KR20120037908A - Light irradiation device for exposure device, control method of light irradiation device, exposure device, and exposure method - Google Patents

Abstract

The light irradiation apparatus for exposure apparatuses, the control method of a light irradiation apparatus, the exposure apparatus, and the exposure method which can suppress the fall of illuminance with passage of the irradiation time of a light source part are provided.
The light source unit 73 is provided such that a plurality of light source units 73 including the light emitting unit 71 and the reflective optical system 72 and a predetermined number of light sources 73 are incident on the incident surface of the integrator lens 74. The plurality of cassettes 81 supported by the light source support part 83 and the plurality of cassettes for mounting the plurality of cassettes 81 so that the light from all the light source parts 73 are incident on the incident surface of the integrator lens 74. The support body 82 which has the mounting part 90, and the optical-axis angle adjustment mechanism 99 which can adjust the optical-axis angle of each light source part 73 are provided.

Description

LIGHT IRRADIATION DEVICE FOR EXPOSURE DEVICE, CONTROL METHOD OF LIGHT IRRADIATION DEVICE, EXPOSURE DEVICE, AND EXPOSURE METHOD}

The present invention relates to a light irradiation apparatus for an exposure apparatus, a control method of a light irradiation apparatus, an exposure apparatus and an exposure method, and more particularly, a mask pattern of a mask on a substrate of a large flat panel display such as a liquid crystal display or a plasma display. The light irradiation apparatus for exposure apparatuses, the control method of a light irradiation apparatus, the exposure apparatus, and the exposure method which can be applied to the exposure apparatus which carries out the exposure transfer are related.

Conventionally, various exposure apparatuses, such as a proximity exposure apparatus, a scanning exposure apparatus, a projection exposure apparatus, a mirror projection, a close-type exposure apparatus, are devised as apparatus which manufactures panels, such as a color filter of a flat panel display apparatus. For example, in the split sequential proximity exposure apparatus, the mask stage smaller than the substrate is held by the mask stage, the substrate is held by the work stage, and the two are proximately arranged to face each other, and then the work stage is moved stepwise with respect to the mask. By irradiating the board | substrate with the light for pattern exposure to a board | substrate for every step, the some pattern drawn by the mask is exposed-transferred on a board | substrate, and several panels are produced on one board | substrate. Moreover, in a scanning exposure apparatus, the light for exposure is irradiated to the board | substrate conveyed at a fixed speed | interval through a mask, and the pattern of a mask is exposed and transferred on a board | substrate.

In recent years, the display apparatus is gradually enlarged, and, for example, when dividing sequential exposure, when producing the eighth generation (2200 mm x 2500 mm) panel with four exposure shots, one exposure area is 1300 mm x 1120. It becomes mm and when it manufactures with six exposure shots, one exposure area becomes 1100 mm x 750 mm. Therefore, the exposure apparatus is also required to be enlarged in the exposure apparatus, and the output of the light source to be used also needs to be increased. For this reason, as an illumination optical system, what tried to raise the output of the whole light source using several light sources is known (for example, refer patent document 1, 2, and 3).

In the exposure lighting apparatus described in Patent Literature 1, the size of the area where the divergent light emitted from the light source unit is incident on the incident surface is made smaller than the incident surface, so that the whole of the divergent light is incident on the incident surface, thereby effectively utilizing the light emitted from the light source unit. Doing. Moreover, the light irradiation apparatus of patent document 2 prevents light irradiation from the adjacent light source by providing the isolation wall which interrupts light between each light source arrange | positioned adjacently, and solves the problem of the light source part by heating etc. And the light irradiation apparatus of patent document 3 arrange | positions two light source parts in which several light source units are arrange | positioned in the zigzag form in the front-back direction, makes a space | gap between light source units, and makes a light source unit efficient. It is cooling. Moreover, in the light irradiation apparatus of patent document 4, the light shielding means which light-shields the light from a light source and narrows the condensing angle of the light which injects into an integrator lens is formed, and a light shielding means is used when an integrator lens with a narrow irradiation area is used. Is inserted into the optical path.

