KR101706695B1 - 착색 경화성 조성물 및 컬러 필터 - Google Patents

착색 경화성 조성물 및 컬러 필터 Download PDF

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Publication number
KR101706695B1
KR101706695B1 KR1020137021241A KR20137021241A KR101706695B1 KR 101706695 B1 KR101706695 B1 KR 101706695B1 KR 1020137021241 A KR1020137021241 A KR 1020137021241A KR 20137021241 A KR20137021241 A KR 20137021241A KR 101706695 B1 KR101706695 B1 KR 101706695B1
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KR
South Korea
Prior art keywords
group
general formula
compound
color filter
curable composition
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KR1020137021241A
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English (en)
Korean (ko)
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KR20140006871A (ko
Inventor
아키노리 후지타
다이스케 사사키
유타 타카사키
유타로 노리즈키
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후지필름 가부시키가이샤
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Publication of KR20140006871A publication Critical patent/KR20140006871A/ko
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Publication of KR101706695B1 publication Critical patent/KR101706695B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B47/00—Porphines; Azaporphines
    • C09B47/04—Phthalocyanines abbreviation: Pc
    • C09B47/08—Preparation from other phthalocyanine compounds, e.g. cobaltphthalocyanineamine complex
    • C09B47/18—Obtaining compounds having oxygen atoms directly bound to the phthalocyanine skeleton
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B47/00—Porphines; Azaporphines
    • C09B47/04—Phthalocyanines abbreviation: Pc
    • C09B47/06—Preparation from carboxylic acids or derivatives thereof, e.g. anhydrides, amides, mononitriles, phthalimide, o-cyanobenzamide
    • C09B47/067—Preparation from carboxylic acids or derivatives thereof, e.g. anhydrides, amides, mononitriles, phthalimide, o-cyanobenzamide from phthalodinitriles naphthalenedinitriles, aromatic dinitriles prepared in situ, hydrogenated phthalodinitrile
    • C09B47/0675—Preparation from carboxylic acids or derivatives thereof, e.g. anhydrides, amides, mononitriles, phthalimide, o-cyanobenzamide from phthalodinitriles naphthalenedinitriles, aromatic dinitriles prepared in situ, hydrogenated phthalodinitrile having oxygen or sulfur linked directly to the skeleton
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B47/00—Porphines; Azaporphines
    • C09B47/04—Phthalocyanines abbreviation: Pc
    • C09B47/08—Preparation from other phthalocyanine compounds, e.g. cobaltphthalocyanineamine complex
    • C09B47/20—Obtaining compounds having sulfur atoms directly bound to the phthalocyanine skeleton
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Materials For Photolithography (AREA)
  • Ceramic Engineering (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Solid State Image Pick-Up Elements (AREA)
KR1020137021241A 2011-02-10 2012-02-07 착색 경화성 조성물 및 컬러 필터 KR101706695B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011027335 2011-02-10
JPJP-P-2011-027335 2011-02-10
PCT/JP2012/052760 WO2012108435A1 (ja) 2011-02-10 2012-02-07 着色硬化性組成物およびカラーフィルタ

Publications (2)

Publication Number Publication Date
KR20140006871A KR20140006871A (ko) 2014-01-16
KR101706695B1 true KR101706695B1 (ko) 2017-02-14

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020137021241A KR101706695B1 (ko) 2011-02-10 2012-02-07 착색 경화성 조성물 및 컬러 필터

Country Status (5)

Country Link
JP (1) JP5717664B2 (ja)
KR (1) KR101706695B1 (ja)
CN (1) CN103339566B (ja)
TW (1) TW201241100A (ja)
WO (1) WO2012108435A1 (ja)

