TW201232186A - Light irradiation device for exposure device, control method of light irradiation device, exposure device, and exposure method - Google Patents

Abstract

The present invention provides a light irradiation apparatus for an exposure apparatus, the exposure apparatus and an exposure method. The light irradiation apparatus for exposure apparatus can shorten the time for replacing a light source part and the time for stopping the device. The light irradiation apparatus (80) comprises the following components: a plurality of light source parts (73) which respectively comprise a lamp (71) and a reflector (72) that cause the light emitted from the lamp (71) to be transmitted out directionally; a plurality of lamp boxes (81) which can respectively be equipped with a preset number of light source parts (73); and a frame (82) which can be equipped with a plurality of lamp boxes (81).

Description

201232186 VI. Description of the Invention: [Technical Field] The present invention relates to a light irradiation device for an exposure device, a control method of the light irradiation device, an exposure device, and an exposure method, and more particularly, the present invention relates to an applicable The light irradiation device, the light irradiation device control method, the exposure device, and the exposure method of the exposure device for exposing the mask pattern of the mask to a substrate of a large flat panel display such as a liquid crystal display or a plasma display. [Prior Art: Technique] Conventionally, as an apparatus for manufacturing a panel such as a color filter of a flat panel display device, various exposure apparatuses such as a proximity exposure apparatus, a scanning exposure apparatus, a projection exposure apparatus, a mirror projection, and a close exposure apparatus have been considered. For example, in the split-sequential proximity exposure device, the mask table is moved stepwise relative to the mask after the mask is held smaller than the substrate and the substrate is held by the workpiece table to align the two adjacently. And irradiating the substrate for the pattern exposure from the mask side substrate in each step, thereby exposing and transferring the plurality of patterns drawn on the mask onto the substrate to form a plurality of panels on one substrate. Further, in the scanning exposure apparatus, the substrate for transport at a constant speed is irradiated with light for exposure through a mask to expose the pattern of the transfer mask on the substrate. In recent years, the display device has become larger and larger, for example, in the case of dividing the successive exposures, in the case of manufacturing the 8th generation (2200 mmx2500 mm) panel with 4 exposures, the exposure area becomes 13〇0 mrnxmo mm, In the case of manufacturing with 6 exposures, the exposure area becomes 11〇〇.

S 157707.doc 201232186 mmx75 0 mm. Therefore, it is also required to enlarge the exposure area for the exposure apparatus, and it is also necessary to increase the output of the light source used. Therefore, it is known to use a plurality of light sources as illumination optical systems to increase the output of the entire light source (for example, refer to Patent Documents 1, 2 and 3). In the illumination device for exposure according to Patent Document 1, the size of the region where the divergent light emitted from the light source portion is incident on the incident surface is smaller than the incident surface so that all the divergent light is incident on the incident surface, thereby achieving the light emitted from the light source portion. Further, the light irradiation device described in Patent Document 2 is provided with a partition wall for blocking light between adjacent light sources, and prevents light from the adjacent light source from being irradiated to solve the problem of the light source portion due to heating or the like. Further, in the light-emitting device described in Patent Document 3, the two light source units in which a plurality of light source units are arranged in a staggered manner are arranged apart in the front-rear direction to have a gap between the light source units, thereby efficiently cooling the light source unit. Further, in the light irradiation device described in Patent Document 4, a light shielding mechanism that shields light from the light source and narrows the light collecting angle of the light incident on the integrator lens is provided, and the integrator lens having a narrow irradiation area is used. When the light shielding mechanism is inserted into the optical path. CITATION LIST Patent Literature Patent Literature 1: Japanese Patent Laid-Open No. Hei. No. 4,391,136 Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. As shown in Fig. 28 (a), in the light irradiation device 1 for exposure apparatus, in order to cause all the light B from the plurality of ultrahigh pressure mercury lamps 2 to enter the integrator 3, a plurality of ultrahigh pressure mercury lamps 2 are arranged along the curved surface to be substantially circular. Arc shape. Even if the ultrahigh pressure mercury lamp 2 is never used, the light irradiated from the ultrahigh pressure mercury lamp 2 generally has approximately two. The left and right light diffusion angles, if a large current is supplied to the electrodes for obtaining/seeking the output, the tungsten electrode in the spherical body of the light source gradually evaporates and the electrodes are spaced apart from each other with the passage of time, and the light source is The base point becomes large, and as a result, as shown in FIG. 28(b), the irradiation angle of light is increased to, for example, 2.2. . In the case of 5 hr, if the distance from the ultrahigh pressure mercury lamp 2 to the integrator 3 is, for example, 4 m, the irradiation angle changes by 0.2. In the case of the irradiation position (the accumulation surface), the size of the illuminating blade 3 is usually about 1 〇〇 to 200 mm, which corresponds to an increase in the irradiation range of about 14 claws. Therefore, a part of the light from the ultrahigh pressure mercury lamp 2 is not incident on the integrator 3 and becomes a loss. Therefore, there is a problem that the illuminance is lowered. Dedicated to 1~4: The technology is based on setting the light incident area of the integrator, or responding to the countermeasures of light ', ', ', and, and is not considered for the above-mentioned electricity. The light is diffused, so there is room for improvement. . The present invention has been made in view of the above problems, and it is an object of the invention to provide a light source. The exposure light illuminating device, the light irradiation device control method, the exposure device, and the exposure method are reduced in accordance with the illuminating time.

S 157707.doc 201232186 Technical Solution to Problem The above object of the present invention is achieved by the following constitution. (1) A light-emitting device for an exposure apparatus, comprising: a plurality of light source units each including a light-emitting portion and a reflection optical system; the light-reflecting optical system causes the light generated from the light-emitting portion to be directed to the factory a plurality of s boxes including a light source branch portion, wherein the light source branch portion is configured such that the light of the light source portion of the special number 1 is incident on the light source portion of the integrator lens; a plurality of (four) cartridge mounting portions that respectively mount the plurality of cassettes such that light of all of the light source units is incident on an incident surface of the integrator lens; and an optical axis angle adjustment mechanism that adjusts each of the light source units The light diffusion caused by the elapse of the irradiation time of each of the light source sections is corrected with respect to the optical axis angle of the integrator lens. (2) The light-emitting device for an exposure apparatus according to (1), wherein the specific number of the light source sections includes a plurality of light source sections having different spectral characteristics. (3) The light-emitting device for an exposure apparatus according to (2), wherein the light-emitting characteristics of the respective light-emitting portions of the specific number of light source sections are the same, and the specific number of the light source sections are configured by a part of the light-emitting sections A plurality of light source sections having different spectral characteristics are formed. (4) An exposure apparatus characterized by comprising: a substrate holding portion that holds a substrate as an exposure material; a mask holding portion that holds a mask opposite to the substrate; and an illumination optical system The light-emitting 157707.doc rs • 6 · 201232186 device according to any one of (1) to (3), and an integrator lens into which light emitted from a plurality of light source units of the light irradiation device is incident; and the substrate is passed through The light from the illumination optical system is illuminated by a mask. (5) A method of controlling a light-emitting device for an exposure apparatus, characterized in that the light-emitting device for the exposure device comprises: a plurality of light source portions each including a light-emitting portion and a reflection optical system, the reflection optical system The light generated by the light-emitting portion is directed to emit light; the plurality of ® boxes include a light source support portion that supports the light source in such a manner that light of the specific number of light source portions is incident on an incident surface of the integrator lens a plurality of cartridge mounting portions that are respectively mounted with the plurality of cassettes in such a manner that light of all of the light source portions is incident on an incident surface of the integrator lens; and an optical axis angle An adjustment mechanism for adjusting an optical axis angle of each of the (4) portions with respect to the integrator lens to correct a light diffusion caused by the illumination time of each of the light source portions; and the light irradiation device for the exposure device The control method includes the following steps: detecting the light diffusion generated by the elapse of the irradiation time of each of the light source sections; and by the above The optical axis angle adjustment mechanism corrects the light diffusion described above. (6) The method of controlling a light-emitting device for an exposure apparatus according to (7), wherein the light-emitting device of the exposure device further comprises: ’’. The illuminance corresponding to the length of each wave 157707.doc 5 201232186 is measured on the downstream side of the integrator lens, and the control unit controls the lighting, extinction, and illumination of each of the light emitting units; and the specific number of the light source units a plurality of light source units having different spectral characteristics, wherein the control unit controls the light source units in the cassette so as to obtain a desired illuminance at a specific wavelength based on the brightness corresponding to each wavelength measured by the illuminometer . (7) The method of controlling a light-emitting device for an exposure apparatus according to (6), wherein the light-emitting characteristics of the light-emitting portions of the specific number of light source sections are the same, and the light source section of the characteristic number S is configured to have a wavelength by a part thereof The cutoff filter constitutes a plurality of light source sections having different spectral characteristics. (8) an exposure method, comprising: a substrate holding portion that holds a substrate as an exposed material; a mask holding portion that holds a mask in a manner opposed to the substrate; and an illumination optical system The light irradiation device according to any one of (5) to (7), wherein the light emitted from a plurality of light source portions of the light irradiation device is incident on the integrator lens; and the exposure method is performed by (5) to (7) The method of controlling the light irradiation device according to any one of the preceding claims, wherein the substrate is irradiated with light from the illumination optical system via the material, and the pattern formed on the mask is exposed and transferred to the substrate. Advantageous Effects of Invention A light irradiation device for an exposure apparatus according to the present invention includes: a plurality of light source sections including a light-emitting section and a reflection optical system and a plurality of degrees, 157707.doc rs • 8 · 201232186 人―#特疋a light source support portion of the light source portion of the number; a support body, the package: the female skirt has a plurality of g boxes (four) including the mounting portion; and the optical axis angle adjustment can neat the optical axis of each light source portion relative to the integrator lens The angle ^ is corrected by the optical expansion of the light source portion with the passage of the irradiation time, and the light diffusion is generated by the irradiation of the light source portion. 70 loo/ from each light source P. The light of the irradiation amount is incident on the integrator lens, whereby the illuminance can be suppressed from decreasing with the passage of the irradiation time, and stable illuminance can be obtained for a long period of time. Further, according to the control method of the light irradiation device for an exposure apparatus of the present invention, light diffusion generated by the elapse of the irradiation time of each light source unit is detected, and the detected money is corrected by the optical axis angle adjustment mechanism. It is possible to suppress the illuminance of 7 G to 1 G (%) of the light source from each light source portion to be incident on the integrator lens, and it is possible to suppress the illuminance from decreasing with the lapse of the irradiation time, and it is possible to obtain stable illuminance for a long period of time. Further, according to the exposure apparatus and the exposure method of the present invention, the pattern formed on the mask is exposed and transferred to the substrate by using the above-described exposure apparatus light irradiation apparatus and the control method thereof, so that exposure light with long-term stable illumination can be exposed. Therefore, high-precision exposure can be performed to improve the quality of the product. [Embodiment] Hereinafter, an embodiment of a light irradiation device for an exposure apparatus of the present invention, an exposure apparatus using the light irradiation device, and an exposure method will be described in detail based on the drawings. (First embodiment)