Japanese Patent Publication No. 4391136 Japanese Laid-Open Patent Publication No. 2006-324435 Japanese Unexamined Patent Publication No. 2007-115817 Japanese Laid-Open Patent Publication 2005-292316

Generally, as a light source part for exposure apparatuses, the ultrahigh pressure mercury lamp whose electrode is made from tungsten is used. As shown to Fig.28 (a), in the light irradiation apparatus 1 for exposure apparatuses, some ultrahigh pressure mercury is made so that all the light L from the some ultrahigh pressure mercury lamp 2 may inject into the integrator 3. The lamp 2 is arrange | positioned in substantially circular arc shape along the curved surface. The light irradiated from the ultra-high pressure mercury lamp 2 has a light diffusion angle of about 2 ° even when the ultra-high pressure mercury lamp 2 is not in use. In general, when a large current is supplied to the electrode to obtain a high output, As time passes, the tungsten electrodes gradually evaporate within the valve of the light source, and the distance between the electrodes increases, and the starting point of the light sources becomes large. As a result, as shown in FIG. 28 (b), the irradiation angle of light is, for example, 2.2 °. Widens.

In this case, if the distance from the ultra-high pressure mercury lamp 2 to the integrator 3 is 4 m, for example, the change of the irradiation angle of 0.2 ° is usually 100? At the irradiation position (incident surface of the integrator). It corresponds to expansion of the irradiation range of about 14 mm with respect to the size of the integrator 3 of the irradiation range of about 200 mm. For this reason, a part of the light from the ultra-high pressure mercury lamp 2 does not enter the integrator 3, but becomes a loss, and there exists a problem that illuminance falls by this. Patent Document 1? The technique disclosed in 4 is intended to effectively use the light by setting the light incidence area for the integrator or the heat countermeasure of the light source unit, and all of them are not considered for the diffusion of light due to the consumption of the electrode. There was room.

This invention is made | formed in view of the subject mentioned above, The objective is the light irradiation apparatus for exposure apparatuses, the control method of the light irradiation apparatus, the exposure apparatus, and the exposure method which can suppress the illumination intensity fall with the progress of irradiation time of a light source part. Is to provide.

The said objective of this invention is achieved by the following structures.

(1) a plurality of light source portions each including a light emitting portion and a reflection optical system which gives directivity to the light generated by the light emitting portion and emits the light;

A plurality of cassettes each having a light source support portion for supporting the light source portion such that light of the predetermined number of light source portions is incident on an incident surface of the integrator lens;

A support having a plurality of cassette mounting portions on which the plurality of cassettes are respectively mounted so that the light of all the light source portions is incident on the incident surface of the integrator lens;

And an optical axis angle adjusting mechanism capable of adjusting an optical axis angle with respect to the integrator lens of each light source unit so as to correct diffusion of the light generated as the irradiation time of each light source unit elapses. Probe device.

(2) The light irradiation apparatus for exposure apparatus according to (1), wherein the predetermined number of light source units are configured by a plurality of light source units having different spectral characteristics.

(3) The light emitting portions of the predetermined number of light source portions have the same spectral characteristics,

The said predetermined number of light source parts arrange | position a wavelength cut filter in the one part, and comprise the several kind of light source part from which a spectral characteristic differs, The light irradiation apparatus for exposure apparatus as described in (2) characterized by the above-mentioned.

(4) a substrate holding portion for holding a substrate as an exposed material;

A mask holding part for holding a mask so as to face the substrate;

(One) ? And an illumination optical system having the light irradiation apparatus according to any one of (3) and an integrator lens into which light emitted from a plurality of light source units of the light irradiation apparatus is incident.

And the substrate is irradiated with light from the illumination optical system with the mask interposed therebetween.

