WO2012011497A1 - Light irradiation device for exposure apparatus, method for controlling light irradiation device, exposure apparatus, and exposure method - Google Patents

Abstract

Provided are: a light irradiation device for an exposure apparatus, wherein luminance decrease over irradiation time of a light source unit can be suppressed; a method for controlling a light irradiation device; an exposure apparatus; and an exposure method. The light irradiation device for an exposure apparatus comprises: a plurality of light source units (73), each of which contains a light emitting unit (71) and a reflective optical system (72); a plurality of cassettes (81), each of which supports a predetermined number of light source units (73) with light source supporting parts (83) so that light from the light source units (73) is incident on the incident surface of an integrator lens (74); a supporting body (82) which comprises a plurality of cassette fitting parts (90) that fit the plurality of cassettes (81) so that light from all of the light source units (73) is incident on the incident surface of the integrator lens (74); and an optical axis angle adjustment mechanism (99) which is capable of adjusting the angle of the optical axis of each light source unit (73).

Description

Light irradiation apparatus for exposure apparatus, control method for light irradiation apparatus, exposure apparatus and exposure method

The present invention relates to a light irradiation apparatus for an exposure apparatus, a control method for the light irradiation apparatus, an exposure apparatus, and an exposure method, and more particularly, a mask pattern of a mask on a substrate of a large flat panel display such as a liquid crystal display or a plasma display. The present invention relates to a light irradiation apparatus for an exposure apparatus, a method for controlling the light irradiation apparatus, an exposure apparatus, and an exposure method that can be applied to an exposure apparatus that performs exposure transfer.

Conventionally, various exposure apparatuses such as a proximity exposure apparatus, a scan exposure apparatus, a projection exposure apparatus, a mirror projection, and a contact type exposure apparatus have been devised as apparatuses for manufacturing a panel such as a color filter of a flat panel display apparatus. For example, in the division sequential proximity exposure apparatus, a mask smaller than the substrate is held on the mask stage, the substrate is held on the work stage and both are placed close to each other, and then the work stage is moved stepwise relative to the mask. By irradiating the substrate with light for pattern exposure from the mask side at each step, a plurality of patterns drawn on the mask are exposed and transferred onto the substrate to produce a plurality of panels on one substrate. In the scanning exposure apparatus, exposure light is irradiated through a mask onto a substrate being conveyed at a constant speed, and a mask pattern is exposed and transferred onto the substrate.

In recent years, display devices are gradually becoming larger. For example, in the case of manufacturing an eighth generation panel (2200 mm × 2500 mm) with four exposure shots in divided sequential exposure, one exposure area is 1300 mm × 1120 mm. Thus, in the case of manufacturing with six exposure shots, one exposure area is 1100 mm × 750 mm. Therefore, the exposure apparatus is also required to expand the exposure area, and it is necessary to increase the output of the light source used. For this reason, an illumination optical system that uses a plurality of light sources to increase the output of the entire light source is known (see, for example, Patent Documents 1, 2, and 3).

In the exposure illumination device described in Patent Document 1, the size of the region where the divergent light emitted from the light source unit is incident on the incident surface is made smaller than the incident surface, and all of the diverged light is incident on the incident surface. In this way, effective use of light emitted from the light source unit is achieved. Moreover, the light irradiation apparatus described in Patent Document 2 is provided with an isolation wall that blocks light between adjacent light sources, prevents light irradiation from adjacent light sources, and prevents the problem of the light source unit due to heating or the like. It has been solved. Furthermore, in the light irradiation device described in Patent Document 3, two sets of light source units in which a plurality of light source units are arranged in a staggered manner are spaced apart in the front-rear direction so as to have a gap between the light source units. It is designed to cool efficiently. In addition, in the light irradiation device described in Patent Document 4, when a light-shielding unit is provided to block the light from the light source and narrow the collection angle of the light incident on the integrator lens, and an integrator lens with a narrow irradiation area is used. A light shielding means is inserted into the optical path.

Japanese Patent No. 4391136 Japanese Unexamined Patent Publication No. 2006-324435 Japanese Unexamined Patent Publication No. 2007-115817 Japanese Unexamined Patent Publication No. 2005-292316

Generally, as a light source unit for an exposure apparatus, an ultra-high pressure mercury lamp whose electrode is made of tungsten is used. As shown in FIG. 28A, in the light irradiation apparatus 1 for an exposure apparatus, the plurality of ultrahigh pressure mercury lamps 2 are curved so that all the light L from the plurality of ultrahigh pressure mercury lamps 2 enters the integrator 3. Are arranged in a substantially arc shape. The light emitted from the ultra-high pressure mercury lamp 2 generally has a light divergence angle of about 2 ° even when the ultra-high pressure mercury lamp 2 is not used. When a large current is supplied to the electrodes, the tungsten electrodes gradually evaporate in the bulb of the light source as the usage time elapses, the distance between the electrodes increases, and the base point of the light source increases, resulting in FIG. 28 (b). As shown, the light irradiation angle extends to, for example, 2.2 °.

In this case, if the distance from the ultra-high pressure mercury lamp 2 to the integrator 3 is 4 m, for example, the change in the irradiation angle of 0.2 ° is usually an irradiation range of about 100 to 200 mm at the irradiation position (incident surface of the integrator). This corresponds to an expansion of the irradiation range of about 14 mm with respect to the size of the integrator 3. For this reason, a part of the light from the ultra-high pressure mercury lamp 2 is lost without entering the integrator 3, thereby causing a problem that the illuminance is lowered. The technologies disclosed in Patent Documents 1 to 4 aim at effective use of light by setting the light incident area to the integrator and taking measures against heat of the light source unit, both of which are caused by the above-mentioned consumption of the electrodes. There was no room for improvement because the spread of light was not taken into consideration.

The present invention has been made in view of the above-described problems, and an object of the present invention is to provide a light irradiation apparatus for an exposure apparatus and a control method for the light irradiation apparatus that can suppress a decrease in illuminance with the lapse of irradiation time of the light source unit. An exposure apparatus and an exposure method are provided.

The above object of the present invention can be achieved by the following constitution.
(1) a plurality of light source units each including a light emitting unit and a reflective optical system that emits light having directivity emitted from the light emitting unit;
A plurality of cassettes each having a light source support part for supporting the light source part so that the light of the predetermined number of light source parts is incident on an incident surface of the integrator lens;
A support body having a plurality of cassette mounting portions to which the plurality of cassettes are respectively mounted so that light of all the light source portions is incident on an incident surface of the integrator lens;
An optical axis angle adjustment mechanism capable of adjusting an optical axis angle of each light source unit with respect to the integrator lens so as to correct the diffusion of the light that occurs as the irradiation time of each light source unit elapses. A light irradiation apparatus for an exposure apparatus.
(2) The light irradiation apparatus for an exposure apparatus according to (1), wherein the predetermined number of light source units includes a plurality of types of light source units having different spectral characteristics.
(3) The light emitting units of the predetermined number of light source units have the same spectral characteristics,
The predetermined number of light source units constitute a plurality of types of light source units having different spectral characteristics by disposing a wavelength cut filter in a part of the predetermined number of light source units. .
(4) a substrate holding unit for holding a substrate as an exposed material;
A mask holding unit for holding a mask so as to face the substrate;
(1) to (3) an illumination optical system having the light irradiation device according to any one of the above, and an integrator lens to which light emitted from a plurality of light source units of the light irradiation device is incident;
With
An exposure apparatus that irradiates the substrate with light from the illumination optical system through the mask.
(5) a plurality of light source units each including a light emitting unit and a reflective optical system that emits light with directivity emitted from the light emitting unit;
A plurality of cassettes each having a light source support part for supporting the light source part so that the light of the predetermined number of light source parts is incident on an incident surface of the integrator lens;
A support body having a plurality of cassette mounting portions to which the plurality of cassettes are respectively mounted so that light of all the light source portions is incident on an incident surface of the integrator lens;
An exposure apparatus comprising: an optical axis angle adjustment mechanism capable of adjusting an optical axis angle of each light source unit with respect to the integrator lens so as to correct the diffusion of the light that occurs as the irradiation time of each light source unit elapses. A method for controlling a light irradiation device for a vehicle,
Detecting the diffusion of the light that occurs with the lapse of the irradiation time of each light source unit;
Correcting the diffusion of the light by the optical axis angle adjusting mechanism;
A method of controlling a light irradiation apparatus for an exposure apparatus, comprising:
(6) An illuminometer that is disposed downstream of the integrator lens and measures illuminance corresponding to each wavelength;
A control unit for controlling lighting and extinction of each light emitting unit and illuminance;
Further comprising
The predetermined number of light source units is constituted by a plurality of types of light source units having different spectral characteristics,
The control unit controls each light source unit in the cassette so that desired illuminance can be obtained at a predetermined wavelength based on illuminance corresponding to each wavelength measured by the illuminometer. (5) The control method of the light irradiation apparatus for exposure apparatuses as described in (5).
(7) The light emitting units of the predetermined number of light source units have the same spectral characteristics,
The predetermined number of light source units constitute a plurality of types of light source units having different spectral characteristics by disposing a wavelength cut filter in a part of the predetermined number of light source units. Control method.
(8) a substrate holding unit for holding a substrate as an exposed material;
A mask holding unit for holding a mask so as to face the substrate;
(5) to (7) the light irradiation device according to any one of the above, and an illumination optical system having an integrator lens into which light emitted from a plurality of light source units of the light irradiation device is incident,
With
(5) to (7), while performing the method of controlling the light irradiation apparatus according to any one of the above, the light from the illumination optical system is irradiated to the substrate through the mask, and the mask An exposure method comprising exposing and transferring a pattern formed on the substrate to the substrate.

