TW201214052A - Light irradiation device for exposure devices, method for controlling turn-on of same, exposure device, exposure method, and substrate - Google Patents

Light irradiation device for exposure devices, method for controlling turn-on of same, exposure device, exposure method, and substrate Download PDF

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Publication number
TW201214052A
TW201214052A TW100104014A TW100104014A TW201214052A TW 201214052 A TW201214052 A TW 201214052A TW 100104014 A TW100104014 A TW 100104014A TW 100104014 A TW100104014 A TW 100104014A TW 201214052 A TW201214052 A TW 201214052A
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Taiwan
Prior art keywords
light
light source
exposure
specific number
exposure apparatus
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TW100104014A
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Chinese (zh)
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TWI435186B (en
Inventor
Hironori Kawashima
Shusaku Karuishi
Shinichiro Nagai
Tomonori Harada
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Nsk Ltd
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Publication of TWI435186B publication Critical patent/TWI435186B/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7035—Proximity or contact printers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

Disclosed are a light irradiation device for exposure devices, a method for controlling turn-on of the same, an exposure device, an exposure method, and a substrate all enabling reduction of the replacement times of the light source units and the downtime of the device. The light irradiation device (80) is provided with a plurality of light source units (73) each including a lamp (71) and a reflecting mirror (72) for giving directivity to the light emitted from the lamp (71) and outputting the light, a plurality of cassettes (81) to which a prescribed number of light source units (73) can be attached, and a supporter (82) to which the cassettes (81) can be attached.

Description

201214052 六、發明說明： 【發明所屬之技術領域】 本發明係有關於一種曝光裝置用光照射裝置及其點* _ 制方法、以及曝光裝置、曝光方法及基板，更詳細而:工 係有關於一種可應用於能夠在液晶顯示器或電聚顯示器等 大型平板顯示器之基板上曝光轉印光罩之光罩圖案之曝“ 裝置的曝光裝置用光照射裝置及其點亮控制方法、以I曝 光裝置、曝光方法及基板。 【先前技術】 先前，作為製造平板顯示器裝置之彩色濾光片等之面板 之裝置，發明了近接曝光裝置、掃描曝光裝置、投影曝光 裝置、鏡面投影、密接式曝光裝置等各種曝光裝置。例 如，連續分階近接曝光裝置，係利用光罩載物台保持小於 基板之光罩，並且利用工件載物台保持基板，使兩者近接 對向配置之後，使工件載物台相對光罩步進移動，且每次 步進中自光罩側對基板照射圖案曝光用之光，藉此，於基 板上曝光轉印光罩上所描繪之複數個圖案，從而於一片基 板上製作複數個面板。又，掃描曝光裝置，係介隔光罩對 以恆定速度搬送之基板照射曝光用之光，從而於基板上曝 光轉印光罩之圖案。 l年來’顯示器裝置逐步大型化，例如，於連續分階曝 光中’以4次曝光照射製造第8代（2200 mmx25〇〇 mm)面板 之情形時’一次曝光區域為1300 mmx 1120 mm，以6次曝 “…、射進行製造時，一次爆光區域則為mmx750 153878.doc 201214052 mm。因此，即便曝光裝置亦 f水曝先區域擴大，故必需 亦將所用之光源之輸出提高。因 u此，作為照明光學系統， 眾所周知有使用複數個光源，揾古 杈问先源整體之輸出者（例 如，參照專利文獻1〜4)。例如，皇制七办。 ) 專利文獻2記载之光照射 裝置，係於使複數個燈之—部分 |刀點冗過耘中，對由照度計 測定之實測照度與預設之合理昭度雄 ，，，、度進仃比較，並根據實測 照度之過剩與不A，使燈斷t，或者使備用之燈通電。專 利文獻3記載之光照射裝置，係於燈之點亮過程中，自背 側拆除光源單元，並安裝新的光源單元， 線停止便可更換燈，又，記載有如下情形：於將 安裝於支持體時，將光源單元之定位部抵住支持體之定位 角部，進行光軸方向之定位。 又，專利文獻4記載之曝光用照明裝置係記載如下，其 包括分別具有内壓不同之燈之至少2種以上之燈單元、及 保持燈單元之燈座，且令最適於使曝光對象物曝光之燈單 元選擇性發光。 先前技術文獻 專利文獻 專利文獻1:曰本專利第4391136號公報 專利文獻2 :曰本專利特開2008-241877號公報 專利文獻3:日本專利特開2006-278907號公報 專利文獻4:日本專利特開2008-191252號公報 【發明内容】 發明所欲解決之問題 153878.doc 201214052 然而’曝光裝置’可藉由改變光照射裝置之照度，而應 對各種光阻劑之感光度特性。由於曝光量可藉由照度與時 間之積而算出，因此，可藉由改變照度或時間，而獲得合 理之曝光量，但因被曝光物不同而必需以低照度進行曝光 故無法自如改變照度之超高壓大型水銀燈光源，為改變照 度獲得合理之曝光量，先前使用減光（ND，Neutral Density) 濾光片等，實現低照度。於該情形時，導致產生多餘之耗 電又，舄要ND;慮光片專光學零件。專利文獻2中，揭示 有使燈之一部分點亮進行曝光之情形，但其目的在於實現 額定照度運行，而並非意圖抑制耗電，又，並未揭示如何 使複數個燈點亮/熄滅。 又專利文獻1及2，係於更換燈時，必需一個一個地更 換燈，故更換燈需要花費時間，導致使裝置停機之時間201214052 VI. Description of the Invention: [Technical Field] The present invention relates to a light irradiation device for an exposure device, a method thereof, an exposure device, an exposure method, and a substrate, and more in detail: An exposure device capable of exposing a mask pattern of a transfer mask to a substrate of a large flat panel display such as a liquid crystal display or a polycondensation display, and a lighting control method thereof, and an I exposure device [Experimental Technology] Previously, as a device for manufacturing a panel such as a color filter of a flat panel display device, a proximity exposure device, a scanning exposure device, a projection exposure device, a mirror projection, a close exposure device, and the like were invented. Various exposure devices. For example, a continuous stepped proximity exposure device uses a reticle stage to hold a reticle smaller than the substrate, and the substrate is held by the workpiece stage so that the two are aligned adjacently, and the workpiece stage is placed. Stepping movement relative to the mask, and illuminating the substrate with the pattern exposure light from the mask side in each step Thereby, a plurality of patterns drawn on the transfer mask are exposed on the substrate to form a plurality of panels on one substrate. Further, the scanning exposure device is configured to expose the substrate conveyed at a constant speed through the mask. Light, thereby exposing the pattern of the transfer mask on the substrate. In the past few years, the display device has been gradually enlarged, for example, in the continuous stepwise exposure to manufacture the 8th generation (2200 mmx25〇〇mm) panel with 4 exposures. In the case of 'one exposure area is 1300 mm x 1120 mm, when it is manufactured with 6 exposures..., the exposure area is mmx750 153878.doc 201214052 mm. Therefore, even if the exposure device is enlarged, the output of the light source used must be increased. Therefore, as the illumination optical system, it is known that a plurality of light sources are used, and the output of the entire source is known (for example, refer to Patent Documents 1 to 4). For example, the Emperor system is seven. The light-irradiating device described in Patent Document 2 is used to make the illuminance measured by the illuminometer and the preset reasonable illuminance of the plurality of lamps. Compare, and according to the excess of the measured illuminance and not A, the lamp is turned off t, or the standby lamp is energized. In the light irradiation device described in Patent Document 3, the light source unit is removed from the back side during the lighting of the lamp, and a new light source unit is mounted, and the lamp can be replaced when the wire is stopped. Further, the following description is made: When the body is supported, the positioning portion of the light source unit is placed against the positioning corner of the support body to perform positioning in the optical axis direction. Further, the illumination device for exposure described in Patent Document 4 is characterized in that it includes at least two or more types of lamps each having a lamp having a different internal pressure, and a lamp holder for holding the lamp unit, and is preferably adapted to expose the exposure object. The lamp unit selectively emits light. CITATION LIST Patent Literature Patent Literature 1: Patent Publication No. 4,391,136, Patent Document 2: Japanese Patent Laid-Open Publication No. 2008-241877 JP-A-2008-191252 SUMMARY OF THE INVENTION PROBLEMS TO BE SOLVED BY THE INVENTION 153878.doc 201214052 However, the 'exposure device' can cope with the sensitivity characteristics of various photoresists by changing the illuminance of the light irradiation device. Since the amount of exposure can be calculated by the product of illuminance and time, a reasonable amount of exposure can be obtained by changing the illuminance or time. However, since the exposure is different, it is necessary to perform exposure with low illuminance, so that the illuminance cannot be changed arbitrarily. Ultra-high pressure large-scale mercury light source, in order to change the illumination to obtain a reasonable exposure, previously using a dimming (ND, Neutral Density) filter, etc., to achieve low illumination. In this case, it leads to excessive power consumption, and ND; Patent Document 2 discloses a case where a part of a lamp is turned on for exposure, but the purpose is to achieve a rated illuminance operation, and it is not intended to suppress power consumption, and it is not disclosed how to turn on/off a plurality of lamps. Further, in Patent Documents 1 and 2, when the lamp is replaced, it is necessary to replace the lamps one by one, so it takes time to replace the lamp, resulting in a downtime of the device.

Ut機時間）變長。作為以避免出現停機時間為目的之技 術，公開有如專利文獻3所示可於曝光運行中更換燈之構 成，但作業者之更換時間自身因單獨進行更換，故時間較 長之情形並無改變。 又，專利文獻1及3中，支持燈之支持體之光出射側之面 係沿著球面形成，因此，當燈之數量增加時，存在該球面 之表面積增大，導致難以進行精度良好之曲面加工之問 題。 又，由水銀燈照射之紫外線，因穿過照明光學系統而變 成具有準直角之平行光，但會因由鏡面反射，或者穿過透 鏡，而使透射及吸收因波長不同而不同，因此，紫外線之 I53878.doc 201214052 分光特性出現變化。 作為被曝光材料之光阻劑係於波長436 nm之g線以下具 有曝光感光度，尤其用於液晶彩色濾光片之負型光阻劑， 近來其中心曝光感光度大多為i線（365 nm)以下之波長。 大型超高壓水銀燈，因玻璃之面積增加，而使由放電產 生之紫外線於穿過玻璃時，短波長側被玻璃吸收，從而產 生曝光所需之波長成分變少之現象。又，曝光光線之分光 特性係依存於所用之燈之分光比率，故無法自由地變更每 一波長之強度比。因此’必需根據光阻劑之曝光感光度更 換燈。 另一方面，當如專利文獻4所示使用小型燈之情形時， 因玻璃之面積較小，故短波長侧之吸收較小，又，藉由選 擇性地使具備内壓不同之燈之2種以上燈單元以目標數量 進行發光，而以最佳之曝光條件使之曝光。然而，於專利 文獻4中，對於以何種方式選擇燈以達到最佳之曝光條 件，並未具體記載。 本發明係鑒於上述課題研製而成者，其第1目的在於提 供一種可縮短光源部之更換時間及裝置之停機時間之曝光 裝置用光照射裝置及其點亮控制方法、以及曝光裝置、黎 光方法及基板。又，第2目的在於提供一種能夠根據所需 之照度抑制耗電，並且可易於控制光源部之曝光裝置用光 照射裝置及其點壳控制方法、以及曝光裝置、曝光方法及 基板。進而，第3自的在於提供一種無需更換光源部便能 自如地設定每一波長之強度之曝光裝置用光照射裝置及其 153878.doc -6- 201214052 點亮控制方法、以及曝光裝置、曝光方法及基板。 解決問題之技術手段 本發明之上述目的係藉由下述構成而達成。 ()、種曝光裝置用光照射1置，其特徵在於包含： 複數個光源部，其等分別包括發光部、及使由該發光部 產生之光以指向性射出之反射光學系統； 1數個卡g ’其等可分別安裝特定數之上述光源部；以及 支持體’其可安裝該複數個卡匣/ (2) 如（1)5己載之曝光裝置用光照射襄置，其中 述卡II係包括支持上述特定數之光源部之光源支持 部，且 上述光源支持部’係形成為自上述特定數之光源部之光 所:射之各照射面起至上述特定數之光源部之光所入射之 光器透鏡之入射面為止之纟光軸之距離達到大致值定。 (3) 如（2)s己载之曝光裝置用光照射裝置，其中 上述支持體，係包含分別安裝有上述複數個卡E之複數 個卡匣安裝部，且 、上述複數個卡匿安裝部，係形成為自上述所有光源部之 缺照射之各照射面起至上述所有光源部之光所入射之積 光器透鏡之人射面為止之各絲之距離達到大致怪定。 (4) 如（3) s己載之曝光裝置用光照射裝置，其中 上述複數個卡E安裝部，係分別包含上述卡£之光源支 持口P所對向之開口部、及與形成於該光源支持部之周圍之 平面部抵接之平面，且 153878.doc 201214052 沿著特定之方向排列之上述複數個卡£安裝部之各平 面，係以特定之角度交又。 (5)如（4)記載之曝光裝置用光照射裝置，其中 上述支持體之卡E安裝部’係形成於將上述平面作為底 面之凹部，且 上述卡匣，係嵌合於上述卡匣安裝部之凹部。 ⑹如⑴至（5)中任一項記载之曝光裝置用光照射襄置，其中 上述卡ϋ，係包括支持上述特定數之光源部之光源支持 部，且 以四條邊連結由上述光源支持部支持且位於最外周之上 述光源部之中心之線呈長方形形狀。 (7) 如（6)記載之曝光裝置用光照射裝置，其中 上述支持體，係包含分別安裝有上述複數個卡匣之複數 個卡Ε安裝部，且 上述複數個卡Ε安裝部，係使沿相互正交之方向配置之 上述卡匣之各個數保持一致而形成為長方形形狀。 (8) 如（2)至（7)中任一項記載之曝光裝置用光照射裝置，其中 上述卡®，係包括於包圍由上述光源支持部支持之上述 特定數之光源部之狀態下安裝於上述光源支持部之遮罩構 件，且 於上述光源支持部與上述遮罩構件之間之收納空間内， 鄰接之上述光源部之反射光學系統之背面直接對向。 (9) 如（8)記載之曝光裝置用光照射裝置，其中 於上述遮罩構件，形成有至少一個將上述收納空間與該 153878.doc -8 · 201214052 遮罩構件以卜料通之連通孔與連通槽。 (ίο)如⑴至（9)中任_項記載之曝光裝置用光照射裂置， 其中 ;上述支持體，設置有供冷卻水循環之冷卻用配管以 冷卻上述各光源部β (11) 如⑴至（1G)中任—項記載之曝光裝置用光照射裝置， 其中 包含自後方及側方之至少一方’對上述各光源部之光所 照射之各照射面，強制排出上述支持體内之空氣之強制排 氣機構。 (12) 如（1)至⑴）中任―項記載之曝光裝置用光照射裝置， 其中 更包含控制上述複數個光源部之點亮或熄滅之控制部，且 上述控制部，係以上述各卡£内之上述特定數之光源部 近似旋轉對稱地點亮之方式進行控制。 (13) 如(1)至(η)中任一項記载之曝光裝置用光照射裝置， 其中 更包含㈣上述複數個光源部之點亮或熄滅之控制部，且 上述控制部，係以交替地使上述各卡匿内之上述特定數 之光源部中成為近似旋轉對稱之位置之上述光源部點亮之 方式進行控制。 (14) 如（1)至（13)中任一項記載之曝光裝置用光照射裝置， 其中 上述特定數之光源部，係包含分光特性不同之複數種光 153878.doc -9- 201214052 (15)—種曝光裝置用光照射裝置，其特徵在於：包含 複數個光源部，其等分別包括發光部、及使自該發光部 中產生之光以指向性射出之反射光學系統； 複數個卡匣’其等可分別安裝特定數之上述光源部； 支持體，其可安裝該複數個卡匣；以及 控制部，其控制上述複數個光源部之點亮或熄滅； 且，上述控制部係以上述各卡匣内之上述特定數之光源 部近似旋轉對稱地點亮之方式進行控制。 (16) 如（15)記載之曝光裝置用光照射裝置，其中 上述控制部，係藉由以上述複數個卡£之上述特定數之 光源部以相同之點亮圖案近似旋轉對稱地同時點亮之方式 進行控制，而使上述所有光源部近似旋轉對稱地點亮。 (17) 如（15)或者（16)記載之曝光裝置用光照射裝置其中 上述控制部’包含上述卡匣内之特定數之光源部中點亮 之上，光源部之數量不同之複數個點亮圖案組，並且，該 ” 0案、且刀別具有上述光源部近似旋轉對稱地點亮 之複數個點亮圖案。 (18) 如（17) s己载之曝光裝置用光照射裝置，其中 更包含對上述各光源部之點亮時間進行計時之 上述控制部，俜栌插 ' 且 圖案組之任一個，*。从 致個點冗Ut machine time) becomes longer. As a technique for avoiding the occurrence of downtime, a configuration in which the lamp can be replaced during the exposure operation as disclosed in Patent Document 3 is disclosed, but the replacement time of the operator itself is changed by itself, so that the time is long. Further, in Patent Documents 1 and 3, since the surface on the light exit side of the support for the lamp is formed along the spherical surface, when the number of lamps increases, the surface area of the spherical surface increases, which makes it difficult to perform a curved surface with high precision. Processing problems. Moreover, the ultraviolet light irradiated by the mercury lamp becomes parallel light having a collimating angle by passing through the illumination optical system, but the transmission and absorption differ depending on the wavelength due to specular reflection or passing through the lens. Therefore, the ultraviolet light I53878 .doc 201214052 The spectral characteristics have changed. The photoresist as the exposed material has exposure sensitivity below the g line of 436 nm, especially for the negative photoresist of liquid crystal color filter. Recently, the central exposure sensitivity is mostly i line (365 nm). ) The following wavelengths. In the large ultra-high pressure mercury lamp, the area of the glass is increased, and when the ultraviolet ray generated by the discharge passes through the glass, the short-wavelength side is absorbed by the glass, and the wavelength component required for exposure is reduced. Further, since the spectral characteristics of the exposure light depend on the spectral ratio of the lamp used, the intensity ratio of each wavelength cannot be freely changed. Therefore, it is necessary to replace the lamp according to the exposure sensitivity of the photoresist. On the other hand, when a small lamp is used as shown in Patent Document 4, since the area of the glass is small, the absorption on the short-wavelength side is small, and by selectively making the lamp having the internal pressure different The above lamp units are illuminated with a target number and exposed to the optimum exposure conditions. However, in Patent Document 4, there is no specific description as to the manner in which the lamps are selected to achieve optimum exposure conditions. The present invention has been made in view of the above problems, and a first object thereof is to provide a light irradiation device for an exposure device and a lighting control method thereof, and an exposure device, and a light-receiving device, which can shorten the replacement time of the light source portion and the down time of the device Method and substrate. Further, a second object of the invention is to provide a light irradiation device for an exposure device and a method for controlling the same, and an exposure device, an exposure method, and a substrate, which are capable of suppressing power consumption according to a desired illuminance and which can easily control a light source unit. Further, the third aspect is to provide a light-emitting device for an exposure device that can freely set the intensity of each wavelength without replacing the light source portion, and a lighting control method thereof, an exposure device, and an exposure method. And the substrate. Means for Solving the Problems The above object of the present invention is achieved by the following constitution. (1) The exposure apparatus is characterized in that: the plurality of light source units each include a light-emitting portion and a reflection optical system that emits light generated by the light-emitting portion in a directivity; a card g' can be separately mounted with a specific number of the above-mentioned light source portions; and a support body 'which can mount the plurality of cassettes/(2) as in (1) 5 the exposure device is irradiated with light, wherein the card is The second aspect includes a light source supporting portion that supports the light source portion of the specific number, and the light source supporting portion ′ is formed by light from the light source portion of the specific number: light emitted from each of the irradiation surfaces to the light source portion of the specific number The distance from the pupil axis of the incident surface of the incident lens is approximately constant. (3) The light irradiation device for an exposure apparatus according to (2) s, wherein the support includes a plurality of cassette mounting portions to which the plurality of cards E are respectively mounted, and the plurality of card mounting portions The distance between each of the filaments from the respective illumination surfaces of the light source portions of the light source portions to the human radiation surface of the light source lens into which all of the light source portions are incident is substantially ambiguous. (4) The light irradiation device for an exposure device according to (3) s, wherein the plurality of card E mounting portions respectively include an opening portion of the light source support port P opposite to the card, and are formed in the The flat surface around which the light source support portion abuts, and 153878.doc 201214052 The planes of the plurality of card mounting portions arranged in a specific direction are intersected at a specific angle. (5) The light irradiation device for an exposure apparatus according to (4), wherein the card E mounting portion of the support is formed in a concave portion having the flat surface as a bottom surface, and the cassette is fitted to the cassette mounting The recess of the department. (6) The light irradiation device for an exposure apparatus according to any one of (1) to (5) wherein the cartridge includes a light source support portion that supports the specific number of light source units, and is supported by the light source by four sides. The line supported by the portion and located at the center of the light source portion at the outermost periphery has a rectangular shape. (7) The light-emitting device for an exposure apparatus according to (6), wherein the support body includes a plurality of cassette mounting portions to which the plurality of cassettes are attached, and the plurality of cassette mounting portions are configured to The respective numbers of the above-described cassettes arranged in mutually orthogonal directions are formed to have a rectangular shape. (8) The light-emitting device for an exposure apparatus according to any one of the preceding claims, wherein the card® is installed in a state of surrounding the light source unit of the specific number supported by the light source supporting unit. The mask member of the light source supporting portion directly faces the back surface of the reflection optical system of the light source unit in a housing space between the light source supporting portion and the mask member. (9) The light-emitting device for an exposure apparatus according to (8), wherein the mask member is formed with at least one communication hole that connects the storage space and the 153878.doc -8 · 201214052 mask member Connected to the slot. The exposure apparatus according to any one of the above-mentioned items, wherein the support body is provided with a cooling pipe for circulating cooling water to cool the respective light source sections β (11) as (1) The light-emitting device for an exposure apparatus according to any one of the preceding claims, wherein at least one of the rear surface and the side side is provided for each of the irradiation surfaces irradiated with the light of each of the light source units, and the air in the support body is forcibly discharged. Forced exhaust mechanism. (12) The light irradiation device for an exposure apparatus according to any one of the preceding claims, further comprising: a control unit that controls lighting or extinguishing of the plurality of light source units, wherein the control unit is each The light source portion of the specific number in the card is controlled to be approximately rotationally symmetrically lit. (13) The light irradiation device for an exposure apparatus according to any one of (1) to (n), further comprising: (4) a control unit for turning on or off the plurality of light source units, wherein the control unit is The light source unit having the position of approximately rotational symmetry among the light source units of the specific number in the respective locks is alternately controlled to be lit. (14) The light-emitting device for an exposure apparatus according to any one of (1) to (13) wherein the light source unit of the specific number includes a plurality of types of light having different spectral characteristics 153878.doc -9-201214052 (15) A light-emitting device for an exposure apparatus, comprising: a plurality of light source sections each including a light-emitting section and a reflection optical system that emits light generated from the light-emitting section in a directivity; a plurality of cassettes 'These light source parts may be respectively mounted with a specific number; the support body may be mounted with the plurality of cassettes; and the control unit may control the lighting or extinguishing of the plurality of light source parts; and the control part is The light source portion of the specific number in each cassette is controlled to be approximately rotationally symmetrically lit. (16) The light-emitting device for an exposure apparatus according to the above aspect, wherein the control unit is configured to simultaneously illuminate the light source unit having the specific number of the plurality of clicks in the same lighting pattern. The control is performed in such a manner that all of the light source sections are illuminated in approximately rotational symmetry. (17) The light-emitting device for an exposure apparatus according to (15) or (16), wherein the control unit includes a plurality of points in which the number of the light source units is different in a light source unit including a specific number in the cassette a bright pattern group, and the knives and the knives have a plurality of lighting patterns that are lightly symmetrically illuminated by the light source unit. (18) (17) s a light irradiation device for an exposure device, wherein The control unit that counts the lighting time of each of the light source units described above, and inserts any one of the pattern groups, *.

