CN102483587A - Light irradiation device for exposure apparatus, method for controlling light irradiation device, exposure apparatus, and exposure method - Google Patents

Light irradiation device for exposure apparatus, method for controlling light irradiation device, exposure apparatus, and exposure method Download PDF

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Publication number
CN102483587A
CN102483587A CN2011800019996A CN201180001999A CN102483587A CN 102483587 A CN102483587 A CN 102483587A CN 2011800019996 A CN2011800019996 A CN 2011800019996A CN 201180001999 A CN201180001999 A CN 201180001999A CN 102483587 A CN102483587 A CN 102483587A
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China
Prior art keywords
light source
light
source portion
mask
exposure
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Granted
Application number
CN2011800019996A
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Chinese (zh)
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CN102483587B (en
Inventor
原田智纪
永井新一郎
川岛洋德
山田丰
轻石修作
林慎一郎
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Vn Systems Ltd
V Technology Co Ltd
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NSK Ltd
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Priority claimed from JP2011154669A external-priority patent/JP5799306B2/en
Application filed by NSK Ltd filed Critical NSK Ltd
Priority claimed from PCT/JP2011/066467 external-priority patent/WO2012011497A1/en
Publication of CN102483587A publication Critical patent/CN102483587A/en
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Publication of CN102483587B publication Critical patent/CN102483587B/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21K—NON-ELECTRIC LIGHT SOURCES USING LUMINESCENCE; LIGHT SOURCES USING ELECTROCHEMILUMINESCENCE; LIGHT SOURCES USING CHARGES OF COMBUSTIBLE MATERIAL; LIGHT SOURCES USING SEMICONDUCTOR DEVICES AS LIGHT-GENERATING ELEMENTS; LIGHT SOURCES NOT OTHERWISE PROVIDED FOR
    • F21K2/00—Non-electric light sources using luminescence; Light sources using electrochemiluminescence
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V13/00—Producing particular characteristics or distribution of the light emitted by means of a combination of elements specified in two or more of main groups F21V1/00 - F21V11/00
    • F21V13/02—Combinations of only two kinds of elements
    • F21V13/08—Combinations of only two kinds of elements the elements being filters or photoluminescent elements and reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

Provided are: a light irradiation device for an exposure apparatus, wherein luminance decrease over irradiation time of a light source unit can be suppressed,a method for controlling a light irradiation device,an exposure apparatus,and an exposure method. The light irradiation device for an exposure apparatus comprises: a plurality of light source units (73), each of which contains a light emitting unit (71) and a reflective optical system (72),a plurality of cassettes (81), each of which supports a predetermined number of light source units (73) with light source supporting parts (83) so that light from the light source units (73) is incident on the incident surface of an integrator lens (74),a supporting body (82) which comprises a plurality of cassette fitting parts (90) that fit the plurality of cassettes (81) so that light from all of the light source units (73) is incident on the incident surface of the integrator lens (74),and an optical axis angle adjustment mechanism (99) which is capable of adjusting the angle of the optical axis of each light source unit (73).

Description

The control method of light irradiation apparatus for exposure apparatus, light irradiation device, exposure device and exposure method
Technical field
The present invention relates to control method, exposure device and the exposure method of a kind of light irradiation apparatus for exposure apparatus, light irradiation device; More specifically, relate to and to be applied to the light irradiation apparatus for exposure apparatus of the exposure device of the mask pattern of mask exposure transfer printing on the substrate of large-scale flat-panel monitor such as LCD or plasma display, control method, exposure device and the exposure method of light irradiation device.
Background technology
In the past, as the device of the panels such as color filter plate of making panel display apparatus, designed near various exposure devices such as exposure device, scanning-exposure apparatus, projection aligner, mirror surface projection, closed jointing exposure devices.For example, in the past cut apart one by one near exposure device, keep the mask littler through mask platform than substrate; Keep substrate through work stage simultaneously; Make both near and arranged opposite after, through with respect to mask substep travelling workpiece platform, per step all from mask side to substrate irradiation pattern exposure light; To be depicted in a plurality of pattern exposure transfer printings on the mask thus on substrate, on a substrate, make a plurality of panels.In addition, scanning-exposure apparatus shines exposure light with respect to the certain speed substrate conveying via mask, the pattern of exposure transfer mask on substrate.
In recent years; Display device maximizes gradually, for example, and in cutting apart exposure one by one; Making for the 8th generation through four exposure flashes of light (during the panel of 2200mm * 2500mm); Exposure area once is 1300mm * 1120mm, and when making through six exposure flashes of light, exposure area once is 1100mm * 750mm.Therefore, exposure device also requires the expansion of exposure area, is necessary to improve the output of employed light source.Therefore, as lamp optical system, be well known that and use a plurality of light sources to improve the lamp optical system (for example, with reference to patent documentation 1,2 and 3) of the whole output of light source.
The exposure of patent documentation 1 record is with in the lighting device, will be set at less than the plane of incidence from the size that the diverging light that light source portion penetrates is injected the incident area on the plane of incidence, makes whole diverging lights be injected into the plane of incidence, thus the light that effective utilization is sent from light source portion.In addition, in the light irradiation device of patent documentation 2 records, between each light source of disposed adjacent, be provided for interdicting the dividing wall of light,, solved the problem that waits the light source portion that causes by heating to prevent irradiation from the light of adjacent light source.And then in the light irradiation device of patent documentation 3 records, the 2 groups of light source portion arranged spaced on fore-and-aft direction with a plurality of light source cell stagger arrangement configurations makes between light source cell, to have the space, can efficiently cool off light source cell.In addition, in the light irradiation device of patent documentation 4 record, be provided with shade, the light that it covers from light source dwindles the convergent pencil of rays of the light that incides fly's-eye lens, when using the narrow fly's-eye lens of irradiation area, shade is inserted in the light path.
Patent documentation 1: No. 4391136 communique of Jap.P.
Patent documentation 2: TOHKEMY 2006-324435 communique
Patent documentation 3: TOHKEMY 2007-115817 communique
Patent documentation 4: TOHKEMY 2005-292316 communique
Summary of the invention
Invent problem to be solved
General, use light source portion as plate exposure apparatus, the extra-high-pressure mercury vapour lamp that uses electrode to process by tungsten.Shown in Figure 28 (a), plate exposure apparatus with light irradiation device 1 in, a plurality of extra-high-pressure mercury vapour lamps 2 are configured to roughly circular-arc along curved surface, make that the whole light L from a plurality of extra-high-pressure mercury vapour lamps 2 inject in the fly's-eye lens 3.Light from these extra-high-pressure mercury vapour lamp 2 irradiations even extra-high-pressure mercury vapour lamp 2 does not come into operation, also roughly has the extended corner of the light about 2 ° generally speaking; In order to obtain high output power when electrode provides big electric current, As time goes on, tungsten electrode evaporates gradually in the bulb of light source; Make power supply interval to each other increase; It is big that the basic point of light source becomes, and its result is shown in Figure 28 (b), and the irradiating angle of light for example expands to 2.2 °.
At this moment; For example; When the distance of extra-high-pressure mercury vapour lamp 2 to fly's-eye lens 3 is set to 4m, then on irradiation position (plane of incidence of fly's-eye lens), the variation that irradiating angle is 0.2 °; Usually with respect to the size of the fly's-eye lens 3 of the range of exposures about 100～200mm, be equivalent to roughly expand the range of exposures of 14mm.Therefore,, do not inject fly's-eye lens 3 and become loss, produce the problem of illumination decrease thus from the part of the light of extra-high-pressure mercury vapour lamp 2.Patent documentation 1～4 disclosed technology is, the setting of the incident area through inciding the light on the fly's-eye lens and the hot countermeasure of light source portion realize effective utilization of light, all do not consider the diffusion of the light that the consumption of above-mentioned electrode causes, the space of improving in addition.
The present invention proposes in view of said problem, and its purpose is to provide and can suppresses along with the increase of the irradiation time of light source portion and the light irradiation apparatus for exposure apparatus of the illumination decrease that causes, control method, exposure device and the exposure method of light irradiation device.
The method that is used to deal with problems
Above-mentioned purpose of the present invention realizes through following formation.
(1) a kind of light irradiation apparatus for exposure apparatus is characterized in that, possesses:
A plurality of light source portion, it comprises illuminating part respectively and makes the light that sends from this illuminating part have the reflective optics that directivity ground penetrates;
A plurality of fuse-boxes, it has the light source support that supports said light source portion respectively, so that the light of the light source portion of said predetermined quantity incides the plane of incidence of fly's-eye lens;
Supporting mass, it has and is respectively applied for a plurality of fuse-box installation portions that said a plurality of fuse-boxes are installed, so that the light of said whole light source portion incides the plane of incidence of fly's-eye lens;
And the optical axis angle governor motion, it can be regulated the optical axis angle with respect to said fly's-eye lens of said each light source portion, to revise the diffusion of the said light that produces along with the increase of the irradiation time of said each light source portion.
