TW201411789A - 附散熱座功率模組用基板,附冷卻器功率模組用基板及功率模組 - Google Patents
附散熱座功率模組用基板,附冷卻器功率模組用基板及功率模組 Download PDFInfo
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- TW201411789A TW201411789A TW102111529A TW102111529A TW201411789A TW 201411789 A TW201411789 A TW 201411789A TW 102111529 A TW102111529 A TW 102111529A TW 102111529 A TW102111529 A TW 102111529A TW 201411789 A TW201411789 A TW 201411789A
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- Prior art keywords
- power module
- substrate
- heat sink
- layer
- metal layer
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- 239000000758 substrate Substances 0.000 title claims abstract description 105
- 229910052751 metal Inorganic materials 0.000 claims abstract description 98
- 239000002184 metal Substances 0.000 claims abstract description 98
- 229910000679 solder Inorganic materials 0.000 claims abstract description 75
- 239000000919 ceramic Substances 0.000 claims abstract description 44
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 38
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 36
- 239000000463 material Substances 0.000 claims abstract description 31
- 229910052802 copper Inorganic materials 0.000 claims abstract description 21
- 239000010949 copper Substances 0.000 claims abstract description 21
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 20
- 239000006104 solid solution Substances 0.000 claims abstract description 20
- 229910000881 Cu alloy Inorganic materials 0.000 claims abstract description 13
- 239000010410 layer Substances 0.000 claims 7
- 239000002344 surface layer Substances 0.000 claims 1
- 239000011159 matrix material Substances 0.000 abstract 1
- 230000017525 heat dissipation Effects 0.000 description 20
- 239000012071 phase Substances 0.000 description 11
- 238000005219 brazing Methods 0.000 description 10
- 239000011888 foil Substances 0.000 description 10