According to the light irradiation apparatus for an exposure apparatus of the present invention, a plurality of light source parts including a light emitting part and a reflection optical system, a plurality of cassettes having a light source support part for supporting a predetermined number of light source parts, and a plurality of cassettes are attached. Optical axis angle adjustment that can adjust the optical axis angle with respect to the integrator lens of each light source unit so as to correct the diffusion of light that occurs as the irradiation time of each light source unit elapses and the support body having a plurality of cassette mounting parts Even if light diffusion occurs as the irradiation time of the light source unit elapses, the light is adjusted by the optical axis angle adjusting mechanism to correct the amount of light from 70 to 100% from each light source unit. Can be made incident on the integrator lens, whereby a decrease in illuminance with the lapse of irradiation time can be suppressed, and stable illuminance can be obtained over a long period of time.

Further, according to the method of controlling a light irradiation apparatus for an exposure apparatus of the present invention, the diffusion of light that occurs as the irradiation time of each light source unit elapses is detected, and the detected light is diffused by the optical axis angle adjustment mechanism. Therefore, 70-100% of the light from each light source unit can be incident on the integrator lens with certainty, and the illuminance decrease with the lapse of the irradiation time can be suppressed. And stable illuminance can be obtained.

Furthermore, according to the exposure apparatus and the exposure method of the present invention, the pattern formed on the mask is exposed and transferred onto the substrate using the above-described light irradiation apparatus for exposure apparatus and the control method thereof. Exposure can be performed with exposure light having a stable illuminance, and the product quality can be improved by performing exposure with high accuracy.

It is a partial exploded perspective view for demonstrating the division | segmentation successive proximity exposure apparatus which concerns on 1st Embodiment of this invention. It is a front view of the division | segmentation successive proximity exposure apparatus shown in FIG. It is sectional drawing of a mask stage. (A) is a front view showing a light irradiation device, (b) is a sectional view taken along line IV-IV in (a), and (c) is a sectional view taken along line IV′-IV ′ in (a). is there It is an expanded sectional view of the light source part vicinity attached to the cassette. It is a principal part enlarged view which shows the state in which the cassette was attached to the support body. (A)-(d) is a front view which respectively shows the shape of the opening part of a reflective mirror. It is the schematic which shows the distance from the output surface of each light source part to the entrance surface of an integrator lens. It is sectional drawing which shows the example which mounts a support body to a light illuminating device. It is sectional drawing which shows the example at the time of attaching a cassette to a cassette attachment part. It is a figure which shows the modification of the cassette fixing means for attaching a cassette to a support body, (a) is a perspective view, (b) is a top view, (c) is XI-XI of (b). It is sectional drawing along a line. It is a figure which shows the other modification of the cassette fixing means for attaching a cassette to a support body. It is a figure which shows the further another modification of the cassette fixing means for attaching a cassette to a support body. (A) is a perspective view which shows the other modification of the cassette fixing means for attaching a cassette to a support body, (b) is sectional drawing which shows the state with which the cassette was attached to the support body. (A) is a perspective view which shows the other modification of the cassette fixing means for attaching a cassette to a support body, (b) is sectional drawing which shows the state with which the cassette was attached to the support body. It is a front view of the division | segmentation successive proximity exposure apparatus which concerns on 2nd Embodiment. (A) is a front view which shows a light irradiation apparatus, (b) is sectional drawing along the XVII-XVII line of (a). (A) is a front view which shows a cassette, (b) is a side view of (a), (c) is a bottom view of (a). (A) is a front view which shows the cassette of the light irradiation apparatus which concerns on the modification of 2nd Embodiment, (b) is a front view which shows the cassette of the light irradiation apparatus which concerns on another modification, (c) These are figures which show the case where the light source part of the light irradiation apparatus of (a) is partially extinguished. It is a whole perspective view of the proximity scan exposure apparatus which concerns on 3rd Embodiment of this invention. It is a top view which shows a proximity | contact scanning exposure apparatus in the state which removed upper structures, such as an irradiation part. It is a side view which shows the exposure state in the mask arrangement | positioning area | region of a proximity scan exposure apparatus. (A) is a principal part top view for demonstrating the positional relationship of a mask and an air pad, (b) is the sectional drawing. It is a figure for demonstrating the irradiation part of a proximity scan exposure apparatus. (A) is a front view showing the light irradiation device of FIG. 24, and (b) is a cross-sectional view taken along line XXV-XXV of (a). It is a figure for demonstrating the irradiation part of the proximity scan exposure apparatus which concerns on 4th Embodiment of this invention. (A) is a front view showing the light irradiation device of FIG. 26, and (b) is a cross-sectional view taken along line XXVII-XXVII in (a). (A) And (b) is the schematic of the conventional light irradiation apparatus which shows the state from which the diffused light remove | deviated from an integrator lens.

Hereinafter, embodiments of a light irradiation apparatus for an exposure apparatus according to the present invention and an exposure apparatus and an exposure method using the light irradiation apparatus will be described in detail with reference to the drawings.

(First embodiment)
As shown in FIGS. 1 and 2, the division sequential proximity exposure apparatus PE of the present embodiment includes a mask stage 10 that holds a mask M, a substrate stage 20 that holds a glass substrate (material to be exposed) W, and pattern exposure. And an illumination optical system 70 for irradiating light.

A glass substrate W (hereinafter simply referred to as “substrate W”) is disposed to face the mask M, and a surface (on the opposite surface side of the mask M) for exposing and transferring a pattern drawn on the mask M. A photosensitive agent is applied to the surface.

The mask stage 10 is a mask stage base 11 in which a rectangular opening 11a is formed at the center, and a mask holding part that is mounted on the opening 11a of the mask stage base 11 so as to be movable in the X axis, Y axis, and θ directions. A mask holding frame 12 and a mask driving mechanism 16 that is provided on the upper surface of the mask stage base 11 and adjusts the position of the mask M by moving the mask holding frame 12 in the X axis, Y axis, and θ directions. .

The mask stage base 11 is supported by a column 51 standing on the apparatus base 50 and a Z-axis moving device 52 provided at the upper end of the column 51 so as to be movable in the Z-axis direction (see FIG. 2). It is arranged above the stage 20.

As shown in FIG. 3, a plurality of planar bearings 13 are arranged on the upper surface of the peripheral edge of the opening 11a of the mask stage base 11, and the mask holding frame 12 has a flange 12a provided at the outer peripheral edge of the upper end. It is mounted on the flat bearing 13. As a result, the mask holding frame 12 is inserted into the opening 11a of the mask stage base 11 through a predetermined gap, so that the mask holding frame 12 can move in the X axis, Y axis, and θ directions by the gap.

