TW201241100A - Compound, coloring curable composition, color filter and method for manufacturing the same, liquid crystal display device and solid-state imaging element - Google Patents

Compound, coloring curable composition, color filter and method for manufacturing the same, liquid crystal display device and solid-state imaging element Download PDF

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Publication number
TW201241100A
TW201241100A TW101104247A TW101104247A TW201241100A TW 201241100 A TW201241100 A TW 201241100A TW 101104247 A TW101104247 A TW 101104247A TW 101104247 A TW101104247 A TW 101104247A TW 201241100 A TW201241100 A TW 201241100A
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TW
Taiwan
Prior art keywords
compound
group
color
pigment
acid
Prior art date
Application number
TW101104247A
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English (en)
Chinese (zh)
Inventor
Akinori Fujita
Daisuke Sasaki
Yuta Takasaki
Yutaro NORIZUKI
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of TW201241100A publication Critical patent/TW201241100A/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B47/00—Porphines; Azaporphines
    • C09B47/04—Phthalocyanines abbreviation: Pc
    • C09B47/08—Preparation from other phthalocyanine compounds, e.g. cobaltphthalocyanineamine complex
    • C09B47/18—Obtaining compounds having oxygen atoms directly bound to the phthalocyanine skeleton
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B47/00—Porphines; Azaporphines
    • C09B47/04—Phthalocyanines abbreviation: Pc
    • C09B47/06—Preparation from carboxylic acids or derivatives thereof, e.g. anhydrides, amides, mononitriles, phthalimide, o-cyanobenzamide
    • C09B47/067—Preparation from carboxylic acids or derivatives thereof, e.g. anhydrides, amides, mononitriles, phthalimide, o-cyanobenzamide from phthalodinitriles naphthalenedinitriles, aromatic dinitriles prepared in situ, hydrogenated phthalodinitrile
    • C09B47/0675—Preparation from carboxylic acids or derivatives thereof, e.g. anhydrides, amides, mononitriles, phthalimide, o-cyanobenzamide from phthalodinitriles naphthalenedinitriles, aromatic dinitriles prepared in situ, hydrogenated phthalodinitrile having oxygen or sulfur linked directly to the skeleton
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B47/00—Porphines; Azaporphines
    • C09B47/04—Phthalocyanines abbreviation: Pc
    • C09B47/08—Preparation from other phthalocyanine compounds, e.g. cobaltphthalocyanineamine complex
    • C09B47/20—Obtaining compounds having sulfur atoms directly bound to the phthalocyanine skeleton
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Materials For Photolithography (AREA)
  • Ceramic Engineering (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Solid State Image Pick-Up Elements (AREA)
TW101104247A 2011-02-10 2012-02-09 Compound, coloring curable composition, color filter and method for manufacturing the same, liquid crystal display device and solid-state imaging element TW201241100A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011027335 2011-02-10

Publications (1)

Publication Number Publication Date
TW201241100A true TW201241100A (en) 2012-10-16

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW101104247A TW201241100A (en) 2011-02-10 2012-02-09 Compound, coloring curable composition, color filter and method for manufacturing the same, liquid crystal display device and solid-state imaging element

Country Status (5)

Country Link
JP (1) JP5717664B2 (ja)
KR (1) KR101706695B1 (ja)
CN (1) CN103339566B (ja)
TW (1) TW201241100A (ja)
WO (1) WO2012108435A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI582175B (zh) * 2013-02-08 2017-05-11 富士軟片股份有限公司 著色硬化性組成物、硬化膜、彩色濾光片與其製造方法、液晶顯示裝置、有機電致發光元件以及固體攝影元件