並且於該選擇之點亮圖案組中，A 述光源部之點亮時間，選擇上述點亮圖案。巾基於上 (9)如（17)5己载之曝光裝置用光照射裝置，其中 153878.doc 201214052 ==述=源部之點亮時間進行計時之計時器，且 亮時所供給^電點亮8^1、以及點 餘壽命， s力’计异上述複數個光源部之剩 上述控制部’係根據所需之昭产，撰握卜卞A4 圖案組之杯" 擇述複數個點亮 八 個，亚且於該選擇之點亮圖案組中，基於上 述光源部之剩餘壽命，選擇上述點亮圖案。基於上 (20)如（18)或者（19)記載之曝光裝置用光照射裝置，其中 得所需之照度，與藉由上述複數個點亮圖案組所獲 、又不同時’選擇獲得與上述所需之照度接近之昭产 ::亮圖案組，並且調整對上述點亮之光源部電： 或者電力》 ⑼-種曝光裝置用光照射裝置，其特徵在於：包含 複數個光源部’其等分別包括發光部、及使由該發光部 生之光以指向性射出之反射光學系統； 複數個卡IE，其等可分別安裝特定數之上述光源部； 支持體’其可安裝該複數個卡匿；以及 控制部’其控制上述複數個光源部之點亮或媳滅； —且’上述控制部’係以交替地使上述各卡匿内之上述特 數之光源中成為近似旋轉對稱之位置之上述光源部點 7C之方式進行控制。 (22)如（21)記載之曝光裝置用光照射裝置，其中 “述控制。卩，係藉由以上述複數個卡匣之上述特定數之 “、相同之點冗圖案同時點亮之方式進行控制，而使Further, in the selected lighting pattern group, A indicates the lighting time of the light source unit, and the lighting pattern is selected. The towel is based on the light irradiation device of the exposure device of (9) as shown in (17) 5, wherein 153878.doc 201214052 == the timer for the lighting time of the source portion is counted, and the power point is supplied when the light is on. Bright 8^1, and the remaining life of the point, s force' counts the above-mentioned plurality of light source parts, the above-mentioned control part' is based on the required production, and composes the cup of the A4 pattern group " The light is eight, and in the selected lighting pattern group, the lighting pattern is selected based on the remaining life of the light source unit. The light illuminating device for an exposure apparatus according to (20) or (19), wherein the desired illuminance is obtained by selecting and obtaining the illuminance obtained by the plurality of lighting pattern groups The required illuminance is close to the production: the bright pattern group, and the light source unit for the lighting is adjusted: or electric power. (9) The light irradiation device for the exposure device is characterized in that it includes a plurality of light source units. Each includes a light-emitting portion and a reflective optical system that emits light generated by the light-emitting portion in a directivity; a plurality of cards IE, which can respectively mount a specific number of the light source portions; and a support body that can mount the plurality of cards And a control unit that controls lighting or annihilation of the plurality of light source units; and the 'control unit' alternately positions the light source of the specific number in the respective locks to be approximately rotationally symmetric The light source unit point 7C is controlled as described above. (22) The light-emitting device for an exposure apparatus according to (21), wherein "the control is performed by simultaneously lighting the same number of the plurality of cassettes" Control

S 153878.doc 201214052 上述所有光源部中成為近似旋轉對稱之位置之上述光源部 交替地點亮。 (23) —種曝光裝置用光照射裝置，其特徵在於：包含 特定數之光源部，其等分別包括發光部、及使由該發光 部產生之光以指向性射出之反射光學系統；以及 卡匣，其係以上述特定數之光源部之光入射至積光器透 鏡之入射面之方式，支持上述特定數之光源部； 且，上述特定數之光源部，係包含分光特性不同之複數 種光源部。 (24) 如（23)記載之曝光裝置用光照射裝置，其中 上述特定數之光源部之各發光部係分光特性相同，且 上述特定數之光源部，係藉由於其一部分配置波長截止 滤光片’而構成分光特性不同之複數種光源部。 (25) 如（23)或者（24)記載之曝光裝置用光照射裝置，其中 包含複數個上述卡匣， 並且，更包含以使上述所有光源部之光入射至上述積光 器透鏡之入射面之方式，安裝有上述複數個卡匣之基座。 (26) —種曝光裝置，其特徵在於：包含 基板保持部，其保持作為被曝光材之基板； 光罩保持部，其以與上述基板對向之方式保持光罩；以及 照明光學系統，其包括如（1)至（25)中任一項記載之上述 光照射裝置、及使自該光照射裝置之複數個光源部出射之 光入射之積光器透鏡； 且’使來自上述照明光學系統之光經由上述光罩，照射 153878.doc 12 201214052 上述基板》 (27)—種曝光方法，其特徵在於：其係使用如下曝光裝 置’該曝光裝置包含 基板保持部，其保持作為被曝光材之基板； 光罩保持部，其以與上述基板對向之方式保持光罩；以及 照明光學系統，其包括如（1)至（25)中任一項記載之上述 光照射裝置、及使自該光照射裝置之複數個光源部出射之 光入射之積光器透鏡； 且，使來自上述照明光學系統之光經由上述光罩，照射 上述基板。 (28) —種基板，其特徵在於：其係使用如（27)記載之曝光 方法進行曝光者。 (29) —種曝光裝置用光照射裝置之點亮控制方法，其係該 曝光裝置用光照射裝置包含 ^ 複數個光源部，其等分別包括發光部、及使由該發光部 產生之光以指向性射出之反射光學系統； 複數個卡E，其等可分別安裝特定數之上述光源部； 支持體，其可安裝該複數個卡匣；以及 控制部，其控制上述複數個光源部之點亮或熄滅； 且上述控帝Hp，係以上述各卡g内之上述特定數之光 源部近似旋轉對稱地點亮之方式進行控制。 ⑽-種曝光裝置用光照射裝置之點亮控制方法，其係該 曝光裝置用光照射裝置包含 複數個光源部，其等分別包括發光部 '及使由該發光部S 153878.doc 201214052 The above-mentioned light source sections which are positions at approximately rotational symmetry among all the light source sections are alternately lit. (23) A light-emitting device for an exposure apparatus, comprising: a specific number of light source units each including a light-emitting portion; and a reflection optical system that emits light generated by the light-emitting portion in a directivity; and a card In other words, the light source portion of the specific number of light source portions is incident on the incident surface of the light concentrator lens, and the specific number of light source portions are included in the specific number of light source portions. Light source section. (24) The light-emitting device for an exposure apparatus according to (23), wherein each of the light-emitting portions of the specific number of light source units has the same spectral characteristics, and the light source unit of the specific number is configured to have a wavelength cut filter by a part thereof The sheet ' constitutes a plurality of light source sections having different spectral characteristics. (25) The light-emitting device for an exposure apparatus according to (23) or (24), wherein the light-emitting device includes a plurality of the latches, and further includes an incident surface for causing light of all of the light source sections to be incident on the light-collecting lens In this manner, the base of the plurality of cassettes described above is mounted. (26) An exposure apparatus comprising: a substrate holding portion that holds a substrate as an exposure material; a mask holding portion that holds the photomask so as to face the substrate; and an illumination optical system The light-irradiating device according to any one of (1) to (25), wherein the light-emitting device that emits light from a plurality of light-emitting portions of the light-irradiating device is incident on the light-collecting lens; The light is irradiated to the above-mentioned substrate by the above-mentioned reticle 153878.doc 12 201214052. The exposure method is characterized in that an exposure apparatus including an substrate holding portion that is held as an exposed material is used. a reticle holding portion that holds the reticle so as to face the substrate; and an illuminating optical system, comprising the light illuminating device according to any one of (1) to (25), and An optical illuminator lens in which light emitted from a plurality of light source units of the light irradiation device is incident; and light from the illumination optical system is irradiated to the substrate via the reticle. (28) A substrate characterized in that it is exposed using an exposure method as described in (27). (29) A lighting control method for a light-emitting device for an exposure apparatus, wherein the light-emitting device for an exposure device includes a plurality of light source units each including a light-emitting portion and light generated by the light-emitting portion a reflective optical system for directivity injection; a plurality of cards E, which may respectively mount a specific number of the light source portions; a support body capable of mounting the plurality of cassettes; and a control portion that controls the plurality of light source portions The light is turned on or off; and the control unit Hp is controlled such that the light source unit of the specific number in the card g is illuminated approximately symmetrically. (10) A lighting control method for a light-emitting device for an exposure apparatus, wherein the light-emitting device for an exposure device includes a plurality of light source units, each of which includes a light-emitting portion 'and a light-emitting portion

S 153878.doc -13· 201214052 產生之光以指向性射出之反射光學系統； 複數個卡匣，其等可分別安裝特定數之上述光源部； 支持體’其可安裝該複數個卡匣；以及 控制部，其控制上述複數個光源部之點亮或熄滅； 且，上述控制部，係以交替地使上述各卡匣内之上述特 疋數之光源部中成為近似旋轉對稱之位置之上述光源部點 焭之方式進行控制。 (31)—種曝光裝置用光照射裝置之點亮控制方法，其特徵 在於··其係該曝光裝置用光照射裝置包含 複數個光源部，其等分別包括發光部、及使由該發光部 產生之光以指向性射出之反射光學系統； 複數個卡ϋ，其等以使特定數之上述光源部之光入射至 積光器透鏡之入射面之方式’支持上述特定數之光源部； 基座，其係以使上述所有光源部之光入射至上述積光器 透鏡之入射面之方式，安裝有上述複數個卡匣； 照度計，其係配置於上述積光器透鏡之下游側，且測量 與各波長對應之照度；以及 控制部，其控制上述各發光部之點亮/熄滅、及照度； 且，上述特定數之光源部係、包含分光肖性不同之複數種 光源部， 且，上述控㈣，係以基於由上述照度計測量之與各波 長對應之照度，於特定之波長中獲得所需之照度之方式， 控制上述卡匣内之各光源部。 (32)如（31)記載之曝光裝置用光照射裝置之點亮控制方 153878.doc -14· 201214052 法，其中 上述特定數之光源部之各發光部係分光特性相同， 且’上述特疋數之光源部，係、藉由於其—部分配置波長 截止渡光片，而構成分光特性不同之複數種光源部。 再者，所謂「照度」，係指i cm2之面積於…鐘内㈣ 到之能量[mWVcm2]。 發明之效果 根據本發明之曝光裝置用光照射裝置、曝光裝置以及曝 光方法’可藉由將特定數之光源部安裝於ι個卡昆中進行 單元化管理，而縮短燈更換時間以及裝置之停機時間。 又’可藉由使用卡g，而無需對支持體實施較大之曲面 加工，便可將所有光源配置於單一之曲面上。 又’根據本發明之曝光裝置用光照射裝置及其點亮控制 方法，由於控制部可以各卡£内之特定數之光源部近似旋 轉對稱地點亮之方式進行控制，因此，可根據所需之照度 抑制耗電進行曝光，且因對每一卡g進行控制，故而可易 於控制燈之點亮，而與基板之大小(時代)變更或燈之數量 無關。 又’藉由以複數個卡E之特錢之光源部之各燈以相同 之點亮圖案’近似旋轉對稱地點亮之方式進行控制，而使 支持體内之所有光源部近似旋轉對稱地點亮。藉此，不必 改變曝光面之照度分佈，即可使照度變化。 進而’根據本發明之曝錢置用光照射裝置及其點亮控 制方法’由於控制部’係以各卡g内之特定數之光源部中a 153. a control unit that controls lighting or extinction of the plurality of light source units; and the control unit alternately causes the light source to be approximately rotationally symmetric in the light source unit in each of the plurality of cassettes Control the way. (31) A lighting control method for a light-emitting device for an exposure apparatus, characterized in that the light-emitting device for the exposure device includes a plurality of light source units, each of which includes a light-emitting portion and a light-emitting portion a reflecting optical system that emits light in a directivity; a plurality of latches that support a specific number of light source sections in such a manner that light of a specific number of the light source sections is incident on an incident surface of the light collector lens; The cradle is disposed on a downstream side of the illuminator lens such that light of all of the light source portions is incident on an incident surface of the illuminator lens; and Measuring an illuminance corresponding to each wavelength; and a control unit that controls lighting/extinguishing and illuminance of each of the light-emitting portions; and the light source unit of the specific number includes a plurality of light source units having different spectral tracts, and The above control (4) controls each light source unit in the cassette in such a manner that the desired illuminance is obtained at a specific wavelength based on the illuminance corresponding to each wavelength measured by the illuminometer. (32) The lighting control unit 153878.doc-14·201214052 of the light-emitting device for an exposure apparatus according to (31), wherein each of the light-emitting portions of the specific number of light source units has the same spectral characteristics, and the above-mentioned feature The plurality of light source units constitute a plurality of light source sections having different spectral characteristics due to the partial arrangement of the wavelength cutoff light-passing sheets. In addition, the term "illuminance" refers to the energy [mWVcm2] of the area of i cm2 in the clock (four). Advantageous Effects of Invention According to the light irradiation device, the exposure device, and the exposure method of the exposure apparatus of the present invention, it is possible to shorten the lamp replacement time and the shutdown of the apparatus by installing a specific number of light source units in one card unit for unit management. time. Moreover, all light sources can be placed on a single curved surface by using the card g without performing a large curved surface processing on the support. Further, according to the light irradiation device for an exposure apparatus of the present invention and the lighting control method thereof, since the control unit can control the light source portion of the specific number within each card to be approximately rotationally symmetrically illuminated, it can be controlled as needed. The illuminance suppresses power consumption for exposure, and since each card g is controlled, it is possible to easily control the lighting of the lamp regardless of the size of the substrate (era) or the number of lamps. Further, by controlling each of the lamps of the light source unit of the plurality of cards E to be approximately rotationally symmetrically illuminated by the same lighting pattern, all the light source portions in the support body are illuminated in approximately rotational symmetry. Thereby, the illuminance can be changed without changing the illuminance distribution of the exposure surface. Further, the light exposure apparatus for exposure of money according to the present invention and the lighting control method thereof are used in the light source unit of a specific number in each card g.

S 153878.doc 15- 201214052 成為近似旋轉對稱之位置之光源部交替點亮之方式進行控 制’因此’可根據所需之照度抑制耗電進行曝光，且因對 母卡昆進行控制’故而可易於控制燈之點亮，而與基板 之大小（時代）變更或燈之數量無關。 又’藉由以複數個卡匣之特定數之光源部以相同之點亮 圖案同時點壳之方式進行控制，而使所有光源部中成為近 似旋轉對稱之位置之光源部交替地點亮。藉此，不必改變 曝光面之照度分佈，即可使照度變化。 進而，根據本發明之曝光裝置用光照射裝置以及曝光裝 置，由於包含包括發光部及反射光學系統之特定數之光源 部、以及以使特定數之光源部之光入射至積光器透鏡之入 射面之方式支持光源部之卡匣，且特定數之光源部包括分 光特丨生不同之複數種光源部，因此，無需更換光源部，便 可自如地設定每一波長之強度。 又，特定數之光源部之各發光部，係分光特性相同，且 特疋數之光源部’藉由於其一部分配置波長截止濾光片， 而構成分光特性不同之複數種光源部。藉此，無需更換光 二又，不必使用分光特性不同之光源部，便可自如地 設定每一波長之強度。S 153878.doc 15- 201214052 The light source unit that is approximately rotationally symmetrical is alternately lit. Therefore, it is easy to prevent the power consumption from being exposed according to the required illumination, and it is easy to control the mother card. The lighting of the lamp is controlled regardless of the size of the substrate (age) or the number of lamps. Further, by controlling the light source portions of the specific number of the plurality of cassettes to be simultaneously nested in the same lighting pattern, the light source portions at positions close to the rotational symmetry of all the light source portions are alternately lit. Thereby, the illuminance can be changed without changing the illuminance distribution of the exposure surface. Further, according to the light-emitting device and the exposure device for an exposure apparatus of the present invention, a light source portion including a specific number of the light-emitting portion and the reflection optical system, and an incident light for causing light of a specific number of light source portions to enter the light-collecting lens The surface method supports the latch of the light source unit, and the specific number of light source sections includes a plurality of different light source sections different from each other. Therefore, the intensity of each wavelength can be set freely without replacing the light source section. Further, each of the light-emitting portions of the specific number of light source sections has the same spectral characteristics, and the light source section of the specific number is configured to have a plurality of light source sections having different spectral characteristics by arranging a wavelength cut filter. Thereby, it is possible to freely set the intensity of each wavelength without using the light source unit having different spectral characteristics without replacing the light.

零件實施大型之曲面加1 間，且，無需對光源部之安裝 便可將所有光源部配置於單一 153878.doc 201214052 之曲面上。 又，根據本發明之曝光裝置用光照射裝置之點亮控制方 法以及曝光方法，曝光裝置用光照射裝置，係包含包括發 光部與反射光學系統之複數個光源部、以使特定數之光源 部之光入射至積光器透鏡之人射面之方式支持光源部之複 數個卡e、以使所有光源部之光人射至積光器透鏡之入射 面之方式安裝複數個切之基座、配置於積光器透鏡之下 游側且測量與各波長對應之照度之照度計、以及控制各發 Μ之點亮/熄滅及照度之控制部，且特定數之光源部， 係包括分光特性不同之複數種光源部。而且，該控制方 法’係㉟制部以基於與由照度計測量之各波長對應之照 度’於特定之波纟中獲得所需之照度之方<，控制切内 之各光源部。藉此’可對所需之發光部進行點亮、德滅或 者照度控制，&而自如地設定曝光所需之波長成分中之強 度，故可延長發光部之壽命。 【實施方式】 以下’基於圖式，對本發明之光照射裝置、曝光裳置以 及曝光方法之各實施形態進行詳細說明。 (第1實施形態） 如圖i及圖2所示，第i實施形態之連續分階近接曝光裝 置PE係包含保持光Μ之光罩載物台1〇、保持玻璃基板 (被曝光材）W之基板載物台2G、及照射圖案曝光用之光之 照明光學系統70。 再者，玻璃基板w(以下，簡稱為「基板w」），係對向The part is implemented with a large curved surface plus one, and all the light source parts can be placed on a single surface of 153878.doc 201214052 without mounting the light source part. Further, according to the lighting control method and the exposure method of the light-emitting device for an exposure apparatus of the present invention, the light-emitting device for an exposure device includes a plurality of light source units including a light-emitting portion and a reflection optical system to enable a specific number of light source units. The light is incident on the human emitting surface of the illuminator lens, and a plurality of cards e of the light source portion are supported, and a plurality of pedestals are mounted so that the light persons of all the light source portions are incident on the incident surface of the illuminator lens. An illuminance meter disposed on the downstream side of the illuminator lens and measuring the illuminance corresponding to each wavelength, and a control unit for controlling the lighting/extinction and illuminance of each of the hairs, and the specific number of light source sections includes different spectral characteristics A plurality of light source sections. Further, the control method section 35 controls the respective light source sections in the cut by the illuminance corresponding to each wavelength measured by the illuminometer to obtain the desired illuminance in a specific wavelength. In this way, it is possible to set the intensity of the wavelength component required for exposure by lighting, de-emphasizing or illuminance control of the desired light-emitting portion, and thus extending the life of the light-emitting portion. [Embodiment] Hereinafter, each embodiment of the light irradiation device, the exposure and the exposure method, and the exposure method of the present invention will be described in detail based on the drawings. (First Embodiment) As shown in Fig. 1 and Fig. 2, the continuous stepped proximity exposure apparatus PE of the i-th embodiment includes a photomask stage 1 holding a stop and a holding glass substrate (exposure material) W. The substrate stage 2G and the illumination optical system 70 that illuminates the light for pattern exposure. In addition, the glass substrate w (hereinafter, simply referred to as "substrate w") is oriented