- 235000012431 wafers Nutrition 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 6
- 238000001816 cooling Methods 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 229910018125 Al-Si Inorganic materials 0.000 description 3
- 229910018520 Al—Si Inorganic materials 0.000 description 3
- 229910020836 Sn-Ag Inorganic materials 0.000 description 3
- 229910020988 Sn—Ag Inorganic materials 0.000 description 3
- 230000005489 elastic deformation Effects 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 229910017944 Ag—Cu Inorganic materials 0.000 description 2
- 229910020935 Sn-Sb Inorganic materials 0.000 description 2
- 229910008757 Sn—Sb Inorganic materials 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000002826 coolant Substances 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 230000001052 transient effect Effects 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910018956 Sn—In Inorganic materials 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 description 1
- 238000004881 precipitation hardening Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000005382 thermal cycling Methods 0.000 description 1
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
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Abstract
本申請案之附散熱座功率模組用基板,具備:功率模組用基板(10),其具有陶瓷基板(11)與電路層(12)與金屬層(13);及散熱座(18),隔著銲料層(17)與金屬層(13)接合,且由銅或銅合金所構成。金屬層(13)是由Al含有量為99.0質量%以上99.85質量%以下之鋁板與陶瓷基板(11)接合而形成,銲料層(17)是由固溶硬化型之銲料材所形成,其含有主成分之Sn、及在該Sn的母相中固溶之固溶元素。
Description
本發明係有關一種附散熱座功率模組用基板、具備此附散熱座功率模組用基板之附冷卻器功率模組用基板及功率模組,該附散熱座功率模組用基板具備:功率模組用基板,在陶瓷基板一方之面配設電路層,且在前述陶瓷基板另一方之面配設由鋁所構成之金屬層;及散熱座,由銅或銅合金所構成。
本申請案基於2012年3月30日於日本申請之特願2012-082997號而主張優先權,其內容被援用於此。
半導體元件當中用於電力供給之功率元件,由於發熱量較高,故作為搭載其之基板,例如如專利文獻1~4所示,係廣泛運用功率模組用基板,其是在陶瓷基板一方之面接合有作為電路層之鋁金屬板,而在陶瓷基板另一方之面接合有作為金屬層之鋁金屬板。
這些功率模組用基板中,在金屬層另一方之面側隔著銲料層而接合有銅製之散熱板(散熱座)。又,該散熱板是藉由螺絲等而固定於冷卻器。
上述功率模組中,使用時會有熱循環負載。此處,當功率模組用基板有熱循環負載的情形下,介於金屬層與散熱板(散熱座)之間的銲料層會蓄積應變(strain),在銲料層有發生裂痕之虞。
鑑此,習知會以鋁含有量99.99質量%以上之4N鋁等變形電阻相對較小的鋁來構成金屬層,藉此以金屬層的變形來吸收上述應變,以謀求防止在銲料層發生裂痕。