(2) according to (1) described light irradiation apparatus for exposure apparatus, it is characterized in that,
The light source portion of said predetermined quantity is made up of the different multiple light source portion of spectral characteristic.
(3) according to (2) described light irradiation apparatus for exposure apparatus, it is characterized in that,
The spectral characteristic of each illuminating part of the light source portion of said predetermined quantity is identical,
Constitute the different multiple light source portion of spectral characteristic through on the part of the light source portion of said predetermined quantity, optical filter being set.
(4) a kind of exposure device is characterized in that, possesses:
The substrate maintaining part, it is used to keep conduct by the substrate of exposing material;
The mask maintaining part, it is to keep mask with the opposed mode of said substrate;
Lamp optical system, it has each described light irradiation device and the fly's-eye lens of confession by the light incident of a plurality of light source portion ejaculations of this light irradiation device in (1) to (3),
To shine to said substrate through said mask from the light of said lamp optical system.
(5) a kind of control method of light irradiation apparatus for exposure apparatus possesses:
A plurality of light source portion, it comprises illuminating part respectively and makes the light that sends from this illuminating part have the reflective optics that directivity ground penetrates;
A plurality of fuse-boxes, it has the light source support that supports said light source portion respectively, so that the light of the light source portion of said predetermined quantity incides the plane of incidence of fly's-eye lens;
Supporting mass, it has and is respectively applied for a plurality of fuse-box installation portions that said a plurality of fuse-boxes are installed, so that the light of said whole light source portion incides the plane of incidence of fly's-eye lens;
And the optical axis angle governor motion, it can be regulated the optical axis angle with respect to said fly's-eye lens of said each light source portion, revising the diffusion of the said light that produces along with the increase of the irradiation time of said each light source portion,
The method is characterized in that, comprising:
Be used to detect along with the increase of the irradiation time of said each light source portion and the operation of the diffusion of the said light that produces and
Operation by the diffusion of the said light of said optical axis angle governor motion correction.
(6) according to the control method of (5) described light irradiation apparatus for exposure apparatus, it is characterized in that also possessing:
Illuminometer, the downstream that it is arranged at said fly's-eye lens is used for measuring and the corresponding illumination of each wavelength;
Control part is used to control the lighting a lamp of said each illuminating part, light-off and illumination,
The light source portion of said predetermined quantity is made up of the different multiple light source portion of spectral characteristic,
The illumination corresponding to each wavelength that said control part is measured based on said illuminometer is controlled each light source portion in the said fuse-box, in presetted wavelength, to obtain the illumination of expectation.
(7) according to the control method of (6) described light irradiation apparatus for exposure apparatus, it is characterized in that,
The spectral characteristic of each illuminating part of the light source portion of said predetermined quantity is identical,
Constitute the different multiple light source portion of spectral characteristic through on the part of the light source portion of said predetermined quantity, optical filter being set.
(8) a kind of exposure method is characterized in that, possesses:
The substrate maintaining part, it is used to keep conduct by the substrate of exposing material;
The mask maintaining part, it is to keep mask with the opposed mode of said substrate;
Lamp optical system, it has each described light irradiation device and the fly's-eye lens of confession by the light incident of a plurality of light source portion ejaculations of this light irradiation device in (5) to (7),
In the control method of enforcement (5) each described light irradiation device in (7), will shine said substrate through said mask from the light of said lamp optical system, being needed on the said substrate at the pattern exposure that said mask forms.
The effect of invention
According to light irradiation apparatus for exposure apparatus of the present invention, owing to possess: a plurality of light source portion that comprise illuminating part and reflective optics; A plurality of fuse-boxes, it has the light source support of the light source portion of supporting predetermined quantity; Supporting mass, it has a plurality of fuse-box installation portions that are used to install a plurality of fuse-boxes; And optical axis angle governor motion; It can be regulated the optical axis angle with respect to fly's-eye lens of each light source portion, to revise the diffusion of the light that produces along with the increase of the irradiation time of each light source portion, therefore; Even along with the increase of the irradiation time of light source portion and the diffusion that produces light; Through the optical axis angle governor motion diffusion is revised, can be made from the light of 70～100% exposure of each light source portion and inject in the fly's-eye lens, thus; The illumination decrease that can suppress to cause along with the increase of irradiation time can obtain illumination steady in a long-term.
In addition; Control method according to light irradiation apparatus for exposure apparatus of the present invention; To along with the increase of the irradiation time of each light source portion and the diffusion of the light that produces detect, by the optical axis angle governor motion diffusion of detected light is revised, can make and inject in the fly's-eye lens reliably from the light of 70～100% exposure of each light source portion; The illumination decrease that can suppress to cause along with the increase of irradiation time can obtain illumination steady in a long-term.
And then; Exposure device according to the present invention with and exposure method; Since use above-mentioned light irradiation apparatus for exposure apparatus with and control method will be formed at mask the pattern exposure transfer printing on substrate, therefore, can make public with light with illumination steady in a long-term; Can make public with high precision, thus the quality of raising product.
Description of drawings
Fig. 1 is the sectional perspective exploded view that separates gradual exposure device that is used to explain first embodiment of the present invention.
Fig. 2 is the front view that separates gradual exposure device shown in Figure 1.
Fig. 3 is the sectional view of mask platform.
Fig. 4 (a) is the front view of expression light irradiation device, (b) is the sectional view along the IV-IV line of (a), (c) is the sectional view along the IV '-IV ' line of (a).
Fig. 5 is the expansion sectional view on every side that is installed on the light source portion in the fuse-box.
Fig. 6 is that the expression fuse-box is installed on the main position expanded view under the state of supporting mass.
Fig. 7 (a)～(d) is the front view of shape of representing the peristome of catoptron respectively.
Fig. 8 is the skeleton diagram of expression from the outgoing plane of each light source portion to the distance the plane of incidence of fly's-eye lens.
Fig. 9 is the sectional view that expression is installed on supporting mass the example in the light irradiation device.
Figure 10 is the sectional view of the example of expression when fuse-box is installed on the fuse-box installation portion.
Figure 11 is the figure that expression is used for fuse-box is installed to the variation of the fuse-box fixed mechanism on the supporting mass,
(a) being stereographic map, (b) is planimetric map, (c) is the sectional view along the XI-XI line in (b).
Figure 12 is the figure that expression is used for fuse-box is installed to other variation of the fuse-box fixed mechanism on the supporting mass.
Figure 13 is the figure that expression is used for fuse-box is installed to another variation of the fuse-box fixed mechanism on the supporting mass.
(a) of Figure 14 is another variation stereographic map that expression is used for fuse-box is installed to the fuse-box fixed mechanism on the supporting mass, (b) is the sectional view that the expression fuse-box is installed to the state on the supporting mass.
(a) of Figure 15 is the variation stereographic map again that expression is used for fuse-box is installed to the fuse-box fixed mechanism on the supporting mass, (b) is the sectional view that the expression fuse-box is installed on the state on the supporting mass.
Figure 16 is the front view that separates gradual exposure device of expression second embodiment.
(a) of Figure 17 is the front view of expression light irradiation device, (b) is the sectional view along the XVII-XVII line in (a).
18 (a) of figure are the front views of expression fuse-box, (b) are the outboard profiles of (a), (c) are the upward views of (a).
Figure 19 (a) is the front view of fuse-box of light irradiation device of the variation of expression the 2nd embodiment, (b) is the front view of fuse-box of the light irradiation device of other variation of expression, (c) is the figure of a part when extinguishing of light source portion of the light irradiation device of expression (a).
Figure 20 is the overall perspective view near scanning-exposure apparatus of expression the 3rd embodiment of the present invention.
Figure 21 is the vertical view near scanning-exposure apparatus that is illustrated under the state of having removed tops such as irradiating part formation.
Figure 22 representes the side view near the exposure status in the mask configuration zone of scanning-exposure apparatus.
(a) of Figure 23 is the vertical view that is used to explain the main position of the position relation between mask and the air cushion, (b) is its sectional view.
Figure 24 is used to explain the figure near the irradiating part of scanning-exposure apparatus.
(a) of Figure 25 is the front view of the light irradiation device of expression Figure 24, (b) is the sectional view along the XXV-XXV line in (a).
Figure 26 is the figure near the irradiating part of scanning-exposure apparatus that is used to explain the 4th embodiment of the present invention.
(a) of Figure 27 is the front view of the light irradiation device of expression Figure 26, (b) is the sectional view along the XXVII-XXVII line in (a).
(a) of Figure 28 and (b) be the skeleton diagram of the existing light irradiation device of light under the state of fly's-eye lens skew of expression diffusion.