S 153878.doc •17- 201214052 配置於光罩Μ，且於可曝光轉印該光罩Μ上所描繪之圖案 之表面（光罩Μ之對向面側）上塗佈有感光劑。 光罩載物台10，係包含中央部形成有矩形形狀之開口 11a之光罩載物台底座11、沿X軸、γ軸、0方向以可移動方 式裝載於光罩載物台底座11之開口 lla之作為光罩保持部 之光罩保持架12、設置於光罩載物台底座11之上表面且使 光罩保持架12沿X軸、Y軸、Θ方向移動以調整光罩M之位 置之光罩驅動機構丨6。 光罩載物台底座11，係由豎立設置於裝置底座5〇上之支 柱5 1、以及設置於支柱5丨之上端部之z轴移動裝置以可沿z 軸方向移動之方式支持（參照圖2)，且配置於基板載物台2〇 之上方。 如圖3所示，於光罩載物台底座u之開口 Ua之周緣部之 上表面，在複數個部位配置有平面軸承，且光罩保持架 12將設置於其上端外周緣部之凸緣12a載置於平面軸承 1 3。藉此，光罩保持架丨2，經由特定之間隙插入至光罩载 物台底座11之開口 lla，故可沿χ軸、γ軸、Θ方向以該間隙 之量進行移動。 又，於光罩保持架12之下表面，介隔隔片15而固定有保 持光罩Μ之吸盤部14。於該吸盤部14，開設有用以吸附光 罩Μ之未描繪光罩圖案之周緣部之複數個吸入嘴14&，光 罩Μ，係經由吸入嘴14a利用未圖示之真空式吸附裝置， 而由吸盤部14裝卸自如地保持。又，吸盤部14，可與光罩 保持架12一併相對光軍載物台底座"沿又轴、γ軸、0方向 153878.doc -18· 201214052 移動。 匕括安裝於光罩保持架12之沿χ择 无卓驅動機構 方向之一邊之2台Y轴方向驅叙租$ 驅勤裝置16y、以及安裝於光罩 保持架12之沿Y軸方向之— 邊之1台X軸方向驅動裝置 16x。 Y軸方向驅動裝置16v，後4 > y直6y係包括驅動用致動器（例如，電 動致動器等)16a，其設置於光罩載物台底座"上，且具有 /口 γ軸方向伸縮之連桿16b;滑塊⑹，其經由銷支持機構 16〇連結於連才旱⑽之前端；以及導軌…，其安裝於光罩 保持架12之沿X轴方向之邊部，且以可移動方式安裝有滑 塊16d。再者’又軸方向驅動裝置…，亦具備與γ軸方向 驅動裝置16y相同之構成。 而且，光罩驅動機構16，係藉由驅動1台X軸方向驅動裝 置16x，而使光罩保持架12沿又軸方向移動，且藉由同等地 驅動2台Y軸方向驅動裝置16y，而使光罩保持架Q沿γ軸 方向移動。又，藉由驅動2台丫軸方向驅動裝置i6y之任一 者，而使光罩保持架12沿0方向移動（圍繞z軸旋轉）。 進而，於光罩載物台底座丨丨之上表面，如圖丨所示，設 置有測定光罩Μ與基板W之對向面間之間距之間距感測器 17、以及用以確認由吸盤部14保持之光罩M之安裝位置之 對準攝像機18。該等間距感測器17以及對準攝像機18，係 介隔移動機構19以可沿X軸、γ軸方向移動之方式得到保 持’且配置於光罩保持架12内。 又，於光罩保持架12上，如圖丨所示，在光罩載物台底 153878.doc •i9· 201214052 座11之開口 lla之X轴方向之兩端部，設置有視需要遮蔽光 罩M之兩端部之光圈檔板38。該光圈檔板38，可藉由包含 馬達、滾珠螺桿、及線性導軌等之光圈檔板驅動機構39而 沿X軸方向移動，對光罩M之兩端部之遮蔽面積進行調 整❶再者’光圈檔板38，不僅可設置於開口 11&之又軸方向 之兩端部’而且可同樣地設置於開口 n &之γ軸方向之兩端 部。 基板載物台20,如圖1及圖2所示，包括保持基板双之基 板保持部21、使基板保持部21相對裝置底座5〇沿又軸、γ 軸、z軸方向移動之基板驅動機構22。基板保持部2丨係利 用未圖示之真空吸附機構裝卸自如地保持基板w。基板驅 動機構22係於基板保持部2 1之下方，包括γ軸工作台23、 Y軸傳送機構24、X軸工作台25、X軸傳送機構26、及Z-傾 斜調整機構27。 Y軸傳送機構24係如圖2所示，包含線性導軌28與傳送驅 動機構29而構成，且安裝於γ軸工作台23之背面之滑塊 ’經由滾動體（未圖示）架設於延伸至裝置底座5〇上之2根 導執3 1，並且利用馬達32與滚珠螺桿裝置33沿著導軌3丨驅 動Y軸工作台23。 再者，X軸傳送機構26亦具有與γ軸傳送24相同之構 成，使X轴工作台25相對γ軸工作台23沿χ方向驅動。又， Z-傾斜調整機構27，係藉由於X方向之一端側配置i台由楔 形之移動體34、35與傳送驅動機構36組合而成之活動楔形 機構，於另一端側配置2台該活動楔形機構而構成。再 153878.doc •20· 201214052 者，傳送驅動機構29、36既可為由馬達與滾珠螺桿裝置組 合而成之構成，亦可為具備固定件與活動件之線性馬達\ 又’ Z-傾斜調整機構27之設置數係為任意者。 藉此，基板驅動機構22，係沿X方向及γ方向傳送驅動 基板保持部21，並且以對光罩M與基板贾之對向面間之間 距進行微調之方式，使基板保持部21沿2軸方向顫動且進 行傾斜調整。 於基板保持部21之X方向側部與γ方向側部分別安裝有 條狀鏡組61、62，又，於裝置底座5〇之丫方向端部與又方 向端部’設置有共計3台雷射干涉儀63、64、65 *藉此， 自雷射干涉儀63、64、65對條狀鏡組61 ' 62照射雷射光， 並接收由條狀鏡組61、62反射之雷射光，對雷射光與由條 狀鏡組61、62反射之雷射光之干涉進行測定，檢測基板载 物台2〇之位置。 如圖2及圖4所示，照明光學系統7〇，係包括光照射裝置 8〇 ’其包含複數個光源部73 ;積光器透鏡74，其使自複數 個光源部73中射出之光束入射；光學控制部76，其可進行 包含各光源部73之燈71點亮與熄滅之切換在内之電壓控 制’凹面鏡77，其改變自積光器透鏡74之出射面出射之光 程之朝向；以及曝光控制用快門78 ’其配置於複數個光源 部73與積光器透鏡74之間，以使照射光透射/遮蔽之方式 進行開閉控制。再者，積光器透鏡74係為使照度分佈均勾 之光學系統，其既可為複眼透鏡，亦可為圓柱型積光器透 鏡。再者’於積光器透鏡74與曝光面之間，既可配置]；)^^^ 153878.doc 201214052 (Deepultraviolet，深紫外線）截止濾光片偏光濾光片、 帶通濾光片，又，於凹面鏡77，亦可設置可手動或自動更 改鏡面之曲率之偏角修正機構。 如圖4〜圖6所示，照明光學系統7〇之光照射裝置8〇，係 包含複數個光源部73，其等分光特性分別相同，且包括作 為發光部之超高壓水銀燈71、及使自該燈71中產生之光以 指向性射出之作為反射光學系統之反射鏡72 ;複數個卡匣 81，其等可分別安裝複數個光源部73中之特定數之光源部 73 ;以及支持體82，其可安裝複數個卡匣81。作為發光 郤，亦可取代超高壓水銀燈71，而應用鹵素燈或 emitting diode，發光二極體）等。 再者，於照明光學系統70中，使用16〇 w之超高壓水銀 燈71時，製造第6代平板之曝光裝置需要374個光源部，製 造第7代平板之曝光裝置需要572個光源部，製造第8代平 板之曝光裝置則需要774個光源部。然而，本實施形態 中，為簡化說明，而如圖4所示，以配置有3段乂3行共計9 個卡匣81從而具有54個光源部73者進行說明，該9個卡匣 8 1中分別安裝有α方向3段且β方向2行之共計6個光源部 73。再者，卡匣8丨或支持體82，亦可考慮光源部73之配置 在α、β方向上為相同數目之正方形形狀，但應用α、ρ方向 上為不同數目之長方形形狀。又，本實施形態之光源部 73 ’係反射鏡72之開口部72b形成為近似正方形形狀，且 四邊沿著α、β方向配置。 各卡Ε 81 ’係形成為具備支持特定數之光源部73之光源 153878.doc •22· 201214052 支持部83、及將由光源支持部83支持之光源部^固定住安 裝於該光源支特部83之凹狀燈座罩（遮罩構件）84之近似長 方體形狀’且分別具有相同之構成。 於光源支持部83，形成有對應於光源部73之數而設置且 使來自光源部73之光發光之複數個窗部83a、及設置於該 窗部83a之遮罩側且包圍反射鏡72之開口部72&(或者，安 裝有反射鏡72之反射鏡安裝部之開口部）之燈用凹部㈣。 又，於該窗部83a之反遮罩側，分別安裝有複數個遮罩玻 璃85。再者，遮罩玻璃85之安裝係為任意，亦可不設置。 各燈用凹部83b之底面，係以光源部乃之光所照射之照 射面（此處為反射鏡72之開口面72b)與光源部乃之光軸[之 交點P，於各《、β方向上位於單一之曲面、例如球面r上之 方式，形成為平面或曲面（本實施形態為平面 於燈座罩84之底面，設置有與光源部73之後部抵接之抵 接部86,且於各抵接部86，設置有包含馬達或汽缸般之致 動器、彈簧座、螺旋夾等之燈座機構87。藉此，各光源部 73，藉由使反射鏡72之開口部72a嵌合於光源支持部”之 燈用凹邛83b ’將燈座罩84安裝於光源支持部，並利用 燈座機構87抵住光源部73之後部，而定位於卡g8i。因 此’如圖5(c)所示’自定位於卡㈣中之特定數之光源部 73之光所照射之各照射面起’至特定數之光源部之光所 入射之積光器透鏡74之入射面為止之各光軸乙之距離變得 大致恆定。又，光源支持部83與燈座罩84之間之收納空間 内，鄰接之光源部73之反射鏡72之背面72c為直接對向，S 153878.doc • 17- 201214052 is disposed in the mask Μ, and is coated with a sensitizing agent on the surface of the pattern (the opposite side of the mask Μ) on which the pattern drawn on the reticle can be exposed. The reticle stage 10 includes a reticle stage base 11 having a rectangular-shaped opening 11a formed at a central portion thereof, and is movably mounted on the reticle stage base 11 along the X-axis, the γ-axis, and the 0-direction. The mask holder 12 as the mask holding portion of the opening 11a is provided on the upper surface of the mask stage base 11 and moves the mask holder 12 in the X-axis, the Y-axis, and the X direction to adjust the mask M. The position of the reticle drive mechanism 丨6. The reticle stage base 11 is supported by a struts 51 that are erected on the apparatus base 5 、 and a z-axis moving device that is disposed at an upper end of the struts 5 以 so as to be movable in the z-axis direction (refer to the figure). 2) and disposed above the substrate stage 2〇. As shown in FIG. 3, a plane bearing is disposed at a plurality of locations on the upper surface of the peripheral portion of the opening Ua of the reticle stage base u, and the reticle holder 12 is provided at the flange of the outer peripheral edge portion of the upper end thereof. 12a is placed on the planar bearing 13 . Thereby, the mask holder 2 is inserted into the opening 11a of the mask stage base 11 via a specific gap, so that it can be moved by the amount of the gap in the x-axis, the γ-axis, and the x-direction. Further, a suction cup portion 14 for holding the mask is fixed to the lower surface of the mask holder 12 via the spacer 15. The suction cup portion 14 is provided with a plurality of suction nozzles 14 & for adsorbing the peripheral portion of the mask 未 which is not drawn with the mask pattern, and the mask Μ is used by a vacuum suction device (not shown) via the suction nozzle 14a. The suction cup portion 14 is detachably held. Further, the chuck portion 14 can be moved together with the reticle holder 12 with respect to the gantry stage base along the re-axis, the γ-axis, and the 0-direction 153878.doc -18·201214052. Included in the Y-axis direction of one of the two Y-axis directions of the reticle holder 12 along the direction of the selected drive mechanism, and the Y-axis direction of the reticle holder 12 One X-axis direction drive unit 16x on the side. The Y-axis direction driving device 16v, the rear 4 > y straight 6y includes a driving actuator (for example, an electric actuator or the like) 16a, which is disposed on the reticle stage base and has / mouth γ a shaft extending and contracting link 16b; a slider (6) connected to the front end of the Liancai (10) via a pin supporting mechanism 16; and a guide rail ... mounted on a side of the reticle holder 12 in the X-axis direction, and A slider 16d is movably mounted. Further, the 'axis-direction driving device» has the same configuration as the γ-axis direction driving device 16y. Further, the reticle driving mechanism 16 moves the reticle holder 12 in the axial direction by driving one X-axis direction driving device 16x, and drives the two Y-axis direction driving devices 16y in the same manner. The reticle holder Q is moved in the γ-axis direction. Further, by driving either of the two x-axis direction driving devices i6y, the mask holder 12 is moved in the zero direction (rotating around the z-axis). Further, on the upper surface of the reticle stage pedestal, as shown in FIG. ,, the distance between the opposite faces of the measuring reticle Μ and the substrate W is provided between the sensor 17 and the suction cup is confirmed. The portion 14 holds the alignment camera 18 of the mounting position of the mask M. The equal-distance sensor 17 and the alignment camera 18 are held in the reticle holder 12 so as to be movable in the X-axis and γ-axis directions. Further, as shown in FIG. ,, the mask holder 12 is provided with shielding light as needed in the X-axis direction of the opening 11a of the housing 153878.doc • i9·201214052. A diaphragm stop 38 at both ends of the cover M. The aperture stop 38 can be moved in the X-axis direction by the aperture stop drive mechanism 39 including a motor, a ball screw, and a linear guide, and the shielding area of both ends of the mask M can be adjusted. The aperture stop 38 can be provided not only at both end portions of the opening 11 & and in the axial direction but also at both end portions of the opening n & γ-axis direction. As shown in FIGS. 1 and 2, the substrate stage 20 includes a substrate holding portion 21 for holding the substrate, and a substrate driving mechanism for moving the substrate holding portion 21 relative to the device base 5 in the direction of the axis, the γ-axis, and the z-axis. twenty two. The substrate holding portion 2 detachably holds the substrate w by a vacuum suction mechanism (not shown). The substrate driving mechanism 22 is disposed below the substrate holding portion 21, and includes a γ-axis table 23, a Y-axis transfer mechanism 24, an X-axis table 25, an X-axis transfer mechanism 26, and a Z-tilt adjustment mechanism 27. As shown in FIG. 2, the Y-axis transfer mechanism 24 includes a linear guide 28 and a transport drive mechanism 29, and a slider attached to the back surface of the γ-axis table 23 is stretched over a rolling element (not shown). Two guides 3 1 on the base 5 of the apparatus are driven, and the Y-axis table 23 is driven along the guide rails 3 by the motor 32 and the ball screw device 33. Further, the X-axis transfer mechanism 26 has the same configuration as the γ-axis transfer 24, and the X-axis table 25 is driven in the χ direction with respect to the γ-axis table 23. Further, the Z-tilt adjustment mechanism 27 is provided with a movable wedge mechanism in which one of the wedge-shaped moving bodies 34 and 35 and the transport drive mechanism 36 is arranged on one end side in the X direction, and two activities are arranged on the other end side. It is composed of a wedge mechanism. 153878.doc •20· 201214052, the transmission drive mechanisms 29, 36 can be composed of a combination of a motor and a ball screw device, or a linear motor with a fixed member and a movable member. The number of settings of the mechanism 27 is any. Thereby, the substrate driving mechanism 22 transports the drive substrate holding portion 21 in the X direction and the γ direction, and finely adjusts the distance between the opposing faces of the mask M and the substrate, so that the substrate holding portion 21 is along 2 Shaft in the direction of the axis and tilt adjustment. The strip-shaped mirror groups 61 and 62 are respectively attached to the X-direction side portion and the γ-direction side portion of the substrate holding portion 21, and a total of three mines are provided at the end portion of the apparatus base 5 and the direction end portion The interferometers 63, 64, 65 are thereby illuminated from the laser interferometers 63, 64, 65 to the strip lens set 61' 62 and receive the laser light reflected by the strip mirrors 61, 62, The laser light is measured by interference of the laser light reflected by the strip mirrors 61 and 62, and the position of the substrate stage 2 is detected. As shown in FIGS. 2 and 4, the illumination optical system 7A includes a light irradiation device 8'' including a plurality of light source portions 73; and an illuminator lens 74 for incident light beams emitted from the plurality of light source portions 73. The optical control unit 76 is configured to perform a voltage control 'concave mirror 77 including switching of the turn-on and turn-off of the lamp 71 of each of the light source units 73, which changes the direction of the optical path emitted from the exit surface of the illuminator lens 74; The exposure control shutter 78' is disposed between the plurality of light source units 73 and the light collector lens 74, and is controlled to open and close so that the irradiation light is transmitted/shielded. Further, the illuminator lens 74 is an optical system that illuminates the illuminance distribution, and may be a fly-eye lens or a cylindrical concentrator lens. Furthermore, 'between the illuminator lens 74 and the exposure surface, it can be configured】;)^^^ 153878.doc 201214052 (Deepultraviolet, deep ultraviolet) cut-off filter polarizing filter, band pass filter, and In the concave mirror 77, an off-angle correction mechanism that can change the curvature of the mirror manually or automatically can also be provided. As shown in FIG. 4 to FIG. 6 , the light irradiation device 8A of the illumination optical system 7 includes a plurality of light source units 73 having the same spectral characteristics, and includes an ultrahigh pressure mercury lamp 71 as a light emitting unit, and The light generated in the lamp 71 is directionally emitted as a mirror 72 of the reflective optical system; a plurality of cassettes 81, which can respectively mount a specific number of light source portions 73 of the plurality of light source portions 73; and a support 82 It can install a plurality of cassettes 81. As the light, it is also possible to replace the ultrahigh pressure mercury lamp 71, and a halogen lamp or an emitting diode, a light emitting diode or the like. Further, when the 16 〇w ultrahigh pressure mercury lamp 71 is used in the illumination optical system 70, 374 light source units are required for the 6th generation flat plate exposure apparatus, and 572 light source parts are required for the 7th generation flat plate exposure apparatus. The 8th generation flat panel exposure device requires 774 light source sections. However, in the present embodiment, for simplification of description, as shown in FIG. 4, a description will be given of a case where a total of nine cassettes 81 are arranged in three rows and three rows, and that there are 54 light source units 73, and the nine cassettes 8 1 are described. A total of six light source units 73 each having three stages in the α direction and two lines in the β direction are mounted in the middle. Further, the cassette 8 or the support 82 may have the same number of square shapes in the α and β directions in consideration of the arrangement of the light source unit 73, but a different number of rectangular shapes in the α and ρ directions are applied. Further, in the light source unit 73' of the present embodiment, the opening 72b of the mirror 72 is formed in a substantially square shape, and the four sides are arranged along the α and β directions. Each of the cassettes 81' is formed to have a light source 153878.doc • 22·201214052 supporting portion 83 that supports a specific number of light source units 73, and a light source unit that is supported by the light source supporting unit 83 is fixedly attached to the light source unit 83. The concave lamp holder cover (mask member) 84 has an approximately rectangular parallelepiped shape and has the same configuration. The light source supporting portion 83 is formed with a plurality of window portions 83a provided corresponding to the number of the light source portions 73 and emitting light from the light source portion 73, and a mask side provided on the window portion 83a and surrounding the mirror 72. The recessed portion (four) for the opening of the opening portion 72 & (or the opening portion of the mirror mounting portion of the mirror 72 is attached). Further, a plurality of mask glasses 85 are attached to the back mask side of the window portion 83a. Furthermore, the mounting of the mask glass 85 is arbitrary or may not be provided. The bottom surface of each of the lamp recesses 83b is an intersection of the irradiation surface (here, the opening surface 72b of the mirror 72) and the optical axis of the light source unit, which is illuminated by the light source, in each of the "β directions". The upper surface is formed on a single curved surface, for example, a spherical surface r, and is formed into a flat surface or a curved surface (this embodiment is a flat surface on the bottom surface of the socket cover 84, and is provided with an abutting portion 86 that abuts against the rear portion of the light source portion 73, and Each of the abutting portions 86 is provided with a socket mechanism 87 including a motor or a cylinder-like actuator, a spring seat, a screw clamp, etc., whereby the light source portions 73 are fitted in the opening 72a of the mirror 72. The lamp holder cover 84 is attached to the light source support portion in the lamp recess 83b of the light source support portion, and is positioned on the card g8i by the socket mechanism 87 against the rear portion of the light source portion 73. Therefore, as shown in Fig. 5(c) The respective illumination surfaces irradiated by the light of the specific number of light source units 73 positioned in the card (four) are the light from the incident surface of the light-collector lens 74 to which the light of the specific number of light source portions is incident. The distance between the axis B and the lamp holder cover 84 is substantially constant. The back surface 72c of the mirror 72 of the adjacent light source unit 73 is directly opposed.

S 153878.doc -23- 201214052 在光源部73、燈座機構87等以外，不會阻擋該收納空間内 之空氣流動’故獲得良好之空氣流動性。 再者，燈座機構87，亦可設置於每一個抵接部86，但如 圖7所示’亦可形成於燈座罩84之側壁。亦於該情形時， 可將抵接部86 ’分別單獨設置於各光源部73，但亦可抵接 於2個以上之光源部73之後部。 又’支持體82，係包含具備安裝複數個卡匣81之複數個 卡匣安裝部90之支持體本體91、以及安裝於該支持體本體 91且覆蓋各卡匣81之後部之支持體遮罩92。 如圖8所示，於各卡匣安裝部9〇 ,形成有光源支持部83 所面對之開口部9〇a，且於該開口部9〇a之周圍，形成有以 光源支持部83之周圍之矩形平面所對向之平面9〇b為底面 之卡匣用凹部90c。又，於支持體本體91之卡匣用凹部9〇c 之周圍，設置有用以固定卡匣81之卡匣固定機構93，而本 實施形態，由形成於卡匣81之凹部81a卡合而將卡匣“固 定。 再者，如圖9所不，卡匣81，係於由卡匣固定機構93固 定時，傾斜著組裝於卡昆安裝部9〇者，可使光源部乃不易 傾倒從而易於組裝。 ，沿α方向或(3方向排列之切用凹部9〇c之各平面働係 形成為以各卡g81之所有光源部73之光所照射之照射面、 與光源部73之光轴L的交點p，在各α、β方向上位於單一之 曲面、例如球面Γ上之方式（參照圖10)，以特定之角度丫交 I53878.doc -24· 201214052 因此’各卡ϋ 81，係藉由於使該等光源支持部83嵌合於 各卡匣安裝部90之卡匣用凹部9〇c中進行定位之狀態下， 使卡E固定機構93卡合於卡匣81之凹部81a，而分別固定 於支持體82。而且，於該等各卡匣81安裝於支持體本體91 之狀態下，將支持體遮罩92安裝於該支持體本體91。因 此如圖10所不，定位於各卡匣81中之所有光源部73之光 所照射之各照射面、與自所有光源部73照射之光中近似 80/〇 1〇〇/0之光所入射之積光器透鏡之入射面為止之各 光轴L之距離亦變得大致恆定。 再者，亦可取代圖8所示之卡匣固定機構”，而如圖u 所示，於卡匿81之對向之二邊設置貫通孔83c，或者面向 側面之槽部’並藉由使作為卡g固定機構之圓柱構件 93a，經由貫通孔83c插入至支持體本體91之凹部9ib，而 將卡S81固疋。再者，貫通孔或卡匡固定機構，係設置於 對向之一邊之中間部，但例如亦可設置於卡匣以之四角。 又’卡㈣定機構亦可為多邊形構件，而取代圓柱構件 93a ’且與此相應地改變貫通孔83c或凹部㈣之形狀即 可^目11所不之卡匣固定機構，亦可與圖8所示之卡 匿固疋機構93—併使用。 或者，如圖⑷所示，亦可於卡㈣之四角，設置 :匿固：機構之圓柱突起93b或多邊形突起，且如圖邮) 行:準於支持體本體Μ側之孔部或槽部…嵌合進 ^準。或者，亦可如圖13⑷所示，於卡"！ 邊形成榫93c , a如固1 hu、& 了 Π之— 且如圖i3(b)所示，與形成於支持體本體91S 153878.doc -23- 201214052 In addition to the light source unit 73, the socket mechanism 87, and the like, the air flow in the storage space is not blocked, so that good air fluidity is obtained. Further, the socket mechanism 87 may be provided in each of the abutting portions 86, but may be formed on the side wall of the socket cover 84 as shown in Fig. 7. Also in this case, the contact portions 86' may be separately provided to the respective light source portions 73, but may be in contact with the rear portions of the two or more light source portions 73. Further, the support body 82 includes a support body 91 including a plurality of cassette mounting portions 90 for mounting a plurality of cassettes 81, and a support mask attached to the support body 91 and covering the rear portions of the cassettes 81. 92. As shown in FIG. 8, the opening portion 9A facing the light source supporting portion 83 is formed in each of the cassette mounting portions 9A, and the light source supporting portion 83 is formed around the opening portion 9A. The plane 9〇b on which the surrounding rectangular plane faces is the recessed recess 90c for the bottom surface. Further, a cassette fixing mechanism 93 for fixing the cassette 81 is provided around the recess portion 9〇c of the support main body 91. In the present embodiment, the recess 81a formed in the cassette 81 is engaged with each other. The cassette is "fixed. Further, as shown in Fig. 9, the cassette 81 is attached to the card mounting portion 9 when it is fixed by the cassette fixing mechanism 93, so that the light source portion can be easily tilted and is easy. The respective planes of the cutting recesses 9〇c arranged in the α direction or in the three directions are formed as irradiation surfaces irradiated with light of all the light source units 73 of the respective cards g81, and the optical axis L of the light source unit 73. The intersection point p, which is located on a single curved surface, such as a spherical surface, in each of the α and β directions (see Fig. 10), and intersects I53878.doc -24·201214052 at a specific angle. Therefore, each card 81 is borrowed. In a state in which the light source supporting portions 83 are fitted into the latching recesses 9C of the respective cassette mounting portions 90, the card E fixing mechanism 93 is engaged with the recess 81a of the cassette 81, and respectively It is fixed to the support body 82. Moreover, in a state in which the respective cassettes 81 are attached to the support body 91 The support mask 92 is attached to the support body 91. Therefore, as shown in Fig. 10, each of the illumination surfaces irradiated by the light of all the light source units 73 in each of the cassettes 81 is irradiated with all of the light source units 73. The distance between the optical axes L up to the incident surface of the illuminator lens on which light of approximately 80/〇1 〇〇/0 is incident in the light is also substantially constant. Further, instead of the card shown in FIG. As shown in FIG. 5, a through hole 83c or a groove portion ' facing the side surface is provided on the opposite sides of the card 81, and the cylindrical member 93a as the fixing mechanism of the card g is passed through the through hole. The 83c is inserted into the recess 9ib of the support body 91 to fix the card S81. Further, the through hole or the cassette fixing mechanism is disposed at an intermediate portion of one of the opposite sides, but may be disposed, for example, in the cassette Further, the 'card (four) fixing mechanism may be a polygonal member instead of the cylindrical member 93a' and correspondingly changing the shape of the through hole 83c or the recess (4) can be used to fix the locking mechanism, or The card hiding mechanism 93 shown in Fig. 8 is used. Or, as shown in Fig. 4 , (Iv) the four corners of the card is also provided: hide solid: projection 93b of the cylindrical bodies or polygonal projections, and as Post) line: to support registration hole or the groove of the side member of the body Μ ^ ... fitted into registration. Or, as shown in Figure 13 (4), on the card "! The side is formed with 榫93c, a such as solid 1 hu, &; Π - and as shown in Figure i3 (b), and formed on the support body 91

S 153878.doc -25- 201214052 側之孔部或者槽部91d嵌合進行對準。再者，考慮到組事 性，且為將榫93 c s免置於一邊’但亦可如圖13(a)之一點鍵 線所示，將榫93c設置於剩餘之對向之二邊。又，亦可構 成為將圖12(a)所示之圓柱突起93b或圖u(a)所示之祥93c 設置於支持體本體91側’且將孔部或槽部設置於卡匿8ι 側。進而，圖12(a)及圖13(a)所示之卡匣固定機構，亦可 與圖8所示之卡匣固定機構93—併使用。 又’如圖14所示’於各卡匣81之光源部73，分別單獨連 接有對燈71供給電力之點亮電源9 5以及控制電路9 6，且自 各光源部73延伸至後方之各配線97，係連接彙集於各卡匿 81中設置之至少一個連接器98。而且，各卡j£8][之連接器 98、與設置於支持體82外側之光學控制部76之間，係藉由 其他配線99而分別連接。藉此，光學控制部76，對各燈71 之控制電路96發送控制信號，進行控制各燈71之點亮或媳 滅、以及該點亮時對燈71供給之電壓之電壓控制。 再者，各光源部7 3之點亮電源9 5以及控制電路9 6，既可 聚集設置於卡匣81中，亦可設置於卡匣之外部。又，燈座 罩84之抵接部86，係形成為不與來自各光源部73之各配線 97產生干涉。 進而，如圖1 5所示，於每一燈71中設置包含保險絲94a 之哥命時間檢測機構94，並利用計時器96a對點亮時間進 行計時，且於額定之壽命時間來臨之階段，使電流流入保 險絲9 4 a ’將保險絲9 4 a切斷。因此，可藉由確認保險絲 94a是否切斷，來檢測燈71是否於額定之壽命時間内使 153878.doc -26 - 201214052 用。再者，壽命時間檢測機構94，不僅限於包含保險絲 者八要在更換燈之維護時，能使燈71是否於額定之 壽命時間内使用之情況一目了然者即可。例如，亦可於每 :燈71中配置IC標籤，並藉由1〇標籤來確認燈71是否於額 定之壽命時間内使用，或者，確認燈71之使用時間。 又於圖14中，點亮電源95以及控制電路％，係設置於 每一光源部73中，但亦可於每複數個光源部73中設置1 個’以特定數為單位匯總管理卡g81内之光源部73。例 如，於圖16所示之卡匣81内具有24個光源部73之情形時， 亦可於每4個光源部73中設置點亮電源％以及控制電路 96 ’同步地控制4個光源部73。 又，於光照射裝置80之各光源部73、各卡匣8丨、及支持 體82，δ又置有用以冷卻各燈71之冷卻構造。具體而言，如 圖6所不，於安裝有各光源部73之燈71與反射鏡72之底座 部&形成有冷卻路徑仏，且於卡£81之各遮罩玻璃 85，形成有一個或者複數個貫通孔85&。又，於卡匣^之 燈座罩84之底面，形成有複數個排氣孔（連通孔）84a(參照 圖5(c)) ’亦於支持體82之支持體遮罩％，形成有複數個排 氣孔92a(參照圖4⑷）。又，於各排氣孔，經由排氣管 9a而連接有形成於支持體82之外部之吹風機單元（強制排 氣機構）79。因此，可藉由利用吹風機單元將支持體 内之工氣抽取排出，而使自遮罩玻璃85之貫通孔…吸入 之外°卩二氣，朝向箭頭所示之方向，穿過燈71與反射鏡72 之間之隙間S ’引導至形成於光源部73之底座部75之冷卻S 153878.doc -25- 201214052 The hole portion or groove portion 91d on the side is fitted and aligned. Furthermore, considering the group matter, and 榫93 c s is set aside, the 榫93c may be placed on the remaining two sides as shown by one of the key lines in Fig. 13(a). Further, the cylindrical projection 93b shown in Fig. 12(a) or the eccentric 93c shown in Fig. u(a) may be provided on the side of the support main body 91', and the hole portion or the groove portion may be provided on the side of the occlusion 8ι side. . Further, the cassette fixing mechanism shown in Figs. 12(a) and 13(a) may be used together with the cassette fixing mechanism 93 shown in Fig. 8. Further, as shown in FIG. 14, the light source unit 73 of each of the cassettes 81 is separately connected to a lighting power source 915 that supplies electric power to the lamp 71 and a control circuit 169, and each of the wirings extending from the respective light source units 73 to the rear is connected. 97 is connected to at least one connector 98 provided in each of the jams 81. Further, the connector 98 of each card is connected to the optical control unit 76 provided outside the support 82 by other wires 99. Thereby, the optical control unit 76 transmits a control signal to the control circuit 96 of each of the lamps 71, and performs voltage control for controlling the lighting or annihilation of each of the lamps 71 and the voltage supplied to the lamps 71 at the time of lighting. Further, the lighting power source 905 and the control circuit 96 of each of the light source units 713 may be collectively disposed in the cassette 81 or may be provided outside the cassette. Further, the abutting portion 86 of the socket cover 84 is formed so as not to interfere with each of the wires 97 from the respective light source portions 73. Further, as shown in Fig. 15, a life time detecting means 94 including a fuse 94a is provided in each of the lamps 71, and the lighting time is counted by the timer 96a, and at the stage where the rated life time comes, Current flows into the fuse 9 4 a 'cuts the fuse 9 4 a. Therefore, it can be detected whether or not the lamp 71 is used for the rated life time by confirming whether or not the fuse 94a is turned off. Further, the life time detecting means 94 is not limited to the case where the fuse is included, and it is necessary to make it clear whether the lamp 71 is used within the rated life time when the lamp is replaced. For example, an IC tag may be placed in each of the lamps 71, and it may be confirmed by one tag to confirm whether the lamp 71 is used for a predetermined life time, or to confirm the use time of the lamp 71. Further, in Fig. 14, the lighting power source 95 and the control circuit % are provided in each of the light source units 73, but one of the plurality of light source units 73 may be provided in a specific number of units in the management card g81. Light source unit 73. For example, when there are 24 light source units 73 in the cassette 81 shown in FIG. 16, the lighting power source % and the control circuit 96' may be provided to control the four light source units 73 in synchronization with each of the four light source units 73. . Further, in each of the light source portions 73 of the light irradiation device 80, the respective cassettes 8 and the support 82, δ is provided with a cooling structure for cooling the lamps 71. Specifically, as shown in FIG. 6, a cooling path 形成 is formed in the base portion & of the lamp 71 and the mirror 72 to which the respective light source units 73 are attached, and each of the mask glasses 85 of the card 81 is formed. Or a plurality of through holes 85 & Further, a plurality of vent holes (communication holes) 84a (see FIG. 5(c)) are formed on the bottom surface of the lamp holder cover 84 of the card holder (see also FIG. 5(c)). One vent hole 92a (see Fig. 4 (4)). Further, a blower unit (forced exhausting means) 79 formed outside the support body 82 is connected to each of the exhaust holes via the exhaust pipe 9a. Therefore, by extracting and discharging the working gas in the support body by using the blower unit, the through hole of the self-shielding glass 85 is sucked out, and the light is reflected in the direction indicated by the arrow, and the light is reflected and reflected. The gap S ' between the mirrors 72 is guided to the cooling of the base portion 75 formed in the light source portion 73.

