物,該摻雜物選自碳、矽、鍺、錫、鉛及其之組成物所組成的群組,其中該脈衝摻雜層包含一平均的層厚度,其範圍是從約5奈米至約15奈米,其中該脈衝摻雜層包括具有每cm3至少1x1019個原子的濃度之摻雜物;在該脈衝摻雜層之上生長一基極區域,該基極區域包含一主動接面、一第一側以及相對該第一側的一第二側,其中該基極區域的該第一側直接接觸該脈衝摻雜層;以直接接觸該基極區域的該第二側的方式生長一本質區域; 在該本質區域之上生長一射極區域,使得該本質區域被設置於該基極區域和該射極區域之間。
- 如申請專利範圍第17項之方法,其進一步包含設置一窗口於該射極區域之上的步驟,使得該射極區域被配置在該本質區域和該窗口之間。
- 一種用於形成太陽能電池的方法,其包括下列步驟:在一基板上生長一第一背面電場層,該第一背面電場層包括AlGaAs或AlGaInP;脈衝摻雜該第一背面電場層以形成一脈衝摻雜層,該脈衝摻雜層包含一摻雜物,該摻雜物選自碳、矽、鍺、錫、鉛及其之組成物所組成的群組,其中該脈衝摻雜層包含一平均的層厚度,其範圍是從約5奈米至約15奈米,其中該脈衝摻雜層包括具有每cm3至少1x1019個原子的濃度之摻雜物;在該脈衝摻雜層之上生長一第二背面電場層,使得該脈衝摻雜層被設置以直接地接觸該第一背面電場層和該第二背面電場層並且在該第一背面電場層和該第二背面電場層之間,該第二背面電場層包含AlGaAs或AlGaInP;在該第二背面電場層之上生長一基極區域,該基極區域包含一主動接面、一第一側以及相對該第一側的一第二側,其中該基極區域的該第一側直接接觸該第二背面電場層;以直接接觸該基極區域的該第二側的方式生長一本質區域;在該本質區域之上生長一射極區域,使得該本質區域被設置於該基極區域和該射極區域之間。
- 如申請專利範圍第19項之方法,其進一步包含設置一窗口於該射極 區域之上的步驟,使得該射極區域被配置在該本質區域和該窗口之間。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/407,924 | 2012-02-29 | ||
US13/407,924 US9178098B2 (en) | 2012-02-29 | 2012-02-29 | Solar cell with delta doping layer |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201733143A true TW201733143A (zh) | 2017-09-16 |
TWI623110B TWI623110B (zh) | 2018-05-01 |
Family
ID=47713943
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW106117175A TWI623110B (zh) | 2012-02-29 | 2013-02-19 | 具有脈衝摻雜層的太陽能電池 |
TW102105654A TWI590481B (zh) | 2012-02-29 | 2013-02-19 | 具有脈衝摻雜層的太陽能電池 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW102105654A TWI590481B (zh) | 2012-02-29 | 2013-02-19 | 具有脈衝摻雜層的太陽能電池 |
Country Status (5)
Country | Link |
---|---|
US (2) | US9178098B2 (zh) |
EP (1) | EP2634820B1 (zh) |
JP (2) | JP6351203B2 (zh) |
CN (1) | CN103296104B (zh) |
TW (2) | TWI623110B (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10587193B2 (en) | 2015-04-20 | 2020-03-10 | Vitesco Technologies USA, LLC. | Synchronous buck regulator with short circuit to voltage source protection |
CN111200030B (zh) * | 2018-11-19 | 2022-08-16 | 紫石能源有限公司 | 太阳能电池与其制作方法 |
CN111341872B (zh) * | 2018-12-18 | 2022-10-25 | 紫石能源有限公司 | 一种砷化镓太阳能电池外延结构及其生长方法 |
CN111430493B (zh) * | 2020-04-03 | 2023-06-02 | 扬州乾照光电有限公司 | 一种多结太阳能电池及供电设备 |
CN117902065B (zh) * | 2023-12-29 | 2024-06-07 | 山东星辰卫星技术有限公司 | 一种用于量产的3u立方星平台一体机 |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4524237A (en) * | 1984-02-08 | 1985-06-18 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Increased voltage photovoltaic cell |
US5019177A (en) * | 1989-11-03 | 1991-05-28 | The United States Of America As Represented By The United States Department Of Energy | Monolithic tandem solar cell |
FR2722612B1 (fr) * | 1994-07-13 | 1997-01-03 | Centre Nat Rech Scient | Procede de fabrication d'un materiau ou dispositif photovoltaique, materiau ou dispositif ainsi obteu et photopile comprenant un tel materiau ou dispositif |
JP3312506B2 (ja) * | 1994-10-17 | 2002-08-12 | 日立電線株式会社 | 化合物半導体ウエハ及び半導体装置 |