The drawing reference numeral explanation
12 mask holders (mask maintaining part)
21 substrate maintaining parts
70 lamp optical systems
71 extra-high-pressure mercury vapour lamps (illuminating part)
72 catoptrons (reflective optics)
73,73A, 73B light source portion
74 fly's-eye lenses
80, the 80A light irradiation apparatus for exposure apparatus
81, the 81A fuse-box
82, the 82A supporting mass
83 light source supports
90 fuse-box installation portions
99 optical axis angle governor motions
171 mask maintaining parts
171a upstream side mask maintaining part
171b downstream mask maintaining part
180 irradiating part (lamp optical system)
186 wavelength cut-off optical filters
200 near scanning-exposure apparatus (exposure device)
The LA optical axis
The M mask
The P pattern
PE is cut apart one by one near exposure device (exposure device)
W substrate, glass substrate, color filter substrate (by exposing material)
Embodiment
Below, based on accompanying drawing light irradiation apparatus for exposure apparatus of the present invention, the exposure device that uses this light irradiation device and the related embodiment of exposure method are elaborated.
First embodiment
As depicted in figs. 1 and 2, cutting apart one by one of this embodiment possesses near exposure device PE: be used to keep mask M mask platform 10, be used to keep the substrate platform 20 of glass substrate (by exposing material) W and the illuminating optical system 70 that is used for the irradiation pattern exposure light.
Moreover glass substrate W (being designated hereinafter simply as " substrate W ") and mask M dispose relatively, are depicted in its transfer printing that will make public on the surface (the opposite face side of mask M) of the pattern on this mask M, are coated with emulsion.
Mask platform 10 possesses: mask platform pedestal 11, and centre portion is formed with the opening 11a of rectangle therein; Mask holder 12, it is to be installed on the mask maintaining part on the opening 11a of mask platform pedestal 11 movably to X axle, Y axle, θ direction; And mask driving mechanism 16, the upper surface that it is arranged at mask platform pedestal 11 makes mask holder 12 move to X axle, Y axle and θ direction, and the position of mask M is adjusted.
Mask platform pedestal 11 is supported for and can on Z-direction, moves (with reference to Fig. 2), and be configured in the top of substrate platform 20 by the upright Z shaft moving device 52 of being located at the pillar 51 of device pedestal 50 and being located at the upper end of pillar 51.
As shown in Figure 3, at the upper surface of the circumference of the opening 11a of mask platform pedestal 11, a plurality of positions have disposed surface bearing 13, upload the flange 12a that is located at upper end outer peripheral edges portion that puts mask holder 12 at surface bearing 13.Thus, mask holder 12 is via the opening 11a of predetermined gap insertion mask platform pedestal 11, and therefore, mask holder 12 can move corresponding to the such distance in this gap along X axle, Y axle and θ direction.
In addition, on the lower surface of mask holder 12, be fixed with the clamping section 14 that keeps mask M through liner 15.On this clamping section 14, offered a plurality of attraction mouth 14a of the circumference of not describing mask pattern that is used to adsorb mask M, mask M is remained on the clamping section 14 by not shown vacuum type adsorbent equipment loading and unloading through attracting mouth 14a freely.In addition, clamping section 14 can be moved along X axle, Y axle and θ direction with respect to mask platform pedestal 11 with mask holder 12.
Mask driving mechanism 16 possesses: be installed in two Y direction drive unit 16y on one side of X-direction of mask holder 12 and be installed in the X-direction drive unit 16x on one side of Y direction of mask holder 12.
Y direction drive unit 16y possesses: drive with actuator 16a (for example, YE etc.), it is arranged on the mask platform pedestal 11, and has to the flexible bar 16b of Y direction; Slide block 16d, it sells the front end that supporting device 16c is connected in bar 16b; And guide rail 16e, its be installed on mask holder 12 along in the limit portion of X-direction, and slide block 16d is installed movably.In addition, X-direction drive unit 16x also has the same structure with Y direction drive unit 16y.
In addition, mask driving mechanism 16 moves mask holder 12 through driving an X-direction drive unit 16x on X-direction, and is same through driving two Y direction drive unit 16y, and mask holder 12 is moved on Y direction.In addition, through driving arbitrary of two Y direction drive unit 16y, can both make mask holder 12 move (around the rotation of Z axle) along the θ direction.
And then, as shown in Figure 1, also be provided with gap sensor 17 and the alignment cameras 18 of the installation site of the mask M that is used to confirm kept in the gap of the opposed faces that is used to measure mask M and substrate W by clamping section 14 at the upper surface of mask platform pedestal 11.These gap sensors 17 and alignment cameras 18 remain on X axle, the Y direction through travel mechanism 19 movably, and are configured in the mask holder 12.
In addition, as shown in Figure 1 on mask holder 12, the both ends in the X-direction of the opening 11a of mask platform pedestal 11 are provided with the hole sheet 38 that comes shadowing mask M both ends as required.Through the hole sheet driving mechanism 39 that is made up of motor, ball-screw and linear guides etc., this hole sheet 38 can move on X-direction, with the dead area at adjustment mask M both ends.In addition, hole sheet 38 not only is located at the both ends of the X-direction of opening 11a, and is located at the both ends of the Y direction of opening 11a equally.
Like Fig. 1 and shown in Figure 2, substrate platform 20 possesses substrate maintaining part 21 that keeps substrate W and the base plate driving mechanism 22 that substrate maintaining part 21 is moved on X axle, Y axle, Z-direction with respect to device pedestal 50.Substrate maintaining part 21 is loaded and unloaded through not shown vacuum suction mechanism and is kept substrate W freely.Base plate driving mechanism 22 possesses Y axle worktable 23, Y axle conveying mechanism 24, X axle worktable 25, X axle conveying mechanism 26 and Z-tilt adjusting mechanism 27 below substrate maintaining part 21.
As shown in Figure 2; Constituting of Y axle conveying mechanism 24 possesses linear guides 28 and transport driving 29; The slide block 30 that is installed on the back side of Y axle worktable 23 is striden frame along on two guide rails 31 that extend on the device pedestal 50 through rolling body (not shown), and drives Y axle worktable 23 through motor 32 and ball-screw apparatus 33 along guide rail 31.
In addition, X axle conveying mechanism 26 also has the formation identical with Y axle conveying mechanism 24, drives X axle worktable 25 with respect to Y axle worktable 23 along directions X.In addition; Through movable Wedge mechanism of a distolateral configuration at directions X; Constitute Z-tilt adjusting mechanism 27 at two movable Wedge mechanisms of another distolateral configuration, wherein this movable Wedge mechanism combines through moving body 34,35 and transport driving 36 with wedge-like.And transport driving 29,36 both can be the structure that combination motor and ball-screw apparatus form, and also can be the linear motor with stator and rotor.In addition, Z-tilt adjusting mechanism 27 is provided with number for any.
Thus, base plate driving mechanism 22 is along directions X and Y direction feed drive substrate maintaining part 21, and makes substrate maintaining part 21 in Z-direction fine motion and tilt adjustments, with the gap between the opposed faces of inching mask M and substrate W.
Directions X sidepiece and Y direction sidepiece in substrate maintaining part 21 are separately installed with bar-shaped mirror 61,62, in addition, are provided with three laser interferometer 63,64,65 altogether in the Y direction end and the directions X end of device pedestal 50.Thus; By laser interferometer 63,64,65 laser is shone to bar-shaped mirror 61,62; And receive the laser that returns by bar-shaped mirror 61,62 reflections, through the interference between the laser of measuring laser and reflecting by bar-shaped mirror 61,62, detect the position of substrate platform 20.
Like Fig. 2 and shown in Figure 4, lamp optical system 70 possesses: light irradiation device 80, and it possesses a plurality of light source portion 73; Fly's-eye lens 74, the light beam that shoots out from a plurality of light source portion 73 incides this fly's-eye lens 74; Optics control part 76, the DC current that it provides voltage to be adjusted to the lamp 71 of each light source portion 73; Concave mirror 77, it can change the direction of the light path that shoots out from the outgoing plane of fly's-eye lens 74; Control with shutter 78 with exposure, it is configured between a plurality of light source portion 73 and the fly's-eye lens 74, carries out open and close controlling to see through/to block the light that irradiation comes.In addition, between fly's-eye lens 74 and plane of exposure, also can dispose DUV cutoff filter, polarizing filter, bandpass filter, in addition, on concave mirror 77, also can be provided with can be manually or change the position angle correcting device of the curvature of mirror automatically.
Like Fig. 4～shown in Figure 8, light irradiation device 80 possesses: a plurality of light source portion 73, its comprise respectively as the extra-high-pressure mercury vapour lamp 71 of illuminating part with make the light that sends from this lamp 71 have the catoptron 72 that directivity ground penetrates as reflective optics; A plurality of fuse-boxes 81, it can install the light source portion 73 of the predetermined quantity in a plurality of light source portion 73 respectively; With supporting mass 82, it can install a plurality of fuse-boxes 81.