此處,針對介於由4N鋁所構成之金屬層與由銅所構成之散熱板(散熱座)之間的銲料層,計算其內部應變分布的結果,確認出應變會分布於金屬層全體,應變廣泛分散,應變量的峰值會變低。
[先前技術文獻]
[專利文獻]
[專利文獻1]日本特開2004-152969號公報
[專利文獻2]日本特開2004-153075號公報
[專利文獻3]日本特開2004-200369號公報
[專利文獻4]日本特開2004-207619號公報
不過,如上述般,藉由4N鋁等變形電阻相對較小的鋁來形成金屬層的情形下,銲料層可能會廣範圍地發生裂痕,造成金屬層與散熱座之接合不確實,熱循環負載後熱阻有上昇之虞。推測這是因為熱循環負載時,金屬層變形超過必要以上程度,對於介於散熱座之間的銲料層進一步施加應變,導致雖然應變廣泛分散了,但應變量卻無法充分減低。
特別是近來伴隨功率模組的小型化、減薄,其使用環境也變得嚴苛,來自半導體元件等電子零件的發熱量變大,故熱循環的溫度差大,銲料層有廣範圍地發生裂痕之傾向。
此外,作為介於金屬層與散熱座之間的銲料層,近來例如會使用Sn-Ag系或Sn-Ag-Cu系之無鉛銲料材。這些銲料材,係做成析出硬化型銲料材,藉由在Sn的母相(parent phase)中散布由Sn-Ag金屬間化合物所構成之析出物而硬化。由這類銲料材所構成之銲料層,由於析出物的粒徑或分散狀態會因熱循環而變化,故銲料層強度會有對熱不穩定之問題。
本發明係有鑑於前述事態而研發,提供一種針對介於由鋁所構成的金屬層與由銅所構成的散熱座之間的銲料層,能夠抑制其裂痕發生及加劇,且接合可靠性優良的附散熱座功率模組用基板、具備此附散熱座功率模組用基板之附冷卻器功率模組用基板及功率模組。
為了解決此問題,本發明團隊反覆鑽研之結果,發現在金屬層使用鋁純度99.0質量%以上99.85質量%以下(亦即2N鋁)之鋁板,藉此,相較於使用4N鋁之鋁板時更可抑制金屬層的變形。此外,針對介於由2N鋁所構成的金屬層與由銅所構成的散熱座之間的銲料層,計算其內部應變分布之結果,發現在金屬層周緣部的應變量會變高,在金屬層內側區域的應變量會變低。
本發明便是基於這樣的發現而研發,本發明之附散熱座功率模組用基板,屬於具備:功率模組用基板,其具有陶瓷基板、和在前述陶瓷基板一方之面配設之電路層、和在前述陶瓷基板另一方之面配設之由鋁所構成之金屬層;及散熱座,由在該金屬層另一方之面側隔著銲料層而接合之銅或銅合金所構成;該附散熱座功率模組用基板,其特徵為:前述金屬層,係Al含有量為99.0質量%以上99.85質量%以下之鋁板與前述陶瓷基板接合而形成,前述銲料層,是由固溶硬化(solid solutiowhardening)型之銲料材所形成,其含有主成分之Sn、及在該Sn的母相中固溶之固溶元素。
按照此構成之附散熱座功率模組用基板,前述金屬層中,由於Al含有量為99.0質量%以上99.85質量%以下之鋁板與前述陶瓷基板接合而形成,故冷熱循環負載後金屬層不易變形,能夠抑制銲料層的裂痕發生。另一方面,若Al含有量未滿99.0質量%,則Al的塑性變形
不足,無法獲得充分的應力緩衝效果。如此一來,由於會在陶瓷或銲料層發生裂痕,會造成冷熱循環後的接合率降低。此外,若超過99.85質量%,則冷熱循環負載後會由於金屬層變形而在銲料層發生裂痕,造成接合率降低。基於這些理由,將Al含有量訂為99.0質量%以上99.85質量%以下之範圍。
此外,由於銲料層是由固溶硬化型之銲料材所形成,其含有主成分之Sn、以及在此Sn的母相中固溶之固溶元素,故銲料層母相的強度會變高。此外,即使在有冷熱循環負載的情形下亦會確保強度。故,即使於金屬層的周緣部,在銲料層發生裂痕的情形下,也能抑制該裂痕加劇至金屬層的內側區域。
另,構成金屬層的鋁板中,Al含有量訂為99.0質量%以上99.85質量%以下,主要的雜質例如有Fe、Cu、Si。
此處,前述銲料層中,作為前述固溶元素,係以含有Sb之銲料材來形成較佳。
在此情形下,Sb固溶於Sn的母相中,藉此,銲料層的強度會確實地提升,且對熱穩定。故,能夠確實地抑制在金屬層的周緣部發生之裂痕加劇。另,由於Sb固溶於Sn而強度充分地提升,故亦可另外含有生成析出物之元素。也就是說,即使因冷熱循環而造成析出物粒徑或分散狀態變化,也會藉由Sb的固溶硬化而能確保Sn母相的強度,能夠抑制裂痕加劇。
又,前述散熱座,以抗拉強度250MPa以上的銅或銅合金所構成較佳。