S 157707.doc 201232186 As shown in FIG. 1 and FIG. 2, the split-sequential proximity exposure apparatus PE of the present embodiment includes a mask stage 1 in which a mask is held, and a glass substrate (exposed material) is held. The substrate stage 20; and the illumination optical system 70 for illuminating the light for pattern exposure. Further, the glass substrate W (hereinafter simply referred to as "substrate w") is disposed opposite to the mask ,, and the surface on which the pattern drawn on the mask is to be exposed is exposed (the pair of masks) The sensitizer is coated on the surface side. The mask stage 10 includes a mask base Π which is formed with a rectangle at the center.

The shape opening 11a, the mask holding frame 12, which is movably attached to the opening 11a of the mask base u and the mask driving mechanism 16 as a mask holding portion in the X-axis 'Y-axis and the θ direction, It is disposed on the upper surface of the mask base η, and moves the mask holding frame 12 in the X-axis, the γ-axis, and the θ direction to adjust the position of the mask Μ. The mask base 11 is movably supported in the y-axis direction (see FIG. 2) by the struts 51 that are erected on the apparatus base 5 、 and the yaw moving device 52 that is provided at the upper end of the struts 51, and is disposed. Above the substrate table 2〇. As shown in FIG. 3, a flat bearing surface 13 is disposed on a plurality of portions on the upper surface of the peripheral edge portion of the opening Ua of the mask base lamp, and the mask holding frame 12 is provided at the flange l2a of the outer peripheral edge portion of the upper end thereof. It is placed on the flat bearing surface 13. Thereby, the mask holding frame 12 is inserted into the opening 11a of the mask base u with a specific slit therebetween, so that the gap amount can be moved only in the X-axis, Y-axis, and θ directions. Further, on the lower surface of the mask holding frame 12, the chuck portion 14 holding the mask 固定 is fixed via the spacer 15. The chuck portion 14 is further provided with a plurality of suction nozzles 157707.doc •10-201232186 14a mask]Vi via the suction 5 for adsorbing the mask Μ without describing the peripheral portion of the mask pattern The nozzle 14a is detachably held by the chuck portion 14 by a vacuum suction device (not shown). Further, the center disk portion 14 and the mask holding frame 12 are movable in the χ, γ, and θ directions with respect to the mask base u. The mask driving mechanism 16 includes two x-axis driving devices 16y attached to one side of the mask holding frame 12 in the x-axis direction, and j stages mounted on one side of the mask holding frame 12 along the γ-axis direction. The pumping direction drive unit (6). The cymbal-direction pulsation device 16E includes a driving actuator (for example, an electric actuator or the like) 16a provided on the mask base 丨1, including a rod 16b that expands and contracts in the Y-axis direction, and a slider 16d. Connected to the front end of the rod 16b via the pin supporting mechanism; and the guide rail 16e' is attached to the side of the mask holding frame η in the y-axis direction, and is movably mounted with the slider 16^, X-axis The direction driving device 16x also has the same configuration as the γ-axis direction driving device 16y. Further, in the mask driving mechanism 16, the mask holding frame 12 is driven in the axial direction by driving the stage and the axial direction driving device 16x, and the two γ-axis direction driving devices 16y are driven in the same manner. The occlusion holding frame 12 is moved in the direction of ¥=. Further, by driving either of the two Y-axis direction driving devices 16y, the mask holding frame 12 is moved in the x-direction (rotation around two axes). The surface is provided with: a mask 18 between the faces 14 is moved and disposed on the cover, and as shown in FIG. 1, a gap sensor 17 is formed on the base of the mask base, and the mask is measured. The gap with the substrate W and the alignment camera 18 are used to confirm the mounting position of the chuck portion. The gap sensors 17 and the alignment camera mechanism 19 are held movably in the X-axis and γ-axis directions.