(5) a plurality of light source portions each including a light emitting portion and a reflection optical system which gives directivity to the light generated by the light emitting portion and emits the light;

A plurality of cassettes each having a light source support portion for supporting the light source portion such that light of the predetermined number of light source portions is incident on an incident surface of the integrator lens;

A support having a plurality of cassette mounting portions on which the plurality of cassettes are respectively mounted so that the light of all the light source portions is incident on the incident surface of the integrator lens;

Control of the light irradiation apparatus for exposure apparatus provided with the optical axis angle adjustment mechanism which can adjust the optical-axis angle with respect to the said integrator lens of each said light source part so that the spread of the light which generate | occur | produces with passage of the irradiation time of each said light source part may be provided. As a method,

Detecting the diffusion of the light generated as the irradiation time of each light source unit elapses;

And a step of correcting the diffusion of the light by the optical axis angle adjustment mechanism.

(6) an illuminometer disposed downstream of the integrator lens and measuring illuminance corresponding to each wavelength;

Further comprising a control unit for controlling the lighting, lighting, and illuminance of the light emitting unit,

The predetermined number of light source units is constituted by a plurality of light source units having different spectral characteristics,

The control unit controls each light source unit in the cassette so as to obtain desired illuminance at a predetermined wavelength based on the illuminance corresponding to each wavelength measured by the illuminometer. Control method of light irradiation device for use.

(7) The light emitting portions of the predetermined number of light source portions have the same spectral characteristics,

The control method of the light irradiation apparatus for exposure apparatus as described in (6) characterized by the above-mentioned predetermined number of light source parts providing a some kind of light source part from which a spectral characteristic differs by arrange | positioning a wavelength cut filter in the one part.

(8) a substrate holding portion for holding a substrate as an exposed material;

A mask holding part for holding a mask so as to face the substrate;

(5) An illumination optical system having the light irradiation apparatus according to any one of (7) and an integrator lens into which light emitted from a plurality of light source units of the light irradiation apparatus is incident;

(5) While performing the control method of the said light irradiation apparatus in any one of (7), the light from the said illumination optical system is irradiated to the said board | substrate through the said mask, and the pattern formed in the said mask is irradiated to the said board | substrate. Exposure transfer characterized by the above-mentioned.

According to the light irradiation apparatus for exposure apparatus of this invention, the some light source part containing a light emission part and a reflection optical system, the some cassette which has a light source support part which supports a predetermined number of light source parts, and the some cassette which mounts a some cassette Since a support body having a mounting portion and an optical axis angle adjustment mechanism capable of adjusting the optical axis angle with respect to the integrator lens of each light source portion are corrected so as to correct the diffusion of light generated as the irradiation time of each light source portion elapses, the irradiation time of the light source portion Even if the light is diffused along the course of 70, the diffusion is corrected by the optical axis angle adjusting mechanism and 70? Light of 100% irradiation amount can be incident on the integrator lens, whereby a decrease in illuminance with the passage of irradiation time can be suppressed, and stable illuminance can be obtained over a long period of time.

Moreover, according to the control method of the light irradiation apparatus for exposure apparatus of this invention, since the spread of the light which generate | occur | produces with passage of the irradiation time of each light source part, and corrects the spread of the light detected by the optical-axis angle adjustment mechanism, 70 in the light source section Light of 100% of irradiation amount can be incident on the integrator lens reliably, suppression of illuminance deterioration with the passage of irradiation time can be suppressed, and stable illuminance can be obtained over a long period of time.

In addition, according to the exposure apparatus and exposure method of the present invention, since the pattern formed on the mask is exposed and transferred to the substrate by using the above-described light irradiation apparatus for exposure apparatus and the control method thereof, the furnace of stable illumination over a long period of time. The light can be exposed to light, and the exposure can be performed with high precision to improve the quality of the product.