在此情形下,由於散熱座會變得容易塑性變形,故散熱座會在彈性變形(elastic deformation)區域變形。故,會抑制散熱座以翹曲的方式塑性變形,能夠將散熱座與冷卻器密合而層積配置。
另,作為散熱座,係包括板狀之散熱板、內部有冷媒流通之冷卻器、形成有鰭片之液冷或空冷散熱器、以及熱管(heat pipe)等以藉由熱逸散而降低溫度為目的之金屬零件。
本發明之附冷卻器功率模組用基板,具備:前述附散熱座功率模組用基板、及前述散熱座另一方的兩側層積配置之冷卻器。
按照此構成之附冷卻器功率模組用基板,由於具備熱傳導性優良之銅製散熱座,故能夠使來自功率模組用基板的熱有效率地擴散而逸散。此外,會抑制介於金屬層與冷卻器之間的銲料層的裂痕發生及加劇,故能夠使功率模組用基板側的熱確實地傳導至冷卻器。
本發明之功率模組,具備:前述附散熱座功率模組用基板、及在附散熱座功率模組用基板上搭載之電子零件。
按照此構成之功率模組,能夠抑制在金屬層與冷卻器之間形成之銲料層的裂痕發生及加劇,故能使其可靠性飛躍性的提升。
按照本發明,能夠提供一種針對介於由鋁所構成的金屬層與由銅所構成的散熱座之間的銲料層,能夠抑制其裂痕發生及加劇,且接合可靠性優良的附散熱座功率模組用基板、具備此附散熱座功率模組用基板之附冷卻器功率模組用基板及功率模組。
1‧‧‧功率模組
3‧‧‧半導體晶片(電子零件)
10‧‧‧功率模組用基板
11‧‧‧陶瓷基板
13‧‧‧金屬層
17‧‧‧銲料層
18‧‧‧散熱座(散熱板)
[圖1]本發明實施形態之功率模組概略說明圖。
[圖2]本發明實施形態之附散熱座功率模組用基板示意說明圖。
[圖3]本發明實施形態之附散熱座功率模組用基板的製造方法示意說明圖。
以下參照所附圖面,說明本發明之實施形態。
圖1揭示本發明實施形態之附散熱座功率模組用基板及功率模組。
該功率模組1具備:附散熱座功率模組用基板20、半導體晶片3、冷卻器40。附散熱座功率模組用基板20,具有:功率模組用基板10,配設有電路層12及金屬層13;及散熱板18,與金屬層13另一方之面(圖1中的
下面)隔著銲料層17而接合。半導體晶片3,是與電路層12一方之面(圖1中的上面)隔著晶片用銲料層2而接合。冷卻器40配設於散熱板18另一方的兩側。另,本實施形態中,作為散熱座係使用散熱板18。
此處,晶片用銲料層2,例如是做成Sn-Ag系、Sn-In系、或Sn-Ag-Cu系之銲料材。另,本實施形態中,在電路層12與晶片用銲料層2之間設有Ni鍍覆層(未圖示)。
功率模組用基板10,如圖1及圖2所示,具備:構成絕緣層之陶瓷基板11;及電路層12,配設於該陶瓷基板11一方之面(圖2中的上面);及金屬層13,配設於陶瓷基板11另一方之面(圖2中的下面)。也就是說,陶瓷基板11具有第一面(一方之面)及第二面(另一方之面),在陶瓷基板11的第一面配設電路層,而在陶瓷基板11的第二面配設金屬層。
陶瓷基板11,係防止電路層12與金屬層13之間的電性連接,且由絕緣性高的AIN(氮化鋁)所構成。此外,陶瓷基板11的厚度設定在0.2~1.5mm的範圍內,本實施形態中是設定為0.635mm。另,本實施形態中,如圖1及圖2所示,陶瓷基板11的寬度是設定成比電路層12及金屬層13的寬度還寬廣。
電路層12,如圖3所示,是藉由在陶瓷基板11的第一面(圖3中的上面)接合具有導電性之金屬板22而形成。本實施形態中,電路層12是藉由鋁含有量
99.99質量%以上的鋁(亦即4N鋁)的壓延板所構成之金屬板22與陶瓷基板11接合而形成。
另,如後所述,金屬板22與陶瓷基板11彼此是隔著Al-Si系硬銲材(brazing material)而接合。因此,在電路層12當中與陶瓷基板11的界面鄰近,會形成有Si擴散之界面鄰近層12A。在此界面鄰近層12A中,鋁含有量可能未滿99.99質量%。
金屬層13,如圖3所示,是藉由在陶瓷基板11的第二面(圖3中的下面)接合金屬板23而形成。
本實施形態中,金屬層13是藉由鋁含有量99.0質量%以上99.85質量%以下的鋁(亦即2N鋁)的壓延板所構成之金屬板23與陶瓷基板11接合而形成。
另,如後所述,金屬板23與陶瓷基板11彼此是隔著Al-Si系硬銲材而接合。因此,在金屬層13當中與陶瓷基板11的界面鄰近,會形成有Si擴散之界面鄰近層13A。在此界面鄰近層13A中,鋁含有量可能未滿99.0質量%。
散熱板18,係將來自前述功率模組用基板10的熱朝兩方向擴散,且由熱傳導性優良之銅或銅合金所構成。
此處,本實施形態中,散熱板18是由楊氏係數130GPa以下,且抗拉強度為250MPa以上的銅或銅合金所構成。具體而言,散熱板18是由Cu-0.04質量%Ni-0.17質量%Co-0.05質量%P-0.1質量%Sn(CDA