S 157707.doc -11 - 201232186 The cover is held inside the frame 12. Further, on the mask holding frame 12, as shown in Fig. 1, at both end portions of the opening 11a of the mask base 11 in the X-axis direction, light which shields both ends of the mask as needed is provided. An aperture blade 38. The diaphragm blade 38 is movable in the X-axis direction by a diaphragm driving mechanism 39 including a motor, a ball screw, and a linear guide to adjust the shielding area of both ends of the mask μ. Further, the diaphragm blades 38 are provided not only at both end portions of the opening 11a in the X-axis direction but also at both end portions of the opening 1 1 a in the Y-axis direction. As shown in FIGS. 1 and 2, the substrate stage 20 includes: a substrate holding portion 21 holding the substrate w; and a substrate for moving the substrate holding portion 21 in the X-axis, the γ-axis, and the z-axis direction with respect to the device chassis 5 Drive mechanism 22. The substrate holding portion 21 detachably holds the substrate w by a vacuum suction mechanism (not shown). The substrate driving mechanism 22 includes a γ-axis platform phantom, a cymbal feeding mechanism 24, an X-axis stage 25, a cymbal feeding mechanism %, and a ζ_ tilt adjusting mechanism 27 below the substrate holding portion 21. As shown in FIG. 2, the cymbal feeding mechanism 24 includes a linear guide 28 and a feed drive mechanism 29 to constitute a slidable body (not shown) attached to the back surface of the cymbal platform 23 and straddles The two guide rails U are extended on the base 5 of the device and are driven by the motor 32 and the ball screw to drive the γ. The X-axis feed mechanism 26 also has a structure with the spindle feed mechanism 24. The movable wedge machine is driven in the χ direction relative to the Y-axis platform 23 by a combination of a wedge-shaped movement (4) and a 仏157707.doc -12-201232186 moving mechanism 36. The downtime machine is configured to have one unit disposed on one end side in the X direction and two units disposed on the other end side. Further, the feed drive mechanisms 29, 36 may be a combination of a motor and a ball screw device or a linear motor including a stator and a rotor. Further, ^ ^ and the number of Z_tilt adjustment mechanisms 27 are arbitrary. Thereby, the substrate driving mechanism 22 feeds the substrate holding portion 2 in the meandering direction and the weir direction, and finely adjusts the gap between the mask and the opposing surface of the substrate, so that the substrate holding portion 2mz is in the axial direction (four) And tilt it. A rod (four) '62' is mounted on the X-direction side portion and the γ-direction side portion of the substrate holding portion 21, respectively, and a total of three laser interferences are provided on the end portion and the end portion of the device base 5 () in the meandering direction. Instruments 63, 64, 65. Thereby, the laser beams 7 are irradiated to the rod mirrors 61, 62 by the radiation interferometers 63, 64, 65, and the laser light reflected by the rod mirrors 62 is received, and the laser light is measured by the rod mirrors 61, 62. The position of the substrate stage (9) is detected by the interference of the reflected laser light. As shown in FIGS. 2 and 4, the illumination optical system 7A includes a light irradiation device including a plurality of light source portions 73, an integrator lens 74 from which a light beam emitted from a plurality of light source portions 73 is incident, and an optical control portion 76. The DC current whose voltage is adjusted is supplied to the lamp 71 of each light source unit 73; the concave mirror 77 changes the direction of the optical path emitted from the exit surface of the integrator lens 74; and the exposure control fast H78 is disposed in the plurality of light sources (4) and The integrator lens 74 is opened and closed so as to penetrate and block the irradiated light. Furthermore, between the integrator lens 74 and the exposure surface, a Duv cut-off chopper, a polarization chopper, a band pass filter, and a wave filter may be disposed, and the concave mirror 77 may also be 157707.doc •13· 201232186 An angling correction mechanism that can manually or automatically change the curvature of the lens is provided. As shown in FIGS. 4 to 8, the 'light-emitting device 80 includes a plurality of light source units 73' that include an ultra-high pressure mercury lamp 71 as a light-emitting portion and a light-reflecting light that is emitted from the lamp 71 in a directivity manner. The mirror 72 of the system has a plurality of g boxes 81 which are respectively mounted with a specific number of light source portions 73 of a plurality of light source portions, and a support (four) which can be mounted with a plurality of cassettes 81. In the optical system 70, when an If shape of a 160 W ultra-high mercury lamp is used, 3 μ light sources are required for the exposure apparatus for manufacturing the 6th generation flat plate. 572 572 light sources 4 are required for the exposure apparatus for manufacturing the 7th generation flat plate, 774 light source units are required for the exposure apparatus for manufacturing the 8th generation flat plate. However, in the present embodiment, for simplification of description, as shown in FIG. 4, 54 light source units 73 will be described, and the 54 light source units will be mounted. The cassette 81 having a total of six light source units 73 in the direction of 3 • k and two lines in the β direction is arranged in a total of nine rows. Further, regarding the cassette 81 or the support 82, it is also considered that the light source unit 73 is arranged in the same number of square shapes in the α and β directions, but is used in a different number of rectangular shapes in the α' β direction. Further, in the light source portion 73 of the present embodiment, the opening portion 72b of the mirror 72 is formed into a substantially rectangular shape, and is arranged so that the four sides are in the directions α and p. Further, the opening α portion 72b having a substantially rectangular shape is not limited to the one shown in Fig. 7 (the square shape or the substantially rectangular shape in which the corner portion 72c is crossed at right angles as shown in Fig. 7(b). It is shown that the corner portion 72e is chamfered into a curved shape, or the corner portion 72c is chamfered into a straight line as shown in Fig. 7(c). Further, as shown in Fig. 7(d), 14-157707.doc Rs 201232186, the opening 72b may have a shape in which both ends of the opposite sides are connected by a circular arc. As shown in Fig. 5, the arc tube (quartz glass ball) 94 of the ultrahigh pressure mercury lamp 71 is used. Two electrodes or the like are disposed inside and filled with mercury having a specific mercury vapor pressure of, for example, 105 to 1 〇7 Pascal. In the case of supplying an ultrahigh pressure mercury lamp 71 having a direct current, the electrode includes electrons released to the discharge plasma. The cathode 95 and the self-discharge plasma flow into the anode 96 of the electron and emit light by arc discharge between the cathode % and the anode 96. The arc tube 94 is such that the cathode % and the anode 96 are substantially at the focus of the mirror 72. The mode is fixed. The mirror 72 can be a paraboloid or an ellipse having the reflected light concentrated at the focus. The shape of the circular surface may be a parabolic mirror that causes the reflected light to be parallel light. The mirror 72 includes, for example, a formed body of borosilicate glass or crystallized glass, and a reflective coating film is formed on the inner surface thereof. The light in the visible light region is reflected from the ultraviolet region of 300 to 590 nm, and the light of the unnecessary visible light region or the infrared region is penetrated behind the mirror 72, for example, including a plurality of dielectric layers of 〇2 and ^2) membrane. As shown in FIGS. 5 to 8, each of the cassettes 81 is formed in a substantially rectangular parallelepiped shape including the following members, and the above-described members are: a light source supporting portion 8 that supports the light source portion 73 in a specific number of points. And a concave lamp cover (cover member) 84 that is attached to the light source support portion 83 by pressing the light source 73 supported by the light source support portion. Further, the substantially rectangular parallelepiped shape ' may also be a shape including a chamfered portion. A plurality of window portions 83a are formed on the light source supporting portion 83, which are provided corresponding to the number of the light source portions 73 to emit light from the light source portion, and a lamp 157707.doc 201232186 is provided in the window by a recess 83b' The cover side of the portion 83a surrounds the opening portion 72a of the mirror 72 (or the opening portion of the mirror mounting portion to which the mirror 72 is attached). Further, a plurality of cover glasses 85 are attached to the side opposite to the cover side of the window portion 83a. Further, the mounting of the cover glass 85 is arbitrary or may not be provided. The bottom surface of each of the lamp recesses 83b is formed into a flat surface or a curved surface (in the present embodiment, a plane), that is, the irradiation surface of the light that illuminates the light source unit 73 in a state where the optical axis angle adjusting mechanism 99 described below is not activated (here) The intersection p of the opening 72b) of the mirror 72 and the optical axis LA of the light source unit 73 is located on a single curved surface, for example, a spherical surface r, in the respective α and β directions. An abutting portion 86 abutting against a rear portion of the light source portion 73 is disposed on a bottom surface of the light button cover 84. Each of the abutting portions 86 is provided with an actuator such as a motor or a cylinder, a spring stopper, and a screw stop. A lamp pressing mechanism 87 such as a device. Thereby, each of the light source units 733 is positioned on the cassette 8 1 in such a manner that the opening 72a of the mirror 7 2 is fitted into the lamp recess 83b of the light source branch portion 83, and the light cover is covered. 84 is attached to the light source supporting portion 83, and the rear portion of the light source portion 73 is pressed by the lamp pressing mechanism 87. Therefore, as shown in Fig. 8, light of a specific number of light source portions 73 positioned on the cassette 81 is incident on the incident surface of the integrator lens 74, and light irradiated from each of the illumination surfaces of the specific number of light source portions 73 is reached. The irradiation amount of the incident surface of the integrator lens 74 is 70% to 1 〇〇〇/〇. Further, the support body 82 includes a support body 91 including a plurality of cassette mounting portions 9A on which a plurality of cassettes 8 1 are mounted, and a support body cover 92 mounted on the support body 91 to cover each The back of the box 81. As shown in Fig. 9, when the support body 82 is attached to the light irradiation device 8 157707.doc •16· 201232186, considering the center of gravity of the support body 82 in which the cassette 81 is mounted, it is preferably at the bottom. The angle ψ between the front surface of the E case 81 and the set face of the support body 82 is 90. And install. Thereby, it is possible to prevent the light irradiation device 8 from falling over. Further, Fig. 9 shows ψ = 9 〇. The situation. As shown in FIG. 6, the opening portion 90a facing the light source supporting portion 83 is formed in each of the cassette mounting portions 90, and a plane facing the rectangular plane around the light source supporting portion 83 is formed around the opening portion 9A. 9〇b is used as the bottom of the box for the recess 4 90c. Further, a cassette fixing mechanism 93 for fixing the cassette 81 is provided around the recessed portion 9C of the support body 91. In the present embodiment, the recessed portion 81a formed on the cassette 81 is engaged and fixed. 81 box 81. Further, as shown in FIG. 10, when the cassette 81 is fixed by the cassette fixing mechanism 93, the cassette 81 is assembled to the cassette mounting portion with a portion thereof tilted, and the light irradiation unit 8 can be made. It is difficult to assemble backwards. The planes 9〇b of the recesses 9〇c arranged in the α direction or the β direction are formed to intersect at a specific angle γ (refer to FIG. 8) so that the illumination of each of the cassettes 81 is performed by the light source 邛73. The intersection ρ of the light irradiation surface and the optical axis LA of the light source unit 73 is located on a single curved surface, for example, the spherical surface r in the respective α and β directions. Therefore, each of the cassettes 81 is engaged with the fixing mechanism 93 by fitting the light source supporting portions 83 to the cassette recesses 9〇c of the cassette boxes 90. The recesses 81a of the cassette 81 are respectively fixed to the support body 82. Further, in a state in which the respective cassettes 81 are attached to the support body 91, a support body cover 92 is attached to the support body 91. Therefore, as shown in Fig. 8, all the light source portions positioned on the respective g-boxes 81 are "shot" to the incident surface of the integrator lens 74, and each of the light source portions 73 is illuminated by 157707.doc 5 •17·201232186 The irradiation amount of the light irradiated by the surface to the incident surface of the integrator lens 74 becomes 70% to 100%. Further, instead of the cassette fixing mechanism 93 shown in FIG. 6, as shown in FIG. The through hole 83c is provided on both sides of the opposite side, and the cylindrical shaft member 93a as the concealing means is inserted into the recess 91b of the support main body 91 via the through hole 83c, thereby fixing the cassette 81. The through hole or the cassette fixing mechanism is disposed at an intermediate portion of the opposite sides, but may be disposed, for example, at the four corners of the cassette 81. Further, on the cassette 81, as shown in FIG. 12, the through hole may be replaced. The groove portion 83d opposed to the side surface of the cassette 81 is provided at 83c, and the cylindrical shaft member 93 is inserted into the concave portion 91b of the support body 91 by the groove portion 83d, thereby fixing the cassette 81. The cartridge fixing mechanism can also replace the cylindrical shaft member 93a as a polygonal shaft as shown in FIG. The shape of the through hole 83c or the recessed portion 91b can be changed correspondingly to the piece 93e. In particular, the cassette 81 can be made correct by the combination of the cylindrical member 93a and the polygonal shaft member 93e. The ground is mounted at the standard position of the support body 82. Further, as shown in Fig. 5 and the figure, the cassette fixing mechanism can be used simultaneously with the cassette fixing mechanism % shown in Fig. 6. Alternatively, as shown in Fig. 14 ( a) A cylindrical projection 93b or a polygonal projection as a cassette fixing mechanism is provided at the four corners of the cassette 81, and is fitted to the hole portion or the groove portion 91c formed on the side of the support body 91 as shown in Fig. 14A). Alternatively, or as shown in FIG. 15(a), the rod head 93c' may be formed on both sides of the concealed box 81 and <Fig. i5(b) and the hole formed on the side of the support body or The groove part is given and aligned. In addition, 'self-assembly consideration, Shantou 93c is better 157707.doc 201232186 = placed on both sides' but as shown in Figure 15 (4) - point chain line, the head w can also be placed in the remaining On either side of the opposite side, it may be configured as follows: a cylindrical protrusion 93b as shown by ^() or as shown in Fig. 15(a) The head 93c is disposed on the side of the support body 91, and the hole portion or the groove portion is disposed on the side of the cassette 81. The cassette fixing mechanism shown in Figs. (a) and 15(a) may also be as shown in Fig. 8. The cassette fixing mechanism 93 is used at the same time. As shown in the figure, a long external thread 97a extending rearward from the adjacent light source unit 73 is fixed to the rear surface of the frame-shaped light source supporting portion 83, and the external thread 97a is at the front end. The nut is screwed to the nut m that is driven by the motor 98 fixed to the bottom of the lamp cover. If the motor is actuated to rotate the nut 9, the light source support portion 83 is pulled by screwing the external thread 97a. The elastic deformation is performed by stretching or pressing, whereby the optical axis angle of the light source 473 fixed to the light source branching portion 83 is adjusted. In other words, the external thread ^, the nut 9 and the motor 98 constitute an optical axis angle adjusting mechanism 99 for adjusting the optical axis angle with respect to each of the light source portions 73 of the integrator lens 74.