BRIEF DESCRIPTION OF THE DRAWINGS It is a partially exploded perspective view for demonstrating the split sequential proximity exposure apparatus which concerns on 1st Embodiment of this invention.
FIG. 2 is a front view of the divided sequential proximity exposure apparatus shown in FIG. 1. FIG.
3 is a cross-sectional view of the mask stage.
(A) is a front view which shows a light irradiation apparatus, (b) is sectional drawing along the IV-IV line of (a), (c) is sectional drawing along the IV'-IV 'line of (a).
5 is an enlarged cross-sectional view of the vicinity of the light source unit attached to the cassette.
6 is an enlarged view illustrating main parts showing a state in which a cassette is mounted on a support;
(A) of FIG. (d) is a front view which shows the shape of the opening part of a reflecting mirror, respectively.
8 is a schematic diagram showing the distance from the exit surface of each light source unit to the entrance surface of the integrator lens.
9 is a cross-sectional view illustrating an example in which a support is mounted on an optical lighting device.
Fig. 10 is a sectional view showing an example when the cassette is attached to the cassette mounting portion.
FIG. 11 is a view showing a modification of the cassette fixing means for mounting the cassette to the support, wherein (a) is a perspective view, (b) is a plan view, and (c) is a cross-sectional view along the line VII-XI of line (b) to be.
12 is a view showing another modification of the cassette fixing means for mounting the cassette to the support.
Fig. 13 is a view showing another modification of the cassette fixing means for mounting the cassette to the support.
(A) is a perspective view which shows the other modified example of the cassette fixing means for attaching a cassette to a support body, (b) is sectional drawing which shows the state in which a cassette was mounted to the support body.
(A) is a perspective view which shows the further modification of the cassette fixing means for mounting a cassette to a support body, (b) is sectional drawing which shows the state in which a cassette was mounted to the support body.
16 is a front view of a divided sequential proximity exposure apparatus according to a second embodiment.
(A) is a front view which shows a light irradiation apparatus, (b) is sectional drawing along the VIII-VIII line of (a).
(A) is a front view which shows a cassette, (b) is a side view of (a), and (c) is a bottom view of (a).
(A) is a front view which shows the cassette of the light irradiation apparatus which concerns on the modification of 2nd Embodiment, (b) is the front view which shows the cassette of the light irradiation apparatus which concerns on another modification, (c) is ( It is a figure which shows the case where the light source part of the light irradiation apparatus of a) is partially lighted out.
20 is an overall perspective view of a proximity scan exposure apparatus according to a third embodiment of the present invention.
21 is a top view illustrating the proximity scan exposure apparatus in a state where an upper configuration such as an irradiation unit is removed.
It is a side view which shows the exposure state in the mask arrangement | positioning area of a proximity scan exposure apparatus.
(A) is a principal part top view for demonstrating the positional relationship of a mask and an air pad, (b) is sectional drawing.
It is a figure for demonstrating the irradiation part of a proximity scan exposure apparatus.
(A) is a front view which shows the light irradiation apparatus of FIG. 24, (b) is sectional drawing along the VIIV-VV line of (a).
It is a figure for demonstrating the irradiation part of the proximity scan exposure apparatus which concerns on 4th Embodiment of this invention.
(A) is a front view which shows the light irradiation apparatus of FIG. 26, (b) is sectional drawing along the VII-V line of (a).
28A and 28B are schematic diagrams of a conventional light irradiation apparatus showing a state in which diffused light deviates from the integrator lens.

EMBODIMENT OF THE INVENTION Hereinafter, embodiment regarding the exposure apparatus for light exposure apparatus which concerns on this invention, the exposure apparatus using this light irradiation apparatus, and exposure method is described in detail based on drawing.

(1st embodiment)

As shown in FIG. 1 and FIG. 2, the divided sequential proximity exposure apparatus PE of the present embodiment holds the mask stage 10 holding the mask M and the glass substrate (exposed material) W. As shown in FIG. The substrate stage 20 and the illumination optical system 70 which irradiate the light for pattern exposure are provided.

In addition, the glass substrate W (henceforth simply called "substrate W") is arrange | positioned facing the mask M, and in order to expose and transfer the pattern drawn to this mask M, the surface (mask ( The photosensitive agent is apply | coated to the opposing surface side of M).