S 153878.doc •27- 201214052 路扭75a ’從而利用空氣對各光源部73進行冷卻。 再者’作為強制排氣機構，可不僅限於吹風機單元79 , 亦可為風扇、變頻器、真空泵等抽取支持體82内之空氣 者。又’吹風機單元79進行之空氣排氣，不僅限於自後方 進行，亦可自上方、下方、左方、右方之任一方進行。例 如圖17所示，亦可經由風門79b，將連接於支持體之側方 之複數個排氣管79a分別連接於吹風機單元79。 又形成於燈座罩84之排氣孔84a，既可如圖5(c)所示於 底面形成複數個，亦可如圖18(a)所示形成於底面之中央， 亦可如圖1 8(b)、（C)所示’形成於長邊方向、短邊方向之 側面又’除了形成排氣孔8 4 a以外’亦可形成自燈座罩 84之開口緣切取之連通槽，藉此，使光源支持部83與燈座 遮罩84之間之收納空間、與外部連通。 再者，燈座罩84，作為包含複數個基座之骨架構造，亦 可藉由於該基座另外安裝形成有連通孔或連通槽之遮罩 板’而構成連通孔或連通槽。 進而，於支持體本體91之周緣，設置有水冷管（冷卻用 配官）91a，利用水泵69使冷卻水於水冷管91a内循環，便 可將各光源部73冷卻。再者，水冷管91a，如圖4所示，既 可形成於支持體本體91内，亦可安裝於支持體本體91之表 面又上述排氣式之冷卻構造與水冷式之冷卻構造，可 僅設置其中之任一個。又’水冷管91a，不僅限於圖4所示 之配置，亦可如圖19(a)及圖19(b)所示，以穿過所有卡匣 81之周圍之方式配置水冷管9la，或者，以穿過所有卡匣 153878.doc -28· 201214052 之周圍一部分之方式鋸齒狀配置水冷管9ia，從而使冷 卻水進行循環。 如此構成之曝光裝置PE，係於照明光學系統7〇中，若曝 光時對曝光控制快門78進行開啟控制，貝彳自超高塵水: 燈71照射之光’將入射至積光器透鏡74之入射面。繼而， 自積光咨透鏡74之出射面發出之光，因凹面鏡”而改變且 行進方向，並且轉換為平行光。繼之，該平行光，作為圖 案曝光用之光，對由光罩載物台1G保持之光罩m、進而對 由基板载物台20保持之基板w之表面近似垂直地進行照 射，從而將光罩Μ之圖案P曝光轉印至基板w上。 此處，於更換光源部73時，更換每—個卡g81。各卡匿 8卜預先定位有特絲之光源部73，1，將來自各光源部 73之配線97連接於連接器98。因此，可自與支持體^之光 所出射之方向相反之方向，拆取需要更換之卡£81後，使 新卡匣81與支持體82之卡匣用凹部9〇b嵌合，從而安裝於 支持體82，由此，完成卡£81内之光源部”之對準。^，' 2可藉由將其他配線99連接於連接器98，而亦使配線作業 完成，因此，可易於進行光源部73之更換作業。又，卡匣 更換時必需固定裝置。作為原因，係卡£81中配置有複數 個燈（9個以上），—個個卡£較大地有助於曝光面上之照度 分佈。然而，如上所述，即便更換複數個卡匣“，作業= 較為容易，且更換時間自身亦可縮短，故而方法較為有 效。 又，卡之光源支持部83,係形成為特定數之光源部 153878.doc -29· 201214052 73之光所照射之各照射面、與特定數之光源部之光所入射 之積光器透鏡74之入射面為止之各光轴l之距離達到大致 惶定，且支持體82之複數個卡匣安裝部90，係形成為所有 光源部73之光所照射之各照射面、與自所有光源部73照射 之光中之近似80〜100〇/〇之光所入射之積光器透鏡74之入射 面為止之各光軸L之距離達到大致恆定。因此，藉由使用 卡S81 ’而無需對支持體82實施較大之曲面加工，便可將 所有光源部73之照射面配置於單一之曲面上。 具體而言，支持體82之複數個卡匣安裝部9〇，係分別具 備卡匣81之光源支持部8 3所面對之開口部9 〇 a、及與形成 於光源支持部83之周圍之平面部抵接之平面9〇b，且於特 定之方向上排列之複數個卡匣安裝部9〇之各平面9〇b，係 以特定之角度交叉，因而，卡匣安裝部9〇可以簡單之加 工’而形成為特定數之光源部73之光所照射之各照射面、 與積光器透鏡74之入射面為止之各光轴[之距離達到大致 值定。 又，支持體82之卡£安裝部9〇，係形成於以平面9〇b為 底面之凹部90c，且卡匣81，係嵌合於卡匣安裝部9〇之凹 部90c，因此，可將卡匿81無空檔地固定於支持體82。 又，卡匣81，係具有於包圍由光源支持部83支持之特定 數之光源部73之狀態下安裝於光源支持部之燈座罩， 且於光源支持部83與燈座罩84之間之收納空間内，鄰接之 光源部73之反射鏡72之背面72c直接對向，因此，於收納 空間内賦予良好之空氣流動性，故可於冷卻各光源部” 153878.doc -30- 201214052 時’有效地將收納空間内之空氣排出。 又，於燈座罩84，形成有連通收納空間與燈座罩84之外 部之連通孔84a，因此，可以簡單之構成將空氣排出至卡 匣81之外部。 進而，於支持體82，設置有供冷卻水循環之水冷管 91a，以冷卻各光源部73，因此，可藉由冷卻水來有二地 冷卻各光源部73。 又’由於設置有自後方以及側方之至少一方，對各光源 部73之光所照射之各照射面強制排出支持體82内之空氣之 吹風機單元79，因此，可使支持體82内之空氣進行循環， 從而有效地冷卻各光源部73。 又，由於因進行曝光之品種（著色層、麵、感光性間隔 物、光配向膜、TFT層等）、或者同品種中之光阻劑之種類 不同，所需之曝光量不同，因此，如圖2〇所示，有時不必 將卡匣81全部安裝於支持體82之複數個卡匣安裝部9〇。於 該情形時，於未配置卡匣81之卡匣安裝部9〇,安裝有蓋構 件89，且於蓋構件89，以與遮罩玻璃85之貫通孔85&相同 之直徑，形成有相同個數之貫通孔89a。藉此，外部之空 氣，不僅由遮罩玻璃85之貫通孔85a吸入，而且由蓋構件 89之貫通孔89a吸入。因此，即便卡匣81未安裝於所有卡 E安裝部90,亦可藉由配置蓋構件89,而賦予與卡匡“配 置於所有卡E安裝部90之情形相同之空氣之流動性，從而 實施光源部73之冷卻。 再者，為了確實地冷卻各光源部73，而可於卡£81或蓋 153878.doc 201214052 將光照射裝 構件89未安裝於所有卡匣安裝部90之狀態下， 置80閉鎖使之無法運行。 再者’上述實施形態，為簡化 向為3段且β方向為2行之共計 W舉*裝有《方 但實際上，配置於卡先原。”3之卡㈣為例， 罝於卡E81之光源部73為8個以上，且 圖21(a)及⑻所示之配置，以點對稱或線對稱安裳“ 。且亦：：方向及β方向上以不同之數目配置光源部 3’且以四邊料安裝財g8i之絲支 外周之光源部"之中心而成之線呈現長方形形狀。又 裝有各卡㈣之A持體82之卡g安裝部⑽，如圖Μ所示， 使配置於相互正交之α、β方向上之各個數n(n: 2以上之正 整數）一致而形成為長方形形狀。此處，該長方形形狀係 於對應於下述積光器元件之各透鏡元件之每-十字交叉之 入射開角比，且使卡匿之列數、行數為相同數目之情形 時最為有效，但亦可為不同之數。 處積光器透鏡74之各透鏡元件之縱橫比（縱/橫比）， 係對應於曝光區域之範圍内之縱橫比而決^。，積光器 透鏡之各個透鏡元件，成為無法擷取自該入射開口角以上 之角度入射之光的構造。亦即，透鏡元件係相對於長邊 側，短邊側之入射開口角變小。因此，可藉由形成使配置 於支持體82之光源部73整體之縱橫比（縱/橫比）對應於積光 器透鏡74之入射面之縱橫比之長方形形狀之配置，而使光 之使用效率變得良好。 如此構成之連續分階近接曝光裝置PE，係根據所需之照 153878.doc •32· 201214052 度，藉由光學控制部76而對每一卡匣81進行各光源部73之 燈71之點亮、熄滅或電壓控制，藉此使照度產生變化。亦 即，光學控制部76,係以各卡£81内之特定數之光源部Μ 之燈71以點對稱點亮之方式進行控制，並且以複數個卡匣 8 1之特定數之光源部73之燈7丨以相同之點亮圖案進行點對 稱點亮之方式進行控制，藉此，支持體82内之所有光源部 73點對稱地點亮。例如，圖23(a)，係表示各卡g 81之 100/。之燈71(本實施形態中為24個）點亮之情形，圖23沙)係 表示各卡厘81之所有燈71之75%(本實施形態中為^個）點 π之If形，圖23(c)係表示各卡匣“之所有燈了丨之別％(本 實施形態中為u個）點亮之情形，圖29⑷係表示各卡g8i 之所有燈71之25%(本實施形態中為6個）點亮之情形。藉 此，無需改變曝光面之照度分佈，便可使照度產生變化， 又，由於對每一卡g同時進行控制，因此，可易於控制燈 71之點亮，而與基板之大小（時代）變更或燈數無關。 又，光學控制部76，係具有複數個（本實施形態中為3 個）之點亮圖案組，該複數個點亮圖案組係分別包含除了 全部點亮之情形以外，以點對稱控制根據所需之照度點亮 之燈7丨之數分別不同之卡g81内之各光源部73之燈71之點 亮或熄滅之複數個（本實施形態中為4個）之點亮圖案。具體 而吕，如圖24(a)所示，使卡匣81内之75%之燈了丨點亮之第 1圖案組，係具有A卜01之4個圖案。又，如圖24(b)所示， 使卡S81内之5〇%之燈71點亮之第2圖案組，係具有μ, 之4個圖案。進而’如圖24(c)所示，使卡匣以内之之 153878.doc •33· 201214052 ’且點儿之第3圖案組，係具有A3〜D3之4個點亮圖案。該 等各點亮圖案A1〜D卜A2〜D2、幻〜⑺均設定為使卡㈣ 内之燈71點對稱點亮。再者，於圖23及圖㈣，光源部η 中才示上影線者表示熄滅之燈71。 而且，光學控制部76，係根據所需之照度，選擇第卜第 3點焭圖案組之任一點亮圖案組，並且選擇經選擇之點亮 圖案組中之任_點亮圖案。該點亮圖案之選擇，亦可以# 疋之時序於複數個jg81内同時依序切換所選擇之點亮圖 案組之複數個點亮圖案。或者，該選擇，亦可基於各光源 部73之燈71之點亮時間’具體而言，選擇點亮時間最少之 點亮圖案。可藉由如此之點亮圖案之切換或選擇，而使燈 之點亮時間均勻。 再者，所謂點亮時間最少之點亮圖案，既可為包含點亮 時間最少之光源部73之燈71的點亮圖案，亦可為可點亮之 光源部73之燈71之點亮時間合計最少之點亮圖案。進而， 光學控制部76，亦可基於各光源部73之燈71之點亮時間、 以及點亮時所供給之電壓，計算各光源部73之燈71之剩餘 辱命，並基於該剩餘壽命，選擇點亮圖案。進而，亦可以 避開包含剩餘壽命短之燈71之點亮圖案之方式，切換點亮 圖案。 又，當所需之照度，與由第1〜第3點亮圖案組所得之照 度不同時’選擇能夠獲得與所需之照度接近之照度之點亮 圖案組，並且’將供給至點亮之光源部73之燈71之電壓調 整為額定以上或額定以下。例如，於所需之照度為1〇〇% 153878.doc -34 - 201214052 點7C時之6〇%之照度之情形時，選擇5〇%點亮之點亮圖案 、-且之任一點壳圖案，將該點亮之光源部之燈71之電壓提 尚，藉此賦予所需之照度。 *進而，於若將所有卡匣81之點亮之燈71之電壓調整為相 等，則偏離所需之照度之情形時，可一面將點對稱配置之 位置之各卡£81之燈71之電壓調整為相等，一面根據卡匿 81之位置’施加不同之電壓。具體而言，於圖23中，一面 將位於周圍之各卡匣81之燈71之電壓調整為相等，一面將 位於中央之卡匣81之燈之電壓，調整為與位於周圍之各卡 匣81之燈71之電壓不同。藉此，不必改變曝光面之照度分 佈’亦可微調為所需之照度。 又，於僅將一部分之卡匣81，歸還為具備新燈71之卡匣 81之情形時，與剩餘之卡匣81之燈71之點亮一併，使經更 換之卡H 81之燈71點對稱地點亮。此時，存在自新卡匿8 ^ 之燈71出射之照度強於自剩餘之卡匣81之燈71出射之照度 向因此，以使新卡匣81之各燈71之電壓下降之方式 進行調整’使得自點對稱g己置之位置之各卡匿Η之燈^出 射之照度達到均勻。 因此，根據本實施形態，可藉由根據所需之照度，僅使 所需之燈71點亮’而抑制耗電，又，無需_滤光片等之 學零件，從而可實現成本縮減，並且可藉由點對稱地使燈 7】點亮或媳滅，而防止曝光面之照度分佈低下。進而，由 於每一卡Et點對稱地使燈71點亮或熄滅，因此，可易於 控制燈71之點亮’而與基板之大小（時代）變更或燈之數量S 153878.doc • 27- 201214052 The road twist 75a' cools each light source unit 73 by air. Further, as the forced exhaust mechanism, the blower unit 79 may be used, and the air in the support body 82 may be extracted by a fan, an inverter, a vacuum pump or the like. Further, the air exhaust by the blower unit 79 is not limited to the rear, and may be performed from either the upper side, the lower side, the left side, or the right side. As shown in Fig. 17, a plurality of exhaust pipes 79a connected to the side of the support may be connected to the blower unit 79 via the damper 79b. Further formed in the vent hole 84a of the lamp holder cover 84, a plurality of holes may be formed on the bottom surface as shown in FIG. 5(c), or may be formed at the center of the bottom surface as shown in FIG. 18(a), or as shown in FIG. 8(b) and (C), the side surface formed in the longitudinal direction and the short side direction, in addition to forming the vent hole 8 4 a, may also form a communication groove cut from the opening edge of the lamp holder cover 84. Thereby, the storage space between the light source support portion 83 and the socket cover 84 is communicated with the outside. Further, the socket cover 84 may have a skeleton structure including a plurality of bases, and the communication hole or the communication groove may be formed by additionally mounting a mask plate having a communication hole or a communication groove. Further, a water-cooling pipe (cooling controller) 91a is provided on the periphery of the support main body 91, and the cooling water is circulated in the water-cooling pipe 91a by the water pump 69, whereby the respective light source sections 73 can be cooled. Further, as shown in FIG. 4, the water-cooling pipe 91a may be formed in the support main body 91, or may be attached to the surface of the support main body 91, the vent type cooling structure, and the water-cooled cooling structure. Set any of them. Further, the water-cooling pipe 91a is not limited to the arrangement shown in Fig. 4, and as shown in Figs. 19(a) and 19(b), the water-cooling pipe 9la may be disposed so as to pass around the periphery of all the latches 81, or The water-cooling pipe 9ia is arranged in a zigzag manner so as to pass through a part of all the surrounding 匣 878 匣 匣 匣 匣 匣 匣 匣 匣 匣 匣 匣 匣 匣 匣 匣 匣 匣 匣 匣 匣 匣The exposure device PE thus constructed is in the illumination optical system 7A. If the exposure control shutter 78 is turned on during exposure, the beauties are super-high-dust: the light irradiated by the lamp 71 will be incident on the illuminator lens 74. The incident surface. Then, the light emitted from the exit surface of the self-aligning lens 74 is changed by the concave mirror and travels, and is converted into parallel light. Then, the parallel light is used as a light for pattern exposure, and the light is loaded by the mask. The mask m held by the stage 1G and the surface of the substrate w held by the substrate stage 20 are irradiated approximately perpendicularly, and the pattern P of the mask is exposed and transferred onto the substrate w. Here, the light source is replaced. At the time of the portion 73, each of the cards g81 is replaced. Each of the jams 8 has a light source unit 73, 1 in which the filaments are positioned in advance, and the wiring 97 from each of the light source units 73 is connected to the connector 98. After the light is emitted in the opposite direction, the card 81 to be replaced is removed, and the new cassette 81 is fitted into the recessed portion 9〇b of the support 82 to be attached to the support 82. , complete the alignment of the light source section in the card £81. ^, '2, by connecting the other wirings 99 to the connector 98, the wiring operation is also completed, so that the replacement of the light source unit 73 can be easily performed. Also, the cassette must be fixed when it is replaced. For this reason, a plurality of lamps (9 or more) are arranged in the card £81, and each of the cards has a large contribution to the illuminance distribution on the exposure surface. However, as described above, even if a plurality of cassettes are replaced, the operation is easier, and the replacement time itself can be shortened, so that the method is effective. Further, the card light source support unit 83 is formed as a specific number of light source units 153878. .doc -29· 201214052 73 The distance between each illumination surface irradiated by the light of a light source and the incident surface of the illuminator lens 74 on which the light of the light source part of the specific number is incident is substantially constant, and is supported. The plurality of cassette mounting portions 90 of the body 82 are formed by the respective illumination surfaces irradiated by the light of all the light source units 73 and the light of approximately 80 to 100 〇/〇 among the light irradiated from all the light source units 73. The distance between the optical axes L from the incident surface of the illuminator lens 74 is substantially constant. Therefore, by using the card S81', it is possible to illuminate all the light source portions 73 without performing large curved surface processing on the support 82. The surface is disposed on a single curved surface. Specifically, the plurality of cassette mounting portions 9 of the support 82 are respectively provided with the opening portion 9 〇a facing and formed by the light source supporting portion 83 of the cassette 81 Around the light source support portion 83 The flat surface 9〇b of the face abutting, and the planes 9〇b of the plurality of cassette mounting portions 9〇 arranged in a specific direction intersect at a specific angle, so that the cassette mounting portion 9〇 can be simple The distance between each of the irradiation surfaces irradiated with light of the specific number of light source units 73 and the incident surface of the light of the illuminator lens 74 is substantially constant. Further, the support 82 is stuck. The mounting portion 9A is formed in the recessed portion 90c having the flat surface 9〇b as the bottom surface, and the latch 81 is fitted into the recessed portion 90c of the cassette mounting portion 9〇. Therefore, the latch 81 can be fixed without a gap. In addition, the cassette 81 has a socket cover attached to the light source supporting portion in a state of surrounding the light source portion 73 supported by the light source supporting portion 83, and is provided in the light source supporting portion 83 and the socket. In the storage space between the covers 84, the back surface 72c of the mirror 72 adjacent to the light source unit 73 directly faces each other, so that good air fluidity is provided in the storage space, so that each light source unit can be cooled" 153878.doc - 30- 201214052 'Effectively discharges air from the storage space. Further, since the socket cover 84 is formed with the communication hole 84a that communicates with the housing space and the outside of the socket cover 84, the air can be easily discharged to the outside of the cassette 81. Further, the support body 82 is provided with a water-cooling pipe 91a for circulating cooling water to cool the respective light source portions 73. Therefore, the respective light source portions 73 can be cooled by the cooling water. Further, since at least one of the rear side and the side side is provided, the air blower unit 79 for forcibly discharging the air in the support body 82 to the respective irradiation surfaces irradiated with the light of the respective light source units 73 allows the air in the support body 82 to be made. The circulation is performed to effectively cool the respective light source sections 73. Further, since the type of exposure (colored layer, surface, photosensitive spacer, photo-alignment film, TFT layer, etc.) or the type of photoresist in the same type is different, the required exposure amount is different, and therefore, As shown in FIG. 2A, it is not necessary to attach all of the cassettes 81 to the plurality of cassette mounting portions 9 of the support body 82. In this case, the cover member 89 is attached to the cassette mounting portion 9A where the cassette 81 is not disposed, and the cover member 89 has the same diameter as the through hole 85& of the cover glass 85. Through hole 89a. Thereby, the outside air is sucked not only by the through hole 85a of the mask glass 85 but also by the through hole 89a of the cover member 89. Therefore, even if the cassette 81 is not attached to all of the card E attachment portions 90, the cover member 89 can be disposed, and the fluidity of the same air as that disposed in the case of all the card E attachment portions 90 can be imparted. Cooling of the light source unit 73. Further, in order to reliably cool the respective light source units 73, the light illuminating member 89 may be attached to all of the cassette mounting portions 90 at the card 81 or the cover 153878.doc 201214052. In the above-mentioned embodiment, in order to simplify the three-segment and the β-direction is two rows, the total number of W is *there is "square but actually, it is placed in the card first." 3 card (4) For example, the light source unit 73 of the card E81 is eight or more, and the arrangement shown in Figs. 21(a) and (8) is point-symmetric or line-symmetric. "And also: the direction and the beta direction are different. The number of the light source unit 3' is arranged in a rectangular shape, and the line formed by the center of the light source portion of the wire peripheral portion of the wire g8i is placed in a rectangular shape. The card g mounting portion (10) of the A holding body 82 of each card (4) is mounted. As shown in FIG. ,, the numbers n (n: 2 or more) arranged in the mutually orthogonal α and β directions are arranged. A positive integer is formed in a rectangular shape. Here, the rectangular shape is an incident-angle ratio of each cross-correlation of each lens element corresponding to the following illuminator element, and the number of rows and rows of the occlusion is made. The number of the same number is most effective, but can also be different. The aspect ratio (vertical/horizontal ratio) of each lens element of the illuminator lens 74 corresponds to the aspect ratio within the range of the exposed area. In the lens element of each of the illuminator lenses, the light incident from the angle above the incident opening angle is not obtained. That is, the lens element is incident on the short side with respect to the long side. Therefore, it is possible to form an arrangement in which the aspect ratio (vertical/horizontal ratio) of the entire light source unit 73 disposed on the support 82 corresponds to the aspect ratio of the incident surface of the illuminator lens 74. The light use efficiency becomes good. The continuous stepped proximity exposure device PE thus constructed performs light source for each cassette 81 by the optical control unit 76 according to the required illumination 153878.doc • 32·201214052 degrees. Department 73 Illumination, extinction, or voltage control of 71 causes the illuminance to change. That is, the optical control unit 76 performs the point-symmetric illumination of the lamp 71 of the specific number of light source units within each of the cards 81. Control, and the lamp 7' of the light source unit 73 of the specific number of the plurality of cassettes 81 is controlled to be point-symmetrically illuminated by the same lighting pattern, whereby all the light source units 73 in the support 82 are controlled. For example, Fig. 23(a) shows a case where the light 71 of each of the cards g 81 (24 in the present embodiment) is lit, and Fig. 23 (b) shows each of the calipers 81. 75% of all the lamps 71 (in the present embodiment, ^) are π-shaped as the shape of FIG. 23(c), and FIG. 23(c) shows the points of all the lamps (all of the lamps in the present embodiment). In the case of being bright, Fig. 29 (4) shows a case where 25% (six in the present embodiment) of all the lamps 71 of the respective cards g8i are lit. Thereby, the illuminance can be changed without changing the illuminance distribution of the exposure surface, and since each card g is simultaneously controlled, the lighting of the lamp 71 can be easily controlled, and the size of the substrate (era) can be changed. Or the number of lights has nothing to do. Further, the optical control unit 76 has a plurality of lighting pattern groups (three in the present embodiment), and the plurality of lighting pattern groups respectively include point symmetry control in addition to all lighting conditions. A plurality of (four in the present embodiment) lighting patterns of the lamps 71 of the respective light source units 73 in the card g81 are different in the number of lamps that are required to be illuminated. Specifically, as shown in Fig. 24(a), the first pattern group in which 75% of the lamps in the cassette 81 are lit and illuminated has four patterns of A Bu 01. Further, as shown in Fig. 24 (b), the second pattern group in which the lamp 71 of the card S81 is lit is provided with four patterns of μ. Further, as shown in Fig. 24(c), the third pattern group of 153878.doc • 33·201214052 ' and the third pattern group having A3 to D3 is provided. Each of the lighting patterns A1 to Db, A2 to D2, and Magic to (7) are set such that the lamps 71 in the card (4) are symmetrical. Further, in Fig. 23 and Fig. 4, the light source unit η indicates that the upper hatch indicates the extinguishing lamp 71. Further, the optical control unit 76 selects one of the lighting pattern groups of the third dot pattern group according to the required illuminance, and selects any of the selected lighting pattern groups. The selection of the lighting pattern may also sequentially switch the plurality of lighting patterns of the selected lighting pattern group in a plurality of jg81 at the timing of #疋. Alternatively, the selection may be based on the lighting time of the lamp 71 of each of the light source units 73. Specifically, the lighting pattern having the least lighting time is selected. The lighting time of the lamp can be made uniform by switching or selecting such a lighting pattern. Further, the lighting pattern having the least lighting time may be a lighting pattern of the lamp 71 including the light source unit 73 having the lowest lighting time, or a lighting time of the lamp 71 of the light source unit 73 that can be illuminated. A minimum of lighting patterns. Further, the optical control unit 76 may calculate the remaining insults of the lamps 71 of the respective light source units 73 based on the lighting time of the lamps 71 of the respective light source units 73 and the voltage supplied during lighting, and select based on the remaining life. Light up the pattern. Further, it is also possible to switch the lighting pattern so as to avoid the lighting pattern including the lamp 71 having a short remaining life. Further, when the required illuminance is different from the illuminance obtained by the first to third lighting pattern groups, 'the lighting pattern group capable of obtaining the illuminance close to the desired illuminance is selected, and 'will be supplied to the lighting. The voltage of the lamp 71 of the light source unit 73 is adjusted to be equal to or higher than the rated value. For example, when the required illuminance is 1〇〇% 153878.doc -34 - 201214052, 7C% of the illuminance of 6〇%, select 5〇% of the lighting pattern, and any one of the shell patterns The voltage of the lamp 71 of the light source portion is raised to provide the desired illuminance. * Further, if the voltages of the lamps 71 of all the latches 81 are adjusted to be equal, the voltage of the lamp 71 of each card at the position of the point symmetrical arrangement can be set while deviating from the required illuminance. Adjusted to be equal, while applying different voltages depending on the position of the card 81. Specifically, in Fig. 23, the voltage of the lamp 71 located at the center of each of the cassettes 81 is adjusted to be equal, and the voltage of the lamp at the center of the card 81 is adjusted to be adjacent to each of the cassettes 81 located there. The voltage of the lamp 71 is different. Thereby, it is not necessary to change the illumination distribution of the exposure surface, and it is also possible to fine tune the desired illumination. Further, when only a part of the cassette 81 is returned to the cassette 81 having the new lamp 71, the lamp 71 of the replaced card H 81 is replaced with the lighting of the lamp 71 of the remaining cassette 81. The dots illuminate symmetrically. At this time, the illuminance emitted from the lamp 71 of the new card 8 is stronger than the illuminance of the lamp 71 from the remaining card 81, so that the voltage of each of the lamps 71 of the new cassette 81 is lowered. 'Improve the illumination of the light from the position where the point symmetry g has been placed. Therefore, according to the present embodiment, it is possible to suppress the power consumption by merely lighting the required lamp 71 in accordance with the required illuminance, and it is possible to reduce the cost by eliminating the need for a component such as a filter. The illuminance distribution of the exposure surface can be prevented from being lowered by illuminating or annihilating the lamp 7 by point symmetry. Further, since the lamp 71 is turned on or off symmetrically with respect to each card Et, it is possible to easily control the lighting of the lamp 71 and the size of the substrate (era) or the number of lamps.