No.C18620)所構成,做成楊氏係數125GPa、抗拉強度250MPa以上。
冷卻器40如圖1所示,具備用來流通冷卻媒體(例如冷卻水)之通路41。冷卻器40理想是由熱傳導性良好的材質所構成,本實施形態中,是以A6063(鋁合金)所構成。
另,散熱板18與冷卻器40彼此如圖1所示,是藉由固定螺絲45而緊固。
又,介於金屬層13與散熱板18之間的銲料層17,是藉由固溶硬化型之銲料材所形成,其包含:主成分之Sn、及在該Sn的母相中固溶之固溶元素。本實施形態中,係做成由含有2質量%以上10質量%以下範圍之Sb作為固溶元素之Sn-Sb系合金所構成之銲料材,具體而言,係做成Sn-5質量%Sb銲料材。
另,本實施形態中,在金屬層13與銲料層17之間設有Ni鍍覆層(未圖示)。
以下參照圖3,說明前述構成之附散熱座功率模組用基板20的製造方法。
首先,如圖3所示,在陶瓷基板11的第一面側,作為電路層12的金屬板22(4N鋁之壓延板),係隔著厚度5~50μm(本實施形態中為14μm)的硬銲材箔24而層積。
此外,在陶瓷基板11的第二面側,作為金屬層13的金屬板23(2N鋁之壓延板),係隔著厚度5~50μm(本
實施形態中為14μm)的硬銲材箔25而層積。
另,本實施形態中,硬銲材箔24、25,係做成含有熔點下降元素即Si之Al-Si系硬銲材。
接下來,將如前述般層積之金屬板22、硬銲材箔24、陶瓷基板11、硬銲材箔25、金屬板23,在朝其層積方向加壓(壓力1~5kgf/cm2)之狀態下,放入加熱爐內加熱。如此,硬銲材箔24、25與金屬板22、23的一部分會熔融,金屬板22、23與陶瓷基板11之界面會分別形成熔融金屬區域。此處,加熱溫度訂為550℃以上650℃以下、加熱時間訂為30分鐘以上180分鐘以下。接著,在加熱後藉由冷卻,使在金屬板22、23與陶瓷基板11之界面形成的熔融金屬區域凝固,將陶瓷基板11與金屬板22及金屬板23接合。
此時,硬銲材箔24、25中含有之熔點下降元素(Si)會朝金屬板22、23擴散。
像這樣,作為電路層12及金屬層13的金屬板22、23與陶瓷基板11接合,製造出本實施形態之功率模組用基板10。
此外,金屬層13中,硬銲材箔25中含有之Si會擴散,藉此形成界面鄰近層13A。同樣地,電路層12中,硬銲材箔24中含有之Si會擴散,藉此形成界面鄰近層12A。
接下來,在該功率模組用基板10的金屬層13另一方之面形成Ni鍍覆膜後,利用Sn-5質量%Sb銲料材
將散熱板18銲接。如此一來,在金屬層13與散熱板18之間會形成銲料層17,製造出本實施形態之附散熱板功率模組用基板20。
接著,該附散熱座功率模組用基板20的散熱板18藉由固定螺絲45而與冷卻器40緊固。如此一來,便製造出本實施形態之附冷卻器功率模組用基板。
此外,在電路層12一方之面隔著晶片用銲料層2而搭載半導體晶片3。如此一來,便製造出本實施形態之功率模組1。
如以上般構成的本實施形態之附散熱座功率模組用基板20及功率模組1中,由於金屬層13是藉由將由Al含有量99.0質量%以上99.85質量%以下之2N鋁所構成之金屬板23與陶瓷基板11接合而形成,故冷熱循環負載後金屬層13不容易變形,能夠抑制銲料層17的裂痕發生。
此外,銲料層17是由固溶硬化型之銲料材所形成,其含有主成分之Sn、及在該Sn的母相中固溶之固溶元素,本實施形態中,是做成由含有2質量%以上10質量%以下範圍之Sb作為固溶元素之Sn-Sb系合金所構成之銲料材,具體而言,是藉由Sn-5質量%Sb銲料材來形成,故銲料層17的母相強度會變高,且即使在有冷熱循環負載的情形下,也會確保銲料層17的母相強度。故,即使於金屬層13的周緣部,在銲料層17發生裂痕的情形下,也能抑制該裂痕加劇至金屬層13的內側區域。
另,若Sb含有量未滿2質量%,那麼固溶硬化的效果可能會不足,而若Sb含有量超過10質量%,銲料層17可能會變得過硬。因此,含有Sb作為固溶元素的情形下,其含有量以2質量%以上10質量%以下的範圍為佳。
此外,散熱板18是由楊氏係數130MPa以下及抗拉強度250MPa以上的銅或銅合金所構成,故散熱板18容易彈性變形,且不易塑性變形。也就是說,散熱板18的彈性變形區域會變廣。故,藉由散熱板18的彈性變形,能夠減低在銲料層17產生之應變,能夠抑制在金屬層13的周緣部發生之裂痕加劇至金屬層13的內側區域。
此外,會抑制散熱板18以翹曲的方式塑性變形,故能使冷卻器40與散熱板18密合,能使半導體晶片3的熱朝向冷卻器40有效率地逸散。