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CN104144987B (zh) * 2012-03-02 2017-05-10 富士胶片株式会社 着色硬化性组成物、彩色滤光片及其制造方法、彩色滤光片的应用以及酞菁化合物
JP5914384B2 (ja) * 2012-03-02 2016-05-11 富士フイルム株式会社 着色硬化性組成物およびカラーフィルタ
JP5914052B2 (ja) * 2012-03-02 2016-05-11 富士フイルム株式会社 着色硬化性組成物およびカラーフィルタ
JP6205193B2 (ja) * 2012-07-30 2017-09-27 富士フイルム株式会社 着色硬化性組成物、これを用いたカラーフィルタ
JP2014080578A (ja) * 2012-09-28 2014-05-08 Fujifilm Corp 着色組成物、感光性着色組成物、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、及び画像表示装置
JP6147224B2 (ja) * 2013-07-01 2017-06-14 富士フイルム株式会社 着色硬化性組成物、これを用いた硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、液晶表示装置、および有機ｅｌ表示装置
JP6165578B2 (ja) * 2013-09-30 2017-07-19 富士フイルム株式会社 表示装置
WO2016158668A1 (ja) * 2015-03-27 2016-10-06 三菱化学株式会社 着色樹脂組成物、カラーフィルタ、及び画像表示装置
KR101881942B1 (ko) * 2015-04-30 2018-07-26 삼성에스디아이 주식회사 신규한 화합물, 이를 포함하는 감광성 수지 조성물 및 컬러필터
KR101837563B1 (ko) * 2015-06-23 2018-03-12 삼성에스디아이 주식회사 신규한 화합물, 이를 포함하는 감광성 수지 조성물, 및 컬러필터
KR101816232B1 (ko) * 2015-10-16 2018-01-08 삼성에스디아이 주식회사 신규한 화합물, 이를 포함하는 감광성 수지 조성물 및 컬러필터
CN107918226B (zh) * 2016-10-08 2020-11-06 瀚宇彩晶股份有限公司 有机荧光材料以及光源模组
CN111752091B (zh) * 2019-03-29 2022-09-06 常州正洁智造科技有限公司 Habi类混合光引发剂在uvled光固化中的应用
WO2024116819A1 (ja) * 2022-12-01 2024-06-06 株式会社Ｄｎｐファインケミカル カラーフィルタ、及び表示装置

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JP3476208B2 (ja) 1992-07-31 2003-12-10 住友化学工業株式会社 カラーフィルター用色素
JPH0675375A (ja) 1992-08-26 1994-03-18 Sony Corp カラーレジスト材料
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JP4393017B2 (ja) * 2001-06-22 2010-01-06 富士フイルム株式会社 フタロシアニン化合物、着色画像形成組成物、インク、インクジェット用インク、インクジェット記録方法及びオゾンガス褪色耐性の改良方法
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JP5085256B2 (ja) 2006-09-27 2012-11-28 富士フイルム株式会社 化合物及びその互変異性体、金属錯体化合物、感光性着色硬化性組成物、カラーフィルタ、及びその製造方法
JP5401026B2 (ja) * 2007-09-26 2014-01-29 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用樹脂印刷版原版、レリーフ印刷版およびレリーフ印刷版の製造方法
JP2009221376A (ja) * 2008-03-17 2009-10-01 Fujifilm Corp 加工顔料、顔料分散組成物、感光性組成物、カラーフィルタおよびその製造方法
KR101384363B1 (ko) * 2009-06-25 2014-04-14 토요잉크Sc홀딩스주식회사 컬러 필터용 착색 조성물, 이것을 사용한 컬러 필터, 및 액정 표시 장치
JP5449883B2 (ja) * 2009-06-25 2014-03-19 凸版印刷株式会社 カラーフィルタ用着色組成物、これを用いたカラーフィルタ、及び液晶表示装置
JP2010271729A (ja) * 2010-07-05 2010-12-02 Toyo Ink Mfg Co Ltd 光硬化性着色組成物およびそれを用いて形成されるカラーフィルタ

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI582175B (zh) * 2013-02-08 2017-05-11 富士軟片股份有限公司 著色硬化性組成物、硬化膜、彩色濾光片與其製造方法、液晶顯示裝置、有機電致發光元件以及固體攝影元件

Also Published As

Publication number Publication date
KR101706695B1 (ko) 2017-02-14
KR20140006871A (ko) 2014-01-16
CN103339566B (zh) 2016-04-13
JP2012181512A (ja) 2012-09-20
CN103339566A (zh) 2013-10-02
WO2012108435A1 (ja) 2012-08-16
JP5717664B2 (ja) 2015-05-13

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