Further, a chuck portion 14 for holding the mask M is fixed to the lower surface of the mask holding frame 12 via a spacer 15. The chuck portion 14 is provided with a plurality of suction nozzles 14a for sucking the peripheral portion of the mask M on which the mask pattern is not drawn, and the mask M is not shown in the drawing through the suction nozzle 14a. It is detachably held on the chuck portion 14 by the apparatus. The chuck portion 14 can move in the X axis, Y axis, and θ directions with respect to the mask stage base 11 together with the mask holding frame 12.

The mask driving mechanism 16 includes two Y-axis direction driving devices 16y attached to one side along the X-axis direction of the mask holding frame 12, and one X-axis attached to one side along the Y-axis direction of the mask holding frame 12. Direction drive device 16x.

The Y-axis direction driving device 16y is installed on the mask stage base 11, and has a driving actuator (for example, an electric actuator) 16a having a rod 16b that expands and contracts in the Y-axis direction, and a pin support mechanism 16c at the tip of the rod 16b. And a guide rail 16e attached to a side portion of the mask holding frame 12 along the X-axis direction and movably attached to the slider 16d. The X-axis direction drive device 16x has the same configuration as the Y-axis direction drive device 16y.

In the mask drive mechanism 16, the mask holding frame 12 is moved in the X-axis direction by driving one X-axis direction drive device 16x, and the two Y-axis direction drive devices 16y are driven equally. The mask holding frame 12 is moved in the Y axis direction. In addition, the mask holding frame 12 is moved in the θ direction (rotated about the Z axis) by driving one of the two Y-axis direction driving devices 16y.

Further, on the upper surface of the mask stage base 11, as shown in FIG. 1, a gap sensor 17 for measuring a gap between the opposing surfaces of the mask M and the substrate W, and a mounting position of the mask M held by the chuck portion 14. And an alignment camera 18 for confirming the above. The gap sensor 17 and the alignment camera 18 are held so as to be movable in the X-axis and Y-axis directions via the moving mechanism 19 and are arranged in the mask holding frame 12.

On the mask holding frame 12, as shown in FIG. 1, aperture blades 38 are provided at both ends in the X-axis direction of the opening 11a of the mask stage base 11 to shield both ends of the mask M as necessary. It is done. The aperture blade 38 is movable in the X-axis direction by an aperture blade drive mechanism 39 including a motor, a ball screw, a linear guide, and the like, and adjusts the shielding area at both ends of the mask M. The aperture blades 38 are provided not only at both ends of the opening 11a in the X-axis direction but also at both ends of the opening 11a in the Y-axis direction.

As shown in FIGS. 1 and 2, the substrate stage 20 includes a substrate holding unit 21 that holds the substrate W, and a substrate that moves the substrate holding unit 21 in the X-axis, Y-axis, and Z-axis directions with respect to the apparatus base 50. Drive mechanism 22. The substrate holding unit 21 detachably holds the substrate W by a vacuum suction mechanism (not shown). The substrate drive mechanism 22 includes a Y-axis table 23, a Y-axis feed mechanism 24, an X-axis table 25, an X-axis feed mechanism 26, and a Z-tilt adjustment mechanism 27 below the substrate holder 21.

As shown in FIG. 2, the Y-axis feed mechanism 24 includes a linear guide 28 and a feed drive mechanism 29, and a slider 30 attached to the back surface of the Y-axis table 23 extends 2 on the apparatus base 50. The Y-axis table 23 is driven along the guide rail 31 by a motor 32 and a ball screw device 33 while straddling the guide rail 31 through a rolling element (not shown).

The X-axis feed mechanism 26 has the same configuration as the Y-axis feed mechanism 24, and drives the X-axis table 25 in the X direction with respect to the Y-axis table 23. The Z-tilt adjustment mechanism 27 has one movable wedge mechanism, which is a combination of the wedge-shaped moving bodies 34 and 35 and the feed drive mechanism 36, arranged at one end in the X direction and two at the other end. Consists of. The feed drive mechanisms 29 and 36 may be a combination of a motor and a ball screw device, or may be a linear motor having a stator and a mover. Further, the number of Z-tilt adjustment mechanisms 27 installed is arbitrary.

Thereby, the substrate driving mechanism 22 feeds and drives the substrate holding unit 21 in the X direction and the Y direction, and moves the substrate holding unit 21 to Z so as to finely adjust the gap between the opposing surfaces of the mask M and the substrate W. Fine movement and tilt adjustment in the axial direction.

Bar mirrors 61 and 62 are respectively attached to the X-direction side and Y-direction side of the substrate holding unit 21, and a total of three laser interferometers are installed at the Y-direction end and the X-direction end of the apparatus base 50. 63, 64, 65 are provided. As a result, the laser light is applied to the bar mirrors 61 and 62 from the laser interferometers 63, 64 and 65, the laser light reflected by the bar mirrors 61 and 62 is received, and the laser light and the laser reflected by the bar mirrors 61 and 62 are received. The position of the substrate stage 20 is detected by measuring interference with light.

As shown in FIGS. 2 and 4, the illumination optical system 70 includes a light irradiation device 80 including a plurality of light source units 73, an integrator lens 74 into which light beams emitted from the plurality of light source units 73 are incident, An optical control unit 76 that supplies a direct current with a regulated voltage to the lamp 71 of the light source unit 73, a concave mirror 77 that changes the direction of the optical path emitted from the exit surface of the integrator lens 74, a plurality of light source units 73, and an integrator lens And an exposure control shutter 78 that controls opening and closing so as to transmit and block the irradiated light. A DUV cut filter, a polarization filter, and a band pass filter may be disposed between the integrator lens 74 and the exposure surface. The concave mirror 77 has a mirror whose curvature can be changed manually or automatically. A clearance angle correction unit may be provided.

As shown in FIGS. 4 to 8, the light irradiation device 80 includes an ultra-high pressure mercury lamp 71 as a light emitting unit and a reflecting mirror as a reflecting optical system that emits light with directivity emitted from the lamp 71. 72, a plurality of light source units 73 including a plurality of light source units 73, a plurality of cassettes 81 to which a predetermined number of light source units 73 can be respectively mounted, and a support body 82 to which a plurality of cassettes 81 can be mounted. .

In the illumination optical system 70, when a 160 W ultrahigh pressure mercury lamp 71 is used, an exposure apparatus that manufactures a 6th generation flat panel has 374 light source units, and an exposure apparatus that manufactures a 7th generation flat panel. In an exposure apparatus that manufactures 572 light source units and 8th generation flat panels, 774 light source units are required. However, in this embodiment, in order to simplify the description, as shown in FIG. 4, a cassette 81 having a total of six light source sections 73 mounted in three rows in the α direction and two rows in the β direction is arranged in three rows. A description will be given assuming that there are 54 light source units 73 arranged in a total of 9 rows of 3 rows. The cassette 81 and the support 82 may have a square shape with the same number of light source portions 73 arranged in the α and β directions, but a rectangular shape with a different number in the α and β directions is applied. Moreover, in the light source part 73 of this embodiment, the opening part 72b of the reflective mirror 72 is formed in the substantially rectangular shape, and it arrange | positions so that four sides may follow an (alpha) and (beta) direction. Note that the substantially rectangular opening 72b is not limited to a square shape or a substantially rectangular shape in which the corner 72c shown in FIG. 7A intersects at a right angle, but the corner 72c shown in FIG. The surface may be chamfered, or the corner 72c shown in FIG. 7C may be chamfered linearly. Moreover, as shown in FIG.7 (d), the opening part 72b may be the shape where the both ends of 2 sides which oppose were connected by the circular arc.

As shown in FIG. 5, inside the arc tube (quartz glass sphere) 94 of the ultra-high pressure mercury lamp 71, two electrodes and the like are provided, and mercury with a predetermined mercury vapor pressure, for example, 10 ⁶ to several 10 ⁷ Pascal. Is enclosed. In the case of the ultra-high pressure mercury lamp 71 to which a direct current is supplied, the electrode includes a cathode 95 that emits electrons into the discharge plasma and an anode 96 into which electrons flow from the discharge plasma, and arc discharge between the cathode 95 and the anode 96 is performed. Emits light. The arc tube 94 is fixed so that the midpoint between the cathode 95 and the anode 96 is substantially located at the focal point of the reflecting mirror 72.