S 153878.doc -35- 201214052 無關。 又’控制部76，係包含卡匣内之特定數之光源部73中點 亮之光源部73之燈71之數不同之複數個點亮圖案組，並 且’各點亮圖案組，係分別包含光源部73之燈7丨點對稱地 點亮之複數個點亮圖案A1〜Dl、A2〜D2、A3〜D3，因此， 可藉由切換使用點亮圖案’而使卡匣81内之各燈71之點宾 時間均一化。藉此，各光源部73之燈71之使用頻度中偏差 消失，卡匣81至更換為止之間隔變長，故可縮短光源部 之更換引起之裝置之停機時間。 進而，更包含對各光源部之燈71之點亮時間進行計時之 計時器96a，且光學控制部76，根據所需之照度，選擇複 數個點亮圖案組之任一個，並且於經選擇之點亮圖案中， 基於光源部73之點亮時間選擇點亮圖案，因此，可使卡匣 81内之各燈71之點亮時間均一化。 此外，於所需之照度，與由複數個點亮圖案組所得之照 度不同時，選擇獲得與上述所需之照度接近之照度之點亮 圖案組，並且調整供給至點亮之光源部中之電壓，因此二 可任意設定照度’而與點亮圖案無關。 再者，作為燈71之點亮或熄滅之控制，亦可藉由對利用 未圖示之照度計測定之實測照度與預設之合理照度進行比 較，而判定實測照度之過剩與不足，並且以提昇燈以之電 壓之方式，對控制電路96或光學控制部76進行控制以消 除實測照度之過剩與不足。 ' 又，於本實施形態中，當使用濾光片等光學零件時，以 153878.doc -36 - 201214052 改善因濾光片而低下之照度分佈之方式，提昇燈”之電壓 或者電力即可^ 進而，本實施形態，係光光學控制部76,控制供給至燈 71之電壓，但亦可控制電力。 立 再者，本實施形態，係、表示各卡g81中之特定數之㈣ 點對稱地點亮，且支持體82内之所有燈71點對稱地點亮之 情形，而包括下述實施形態在内，本發明，亦於各卡 内之特定數之燈71近似旋轉對稱地點亮之情形時，進而， 支持體82内之所有燈71近似旋轉對稱地點亮之情形時，起 到與本實施形態相同之效果。又，所謂旋轉對稱地點亮， 係指360度/η度旋轉時，與旋轉前之點亮圖案重合之位置 之燈71點焭，本發明，係不僅包括因卡匣81内或支持體μ 内之燈71之排列而使點亮部位略微偏離之情形，亦包括近 似旋轉對稱（旋轉180度時近似點對稱）地點亮之情形。 此外，本實施形態，係光學控制部76，以各卡匣以内之 特定數之燈7 1近似旋轉對稱地點亮之方式對每一卡匣8工進 行控制，但亦可如圖25(a)以及（b)所示，以使以相互相等 數目之燈71為單位成為近似旋轉對稱（此處為點對稱）之位 置之燈71交替地點亮之方式進行控制，且，以使各卡匣81 之特定數之燈71以相同之點亮圖案同時點亮之方式進行控 制，藉此，使所有燈71中成為近似旋轉對稱之位置之燈71 交替地點亮。藉此，無需改變曝光面之照度分佈，便可使 照度產生變化，從而防止曝光不均。 又，該情形時所謂使成為近似旋轉對稱之位置之燈71交 153878.doc -37- 201214052 替地點亮，亦包括與成為旋轉對稱之位置之燈71略微偏離 之部位之燈71交替地點亮之情形。 (第2實施形態） 其次，作為本發明之第2實施形態，對使用第丨實施形態 之連續分階近接曝光裝置PE之曝光方法進行說明。再者， 本實施形態之曝光裝置，因基本性構成與第丨實施形態之 曝光裝置相同，故對同一部分或者類似部分標註同一符 號，並省略說明。 上述實施形態之連續分階近接曝光裝置PE,可藉由改變 光照射裝置80之照度，而應對各種光阻劑之感光度特性。 曝光1： ’可由照度與¥間之積而算出，因此，可藉由變更 照度之時間，而獲得合理之曝光量，但為縮短節拍時間， 已將時間設定為較短’故難以進一步變更時間。因此，藉 由變更照度來獲得合理之曝光量’故而，通常使用減光 (ND)濾光片等’實現低照度。於該情形時，導致產生多餘 之耗電，又，需要ND濾光片等光學零件。 因此，本實施形態，係根據所需之照度，藉由光學控制 部76來對各光源部73之燈71單獨地進行點亮、熄滅、或電 壓控制，藉此，使照度產生變化。例如，可藉由將各燈71 之電壓控制為額定以下，即便不改變照度，亦可使燈7丨之 部为熄滅’藉此，不必使照度產生變化。又，於藉由使 燈71點亮或熄滅，而控制照度之情形時，可藉由使所配置 之燈71線對稱或者點對稱地點亮，而無需改變曝光面之照 度分佈，亦可使照度產生變化。 153878.doc • 38 - 201214052 具體而言’既可如圖26(a)以及（b)所示，於每一卡g81 内之燈71，對線A線對稱地使燈71點亮或熄滅，亦可如圖 27(a)所示，以使卡匣81内之燈Η全部點亮或熄滅之方式， 對線A線對稱地於每一卡匣中使燈7丨點亮或熄滅。再者， 亦可如圖27(b)所示，於每一卡匣81中，對線B使燈7ι線對 稱或者對點Q使燈71點對稱地點亮或熄滅。又，於α、p方 向上配置之卡匣81之個數為偶數之情形時，亦可如圖28(勾 及（b)所示，於每一卡g81中對點Q使燈71點對稱地點亮或 熄滅。再者，於圖26〜圖28中，對光源部73標上影線者^係 表示媳滅之燈71。 ，根據本實施形態，可藉由根據所需之照度，使曾 要最低限度之燈71點亮，來抑制耗電，又，無需_彩; 慮先片等光學零件，故可實現成本縮減，並且可 稱或點對稱地使燈71點亮或熄滅，而防止曝光^昭产广 再者，燈71，可藉由以包括點對稱在内以旋 分佈低下之效果。亦即，當以特定二止广之照度 時，口要h古 田乂特疋之點為中心旋轉一次 點冗部位一致之點亮/總滅控制即可，例如， 時，亦！之個數將燈71配置成正方形形狀之情形 再者，作點亮部位達到一致之情形。 未圖示之^或熄減之控制，亦可藉由將利用 較，而之實測照度與預設之合理照度進行比 或熄滅之方’:、、度之過剩與不足’並且’以使燈71點亮 …對控制電路96或光學控制部76進行控制， I53878.doc •39. 201214052 以消除實測照度之過剩與不足。進而，亦可以對曝光時間 進行計時，以利用曝光時序使各燈71點亮或熄滅之方式進 行控制，以維持預設之合理照度。 又’本實施形態，可使所需最低限度之燈7丨點亮，且無 需彩色濾光片等光學零件，而於使用濾光片之情形時，以 改善因濾光片而低下之照度分佈之方式，使燈71點亮即 可。 (第3實施形態） 其次’作為本發明之第3實施形態，係參照圖29，對光 照射裝置80之燈71點亮或熄滅之控制方法之一例進行說 明。再者，本實施形態之曝光裝置，因基本性構成與第i κ鈿形態之曝光裝置相同，故對相同部分或類似部分標註 同一符號，並省略說明^ 本貫施形態，係如圖29所示，於可同步點亮/熄滅之燈 71中，利用時間管理點亮之燈71之區域，且於曝光動作過 程中’或非曝光動作過程中（例如’基板裝載過程中或照 射期間）’以特定之時序依序使該區域產生變化。又，亦 於該障形時，與第1實施形態相同，以曝光面之照度分佈 不產生變化之方式，於每一卡匣81内之燈71中，對點Q使 燈71點對稱地點壳或熄滅。藉此，可一面維持均勻之照 度 面易於官理點亮/熄滅，而不會使燈71之使用頻度 偏差又，上述特定之時序，宜為快門關閉之時序，且該 區域亦可為線對稱。 再者，作為各超高壓水銀燈之燈7】，係若通電則緩慢使 153878.doc 201214052 照度上升’成為點亮狀態，或者若斷電，則缓慢使昭产下 降’成為熄滅狀態。因此，於例如自圖29⑷轉移、= 释)之狀態時，實際存在有受難亮控制之燈㈣受到媳 滅：制之燈71均點亮之時序。因此，既可考慮如此之轉移 β β…度控制點免/熄滅時序，或者，亦可使用未圖 示之快門，切換燈71之點亮/熄滅。 (第4實施形態） ’基於圖式，對曝光 、以及曝光裝置及曝 其次，作為本發明之第4實施形態 裝置用光照射裝置及其點亮控制方法 光方法進行詳細說明。 再者本貫把形態之曝光裝4，因基本性構成與第1 施形態之曝光裝置相同’故對相同部分或類似部分標註同 一符號，並省略說明。 如圖3〇所不，本實施形態，係於凹面鏡77之一部分，形 成有開n77a’且於開n77a之後方，設置有敎§線、h 線、i線、j線、k線等中之各波長之照度之各照度計279。 又’如圖31及32所示，於卡£81，在與預期之㈣對應 之前面’配置有波長截止渡光片286。作為波長截止滤光 片286，既可為低通濾光片、高通濾光片、及帶通濾光片 之任一者，亦可為減小預期波長之強度之ND(減光）濾光 片。再者，波長截止濾光片286，宜為點對稱設置，且該 實施形態中，係安裝於上段之6個燈與下段之6個燈（圖31 及32之斜線部分）。藉此，於卡匣81，構成有分光特性不 同之2種光源部73。以下，將安裝有波長截止彩色濾光片 £ 153878.doc 41 201214052 286之光源部73稱為附帶濾光片之光源部73A ’將不具有波 長截止滤光片286之光源部73稱為無濾光片之光源部73B。 又’光學控制部76，係預先測定附帶濾光片之光源部 73A與無渡光片之光源部73B之各分光特性，尤其測定各 波長之峰值高度，並作為資料庫進行保存。再者，光源部 73 A、73B，若持續使用燈7丨則分光特性將產生變化，因 此，於不進行曝光之狀態下，預先測定各光源部73 A、 73B之各波長中之照度。 如此構成之光照射裝置80，係依據由照度計279測定之 結果，並參照資料庫，決定各光源部73 A、73B之點亮之 燈71之功率及個數。此處，於點亮之燈71之個數較多之情 形時，即便燈71之熄滅方法並非為近似旋轉對稱，對曝光 面照度分佈之影響亦較小，而於點亮之燈71之個數較少之 情形時，例如，當216燈之燈71之5〇%左右熄滅之情形 時，燈71之熄滅方法若並非為近似旋轉對稱，則有在曝光 面照度分佈變差之可能性。因此，如圖31所示，附帶濾光 片之光源部73A、及無濾光片之光源部73B，宜為分別以 達到近似旋轉對稱（此處為點對稱）之方式使燈Η點亮。 自水銀燈71中出射之光，-般而言為非相干光，且於穿 過包含積光器透鏡74、及反射鏡77等之照明光學系統，到 達曝光面時’其強度’以每一波長之和提供。可藉由設置 附帶遽光片之光源部73A與無滤光片之光源部7把，而— 疋程度地控制各波長中之分光強度比。 此處’於使用分光特性不同之2種燈之情形與於分光特 153878.doc -42· 201214052 性相同之燈中設置波長截止濾光片之情形下，實施照度之 測定試驗。具體而言，使用分光特性不同之2種燈之試 驗’係於使用4個燈的第1燈之情形、使用短波長側之強度 強於該第1燈之4個燈的第2燈之情形、使用2個燈的第1燈 以及2個燈的第2燈之情形下，進行照度測定。又，設置有 波長截止濾光片之試驗’係於使用4個燈的第2燈且未安裝 波長截止濾光片之情形、將波長截止濾光片安裝於2個燈 之情形、將波長截止遽光片安裝於4個燈之情形下，進行 照度測定。使用2種燈時之結果示於表丨，設置有波長截止 濾光片時之結果示於表2。 再者’作為用於本試驗之照度計，係使用牛尾電機股份 公司製之紫外線累積曝光計UIT_25〇 ’且受光部使用365 nm測疋用受光器UVD-S365、313 nm測定用受光器UVD_ S313 ’於該等受光部測定200 mmx200 mm之曝光面中心部 之1線（365 nm)與j線（313 nm)之強度。 其結果，如表1及表2所示，可知悉藉由變更DUV渡光片 之個數’便可與變更燈之種類之情形相同，變更各波長中 之強度。 [表1] 照度(mW/cm2) 365(nm) 313(nm) 第1燈4個 40.5 15.9 第2燈4個 34.9 23.0 第1燈2個 第2燈2個 37.8 19.4 153878.docS 153878.doc -35- 201214052 Nothing. Further, the control unit 76 includes a plurality of lighting pattern groups in which the number of the lamps 71 of the light source unit 73 that is lit in the light source unit 73 of the specific number in the cassette is different, and each of the lighting pattern groups includes Since the lamp 7 of the light source unit 73 illuminates the plurality of lighting patterns A1 to D1, A2 to D2, and A3 to D3 in a point symmetrical manner, the lamps 71 in the cassette 81 can be replaced by switching the lighting pattern ' The guest time is uniform. As a result, the variation in the frequency of use of the lamps 71 of the respective light source units 73 disappears, and the interval between the cassettes 81 and the replacement becomes long, so that the down time of the apparatus caused by the replacement of the light source unit can be shortened. Furthermore, the timer 96a for counting the lighting time of the lamp 71 of each light source unit is further included, and the optical control unit 76 selects one of a plurality of lighting pattern groups according to the required illuminance, and selects one of the plurality of lighting pattern groups. In the lighting pattern, the lighting pattern is selected based on the lighting time of the light source unit 73, so that the lighting time of each of the lamps 71 in the cassette 81 can be made uniform. Further, when the required illuminance is different from the illuminance obtained by the plurality of lighting pattern groups, the lighting pattern group having the illuminance close to the required illuminance is selected, and the adjustment is supplied to the lighting source portion. The voltage, therefore, can be arbitrarily set to illuminance' regardless of the lighting pattern. Furthermore, as the control for turning on or off the lamp 71, it is also possible to determine the excess and deficiency of the measured illuminance by comparing the measured illuminance measured by an illuminometer not shown with the preset illuminance. The lamp controls the control circuit 96 or the optical control unit 76 in a manner to eliminate excess and deficiency of the measured illuminance. In addition, in the present embodiment, when an optical component such as a filter is used, the illuminance distribution of the lamp can be improved by 153878.doc -36 - 201214052 to improve the illuminance distribution due to the filter. Further, in the present embodiment, the optical optical control unit 76 controls the voltage supplied to the lamp 71, but it is also possible to control the electric power. In the present embodiment, the present embodiment is a (four) point symmetrical position indicating a specific number of each card g81. Bright, and all the lamps 71 in the support 82 are symmetrically lit, and the present invention includes the following embodiments, and when a specific number of lamps 71 in each card are illuminated in approximately rotational symmetry, Further, when all of the lamps 71 in the support 82 are illuminated in a substantially rotationally symmetrical manner, the same effect as in the present embodiment is obtained. Further, the rotation is symmetrically rotated, and is referred to as 360 degree/η degree rotation, and before rotation. The lamp at the position where the lighting pattern coincides is 71. The present invention includes not only the case where the lighting portion is slightly deviated from the arrangement of the lamps 71 in the inner casing 81 or the supporting body μ, but also the approximate rotational symmetry ( Rotate 180 In the present embodiment, the optical control unit 76 controls each of the cassettes so that the specific number of lamps 7 1 within each of the cassettes are approximately rotationally symmetrically illuminated. However, as shown in FIGS. 25(a) and (b), the lamps 71 which are in a position of approximately rotational symmetry (here, point symmetry) in units of equal numbers of lamps 71 are alternately lit. Control, and the lamps 71 of the specific number of the respective latches 81 are simultaneously illuminated by the same lighting pattern, whereby the lamps 71 of the positions of the lamps 71 which are approximately rotationally symmetrical are alternately lit. Thereby, the illuminance can be changed without changing the illuminance distribution of the exposure surface, thereby preventing uneven exposure. In this case, the so-called lamp 71 which becomes the position of approximately rotational symmetry is 153878.doc -37-201214052 In the second embodiment, the second embodiment of the present invention is applied to the second embodiment of the present invention. In the exposure apparatus of the present embodiment, the basic configuration is the same as that of the exposure apparatus according to the second embodiment. Therefore, the same or similar parts are denoted by the same reference numerals. The description of the continuous stepped proximity exposure apparatus PE of the above embodiment can deal with the sensitivity characteristics of various photoresists by changing the illuminance of the light irradiation apparatus 80. Exposure 1: 'The product of illuminance and ¥ can be Therefore, it is possible to obtain a reasonable exposure amount by changing the illuminance time, but in order to shorten the takt time, the time has been set to be shorter, so it is difficult to change the time further. Therefore, by changing the illuminance, a reasonable exposure is obtained. The amount 'often, usually using a dimming (ND) filter or the like 'to achieve low illumination. In this case, excessive power consumption is generated, and optical components such as ND filters are required. Therefore, in the present embodiment, the light 71 of each light source unit 73 is individually turned on, off, or voltage-controlled by the optical control unit 76 in accordance with the required illuminance, whereby the illuminance is changed. For example, by controlling the voltage of each of the lamps 71 to be equal to or lower than the rated value, the portion of the lamp 7 can be turned off even without changing the illuminance, whereby it is not necessary to change the illuminance. Further, when the illuminance is controlled by turning the lamp 71 on or off, the illuminance can be made by illuminating the arranged lamp 71 in line symmetry or point symmetry without changing the illuminance distribution of the exposure surface. Make a difference. 153878.doc • 38 - 201214052 Specifically, as shown in Figures 26(a) and (b), the lamp 71 in each card g81 illuminates or extinguishes the lamp 71 symmetrically with respect to line A. Alternatively, as shown in Fig. 27(a), the lamp 7 may be turned on or off in a line symmetrical manner with respect to the line A so that all the lamps in the cassette 81 are turned on or off. Further, as shown in Fig. 27 (b), in each of the cassettes 81, the line 7 is symmetrical with respect to the line B or the point Q is made to illuminate or extinguish the lamp 71 with a point symmetry. Further, when the number of the cassettes 81 arranged in the α and p directions is an even number, the light 71 may be point-symmetric to the point Q in each of the cards g81 as shown in FIG. 28 (hook (b)). In addition, in Fig. 26 to Fig. 28, the light source unit 73 is marked with a hatching indicating the annihilator lamp 71. According to the present embodiment, it can be made according to the required illuminance. It has been necessary to light the minimum lamp 71 to suppress power consumption, and it is not necessary to use _ color; and optical components such as the first piece can be reduced, and the lamp 71 can be turned on or off symmetrically or symmetrically. To prevent exposure, the lamp 71 can be used to reduce the effect of the rotation by including the point symmetry. That is, when the illumination is specific to the second, the mouth is required to be For the center, it is sufficient to control the lighting/total-out control at the same time. For example, the number of the lamps 71 is arranged in a square shape, and the lighting portions are consistent. The control of the ^ or the extinction can also be compared by comparing the measured illuminance with the preset reasonable illuminance or The extinction ':, the excess and the insufficient 'and' to light the lamp 71 ... control the control circuit 96 or the optical control unit 76, I53878.doc • 39. 201214052 to eliminate the excess and deficiency of the measured illuminance. Furthermore, it is also possible to time the exposure time to control the illumination of each of the lamps 71 by the exposure timing to maintain a predetermined reasonable illumination. In this embodiment, the minimum required lamp 7 can be used. When the light is turned on, optical components such as color filters are not required, and when the filter is used, the lamp 71 can be turned on so as to improve the illuminance distribution which is lowered by the filter. (2) In the third embodiment of the present invention, an example of a method of controlling whether the lamp 71 of the light irradiation device 80 is turned on or off is described with reference to Fig. 29. Further, the exposure device of the present embodiment is basically The same configuration is applied to the same or similar parts, and the same reference numerals will be given to the same parts or the like, and the description will be omitted, as shown in Fig. 29, in which the lamp 71 can be synchronized/extinguished. in Using the time to manage the area of the illuminated lamp 71, and during the exposure operation or during the non-exposure action (eg, during the substrate loading process or during the illumination period), the region is sequentially changed at a specific timing. Also in the case of the baffle, in the same manner as in the first embodiment, in the lamp 71 in each of the cassettes 81, the lamp 71 is point-symmetrical to the point 71 in a manner of not changing the illuminance distribution of the exposure surface. Therefore, it is easy to illuminate/extinguish the uniform illumination surface without the frequency deviation of the lamp 71. The specific timing is preferably the timing of the shutter closing, and the area may also be In addition, as the lamp 7 of each ultra-high pressure mercury lamp, if the power is turned on, the illuminance of 153878.doc 201214052 is slowly turned "on", or if the power is turned off, the display is slowly turned "off". Therefore, in the state of, for example, the transition from Fig. 29 (4), the lamp (4) which is subjected to the light-diffusing control is actually extinguished: the timing at which the lamp 71 is lit. Therefore, it is possible to consider such a shift β β... degree control point free/extinguish timing, or it is also possible to switch the turn-on/off of the lamp 71 by using a shutter not shown. (Fourth Embodiment) A light irradiation device for a device and a lighting control method light method according to a fourth embodiment of the present invention will be described in detail based on the drawings, exposure, and exposure apparatus. In addition, the basic configuration is the same as that of the exposure apparatus of the first embodiment, and the same reference numerals will be given to the same parts or the like, and the description will be omitted. As shown in FIG. 3, in the present embodiment, one of the concave mirrors 77 is formed with an opening n77a' and is opened after n77a, and is provided with a 线 line, an h line, an i line, a j line, a k line, and the like. Each illuminance meter 279 of the illuminance of each wavelength. Further, as shown in Figs. 31 and 32, the wavelength cut-off light-passing sheet 286 is disposed on the front surface of the card (81) corresponding to the expected (four). As the wavelength cut filter 286, it may be either a low pass filter, a high pass filter, or a band pass filter, or an ND (dimmer) filter that reduces the intensity of an intended wavelength. sheet. Further, the wavelength cut filter 286 is preferably arranged in point symmetry, and in this embodiment, it is attached to the six lamps of the upper stage and the six lamps of the lower stage (the oblique lines of Figs. 31 and 32). Thereby, in the cassette 81, two types of light source units 73 having different spectral characteristics are formed. Hereinafter, the light source unit 73 to which the wavelength cut-off color filter is attached is referred to as a light source unit 73A with a filter, and the light source unit 73 having no wavelength cut filter 286 is referred to as a non-filter. The light source portion 73B of the light sheet. Further, the optical control unit 76 measures the spectral characteristics of the light source unit 73A with the filter and the light source unit 73B without the light-receiving sheet in advance, and particularly measures the peak height of each wavelength, and stores it as a data bank. Further, when the light source units 73 A and 73B continue to use the lamp 7 丨, the spectral characteristics are changed. Therefore, the illuminance at each wavelength of each of the light source units 73 A and 73B is measured in advance without exposure. The light irradiation device 80 configured as described above determines the power and the number of the lamps 71 that light up the respective light source units 73 A and 73B based on the results measured by the illuminance meter 279 and with reference to the database. Here, in the case where the number of the lamps 71 is large, even if the method of extinguishing the lamps 71 is not approximately rotationally symmetrical, the influence on the illuminance distribution of the exposure surface is small, and the lamps 71 are illuminated. In the case where the number is small, for example, when about 5 〇% of the lamp 712 of the 216 lamp is turned off, if the method of extinguishing the lamp 71 is not approximately rotationally symmetrical, there is a possibility that the illuminance distribution on the exposure surface is deteriorated. Therefore, as shown in Fig. 31, it is preferable that the light source unit 73A with the filter and the light source unit 73B without the filter light the respective lamps so as to achieve approximate rotational symmetry (here, point symmetry). The light emitted from the mercury lamp 71 is, in general, incoherent light, and passes through an illumination optical system including the illuminator lens 74, the mirror 77, and the like, and reaches its exposure surface with 'intensity' at each wavelength. The sum is provided. The light source intensity ratio in each wavelength can be controlled to a certain extent by providing the light source portion 73A with the phosphor sheet and the light source portion 7 without the filter. Here, in the case where the two kinds of lamps having different spectral characteristics are used, and the wavelength cut filter is provided in the lamp having the same spectroscopic characteristics as 153878.doc - 42 · 201214052, the illuminance measurement test is performed. Specifically, the test using two types of lamps having different spectral characteristics is based on the case where the first lamp of four lamps is used, and the case where the intensity of the short-wavelength side is stronger than the second lamp of the four lamps of the first lamp. In the case of using the first lamp of two lamps and the second lamp of two lamps, the illuminance measurement is performed. In addition, the test of setting the wavelength cut filter is based on the case where the second lamp using four lamps is not mounted and the wavelength cut filter is not mounted, and the wavelength cut filter is attached to the two lamps, and the wavelength is cut off. The illuminance measurement was performed in the case where the calender sheet was attached to four lamps. The results when using two types of lamps are shown in Table 丨, and the results when a wavelength cut filter is provided are shown in Table 2. In addition, as the illuminance meter used in the test, the ultraviolet light cumulative exposure meter UIT_25〇' manufactured by Oxtail Electric Co., Ltd. was used, and the light receiving unit UVD-S365 and the 313 nm measuring light receiver UVD_S313 were used for the light receiving unit. 'The intensity of the 1 line (365 nm) and the j line (313 nm) at the center of the exposure surface of 200 mm x 200 mm was measured in the light receiving portions. As a result, as shown in Tables 1 and 2, it can be understood that the intensity of each wavelength can be changed by changing the number of DUV light-emitting sheets as in the case of changing the type of the lamp. [Table 1] Illuminance (mW/cm2) 365 (nm) 313 (nm) 1st lamp 4 40.5 15.9 2nd lamp 4 34.9 23.0 1st lamp 2 2nd lamp 2 37.8 19.4 153878.doc