The mask stage 10 can move to the mask stage base 11 in which the rectangular opening 11a is formed in the center part, and the opening 11a of the mask stage base 11 in X, Y, and θ directions. The mask holding frame 12, which is a mask holding part which is mounted securely, is formed on the upper surface of the mask stage base 11, and the mask holding frame 12 is moved in the X-axis, Y-axis, and θ directions to position the mask M. FIG. And a mask drive mechanism 16 for adjusting the pressure.

The mask stage base 11 is moved in the Z-axis direction by the strut 51 formed upright on the apparatus base 50 and the Z-axis moving apparatus 52 formed in the upper end of the strut 51. It is possibly supported (see FIG. 2) and disposed above the substrate stage 20.

As shown in FIG. 3, the planar bearing 13 is arrange | positioned in multiple locations on the upper peripheral surface of the opening part 11a of the mask stage base 11, and the mask holding frame 12 is a flange formed in the upper outer peripheral part. 12a is mounted on the planar bearing 13. As a result, the mask holding frame 12 is inserted into the opening 11a of the mask stage base 11 with a predetermined gap therebetween, so that the mask holding frame 12 can move in the X, Y, and θ directions by the gap. .

Moreover, the chuck | zipper part 14 which hold | maintains the mask M is fixed to the lower surface of the mask holding frame 12 with the interseat 15 in between. In this chuck | zipper part 14, the some suction nozzle 14a for adsorb | sucking the peripheral part which the mask pattern of the mask M is not drawn is opened, and the mask M is the suction nozzle 14a. It is maintained so that it can be attached or detached to the chuck | zipper part 14 by the vacuum adsorption apparatus which is not shown through the figure. Moreover, the chuck | zipper part 14 can move with respect to the mask stage base 11 with the mask holding frame 12 in the X-axis, Y-axis, (theta) direction.

The mask drive mechanism 16 includes two Y-axis drive devices 16y mounted on one side along the X-axis direction of the mask holding frame 12, and one along the Y-axis direction of the mask holding frame 12. One X-axis direction drive apparatus 16x attached to the side is provided.

The Y-axis direction drive device 16y is provided on the mask stage base 11 and has a rod actuator 16a (for example, an electric actuator, etc.) 16a having a rod 16b that stretches in the Y-axis direction, and a rod Guide 16d attached to the edge of the mask holding frame 12 and the slider 16d connected to the front-end | tip of 16b via the pin support mechanism 16c, and movably mounting the slider 16d. The rail 16e is provided. In addition, the X-axis direction drive apparatus 16x also has the same structure as the Y-axis direction drive apparatus 16y.

In the mask drive mechanism 16, the mask holding frame 12 is moved in the X-axis direction by driving one X-axis direction drive device 16x, so that the two Y-axis drive devices 16y are equal. By driving, the mask holding frame 12 is moved in the Y axis direction. In addition, the mask holding frame 12 is moved (rotated around the Z axis) in the θ direction by driving one of the two Y-axis direction driving devices 16y.

Moreover, on the upper surface of the mask stage base 11, as shown in FIG. 1, it hold | maintains in the gap sensor 17 and the chuck | zipper part 14 which measure the gap between the opposing surface of the mask M and the board | substrate W. As shown in FIG. An alignment camera 18 for confirming the mounting position of the mask M to be used is provided. These gap sensors 17 and the alignment camera 18 are hold | maintained so that the movement to the X-axis and Y-axis direction through the moving mechanism 19, and are arrange | positioned in the mask holding frame 12. As shown in FIG.

In addition, on the mask holding frame 12, as shown in FIG. 1, the upper part which shields both ends of the mask M to the X-axis direction both ends of the opening 11a of the mask stage base 11 as needed. Blade 38 is formed. The aperture blade 38 is movable in the X-axis direction by the aperture blade drive mechanism 39 composed of a motor, a ball screw, a linear guide, and the like, thereby reducing the shielding area at both ends of the mask M. FIG. Adjust In addition, the aperture blade 38 is similarly formed not only at both ends of the X-axis direction of the opening 11a but also at both ends of the Y-axis direction of the opening 11a.