The reflecting mirror 72 may have a parabolic surface or an elliptical surface where the reflected light is concentrated on the focal point, or may be a parabolic mirror in which the reflected light becomes parallel light. The reflecting mirror 72 is made of, for example, a molded body of borosilicate glass or crystallized glass, and a reflective coating film is formed on the inner surface thereof. The reflective coating film reflects light in the visible region from the ultraviolet region of 300 to 590 nm, and transmits unnecessary light in the visible region and infrared region behind the reflecting mirror 72. For example, SiO ₂ and Nb ₂ O ₅ A dielectric multilayer film comprising:

As shown in FIG. 5 to FIG. 8, each cassette 81 presses the light source support part 83 that supports a predetermined number of light source parts 73 and the light source part 73 supported by the light source support part 83, and the light source support part 83. Are formed in a substantially rectangular parallelepiped shape including a concave lamp pressing cover (cover member) 84 attached to each other. Note that the substantially rectangular parallelepiped shape may be a shape including a chamfered portion.

The light source support portion 83 is provided corresponding to the number of the light source portions 73 and is provided on the cover side of the window portions 83 a that emit light from the light source portion 73. A lamp recess 83b that surrounds the opening 72a (or the opening of the reflecting mirror mounting portion to which the reflecting mirror 72 is mounted) is formed. A plurality of cover glasses 85 are attached to the window 83a on the side opposite to the cover. In addition, attachment of the cover glass 85 is arbitrary and does not need to be provided.

The bottom surface of each lamp recess 83b includes an irradiation surface (here, an opening surface 72b of the reflecting mirror 72) for irradiating light from the light source unit 73 in a state where an optical axis angle adjusting mechanism 99 described later is not operating, and a light source. The intersection point p with the optical axis LA of the portion 73 is formed in a flat surface or a curved surface (in this embodiment, a flat surface) so as to be positioned on a single curved surface, for example, the spherical surface r, in each α and β direction.

A contact portion 86 that contacts the rear portion of the light source portion 73 is provided on the bottom surface of the lamp pressing cover 84. Each contact portion 86 is provided with an actuator such as a motor or a cylinder, a spring press, screwing, or the like. A configured lamp holding mechanism 87 is provided. As a result, each light source unit 73 fits the opening 72 a of the reflecting mirror 72 into the lamp recess 83 b of the light source support unit 83 and attaches the lamp pressing cover 84 to the light source support unit 83. By pressing the rear part 73, the cassette 81 is positioned.

Therefore, as shown in FIG. 8, the light of the predetermined number of light source units 73 positioned in the cassette 81 is incident on the incident surface of the integrator lens 74, and the light irradiated from each irradiation surface of the predetermined number of light source units 73. The irradiation amount reaching the incident surface of the integrator lens 74 is 70% to 100%.

The support 82 includes a support body 91 having a plurality of cassette mounting portions 90 to which a plurality of cassettes 81 are attached, and a support cover 92 that is attached to the support body 91 and covers the rear portion of each cassette 81. Have.

As shown in FIG. 9, when the support 82 is mounted on the light irradiation device 80, considering the center of gravity of the support 82 to which the cassette 81 is attached, the front surface of the cassette 81 and the support located at the lowermost position. It is preferable that the angle Ψ with respect to the installation surface 82 is set to Ψ ≦ 90 °. Thereby, it can prevent that the light irradiation apparatus 80 falls down. FIG. 9 shows a case where Ψ = 90 °.

As shown in FIG. 6, each cassette mounting portion 90 is formed with an opening 90 a that faces the light source support portion 83, and a plane around which the rectangular plane around the light source support portion 83 is opposed. A cassette recess 90c having a bottom surface 90b is formed. A cassette fixing means 93 for fixing the cassette 81 is provided around the cassette concave portion 90c of the support body 91. In this embodiment, the cassette fixing means 93 is engaged with the concave portion 81a formed in the cassette 81. Then, the cassette 81 is fixed.

As shown in FIG. 10, when the cassette 81 is fixed by the cassette fixing means 93, the light irradiation device 80 falls backward when the cassette 81 is assembled to the cassette mounting portion 90 with a part of the cassette 81 tilted. It is difficult and easy to assemble.

Each plane 90b of the cassette recess 90c arranged in the α direction or the β direction has an intersection point p between the irradiation surface that irradiates the light of all the light source parts 73 of each cassette 81 and the optical axis LA of the light source part 73. , Β are formed so as to intersect at a predetermined angle γ so as to be positioned on a single curved surface, for example, a spherical surface r (see FIG. 8).

Therefore, each cassette 81 is engaged with the cassette fixing means 93 in the recess 81a of the cassette 81 in a state where the light source support 83 is fitted and positioned in the cassette recess 90c of each cassette mounting portion 90. Each is fixed to the support 82. Then, a support cover 92 is attached to the support body 91 in a state where each cassette 81 is attached to the support body 91. Therefore, as shown in FIG. 8, the light of all the light source units 73 positioned in each cassette 81 is incident on the incident surface of the integrator lens 74, and the light irradiated from each irradiation surface of all the light source units 73 is The amount of irradiation reaching the incident surface of the integrator lens 74 is 70% to 100%.

In place of the cassette fixing means 93 as shown in FIG. 6, as shown in FIG. 11, through holes 83c are provided on two opposite sides of the cassette 81, and a cylindrical shaft member 93a as the cassette fixing means is provided. The cassette 81 may be fixed by being inserted into the concave portion 91b of the support body 91 through the through hole 83c. In addition, although the through hole and the cassette fixing means are provided in the middle part of the two opposite sides, they may be provided in the four corners of the cassette 81, for example. Further, as shown in FIG. 12, the cassette 81 is provided with a groove portion 83d facing the side surface of the cassette 81 instead of the through hole 83c, and the columnar shaft member 93a is connected to the support body 91 via the groove portion 83d. The cassette 81 may be fixed by being inserted into the recess 91b. Further, the cassette fixing means may be a polygonal shaft member 93e as shown in FIG. 13 instead of the columnar shaft member 93a, and the shape of the through hole 83c and the recess 91b can be changed accordingly. That's fine. In particular, by using a combination of the cylindrical shaft member 93a and the polygonal shaft member 93e as the cassette fixing means, the cassette 81 can be attached to the regular position of the support 82 without making a mistake. Further, the cassette fixing means as shown in FIGS. 11 and 12 can be used together with the cassette fixing means 93 shown in FIG.

Alternatively, as shown in FIG. 14A, cylindrical projections 93b or polygonal projections as cassette fixing means are provided at the four corners of the cassette 81, and as shown in FIG. You may make it align by fitting with the hole or groove part 91c. Alternatively, as shown in FIG. 15 (a), tenons 93c are formed on two opposite sides of the cassette 81, and as shown in FIG. 15 (b), a hole or groove 91d formed on the support body 91 side. And may be aligned with each other. In addition, although the tenon 93c is preferably provided on two sides for ease of assembly, the tenon 93c may be provided on the other two opposite sides as shown by the one-dot chain line in FIG. . Moreover, the structure which provides the cylindrical protrusion 93b shown to Fig.14 (a) and the boss 93c shown to Fig.15 (a) in the support body 91 side, and provides a hole part and a groove part in the cassette 81 side may be sufficient. Furthermore, the cassette fixing means shown in FIGS. 14A and 15A can also be used together with the cassette fixing means 93 shown in FIG.

As shown in FIG. 6, a long male screw 97a extending backward from between adjacent light source portions 73 is fixed to the back surface of the frame-shaped light source support portion 83, and the tip of the male screw 97a is connected to the lamp retainer. The nut is engaged with a nut 97b that is rotationally driven by a motor 98 fixed to the bottom of the cover 84. When the motor 98 is actuated to rotate the nut 97 b, the light source support portion 83 is pulled or pressed via the threaded male screw 97 a to be elastically deformed, and thereby the light source portion 73 fixed to the light source support portion 83. The optical axis angle is adjusted. In other words, the male screw 97a, the nut 97b, and the motor 98 constitute an optical axis angle adjusting mechanism 99 that adjusts the optical axis angle of each light source unit 73 with respect to the integrator lens 74.

The optical axis angle of each light source unit 73 adjusted by the optical axis angle adjusting mechanism 99 is an angle that can correct the diffusion of light that occurs with the lapse of the irradiation time of the light source unit 73, for example, a minute value of 1 ° or less. Since the angle is sufficient, the light source support 83 can be adjusted within the range of elastic deformation. Further, the optical axis angle adjusting mechanism 99 is not limited to the mechanism including the male screw 97a, the nut 97b, and the motor 98 described above, and any mechanism can be adopted, and the lamp pressing mechanism 87 that presses the rear portion of the light source unit 73 can be used. It may be arranged.