S -43 - 201214052 [表2] 照度(mW/cm2) 365(nm) 313(nm) 無DUV濾光片 34.9 23.0 DUV濾光片4個 32.1 1.02 DUV濾光片2個 33.5 11.7 如上所述，根據本實施形態之曝光裝置用光照射裝置8〇 以及曝光裝置PE，包含包括燈71與反射鏡72之特定數之光 源部73、及以使特定數之光源部73之光入射至積光器透鏡 74之入射面入射之方式支持光源部73之卡匣81，且特定數 之光源部73包含分光特性不同之2種光源部73。藉此，不 必更換光源部7 3 ’亦可自如地設定每一波長之強度。尤 其’特疋數之光源部7 3之各燈71係.分光特性相同，且特定 數之光源部73 ’於其一部分配置有波長截止彩色濾光片 286，藉此，構成分光特性不同之2種光源部73。藉此，無 需更換光源部73，又，不必使用分光特性不同之光源部， 便可自如地設定每一波長之強度。 又，由於具備複數個卡匣81，並且，更包含以使所有光 源部73之光入射至積光器透鏡74之入射面之方式，安裝複 數個卡㈣之支持體82，因此，可單元化管理燈71，縮短 燈”之更換時間以及裝置之停機時間，且，無需對燈”之 安裝零件實施較大之曲面加工係 囬加工便可將所有光源部73配置 於單一之曲面上。 進而’根據本實施形態之曝光裝置用光照射I置之點亮 153878.doc •44· 201214052 控制方法以及曝光方法，光照射裝置80，係不僅包含上述 複數個光源部73、複數個卡匣8 1、及支持體82，而且包含 配置於積光器透鏡74之下游側且測量與各波長對應之照度 之照度計279、及對各燈71之點亮/熄滅及照度進行控制之 光學控制部76。而且’光學控制部76，係以基於由照度計 279測軍之與各波長對應之照度，於特定之波長中獲得所 需之照度之方式，控制卡匣81内之各光源部73。藉此，可 使所需之燈71點亮，自如地設定曝光所需之波長成分中之 強度’故可延長燈71之壽命。 再者’上述實施形態’係使用丨種波長截止濾光片286， 構成分光特性不同之2種光源部73A、73B，但亦可如圖 33(a)及（b)所示’使用2種波長截止濾光片286a、286b，構 成分光特性不同之3種光源部73A1、73A2、73B。例如，3 種光源部73A1、73A2、73B，可如圖33(a)所示，以8: 8: 8構成，亦可如圖33(b)所示，以1〇 : 1〇 : 4構成。亦於該等 情形時，宜為點對稱地構成3種光源部73A1、73A2、 73B ’又’於藉由光學控制部76使圖33⑷之燈71熄滅之情 形時’如圖33(c)之影線部分所示，使之點對稱地熄滅即 "5J* 〇 又’上述實施形態，係光照射裝置80，將分別具有特定 數之光源部73之複數個卡匣81安裝於支持體82中使用，但 即便於光照射裝置80由卡匣81單體構成之情形時，亦可起 到本實施形態之效果。 又’上述實施形態’係使用波長截止濾光片286，構成 153878.doc -45- 201214052 刀光特}·生不同之複數種光源部73，且包含配置於積光器透 鏡74之下游側且測量與各波長對應之照度之照度計279、 控制各燈71之點亮/熄滅及照度之控制部76，控制部76， 係以基於由照度計279測量之與各波長對應之照度，於各 波長中獲得所需之照度之方式，控制卡㈣内之各光源部 73但本發明，係包括藉由分光特性不同之複數種燈7丨構 成複數種光源部73之情形在内，亦可起到相同之效果。 (第5實施形態） 其次，參照圖34〜圖39，對本發明第5實施形態之近接掃 描曝光裝置進行說明。 近接掃描曝光裝置1〇1，係如圖37所示，經由形成有圖 案P之複數個光罩Μ，對一面接近光罩“一面沿特定方向搬 送之近似矩形之基板W，照射曝光用光L，從而將圖案ρ曝 光轉印至基板w。亦即，該曝光裝置1〇1，係採用一面使 基板W相對複數個光罩Μ進行移動一面進行曝光轉印之掃 描曝光方式。再者，用於本實施形態之光罩之尺寸，係設 定為350 mmx250 mm，且圖案Ρ之X方向長度，對應於有 效曝光區域之X方向長度。 近接掃描曝光裝置101，圖34及圖35所示，包含：基板 搬送機構120，其使基板W上升進行支持，並且沿特定方 向（圖中為X方向）搬送基板W;光罩保持機構丨7〇，其分別 保持複數個光罩Μ，且具有沿著與特定方向交叉之方向（圖 中為Υ方向）以曲折狀配置二行之複數個光罩保持部171 ; 作為照明光學系統之複數個照射部180，其等分別置於 153878.doc -46- 201214052 複數個光罩保持部171之上部，且照射曝光用光L ;以及複 數個遮光裝置190，其等設置於複數個照射部丨8〇與複數個 光罩保持部171之間，且遮蔽自照射部丨8〇中出射之曝光用 光L。 該等基板搬送機構120、光罩保持機構170、複數個照射 部180、以及遮光裝置19〇，係配置於經由平台（未圖示）設 置於地面上之裝置底座102上。此處，如圖35所示，將基 板搬送機構120搬送基板W之區域中，上方配置有光罩保 持機構170之區域稱為光罩配置區域ea，相對光罩配置區 域EA為上游侧之區域稱為基板搬入側區域IA，相對光罩 配置區域EA為下游側之區域稱為基板搬出側區域〇A。 基板搬送機構120，係包括作為基板保持部之上.升單元 121，其配置於經由其他平台（未圖示）設置於裝置底座1〇2 上之搬入基座105、精密基座1〇6、搬出基座1〇7上，且利 用空氣使基板w上升得到支持；以及基板驅動單元14〇， 其於上升單元121之Y方向側方，配置於進而經由其他平台 108設置於裝置底座丄〇2上之基座1〇9上，且握持基板w， 並且沿X方向搬送基板W。 上升單70121，係如圖36所示，包含長條狀之複數個排 氣緩衝氣墊123(參照圖35)、124以及長條狀之複數個吸排 氣緩衝氣墊125a、125b，其等於下表面分別安裝有自搬入 搬出以及精密基座105、1〇6、1〇7之上表面延伸至上方之 複數個連結棒122 ;空氣排出系統13〇以及空氣排出用泵 ’其等自形成於各緩衝氣墊123、124、125a、125b之 153878.doc -47· 201214052 複數個排氣孔126將空氣排出；以及空氣吸入系統i 32及空 氣吸入用泵133’其等係用以自形成於吸排氣緩衝氣塾 125a、125b之吸氣孔127吸入空氣。 又’吸排氣緩衝氣墊125a、125b，係包含複數個排氣孔 126以及複數個吸氣孔127，且可對緩衝氣墊125a、125b之 支持面134與基板w之間之空氣壓進行平衡調整，從而高 精度設定為特定之上升量，並以穩定之高度進行水平支 持。 基板驅動單元140,係如圖35所示，具備握持構件141， 其利用真空吸附來握持基板W ;線性導軌142，其沿X方嚮 導引握持構件141 ;驅動馬達143及滚珠螺桿機構144，其 等沿X方向驅動握持構件141 ;以及複數個防工件碰撞滾輪 145 ’其等以自基座1 〇9之上表面突出之方式，可Z方向移 動且旋轉自如地安裝於基板搬入側區域IA中之基座1〇9之 側方’且支持等待朝向光罩保持機構17〇搬送之基板臀之 下表面。 又’基板搬送機構120 ’係具有基板預對準機構15〇，其 设置於基板搬入側區域IA ’且對於該基板搬入側區域IA中 待機之基板W實施預對準；以及基板對準機構丨60，其實 施基板W之對準。 光罩保持機構170，係如圖35及圖36所示，包含上述複 數個光罩保持部〗7丨；以及複數個光罩驅動部〗72 ’其等係 "又置於每一個光罩保持部丨71，且沿著X、Y、Z、θ方向、 即特疋方向、交又方向、相對與特定方向及交叉方向之水 153878.doc -48- 201214052 平面之錯垂方向 持部171。 以及圍繞該水平面 之法線，驅動光罩保 沿γ方向^折狀配置二行之複數個光罩保持部i7i，係 匕含配置於上游側之複數個上游側光罩保持部17叫本實 施形態為6個)、配置於下游側之複數個下游側光草保持部 171b(本實施形態為6個)，且經由光罩驅動部172,分別支 持豎立設置於裝置底座2之¥方向兩側之柱部叫參照圖 34)間以2根為單位架設於上游側與下游側之主基座⑴。 备光罩保持部m，係具有沿2方向貫通之開口177,並且 於其周緣部下表面真空吸附著光罩訄。 光罩驅動部172 ’係具有X方向驅動部173，其安裝於主 基座113，且沿X方向移動；z方向驅動部"a，其安裝於X 方向驅動部173之前端，且沿2方向進行驅動；γ方向驅動 部175 ’其安裝於2方向驅動部m，且沿γ方向進行驅 動；以及Θ方向驅動部176，其安裝於γ方向驅動部175，且 沿Θ方向進行驅動；且，於θ方向驅動部176之前端安裝有 光罩保持部171。 複數個照射部180，係如圖38及圖39所示，於框體18! 内，具有與第1實施形態同樣構成之光照射裝置8〇a、積光 器透鏡74C、光學控制部76、凹面鏡77、以及曝光控制用 快門78，並且，具有配置於光源部73A與曝光控制用快門 78間、以及積光器透鏡74C與凹面鏡77間之平面鏡面280、 281、282。再者，於凹面鏡77或作為摺疊鏡面之平面鏡面 282，亦可設置可以手動或自動變更鏡面之曲率之偏角修 153878.doc -49- 201214052 正機構。 光照射裝置80A，係具有直線狀排列有3個分別包含超高 壓水銀燈71與反射鏡72、例如包含4段2行之8個光源部73 之卡匣81A之支持體82A。與第i實施形態相同，卡匣 81A，係將燈座罩84安裝於支持8個光源部乃之光源支持部 · 83，藉此，以8個光源部73之光所照射之各照射面、與8個 光源部73之光所入射之積光器透鏡74(：之入射面為止之各 光軸L之距離達到大致恆定之方式，定位光源部73。 又’如圖39所示’可藉由將各卡匣81A安裝於支持體 82A之複數個卡匣安裝部9〇，而以使所有光源部73之光所 照射之各照射面、與該光源部73之光所入射之積光器透鏡 74之入射面為止之各光軸L之距離達到大致恆定之方式， 定位各卡E 81A。再者，來自各光源部73之配線之捲繞、 或支持體内之冷卻構造’係以與第1實施形態相同之方式 構成’又，燈71之點亮控制方法亦與第1實施形態相同。 複數個遮光裝置190 ’係如圖3 6所示，具有變更傾斜角 度之一對板狀封閉構件208、209，且藉由封閉驅動單元 192來變更一對封閉構件208、209之傾斜角度。藉此，於 由光罩保持部171保持之光罩Μ之附近，將自照射部180中 出射之曝光用光L遮蔽，並且，可使遮蔽曝光用光l之特定 方向上之遮光寬度、即自Ζ方向觀察之投影面積靈活變 化。 再者’於近接掃描曝光裝置101，設置有藉由沿Υ方向驅 動保持光罩Μ之一對光罩盤部（未圖示）而更換由上游側及 153878.doc -50- 201214052 下游側光罩保持部171a、171b所保持之光罩Μ之光罩交換 器220，並且，設置有於光罩更換之前，一面使受到上升 支持之光罩Μ擠壓光罩盤部，一面使定位銷（未圖示）抵接 於光罩Μ藉此實施預對準之光罩預對準機構24〇。 進而，如圖36所示，於近接掃描曝光裝置1〇1，配置有 雷射位移計260、光罩對準用攝像機（未圖示）、跟蹤用攝像 機（未圖示）、及跟縱用照明2 7 3等各種檢測機構。 其-人’使用以上述方式構成之近接掃描曝光裝置丨〇1 , 說明基板W之曝光轉印。再者，本實施形態，係就對描繪 有底層圖案（例如，黑矩陣）之彩色濾光片基板w，描繪 R(紅）、G(綠）、B(藍）之任一圖案之情形進行說明。 近接掃描曝光裝置101，係藉由來自排氣緩衝氣墊123之 空氣，而使由未圖示之搭載機等搬送至基板搬入區域认之 基板W上升進行支持，且於實施基板臀之預對準作業、對 準作業之後，將由基板驅動單元14〇之握持構件141吸附之 基板W搬送至光罩配置區域EA。 143進行驅動，而沿軌道142於又方向上移動。S -43 - 201214052 [Table 2] Illuminance (mW/cm2) 365 (nm) 313 (nm) No DUV filter 34.9 23.0 DUV filter 4 32.1 1.02 DUV filter 2 33.5 11.7 As mentioned above, The light-emitting device 8A and the exposure device PE of the exposure apparatus according to the present embodiment include a specific number of light source units 73 including the lamps 71 and the mirrors 72, and light of a specific number of light source units 73 is incident on the light collectors. The entrance surface of the lens 74 is incident on the cassette 81 of the light source unit 73, and the specific number of light source units 73 includes two types of light source units 73 having different spectral characteristics. Thereby, the intensity of each wavelength can be set freely without replacing the light source unit 7 3 '. In particular, each of the lamps 71 of the light source unit 713 has the same spectral characteristics, and the specific number of light source units 73' have a wavelength cut-off color filter 286 disposed therein, thereby constituting two different spectral characteristics. The light source unit 73 is used. Thereby, it is not necessary to replace the light source unit 73, and it is possible to freely set the intensity of each wavelength without using a light source unit having different spectral characteristics. Further, since a plurality of cassettes 81 are provided, and the light of all the light source units 73 is incident on the incident surface of the light collector lens 74, the support 82 of a plurality of cards (four) is mounted, so that it can be unitized. The lamp 71 is operated to shorten the replacement time of the lamp and the downtime of the device, and all the light source portions 73 can be disposed on a single curved surface without performing a large curved surface processing back on the mounting member of the lamp. Further, the light irradiation device 80 includes not only the plurality of light source units 73 but also a plurality of cassettes 8 in accordance with the illumination method of the exposure apparatus according to the present embodiment, such as the illumination 153878.doc • 44·201214052, and the exposure method. 1. The support body 82 includes an illuminance meter 279 disposed on the downstream side of the illuminator lens 74 and measuring illuminance corresponding to each wavelength, and an optical control unit that controls lighting/extinction and illuminance of each of the lamps 71. 76. Further, the optical control unit 76 controls the light source units 73 in the cassette 81 so as to obtain the desired illuminance at a specific wavelength based on the illuminance corresponding to each wavelength measured by the illuminometer 279. Thereby, the required lamp 71 can be turned on, and the intensity of the wavelength component required for exposure can be set freely, so that the life of the lamp 71 can be extended. Further, the above-described embodiment uses two types of wavelength cutoff filters 286 to form two types of light source units 73A and 73B having different spectral characteristics. However, as shown in FIGS. 33(a) and (b), two types may be used. The wavelength cut filters 286a and 286b constitute three kinds of light source units 73A1, 73A2, and 73B having different spectral characteristics. For example, the three light source units 73A1, 73A2, and 73B may be configured by 8:8:8 as shown in Fig. 33(a), or may be composed of 1〇:1〇:4 as shown in Fig. 33(b). . In such a case, it is preferable to form the three types of light source units 73A1, 73A2, and 73B 'in a point symmetrical manner when the light 71 of Fig. 33 (4) is extinguished by the optical control unit 76' as shown in Fig. 33(c). In the above-described embodiment, the light irradiation device 80 is provided with a plurality of cassettes 81 each having a specific number of light source units 73, and is attached to the support body 82, as shown in the hatched portion. Although it is used in the case where the light irradiation device 80 is composed of a single card 81, the effect of the embodiment can be achieved. Further, in the above-described embodiment, the wavelength cut filter 286 is used to form a plurality of light source portions 73 of 153878.doc -45 - 201214052, and is disposed on the downstream side of the illuminator lens 74. The illuminance meter 279 that measures the illuminance corresponding to each wavelength, the control unit 76 that controls the lighting/extinction and illumination of each of the lamps 71, and the control unit 76 are based on the illuminances corresponding to the respective wavelengths measured by the illuminance meter 279. The light source portion 73 in the control card (4) is obtained by obtaining the desired illuminance in the wavelength. However, the present invention includes the case where the plurality of types of lamps 7 are different in the light source characteristics, and the plurality of light source units 73 are formed. To the same effect. (Fifth Embodiment) Next, a proximity scanning exposure apparatus according to a fifth embodiment of the present invention will be described with reference to Figs. 34 to 39. As shown in FIG. 37, the proximity scanning exposure apparatus 1〇1 irradiates the exposure light L to the substrate W of the approximately rectangular shape which is conveyed in a specific direction toward the mask via a plurality of masks 151 in which the pattern P is formed. Thereby, the pattern ρ is exposed and transferred to the substrate w. That is, the exposure apparatus 1〇1 is a scanning exposure method in which the substrate W is subjected to exposure transfer while moving the substrate W against a plurality of masks. The size of the mask of the present embodiment is set to 350 mm x 250 mm, and the length of the pattern X in the X direction corresponds to the length of the effective exposure area in the X direction. The proximity scanning exposure apparatus 101, as shown in Figs. 34 and 35, includes The substrate transfer mechanism 120 supports the substrate W and supports the substrate W, and transports the substrate W in a specific direction (X direction in the drawing); the mask holding mechanism 丨7〇 holds a plurality of masks respectively, and has a plurality of masks A plurality of mask holding portions 171 arranged in a zigzag pattern in a direction intersecting with a specific direction (in the Υ direction in the drawing); and a plurality of illuminating portions 180 as illumination optical systems are respectively placed at 153878.doc -46- 201 214052 a plurality of upper portions of the mask holding portion 171, and irradiating the exposure light L; and a plurality of light shielding devices 190 disposed between the plurality of irradiation portions 丨8〇 and the plurality of mask holding portions 171, and shielded from The exposure light L emitted from the illuminating unit 8 is disposed. The substrate transfer mechanism 120, the mask holding mechanism 170, the plurality of illuminating units 180, and the shading device 19 are disposed on the platform (not shown). In the device base 102 on the ground, here, as shown in FIG. 35, in the region where the substrate transport mechanism 120 is transported to the substrate W, the region where the mask holding mechanism 170 is disposed above is referred to as a mask arrangement region ea, and the mask is opposite. The area where the arrangement area EA is on the upstream side is referred to as the substrate carry-in side area IA, and the area on the downstream side of the mask arrangement area EA is referred to as the substrate carry-out side area 〇A. The substrate transfer mechanism 120 is included as the substrate holding portion. The lifting unit 121 is disposed on the loading base 105, the precision base 1〇6, and the unloading base 1〇7 provided on the apparatus base 1〇2 via another platform (not shown), and the substrate w is made of air. Rise up And a substrate driving unit 14A disposed on the side of the rising unit 121 in the Y direction, and further disposed on the base 1〇9 of the device base 2 via the other platform 108, and holding the substrate w, and The substrate W is transported in the X direction. As shown in FIG. 36, the riser 70121 includes a plurality of exhaust buffer cushions 123 (see FIG. 35) and 124, and a plurality of intake and exhaust cushion cushions 125a. And 125b, which are respectively connected to a plurality of connecting rods 122 which are self-loading and unloading and extending from the upper surface of the precision base 105, 1〇6, 1〇7 to the lower surface; the air discharge system 13〇 and the air discharge pump' The plurality of vent holes 126 formed in each of the buffer cushions 123, 124, 125a, and 125b are ventilated by a plurality of vent holes 126; and the air intake system i32 and the air suction pump 133' are used. Air is taken in from the intake holes 127 formed in the intake and exhaust buffer ports 125a, 125b. Further, the exhaust and exhaust buffer air cushions 125a and 125b include a plurality of exhaust holes 126 and a plurality of air suction holes 127, and can balance the air pressure between the support surface 134 of the buffer air cushions 125a and 125b and the substrate w. Therefore, the high precision is set to a specific amount of rise, and horizontal support is performed at a stable height. The substrate driving unit 140, as shown in FIG. 35, is provided with a holding member 141 that holds the substrate W by vacuum suction, a linear guide 142 that guides the holding member 141 in the X direction, and a driving motor 143 and a ball screw mechanism. 144, which drives the grip member 141 in the X direction, and a plurality of workpiece-preventing rollers 145' that are movable in the Z direction and rotatably mounted on the substrate so as to protrude from the upper surface of the susceptor 1 〇9 The side of the pedestal 1 〇 9 in the side area IA and supports the lower surface of the substrate hip that is waiting to be transported toward the reticle holding mechanism 17 。. Further, the 'substrate transfer mechanism 120' has a substrate pre-alignment mechanism 15A which is provided in the substrate carry-in side area IA' and performs pre-alignment on the substrate W which is standby in the substrate carry-in side area IA; and a substrate alignment mechanism 60, which performs alignment of the substrate W. As shown in FIGS. 35 and 36, the mask holding mechanism 170 includes the plurality of mask holding portions 7; and a plurality of mask driving portions 72', which are placed in each mask. The holding portion ,71 and the water 153878.doc -48-201214052 plane slanting direction holding portion 171 along the X, Y, Z, θ directions, that is, the special direction, the intersecting direction, and the specific direction and the intersecting direction. . And a plurality of mask holding portions i7i for arranging the two rows along the γ direction in the imaginary direction around the normal line of the horizontal plane, and the plurality of upstream side mask holding portions 17 disposed on the upstream side are called the present embodiment. The plurality of downstream side light-grass holding portions 171b (six in the present embodiment) disposed on the downstream side are supported by the mask driving unit 172 and are respectively erected on both sides of the apparatus base 2 in the ¥ direction. The column portion is referred to as a main base (1) on the upstream side and the downstream side in units of two in accordance with FIG. 34). The reticle holding portion m has an opening 177 that penetrates in two directions, and a mask rim is vacuum-absorbed on the lower surface of the peripheral portion. The mask driving unit 172 ′ has an X-direction driving unit 173 that is attached to the main base 113 and moves in the X direction, and a z-direction driving unit “a” that is attached to the front end of the X-direction driving unit 173 and along the 2 Driving in the direction; the γ-direction driving unit 175 ′ is mounted in the 2-direction driving unit m and driven in the γ direction; and the Θ-direction driving unit 176 is mounted in the γ-direction driving unit 175 and driven in the Θ direction; A mask holding portion 171 is attached to the front end of the driving portion 176 in the θ direction. As shown in FIG. 38 and FIG. 39, the plurality of illuminating units 180 have a light irradiation device 8A, an illuminator lens 74C, and an optical control unit 76 which are configured in the same manner as in the first embodiment. The concave mirror 77 and the exposure control shutter 78 have planar mirror surfaces 280, 281, and 282 disposed between the light source portion 73A and the exposure control shutter 78 and between the illuminator lens 74C and the concave mirror 77. Furthermore, in the concave mirror 77 or the flat mirror surface 282 as a folded mirror surface, it is also possible to provide a eccentric angle correction which can be manually or automatically changed the curvature of the mirror surface 153878.doc -49- 201214052. The light irradiation device 80A has a support body 82A in which three cartridges 81A each including an ultrahigh pressure mercury lamp 71 and a mirror 72, for example, eight light source portions 73 of four stages and two rows are arranged in a straight line. In the same manner as the first embodiment, the cassette holder 81A is attached to the light source supporting unit 83 that supports the eight light source units, whereby the respective irradiation surfaces irradiated by the light of the eight light source units 73 are The light source unit 73 is positioned such that the distance between the optical axes L of the incident surface of the eight light source units 73 (the incident surface is substantially constant). Each of the latches 81A is attached to the plurality of latch mounting portions 9A of the support 82A, and the respective illumination surfaces irradiated by the light of all the light source sections 73 and the light emitters incident on the light of the light source section 73 are incorporated. Each card E 81A is positioned such that the distance between the optical axes L of the incident surface of the lens 74 is substantially constant. Further, the winding of the wiring from each of the light source sections 73 or the cooling structure in the support body is In the same manner as the first embodiment, the lighting control method of the lamp 71 is also the same as that of the first embodiment. The plurality of light shielding devices 190' have a change in the inclination angle and are closed in a plate shape as shown in Fig. 36. Components 208, 209, and changing a pair of closed structures by closing drive unit 192 The angle of inclination of 208 and 209. Thereby, the exposure light L emitted from the irradiation unit 180 is shielded in the vicinity of the mask 保持 held by the mask holding portion 171, and the specificity of the masking exposure light 1 can be made. The light-shielding width in the direction, that is, the projected area viewed from the rubbing direction, is flexibly changed. Further, in the proximity scanning exposure apparatus 101, one of the holding masks is driven by the rubbing direction in the x direction (not shown). And replacing the mask exchanger 220 of the mask holder held by the downstream side mask holders 171a and 171b on the upstream side and 153878.doc -50-201214052, and providing the mask holder 220 to be raised before the mask replacement The supported photomask Μ squeezing the reticle disk portion and abutting the locating pin (not shown) against the reticle to perform the pre-aligned reticle pre-alignment mechanism 24 〇. Further, as shown in FIG. In the proximity scanning exposure apparatus 1〇1, various detection mechanisms such as a laser displacement meter 260, a mask alignment camera (not shown), a tracking camera (not shown), and a vertical illumination 27 3 are disposed. Its-person' uses a close-up sweep constructed in the above manner In the exposure apparatus 丨〇1, the exposure transfer of the substrate W will be described. Further, in the present embodiment, R (red) and G are drawn on the color filter substrate w on which the underlying pattern (for example, a black matrix) is drawn. In the case of any of the green and B (blue) patterns, the proximity scanning exposure device 101 is transported to the substrate loading area by a carrier or the like (not shown) by the air from the exhaust buffer air cushion 123. The substrate W is lifted and supported, and after the substrate pre-alignment operation and the alignment work are performed, the substrate W adsorbed by the holding member 141 of the substrate driving unit 14 is transported to the mask arrangement area EA. It moves along the track 142 in the other direction.

