TW201612221A - Photocurable resin composition - Google Patents
Photocurable resin compositionInfo
- Publication number
- TW201612221A TW201612221A TW104122988A TW104122988A TW201612221A TW 201612221 A TW201612221 A TW 201612221A TW 104122988 A TW104122988 A TW 104122988A TW 104122988 A TW104122988 A TW 104122988A TW 201612221 A TW201612221 A TW 201612221A
- Authority
- TW
- Taiwan
- Prior art keywords
- component
- resin composition
- photocurable resin
- tertiary amine
- pag
- Prior art date
Links
- 239000011342 resin composition Substances 0.000 title abstract 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 239000003505 polymerization initiator Substances 0.000 abstract 1
- -1 tertiary amine compound Chemical class 0.000 abstract 1
- 150000003512 tertiary amines Chemical group 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1811—C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/15—Heterocyclic compounds having oxygen in the ring
- C08K5/151—Heterocyclic compounds having oxygen in the ring having one oxygen atom in the ring
- C08K5/1545—Six-membered rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/17—Amines; Quaternary ammonium compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/37—Thiols
- C08K5/375—Thiols containing six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
- C08K5/41—Compounds containing sulfur bound to oxygen
- C08K5/42—Sulfonic acids; Derivatives thereof
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/41—Organic pigments; Organic dyes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/63—Additives non-macromolecular organic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
- C09J11/06—Non-macromolecular additives organic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/10—Materials in mouldable or extrudable form for sealing or packing joints or covers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Inorganic Chemistry (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014197803 | 2014-09-29 | ||
JP2014-197803 | 2014-09-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201612221A true TW201612221A (en) | 2016-04-01 |
TWI648321B TWI648321B (zh) | 2019-01-21 |
Family
ID=55629966
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW104122988A TWI648321B (zh) | 2014-09-29 | 2015-07-15 | Photocurable resin composition |
Country Status (7)
Country | Link |
---|---|
US (1) | US10240026B2 (zh) |
EP (1) | EP3202794A4 (zh) |
JP (1) | JP6586958B2 (zh) |
KR (1) | KR102311319B1 (zh) |
CN (1) | CN106715477B (zh) |
TW (1) | TWI648321B (zh) |
WO (1) | WO2016051914A1 (zh) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6700558B2 (ja) * | 2014-11-04 | 2020-05-27 | 株式会社スリーボンド | 光硬化性樹脂組成物およびその硬化物、ならびに硬化物の製造方法 |
WO2016117631A1 (ja) * | 2015-01-21 | 2016-07-28 | 株式会社スリーボンド | 光硬化性組成物 |
JP6557043B2 (ja) * | 2015-04-02 | 2019-08-07 | 山本化成株式会社 | 活性線硬化型接着剤用液状樹脂組成物 |
JP6932744B2 (ja) * | 2015-04-02 | 2021-09-08 | 山本化成株式会社 | 活性線硬化型接着剤用液状樹脂組成物 |
WO2019035411A1 (ja) * | 2017-08-18 | 2019-02-21 | 積水化学工業株式会社 | 湿気硬化型樹脂組成物、電子部品用接着剤、及び、表示素子用接着剤 |
KR102009341B1 (ko) * | 2017-09-26 | 2019-08-12 | 조광페인트주식회사 | 폴리프로필렌 필름 코팅용 친환경 무광 도료 조성물 및 이를 이용한 도장 방법 |
DE102017126215A1 (de) | 2017-11-09 | 2019-05-09 | Delo Industrie Klebstoffe Gmbh & Co. Kgaa | Verfahren zur Erzeugung opaker Beschichtungen, Verklebungen und Vergüsse sowie härtbare Masse zur Verwendung in dem Verfahren |
CN107935720A (zh) * | 2017-12-13 | 2018-04-20 | 烟台燕晟信息技术有限公司 | 一种互穿网络包膜染色肥料的制备方法 |
CN112969732B (zh) * | 2018-11-21 | 2023-11-28 | 三键有限公司 | 光固化性树脂组合物、燃料电池用密封材料以及它们的固化物、燃料电池以及密封方法 |
KR102302203B1 (ko) * | 2018-11-29 | 2021-09-15 | 도레이첨단소재 주식회사 | 점착제 조성물, 점착필름 및 디스플레이 디바이스 |