In addition; In lamp optical system 70; When having used the extra-high-pressure mercury vapour lamp 71 of 160W; Be used to make dull and stereotyped 374 light source portion of exposure device needs of the 6th generation, be used to make dull and stereotyped 572 light source portion of exposure device needs of the 7th generation, be used to make dull and stereotyped 774 light source portion of exposure device needs of the 8th generation.But; In this embodiment, for the purpose of simplifying the description, as shown in Figure 4; Establish the fuse-box 81 that 2 row amount to 6 light source portion 73 on 3 layers, β direction to having installed to establish on the α direction, be configured to 3 layers * 3 row and amount to lamp optical system 9, that have 54 light source portion 73 and describe.In addition, fuse-box 81 and supporting mass 82 also consider the configuration of light source portion 73 is set as the square shape of equivalent amount on α, β direction, but also are useful in the rectangular shape that is set as varying number on α, the β direction.In addition, in the light source portion 73 of this embodiment, the peristome 72b of catoptron 72 forms roughly square shape, and four limits are configured to along α, β direction.Moreover; The peristome 72b of so-called essentially rectangular; Being not limited to bight 72c shown in Fig. 7 (a) intersects and to become the square shape at right angle or rectangular shape roughly; Also can be the shape that the bight 72c shown in Fig. 7 (b) forms curved surface shape chamfering, or the bight 72c shown in Fig. 7 (c) form the shape of linearity chamfering.In addition, also can be shown in Fig. 7 (d), peristome 72b forms the shape of the both ends on relative both sides with the circular arc connection.
As shown in Figure 5, the inside at the luminotron (quartz glass ball) 94 of extra-high-pressure mercury vapour lamp 71 is provided with two electrodes etc., is packaged with predetermined mercury vapor and presses, for example 10 6～several 10 7Pascal's mercury.When extra-high-pressure mercury vapour lamp 71 was provided DC current, electrode was made up of from the anode 96 that discharge plasma flows into electronics the negative electrode 95 to the discharge plasma ejected electron, and comes luminous through the arc discharge between negative electrode 95 and the anode 96.Luminotron 94 is fixed, made the mid point of 96 on negative electrode 95 and anode roughly be positioned on the focus of catoptron 72.
Catoptron 72 can be to have the shape that reflected light concentrates on the parabola or the elliptical area of focus, also can be that reflected light is the paraboloidal mirror of directional light.Catoptron 72 for example is made up of the formed body of borosilicate glass or glass ceramics, and the surface is formed with reflection with filming within it.Reflection for example is by SiO with filming 2And Nb 2O 5The dielectric multilayer-film that constitutes, reflection be from the light of ultraviolet range to the viewing area of 300～590nm, makes the behind of light transmission arrival catoptron 72 of light and the infrared spectral range of unwanted viewing area.
Extremely shown in Figure 8 like Fig. 5; Each fuse-box 81 forms roughly square shape; It possesses the light source support 83 of the light source portion 73 that supports predetermined quantity and lamp fixed cover (cap assembly) 84, this lamp fixed cover (cap assembly) 84 of concavity is installed on this light source support 83; Be used for fixing the light source portion 73 that is supported on the light source support 83, each fuse-box 81 has identical formation separately.Moreover so-called roughly square shape also can be the shape that comprises chamfered section.
On light source support 83, be formed with: be provided with accordingly and send from a plurality of window 83a of portion of the light of light source portion 73 and the lamp being located at the jacket side of the 83a of this window portion and surrounding the peristome 72a (perhaps being used to install the peristome of the catoptron installation portion of catoptron 72) of catoptron 72 with the quantity of light source portion 73 and use recess 83b.In addition, the opposition side at the cover of the 83a of this window portion is separately installed with a plurality of cover glass 85.In addition, the installation of cover glass 85 is arbitrarily, also can not be provided with.
Each lamp forms plane or curved surface (this embodiment is the plane) with the bottom surface of recess 83b; Make after under the state that moves of the optical axis angle adjusting mechanism 99 stated; The intersection point p of the shadow surface (at this, being the opening surface 72b of catoptron 72) that makes the light of radiation source portion 73 and the optical axis L A of light source portion 73 is being positioned on α, the β direction on the single curved surface such as sphere r.
On the bottom surface of lamp fixed cover 84, be provided with the abutting part 86 at the rear portion that is connected to light source portion 73, on each abutting part 86, be provided with the lamp hold-down mechanism 87 that constitutes by the such actuator of motor or cylinder, spring mountings, screw clamp etc.Thus; Each light source portion 73 is used recess 83b through the lamp that the peristome 72a with catoptron 72 is entrenched in light source support 83; Lamp fixed cover 84 is installed on the light source support 83, utilizes lamp hold-down mechanism 87 to compress the rear portion of light source portion 73, be located thus in fuse-box 81.
Therefore; As shown in Figure 8; The light that is positioned the light source portion 73 of the predetermined quantity in the fuse-box 81 is injected into the plane of incidence of fly's-eye lens 74, and from the light that each shadow surface shone of the light source portion 73 of predetermined quantity, the exposure that arrives the plane of incidence of fly's-eye lens 74 is 70%～100%.
In addition, supporting mass 82 has: supporting mass main body 91, and it has a plurality of fuse-box installation portions 90 that are used to install a plurality of fuse-boxes 81; With supporting mass outer cover 92, it is installed on this supporting mass main body 91, is used to cover the rear portion of each fuse-box 81.
As shown in Figure 9, supporting mass 82 is installed to 80 last times of light irradiation device, considers the center of gravity of the supporting mass 82 that fuse-box 81 is installed, and making the angle Ψ between the face of being provided with of front surface and the supporting mass 82 of the fuse-box 81 below when preferably installing is Ψ≤90 °.Thus, can prevent that light irradiation device 80 from toppling over.Situation when in addition, Fig. 9 representes Ψ=90 °.
Peristome 90a as shown in Figure 6, as on each fuse-box installation portion 90, form to supply light source support 83 to face, form around this peristome 90a with the rectangle plane around the light source support 83 opposed plane 90b be the bottom surface fuse-box is used recess 90c.In addition, be provided with the fuse-box fixed mechanism 93 that is used for fixing fuse-box 81 at the fuse-box of supporting mass main body 91 around with recess 90c, in this embodiment, this fuse-box fixed mechanism 93 is fastened on the recess 81a that is formed on the fuse-box 81, with fixing fuse-box 81.
Moreover shown in figure 10, fuse-box 81 fixedly the time, preferably makes the part of fuse-box 81 be assemblied on the fuse-box installation portion 90 with the state that tilts by fuse-box fixed mechanism 93, and light irradiation device 80 is not easy to swing to rear and easy mounting like this.
The fuse-box of on α direction or β direction, arranging forms with the mode that predetermined angle γ intersects with each plane 90b of recess 90c, is being positioned on single curved surface, the for example sphere r (with reference to Fig. 8) on each α, the β direction so that shine the intersection point p of optical axis L A of shadow surface and light source portion 73 of light of whole light source portion 37 of each fuse-box 81.
Therefore, under the state that the fuse-box that these light source supports 83 is embedded in each fuse-box installation portion 90 positions in recess 90c, through fuse-box fixed mechanism 93 is sticked among the recess 81a of fuse-box 81, and each fuse-box 81 is separately fixed on the supporting mass 82.And, be installed under the state on the supporting mass main body 91 at these fuse-boxes 81, supporting mass outer cover 92 is installed on this supporting mass main body 91.Therefore, as shown in Figure 8, the light that is located in the whole light source portion 73 in each fuse-box 81 is injected into the plane of incidence of fly's-eye lens 74, and the exposure that arrives the plane of incidence of fly's-eye lens 74 from the light that each shadow surface shone of whole light source portion 73 is 70%～100%.
In addition, also can substitute fuse-box fixed mechanism 93 as shown in Figure 6, shown in figure 11; Relative both sides at fuse-box 81 are provided with through hole 83c; Through will being inserted in the recess 91b of supporting mass main body 91, with fixing fuse-box 81 as the cylindrical shaft parts 93a via through holes 83c of fuse-box fixed mechanism.In addition, though through hole and fuse-box fixed mechanism are arranged at the pars intermedia on relative both sides, also can be arranged on four jiaos of fuse-box 81.In addition, shown in figure 12, instead through-holes 83c is provided with slot part 83d towards the side of fuse-box 81 on fuse-box 81, through columned spindle unit 93a is inserted the recess 91b of supporting mass main body 91 through slot part 83d, with fixing fuse-box 81.In addition, shown in figure 13, also can substitute columned spindle unit 93a, and use polygon-shaped spindle unit 93e to be used as in the fuse-box fixed mechanism, the shape that changes through hole 83c or recess 91b gets final product correspondingly.Especially the combination through adopting columned spindle unit 93a and polygon-shaped spindle unit 93e can be installed on fuse-box 81 on the normal place of supporting mass 82 as the fuse-box fixed mechanism exactly.In addition, can use jointly with fuse-box fixed mechanism 93 shown in Figure 6 like Figure 11 and fuse-box fixed mechanism shown in Figure 12.