其後，基板w，係藉由使基板驅動單元14〇之驅動馬達Thereafter, the substrate w is driven by the substrate driving unit 14

S 153878.doc -51 - 201214052 射位移計260,因此，在曝光動作過程中，將檢測光韓 與基板W之相對位置偏移，並基於所檢測之相對位置偏 移，使光罩驅動部172驅動，使基板|即時跟蹤光罩m之位 置。同時，檢測光罩Μ與基板W之間距，並基於所檢測之 間距，使光罩驅動部172驅動，即時修正光罩Μ與基板W之 間距。 以上，可以相同之方式，進行連續曝光，藉此，於基板 w整體上實施圖案之曝光。由光罩保持部ΐ7ι保持之光罩 Μ，係以曲折狀配置，因此，由上游側或下游側之光罩保 持部171a、i71b保持之光罩Μ即便分離排列，亦可於基板 W上無間隙地形成圖案。 又，於自基板W中切取複數個面板之情形時，於與鄰接 之面板彼此之間對應之區域，不照射曝光用光L而形成非 曝光區域。因此，在曝光動作過程中，可以開關一對封閉 構件208、209，使封閉構件208、209位於非曝光區域之方 式，結合基板W之傳送速度，沿與基板貿之傳送方向相同 之方向，使封閉構件208、209移動。 因此’即便本實施形態之近接掃描曝光裝置中，亦於更 換光源部73時，更換每一卡匣81。各卡匣81，係將特定數 之光源部73預先定位，且，將來自各光源部73之配線97連 接於連接器98 ^因此，可藉由使需要更換之卡匣81A嵌合 於支持體82A之卡匣用凹部90b從而安裝於支持體82A，而 元成卡匣81内之光源部73之對準。又，亦可藉由使其他配 線99連接於連接器卯，而亦完成配線作業，因此，可易於 I53878.doc •52· 201214052 進行光源部73之更換作業。 再者，如圖41所示’即便於本實施形態之光照射裝置 80A中’亦與第4實施形態相同，特定數之光源部73之各燈 71係分光特性相同，且特定數之光源部73，藉由於其一部 分配置波長戴止遽光片286 ’而構成分光特性不同之2種光 源部73。 具體而言，如圖40及41所示’包含包括燈71與反射鏡72 之特定數之光源部73、及以使特定數之光源部73之光入射 至積光器透鏡74之入射面之方式支持光源部73之卡匣81， 且特定數之光源部73之各燈71係分光特性相同，特定數之 光源部73 ’藉由於其一部分配置波長截止彩色濾光片 286 ’而構成分光特性不同之2種光源部73。又，於凹面鏡 77之一部分’形成有開口 77a ’且於開口 77a之後方，設置 有測定g線、h線、i線、j線' k線等中之各波長之照度之各 照度計279。 藉由如此之構成，而無需更換燈71，又，不必使用分光 特性不同之光源部’便可自如地設定每一波長之強度。 再者，本發明係不限於上述實施形態，可適當地進行變 形、改良等。 例如，本實施形態之燈座罩84，係為凹狀之箱形狀，但 不僅限於此，只要可藉由抵接部定位固定光源部即可，例 如’亦可為篩網形狀。又，於使各光源部73嵌合於光源支 持部83進而進行固定之情形時’亦可不設置燈座罩84而構 成。S 153878.doc -51 - 201214052 The displacement meter 260 is displaced, so that the relative position of the detection light and the substrate W is shifted during the exposure operation, and the mask driving portion 172 is caused based on the detected relative positional shift. Drive to make the substrate | instantly track the position of the mask m. At the same time, the distance between the mask Μ and the substrate W is detected, and based on the detected pitch, the reticle driving portion 172 is driven to instantly correct the distance between the reticle Μ and the substrate W. As described above, the continuous exposure can be performed in the same manner, whereby the exposure of the pattern is performed on the entire substrate w. Since the mask 保持 held by the mask holding portion ΐ7 is arranged in a meandering shape, the mask 保持 held by the mask holding portions 171a and i71b on the upstream side or the downstream side can be separated from the substrate W even if they are separated and arranged. A pattern is formed in a gap. Further, when a plurality of panels are cut out from the substrate W, the non-exposure regions are formed without irradiating the exposure light L in a region corresponding to the adjacent panels. Therefore, during the exposure operation, a pair of closing members 208, 209 can be opened and closed so that the closing members 208, 209 are located in the non-exposed area, and the conveying speed of the substrate W is combined in the same direction as the conveying direction of the substrate. The closure members 208, 209 move. Therefore, even in the proximity scanning exposure apparatus of the present embodiment, each of the cassettes 81 is replaced when the light source unit 73 is replaced. Each of the cassettes 81 has a predetermined number of light source units 73 positioned in advance, and the wiring 97 from each of the light source units 73 is connected to the connector 98. Therefore, the cassette 81A to be replaced can be fitted to the support by the cassette 81A. The latching portion 90b of the 82A is attached to the support body 82A, and is aligned with the light source portion 73 in the cassette 81. Further, since the wiring operation can be completed by connecting the other wiring 99 to the connector ,, the replacement of the light source unit 73 can be easily performed by I53878.doc • 52·201214052. Further, as shown in Fig. 41, "in the light irradiation device 80A of the present embodiment", as in the fourth embodiment, each of the lamps 71 of the specific number of light source units 73 has the same spectral characteristics and a specific number of light source units. 73. The light source unit 73 having two different spectral characteristics is formed by arranging the wavelength-holding light-emitting sheet 286'. Specifically, as shown in FIGS. 40 and 41, 'the light source portion 73 including the specific number of the lamps 71 and the mirrors 72, and the light incident from the light source portion 73 of the specific number are incident on the incident surface of the light collector lens 74. The method supports the cassette 81 of the light source unit 73, and each of the lamps 71 of the specific number of light source units 73 has the same spectral characteristics, and the specific number of light source units 73' constitute a spectral characteristic by a part of the wavelength cut-off color filter 286'. Two different types of light source sections 73 are provided. Further, an illuminance meter 279 for measuring the illuminance of each wavelength in the g line, the h line, the i line, the j line 'k line, etc., is formed in a portion 'of the concave mirror 77' and has an opening 77a' behind the opening 77a. With such a configuration, it is not necessary to replace the lamp 71, and the intensity of each wavelength can be set freely without using the light source portion having different spectral characteristics. Furthermore, the present invention is not limited to the above embodiment, and can be appropriately modified, improved, and the like. For example, the socket cover 84 of the present embodiment has a concave box shape. However, the present invention is not limited thereto, and the light source unit may be positioned and fixed by the abutting portion. For example, the screen may be in the shape of a mesh. Further, when the light source portions 73 are fitted to the light source supporting portion 83 and fixed, the lamp holder cover 84 may not be provided.

S 153878.doc -53- 201214052 又，支持體遮罩92之形狀亦可根據照明光學系統7〇之配 置而任意設計。 又’使配置於卡匣81之光源部73為8個以上，且使配置 於支持體82之所有光源部為8個〜約8〇〇個。只要達到8〇〇個 左右，則實用性及效率變得良好❶進而，裝載於支持體82 之卡E81之數宜為整體之光源部73之數之5%以下，於該 情形時，配置於1個卡匣8 1之光源部73之數達到5%以上。 進而’圖25(a)及（b)，係說明使用相同尺寸之卡匿81， 使成為近似旋轉對稱之位置之燈交替地點亮之情況，但亦 可使用不同尺寸之卡£81，使卡匣81中成為近似旋轉對稱 之位置之燈71交替地點亮。組裝於小型尺寸之卡匣81中之 燈71，與組裝於大型卡匣81之燈71相比，燈71之個數較 少’因此’受到來自周圍之發熱量較少，故組裝於小型尺 寸之卡E81中之燈71之壽命變長。又，宜使用不同尺寸之 卡匡81 ’對所有燈71中成為近似旋轉對稱之位置之燈71進 行交替點亮控制。 又，例如，上述實施形態，係對作為曝光裝置之連續分 P白近接曝光裳置與知描式近接曝光裝置進行了說明，但不 僅限於此，本發明，亦可應用於鏡面投影式曝光裝置、透 鏡投影式曝光裝置、密接式曝光裝置。又，本發明，亦可 應用於一次式、連續式、掃描式等任一曝光方法。 進而’本發明之支持體，較佳為包含如上述實施形態之 包括支持體本體91與支持體遮罩92之支持體82，但只要為 可以使安裝於各卡匣81之各光源部73之光實質性朝向積光 153878.doc -54- 201214052 器透鏡74之入射面之方式進行對準者即可，既可僅由支持 體本體構成’又，亦可僅由包含如骨架構造之框體之支持 體本體構成。 例如圖42所示，亦可使支持體82形成為使前面開放，且 藉由凹部（與卡匣81之矩形之後方緣部對向之剖面L字狀之 缺口）而形成設置於支持體82之各卡匣安裝部9〇，成為由 卡匣固疋機構自前方固定各卡匣81之構造。又，於該情形 時’若藉由強制排氣機構79來排出支持體82内之空氣，則 如圖18(a)所示，宜為排氣孔84a形成於燈座罩84之底面。 又’支持體之卡匣安裝部9〇之構成亦可任意，如上述實 施形態之圖8所示，可藉由設置於開口部9〇a之周圍之卡匣 用凹部90c而形成’亦可如圖43所示，藉由使設置於光源 支持部83之前面周圍之凸狀之卡合部83c、與遍及周圍設 置於卡E女裝部90之凹狀之被卡合部9〇d卡合而進行安 裝。 本申凊案係基於2010年2月5曰申請之曰本專利申請案 2010-024326、2010年8月27日申請之日本專利申請案2〇1〇_ 191288、2010年1〇月7日申請之日本專利申請案2〇1〇_ 227689以及2011年1月26曰申請之曰本專利申請案2〇11_ 014268者，且該申請案之全文以引用的方式併入本文。 【圖式簡單說明】 圖1係用以對本發明第丨實施形態之連續分階近接曝光裝 置進行說明之局部分解立體圖β ’ 圖2係圖1所示之連續分階近接曝光裝置之正視圖。S 153878.doc -53- 201214052 Further, the shape of the support mask 92 can be arbitrarily designed according to the arrangement of the illumination optical system 7A. Further, the number of light source units 73 disposed in the cassette 81 is eight or more, and that all of the light source units disposed on the holder 82 are eight to about eight. When the number is about 8 ,, the usability and efficiency are improved, and the number of the cards E81 mounted on the support 82 is preferably 5% or less of the total number of the light source units 73. In this case, The number of light source units 73 of one cassette 81 is 5% or more. Further, in FIGS. 25(a) and (b), the case where the lamp 81 having the same rotational symmetry is alternately lit by using the card 81 of the same size, but a card of a different size of £81 may be used to make the card. The lamps 71 which are positions at approximately rotational symmetry in the 匣 81 are alternately lit. The lamp 71 incorporated in the small-sized cassette 81 has a smaller number of lamps 71 than the lamp 71 assembled in the large cassette 81. Therefore, the amount of heat generated from the surroundings is small, so that it is assembled in a small size. The life of the lamp 71 in the card E81 becomes longer. Further, it is preferable to use the cassettes 81' of different sizes to perform alternate lighting control for the lamps 71 of the positions of the lamps 71 which are approximately rotationally symmetrical. Further, for example, in the above embodiment, the continuous P-light proximity exposure and the proximity proximity exposure device as the exposure device have been described. However, the present invention is not limited thereto, and the present invention can also be applied to a mirror projection exposure device. , lens projection exposure device, close contact exposure device. Further, the present invention can be applied to any exposure method such as a one-shot type, a continuous type, or a scanning type. Further, the support of the present invention preferably includes the support body 82 including the support main body 91 and the support body cover 92 as in the above embodiment, but it is possible to attach the light source portions 73 attached to the respective cassettes 81. The light may be aligned toward the incident surface of the lens 143878.doc -54-201214052, and may be formed only by the support body, or may be composed only of a frame including a skeleton structure. The support body is constructed. For example, as shown in FIG. 42, the support body 82 may be formed such that the front surface is opened, and the concave portion (the L-shaped notch that faces the rectangular rear edge portion of the cassette 81) is formed on the support body 82. Each of the cassette mounting portions 9 is configured to fix the respective latches 81 from the front by the latching mechanism. Further, in this case, when the air in the support body 82 is discharged by the forced exhaust mechanism 79, as shown in Fig. 18 (a), it is preferable that the exhaust hole 84a is formed on the bottom surface of the socket cover 84. Further, the configuration of the mounting portion 9 of the support body may be arbitrary, and as shown in FIG. 8 of the above embodiment, it may be formed by the recessed recess 90c provided around the opening 9A. As shown in Fig. 43, by engaging the convex engaging portion 83c provided around the front surface of the light source supporting portion 83 and the concave engaging portion 9〇d which is provided around the periphery of the card E wearing portion 90 Install it together. This application is based on the application for the patent application 2010-024326 filed on February 5, 2010, and the Japanese patent application filed on August 27, 2010. 2〇1〇_191288, 1st, 7th, 2010 Japanese Patent Application No. 2, 227, 227, 689, filed on Jan. 26, 2011, the entire disclosure of which is hereby incorporated by reference. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a partially exploded perspective view showing a continuous stepped proximity exposure apparatus according to a second embodiment of the present invention. Fig. 2 is a front elevational view of the continuous stepped proximity exposure apparatus shown in Fig. 1.

S 153878.doc -55· 201214052 圖3係光罩載物台之剖面圖。 圖4⑷係表示照明光學系統之光照射裝置之正視圖，且 ()為々（a)之IV-IV線之剖，⑷為沿⑷之^ ^線之剖 面圖。 圖5(a)係表不卡g之正視圖，且⑻為自⑷之v方向觀察 之d面圖，⑷為與積光器透鏡—併表示自⑷之v，方向觀 察之卡匣之剖面圖之圖。 圖6係安裝於卡E之光源部附近之放大剖面圖。 圖7係表*燈座機構之㈣例之卡E之剖面圖。 圖8係表示卡匿安裝於支持體之狀態之主要部分放大 圖。 圖9係表示使卡㈣斜地安裝於支持體之狀態之側視剖 面圖。 .圖10表^自各光㈣Μ射面起至積光H錢之入射面 為止之距離之概略圖。 圖11係表㈣以將卡E錢於支持體之卡四定機構之 變形例之圖’且⑷為平面圖，為沿⑷之㈣線之剖面 圖。 圖12(a)係表示用以將卡昆安劈^^ & 文裝於支持體之卡匣固定機構 之其他變形例之立體圖，且（b) 表不卡匣安裝於支持體之 狀態之剖面圖。 圖13 (a)係表示用以將卡匣 之又一其他變形例之立體圖 體之狀態之剖面圖。 安裝於支持體之卡匣固定機構 ’且（b)為表示卡匣安裝於支持 153878.doc -56- 201214052 圖14係用以表示各光源部之控制構成之圖β 圖15係用以說明壽命時間檢測機構之圖。 圖16係用以對匯總管理卡匣内之光源部之情形進行說明 之圖。 圖17係表示藉由空氣來冷卻各光源部之構造之一例之 ' 圖。 圖18(a)〜(c)係表示形成於卡匣座罩之排氣孔之例之圖。 圖19(a)、（b)係表示利用冷卻劑冷卻各光源部之冷卻路 徑之設計例之圖。 圖20係表示卡匣安裝部中配置有卡匣與蓋構件之一例之 圖。 圖21 (a)、（b)係表示安裝於卡匣之光源部之配置之圖。 圖22係表示安裝有圖21(a)之卡匣之支持體之圖。 圖23(a)〜(d)係表示光照射裝置之點亮控制方法之圖。 圖24(a)〜(c)係表示卡匣内之各光源部之點亮圖案之圖。 圖25(a)、（b)係表示光照射裝置之其他點亮控制方法之 圖。 圖26(a)、（b)係表示本發明第2實施形態之各光源部之點 7C控制方法之—例之圖。 圖27(a)、（b)係表示本發明第2實施形態之各光源部之點 7C控制方法之—例之圖。 圖28(a)、（b)係表示本發明第2實施形態之各光源部之點 7C控制方法之一例之圖。 圖29(a)〜(d)係表示本發明第3實施形態之各光源部之點S 153878.doc -55· 201214052 Figure 3 is a cross-sectional view of the reticle stage. Fig. 4 (4) is a front view showing the light irradiation device of the illumination optical system, and () is a cross section taken along line IV-IV of 々(a), and (4) is a cross-sectional view taken along line (4). Fig. 5(a) is a front view showing the card g, and (8) is a d-side view seen from the direction of (4) in the v direction, and (4) is a cross-section of the card viewed from the (4) v, and from the direction of the v. Diagram of the figure. Fig. 6 is an enlarged cross-sectional view showing the vicinity of a light source unit of the card E. Figure 7 is a cross-sectional view of the card E of the (4) example of the lamp holder mechanism. Fig. 8 is an enlarged view of a main part showing a state in which a card is attached to a support. Fig. 9 is a side sectional view showing a state in which the card (four) is obliquely attached to the support. Fig. 10 is a schematic diagram showing the distance from the light-emitting surface of each light (four) to the incident surface of the light H-weight. Fig. 11 is a view showing a modification of the card four-fixing mechanism for taking the card E money to the support body, and (4) is a plan view, and is a cross-sectional view taken along line (4) of (4). Fig. 12 (a) is a perspective view showing another modification of the cassette fixing mechanism for attaching the card to the support, and (b) showing the state in which the cassette is attached to the support. Sectional view. Fig. 13 (a) is a cross-sectional view showing a state of a perspective view of still another modification of the cartridge. FIG. 15 is a diagram showing the control structure of each light source unit. FIG. 15 is a diagram for explaining the life of the card body fixing mechanism installed in the support body and (b) indicating that the cassette is attached to the support 153878.doc -56-201214052. A diagram of the time detection mechanism. Fig. 16 is a view for explaining a case where the light source unit in the management card is summarized. Fig. 17 is a view showing an example of a structure for cooling each light source portion by air. 18(a) to (c) are views showing an example of a vent hole formed in a cassette cover. 19(a) and 19(b) are views showing a design example of cooling the cooling path of each light source unit by a coolant. Fig. 20 is a view showing an example in which a clicker and a cover member are disposed in the cassette mounting portion. 21(a) and 21(b) are views showing the arrangement of the light source unit attached to the cassette. Fig. 22 is a view showing a support body to which the cassette of Fig. 21 (a) is attached. 23(a) to (d) are views showing a lighting control method of the light irradiation device. 24(a) to (c) are views showing lighting patterns of respective light source sections in the cassette. Fig. 25 (a) and (b) are views showing other lighting control methods of the light irradiation device. Figs. 26(a) and 26(b) are diagrams showing an example of a method of controlling the point 7C of each light source unit according to the second embodiment of the present invention. (a) and (b) of FIG. 27 are views showing an example of a method of controlling the point 7C of each light source unit according to the second embodiment of the present invention. (a) and (b) of FIG. 28 are views showing an example of a method of controlling the point 7C of each light source unit according to the second embodiment of the present invention. 29(a) to (d) show the points of the respective light source units according to the third embodiment of the present invention.

S 153878.doc -57- 201214052 免控制方法之一例之圖。 圖30係第4實施形態之連續分階哮接曝光裝置之正視 圖。 圖31(a)係表示光照射裝置之正視圖，且⑻為沿⑷之 XXXI-XXXI線之剖面圖。 圖32(a)係表示卡g之正視圖，且⑻為⑷之側視圖⑷ 為（a)之仰視圖。 圖33(a)係表示第4實施形態之變形例之光照射裝置之卡 匣之正視圖，且（b)為表示其他變形例之光照射裝置之卡匣 之正視圖，（c)為表示使（&)之光照射裝置之光源部局部熄 滅之情形之圖。 圖34係本發明第5實施形態之近接掃描曝光裝置之整體 立體圖。 圖35係於將照射部等之上部構成去除之狀態下表示近接 掃描曝光裝置之俯視圖。 圖3 6係表示近接掃描曝光裝置之光罩配置區域中之曝光 狀態之側視圖。 圖3 7(a)係用以對光罩與緩衝氣墊之位置關係進行說明之 主要部分俯視圖，且（b)為其之剖面圖。 圖38係用以說明近接掃描曝光裝置之照射部之圖。 圖39(a)係表示圖38之光照射裝置之正視圖，且（b)為沿 ⑷之χχχΐχ_χχχ1χ線之剖面圖。 圖40係用以說明近接掃描曝光裝置之照射部之圖。 圖41(a)係表示圖40之光照射裝置之正視圖，且（b)為沿 153878.doc -58- 201214052 (a)之XXXXI-XXXXI線之音j面圖。 圖42係本發明之支持體之變形例之概略剖面圖。 圖43係表示本發明之支持體之卡匣安裝部之變形例之剖 面圖。 【主要元件符號說明】 10 光罩載物台 11 光罩載物台底座 11a' 177 開口 12 光罩保持架（光罩保持 12a 凸緣 13 平面軸承 14 吸盤部 14a 吸入嘴 15 隔片 16 光罩驅動機構 16a 致動器 16b 連桿 16c 銷支持機構 16d 滑塊 16e 導軌 16x X軸方向驅動裝置 1 6y Y軸方向驅動裝置 17 間距感測器 18 對準攝像機 153878.doc -59· 201214052 19 移動機構 20 基板載物台 21 基板保持部 22 基板驅動機構 23 Y軸工作台 24 Y軸傳送機構 25 X軸工作台 26 X軸傳送機構 27 Z-傾斜調整機構 28 線性導軌 29、36 傳送驅動機構 30 滑塊 31 導軌 32 馬達 33 滾珠螺桿裝置 34、35 移動體 38 光圈樓板 39 光圈檔板驅動機構 50 ' 102 裝置底座 51 支柱 61 ' 62 條狀鏡組 63 ' 64 、 65 雷射干涉儀 69 水泵 70 照明光學系統 153878.doc 60- 201214052 71 燈 72 反射鏡 72a 開口部 72b 開口面 72c 背面 73 ' 73A1、73A2、73B 光源部 74、 74C 積光器透鏡 76 光學控制部（控制部） 75 底座部 75a 冷卻路徑 77 凹面鏡 77a 開口 78 曝光控制用快門 79 吹風機單元（強制排氣機構） 79a 排氣管 79b 風門 80、 80A 光照射裝置 81、 81A 卡匣 81a 凹部 82、 82A 支持體 83 光源支持部 83a 窗部 83b 燈用凹部 83c 貫通孔 153878.doc -61 - 201214052 84 燈座罩 84a 連通孔 85 遮罩玻璃 85a 貫通孔 86 抵接部 87 燈座機構 89 蓋構件 89a 貫通孔 90 卡匣安裝部 90a 開口部 90b 卡匣用凹部 90c 凹部 91 支持體本體 91a 水冷管（冷卻用配管） 91b 凹部 91c 、 91d 槽部 92 支持體遮罩 92a 排氣孔 93 卡匣固定機構 93a 圓柱構件 93b 圓柱突起 93c 榫 94 壽命時間檢測機構 94a 保險絲 153878.doc -62· 201214052 95 96 96a 97 ' 99 98 101 105 106 107 108 109 112 113 120 121 122 123、124、125a、125b 126 127 130 131 132 133 140 點亮電源 控制電路 計時器 配線 連接器 近接掃描曝光裝置（曝光裝置） 搬入基座 精密基座 搬出基座 平台 基座 柱部 主基座 基板搬送機構 上升單元 連結棒 吸排氣緩衝氣墊 排氣孔 吸氣孔 空氣排出系統 空氣排出用泵 空氣吸入系統 空氣吸入用泵 基板驅動單元 153878.doc -63- 201214052 141 握持構件 142 線性導軌 143 驅動馬達 144 滚珠螺桿機構 145 防工件碰撞滚輪 150 基板預對準機構 160 基板對準機構 170 光罩保持機構 171 光罩保持部 171a 上游側光罩保持部 171b 下游側光罩保持部 172 光罩驅動部 173 X方向驅動部 174 Z方向驅動部 175 Y方向驅動部 180 照射部 181 框體 190 遮光裝置 192 封閉驅動單元 208 、 209 板狀封閉構件 220 光罩交換器 240 光罩預對準機構 260 雷射位移計 273 跟蹤用照明 153878.doc -64- 201214052 279 照度計 280 ' 281 ' 282 平面鏡面 286 、 286a ' 286b 波長截止濾光片 EA 相對光罩配置區域 IA 基板搬入側區域 M 光罩 OA 基板搬出側區域 P 圖案 PE 逐次近接曝光裝置（曝光裝置） W 玻璃基板（被曝光材、基板） 153878.doc -65-S 153878.doc -57- 201214052 A diagram of an example of an uncontrolled method. Fig. 30 is a front elevational view showing the continuous stepwise slewing exposure apparatus of the fourth embodiment. Fig. 31 (a) is a front view showing the light irradiation device, and (8) is a sectional view taken along the line XXXI-XXXI of (4). Fig. 32 (a) is a front view showing the card g, and (8) is a bottom view of (4) in a side view (4). Fig. 33 (a) is a front view showing a cassette of a light irradiation device according to a modification of the fourth embodiment, (b) is a front view showing a cassette of a light irradiation device according to another modification, and (c) is a view showing A diagram of a situation in which the light source portion of the light irradiation device is partially extinguished. Figure 34 is a perspective view showing the whole of a proximity scanning exposure apparatus according to a fifth embodiment of the present invention. Fig. 35 is a plan view showing the proximity scanning exposure apparatus in a state where the upper portion of the irradiation portion or the like is removed. Fig. 3 is a side view showing the exposure state in the mask arrangement area of the proximity scanning exposure apparatus. Fig. 3 (a) is a plan view of a main portion for explaining the positional relationship between the reticle and the cushioning cushion, and (b) is a sectional view thereof. Figure 38 is a view for explaining an illuminating portion of a proximity scanning exposure device. Fig. 39 (a) is a front view showing the light irradiation device of Fig. 38, and Fig. 39 (b) is a cross-sectional view taken along line ( χχχ 1 。 of (4). Figure 40 is a view for explaining an illuminating portion of the proximity scanning exposure device. Fig. 41 (a) is a front view showing the light irradiation device of Fig. 40, and (b) is a j-side view of the line XXXXI-XXXXI along 153878.doc - 58 - 201214052 (a). Figure 42 is a schematic cross-sectional view showing a modification of the support of the present invention. Fig. 43 is a cross-sectional view showing a modification of the cassette mounting portion of the support of the present invention. [Main component symbol description] 10 Mask stage 11 Mask stage base 11a' 177 Opening 12 Mask holder (mask holder 12a flange 13 plane bearing 14 suction cup portion 14a suction nozzle 15 spacer 16 mask Drive mechanism 16a Actuator 16b Link 16c Pin support mechanism 16d Slider 16e Rail 16x X-axis direction drive 1 6y Y-axis drive 17 Interval sensor 18 Alignment camera 153878.doc -59· 201214052 19 Moving mechanism 20 Substrate stage 21 Substrate holding unit 22 Substrate drive mechanism 23 Y-axis table 24 Y-axis transfer mechanism 25 X-axis table 26 X-axis transfer mechanism 27 Z-tilt adjustment mechanism 28 Linear guides 29, 36 Transfer drive mechanism 30 Slip Block 31 Guide rail 32 Motor 33 Ball screw unit 34, 35 Moving body 38 Aperture floor 39 Aperture baffle drive mechanism 50' 102 Device base 51 Pillar 61 '62 Strip mirror 63 ' 64 , 65 Laser interferometer 69 Water pump 70 Illumination Optical system 153878.doc 60- 201214052 71 Lamp 72 Mirror 72a Opening 72b Opening surface 72c Back 73 '73A1, 73A2 73B light source unit 74, 74C light concentrator lens 76 optical control unit (control unit) 75 base portion 75a cooling path 77 concave mirror 77a opening 78 exposure control shutter 79 blower unit (forced exhaust mechanism) 79a exhaust pipe 79b damper 80, 80A light irradiation device 81, 81A cassette 81a recess 82, 82A support 83 light source support portion 83a window portion 83b lamp recess portion 83c through hole 153878.doc -61 - 201214052 84 lamp holder cover 84a communication hole 85 cover glass 85a through Hole 86 abutting portion 87 socket mechanism 89 cover member 89a through hole 90 latching attachment portion 90a opening portion 90b recessed portion 90c recessed portion 91 support body 91a water-cooling tube (cooling pipe) 91b recessed portion 91c, 91d groove portion 92 Support body cover 92a Vent hole 93 Locking mechanism 93a Cylindrical member 93b Cylindrical protrusion 93c 榫94 Life time detecting mechanism 94a Fuse 153878.doc -62· 201214052 95 96 96a 97 ' 99 98 101 105 106 107 108 109 112 113 120 121 122 123, 124, 125a, 125b 126 127 130 131 132 133 140 Lighting power control Circuit timer wiring connector Proximity scanning exposure device (exposure device) Moving into the base Precision base Carrying out the base platform Base column Main base substrate Transport mechanism Ascending unit Connecting rod Suction and exhaust cushion Air cushion Vent hole Intake air Discharge system air discharge pump air intake system air suction pump substrate drive unit 153878.doc -63- 201214052 141 grip member 142 linear guide 143 drive motor 144 ball screw mechanism 145 anti-work collision roller 150 substrate pre-alignment mechanism 160 substrate Alignment mechanism 170 Mask holding mechanism 171 Mask holding portion 171a Upstream side mask holding portion 171b Downstream side mask holding portion 172 Photomask driving portion 173 X-direction driving portion 174 Z-direction driving portion 175 Y-direction driving portion 180 Irradiation portion 181 frame 190 shading device 192 closed drive unit 208, 209 plate-like closing member 220 mask exchanger 240 mask pre-alignment mechanism 260 laser displacement meter 273 tracking illumination 153878.doc -64- 201214052 279 illuminance meter 280 ' 281 ' 282 flat mirror 286 , 286a ' 286b wavelength cut filter EA reticle plate disposed opposite the substrate loading area IA of the mask M side region of the substrate carry-out side area OA pattern P PE successive proximity exposure device (exposure means) W a glass substrate (member to be exposed, the substrate) 153878.doc -65-