Further, as shown in FIG. 8, adjacent to the integrator lens 74, for example, a light detection device 101 such as an illuminance meter is disposed. The light detection apparatus 101 detects the amount of light leaked outside the integrator lens 74 without being incident on the integrator lens 74 due to the diffusion of the light of the light source unit 73 that occurs as the irradiation time elapses. Further, the light detection device 101 and the motor 98 of the optical axis angle adjustment mechanism 99 are connected to the control device 102 by electric wires 103, respectively.

When the light detection device 101 detects the amount of light leaked, the motor 98 is operated to adjust the optical axis angle of the light source unit 73 so that 70 to 100% of the amount of light is incident on the integrator lens 74. Correct the amount of diffusion. More specifically, when the light detection device 101 detects a light amount exceeding a predetermined threshold value, the control device 102 transmits an operation command to the motor 98 to operate, and rotates the nut 97b. As a result, the male screw 97a that is screwed into the nut 97b is pulled in the direction of the motor 98, and the light source support portion 83 is elastically deformed in a direction in which the radius of curvature decreases, so that the optical axis angle of each light source portion 73 is directed inward. Correct the amount of diffusion. As a result, when the amount of light detected by the light detection device 101 is reduced to an initial value or less, that is, when 70 to 100% of light is incident on the integrator lens 74 as in the initial state, the motor The operation of 98 stops.

The light detection device 101 is not limited to the light detection device 101 as long as it can detect the light diffusion of the light source unit 73 depending on the irradiation time, and the light amount detection device disposed on the incident surface of the integrator lens 74 or the irradiation A timer that counts time may be used. When the light amount detection device is arranged on the integrator lens 74, the optical axis angle of each light source unit 73 is adjusted by the optical axis angle adjustment mechanism 99 when the light amount detected by the light amount detection device becomes smaller than a predetermined threshold. Then, the light is incident on the center side of the integrator lens 74. Then, when the detected light amount returns to the initial value, the operation is stopped. On the other hand, if the optical axis angle of each light source unit 73 is adjusted by the optical axis angle adjusting mechanism 99 to be less than a predetermined threshold value, it is determined that the illuminance of the lamp 71 itself has decreased, and the lamp 71 is replaced. .
When the timer control is performed, the relationship between the irradiation time of the light source unit 73 and the light diffusion angle is investigated in advance, and the optical axis angle of each light source unit 73 is adjusted when a predetermined irradiation time has elapsed. To do.
Also, the illuminance is checked after the lamp 71 is replaced, but the illuminance may not return. For example, when the cover glass 85 is dirty, the cover glass 85 is replaced. Contamination of the cover glass 85 may be confirmed visually or by a sensor. As the sensor, a transmission type light detection sensor, a reflection type light detection sensor, or an eddy current sensor can be used.

In the exposure apparatus PE configured as described above, when the exposure control shutter 78 is controlled to be opened during exposure in the illumination optical system 70, the light emitted from the ultrahigh pressure mercury lamp 71 is incident on the incident surface of the integrator lens 74. Incident. The light emitted from the exit surface of the integrator lens 74 is changed in its traveling direction by the concave mirror 77 and converted into parallel light. The parallel light is irradiated as pattern exposure light substantially perpendicularly to the surface of the mask M held on the mask stage 10 and the surface of the substrate W held on the substrate stage 20. Is transferred onto the substrate W by exposure.

Here, the light irradiated from the ultra high pressure mercury lamp 71 has a light spread angle of about 2 °, for example, even if the ultra high pressure mercury lamp 71 is an unused lamp, but obtains a high output. For this reason, when a large current is supplied between the electrodes 95 and 96, the tungsten electrodes 95 and 96 gradually evaporate in the arc tube 94 as the usage time elapses, and the distance between the electrodes 95 and 96 is widened. It becomes larger, the light diffuses, and the irradiation angle spreads to, for example, 2.2 °. This wear phenomenon in the ultra-high pressure mercury lamp 71 supplied with direct current tends to become more prominent than the ultra-high pressure mercury lamp supplied with alternating current because the current flows in one direction.

From the viewpoint of light use efficiency, at the time of assembling the illumination optical system 70, adjustment is made so that light of 70 to 100% from all the light source units 73 is incident on the incident surface of the integrator lens 74. However, when the light detection device 101 detects the amount of leakage light (diffusion of light) due to the light diffusion associated with the use time of the ultrahigh pressure mercury lamp 71 described above, the control device 102 operates the motor 98 via the male screw 97a. The light source support 83 is pulled in and elastically deformed. As a result, the optical axis angle is adjusted so as to correct the light diffusion with the light source portions 73 fixed to the light source support portion 83 facing inward.

As described above, according to the light irradiation device 80 for an exposure apparatus of the first embodiment, the light from the light source units 73 including the light emitting unit 71 and the reflection optical system 72 and the light from the predetermined number of light source units 73 are integrated into the integrator lens 74. The plurality of cassettes 81 that support the light source unit 73 with the light source support unit 83 and the light of all the light source units 73 are incident on the incident surface of the integrator lens 74. Since a support body 82 having a plurality of cassette attaching portions 90 for attaching the cassette 81 and an optical axis angle adjusting mechanism 99 capable of adjusting the optical axis angle of each light source portion 73 are provided, the irradiation time of the light source portion 73 is elapsed. The accompanying light diffusion can be corrected so that 70 to 100% of the amount of light from each light source unit 73 can be incident on the integrator lens 74, thereby improving the light utilization efficiency and illuminance. It is possible to suppress the bottom.

Further, since the light diffusion generated with the lapse of the irradiation time of each light source unit 73 is detected and the light irradiation device 80 is controlled by the optical axis angle adjustment mechanism 99 so as to correct the detected light diffusion, Light with a dose of 70 to 100% from each light source unit 73 can be reliably incident on the integrator lens 74, and a reduction in illuminance is prevented. In the above-described embodiment, the light diffusion is detected and the optical axis angle of the light source unit 73 is automatically adjusted. However, the relationship between the lifetime irradiation time and the light diffusion is predicted in advance. The light use efficiency can be improved to some extent by adjusting each light source unit 73 inward by the angle.

(Second Embodiment)
Next, a divided successive proximity exposure apparatus according to the second embodiment of the present invention will be described with reference to FIGS. Since the divided sequential exposure apparatus of the present embodiment has the same basic configuration as the divided sequential proximity exposure apparatus of the first embodiment, the same parts are denoted by the same reference numerals, and the description thereof is omitted. Will be described in detail.

17 and 18, in the divided sequential exposure apparatus PE of the present embodiment, a wavelength cut filter 186 is disposed in the cassette 81 on the front surface corresponding to the desired lamp 71. The wavelength cut filter 186 may be any of a low-pass filter, a high-pass filter, and a band-pass filter, and may be an ND (dimming) filter that reduces the intensity of a desired wavelength. The wavelength cut filter 186 is preferably installed point-symmetrically. In this embodiment, the wavelength cut filter 186 is attached to the upper six lamps and the lower six lamps (shaded portions in FIGS. 17 and 18). As a result, the cassette 81 includes two types of light source units 73 having different spectral characteristics. Hereinafter, the light source unit 73 to which the wavelength cut filter 186 is attached is referred to as a light source unit 73A with a filter, and the light source unit 73 without the wavelength cut filter 186 is referred to as a light source unit 73B without a filter.

Further, as shown in FIG. 16, an opening 77a is formed in a part of the concave mirror 77, and each wavelength of g-line, h-line, i-line, j-line, k-line, etc. is behind the opening 77a. Each illuminance meter 79 for measuring the illuminance is provided.

Further, the optical control unit 76 measures in advance the spectral characteristics of the light source unit 73A with filter and the light source unit 73B without filter, particularly the peak height of each wavelength, and stores it as a database. Since the spectral characteristics of the light source units 73A and 73B change when the lamp 71 is continuously used, the illuminance at each wavelength of the light source units 73A and 73B is measured in a state where exposure is not performed.