Further, the optical axis angle of each of the light source sections adjusted by the optical axis angle adjusting means 99 can correct the angle of light diffusion caused by the irradiation time of the light source section 73, for example, a slight angle of 1 〇 or less. It is sufficient that it can be adjusted within the range of elastic deformation of the light source supporting portion 83. Further, the optical axis angle adjusting mechanism is not limited to the above-described mechanism including the male screw 97a, the nut 97J, and the motor 98, and any mechanism may be employed, or the lamp pressing mechanism 87 may be disposed at the rear of the crimping light source portion 73. on. Further, as shown in Fig. 8, a photodetecting device 1G1 such as an illuminometer is disposed adjacent to the integrator lens 74. The light detecting device (8) detects the amount of leaked light that is incident on the outside of the integrator lens 74 without being incident on the integrator lens 74 by the diffusion of the light from the light source portion 73 generated by the passage of time 157707.doc 5 • J9·201232186 . Further, the optical detecting device HH and the motor 98 of the optical axis angle adjusting mechanism 99 are connected to the control device 1A by the electric wires 103, respectively. When the light detecting means 101 detects the amount of light leakage, the motor % is actuated to adjust the optical axis angle of the light source unit 73 so that 70 to 100% of the amount of light is incident on the integrator lens 74. Correct the amount of light spread. More specifically, if the light detecting device 101 detects the amount of light exceeding the set specific threshold value, the control device 102 transmits an actuation command to the motor 98 to actuate the nut 97b to rotate. Thereby, the thread 97a screwed to the nut 97b is introduced in the direction of the motor 98, and the light source supporting portion is elastically deformed in a direction in which the radius of curvature becomes smaller, whereby the optical axis angle of each light source portion 73 is directed toward the inner side: Correct the amount of light spread. Therefore, if the amount of light detected by the light detecting means ι〇ι is lowered below the initial value, that is, if the light of the irradiation amount of 7 〇 to 1 〇〇% is irradiated to the integrating lens 74 in the same manner as the initial state, Then the action of the horse stopped. Further, if the light detecting device 1〇1 can detect the light diffuser of the light source unit 73 caused by the irradiation time, the light detecting device ′′ is not limited to the human emitting surface disposed on the integrating lens 74. The upper light amount detecting device or the timer for counting the irradiation time. When the light amount detecting device is disposed on the blade lens 74, 'when the amount of light detected by the light amount detecting device is less than a specific threshold material, the optical axis of each light source portion 73 is adjusted by the wire angle adjusting mechanism 99. When the light after the angle is incident on the center of the integrator lens 74 and the field detection light amount is restored to the initial value, the operation is stopped. In another aspect, 157707.doc -20-201232186, when the optical axis angle of each light source portion is adjusted to be less than a certain threshold value even by the optical axis angle adjusting mechanism 99, the illumination of the lamp 71 itself is lowered. 'Therefore, the lamp 7 is replaced. Further, in the case of the timer control, the relationship between the irradiation day of the light source unit 73 and the light diffusion angle is checked in advance, and when the specific irradiation time elapses, the optical axis angle of each light source unit 73 is adjusted. Further, the illuminance is also checked after the replacement of the lamp 71, but the illuminance may not be restored. For example, when the cover glass 85 is contaminated, the dirt of the cover glass 8 can be confirmed by visual inspection or by means of a sensor. As the sensor, a penetrating type light detecting sensor, a reflective type photo detecting sensor, and an eddy current type sensor can be used. In the exposure apparatus pE configured as described above, when the exposure control shutter 78 is subjected to the opening control in the illumination optical system 7A, the light irradiated from the ultrahigh pressure mercury lamp 71 is incident on the incident surface of the integrator lens 74. Then, the light emitted from the exit surface of the integrator lens 74 is changed by the concave mirror 77 to change its traveling direction and converted into parallel light. Then, the parallel light is irradiated to the mask Μ on the mask stage 1 and the surface of the substrate w held on the substrate stage 2 as a pattern exposure light, and is irradiated substantially vertically, and the mask 1^ The pattern 1> is transferred onto the substrate W by exposure. Here, even if the ultrahigh pressure mercury lamp 71 is an unused lamp, the light irradiated from the ultrahigh pressure mercury lamp 71 has, for example, two. The diffusion angle of the left and right light, but if a large current is supplied between the electrodes 95 and 96 in order to obtain a high output, the tungsten electrodes 95 and 96 gradually evaporate in the arc tube 94 to cause the two electrodes 95 to elapse with the passage of the use time. , 96 intervals become wider, the base point of the * source becomes larger, the light spreads and the 〇 〇 1 -1, &,