Perhaps; Also can be shown in Figure 14 (a); In four jiaos of cylindrical protrusion 93b or polygon projections that are provided with as the fuse-box fixed mechanism of fuse-box 81, shown in Figure 14 (b), and make above-mentioned projection and supporting mass main body 91 sides formed hole portion or slot part 91c carry out chimeric calibration.Perhaps, also can shown in Figure 15 (a), form tenon 93c, shown in Figure 15 (b), carry out chimeric the aligning with supporting mass main body 91 sides formed hole portion or slot part 91d on the relative both sides of fuse-box 81.In addition, tenon 93c is preferably disposed on both sides from installation property, but shown in the dot-and-dash line of Figure 15 (a), tenon 93c also can be arranged at other relative both sides.In addition, also can be following formation: cylindrical protrusion 93b or the tenon 93c shown in Figure 15 (a) shown in Figure 14 (a) are arranged at supporting mass main body 91 sides, hole portion or slot part are arranged at fuse-box 81 sides.And then the fuse-box fixed mechanism shown in Figure 14 (a) and Figure 15 (a) can use with fuse-box fixed mechanism 93 shown in Figure 8 jointly.
As shown in Figure 6; Be fixed with from the bolt 97a of the strip that rearward extends between the adjacent light source portion 73 in the inside of the light source support 83 of frame shape, the front end of this bolt 97a is screwed with nut 97b by motor 98 driven in rotation that are fixed in lamp fixed cover 84 bottoms.In motor 98 drive nut 97b when rotation, then via the bolt 97a transmission that screws togather, make light source support 83 drawn or push and produce elastic deformation, thus, the optical axis angle that is fixed in the light source portion 73 on the light source support 83 regulated.Change speech its, bolt 97a, nut 97b and motor 98 are configured for regulating the optical axis angle governor motion 99 with respect to the optical axis angle of each light source portion 73 of fly's-eye lens 74.
In addition; Receive the optical axis angle of each light source portion 73 of optical axis angle governor motion 99 adjustings to be; The angle that the diffusion of the light that can produce the increase along with the irradiation time of light source portion 73 is revised, for example, the minute angle below 1 ° is just enough; Therefore, can in the scope of the elastic deformation of light source support 83, regulate.In addition, optical axis angle governor motion 99 is not limited to the above-mentioned structure that is made up of bolt 97a, nut 97b and motor 98, can adopt mechanism arbitrarily, and it can be provided in the lamp hold-down mechanism 87 that is used to compress light source portion 73 rear portions.
In addition, as shown in Figure 8, for example, be adjacent to be equipped with optical detection devices 101 such as illuminometer with fly's-eye lens 74.Optical detection device 101 to the diffusion of the light of the light source portion 73 that produces owing to the increase along with irradiation time, is not injected fly's-eye lens 74 and the light leak amount that shines beyond the fly's-eye lens 74 detects.In addition, the motor 98 of optical detection device 101 and optical axis angle governor motion 99 is connected with control device 102 through electric wire 103 respectively.
In addition, when optical detection device 101 detects the light leak amount, make motor 98 action, revise, make the light of 70%～100% exposure inject fly's-eye lens 74 with the optical axis angle of regulating light source portion 73 and to the diffusion part of light.More specifically, when optical detection device 101 detected the light quantity that surpasses the predetermined threshold that sets, control device 102 made motor-driven to motor 98 transmission action commands, and makes nut 97b rotation.Thus, the bolt 97a that is screwed together in nut 97b is pulled to the direction of motor 98, through the direction generation elastic deformation that light source support 83 is reduced to radius-of-curvature, with the optical axis angle of each light source portion 73 towards the inboard diffusion part to light revise.Therefore, the light quantity that optical detection device 101 detects is reduced to initial value when following, that is, when the light of 70%～100% exposure was injected into fly's-eye lens 74 with original state identically, the action of motor 98 stopped.
In addition; Optical detection device 101 so long as can detect based on the device of the light diffusion of the light source portion 73 of irradiation time all can; Can be not limited to optical detection device 101, also can be the light quantity pick-up unit that is disposed on the plane of incidence of fly's-eye lens 74, or the timer that irradiation time is counted etc.When the light quantity pick-up unit was disposed at fly's-eye lens 74, the light quantity that is detected by the light quantity pick-up unit was regulated through the optical axis angle of 99 pairs of each light source portion 73 of optical axis angle governor motion during less than predetermined threshold, makes light be injected into the central side of fly's-eye lens 74.And when the detection light quantity returned to initial value, action stopped.On the other hand,, during still less than predetermined threshold, can be judged as the illumination decrease of lamp 71 itself, change lamp 71 even regulate through the optical axis angle of 99 pairs of each light source portion 73 of optical axis angle governor motion.
In addition, carrying out timing when control, the relation between the irradiation time of investigating light source portion 73 in advance and the diffusion angle of light, through the irradiation time of being scheduled to after, the optical axis angle of each light source portion 73 is regulated.
In addition, also to check illumination behind the replacing lamp 71, occur the situation that illumination does not have recovery sometimes.For example, during cover glass 85 dirts, change cover glass 85.Also can be through observing or pass through the dirt of sensor affirmation cover glass 85.As the applicable infiltration type light of sensor detecting sensor, reflection type optical detecting sensor and eddy current type sensor.
In the exposure device PE of such formation, in lamp optical system 70, when control exposure control was with shutter 78 unlatchings during exposure, the light that shines from extra-high-pressure mercury vapour lamp 71 was injected on the plane of incidence of fly's-eye lens 74.And the light that sends from the outgoing plane of fly's-eye lens 74 is through concave mirror 77, the reformed directional light that is converted into simultaneously of its working direction.And, wide the causing on the surface that vertically is irradiated to mask M that remains in mask platform 10 and even the substrate W that remains in substrate platform 20 that this directional light is used as pattern exposure, and the pattern P exposure of mask M is transferred on the substrate W.
Here, even the lamp of extra-high-pressure mercury vapour lamp 71 for not coming into operation, the light that shines from extra-high-pressure mercury vapour lamp 71 also has the for example extended corner of the light about 2 °; But in order to obtain high output power, along with the passing of service time, in luminotron 94 to electrode 95, when between 96 big electric current being provided; Tungsten electrode 95,96 evaporates gradually, makes two electrodes 95, the interval between 96 increase, and it is big that the basic point of light source becomes; The diffusion of light takes place, and the irradiating angle of light for example expands to 2.2 °.In being supplied to galvanic extra-high-pressure mercury vapour lamp 71, because electric current flows towards a direction, this wear phenomenon has the tendency that is more showing than the extra-high-pressure mercury vapour lamp that is supplied to alternating current 71.
From the viewpoint of the utilization ratio of light, when the installation of lamp optical system 70, regulate from the light of 70%～100% exposure of whole light source portion 73 so that it is injected on the plane of incidence of fly's-eye lens 74.But; The diffusion of the light that produces through increase along with service time of above-mentioned extra-high-pressure mercury vapour lamp 71, when optical detection device 101 detected light leak amounts (diffusion of light), then control device 102 drove motor 98; Through bolt 97a transmission, traction light source support 83 makes it that elastic deformation take place.Thus, make each light source portion 73 that is fixed in light source support 83, regulate optical axis angle and revise with diffusion to light towards the inboard.
As stated, the light irradiation apparatus for exposure apparatus 80 according to first embodiment possesses: a plurality of light source portion 73, and it comprises illuminating part 71 and reflective optics 72; A plurality of fuse-boxes 81, it is with light source support 83 supporting light source portion 73; Supporting mass 82, it has a plurality of fuse-box installation portions 90 that are used to install a plurality of fuse-boxes 81; And optical axis angle governor motion 99, it can be regulated the optical axis angle of each light source portion 73; Therefore, can revise the diffusion of the light that produces along with the increase of the irradiation time of light source portion 73, can make light be injected into fly's-eye lens 74, thus, can improve the light utilization ratio, suppress illumination decrease from 70～100% exposure of each light source portion 73.
In addition; To along with the increase of the irradiation time of each light source portion 73 and the diffusion of the light that produces detect; Control light irradiation device 80 makes to be revised by the diffusion of 99 pairs of detected light of optical axis angle governor motion; Therefore, the light from 70～100% exposure of each light source portion 73 is injected on the fly's-eye lens 74 reliably, to prevent illumination decrease.In addition; In above-mentioned embodiment; Though the diffusion of light is detected and regulates automatically the optical axis angle of light source portion 73; But through the relation between the diffusion of bimetry irradiation time and light, in advance each light source portion 73 is regulated with the size at its angle of inclination to the inside, also can improve the utilization ratio of light to a certain extent.
Second embodiment
Below, with reference to accompanying drawing 16～19, to describing near exposure device cutting apart one by one of second embodiment of the present invention.Moreover; This embodiment cut apart one by one near the basic structure of exposure device with separating of first embodiment progressive proximity printing device identical; Therefore to the identical symbol of identical part mark and omit its explanation, and different portions is elaborated.