The light irradiation device 80 configured in this manner determines the power and number of the lamps 71 to be turned on by referring to the database based on the result measured by the illuminance meter 79. Here, when the number of lamps 71 to be lit is large, the influence on the exposure surface illuminance distribution is small even if the method of turning off the lamps 71 is not point-symmetric, but when the number of lamps 71 to be lit is small, for example, 216 lamps When about 50% of the lamp 71 is turned off, the illumination intensity distribution on the exposed surface may be deteriorated unless the lamp 71 is turned off in a point-symmetric manner. For this reason, it is preferable that the light source part 73A with a filter and the light source part 73B without a filter light the lamp 71 so that each may become point-symmetric.

The light emitted from the mercury lamp 71 is generally incoherent light. When the light passes through the illumination optical system including the integrator lens 74 and the concave mirror 77 and reaches the exposure surface, the intensity is summed for each wavelength. As given. By providing the light source part with filter 73A and the light source part without filter 73B, the spectral intensity ratio at each wavelength can be controlled to some extent.

Here, an illuminance measurement test was performed when two types of lamps having different spectral characteristics were used and when a wavelength cut filter was provided on a lamp having the same spectral characteristics. Specifically, in a test using two types of lamps having different spectral characteristics, when the four first lamps are used, the four second lamps having a stronger intensity on the short wavelength side than the first lamp. The illuminance was measured when two first lamps and two second lamps were used. In addition, in a test in which a wavelength cut filter is provided, when four second lamps are used and the wavelength cut filter is not attached, when the wavelength cut filter is attached to the two lamps, the wavelength cut filter is the four lamps. The illuminance was measured when it was attached. The results when two types of lamps are used are shown in Table 1, and the results when a wavelength cut filter is provided are shown in Table 2.

As the illuminance meter used in this test, a UV integrated light meter UIT-250 manufactured by Ushio Electric Co., Ltd. and a 365 nm measuring light receiver UVD-S365 and 313 nm measuring light receiver UVD-S313 are used in the light receiving part. Then, the i-line (365 nm) and j-line (313 nm) intensities at the center of the exposure surface of 200 mm × 200 mm were measured at these light receiving parts.

As a result, as shown in Tables 1 and 2, it can be seen that by changing the number of DUV filters, the intensity at each wavelength can be changed as in the case of changing the type of lamp.

 

 

As described above, according to the exposure apparatus light irradiation device 80 and the exposure device PE of the second embodiment, the predetermined number of light source units 73 including the light emitting unit 71 and the reflective optical system 72, and the predetermined number of light source units 73. A cassette 81 that supports the light source unit 73 so that the light is incident on the incident surface of the integrator lens 74, and the predetermined number of light source units 73 are configured by two types of light source units 73 having different spectral characteristics. . Thereby, the intensity | strength for every wavelength can be set freely, without replacing | exchanging the light source part 73. FIG. Particularly, the lamps 71 of the predetermined number of light source units 73 have the same spectral characteristics, and the predetermined number of light source units 73 are provided with two types of spectral characteristics different from each other by disposing the wavelength cut filter 186 in a part thereof. A light source unit 73 is configured. Thereby, the intensity | strength for every wavelength can be set freely, without replacing | exchanging the light source part 73 and using the light source part from which spectral characteristics differ.

In addition, a plurality of cassettes 81 are provided, and a lamp 82 is provided as a unit by further including a support 82 to which a plurality of cassettes 81 are attached so that light from all the light source units 73 is incident on the incident surface of the integrator lens 74. All the light source parts 73 are arranged on a single curved surface without shortening the replacement time of the lamp 71 and the downtime of the apparatus, and without performing a large curved surface processing on the mounting part of the lamp 71. Can do.

Furthermore, according to the control method and the exposure method of the light irradiation apparatus for an exposure apparatus of this embodiment, the light irradiation apparatus 80 includes an integrator in addition to the plurality of light source units 73, the plurality of cassettes 81, and the support 82 described above. An illuminance meter 79 that is disposed on the downstream side of the lens 74 and measures illuminance corresponding to each wavelength, and an optical control unit 76 that controls lighting / extinction of each lamp 71 and illuminance. Then, the optical control unit 76 controls each light source unit 73 in the cassette 81 based on the illuminance corresponding to each wavelength measured by the illuminance meter 79 so that a desired illuminance is obtained at a predetermined wavelength. As a result, the necessary lamp 71 can be turned on, the intensity of the wavelength component necessary for exposure can be freely set, and the life of the lamp 71 can be extended.

In the above embodiment, two types of light source units 73A and 73B having different spectral characteristics are configured by using one type of wavelength cut filter 186, but as shown in FIGS. 19A and 19B, You may make it comprise three types of light source parts 73A1, 73A2, and 73B from which a spectral characteristic differs using two types of wavelength cut filters 186a and 186b. For example, the three types of light source units 73A1, 73A2, and 73B may be configured at 8: 8: 8 as shown in FIG. 19A, and 10: 10: 4 as shown in FIG. 19B. You may comprise. Also in these cases, it is preferable that the three types of light source units 73A1, 73A2, and 73B are configured to be point-symmetric, and when the lamp 71 in FIG. 19A is turned off by the optical control unit 76, FIG. What is necessary is just to make it light-off point-symmetrically as shown to the shaded part of (c).

(Third embodiment)
Next, a proximity scan exposure apparatus according to a third embodiment of the present invention will be described with reference to FIGS.

As shown in FIG. 23, the proximity scan exposure apparatus 200 is used for exposure via a plurality of masks M on which patterns P are formed on a substantially rectangular substrate W that is transported in a predetermined direction while approaching the mask M. The pattern L is exposed and transferred onto the substrate W by irradiating the light L. That is, the exposure apparatus 200 employs a scan exposure method in which exposure transfer is performed while the substrate W is moved relative to the plurality of masks M. Note that the size of the mask used in the present embodiment is set to 350 mm × 250 mm, and the X-direction length of the pattern P corresponds to the X-direction length of the effective exposure region.

As shown in FIGS. 20 and 21, the proximity scan exposure apparatus 200 floats and supports the substrate W, and also transports the substrate W in a predetermined direction (X direction in the figure), and a plurality of substrate transport mechanisms 120. A mask holding mechanism 170 having a plurality of mask holding portions 171 each holding the mask M and arranged in two rows in a staggered manner along a direction (Y direction in the figure) intersecting with a predetermined direction, and a plurality of mask holding portions 171 is disposed above each of the plurality of irradiation units 180 as an illumination optical system that irradiates the exposure light L, and is disposed between the plurality of irradiation units 180 and the plurality of mask holding units 171. And a plurality of light shielding devices 190 that shield the exposure light L emitted from the light source.

The substrate transport mechanism 120, the mask holding mechanism 170, the plurality of irradiation units 180, and the light shielding device 190 are disposed on a device base 201 installed on the ground via a level block (not shown). Here, as shown in FIG. 21, among the areas where the substrate transport mechanism 120 transports the substrate W, the area where the mask holding mechanism 170 is disposed is located upstream of the mask layout area EA and the mask layout area EA. This area is referred to as a substrate carry-in area IA, and an area downstream of the exposure area EA is referred to as a substrate carry-out area OA.

The substrate transport mechanism 120 is disposed on the carry-in frame 105, the precision frame 106, and the carry-out frame 107 installed on the apparatus base 201 via another level block (not shown), and floats the substrate W with air. A floating unit 121 as a substrate holding unit to be supported, and a frame 109 installed on the apparatus base 201 via another level block 108 on the side of the floating unit 121 in the Y direction, and holds the substrate W And a substrate driving unit 140 for transporting the substrate W in the X direction.

As shown in FIG. 22, the levitation unit 121 includes a plurality of long exhaust air pads 123 (see FIG. 22) to which a plurality of connecting rods 122 extending upward from the upper surface of the carry-in / out and precision frames 105, 106, 107 are respectively attached. 21), 124 and a plurality of elongated air intake / exhaust air pads 125a, 125b, and an air exhaust system 130 and air exhaust for exhausting air from a plurality of exhaust holes 126 formed in each of the air pads 123, 124, 125a, 125b. And an air suction system 132 and an air suction pump 133 for sucking air from the intake holes 127 formed in the intake / exhaust air pads 125a and 125b.

