TW201612641A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
TW201612641A
TW201612641A TW104117777A TW104117777A TW201612641A TW 201612641 A TW201612641 A TW 201612641A TW 104117777 A TW104117777 A TW 104117777A TW 104117777 A TW104117777 A TW 104117777A TW 201612641 A TW201612641 A TW 201612641A
Authority
TW
Taiwan
Prior art keywords
photosensitive composition
photopolymerization initiator
carbazole
pattern
photopolymerization
Prior art date
Application number
TW104117777A
Other languages
Chinese (zh)
Other versions
TWI662366B (en
Inventor
Yoshinori Tadokoro
Dai Shiota
Eita Suga
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW201612641A publication Critical patent/TW201612641A/en
Application granted granted Critical
Publication of TWI662366B publication Critical patent/TWI662366B/en

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)

Abstract

A photosensitive composition is provided, which is capable of forming a pattern that features a high sensitivity, an excellent straightness and an enhanced adhesion-contact to the substrate; in addition, the photosensitive composition is able to inhibit undercut generated during developing the pattern even when an opaquer is contained therein or under-developed. A color filter and a display using the photosensitive composition are also disclosed. In a photosensitive composition comprising a photopolymerization compound and a photopolymerization initiator, the oxime type compound which the carbazole 3-ylcarbonyl group having a specific substituent in 6th-position on a carbazole ring, and the cycloalkyl alkyl group of a specific structure bonding with oxime carbon is used as a photopolymerization initiator.
TW104117777A 2014-07-15 2015-06-02 Photosensitive composition TWI662366B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014-145258 2014-07-15
JP2014145258A JP6401529B2 (en) 2014-07-15 2014-07-15 Photosensitive composition

Publications (2)

Publication Number Publication Date
TW201612641A true TW201612641A (en) 2016-04-01
TWI662366B TWI662366B (en) 2019-06-11

Family

ID=55147505

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104117777A TWI662366B (en) 2014-07-15 2015-06-02 Photosensitive composition

Country Status (4)

Country Link
JP (1) JP6401529B2 (en)
KR (1) KR102297020B1 (en)
CN (1) CN105278242A (en)
TW (1) TWI662366B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102025359B1 (en) * 2016-03-08 2019-09-25 삼성에스디아이 주식회사 Photosensitive resin composition, black column spacerusing the same and color filter
KR20180124831A (en) * 2016-03-29 2018-11-21 가부시키가이샤 아데카 Photopolymerization initiator composition and photosensitive composition
CN108475019B (en) * 2016-03-29 2022-02-11 株式会社艾迪科 Black photosensitive resin composition
JP6860978B2 (en) * 2016-04-27 2021-04-21 東京応化工業株式会社 Photosensitive composition

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100543585C (en) * 2004-12-24 2009-09-23 东洋油墨制造株式会社 Color composition for color filter and color filter
JP4657808B2 (en) * 2005-05-24 2011-03-23 東京応化工業株式会社 Photosensitive composition and color filter formed from the photosensitive composition
JP5732191B2 (en) * 2009-09-25 2015-06-10 太陽ホールディングス株式会社 Photocurable composition
KR20130018229A (en) * 2010-03-26 2013-02-20 스미또모 베이크라이트 가부시키가이샤 Photosensitive resin composition and light receiving device
EP2625166B1 (en) 2010-10-05 2014-09-24 Basf Se Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions
JP5121912B2 (en) * 2010-11-24 2013-01-16 富士フイルム株式会社 Colored photosensitive resin composition, pattern forming method, color filter manufacturing method, color filter, and display device including the same
JP6009774B2 (en) * 2011-02-22 2016-10-19 東京応化工業株式会社 Photosensitive resin composition, and color filter and display device using the same
JP5981159B2 (en) * 2011-02-22 2016-08-31 東京応化工業株式会社 Photosensitive resin composition, and color filter and display device using the same
JP6026757B2 (en) * 2012-03-12 2016-11-16 東京応化工業株式会社 Photosensitive resin composition, color filter, display device, photopolymerization initiator, and compound
JP5798978B2 (en) 2012-05-17 2015-10-21 富士フイルム株式会社 Colored radiation-sensitive composition and color filter using the same
CN103130919B (en) * 2013-02-08 2015-02-25 常州强力先端电子材料有限公司 Carbazole ketone oxime ester high-photosensibility photoinitiator
KR101508744B1 (en) 2013-04-23 2015-04-07 대한민국 Chloroplast DNA marker for distinguishing Brassica species and uses thereof
CN103293855B (en) * 2013-05-20 2015-12-23 常州强力先端电子材料有限公司 A kind of esters of acrylic acid Photocurable composition

Also Published As

Publication number Publication date
KR102297020B1 (en) 2021-09-01
TWI662366B (en) 2019-06-11
KR20160008957A (en) 2016-01-25
JP2016021012A (en) 2016-02-04
JP6401529B2 (en) 2018-10-10
CN105278242A (en) 2016-01-27

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