Like Figure 17, shown in Figure 180, this embodiment cut apart one by one near exposure device PE, wavelength cut-off optical filter 186 is configured on the fuse-box 81 front surface corresponding with the lamp of expectation 71.As wavelength cut-off optical filter 186, can be any one in low pass filter, high-pass filter, the bandpass filter, also can be ND (dim light) optical filter that reduces the expectation Wavelength strength.Moreover wavelength cut-off optical filter 186 preferably is set to point symmetry, and in this embodiment, it is installed on 6 lamps of 6 lamps and lower floor on upper strata (Figure 17,18 oblique line part).Thus, on fuse-box 81, constitute two kinds of different light source portion 73 of spectral characteristic.Below, the light source portion that wavelength cut-off optical filter 186 is installed 73 is called the light source portion 73A that is with optical filter, will there be the light source portion 73 of wavelength cut-off optical filter 186 to be called the light source portion 73B of free of light filter.
In addition, shown in figure 16, be formed with opening 77a in the part of concave mirror 77, at the rear of opening 77a, be provided with each illuminometer 79 of the illumination of each wavelength that is used to measure g line, h line, i line, j line, k line etc.
In addition, in the optics control part 76, the peak height of each spectral characteristic, particularly each wavelength of the light source portion 73B of the light source portion 73A of mensuration band optical filter and free of light filter is preserved as database in advance.Moreover, if light source portion 73A, 73B continue to use lamp 71 then spectral characteristic changes, therefore not have under the state that makes public, measure the illumination in each wavelength of each light source portion 73A, 73B.
In the light irradiation device 80 that constitutes like this, based on the result who is measured by illuminometer 79, the power and the number of the lamp of lighting 71 of each light source portion 73A, 73B are confirmed in the comparable data storehouse.At this, the number of the lamp of lighting 71 for a long time, even the extinguishing method of lamp 71 is not a point symmetry; Its influence to the plane of exposure Illumination Distribution is also less; But the number of the lamp of lighting 71 is more after a little while, for example, and when extinguishing 50% left and right sides of 216 lamps 71; If the extinguishing method of lamp 71 is not a point symmetry, then the plane of exposure Illumination Distribution might variation.Therefore, preferably lighting lamp 71 makes the light source portion 73A of band optical filter and the light source portion 73B of free of light filter be respectively point symmetry.
Light from mercury vapor lamp 71 penetrates is generally incoherent light, when arriving plane of exposure through the lamp optical system that is made up of fly's-eye lens 74, concave mirror 77 etc., corresponding to every kind of wavelength its intensity sum is provided.Through light source portion 73A and the light source portion 73B of free of light filter of band optical filter are set, can control the spectral intensity ratio in each wavelength to a certain extent.
At this, with when the identical lamp of spectral characteristic is provided with optical filter, carry out the determination test of illumination in the situation of using two kinds of different lamps of spectral characteristic.Concrete, in the test of using two kinds of different lamps of spectral characteristic, when using 4 first lamps, when using strong 4 second lamps of this first lamp of strength ratio of short wavelength side, and when using 2 first lamps and 2 second lamps, illumination is measured.In addition, in the test that optical filter is set, use 4 second lamps, when optical filter not being installed, when optical filter is installed on 2 each lamps, and when being installed on optical filter on 4 each lamps, illumination is measured.Result when using two kinds of lamps is shown in table 1, and the result when optical filter is set is shown in table 2.
Moreover; As employed illuminometer in this test; Use the ultraviolet integrating quantometer UIT-250 that USHIO Electric Co., Ltd makes and use 365nm to measure at light accepting part and use light-receiving device UVD-S313, measured i line (365nm) and the intensity of j line (313nm) in the plane of exposure central part of 200mm * 200mm at these light accepting parts with light-receiving device UVD-S365,313nm mensuration.
Its result is shown in table 1 and table 2.Can know: identical through changing the number of DUV optical filter with the situation of the kind that changes lamp, can change the intensity in each wavelength.
Table 1
Figure BPA00001462272600211
Table 2
As stated; Light irradiation apparatus for exposure apparatus 80 and exposure device PE as second embodiment; Comprise the light source portion 73 of predetermined quantity respectively and be used to support light source portion 73 that the light source portion 73 of predetermined quantity is made up of two kinds of different light source portion 73 of spectral characteristic so that the light of the light source portion 73 of predetermined quantity is injected into the fuse-box 81 on the plane of incidence of fly's-eye lens 74 with illuminating part 71 and reflective optics 72.Thus, can under the situation of not changing light source portion 73, freely set the intensity of each wavelength.Particularly, the spectral characteristic of each lamp 71 of the light source portion 73 of predetermined quantity is identical, and the light source portion 73 of predetermined quantity has constituted two kinds of different light source portion 73 of spectral characteristic through wavelength cut-off optical filter 186 is set on its part.Thus, can not change light source portion 73 and not use the intensity of freely setting each wavelength under the situation of the different light source portion of spectral characteristic.
In addition; When possessing a plurality of fuse-box 81, and then also possess supporting mass 82, this supporting mass 82 is equipped with a plurality of fuse-boxes 81; So that all the light of light source portion 73 is injected on the plane of incidence of fly's-eye lens 74; Thereby can carry out blocking management, the replacing time that shortens lamp 71 and the stop time of equipment to lamp 71, and can whole light source portion 73 be arranged on the single curved surface, and not need on the installing component of lamp 71, to carry out large curved surface processing.
And then; According to the control method of the light irradiation apparatus for exposure apparatus of this embodiment with and exposure method; Light irradiation device 80 possesses above-mentioned light source portion 73, a plurality of fuse-box 81 and supporting mass 82; In addition, light irradiation device 80 also possesses the downstream that is arranged on fly's-eye lens 74, is used to measure the illuminometer 79 corresponding to the illumination of each wavelength; Be used to control lighting and extinguishing and the optics control part 76 of illumination of each lamp 71.And, the illumination that optics control part 76 is measured based on illuminometer 79 corresponding to each wavelength, each light source portion 73 in the control fuse-box 81, thus obtain the expectation illumination in the predetermined wavelength.Thus, light, can freely set the intensity in the necessary wavelength components of exposure, can prolong the life-span of lamp 71 through making necessary lamp 71.
Moreover; In the above-described embodiment; Though use a kind of wavelength cut-off optical filter 186 to constitute two kinds of different light source portion 73A of spectral characteristics and 73B; But also can shown in Figure 19 (a) and Figure 19 (b), use two kinds of wavelength cut-off optical filter 186a, 186b to constitute different three kinds of light source portion 73A1,73A2, the 73B of spectral characteristic.For example, can be shown in Figure 19 (a), make three kinds of light source portion 73A1,73A2,73B according to 8: 8: 8 composition of proportions, also can be shown in Figure 19 (b), according to 10: 10: 4 composition of proportions.Under these situation, three kinds of light source portion 73A1,73A2,73B are constituted with point-symmetric mode, and, when the lamp 71 of Figure 19 (a) being extinguished, shown in the lattice portion of Figure 19 (c) is divided, extinguish with point-symmetric mode and to get final product through optics control part 76.
The 3rd embodiment
Below, with reference to Figure 20～Figure 25 to related the describing of the 3rd embodiment of the present invention near scanning-exposure apparatus.
Shown in figure 23, near scanning-exposure apparatus 200 on one side near mask M, on one side the substrate W of the essentially rectangular carried of subtend predetermined direction, via a plurality of mask M that are formed with pattern P, irradiation exposure light L is transferred to the pattern P exposure on the substrate W.That is, this exposure device 200 adopts on one side substrate W is relatively moved with respect to a plurality of mask M, Yi Bian the scan exposure mode of the transfer printing that makes public.In addition, employed means of mask dimensions is set at 350mm * 250mm in this embodiment, and the directions X length of pattern P is corresponding to the length of the directions X of effective exposure area.
Like Figure 20 and shown in Figure 21, possess near scanning-exposure apparatus 200: substrate carrying mechanism 120, it floats substrate W and is supported, and substrate W is carried to predetermined direction (being directions X in the drawings); Mask holding mechanism 170, it has and keeps a plurality of mask M respectively, and the edge is configured to the staggered a plurality of mask maintaining parts 171 of two row with the direction (being the Y direction in the drawings) that predetermined direction intersects; A plurality of irradiating part 180, it is disposed at the top of a plurality of mask maintaining parts 171 respectively, as the lamp optical system of irradiation exposure light L; A plurality of shades 190, it is configured in respectively between a plurality of irradiating part 180 and a plurality of mask maintaining part 171, covers the exposure light L that penetrates from irradiating part 180.
These substrate carrying mechanisms 120, mask holding mechanism 170, a plurality of irradiating part 180 and shade 190 are configured in through horizontal block (not shown) and are arranged on the ground device pedestal 201.At this; Shown in figure 21; The zone that disposes mask holding mechanism 170 in the zone with substrate carrying mechanism 120 conveying substrate W, up is called mask configuration area E A; To be called substrate with respect to the zone of the upstream side of mask configuration area E A and send into regions IA, will be called substrate with respect to the zone in the downstream of exposure area EA and see regions OA off.