S 157707.doc -21 · 201232186 Shot: The degree is expanded to, for example, 2.2. . Since the current flows in one direction, the wear phenomenon of the ultrahigh pressure mercury lamp 71 flowing has a tendency to be more remarkable than that of the ultrahigh pressure mercury lamp having a parent flow. From the point of assembly of the illumination optical system 70, the light from the illumination light system 70 is irradiated to the integrator lens 74 so that the light from 7 〇 to 1% of the light source portion 73 is irradiated. People adjust the way they face. However, if the photodetecting device 1 〇 1 detects the amount of light leakage (diffusion of light) caused by the diffusion of light accompanying the use time of the ultrahigh pressure mercury lamp 71, the control device H) 2 activates the motor 98. And the light source support portion 83 is introduced via the external thread w to cause elastic deformation. Thereby, the respective light source portions 73 fixed to the light source supporting portion 83 are directed inward to adjust the optical axis angle to correct the light diffusion. As mentioned above, according to the first! The light-emitting device for exposure apparatus according to the embodiment includes a plurality of light source units 73 including a light-emitting portion 71 and a reflection optical system t, and a plurality of slits 81 for causing a specific number of light sources to be incident on the light source portion. The light source support portion 83 supports the light source in such a manner as to form the incident surface of the integrator lens 74. p 73, a support body 82 comprising a plurality of E-box mounting portions 90 for mounting a plurality of cassettes, such that light from all of the light source units 73 is incident on the emitting surface of the integrator lens 74, and the optical axis angle adjusting mechanism 99, Since the optical axis angle of each of the light source units 73 can be adjusted, the light diffusion caused by the irradiation time of the light source unit can be corrected, and the light of the irradiation amount of 7 〇 to 1% by the light source unit 73 can be incident on the light source. The integrator lens 74 can thereby improve the light use efficiency and suppress the decrease in illuminance. Further, the light generated by the irradiation time of each light source unit 73 is detected. J57707.doc

S-22 - 201232186 is diffused, and the light irradiation device 80 is controlled so as to correct the diffusion of the detected light by the optical axis angle adjustment mechanism 99, so that 70 to 1% of the light source portion 73 can be obtained. The amount of illumination light is incident on the integrator lens 74, thereby preventing illuminance from decreasing. Further, in the above embodiment, the light is diffused and the optical axis angle of the light source unit 73 is automatically adjusted. However, the relationship between the life irradiation time and the light diffusion is predicted, and the light source unit 73 is previously set at the angle. The amount is adjusted toward the inner side, whereby the light utilization efficiency can be improved to some extent. (Second Embodiment) A person-by-person, a divided sequential approaching exposure apparatus according to a second embodiment of the present invention will be described with reference to Figs. In addition, the divisional sequential exposure apparatus of the present embodiment is basically the same as the divisional sequential proximity exposure apparatus of the first embodiment. Therefore, the same portions are denoted by the same reference numerals and the description thereof will not be repeated, and the different portions will be described in detail. As shown in Figs. 17 and 18, in the divided sequential exposure apparatus pE of the present embodiment, a wavelength cut filter 186 is disposed on the front surface of the cassette 81 corresponding to the desired lamp 71. As the wavelength cut filter 186, it may be any one of a low pass chopper, a high pass chopper, and a band pass chopper, or may be an ND (Neutral Denshy, neutral density thief) that reduces the intensity of a desired wavelength. Light) waver. Further, the wavelength cut filter 186 is preferably arranged in point symmetry. In the present embodiment, six lamps are mounted in the upper stage and six lamps in the lower stage: (hatched portions in Figs. 17 and 18). Thereby, two types of light source sections 73 having different spectral characteristics are formed. Hereinafter, the light source 73 to which the wavelength cut filter 6 is mounted is referred to as a chopper light source unit 73, and the light source unit 73 not including the wavelength cutoff 157707.doc 5 •23-201232186 stop filter 186 is referred to as a no filter. Light source unit 73B. Further, as shown in Fig. 16, an opening 77a is formed in a portion of the concave mirror 77, and each of the illuminances of the respective wavelengths of g-rays, h-rays, i-rays, j-rays, and k-rays is measured behind the opening 77a. Illuminance meter 79.

Further, in the optical control unit 76, the spectral characteristics of the filter light source unit 73A and the filterless light source unit 73B, in particular, the peak heights of the respective wavelengths, are measured in advance, and are stored as a database. Further, when the light source units 73 A and 73B continue to use the lamp 7 丨, the spectral characteristics change. Therefore, the illuminance of each wavelength of each of the light source units 73A and 73B is measured in advance without exposure. The light irradiation device 80 configured as described above determines the power of the lamp "lights that are lit by the light source units 73A, 73B" based on the result of the measurement by the illuminometer 79. Here, the number of the lamps 71 that are lit When there are a large number of cases, even if the sub-asymmetry is used, the method of extinguishing the lamp 71 has a small influence on the illuminance distribution of the exposure surface, but when the number of the lamps 71 is small, for example, annihilation When the heart-light is about W%, ^ is not point-symmetric, and the annihilation method of the lamp 71 may cause the exposure surface illuminance distribution to be deteriorated. Therefore, the chopper light source portion 73A and the wave-reducing light source portion are preferably The lamp 71 is lit in such a manner as to be point-symmetric, respectively. The light emitted from the mercury lamp 71 is generally incoherent light, and when it reaches the exposure surface by the illumination optical system including the lens 74, the concave mirror 77, and the like, it is: The intensity is given as the sum of each wavelength. By providing the filter light source unit 73A, it is a "light source". The dioptric intensity ratio of each wavelength can be controlled to some extent. 157707.doc 201232186 Here, a wavelength cut filter is provided on a lamp having two types of lamps having different spectral characteristics and a lamp having the same spectral characteristics. In the case of the measurement of the illuminance, in particular, in the case of using two types of lamps having different spectral characteristics, the intensity of the short-wavelength side is used when the fourth lamp is used. The illuminance is measured when the first lamp is stronger than the fourth lamp, and when the second lamp and the second lamp are used. In the test in which the wavelength cut filter is provided, When using a 4th second lamp and no women's wavelength is determined according to the wave, when the wavelength cutoff wave is mounted on the 2 lamps, and the wavelength cut filter is mounted on the 4 lamps In the case of the case, the illuminance is measured. The results when two types of lamps are used are shown in Table 1, and the results when the wavelength cut filter is provided are shown in Table 2 °, and the illuminance used in this test. , using the purple made by Ushi〇Inc AG The external line integrated light meter UIT_25〇, and the light receiving unit uses the light receiving state UVD-S365 for 65 nm and the 313 nm measuring light receiver UVD-S313' to measure the center of the exposure surface of 2〇〇minx200 mm in the light receiving portions. The intensity of the 1 ray (365 nm) and the j ray (313 nm), and the results are shown in Table 丨 and Table 2, and it can be seen that the number of DUV filters can be changed in the same manner as in the case of changing the type of the lamp. The intensity of each wavelength [Table 1] 4th lamp 1 illuminance (mW/cm2) 365 (nm) 313 (nm) 40.5 15.9 2nd lamp 4 1 34.9 23.0 2nd lamp 2 2nd lamp 2 37.8 19.4

S 157707.doc -25· 201232186 [Table 2] Illuminance (mW/cm2) 365 (nm) 313 (nm) No DUV filter 34.9 23.0 DUV filter 4 32.1 1.02 DUV filter 2 33.5 11.7 As mentioned above' According to the exposure apparatus of the second embodiment, the light irradiation unit 80 and the exposure apparatus PE include a specific number of light source units 73 including the light-emitting unit 71 and the reflection optical system 72, and a cassette 81 for a specific number. The light source unit 73 supports the light source unit 73 so that the light of the light source unit 73 enters the incident surface of the integrator lens 74. The specific number of light source units 73 are composed of two types of light source units 73 having different spectral characteristics. Thereby, the intensity of each wavelength can be set freely without replacing the light source unit 73. In particular, the light-emitting characteristics of the lamps 7 of the specific number of light source units 73 are the same, and a specific number of the light source units 73 are formed by the wavelength cut-off filter 186, and the two light source units having different spectral characteristics are formed. As a result, the intensity of each wavelength can be set freely without replacing the light source unit 73 and using a light source unit having different spectral characteristics. Further, since a plurality of cassettes 81 are included, and further includes a support body 82 in which the cassettes 81 are attached so that the light of all the light source units 73 is incident on the incident surface of the integrator lens 74, the lamps 71 can be unitized. By managing, the replacement time of the lamp 71 and the time of stopping the device can be shortened, and all the light source portions 73 can be disposed on a single curved surface without performing large surface processing on the mounting parts of the lamp 71. Further, according to the control method and the exposure method of the light irradiation device for an exposure apparatus according to the present embodiment, in addition to the plurality of light source units, the plural (four) box 157707.doc -26-201232186 8 and the label body 82, the light irradiation is performed. The device 8A includes an illuminance meter 79_ disposed on the downstream side of the integrator lens 74, and measures an illuminance and optical control unit 76 corresponding to each wavelength, which controls lighting, annihilation, and illuminance of each of the lamps 71. Further, the optical control unit 76 controls the respective light source units 73 in the cassette 8 to control the illuminance corresponding to each wavelength measured by the illuminometer 79 to obtain the desired illuminance within a specific wavelength. Thereby, it is possible to illuminate necessary (4), and to freely set the intensity of the wavelength component necessary for exposure, thereby prolonging the life of (4). . . Further, in the above-described embodiment, the two kinds of light source units 73 and b having different spectral characteristics are formed by using the wavelength cut filter 186 of the 丨 type. However, as shown in Figs. 19 (4) and (b), two types of light source units can be used. The wavelength cutoff filter unit is configured to form three light source units 73A1, 73A2, and 73B having different spectral characteristics. For example, the three types of light source units 73A1, 73, VIII, and π may be formed by 8:8:8 as shown in Fig. 19(b), and may be formed by ι 〇: ι 〇: 4. In these cases, it is preferable that the three types of light source units 73 are illusory 73 8 and 2, and the points of the i9 (4) are turned off by the optical (four) portion 76. The grid portion of Fig. 19(4) shows its point symmetry annihilation. (Third Embodiment) Next, a proximity scanning exposure apparatus according to a third embodiment of the present invention will be described with reference to Figs. 20 to 25 . As shown in FIG. 23, the scanning exposure apparatus 200 approaches the substantially rectangular substrate w which is conveyed in a specific direction close to the mask Μ-surface, and irradiates the exposure light l through a plurality of mask 形成 which forms the S case P, Expose pattern p

