TW201612641A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- TW201612641A TW201612641A TW104117777A TW104117777A TW201612641A TW 201612641 A TW201612641 A TW 201612641A TW 104117777 A TW104117777 A TW 104117777A TW 104117777 A TW104117777 A TW 104117777A TW 201612641 A TW201612641 A TW 201612641A
- Authority
- TW
- Taiwan
- Prior art keywords
- photosensitive composition
- photopolymerization initiator
- carbazole
- pattern
- photopolymerization
- Prior art date
Links
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Polymerisation Methods In General (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
Abstract
A photosensitive composition is provided, which is capable of forming a pattern that features a high sensitivity, an excellent straightness and an enhanced adhesion-contact to the substrate; in addition, the photosensitive composition is able to inhibit undercut generated during developing the pattern even when an opaquer is contained therein or under-developed. A color filter and a display using the photosensitive composition are also disclosed. In a photosensitive composition comprising a photopolymerization compound and a photopolymerization initiator, the oxime type compound which the carbazole 3-ylcarbonyl group having a specific substituent in 6th-position on a carbazole ring, and the cycloalkyl alkyl group of a specific structure bonding with oxime carbon is used as a photopolymerization initiator.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014-145258 | 2014-07-15 | ||
JP2014145258A JP6401529B2 (en) | 2014-07-15 | 2014-07-15 | Photosensitive composition |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201612641A true TW201612641A (en) | 2016-04-01 |
TWI662366B TWI662366B (en) | 2019-06-11 |
Family
ID=55147505
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW104117777A TWI662366B (en) | 2014-07-15 | 2015-06-02 | Photosensitive composition |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6401529B2 (en) |
KR (1) | KR102297020B1 (en) |
CN (1) | CN105278242A (en) |
TW (1) | TWI662366B (en) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102025359B1 (en) * | 2016-03-08 | 2019-09-25 | 삼성에스디아이 주식회사 | Photosensitive resin composition, black column spacerusing the same and color filter |
KR20180124831A (en) * | 2016-03-29 | 2018-11-21 | 가부시키가이샤 아데카 | Photopolymerization initiator composition and photosensitive composition |
CN108475019B (en) * | 2016-03-29 | 2022-02-11 | 株式会社艾迪科 | Black photosensitive resin composition |
JP6860978B2 (en) * | 2016-04-27 | 2021-04-21 | 東京応化工業株式会社 | Photosensitive composition |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100543585C (en) * | 2004-12-24 | 2009-09-23 | 东洋油墨制造株式会社 | Color composition for color filter and color filter |
JP4657808B2 (en) * | 2005-05-24 | 2011-03-23 | 東京応化工業株式会社 | Photosensitive composition and color filter formed from the photosensitive composition |
JP5732191B2 (en) * | 2009-09-25 | 2015-06-10 | 太陽ホールディングス株式会社 | Photocurable composition |
KR20130018229A (en) * | 2010-03-26 | 2013-02-20 | 스미또모 베이크라이트 가부시키가이샤 | Photosensitive resin composition and light receiving device |
EP2625166B1 (en) | 2010-10-05 | 2014-09-24 | Basf Se | Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions |
JP5121912B2 (en) * | 2010-11-24 | 2013-01-16 | 富士フイルム株式会社 | Colored photosensitive resin composition, pattern forming method, color filter manufacturing method, color filter, and display device including the same |
JP6009774B2 (en) * | 2011-02-22 | 2016-10-19 | 東京応化工業株式会社 | Photosensitive resin composition, and color filter and display device using the same |
JP5981159B2 (en) * | 2011-02-22 | 2016-08-31 | 東京応化工業株式会社 | Photosensitive resin composition, and color filter and display device using the same |
JP6026757B2 (en) * | 2012-03-12 | 2016-11-16 | 東京応化工業株式会社 | Photosensitive resin composition, color filter, display device, photopolymerization initiator, and compound |
JP5798978B2 (en) | 2012-05-17 | 2015-10-21 | 富士フイルム株式会社 | Colored radiation-sensitive composition and color filter using the same |
CN103130919B (en) * | 2013-02-08 | 2015-02-25 | 常州强力先端电子材料有限公司 | Carbazole ketone oxime ester high-photosensibility photoinitiator |
KR101508744B1 (en) | 2013-04-23 | 2015-04-07 | 대한민국 | Chloroplast DNA marker for distinguishing Brassica species and uses thereof |
CN103293855B (en) * | 2013-05-20 | 2015-12-23 | 常州强力先端电子材料有限公司 | A kind of esters of acrylic acid Photocurable composition |
-
2014
- 2014-07-15 JP JP2014145258A patent/JP6401529B2/en active Active
-
2015
- 2015-06-02 TW TW104117777A patent/TWI662366B/en active
- 2015-06-25 KR KR1020150090269A patent/KR102297020B1/en active IP Right Grant
- 2015-07-10 CN CN201510404538.3A patent/CN105278242A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
KR102297020B1 (en) | 2021-09-01 |
TWI662366B (en) | 2019-06-11 |
KR20160008957A (en) | 2016-01-25 |
JP2016021012A (en) | 2016-02-04 |
JP6401529B2 (en) | 2018-10-10 |
CN105278242A (en) | 2016-01-27 |
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