以上已說明本發明之實施形態,但本發明並非限定於此,在不脫離其發明之技術思想範圍內可適當變更。
舉例來說,作為本發明之實施形態,係說明利用散熱板來作為散熱座,但亦可與圖1所示構成之冷卻器直接接合,或是亦可利用形成有鰭片之液冷、空冷散熱器、熱管等來作為散熱座。
此外,上述說明是利用硬銲材箔將作為電路層之金屬板及作為金屬層之金屬板與陶瓷基板接合,但並非限定於此,亦可藉由暫態液相擴散接合(Transient Liquid Phase Diffusion Bonding,TLPDB)來將作為電路
層之金屬板及作為金屬層之金屬板與陶瓷基板接合。
又,上述說明是以楊氏係數130MPa以下、且抗拉強度250MPa以上的銅或銅合金來構成散熱座,但並非限定於此,亦可為其他銅或銅合金所構成之散熱座。
此外,上述說明是藉由鋁來形成電路層,但並非限定於此,亦可以銅或銅合金來形成電路層。
接下來,說明為了確認本發明之功效而實施之確認實驗結果。
製造出表1所示之附散熱座功率模組用基板,評估其初始接合率、及冷熱循環後之接合率。
此處,電路層及金屬層的尺寸訂為37mm×37mm、陶瓷基板的尺寸訂為40mm×40mm。
利用散熱板作為散熱座,該散熱板的尺寸訂為70mm×70mm×3mm。此外,散熱板與金屬層之間的銲料層厚度訂為0.4mm。
金屬層與散熱板之間的接合率,係利用超音波探傷裝置,藉由以下式子求出接合率。此處,所謂初始接合面積,係指接合前的應接合面積,亦即金屬層面積。超音波探傷像中,剝離係以接合部內的白色部分表示,故將該白色部面積作為剝離面積。
(接合率)={(初始接合面積)-(剝離面積)}/(初始接合面積)
另,接合率是在冷熱循環負載前及負載後測定。
此外,冷熱循環,是使用espec公司製TSB-51冷熱衝撃試驗機,針對試驗片(附散熱座功率模組),在液相(FluorinertTM)下以-40℃下5分鐘及125℃下5分鐘反覆循環,實施2000次循環。
評估結果如表1所示。
使用固溶硬化型以外的銲料材之比較例1、2中,在冷熱循環負載後,可看出接合率降低。推測其原因為,在冷熱循環負載後,銲料層的母相強度降低,於金屬層的周緣部發生之裂痕加劇至金屬層的內側區域所致。
此外,藉由4N鋁形成金屬層之比較例3、4中,在冷熱循環負載後,同樣可看出接合率降低。推測其原因為在銲料層廣範圍地發生裂痕所致。
相較於此,本發明例1~7中,在冷熱循環負載後接合率也沒有降低。藉由Al含有量99.0質量%以上99.85質量%以下之鋁板來形成金屬層,而使用固溶硬化型之銲料材,藉此,可看出金屬層與散熱座之接合可靠性提升。
按照本發明,能夠提供一種針對介於由鋁所構成的金屬層與由銅所構成的散熱座之間的銲料層,能夠抑制其裂痕發生及加劇,且接合可靠性優良的附散熱座功率模組用基板、具備此附散熱座功率模組用基板之附冷卻器功率模組用基板及功率模組。
10‧‧‧功率模組用基板
11‧‧‧陶瓷基板
12‧‧‧電路層
12A、13A‧‧‧界面鄰近層
13‧‧‧金屬層
17‧‧‧銲料層
18‧‧‧散熱座(散熱板)
20‧‧‧附散熱座功率模組用基板
Claims (6)
- 一種附散熱座功率模組用基板,屬於具備:功率模組用基板,其具有陶瓷基板、和在前述陶瓷基板一方之面配設之電路層、和在前述陶瓷基板另一方之面配設之由鋁所構成之金屬層;及散熱座,由在該金屬層另一方之面側隔著銲料層而接合之銅或銅合金所構成;該附散熱座功率模組用基板,其特徵為:前述金屬層,係Al含有量為99.0質量%以上99.85質量%以下之鋁板與前述陶瓷基板接合而形成,前述銲料層,是由固溶硬化型之銲料材所形成,其含有主成分之Sn、及在該Sn的母相中固溶之固溶元素。
- 如申請專利範圍第1項之附散熱座功率模組用基板,其中,前述銲料層是藉由含有作為前述固溶元素之Sb之銲料材來形成。
- 如申請專利範圍第1項之附散熱座功率模組用基板,其中,前述散熱座,係以抗拉強度250MPa以上的銅或銅合金所構成。
- 如申請專利範圍第2項之附散熱座功率模組用基板,其中,前述散熱座,係以抗拉強度250MPa以上的銅或銅合金所構成。
- 一種附冷卻器功率模組用基板,其特徵為,具備:申請專利範圍第1項至第4項任一項之附散熱座功率模組用基板、及在前述散熱座另一方之面側層積配置之冷卻器。
- 一種功率模組,其特徵為,具備:申請專利範圍第1項至第4項任一項之附散熱座功率模組用基板、及在該附散熱座功率模組用基板上搭載之電子零件。
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