The intake / exhaust air pads 125a and 125b have a plurality of exhaust holes 126 and a plurality of intake holes 127, and balance the air pressure between the support surfaces 134 of the air pads 125a and 125b and the substrate W to obtain a predetermined value. The flying height can be set with high accuracy and can be horizontally supported at a stable height.

As shown in FIG. 21, the substrate driving unit 140 includes a gripping member 141 that grips the substrate W by vacuum suction, a linear guide 142 that guides the gripping member 141 along the X direction, and a gripping member 141 along the X direction. And a drive motor 143 and a ball screw mechanism 144 that are driven in the manner described above, and are attached to the side of the frame 109 in the substrate carry-in area IA so as to be movable in the Z direction and to be rotatable so as to protrude from the upper surface of the frame 109. And a plurality of work collision prevention rollers 145 that support the lower surface of the substrate W waiting to be conveyed to.

In addition, the substrate transport mechanism 120 is provided in the substrate carry-in side area IA, and the substrate pre-alignment mechanism 150 that performs pre-alignment of the substrate W waiting in the substrate carry-in side area IA, and the substrate alignment mechanism that performs alignment of the substrate W 160.

As shown in FIGS. 21 and 22, the mask holding mechanism 170 is provided for each of the plurality of mask holding portions 171 and the mask holding portions 171, and the mask holding portion 171 is moved in the X, Y, Z, and θ directions, that is, , A predetermined direction, a crossing direction, a vertical direction with respect to the horizontal plane of the predetermined direction and the crossing direction, and a plurality of mask driving units 172 that drive around a normal line of the horizontal plane.

The plurality of mask holding portions 171 arranged in two rows in a staggered manner along the Y direction are arranged on the upstream side with a plurality of upstream mask holding portions 171a (six in this embodiment) arranged on the upstream side. A plurality of downstream mask holding portions 171b (six in this embodiment), and the upstream side between the column portions 112 (see FIG. 20) erected on both sides in the Y direction of the apparatus base 201. Two main frames 113 installed on the downstream side are respectively supported via a mask driving unit 172. Each mask holding portion 171 has an opening 177 penetrating in the Z direction, and the mask M is vacuum-sucked on the lower surface of the peripheral edge portion.

The mask drive unit 172 is attached to the main frame 113 and moves along the X direction. The X direction drive unit 173 moves along the X direction. The Z direction drive unit 174 is attached to the tip of the X direction drive unit 173 and drives in the Z direction. A Y-direction drive unit 175 attached to the Z-direction drive unit 174 and driven in the Y-direction, and a θ-direction drive unit 176 attached to the Y-direction drive unit 175 and driven in the θ-direction. A mask holding portion 171 is attached to the tip of 176.

As shown in FIGS. 24 and 25, the plurality of irradiation units 180 are provided in the housing 181 in the same manner as in the first embodiment, the light irradiation device 80 </ b> A, the integrator lens 74, the optical control unit 76, the concave mirror 77, And an exposure control shutter 78, and plane mirrors 280, 281, and 282 disposed between the light source unit 73 A and the exposure control shutter 78, and between the integrator lens 74 and the concave mirror 77. The concave mirror 77 or the flat mirror 282 as the folding mirror may be provided with a declination angle correcting means capable of changing the curvature of the mirror manually or automatically.

The light irradiation device 80A includes a support 82A that includes an ultra-high pressure mercury lamp 71 and a reflecting mirror 72, each of which includes, for example, three cassettes 81A including eight light source sections 73 arranged in four rows and two rows. is doing. As in the first embodiment, in the cassette 81A, the cassette pressing cover 84 is attached to the light source support portion 83 on which the eight light source portions 73 are supported, so that the irradiation amount of 70% to 100% from each light source portion 73 can be obtained. Each light source unit 73 is positioned so that light can enter the integrator lens 74. Further, by attaching each cassette 81A to the plurality of cassette attaching portions 90 of the support 82A, it is possible to allow 70% to 100% irradiation light from each light source portion 73 to enter the integrator lens 74. Each cassette 81A is positioned.

Between the frame-shaped light source support portion 83 and the bottom of the lamp pressing cover 84, an optical axis angle adjusting mechanism 99 including a long male screw 97, a nut 97b, and a motor 98 is disposed. Further, the light detection device 101 and the optical axis angle adjustment mechanism 99 arranged adjacent to the integrator lens 74 are connected to the control device 102 by the electric wire 103 as in the first embodiment.

As shown in FIG. 22, the plurality of light shielding devices 190 include a pair of plate-shaped blind members 208 and 209 that change the inclination angle, and the blind drive unit 192 changes the inclination angle of the pair of blind members 208 and 209. To do. Thus, in the vicinity of the mask M held by the mask holding unit 171, the exposure light L emitted from the irradiation unit 180 is shielded, and the light shielding width in a predetermined direction for shielding the exposure light L, that is, the Z direction. The projected area viewed from the above can be made variable.

In the proximity scan exposure apparatus 200, the pair of mask trays 221 that hold the mask M is driven in the Y direction, thereby exchanging the masks M held by the upstream and downstream mask holding units 171a and 171b. A mask changer 220 is provided, and pre-alignment is performed by bringing a positioning pin (not shown) into contact with the mask M while pressing the mask M that is levitated and supported against the mask tray 221 before mask replacement. A mask pre-alignment mechanism 240 is provided.

Furthermore, as shown in FIG. 22, the proximity scanning exposure apparatus 200 includes various detection means such as a laser displacement meter 260, a mask alignment camera (not shown), a tracking camera (not shown), and a tracking illumination 273. Is arranged.

Next, exposure transfer of the substrate W will be described using the proximity scan exposure apparatus 200 configured as described above. In the present embodiment, when a pattern of R (red), G (green), or B (blue) is drawn on the color filter substrate W on which a base pattern (for example, a black matrix) is drawn. Will be described.

After the proximity scan exposure apparatus 200 supports the substrate W transported to the substrate carry-in area IA by air from the exhaust air pad 123 by a loader or the like (not shown) and performs pre-alignment work and alignment work for the substrate W. Then, the substrate W chucked by the gripping member 141 of the substrate driving unit 140 is transferred to the mask arrangement area EA.

Thereafter, the substrate W is moved in the X direction along the linear guide 142 by driving the drive motor 143 of the substrate drive unit 140. Then, the substrate W is moved onto the exhaust air pad 124 and the intake / exhaust air pads 125a and 125b provided in the mask arrangement area EA, and is lifted and supported with vibrations eliminated as much as possible. When the exposure light L is emitted from the light source in the irradiation unit 180, the exposure light L passes through the mask M held by the mask holding unit 171 and exposes and transfers the pattern onto the substrate W.

Further, since the exposure apparatus 200 includes a follow-up camera (not shown) and a laser displacement meter 260, the relative position deviation between the mask M and the substrate W is detected during the exposure operation, and the detected relative position is detected. Based on the deviation, the mask driving unit 172 is driven to cause the position of the mask M to follow the substrate W in real time. At the same time, the gap between the mask M and the substrate W is detected, the mask driving unit 172 is driven based on the detected gap, and the gap between the mask M and the substrate W is corrected in real time.

As described above, pattern exposure can be performed on the entire substrate W by performing continuous exposure in the same manner. Since the masks M held by the mask holding part 171 are arranged in a staggered manner, even if the masks M held by the upstream or downstream mask holding parts 171a and 171b are arranged apart from each other, the substrate A pattern can be formed in W without a gap.

Further, when a plurality of panels are cut out from the substrate W, a non-exposure area where the exposure light L is not irradiated is formed in a corresponding area between adjacent panels. For this reason, during the exposure operation, the pair of blind members 208 and 209 are opened and closed so that the blind members 208 and 209 are positioned in the non-exposure region in the same direction as the substrate W feed direction in accordance with the feed speed of the substrate W. The blind members 208 and 209 are moved.

Also in the present embodiment, during the exposure operation, a large current is supplied between the electrodes 95 and 96 of the ultra-high pressure mercury lamp 71, so that the electrodes 95 and 96 evaporate with the passage of use time and light diffusion occurs. Similarly to the first embodiment, light diffusion is detected by the light detection device 101, and the optical axis angle is adjusted by the optical axis angle adjustment mechanism 99 with the optical axis LA of each light source unit 73 facing inward.