S 157707.doc -27- 201232186 Printed on the substrate w. That is, the exposure apparatus 2 employs a scanning exposure method in which the substrate is subjected to exposure transfer while relatively moving the plurality of mask rivers. Further, the size of the mask used in the present embodiment is set to 350 mm x 250, and the length of the X direction of the garden + picture P corresponds to the length of the effective exposure area in the X direction. As shown in FIGS. 20 and 21, the proximity scanning exposure device 2 (9) includes a substrate transfer mechanism that lifts the substrate to support the substrate and transports the substrate % in a specific direction (X direction in the drawing); The holding mechanism i7〇 includes a plurality of mask holding portions 171, and the plurality of mask holding portions ΐ71 respectively hold a plurality of mask ridges, and are in a direction crossing the specific direction (the direction in the figure is the Υ direction) and the parent Two rows are arranged in a staggered manner; a plurality of illuminating portions 丨8 〇 are disposed on the upper portions of the plurality of mask holding portions 171, and serve as an illumination optical system for illuminating the exposure light L; and a plurality of light shielding devices 丨9〇 Each of the plurality of illuminating units 180 is disposed between the plurality of illuminating units 180 and the plurality of mask holding units 丄7丨, and the exposure light 1 emitted from the illuminating unit 180 is shielded from light. The substrate transport mechanism 120, the mask holding mechanism 17A, the plurality of illuminating units 180, and the light blocking device 190 are disposed on the apparatus base 201 provided on the ground via a platform (not shown). Here, as shown in FIG. 21, in a region where the substrate transport mechanism 120 transports the substrate W, a region in which the mask holding mechanism 170 is disposed above is referred to as a mask arrangement region e A, and a region to be placed with respect to the mask is disposed. A region on the upstream side of the EA is referred to as a substrate carry-in side region IA, and a region on the downstream side of the exposure region EA is referred to as a substrate carry-out side region OA. The substrate transfer mechanism 1 200 includes a floating unit 12 1 as a substrate holding 157707.doc • 28· 201232186 'moving frame 105 disposed on the device base 201 via another platform (not shown), and a precision frame 106 and moving out of the frame 1〇7, and the substrate W is floated and supported by air; and the substrate driving unit 140 is disposed on the Y-direction side of the floating unit 121, and is further disposed via the other platform 108. The substrate W is held on the frame 1〇9 on the apparatus base 201, and the substrate w is conveyed in the X direction. As shown in FIG. 22, the 'floating unit 121 includes a plurality of exhaust vents 123 (see FIG. 21) and 124 and a plurality of long and short venting pads 125a and 125b' which are respectively mounted on the lower surface. The frame 1〇5, the carrying-out frame 106, and the plurality of connecting rods 122 that extend upward from the upper surface of the frame 1〇7, the air discharging system 130 and the air discharging pump 131 are formed on the air cushion 123, 124, 125a, 125b, a plurality of exhaust holes 126 discharge air; and an air suction system 132 and an air suction pump 133 for sucking air from the intake holes 127 formed in the intake and exhaust pads 125a, 125b. Further, the intake and exhaust pads 125a and 125b include a plurality of exhaust holes 126 and a plurality of intake holes 127' for balancing the air pressure between the support surfaces 134 of the air cells 125a and 1256 and the substrate W, so that the specific floating amount can be set with high precision. Therefore, horizontal support can be performed at a stable height. As shown in FIG. 21, the substrate driving unit 14A includes: a holding member 141 that holds the substrate W by vacuum suction; a linear guide 142 that guides the holding member ι41 in the X direction; and a driving motor that drives the holding member 141 in the X direction. 143 and a ball screw mechanism 144; and a plurality of workpiece anti-collision rollers 45 supporting the lower surface of the substrate w waiting for the conveyance of the mask holding mechanism 17, which protrude from the upper surface of the frame 1〇9 Z direction can be moved and rotated freely