As shown in FIG. 1 and FIG. 2, the substrate stage 20 includes a substrate holding part 21 holding the substrate W and a substrate holding part 21 with respect to the apparatus base 50. The board | substrate drive mechanism 22 which moves to an axis and a Z axis direction is provided. The board | substrate holding part 21 hold | maintains so that the board | substrate W can be attached or detached freely by the vacuum suction mechanism not shown. The board | substrate drive mechanism 22 is the Y-axis table 23, the Y-axis feed mechanism 24, the X-axis table 25, the X-axis feed mechanism 26, and Z under the board | substrate holding part 21. -Tilt adjustment mechanism 27 is provided.

As shown in FIG. 2, the Y-axis feed mechanism 24 includes a linear guide 28 and a feed drive mechanism 29, and the slider 30 mounted on the rear surface of the Y-axis table 23 is provided. The two guide rails 31 which extend onto the device base 50 are hypothesized over a rolling element (not shown), and the Y-axis table 23 is provided by the motor 32 and the ball screw device 33. Is driven along the guide rail 31.

Moreover, the X-axis feed mechanism 26 also has the same structure as the Y-axis feed mechanism 24, and drives the X-axis table 25 with respect to the Y-axis table 23 in the X direction. In addition, the Z-tilt adjustment mechanism 27 has one movable wedge mechanism formed by combining the wedge-shaped moving bodies 34 and 35 and the feed drive mechanism 36 on one end in the X direction and two on the other end. It is comprised by arrangement. Moreover, the structure which combined the motor and the ball screw apparatus may be sufficient as the feed drive mechanisms 29 and 36, and the linear motor which has a stator and a mover may be sufficient as it. In addition, the number of installation of the Z-tilt adjustment mechanism 27 is arbitrary.

Thereby, the board | substrate drive mechanism 22 transfer-drives the board | substrate holding part 21 to a X direction and a Y direction, and also fine-adjusts the gap between the opposing surface of the mask M and the board | substrate W. FIG. The holding portion 21 is finely moved in the Z axis direction and tilted.

The bar mirrors 61 and 62 are attached to the X direction side part and the Y direction side part of the board | substrate holding part 21, respectively, and 3 laser interferometers (total of Y direction end part and X direction end part of the apparatus base 50) 63, 64, 65 are formed. Thereby, the laser beam is irradiated to the bar mirrors 61 and 62 from the laser interferometers 63, 64 and 65, the laser beam reflected by the bar mirrors 61 and 62 is received, and the laser beam and the bar mirror 61 are received. , The interference of the laser light reflected by the 62 is measured to detect the position of the substrate stage 20.

As shown in FIG.2 and FIG.4, the illumination optical system 70 is the light irradiation apparatus 80 provided with the some light source part 73, and the integrator lens in which the light beam inject | emitted from the some light source part 73 is incident. Concave to change the direction of the optical path emitted from the exit surface of the integrator lens 74 and the optical control unit 76 for supplying a direct current with adjusted voltage to the lamps 71 of the respective light source units 73. It is provided with the surface mirror 77, and the exposure control shutter 78 arrange | positioned between the some light source part 73 and the integrator lens 74, and opening-and-closing control so that the irradiated light may be transmitted / blocked. In addition, a DUV cut filter, a polarization filter, and a band pass filter may be disposed between the integrator lens 74 and the exposure surface, and the curvature of the mirror can be manually or automatically changed in the concave mirror 77. Declination angle correction means may be formed.

4 to 8, the light irradiation apparatus 80 includes an ultra-high pressure mercury lamp 71 as a light emitting portion and a reflecting mirror as a reflecting optical system which gives directivity to the light generated from the lamp 71 and emits the light. A plurality of light sources 73 each including a plurality of light sources 73, a plurality of cassettes 81 each capable of mounting a predetermined number of light sources 73 among the plurality of light sources 73, and a plurality of cassettes 81. The support body 82 which can be attached is provided.