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CN104144987B (zh) * 2012-03-02 2017-05-10 富士胶片株式会社 着色硬化性组成物、彩色滤光片及其制造方法、彩色滤光片的应用以及酞菁化合物
JP5914384B2 (ja) * 2012-03-02 2016-05-11 富士フイルム株式会社 着色硬化性組成物およびカラーフィルタ
JP5914052B2 (ja) * 2012-03-02 2016-05-11 富士フイルム株式会社 着色硬化性組成物およびカラーフィルタ
JP6205193B2 (ja) * 2012-07-30 2017-09-27 富士フイルム株式会社 着色硬化性組成物、これを用いたカラーフィルタ
JP2014080578A (ja) * 2012-09-28 2014-05-08 Fujifilm Corp 着色組成物、感光性着色組成物、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、及び画像表示装置
JP6043645B2 (ja) * 2013-02-08 2016-12-14 富士フイルム株式会社 硬化性組成物およびカラーフィルタ
JP6147224B2 (ja) * 2013-07-01 2017-06-14 富士フイルム株式会社 着色硬化性組成物、これを用いた硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子、液晶表示装置、および有機ｅｌ表示装置
JP6165578B2 (ja) * 2013-09-30 2017-07-19 富士フイルム株式会社 表示装置
WO2016158668A1 (ja) * 2015-03-27 2016-10-06 三菱化学株式会社 着色樹脂組成物、カラーフィルタ、及び画像表示装置
KR101881942B1 (ko) * 2015-04-30 2018-07-26 삼성에스디아이 주식회사 신규한 화합물, 이를 포함하는 감광성 수지 조성물 및 컬러필터
KR101837563B1 (ko) * 2015-06-23 2018-03-12 삼성에스디아이 주식회사 신규한 화합물, 이를 포함하는 감광성 수지 조성물, 및 컬러필터
KR101816232B1 (ko) * 2015-10-16 2018-01-08 삼성에스디아이 주식회사 신규한 화합물, 이를 포함하는 감광성 수지 조성물 및 컬러필터
CN107918226B (zh) * 2016-10-08 2020-11-06 瀚宇彩晶股份有限公司 有机荧光材料以及光源模组
CN111752091B (zh) * 2019-03-29 2022-09-06 常州正洁智造科技有限公司 Habi类混合光引发剂在uvled光固化中的应用
WO2024116819A1 (ja) * 2022-12-01 2024-06-06 株式会社Ｄｎｐファインケミカル カラーフィルタ、及び表示装置

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JPH0675375A (ja) 1992-08-26 1994-03-18 Sony Corp カラーレジスト材料
JP3888712B2 (ja) 1995-10-02 2007-03-07 三井化学株式会社 高耐久性近赤外線吸収化合物及びその用途
JP4132176B2 (ja) 1997-09-18 2008-08-13 三井化学株式会社 ナフタロシアニン化合物及びその用途
JP4393017B2 (ja) * 2001-06-22 2010-01-06 富士フイルム株式会社 フタロシアニン化合物、着色画像形成組成物、インク、インクジェット用インク、インクジェット記録方法及びオゾンガス褪色耐性の改良方法
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JP5085256B2 (ja) 2006-09-27 2012-11-28 富士フイルム株式会社 化合物及びその互変異性体、金属錯体化合物、感光性着色硬化性組成物、カラーフィルタ、及びその製造方法
JP5401026B2 (ja) * 2007-09-26 2014-01-29 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用樹脂印刷版原版、レリーフ印刷版およびレリーフ印刷版の製造方法
JP2009221376A (ja) * 2008-03-17 2009-10-01 Fujifilm Corp 加工顔料、顔料分散組成物、感光性組成物、カラーフィルタおよびその製造方法
KR101384363B1 (ko) * 2009-06-25 2014-04-14 토요잉크Sc홀딩스주식회사 컬러 필터용 착색 조성물, 이것을 사용한 컬러 필터, 및 액정 표시 장치
JP5449883B2 (ja) * 2009-06-25 2014-03-19 凸版印刷株式会社 カラーフィルタ用着色組成物、これを用いたカラーフィルタ、及び液晶表示装置
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Also Published As

Publication number Publication date
KR20140006871A (ko) 2014-01-16
TW201241100A (en) 2012-10-16
CN103339566B (zh) 2016-04-13
JP2012181512A (ja) 2012-09-20
CN103339566A (zh) 2013-10-02
WO2012108435A1 (ja) 2012-08-16
JP5717664B2 (ja) 2015-05-13

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