Substrate carrying mechanism 120 possesses: send into framework 105, its horizontal block through other (not shown) is arranged on the device pedestal 201; Accurate framework 106; Float unit 121, it is disposed at sees off on the framework 107, as utilizing air that substrate W is floated the substrate supported maintaining part; And substrate drive unit 140, it is floating the Y direction side of unit 121, is configured in also to be arranged on the framework 109 on the device pedestal 201 through other horizontal block 108, controls substrate W, simultaneously substrate W is carried to directions X.
Shown in figure 22; Floating unit 121 possesses: a plurality of exhaust air cushions 123 (with reference to Figure 21) of strip, 124 and a plurality of suction and discharge air cushion 125a, the 125b of strip, and it is installed on the lower surface respectively from a plurality of connecting rods 122 of sending into the upper surface of seeing framework 105,106 and accurate framework 107 off and extending to the top; Exhaust system 130 and the exhaust of discharging air from a plurality of vent ports of being formed at each air cushion 123,124,125a, 125b 126 are with pump 131; Be used for from the suction system 132 that is formed at last air admission hole 127 suction airs of suction and discharge air cushion 125a, 125b and air-breathing with pump 133.
In addition; Suction and discharge air cushion 125a, 125b have a plurality of vent ports 126 and a plurality of air admission hole 127; Can balance adjust air cushion 125a, the supporting surface 134 of 125b and the air pressure between the substrate W; And can set the predetermined amount of floating accurately for, thus can horizontal support on stable height.
Shown in figure 21, substrate drive unit 140 possesses: control parts 141 through what vacuum attraction was controlled substrate W; Control the linear guides 142 of parts 141 along the directions X guiding; Drive the driving motor 143 and the ball screw framework 144 of controlling parts 141 along directions X; A plurality of workpiece collisions prevent roller 145; Its mode to give prominence to from the upper surface of framework 109; Be installed on substrate and send into the side of the framework 109 of area I A, can move and rotate freely to the Z direction, and be used to support the lower surface of wait to mask holding mechanism 170 substrate conveying W.
In addition, substrate carrying mechanism 120 has: be located at the base plate alignment mechanism 160 that substrate is sent into regions IA and the substrate W that sends into regions IA standby at this substrate is carried out the substrate prealignment mechanism 150 of prealignment, substrate W is aimed at.
Like Figure 21 and shown in Figure 22, mask holding mechanism 170 has above-mentioned a plurality of mask maintaining parts 171 and a plurality of mask drive divisions 172; These a plurality of mask drive divisions 172 are located on each mask maintaining part 171, and with mask maintaining part 171 along X, Y, Z, θ direction, be predetermined direction, crisscross, with respect to by predetermined direction and the vertical direction of the crisscross surface level that constitutes; And drive around the normal of this surface level.
A plurality of mask maintaining parts 171 along interconnected one-tenth two row of Y direction; By a plurality of upstream side mask maintaining part 171a that are configured in upstream side (in this embodiment; Be 6) and a plurality of downstream mask maintaining part 171b of being configured in the downstream (in this embodiment; Be 6) constitute; Between the post portion 112 (with reference to Figure 20) of standing the Y direction both sides of being located at device pedestal 201, be supported in respectively on the main frame 113 through mask drive division 172, this main frame 113 has respectively set up two at upstream side and downstream.Each mask maintaining part 171 has the opening 177 that connects along the Z direction, and vacuum suction has mask M on its circumference lower surface.
Mask drive division 172 has: the directions X drive division 173 that is installed on main frame 113 and moves along directions X; The Z direction drive division 174 that is installed on the front end of directions X drive division and on the Z direction, drives; The Y direction drive division 175 that is installed on Z direction drive division 174 and on the Y direction, drives; And the θ direction drive division 176 that is installed on Y direction drive division 175 and drives along the θ direction, at the front end of θ direction drive division 176 mask maintaining part 171 is installed.
Like Figure 24 and shown in Figure 25; A plurality of irradiating part 180 possess in framework 181: control with shutter 78 with light irradiation device 80A, fly's-eye lens 74, optics control part 76, concave mirror 77 and the exposure of the identical formation of the 1st embodiment; And, also possess and be disposed at light source portion 73A and exposure control with the level crossing between the shutter 78 and between fly's-eye lens 74 and the concave mirror 77 280,281,282.In addition, also can be on concave mirror 77 or level crossing 282 as refrative mirror, setting can be changed the position angle correcting device of the curvature of mirror with manual or automatic mode.
Light irradiation device 80A comprises extra-high-pressure mercury vapour lamp 71 and catoptron 72 respectively, for example, has linearity and is arranged with 3 and comprises 4 and establish the supporting mass 82A of fuse-box 81A of 8 light source portion 73 of layer, 2 row.Identical with the 1st embodiment, fuse-box 81A is through being installed in lamp fixed cover 84 positioned light source portion 73 on the light source support 83 that supports 8 light source portion 73, so that inject in the fly's-eye lens 74 from 70%～100% light of the exposure of each light source portion 73.In addition,, each fuse-box 81A locatees each fuse-box 81A on a plurality of fuse-box installation portions 90 of supporting mass 82A, so that inject in the fly's-eye lens 74 from 70%～100% light of the exposure of each light source portion 73 through being installed.
Between the bottom of the light source support 83 of frame shape and lamp fixed cover 84, be provided with the optical axis angle governor motion 99 that bolt 97, nut 97b and motor 98 by strip constitute.In addition, identical with first embodiment, be connected with control device 102 through electric wire 103 with optical axis angle governor motion 99 with the optical detection device 101 that fly's-eye lens 74 is adjacent to be provided with.
Shown in figure 22, a plurality of shades 190 have the window shutter parts 208,209 of the pair of plate-shaped that is used to change the angle of inclination, through the angle of inclination of a pair of window shutter parts 208,209 of window shutter driver element 192 changes.Thus, near the mask M that keeps by mask maintaining part 171, cover the exposure light L that penetrates by irradiating part 180, and can change the predetermined direction shading amplitude of blocking exposure light L, can change the projected area of observing from the Z direction.
In addition; On near scanning-exposure apparatus 200, mask converter 220 is set; The a pair of mask bracket part 221 of this mask converter 220 through will keeping mask M drives to the Y direction, changes to remain on upstream side and downstream mask maintaining part 171a, the last mask M of 171b, is provided with mask prealignment mechanism 240 simultaneously; This mask prealignment mechanism 240 is before changing mask; Compress the mask M that is floated support with respect to mask bracket part 121 on one side,, carry out prealignment on one side with register pin (not shown) and mask M butt.
In addition, shown in figure 22, dispose near scanning-exposure apparatus 200 laser extensometer 260, mask registration with camera (not shown), follow the trail of with camera (not shown) and follow the trail of with the various pick-up units such as 273 that throw light on.
Then, utilize as above constitute near scanning-exposure apparatus 200, the exposure transfer printing of substrate W is described.In addition, in this embodiment, the situation of the color filter substrate W that describes base pattern (for example Prague matrix) being described any pattern among R (red), G (green), the B (indigo plant) will be described.
Be used to air near scanning-exposure apparatus 200 from exhaust air cushion 123; To be transported to substrate by not shown loader etc. moves into the substrate W of area I A and floats and support; And carried out prealignment operation and the alignment function of substrate W, use the parts 141 of controlling of substrate drive unit 140 that jammed substrate W is carried to mask configuration area E A thereafter.
Through the drive motor 143 that make substrate drive unit 140 drive, and substrate W along the line property guide rail 142 on directions X moved thereafter.Substrate W at the exhaust air cushion 124 of being located at mask configuration area E A and suction and discharge air cushion 125a, 125b is last moves, the state of doing one's utmost to have eliminated vibrations down quilt floated support.And when penetrating exposure light L by the light source in the irradiating part 180, the mask M of exposure light L through being kept by mask maintaining part 171 is needed on pattern exposure on the substrate W.
In addition; This exposure device 200 has camera (not shown) and the laser extensometer 260 of following the trail of usefulness, therefore in exposure actions, detects the relative position deviation of mask M and substrate W; Drive mask drive division 172 based on detected relative position deviation, make substrate W follow the position of mask M in real time.Simultaneously, detect the gap between mask M and the substrate W, based on detected gap drive mask drive division 172, the gap between real-time mask correction M and the substrate W.
Same as described above, through continuous exposure, can carry out the exposure of pattern to substrate W integral body.The mask M that is kept by mask maintaining part 171 is configured to staggered opposed shape, therefore, even the mask M that mask maintaining part 171a, 171b in upstream side or downstream are kept is spaced, also can on substrate W, seamlessly form pattern.
In addition, when substrate W cuts out a plurality of panel, with the adjacent corresponding each other zone of panel form the territory, non-exposed area of not shining exposure light L.Therefore, in exposure actions, open and close a pair of window shutter parts 208,209, cooperate the transporting velocity of substrate W, on the direction identical, move window shutter parts 208,209, so that window shutter parts 208,209 are positioned at the territory, non-exposed area with the throughput direction of substrate W.