In addition, in the illumination optical system 70, when the 160 W ultra-high pressure mercury lamp 71 is used, in the exposure apparatus which manufactures a 6th generation flat panel, 374 light source parts and the exposure apparatus which manufactures a 7th generation flat panel are 572. Light source units, 774 light source units are required in the exposure apparatus for manufacturing the eighth generation flat panel. However, in this embodiment, in order to simplify description, as shown in FIG. 4, the cassette 81 equipped with the six light source parts 73 of three columns in the (alpha) direction and two rows in the (beta) direction is carried out by three columns x 3 rows. It demonstrates as having 54 light source parts 73 arrange | positioned nine pieces in total. In addition, although the square shape which made the arrangement | positioning of the light source part 73 the same number in the (alpha), (beta) direction can also be considered as the cassette 81 and the support body 82, the rectangular shape which made the number different in the (alpha), (beta) direction is applied. In addition, in the light source part 73 of this embodiment, the opening part 72b of the reflecting mirror 72 is formed in substantially square shape, and it arrange | positions so that four sides may follow the (alpha), (beta) direction. In addition, the opening part 72b of a substantially rectangular shape is not limited to being a square shape or substantially rectangular shape which the corner part 72c shown to Fig.7 (a) crosses at right angles, and is shown to Fig.7 (b). The edge portion 72c may be chamfered in a curved shape, or the edge portion 72c illustrated in FIG. 7C may be chamfered in a straight line shape. In addition, as shown to Fig.7 (d), the opening part 72b may be a shape in which the opposing two edge parts were connected by the circular arc.

As shown in FIG. 5, two electrodes or the like are formed inside the light emitting tube (quartz glass sphere) 94 of the ultra-high pressure mercury lamp 71, and a predetermined mercury vapor pressure, for example, 10 ⁶ ? Mercury in mercury 10 ⁷ Pascal is enclosed. In the case of the ultra-high pressure mercury lamp 71 to which a direct current is supplied, the electrode consists of a cathode 95 for emitting electrons to the discharge plasma and an anode 96 for introducing electrons from the discharge plasma, and the cathode 95 and the anode ( It emits light by the arc discharge between 96). The light emitting tube 94 is fixed so that the intermediate point of the cathode 95 and the anode 96 is substantially positioned at the focal point of the reflecting mirror 72.

The reflecting mirror 72 may be a shape having a parabolic surface or an ellipsoidal surface in which the reflected light concentrates on the focus, or may be a parabola mirror in which the reflected light becomes parallel light. The reflector 72 is made of, for example, a molded body of borosilicate glass or crystallized glass, and a reflection coating film is formed on the inner surface thereof. The reflective coating film is 300? A dielectric multilayer film made of, for example, SiO ₂ and Nb ₂ O ₅ , which reflects light in the visible region from an ultraviolet region of 590 nm and transmits light in an unnecessary visible region or infrared region behind the reflector 72.

5 to 8, each cassette 81 presses a light source support portion 83 that supports a predetermined number of light source portions 73, and a light source portion 73 supported by the light source support portion 83. It is formed in the substantially rectangular parallelepiped shape provided with the recessed lamp press cover (cover member) 84 attached to the light source support part 83, and has the same structure, respectively. In addition, the substantially rectangular parallelepiped shape may be a shape including a chamfer.

The light source support part 83 is formed corresponding to the number of light source parts 73, is formed in the cover part of the window part 83a which emits the light from the light source part 73, and the window part 83a, and the reflecting mirror A lamp recess 83b is formed that surrounds the opening 72a of the 72 (or the opening of the reflector mounting portion on which the reflector 72 is mounted). Moreover, the some cover glass 85 is each attached to the cover opposite side of the window part 83a. In addition, attachment of the cover glass 85 does not need to be formed arbitrarily.

The bottom surface of each recessed part 83b for lamps is an irradiation surface for irradiating light from the light source unit 73 in a state where the optical axis angle adjustment mechanism 99 described later does not operate (here, the reflection mirror 72 The plane or curved surface (interface p) between the opening surface 72b and the optical axis LA of the light source portion 73 is located on a single curved surface, for example, a spherical surface r in each of the α and β directions. In the present embodiment).