Therefore, also in the proximity scanning exposure apparatus as in the present embodiment, the light detection device 101 detects the diffusion of light that occurs with the lapse of the irradiation time of each light source unit 73, and is detected by the optical axis angle adjustment mechanism 99. By controlling the light irradiation device 80 so as to correct the diffused light, 70 to 100% of light from each light source unit 73 can be reliably incident on the integrator lens 74, resulting in a decrease in illuminance. Can be suppressed.

(Fourth embodiment)
Next, a proximity scan exposure apparatus according to a fourth embodiment of the present invention will be described with reference to FIGS. The proximity scan exposure apparatus of this embodiment has the same basic configuration as that of the proximity scan exposure apparatus of the third embodiment. Detailed description.

As shown in FIG. 26, in the proximity scan exposure apparatus 200 of the present embodiment, an opening 77a is formed in a part of the concave mirror 77 in the housing 181 of the plurality of irradiation units 180, and behind the opening 77a. Each illuminance meter 79 for measuring the illuminance at each wavelength in the g-line, h-line, i-line, j-line, k-line, etc. is installed. In FIG. 26, reference numeral 195 denotes a lighting power source, and reference numeral 196 denotes a control circuit.

The light irradiation device 80A includes a support 82A that includes three ultra-high pressure mercury lamps 71 and a reflecting mirror 72, each including, for example, three cassettes 81 that include 24 light source sections 73 in six rows and four rows. is doing. As in the first embodiment, in the cassette 81, the cassette pressing cover 84 is attached to the light source support portion 83 on which the 24 light source portions 73 are supported, so that the irradiation amount of 70% to 100% from each light source portion 73 can be obtained. Each light source unit 73 is positioned so that light can enter the integrator lens 74. Further, by attaching each cassette 81 to the support 82A, each cassette 81 is positioned so that light with an irradiation amount of 70% to 100% from each light source unit 73 can enter the integrator lens 74. The

Also in the light irradiation device 80A of the present embodiment, the light emitting units 71 of the predetermined number of light source units 73 have the same spectral characteristics, and the predetermined number of light source units 73 have the wavelength cut filter 186 as a part thereof. By arranging, two types of light source units 73 having different spectral characteristics are configured.

Therefore, also in the proximity scan exposure apparatus 200 as in the present embodiment, a predetermined number of light source units 73 including the light emitting unit 71 and the reflective optical system 72 and light of the predetermined number of light source units 73 are incident on the entrance surface of the integrator lens 74. A cassette 81 that supports the light source unit 73 so as to be incident, the lamps 71 of the predetermined number of light source units 73 have the same spectral characteristics, and the predetermined number of light source units 73 are included in a part thereof. By disposing the wavelength cut filter 186, two types of light source units 73 having different spectral characteristics are configured. Thereby, the intensity | strength for every wavelength can be set freely, without replacing | exchanging the lamp | ramp 71 and using the light source part from which spectral characteristics differ.

It should be noted that the present invention is not limited to the above-described embodiment, and modifications, improvements, etc. can be made as appropriate. For example, in the above-described embodiment, the divided sequential proximity exposure apparatus and the scanning proximity exposure apparatus have been described as the exposure apparatus. However, the present invention is not limited to this, and the present invention can be applied to a mirror projection exposure apparatus, a lens projection exposure apparatus, a close contact The present invention can also be applied to a type exposure apparatus. Further, the present invention can be applied to any exposure method such as a batch method, a sequential method, and a scanning method.

This application is based on Japanese Patent Application 2010-165163 filed on July 22, 2010, Japanese Patent Application 2010-191288 filed on August 27, 2010, and Japanese Patent Application 2011-154669 filed on July 13, 2011. The contents of which are incorporated herein by reference.

12 Mask holding frame (mask holding part)
21 Substrate holding part 70 Illumination optical system 71 Super high pressure mercury lamp (light emitting part)
72 Reflector (reflective optical system)
73, 73A, 73B Light source 74 Integrator lens 80, 80A Light irradiation device 81 for exposure apparatus, 81A Cassette 82, 82A Support 83 Light source support 90 Cassette mounting part 99 Optical axis angle adjustment mechanism 171 Mask holding part 171a Upstream mask Holding unit 171b Downstream mask holding unit 180 Irradiation unit (illumination optical system)
186 Wavelength cut filter 200 Proximity scanning exposure apparatus (exposure apparatus)
LA Optical axis M Mask P Pattern PE Split sequential proximity exposure equipment (exposure equipment)
W substrate, glass substrate, color filter substrate (material to be exposed)

Claims (8)

1. A plurality of light source units each including a light emitting unit and a reflection optical system that emits light with directivity emitted from the light emitting unit;
   A plurality of cassettes each having a light source support part for supporting the light source part so that the light of the predetermined number of light source parts is incident on an incident surface of the integrator lens;
   A support body having a plurality of cassette mounting portions to which the plurality of cassettes are respectively mounted so that light of all the light source portions is incident on an incident surface of the integrator lens;
   An optical axis angle adjustment mechanism capable of adjusting an optical axis angle of each light source unit with respect to the integrator lens so as to correct the diffusion of the light that occurs as the irradiation time of each light source unit elapses. A light irradiation apparatus for an exposure apparatus.
2. 2. The light irradiation apparatus for an exposure apparatus according to claim 1, wherein the predetermined number of the light source units includes a plurality of types of light source units having different spectral characteristics.
3. Each light emitting unit of the predetermined number of light source units has the same spectral characteristics,
   3. The light irradiation apparatus for an exposure apparatus according to claim 2, wherein the predetermined number of light source units includes a plurality of types of light source units having different spectral characteristics by disposing a wavelength cut filter in a part thereof. .
4. A substrate holder for holding a substrate as an exposed material;
   A mask holding unit for holding a mask so as to face the substrate;
   An illumination optical system comprising: the light irradiation device according to any one of claims 1 to 3; and an integrator lens into which light emitted from a plurality of light source units of the light irradiation device is incident;
   With
   An exposure apparatus that irradiates the substrate with light from the illumination optical system through the mask.
5. A plurality of light source units each including a light emitting unit and a reflection optical system that emits light with directivity emitted from the light emitting unit;
   A plurality of cassettes each having a light source support part for supporting the light source part so that the light of the predetermined number of light source parts is incident on an incident surface of the integrator lens;
   A support body having a plurality of cassette mounting portions to which the plurality of cassettes are respectively mounted so that light of all the light source portions is incident on an incident surface of the integrator lens;
   An exposure apparatus comprising: an optical axis angle adjustment mechanism capable of adjusting an optical axis angle of each light source unit with respect to the integrator lens so as to correct the diffusion of the light that occurs as the irradiation time of each light source unit elapses. A method for controlling a light irradiation device for a vehicle,
   Detecting the diffusion of the light that occurs with the lapse of the irradiation time of each light source unit;
   Correcting the diffusion of the light by the optical axis angle adjusting mechanism;
   A method of controlling a light irradiation apparatus for an exposure apparatus, comprising:
6. An illuminometer that is disposed downstream of the integrator lens and measures illuminance corresponding to each wavelength;
   A control unit for controlling lighting and extinction of each light emitting unit and illuminance;
   Further comprising
   The predetermined number of light source units is constituted by a plurality of types of light source units having different spectral characteristics,
   The control unit controls each light source unit in the cassette so that desired illuminance can be obtained at a predetermined wavelength based on illuminance corresponding to each wavelength measured by the illuminometer. The control method of the light irradiation apparatus for exposure apparatuses of Claim 5.
7. Each light emitting unit of the predetermined number of light source units has the same spectral characteristics,
   7. The light irradiation apparatus for an exposure apparatus according to claim 6, wherein the predetermined number of light source units constitute a plurality of types of light source units having different spectral characteristics by disposing a wavelength cut filter in a part thereof. Control method.
8. A substrate holder for holding a substrate as an exposed material;
   A mask holding unit for holding a mask so as to face the substrate;
   An illumination optical system comprising: the light irradiation device according to any one of claims 5 to 7; and an integrator lens into which light emitted from a plurality of light source units of the light irradiation device is incident;
   With
   A light is emitted from the illumination optical system to the substrate through the mask while performing the method of controlling the light irradiation apparatus according to any one of claims 5 to 7, and is formed on the mask. An exposure method comprising exposing and transferring a pattern to be exposed to the substrate.

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