US6265652B1 (en) * | 1995-06-15 | 2001-07-24 | Kanegafuchi Kagaku Kogyo Kabushiki Kabushiki Kaisha | Integrated thin-film solar battery and method of manufacturing the same |
US6010937A (en) * | 1995-09-05 | 2000-01-04 | Spire Corporation | Reduction of dislocations in a heteroepitaxial semiconductor structure |
JP3250425B2 (ja) * | 1995-09-13 | 2002-01-28 | 日立電線株式会社 | 化合物半導体ウエハ及び太陽電池 |
JP3027116B2 (ja) * | 1996-02-28 | 2000-03-27 | 株式会社日立製作所 | 太陽電池 |
US6150603A (en) * | 1999-04-23 | 2000-11-21 | Hughes Electronics Corporation | Bilayer passivation structure for photovoltaic cells |
JP3724272B2 (ja) * | 1999-09-16 | 2005-12-07 | トヨタ自動車株式会社 | 太陽電池 |
US6542531B2 (en) * | 2001-03-15 | 2003-04-01 | Ecole Polytechnique Federale De Lausanne | Vertical cavity surface emitting laser and a method of fabrication thereof |
US20030070707A1 (en) * | 2001-10-12 | 2003-04-17 | King Richard Roland | Wide-bandgap, lattice-mismatched window layer for a solar energy conversion device |
US7309832B2 (en) * | 2001-12-14 | 2007-12-18 | Midwest Research Institute | Multi-junction solar cell device |
US7126052B2 (en) * | 2002-10-02 | 2006-10-24 | The Boeing Company | Isoelectronic surfactant induced sublattice disordering in optoelectronic devices |
US7122734B2 (en) * | 2002-10-23 | 2006-10-17 | The Boeing Company | Isoelectronic surfactant suppression of threading dislocations in metamorphic epitaxial layers |
US7560750B2 (en) * | 2003-06-26 | 2009-07-14 | Kyocera Corporation | Solar cell device |
EP1519422B1 (en) * | 2003-09-24 | 2018-05-16 | Panasonic Intellectual Property Management Co., Ltd. | Photovoltaic cell and its fabrication method |
JP5109230B2 (ja) * | 2005-02-23 | 2012-12-26 | 凸版印刷株式会社 | 非単結晶太陽電池の製造方法 |
US7375378B2 (en) * | 2005-05-12 | 2008-05-20 | General Electric Company | Surface passivated photovoltaic devices |
US10069026B2 (en) | 2005-12-19 | 2018-09-04 | The Boeing Company | Reduced band gap absorber for solar cells |
PL2165371T3 (pl) * | 2007-07-18 | 2012-08-31 | Imec | Sposób wytwarzania struktur emitera i struktury emitera wytwarzane tym sposobem |
EP2242111A4 (en) * | 2008-02-06 | 2013-01-23 | Kyocera Corp | METHOD FOR PRODUCING SOLAR BATTERY ELEMENT AND SOLAR BATTERY ELEMENT |
US8236600B2 (en) * | 2008-11-10 | 2012-08-07 | Emcore Solar Power, Inc. | Joining method for preparing an inverted metamorphic multijunction solar cell |
US9722131B2 (en) * | 2009-03-16 | 2017-08-01 | The Boeing Company | Highly doped layer for tunnel junctions in solar cells |
EP2362425A1 (en) * | 2010-02-26 | 2011-08-31 | Excico Group NV | A method for forming a selective contact |
AU2013277994A1 (en) * | 2012-06-22 | 2015-01-22 | Epiworks, Inc. | Manufacturing semiconductor-based multi-junction photovoltaic devices |
-
2012