In the exposure actions of this embodiment; 95,96 at two electrodes to extra-high-pressure mercury vapour lamp 71 provide big electric current; Therefore along with the increase of service time, electrode 95,96 evaporates and the diffusion of generation light, but identical with first embodiment; Diffusion with optical detection device 101 detection light makes the optical axis L A of each light source portion 73 regulate optical axis angle towards the inboard through optical axis angle governor motion 99.
Therefore; As this embodiment near scanning-exposure apparatus in; Detect the diffusion of the light that produces along with the increase of the irradiation time of each light source portion 73 with optical detection device 101; Revise by the diffusion of 99 pairs of detected light of optical axis angle governor motion through control light irradiation device 80, can make from the light of 70～100% exposure of each light source portion 73 and inject reliably in the fly's-eye lens 74, can suppress illumination decrease.
The 4th embodiment
Below, with reference to Figure 26～Figure 27 to related the describing of the 4th embodiment of the present invention near scanning-exposure apparatus.In addition, because this embodiment identical with the basic comprising near scanning-exposure apparatus of the 3rd embodiment, for the identical symbol of identical part mark and omit its explanation, and different portions is elaborated near scanning-exposure apparatus.
Shown in figure 26; This embodiment near scanning-exposure apparatus 200; In the framework 181 of a plurality of irradiating part 180; Opening 77a is formed on the part of concave mirror 77, at the rear of opening 77a, is provided with each illuminometer 79 of the illumination of each wavelength that is used to measure g line, h line, i line, j line and k line etc.In addition, among Figure 26, the bright lamp power supply of symbol 195 expressions, symbol 196 expression control circuits.
Light irradiation device 80A comprises extra-high-pressure mercury vapour lamp 71 and catoptron 72 respectively, for example, has linearity and is arranged with 3 supporting mass 82A that comprise the fuse-box 81 of 6 layer of 4 24 light source portion 73 that are listed as.Identical with the 1st embodiment, in the fuse-box 81, through fuse-box fixed cover 84 being installed in positioned light source portion 73 on the light source support 83 that supports 24 light source portion 73, so that inject fly's-eye lens 74 from 70%～100% light of the exposure of each light source portion 73.In addition,, each fuse-box 81A locatees each fuse-box 81A on supporting mass 82A, so that inject fly's-eye lens 74 from 70%～100% light of the exposure of each light source portion 73 through being installed.
In addition; Among the light irradiation device 80A of this embodiment; Each illuminating part 71 spectral characteristic of the light source portion 73 of predetermined quantity are identical, and the light source portion 73 of predetermined quantity constitutes two kinds of different light source portion 73 of spectral characteristic through wavelength cut-off optical filter 186 is set in its part.
Therefore, as this embodiment near scanning-exposure apparatus 200 in, possess: the light source portion 73 of predetermined quantity, it comprises illuminating part 71 and reflective optics 72; Be used to support the fuse-box 81 of light source portion 73, so that the light of the light source portion of predetermined quantity 73 is injected the plane of incidence of fly's-eye lens 74.Each lamp 71 spectral characteristic of the light source portion 73 of predetermined quantity are identical, and the light source portion 73 of predetermined quantity constitutes two kinds of different light source portion 73 of spectral characteristic through wavelength cut-off optical filter 186 is set in its part.Thus, can not change lamp 71, not use the intensity of freely setting each wavelength under the situation of the different light source portion of spectral characteristic.
In addition, the present invention is not limited in above-mentioned embodiment, can carry out suitable distortion, improvement etc.For example in the above-described embodiment; As exposure device; Be illustrated near exposure device near exposure device and scan-type cutting apart one by one, but be not limited in this, the present invention also can be applied in mirror surface projection formula exposure device, lens projection exposure device, the closed jointing exposure device.In addition, the present invention also can be applicable in the lump formula, any exposure method such as formula, scan-type one by one.
The present invention is based on the Japanese patent application 2010-191288 of the Japanese patent application 2010-165163 of application on July 22nd, 2010, application on August 27th, 2010 and the Japanese patent application 2011-154669 of application on July 13rd, 2011, by reference its content is enrolled in this instructions.

Claims (8)

1. light irradiation apparatus for exposure apparatus is characterized in that possessing:
A plurality of light source portion comprise illuminating part respectively and make the light that sends from this illuminating part have the reflective optics that directivity ground penetrates;
A plurality of fuse-boxes have the light source support that supports said light source portion respectively, so that the light of the said light source portion of predetermined quantity is injected into the plane of incidence of fly's-eye lens;
Supporting mass has a plurality of fuse-box installation portions that are respectively applied for the said a plurality of fuse-boxes of installation, so that the light of whole said light source portion is injected into the plane of incidence of fly's-eye lens; And
The optical axis angle governor motion can be regulated the optical axis angle with respect to said fly's-eye lens of said each light source portion, to revise the diffusion of the said light that produces along with the increase of the irradiation time of said each light source portion.
2. light irradiation apparatus for exposure apparatus according to claim 1 is characterized in that,
The light source portion of said predetermined quantity is made up of the different multiple light source portion of spectral characteristic.
3. light irradiation apparatus for exposure apparatus according to claim 2 is characterized in that,
The spectral characteristic of each illuminating part of the light source portion of said predetermined quantity is identical,
Through on the part of the light source portion of said predetermined quantity, optical filter being set, constitute the different said multiple light source portion of spectral characteristic.
4. exposure device is characterized in that possessing:
The substrate maintaining part is used to keep conduct by the substrate of exposing material;
The mask maintaining part is to keep mask with the opposed mode of said substrate; And
Lamp optical system has each described light irradiation device and fly's-eye lens in the claim 1 to 3, and the light that is penetrated by a plurality of light source portion of this light irradiation device is injected into this fly's-eye lens,
Light from said lamp optical system shines to said substrate via said mask.
5. the control method of a light irradiation apparatus for exposure apparatus, this light irradiation apparatus for exposure apparatus possesses:
A plurality of light source portion comprise illuminating part respectively and make the light that sends from this illuminating part have the reflective optics that directivity ground penetrates;
A plurality of fuse-boxes have the light source support that supports said light source portion respectively, so that the light of the said light source portion of predetermined quantity is injected into the plane of incidence of fly's-eye lens;
Supporting mass has a plurality of fuse-box installation portions that are respectively applied for the said a plurality of fuse-boxes of installation, so that the light of whole said light source portion is injected into the plane of incidence of fly's-eye lens; And
The optical axis angle governor motion can be regulated the optical axis angle with respect to said fly's-eye lens of said each light source portion, revising the diffusion of the said light that produces along with the increase of the irradiation time of said each light source portion,
Said control method comprises:
Be used to detect along with the increase of the irradiation time of said each light source portion and the operation of the diffusion of the said light that produces and
Operation by the diffusion of the said light of said optical axis angle governor motion correction.
6. the control method of light irradiation apparatus for exposure apparatus according to claim 5 is characterized in that, also comprises:
Illuminometer is arranged at the downstream of said fly's-eye lens, is used for measuring and the corresponding illumination of each wavelength; With
Control part is used to control lighting, extinguish and illumination of said each illuminating part,
The light source portion of said predetermined quantity is made up of the different multiple light source portion of spectral characteristic,
Said control part is controlled each light source portion in the said fuse-box based on the illumination of being measured by said illuminometer corresponding to each wavelength, in presetted wavelength, to obtain the illumination of expectation.
7. the control method of light irradiation apparatus for exposure apparatus according to claim 6 is characterized in that,
The spectral characteristic of each illuminating part of the light source portion of said predetermined quantity is identical,
Through on the part of the light source portion of said predetermined quantity, optical filter being set, constitute the different said multiple light source portion of spectral characteristic.
8. exposure method is characterized in that possessing:
The substrate maintaining part is used to keep conduct by the substrate of exposing material;
The mask maintaining part is to keep mask with the opposed mode of said substrate;
Lamp optical system has each described light irradiation device and fly's-eye lens in the claim 5 to 7, and the light that is penetrated by a plurality of light source portion of this light irradiation device is injected into this fly's-eye lens,
In implementing claim 5 to 7 in the control method of each described light irradiation device; Feasible light from said lamp optical system shines on the said substrate via said mask, being transferred on the said substrate at the pattern exposure that forms on the said mask.
CN201180001999.6A 2010-07-22 2011-07-20 Light irradiation device for exposure apparatus, method for controlling light irradiation device, exposure apparatus, and exposure method Expired - Fee Related CN102483587B (en)

Applications Claiming Priority (7)

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JP2010165163 2010-07-22
JP2010-165163 2010-07-22
JP2010-191288 2010-08-27
JP2010191288 2010-08-27
JP2011-154669 2011-07-13
JP2011154669A JP5799306B2 (en) 2010-07-22 2011-07-13 Method of controlling light irradiation apparatus for exposure apparatus and exposure method
PCT/JP2011/066467 WO2012011497A1 (en) 2010-07-22 2011-07-20 Light irradiation device for exposure apparatus, method for controlling light irradiation device, exposure apparatus, and exposure method

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CN102483587B (en) 2014-11-05

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