S 157707.doc -29- 201232186 is mounted on the side of the frame i 〇 9 of the substrate loading area IA. Further, the substrate transfer mechanism 120 includes a substrate pre-alignment mechanism 15 that is disposed on the substrate carry-in side region IA, performs pre-alignment of the substrate W waiting for the substrate carry-in side region, and a substrate alignment mechanism 1 60, which performs alignment of the substrate w. As shown in FIGS. 21 and 22, the mask holding mechanism 170 includes: the plurality of mask holding portions 17 1; and a plurality of mask driving portions 72 that are provided corresponding to each of the mask holding portions 71 Mask holder! 7丨 is driven in the X, γ, ζ, θ directions, that is, in a specific direction, a crossing direction, a vertical direction with respect to a specific direction and a horizontal plane, and a normal around the horizontal plane. The plurality of mask holding portions 17i that are arranged in two rows in a staggered manner in the γ direction include a plurality of upstream mask holding portions nia disposed on the upstream side (six in the present embodiment); and are disposed on the downstream side a plurality of downstream side mask holding portions 171b (six in the present embodiment); and each of the column portions 112 erected on both sides in the γ direction of the apparatus base 2〇1 via the mask driving unit (refer to the figure) 20) Two main frames 113 are provided on each of the upstream side and the downstream side. Each of the mask holding portions 171 includes an opening η? penetrating in the ζ direction, and a mask 真空 is vacuum-adsorbed on the lower surface of the peripheral portion. The mask driving unit 172 includes a χ direction driving unit 173 ′′ mounted on the main frame 113 and moving in the χ direction, and a ζ direction driving unit 174 attached to the front end of the X direction driving unit 173 and driving in the ζ direction The γ-direction driving unit 175 is mounted on the ζ direction driving unit 174 and driven in the ¥ direction; and the one-direction driving unit 176 is mounted on the Υ direction driving unit 175' and faces the 0 direction 157707.doc rs • 30 · 201232186 drive; the mask holding portion i7i is attached to the front end of the θ direction drive unit 176. As shown in FIG. 24 and FIG. 25, the plurality of irradiation units 18A include a light irradiation device 80A configured in the same manner as the first embodiment in the housing 181, an integrator lens 74, an optical control unit 76, a concave mirror 77, and an exposure. The control shutter 78 includes plane mirrors 280, 281, and 282 disposed between the light source portion 73A and the exposure control shutter 78 and between the integrator lens 74 and the concave mirror 77. Further, an off-angle mirror 77 or a plane mirror 282 as a folding mirror may be provided with an off-angle correcting mechanism that can manually or automatically change the curvature of the mirror. The light irradiation device 80 includes a support body 82 直线 in which three cassettes 81 are linearly arranged, and the δ 匣 box 81 Α includes eight light source units 73 each including, for example, four stages and two lines of the ultrahigh pressure mercury lamp 71 and the mirror 72, respectively. Similarly to the third embodiment, in the cassette 81, the light source supporting portions 83 supporting the eight light source units 73 are provided with the cassette pressing cover 84, and the respective light source units 73 are positioned so as to be possible from the respective light source units. Light of 70% to 100% of the amount of light of 73 is incident on the integrator lens 74. Further, each of the cassettes 81 is positioned by attaching each of the cassettes 81 to the plurality of cassette mounting portions of the support 82, so that the irradiation amount of 70% to 1% of the light from each of the light source units 73 can be incident. Integral lens 74. An optical axis angle adjusting mechanism 99 including an external thread 97a, a nut 97b, and a motor 98 is disposed between the frame-shaped light source supporting portion 83 and the bottom of the lamp pressing cover 84. Further, the photodetecting device 丨〇 1 and the optical axis angle adjusting mechanism 99 disposed adjacent to the integrator lens 74 are connected to the control device 1 2 by the electric wires 1 to 3, which is the same as in the first embodiment. As shown in FIG. 22, a plurality of light-shielding devices 19A include a plate-shaped baffle member 208, 209 which changes one of the inclination angles, and the pair of baffles are changed by the baffle drive unit 192 157707.doc • 31· 201232186 The inclination angle of the members 2〇8, 209. Thereby, the exposure light L emitted from the irradiation portion 18 in the vicinity of the mask 保持 held by the mask holding portion 171 can be blocked, and the light-shielding width in the specific direction of the light-shielding exposure light 1 can be blocked. The projected area of the direction observation is variable. Further, a proximity changer 22 is provided in the proximity scanning exposure apparatus 200, and is replaced by the upstream side and the downstream side by driving one of the masks 对 to the mask bracket portion 221 in the γ direction. The mask holding portions 171a, 171b are covered with a mask, and a mask pre-alignment mechanism 24 is provided, which is pressed against the mask bracket portion 22 to receive a floating support before the mask is replaced. The mask Μ is abutted against a positioning pin (not shown) to perform pre-alignment. Further, as shown in FIG. 22, a laser displacement meter 260, a mask alignment camera (not shown), a follow-up camera (not shown), and a follow-up illumination 273 are disposed in proximity to the scanning exposure apparatus 2A. Various testing institutions. Next, the exposure transfer of the substrate W will be described using the scanning exposure apparatus 2A configured as described above. Further, in the present embodiment, the following will be described. 1 The base pattern is drawn with respect to the drawing (for example, The color filter substrate w of the black matrix) has any one of R (red), g (green), and B (blue). The substrate adjacent to the scanning exposure apparatus 200 is transported to the substrate loading area IA by a carrier or the like (not shown). The substrate is lifted by the air from the exhaust pad 123 and supported by the fork to perform pre-alignment of the substrate w. After the alignment operation, the substrate w clamped by the holding member 141 of the substrate driving unit 14 is transported to the mask arrangement area EA. 157707.doc *32- 201232186 Thereafter, the substrate w is moved in the X direction along the linear guide 142 by driving the drive motor 143 of the substrate driving unit 134. Then, the substrate w is moved over the exhaust pad 124 and the suction/discharge pads i25a, 125b provided on the mask arrangement area EA, and is supported by being lifted up while the vibration is removed as much as possible. Then, when the light source for exposure is emitted from the light source in the illuminating unit 180, the exposure light L is exposed to the substrate W by the occlusion held by the mask holding portion 171. 200 includes a follow-up camera (not shown) and a laser displacement gauge 260. Therefore, during the exposure operation, the relative positional shift between the mask M and the substrate w is detected, and the mask is masked according to the detected relative positional shift. The driving unit 172 is driven to cause the position of the mask μ to follow the substrate w in real time. At the same time, the gap between the mask Μ and the substrate W is detected, and the mask driving portion 172 is driven to correct the gap between the mask μ and the substrate w in real time in accordance with the detected gap. The exposure is continuously performed in the same manner as above, whereby the pattern exposure can be performed on the entire substrate w. Since the masks 保持 held by the mask holding portion 171 are arranged in a staggered manner, even if the mask rivers held on the upstream or downstream side of the mask holding portions 171a and 171b are arranged separately, the substrate w can be arranged on the substrate w. The pattern is formed without a gap. Further, when a plurality of panels are cut out from the substrate W, a non-exposed region where the exposure light L is not irradiated is formed in a region corresponding to the adjacent panels. Therefore, in the exposure operation, the pair of shutter members 2〇8, 2〇9 are opened and closed so that the shutter members 208, 2〇9 are placed on the non-exposed area, and the shutter is made according to the feed speed of the substrate w. The members 2〇8, 2〇9 are moved in the same direction as the feeding direction of the substrate w.

S 157707.doc •33· 201232186 In the present embodiment, a large current is supplied between the electrodes 95 and 96 of the ultrahigh pressure mercury lamp 71 during the exposure operation, so that the electrodes 95 and 96 evaporate with the passage of the use time. In the same manner as in the first embodiment, the light detecting device 101 detects the diffusion of light, and the optical axis LA of each light source unit 73 is directed inward by the optical axis angle adjusting mechanism 99 to adjust the optical axis angle. . Therefore, in the proximity scanning exposure apparatus of the present embodiment, the light detecting device 101 detects the light diffusion caused by the elapse of the irradiation time of each light source unit 73, and corrects the detection by the optical axis angle adjusting mechanism 99. Since the light irradiation device 80 is controlled in such a manner that the light is diffused, the light from the respective light source units 73 can be surely incident on the integrator lens 74, and the illuminance can be suppressed from being lowered. (Fourth Embodiment) Next, a proximity scanning exposure apparatus according to a fourth embodiment of the present invention will be described with reference to Figs. 26 to 27 . Incidentally, the proximity scanning exposure apparatus of the present embodiment is formed in substantially the same configuration as the scanning exposure apparatus of the third embodiment. Therefore, the same portions are denoted by the same reference numerals, and the description thereof will not be repeated, and the different portions will be described in detail. As shown in Fig. 26, in the proximity scanning exposure apparatus 200 of the present embodiment, an opening 77a is formed in a portion of the concave mirror 77 in the housing 181 of the plurality of illuminating units 180, and measurement is provided after the opening 77a. Each illuminance meter of the illuminance of each wavelength of g-ray, h-ray, i-ray, j-ray 'k-ray, etc. is 79. Further, in Fig. 26, reference numeral 195 is a lighting power source, and reference numeral 196 is a control circuit. 157707.doc rs -34· 201232186 The light irradiation device 80A includes three cassettes arranged in a straight line to support the body 82A. The 匣|81 includes, for example, 6 segments and 4 rows of ultrahigh pressure mercury lamps η and mirrors, respectively. Light source unit 73. Similarly to the first embodiment, in the E-box 81, each of the light source units 73 is positioned by supporting the medical cell buckle cover 84 by supporting the light source branch portions of the 24 light source units, so that the light source units can be positioned from the respective light source units. The light person of the observation amount of the position of 73 is incident on the integrator lens 74. Further, by attaching the respective cartridges 81 to the support 82A, the respective cartridges 81' are positioned so that 7 (%) to (10)% of the light from the respective light source portions 73 can be incident on the integrator lens 74. Further, in the light irradiation device 本 of the present embodiment, the light-splitting characteristics of the light-emitting portions 71 of the specific number of light source units 73 are also the same, and a specific number of the light source units 73 are also provided with the wavelength cut filter 186 by a part thereof. Two types of light source units 73 having different spectral characteristics are formed. Therefore, in the proximity of the scanning exposure apparatus as in the present embodiment, the light source includes a specific number of light source cores including the light-emitting portion 71 and the reflective optical system (4), and a light person of the light source portion 73 of a specific number is incident on the integrator lens. μ, the incident surface supports the light source portion 73 to be the same as the cartridge 8i, and the light splitting characteristics of the lamps 71 of the specific number of the light sources 2 are the same. A specific number of light source portions are configured by the gate/minutes with the wavelength cut filter i 8 6 Structure

= light source unit 73. Therefore, it is possible to freely set the intensity per wavelength without replacing the lamp 71' and using the same light source portion. The present month is not limited to the above-described embodiment, and it is possible to perform an appropriate 'cross-shape and improvement. Cangjie, 1 °, in the above embodiment, the stepwise sequential exposure device and the scanning proximity exposure device are described as the division

S 157707.doc -35- 201232186 is not limited thereto, and the present invention is also applicable to a mirror projection exposure apparatus, a lens projection exposure apparatus, and a close exposure apparatus. Further, the present invention is also applicable to any one of an exposure method such as a general type or a sequential type 'scanning type. The present application is filed on the basis of Japanese Patent Application No. 2010-165 163 filed on Jul. 22, 2010, and Japanese Patent Application No. 2 〇 191 191 288, filed on August 27, 2010, and filed on July 13, 2011 Japanese Patent Application No. 2011-154669, the disclosure of which is incorporated herein by reference. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a partially exploded perspective view showing a split sequential approaching exposure apparatus according to a third embodiment of the present invention. Figure 2 is a front elevational view of the segmented successive exposure apparatus shown in Figure i. Figure 3 is a cross-sectional view of the mask table. Fig. 4 (4) shows a front view of the light irradiation device, Fig. 4 (b) is a cross-sectional view taken along line (4) t (four), and Fig. 4 (c) is a cross-sectional view taken along line (4) of the line. Fig. 5 is an enlarged cross-sectional view showing the vicinity of a light source unit mounted in a cassette. Fig. 6 is an enlarged view showing a state in which the dragon box is attached to the branch body. Fig. 7 (4) to (4) are front views showing the shape of the opening of the mirror, respectively. Fig. 8 is a schematic view showing the distance from the exit surface of each light source unit to the incident surface of the integrator lens. Figure 9 is a section showing an example of mounting a support on a light illuminating device.