Claims (1)

201214052 七、申請專利範圍： ι_ 一種曝光裝置用光昭鼾 %‘、、、射裝置，其特徵在於包含： 複數個光源部，1莖八^ t ~ 〃專刀別包括發光部、及使由該發光 部產生之光以指向性射 出之反射光學系統 複數個卡匣， 其等可分別安裝特定數之上述光源部； 以及 支持體，其可安裝該複數個卡匣。 2.如請求項1之曝光裂置用光照射裝置，其中 上述卡E係、包括支持上述特定數之光源部之㈣支持 部，且 之 入 恆 述光源n卩n成為自上述特定數之光源部 光所照射之各照射面起至上述特定數之光源部之光所 射之積光器透鏡之入射面為止之各光軸之距離大致 定。 3. 如請求項2之曝光裝置用光照射裝置，其中 上述支持體，係包含分別安裝有上述複數個卡E之複 數個卡匣安裝部，且 j述複數個切安裝部，係形成為自上述所有光源部 之光所照射之各照射面起至上述所有光源部之光所入射 之積光II透鏡之人射面為止之各光轴之距離大致惶定。 4. 如請求項3之曝光裝置用光照射裝置，其中 上述複數個卡E安裝部，係分別包含上述卡£之光源 支持部所對向之開口部、及與形成於該光源支持部之周 圍之平面部柢接之平面，且 153878.doc 201214052 沿著特定之方向排列之上述複數個卡匣安裝部之各平 面’係以特定之角度交又。 5.如請求項4之曝光裝置用光照射裝置，其中 上述支持體之卡匣安裝部，係形成於將上述平面作為 底面之凹部，且 上述卡匣，係嵌合於上述卡匣安裝部之凹部。 6_如請求項1至5中任一項之曝光裝置用光照射裝置，其中 上述卡S，係包括支持上述特定數之光源部之光源支 持部，且 以四條邊連結由上述光源支持部支持且位於最外周之 上述光源部之中心之線呈長方形形狀。 7. 如請求項6之曝光裝置用光照射裝置，其中 上述支持體，係包含分別安裝有上述複數個卡匣之複 數個卡匣安裝部，且 上述複數個卡匣安裝部，係使沿相互正交之方向配置 之上述卡匣之各個數保持一致而形成為長方形形狀。 8. 如請求項2至7中任一項之曝光裝置用光照射裝置，其中 上述卡匣，係包括於包圍由上述光源支持部支持之上 述特定數之光源部之狀態下安裝於上述光源支持部之遮 罩構件，且 於上述光源支持部與上述遮罩構件之間之收納空間 内，鄰接之上述光源部之反射光學系統之背面直接對 向。 9. 如請求項8之曝光裝置用光照射裝置，其中 153878.doc 201214052 於上述遮罩構件，形成有至少一個將上述收納空間與 該遮罩構件之外部連通之連通孔與連通槽。 10·如請求項1至9中任一項之曝光裝置用光照射裴置，其中 於上述支持體，設置有供冷卻水循環之冷卻用配管， 以冷卻上述各光源部。 11. 如請求項1至1〇中任一項之曝光裝置用光照射裝置，其中 包含自後方及側方之至少一側，對上述各光源部之光 所照射之各照射面，強制排出上述支持體内之空氣之強 制排氣機構》 12. 如。月求項1至11中任一項之曝光裝置用光照射裝置，其中 更包含控制上述複數個光源部之點亮或熄滅之控制 部，且 上述控制部，係以上述各卡匣内之上述特定數之光源 部近似旋轉對稱地點亮之方式進行控制。 1 3.如吻求項1至1丨中任一項之曝光裝置用光照射裝置，其中 更包含控制上述複數個光源部之點亮或熄滅之控制 部，且 上述控制部，係以交替地使上述各卡匣内之上述特定 數之光源部中成為近似旋轉對稱之位置之上述光源部點 亮之方式進行控制。 14_如請求項1至13中任一項之曝光裝置用光照射裝置，其中 上述特定數之光源部，係包含分光特性不同之複數種 光源部。 15. —種曝光裝置用光照射裝置，其特徵在於：包含 S 153878.doc 201214052 複數個光源部’其等分別包括發光部、及使自該發光 中產生之光以指向性射出之反射光學系統； 複數個卡匣，其等可分別安裝特定數之上述光源部； 支持體，其可安裝該複數個卡匣；以及 控制部，其控制上述複數個光源部之點亮或熄滅； 且，上述控制部係以上述各卡匣内之上述特定數之光 源部近似旋轉對稱地點亮之方式進行控制。 16.如請求項15之曝光裝置用光照射裝置，其中 上述控㈣’係藉由以上述複數個切之上述特定數 之光源部以相同之點亮圖案近似旋轉對稱地同時點亮之 方式進行控制’而使上述所有光源部近似旋轉對稱地點 I7·如清求項15或者16之曝光裝 上述控制部’包含上述卡！内之特定數之光：：中點 亮之上述光源部之數量不同之複數個點亮圖案組 該各點亮圖案組，分別具有上述光源部近似旋轉對 稱地點壳之複數個點亮圖案。 、 18.如請求項17之曝光裝置用光照射裝置，其中 更包含對上述各光源部 器，且 延仃。十時之計時 係根據所需之照度，選 免圖案組之任一個，並且於該選擇之 =個點 於上述光源部之點亮時間，選擇上述點亮圖宰中’基 19.如請求項17之曝光裝置用光照射裝置，其中 153878.doc 201214052 更包含對上ϋ各光源部之點糾間進行計時之 器，且 上述控制部，係基於上述各光源部之點亮時間、以及 點亮時所供給之電㈣者電力，計算上述複數個光源部 之剩餘壽命， ▲上述控制冑’係根據所需之照纟’選擇上述複數個點 焭圖案組之任一個’並且於該選擇之點亮圖案組中，基 於上述光源部之刺餘壽命，選擇上述點亮圖案。 20. 如請求項18或者19之曝光裝置用光照射裝置，其中 於上述所需之照度，與藉由上述複數個點亮圖案組所 獲得之…、度不同時，選擇獲得與上述所需之照度接近之 照度之點亮圖案組，並且調整對上述點亮之光源部供給 之電壓或者電力。 21. —種曝光裝置用光照射裝置，其特徵在於：包含 複數個光源部，其等分別包括發光部、及使由該發光 邛產生之光以指向性射出之反射光學系統； 複數個卡H，其等可分別安裝特定數之上述光源部； 支持體，其可安裝該複數個卡匣；以及 控制。卩，其控制上述複數個光源部之點亮或熄滅； 且，上述控制部，係以交替地使上述各卡匿内之上述 特定數之光源部中成為近似旋轉對稱之位置之上述光源 部點亮之方式進行控制。 22. 如請求項21之曝光裝置用光照射裝置，其中 上述控制部，係藉由以上述複數個卡匣之上述特定數 153878.doc 201214052 之光源部以相同之點 而使上述所有光源部 光源部交替地點亮。 免圖案同時點亮之方式進行控制， 中成為近似旋轉對稱之位置之上述 種曝光裝置用光照射裝 — TT做你^： 包含 特定數之光源部，其箄公丨6 八寺刀別包括發光部、及使由該發 先4產生之光以指向性射出之反射光學系統；以及 其係以上述特定數之光源部之U射至積光器 透鏡之入射面之方式，支持上述特定數之光源部； 且，上述特定數之光源部，係包含分光特性不同之複 數種光源部。 24. 如請求項23之曝光裝置用光照射裝置，其中 上述特疋數之光源部之各發光部係分光特性相同，且 上述特定數之光源部，係藉由於其一部分配置波長截 止遽光片’而構成分光特性不同之複數種光源部。 25. 如請求項23或者24之曝光裝置用光照射裝置，其中 包含複數個上述卡匣， 並且，更包含以使上述所有光源部之光入射至上述積 光器透鏡之入射面之方式，安裝有上述複數個卡匿之基 座0 26. —種曝光裝置，其特徵在於：包含 基板保持部，其保持作為被曝光材之基板； 光罩保持邛，其以與上述基板對向之方式保持光罩； 以及 照明光學系統，其包括如請求項！至25中任一項之 153878.doc 201214052 述光照射裝置、及使自該光照射裝置之複數個光源部出 射之光入射之積光器透鏡； 且’使來自上述照明光學系統之光經由上述光罩，照 射上述基板。 27. 28. 29. 種曝光方法，其特徵在於：其係使用如下曝光裝置， 該曝光裝置包含： 基板保持部’其保持作為被曝光材之基板； 光罩保持部，其以與上述基板對向之方式保持光罩； 以及 照明光學系統，其包括如請求項1至25中任一項之上 述光照射裝置、及使自該光照射裝置之複數個光源部出 射之光入射之積光器透鏡； 且，使來自上述照明光學系統之光經由上述光罩，照 射上述基板D 一種基板，其特徵在於：其係使用如請求項”之曝光方 法進行曝光者。 -種曝光裝置用光照射裝置之點亮控制方法，其係該曝 光裝置用光照射裝置包含： 複數個光源部，其等分別包括發光部、及使由該發光 部產生之光以指向性射出之反射光學系統； 複數個卡E，其等可分別安裝特定數之上述光源部； 支持體，其可安裝該複數個卡匣；以及 控制部，其控制上述複數個光源部之點亮或熄滅； 且上述控制。p，係以上述各卡昆内之上述特定數之 153878.doc 201214052 光源部近似旋轉對稱地點亮之方式進行控制。 3〇· -種曝光裝置用光照射裝置之點亮控制方法，其係該曝 光裝置用光照射裝置包含： 複數個光源部，其等分別包括發光部、及使由該發光 部產生之光以指向性射出之反射光學系統； 複數個卡E，其等可分別安裳特定數之上述光源部； 支持體，其可安裝該複數個卡匣；以及 控制部’其控制上述複數個光源部之點亮或總滅； 且，上述控制部’係以交替地使上述各卡匣内之上述 特定數之光源部中成4近似旋轉對稱之位置之上述光源 部點亮之方式進行控制。 31. -種曝光裝置用光照射裝置之點亮控制方法，其特徵在 於.其係該曝光裝置用光照射裝置包含： 複數個光源部，其等分別包括發光部、及使由該發光 部產生之光以指向性射出之反射光學系統； 複數個卡E，其等以使特定數之上述光源部之光入射 至積光器透鏡之人射面之方式，支持上述特定數之光源 部； 。土座錢以使上述所有光源部之光入射至上述積光 器透鏡之入射面之方式，安裝有上述複數個卡匡； 照度计，其係配置於上述積光器透鏡之下游側，且測 量與各波長對應之照度；以及 控制’其控制上述各發光部之點亮/熄減、及照度； 且，上述特定數之光源部係、包含分光特性不同之複數 153878.doc 201214052 種光源部； 且，上述控制部，係以基於由上述照度計測量之與各 波長對應之照度，於特定之波長中獲得所需之照度之方 式，控制上述卡匣内之各光源部。 32.如請求項31之曝光裝置用光照射裝置之點亮控制方法， 其中 上述特定數之光源部之各發光部係.分光特性相同， 且，上述特定數之光源部，係藉由於其一部分配置波 長截止濾光片’而構成分光特性不同之複數種光源部。 S 153878.doc201214052 VII. Patent application scope: ι_ An exposure device using a light-emitting device, characterized in that it comprises: a plurality of light source portions, one stem eight ^ t ~ 〃 special knife includes a light-emitting portion, and The light generated by the light-emitting portion is a plurality of latches of the reflective optical system that emits light in a directional manner, and the light source portion can be mounted with a specific number, and a support body that can mount the plurality of cassettes. 2. The light irradiation device for exposure slitting according to claim 1, wherein the card E includes a (four) support portion that supports the specific number of light source portions, and the light source n卩n becomes a light source from the specific number The distance between each of the optical axes from the respective irradiation surfaces irradiated by the partial light to the incident surface of the light-collecting lens that is emitted by the light of the specific number of light source portions is substantially constant. 3. The light-emitting device for an exposure apparatus according to claim 2, wherein the support body includes a plurality of card mounting portions to which the plurality of cards E are respectively mounted, and wherein the plurality of cutting attachment portions are formed as The distance between each of the optical axes irradiated by the light of all the light source sections to the respective human optical surfaces of the light-collecting lens of the light source II is substantially constant. 4. The light-emitting device for an exposure apparatus according to claim 3, wherein the plurality of card E mounting portions respectively include an opening portion facing the light source supporting portion of the card, and a periphery formed around the light source supporting portion The planar plane is spliced to the plane, and 153878.doc 201214052 The planes of the plurality of cassette mounting portions arranged in a particular direction are intersected at a specific angle. 5. The light-emitting device for an exposure apparatus according to claim 4, wherein the cartridge mounting portion of the support is formed in a concave portion having the flat surface as a bottom surface, and the cartridge is fitted to the cartridge mounting portion. Concave. The light-emitting device for an exposure apparatus according to any one of claims 1 to 5, wherein the card S includes a light source support portion that supports the specific number of light source units, and is supported by the light source support unit by four sides. The line at the center of the light source portion at the outermost periphery has a rectangular shape. 7. The light-emitting device for an exposure apparatus according to claim 6, wherein the support body comprises a plurality of cassette mounting portions respectively mounted with the plurality of cassettes, and the plurality of cassette mounting portions are arranged to be mutually The respective numbers of the above-described cassettes arranged in the orthogonal direction are formed to have a rectangular shape. 8. The light-emitting device for an exposure apparatus according to any one of claims 2 to 7, wherein the cartridge is attached to the light source support in a state of surrounding the specific number of light source portions supported by the light source support portion. The mask member of the portion directly faces the back surface of the reflection optical system of the light source unit in a housing space between the light source support portion and the mask member. 9. The light-emitting device for an exposure apparatus according to claim 8, wherein the cover member is formed with at least one communication hole and a communication groove that communicates the accommodation space with the outside of the cover member. The exposure apparatus according to any one of claims 1 to 9, wherein the support body is provided with a cooling pipe for circulating cooling water to cool the respective light source sections. 11. The light-emitting device for an exposure apparatus according to any one of claims 1 to 1, comprising at least one side from the rear side and the side side, forcibly discharging the respective irradiation surfaces irradiated with light of each of the light source units Forced exhaust mechanism to support the air in the body. 12. The light-emitting device for an exposure apparatus according to any one of the preceding claims, further comprising: a control unit for controlling lighting or extinguishing of the plurality of light source units, wherein the control unit is configured by the above-mentioned respective cassettes The specific number of light source sections are controlled to be approximately rotationally symmetrically lit. 1. The light-emitting device for an exposure apparatus according to any one of claims 1 to 1, further comprising a control unit for controlling lighting or extinction of said plurality of light source units, wherein said control unit is alternately The light source unit having a position close to the rotational symmetry of the specific number of light source units in the respective cassettes is controlled to be lit. The light-emitting device for an exposure apparatus according to any one of claims 1 to 13, wherein the light source unit of the specific number includes a plurality of light source units having different spectral characteristics. A light-emitting device for an exposure apparatus, comprising: S 153878.doc 201214052, a plurality of light source units ′, each of which includes a light-emitting portion, and a reflection optical system that emits light generated from the light-emitting light with directivity a plurality of cassettes, which may respectively mount a specific number of the light source sections; a support body capable of mounting the plurality of cassettes; and a control unit that controls lighting or extinction of the plurality of light source sections; The control unit controls the light source unit of the specific number in each of the cassettes to illuminate approximately rotationally symmetrically. 16. The light-emitting device for an exposure apparatus according to claim 15, wherein the control (four)' is performed by simultaneously illuminating the plurality of light source portions of the plurality of cuts in the same lighting pattern with approximately the same lighting pattern. Controlling all of the above-mentioned light source sections to approximate the rotationally symmetrical position I7. The exposure apparatus of the above-mentioned claim 15 or 16 includes the above-mentioned card! A specific number of lights in the middle: a plurality of lighting pattern groups in which the number of the light source units is different at the midpoint. Each of the lighting pattern groups has a plurality of lighting patterns in which the light source unit is approximately rotated to the symmetrical position. 18. The light-emitting device for an exposure apparatus according to claim 17, wherein the light source unit is further included and delayed. The timing of the ten o'clock is selected according to the required illumination, and any one of the pattern groups is selected, and the lighting time of the light source portion is selected at the selected point = the above lighting pattern is selected as the base 19. If the request item A light-emitting device for an exposure apparatus of 17, wherein 153878.doc 201214052 further includes means for timing a point correction between each of the light source units, and the control unit is based on lighting time of each of the light source units and lighting Calculating the remaining life of the plurality of light source sections when the power is supplied, and the above control 胄 'selects any one of the plurality of dot pattern groups according to the required illumination ‘ and at the point of selection In the bright pattern group, the lighting pattern is selected based on the remaining life of the light source unit. 20. The light-emitting device of the exposure apparatus of claim 18 or 19, wherein, when the desired illuminance is different from the degree of ... obtained by the plurality of lighting pattern groups, the selection and the required The lighting pattern group whose illuminance is close to the illuminance is adjusted, and the voltage or electric power supplied to the above-mentioned light source unit is adjusted. A light-emitting device for an exposure apparatus, comprising: a plurality of light source units each including a light-emitting portion and a reflection optical system that emits light generated by the light-emitting pupil in a directivity; a plurality of cards H And the like, wherein the plurality of light source sections can be separately mounted; a support body that can mount the plurality of cassettes; and control.卩 controlling the lighting or extinguishing of the plurality of light source units; and the control unit alternately causing the light source unit to be approximately rotationally symmetric in the specific number of light source units in each of the locks Bright way to control. 22. The light-emitting device for an exposure apparatus according to claim 21, wherein said control unit causes said light source portion to be light source by said light source portion of said specific number 153878.doc 201214052 of said plurality of cassettes The parts are lit alternately. The above-mentioned type of exposure device is controlled by the light-emitting device in the position where the pattern is approximately symmetrical, and the TT is used as the light source unit of the specific number, and the illuminating part of the 寺 寺 包括 包括 包括And a reflection optical system that emits light generated by the first light 4 in a directivity; and the U of the light source portion of the specific number is incident on an incident surface of the light concentrator lens, and supports the specific number The light source unit; and the specific number of light source units includes a plurality of light source units having different spectral characteristics. 24. The light-emitting device for an exposure apparatus according to claim 23, wherein each of the light-emitting portions of the light source portion has the same spectral characteristics, and the light source portion of the specific number is configured by a part of the wavelength-cutting light-emitting sheet 'There are a plurality of light source sections having different spectral characteristics. 25. The light-emitting device for an exposure apparatus according to claim 23 or 24, comprising a plurality of the above-mentioned cassettes, and further comprising means for causing light of all of said light source parts to be incident on an incident surface of said light-collecting lens A susceptor having a plurality of latches as described above, comprising: a substrate holding portion that holds a substrate as an exposed material; and a photomask holding port that is held in a manner opposed to the substrate Photomask; and illumination optics, including as requested! 153878.doc 201214052 discloses a light irradiation device and an illuminator lens for causing light emitted from a plurality of light source portions of the light irradiation device to enter; and 'passing light from the illumination optical system through the above A photomask that illuminates the substrate. 27. 28. 29. An exposure method characterized by using an exposure apparatus comprising: a substrate holding portion that holds a substrate as an exposed material; and a mask holding portion that is opposite to the substrate And a illuminating optical system comprising: the light illuminating device according to any one of claims 1 to 25; and an illuminator for causing light emitted from a plurality of light source portions of the light illuminating device to be incident a lens; the light from the illumination optical system is irradiated to the substrate D via the photomask, and the substrate is exposed by using an exposure method as claimed in the above-mentioned item. The light control device for the exposure apparatus includes: a plurality of light source units each including a light emitting unit and a reflective optical system that emits light generated by the light emitting unit in a directivity; a plurality of cards E, which may separately mount a specific number of the above-mentioned light source sections; a support body capable of mounting the plurality of cassettes; and a control section that controls the above-mentioned complex The plurality of light source units are turned on or off; and the above control p is controlled such that the light source unit is illuminated in a substantially rotationally symmetrical manner by the specific number of the above-mentioned respective kanjis 153878.doc 201214052. A lighting control method for a light-emitting device for a device, wherein the light-emitting device for the exposure device includes: a plurality of light source portions each including a light-emitting portion and a reflection optical for causing light generated by the light-emitting portion to emit light with directivity a system; a plurality of cards E, which may respectively share a specific number of the light source portions; a support body that can mount the plurality of cassettes; and a control portion that controls the lighting or total off of the plurality of light source portions; Further, the control unit' is configured to alternately light the light source unit at a position where the specific number of the light source units in the respective cassettes are approximately rotationally symmetrical. A lighting control method for an exposure device, characterized in that the light irradiation device for the exposure device includes: a plurality of light source portions each including a light emitting portion and causing the light emitting portion a reflecting optical system that emits light in a directional manner; a plurality of cards E that support the specific number of light source sections in such a manner that light of a specific number of the light source sections is incident on a human emitting surface of the illuminator lens The earthen money is attached to the plurality of cassettes such that light of all of the light source units is incident on the incident surface of the light concentrator lens; and the illuminometer is disposed on the downstream side of the illuminator lens. And measuring illuminance corresponding to each wavelength; and controlling 'controlling the lighting/de-zeroing and illuminance of each of the light-emitting portions; and the light source portion of the specific number includes a plurality of light sources having different spectral characteristics. 153878.doc 201214052 Light sources And the control unit controls each of the light source units in the cassette so as to obtain a desired illuminance at a specific wavelength based on the illuminance corresponding to each wavelength measured by the illuminometer. The lighting control method of the light-emitting device for an exposure apparatus according to claim 31, wherein each of the light-emitting portions of the light source portion of the specific number has the same spectral characteristics, and the light source portion of the specific number is a part thereof The wavelength cut filter is disposed to constitute a plurality of light source sections having different spectral characteristics. S 153878.doc
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JP6095240B2 (en) 2017-03-15
KR101409670B1 (en) 2014-06-18
KR20110106836A (en) 2011-09-29
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CN102369484A (en) 2012-03-07
WO2011096365A1 (en) 2011-08-11

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