JP7111672B2 (ja) * | 2019-03-15 | 2022-08-02 | 日東電工株式会社 | 粘着シート、粘着シートの製造方法、中間積層体の製造方法および中間積層体 |
CN110256992A (zh) * | 2019-07-15 | 2019-09-20 | 江苏方成生物科技有限公司 | 一种高性能电子胶 |
JP2022046283A (ja) * | 2020-09-10 | 2022-03-23 | 日東電工株式会社 | 粘着シート貼付品の製造方法 |
JP7237900B2 (ja) * | 2020-09-10 | 2023-03-13 | 日東電工株式会社 | 可変色粘着シート |
JP2022046282A (ja) * | 2020-09-10 | 2022-03-23 | 日東電工株式会社 | 可変色粘着シート |
JP7428669B2 (ja) * | 2021-01-20 | 2024-02-06 | 株式会社豊田自動織機 | 樹脂ガラス用コーティング剤および樹脂ガラス |
US11675266B2 (en) | 2021-04-15 | 2023-06-13 | Industrial Technology Research Institute | Photosensitive compound, photosensitive composition, and patterning method |
JP7343728B1 (ja) | 2023-06-07 | 2023-09-12 | デクセリアルズ株式会社 | 光硬化型接着組成物、硬化物、接続構造体及び接続構造体の製造方法 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH06148883A (ja) | 1992-11-06 | 1994-05-27 | Mitsubishi Rayon Co Ltd | 感光性樹脂組成物 |
JPH1160962A (ja) * | 1997-08-11 | 1999-03-05 | Asahi Chem Ind Co Ltd | 注型用感光性樹脂組成物 |
JP2000273109A (ja) | 1999-03-18 | 2000-10-03 | Asahi Chem Ind Co Ltd | 光注型用感光性樹脂組成物 |
JP2001075271A (ja) * | 1999-09-06 | 2001-03-23 | Mitsubishi Paper Mills Ltd | 光発色記録材料 |
JP2003301018A (ja) * | 2002-04-11 | 2003-10-21 | Nippon Kayaku Co Ltd | 感光性樹脂組成物及びその硬化皮膜を有するフィルム |
JP2004219690A (ja) | 2003-01-15 | 2004-08-05 | Sumitomo Seika Chem Co Ltd | 感光性組成物 |
US20060005749A1 (en) * | 2004-07-07 | 2006-01-12 | Kobin Environmental Enterprise Co., Ltd. | Process for washing and sorting solid residues generated from solid wastes incinerator |
JP5089866B2 (ja) * | 2004-09-10 | 2012-12-05 | 富士フイルム株式会社 | 平版印刷方法 |
JP5061967B2 (ja) * | 2008-03-06 | 2012-10-31 | Jsr株式会社 | 硬化性組成物、硬化膜及び硬化膜の製造方法 |
JP2011085898A (ja) * | 2009-09-15 | 2011-04-28 | Ricoh Co Ltd | トナー容器、及び、画像形成装置 |
JP5549439B2 (ja) * | 2009-09-18 | 2014-07-16 | Jsr株式会社 | 表示素子用の保護膜、絶縁膜又はスペーサーとしての硬化物形成用の感放射線性樹脂組成物、硬化物及びその形成方法 |
JP5916600B2 (ja) * | 2010-02-26 | 2016-05-11 | 太陽ホールディングス株式会社 | 画像形成方法及びその方法に用いる感光性組成物 |
JP2012167262A (ja) * | 2011-01-25 | 2012-09-06 | Sanyo Chem Ind Ltd | 感光性組成物 |
JP2013071321A (ja) * | 2011-09-28 | 2013-04-22 | Dainippon Printing Co Ltd | 透明光学部材及びその製造方法 |
JP2013082924A (ja) | 2011-09-30 | 2013-05-09 | Sanyo Chem Ind Ltd | 活性エネルギー線硬化性黒色樹脂組成物 |
JP5981181B2 (ja) | 2012-03-21 | 2016-08-31 | 株式会社タムラ製作所 | 紫外線硬化性樹脂組成物 |
JP2014028950A (ja) * | 2012-07-04 | 2014-02-13 | Nippon Shokubai Co Ltd | 組成物およびカラーフィルタ |
JP2014025021A (ja) | 2012-07-30 | 2014-02-06 | Toyo Ink Sc Holdings Co Ltd | 光硬化性着色接着剤 |
JP2014056123A (ja) * | 2012-09-12 | 2014-03-27 | Sanyo Chem Ind Ltd | 感光性組成物 |
CN103926795A (zh) * | 2013-01-16 | 2014-07-16 | 施敏打硬株式会社 | 光固化性组合物 |
JP2015163672A (ja) * | 2014-01-30 | 2015-09-10 | 株式会社Adeka | 組成物 |
-
2015
- 2015-07-10 KR KR1020177007391A patent/KR102311319B1/ko active IP Right Grant
- 2015-07-10 US US15/513,578 patent/US10240026B2/en active Active
- 2015-07-10 WO PCT/JP2015/069957 patent/WO2016051914A1/ja active Application Filing
- 2015-07-10 CN CN201580052506.XA patent/CN106715477B/zh active Active
- 2015-07-10 EP EP15847195.3A patent/EP3202794A4/en active Pending
- 2015-07-10 JP JP2016551598A patent/JP6586958B2/ja active Active
- 2015-07-15 TW TW104122988A patent/TWI648321B/zh active
Also Published As
Publication number | Publication date |
---|---|
JPWO2016051914A1 (ja) | 2017-09-21 |
WO2016051914A1 (ja) | 2016-04-07 |
EP3202794A1 (en) | 2017-08-09 |
CN106715477B (zh) | 2018-10-12 |
US20170283584A1 (en) | 2017-10-05 |
KR20170065507A (ko) | 2017-06-13 |
KR102311319B1 (ko) | 2021-10-08 |
EP3202794A4 (en) | 2018-05-30 |
CN106715477A (zh) | 2017-05-24 |
JP6586958B2 (ja) | 2019-10-09 |
US10240026B2 (en) | 2019-03-26 |
TWI648321B (zh) | 2019-01-21 |
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