Fig. 1 is a cross-sectional view showing an example in which the cassette is attached to the cassette 11 to show the case where the cassette is attached to the most image mounting unit. Fig. 11 (denier stereogram, Fig. 11 (6) is a plan view, Fig. 11 (c) is along the diagram li(b) 2XI_XI, on the support body, a diagram of a modification of the cassette fixing mechanism 157707.doc-36-201232186 Fig. 12 is a view showing another modification of the stencil fixing mechanism for attaching the g cartridge to the support. Fig. 13 is a view showing the cymbal fixing for attaching the cassette to the support. Fig. 14 (a) is a perspective view showing another modification of the cassette fixing mechanism for attaching the cassette to the support, and Fig. 14 is a view showing the cassette mounting. A cross-sectional view of the state on the support. Fig. 15 (a) is a perspective view showing still another modification of the cassette fixing mechanism for attaching the cassette to the support, and Fig. 15 (b) is a sectional view showing a state in which the cassette is attached to the support. . Fig. 16 is a front view of the divided successive approaching exposure apparatus of the second embodiment. Fig. 17 (a) is a front view showing the light irradiation device, and Fig. 17 (b) is a sectional view taken along line XVII-XVII of Fig. 17 (a). Fig. 18(a) is a front view of the cassette, Fig. i8(b) is a side view of Fig. i8(a), and Fig. 18(c) is a bottom view of Fig. i8(a). Fig. 19 (a) is a front view showing a cassette of a light irradiation device according to a modification of the second embodiment, and Fig. 19 (b) is a front view showing a cassette of the light irradiation device according to another modification, Fig. 19 (c) is a view showing a state in which the light source unit of the light irradiation device of Fig. 19 (a) is partially extinguished. Fig. 20 is a perspective view showing the entire vicinity of a scanning exposure apparatus according to a third embodiment of the present invention. 157707.doc 5 -37-201232186 Fig. 21 is a top view showing a state in which the upper portion of the illuminating portion or the like close to the scanning exposure device is removed. Fig. 22 is a side view showing the exposure state of the mask arrangement area close to the scanning exposure apparatus. Fig. 23 (a) is a top plan view showing the positional relationship between the mask and the air cushion, and Fig. 23 (b) is a sectional view thereof. Fig. 24 is a view for explaining the irradiation portion of the scanning exposure apparatus. Fig. 25 (a) is a front view showing the light irradiation device of Fig. 24, and is a cross-sectional view taken along line χχν-χχν of Fig. 25(a). Fig. 26 is a view for explaining an illuminating unit of the scanning exposure apparatus according to the fourth embodiment of the present invention. Fig. 27 (a) is a front view circle of the light irradiation device of Fig. 26, and Fig. 27 (b) is a cross-sectional view taken along line XXVII-XXVII of Fig. 27 (a). 28(a) and 28(b) are schematic diagrams showing a prior art light irradiation device in which the diffused light is deviated from the integrator lens. [Description of main component symbols] 12 Mask holding frame (mask holding portion) 21 Substrate holding unit 70 Illumination optical system 71 Ultra high pressure mercury lamp (light emitting unit) 72 Mirror (reflecting optical system) 73 '73A ' 73B Light source unit 74 Integral lens 80 ' 80A Exposure device is illuminated with light 157707.doc •38· 201232186 81 ' 81A 82 box 82 ' 82A Support body 83 Light source support part 84 Light-retaining cover (cover member) 86 Abutment part 87 Light-pressing mechanism 90 安装 Box mounting part 91 Branch body 99 Optical axis angle adjustment mechanism 101 Light detection Device 102 Control device 103 Wire 171 Mask holding portion 171a Upstream side mask holding portion 171b Downstream side mask holding portion 180 Irradiation portion (illumination optical system) 186 Wavelength cutoff chopper 200 Proximity to scanning exposure device (exposure device) LA light Axis M Mask P pattern PE division successive approaching exposure device (exposure device) W substrate, glass substrate, color filter substrate (exposed material) ) 157707.doc •39-

Claims (1)

201232186 VII. Patent application scope: ί. A light irradiation device for an exposure device, comprising: a plurality of light source portions each including a light emitting portion and a reflection optical system, wherein the reflection optical system causes light generated from the light emitting portion to have Directly ejecting; a plurality of e-boxes respectively including a light source supporting portion for supporting the light source portion, such that light of the specific number of light source portions is incident on an incident surface of the integrator lens; and a support body including the plurality of the above-mentioned plurality a plurality of cassette mounting portions for causing light of all of the light source portions to be incident on an incident surface of the integrator lens; and an optical axis angle adjusting mechanism '丨 adjusting the light source portion with respect to the product> The optical axis angle "corrects" the light diffusion caused by the elapse of the irradiation time of each of the light source sections. 2. The light-emitting device for an exposure apparatus according to claim 1, wherein the light source portion of the specific number f includes a plurality of light source portions having different spectral characteristics. 3. The light-emitting device for an exposure apparatus according to claim 2, wherein the light-emitting portions of the light-emitting portions of the specific number I have the same spectral characteristics, and the light source portion of the plurality of direct-numbered light sources is configured by arranging a wavelength cut filter A plurality of light source sections having different spectral characteristics. 4. An exposure apparatus, comprising: a substrate holding portion that holds a substrate as an exposed material; a mask holding portion that holds a mask in a manner to be opposite to the base (four); and an illumination optical system including The request item 丨 to 3—Beilt; the above 157707.doc, ^ 201232186 light irradiation device, and an integrating lens from which light emitted from a plurality of light source units of the light irradiation device is incident; and the substrate is passed through the mask And the light from the illumination optical system, wherein the light irradiation device of the exposure device comprises: a plurality of light source portions each including a light emitting portion and a reflective optical system The reflective optical system emits light from the light-emitting portion in a directivity manner; and a plurality of cassettes respectively include a light source supporting portion respectively supporting the light source portion such that light of the specific number of the light source portions is incident on the integrator lens The incident surface; the support body includes a plurality of cassette mounting portions respectively mounting the plurality of cassettes, so that An incident surface of the light source portion is incident on the incident surface of the integrator lens; and an optical axis angle adjusting mechanism that adjusts a light angle of each of the light source portions with respect to the integrator lens to correct an incident time of each of the light source portions The light diffusion device generated by the exposure device includes: a step of: detecting the light diffusion caused by the elapse of the irradiation time of each of the light source portions; and the optical axis angle adjustment mechanism by the optical axis angle adjustment mechanism Correct the above light diffusion. 6. The method of controlling a light-emitting device for an exposure apparatus according to claim 5, wherein the light-emitting device of the exposure device further comprises: 157707.doc 201232186 illuminance meter, which is disposed on a downstream side of the above-mentioned integral transparent mirror Measuring the illuminance corresponding to each ferry length; and a control unit, wherein: (4) the lighting, extinction, and illuminance of each of the light-emitting portions; and the plurality (four) of the plurality of light source units including the plurality of types of light having different spectral characteristics, the control unit The light source portion corresponding to each wavelength measured by the illuminometer controls the respective light source portions in the s box in such a manner that the desired illuminance is obtained at a specific wavelength. 7. The method of controlling an exposure apparatus according to claim 6, wherein the light-emitting characteristics of the respective light-emitting portions of the specific number of light source sections are the same, and 8. the predetermined number of light source sections are due to the partial-configuration wavelength cut-off filtering thereof. It constitutes a plurality of light source sections having different spectral characteristics. An exposure method characterized by: an exposure apparatus comprising: a substrate holding portion that holds a substrate as an exposed material; a mask holding σρ 'which holds a mask opposite to the substrate; and an illumination optical system' The light irradiation device according to any one of claims 5 to 7, wherein the light emitted from the plurality of light source portions of the light irradiation device is incident on the integrator lens; and the exposure method is performed as claimed in claims 5 to 7 In the method of controlling the light irradiation device of any one of the above, the substrate is irradiated with light from the illumination optical system via the mask, and the pattern formed on the mask is exposed and transferred to the substrate. 5 157707.doc