- 2012-02-29 US US13/407,924 patent/US9178098B2/en active Active
-
2013
- 2013-02-06 CN CN201310048511.6A patent/CN103296104B/zh active Active
- 2013-02-08 EP EP13154715.0A patent/EP2634820B1/en active Active
- 2013-02-19 TW TW106117175A patent/TWI623110B/zh active
- 2013-02-19 TW TW102105654A patent/TWI590481B/zh active
- 2013-02-28 JP JP2013038097A patent/JP6351203B2/ja active Active
-
2015
- 2015-09-23 US US14/862,394 patent/US10944022B2/en active Active
-
2017
- 2017-12-26 JP JP2017249352A patent/JP6473220B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
TWI623110B (zh) | 2018-05-01 |
EP2634820B1 (en) | 2020-04-08 |
EP2634820A2 (en) | 2013-09-04 |
JP6351203B2 (ja) | 2018-07-04 |
TWI590481B (zh) | 2017-07-01 |
US20130220407A1 (en) | 2013-08-29 |
JP6473220B2 (ja) | 2019-02-20 |
EP2634820A3 (en) | 2017-09-06 |
JP2018107453A (ja) | 2018-07-05 |
US9178098B2 (en) | 2015-11-03 |
US10944022B2 (en) | 2021-03-09 |
JP2013183159A (ja) | 2013-09-12 |
US20160013357A1 (en) | 2016-01-14 |
TW201342647A (zh) | 2013-10-16 |
CN103296104A (zh) | 2013-09-11 |
CN103296104B (zh) | 2016-12-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US7629532B2 (en) | Solar cell having active region with nanostructures having energy wells | |
JP6473220B2 (ja) | デルタドーピング層を有する太陽電池 | |
US20100132774A1 (en) | Thin Film Silicon Solar Cell Device With Amorphous Window Layer | |
US20120103403A1 (en) | Multi-junction solar cell with dilute nitride sub-cell having graded doping | |
EP3550617A1 (en) | Heterojunction solar cell | |
KR100850641B1 (ko) | 고효율 결정질 실리콘 태양전지 및 그 제조방법 | |
TW201029197A (en) | Surrogate substrates for inverted metamorphic multijunction solar cells | |
JP2015532787A (ja) | 基板内に浅いカウンタードーピング層を含むトンネリング接合太陽電池 | |
TW200933913A (en) | High concentration terrestrial solar cell arrangement with III-V compound semiconductor cell | |
JP2012004557A (ja) | 高効率InGaAsN太陽電池、およびその製造方法 | |
KR20130106063A (ko) | 태양 전지 | |
JP2018137425A (ja) | パターニングされたエミッタを有する多接合太陽電池及び該太陽電池の製造方法 | |
TW201242066A (en) | Method of fabricating solar cell | |
US10141467B2 (en) | Solar cell and method for manufacturing the same | |
Kellenbenz et al. | Development of radiation hard Ga 0.50 In 0.50 P/Ga 0.99 In 0.01 As/Ge space solar cells with multi quantum wells | |
Raj et al. | Electron selective contact for high efficiency core-shell nanowire solar cell | |
CN102738267B (zh) | 具有超晶格结构的太阳能电池及其制备方法 | |
JP5669228B2 (ja) | 多接合太陽電池およびその製造方法 | |
CN102623524A (zh) | 一种半导体太阳能电池及其制作方法 | |
US20130081681A1 (en) | Photovoltaic device | |
US20100224237A1 (en) | Solar cell with backside contact network | |
KR20090019600A (ko) | 고효율 태양전지 및 그의 제조방법 | |
JP2009043822A (ja) | 光起電力装置の製造方法 | |
KR20160117770A (ko) | 이중막 패시베이션 구조물 및 이를 포함하는 태양 전지 | |
Hainey et al. | Nanotextured solar cells using aluminum as a catalyst and dopant |