The bottom part of the lamp press cover 84 is provided with the contact part 86 which abuts on the back side of the light source part 73, and each contact part 86 has an actuator like a motor and a cylinder, a spring press, and a screw. A lamp pressing mechanism 87 formed by fixing or the like is formed. Thereby, each light source part 73 fits the opening part 72a of the reflecting mirror 72 to the recessed part 83b for lamps of the light source support part 83, and attaches the lamp press cover 84 to the light source support part 83. As shown in FIG. Then, by pressing the back of the light source unit 73 by the lamp pressing mechanism 87, the cassette 81 is positioned.

Therefore, as shown in FIG. 8, the light of the predetermined number of light source parts 73 positioned in the cassette 81 is incident on the incident surface of the integrator lens 74, and each irradiation surface of the predetermined number of light source parts 73 is provided. The amount of irradiation that the light irradiated from the light reaches the incident surface of the integrator lens 74 is 70%? It becomes 100%.

In addition, the support body 82 is attached to the support body 91 which has the some cassette mounting part 90 which mounts the some cassette 81, and the support body 91, and the back part of each cassette 81 is provided. It has a support cover 92 covering it.

As shown in FIG. 9, when the support body 82 is mounted to the light irradiation apparatus 80, the cassette 81 located in the lowermost part in consideration of the center of gravity of the support body 82 on which the cassette 81 is mounted It is preferable that the angle Ψ between the front surface of the and the mounting surface of the support body 82 be set to ≦≦ 90 °. Thereby, the light irradiation apparatus 80 can be prevented from falling. 9 has shown the case where Ψ = 90 degrees.

As shown in FIG. 6, each cassette mounting portion 90 is provided with an opening 90a facing the light source supporting portion 83, and a rectangular plane around the light source supporting portion 83 faces the opening 90a. The cassette recessed part 90c which made the flat surface 90b the bottom surface is formed. Moreover, the cassette fixing means 93 for fixing the cassette 81 is formed in the circumference | surroundings of the cassette recessed part 90c of the support body 91, and in this embodiment, the recess formed in the cassette 81 is formed. It is engaged with the part 81a, and the cassette 81 is fixed.

As shown in Fig. 10, when the cassette 81 is fixed by the cassette fixing means 93, it is more preferable to attach a part of the cassette 81 to the cassette mounting portion 90 in an inclined state. 80) It is easy to attach so that it does not fall well backwards.

Each plane 90b of the cassette recessed portion 90c aligned in the α direction or the β direction has an irradiation surface for irradiating light from all the light source portions 73 of each cassette 81 and an optical axis of the light source portion 73. The intersection point p of LA) is formed so as to intersect at a predetermined angle γ so as to be located on a single curved surface, for example, spherical surface r in each of the α and β directions (see FIG. 8).

Therefore, each cassette 81 has the cassette fixing means 93 of the cassette 81 in a state where these light source support portions 83 are fitted to the cassette recessed portions 90c of the cassette mounting portions 90 and positioned. It is fixed to the support body 82, respectively, by engaging with the recessed part 81a. And in the state in which each of these cassettes 81 is attached to the support body 91, the support cover 92 is attached to the support body 91. As shown in FIG. Therefore, as shown in FIG. 8, the light of all the light source parts 73 positioned in each cassette 81 is incident on the incident surface of the integrator lens 74, and irradiated from each irradiation surface of all the light source parts 73. The amount of irradiation that light reaches the incident surface of the integrator lens 74 is 70%? It becomes 100%.

In addition, instead of the cassette fixing means 93 shown in FIG. 6, as shown in FIG. 11, the through-hole 83c is formed in the two opposite sides of the cassette 81, and the cylindrical shaft member as a cassette fixing means is provided. The cassette 81 may be fixed by inserting the 93a into the recess 91b of the support body 91 through the through hole 83c. In addition, although the through-hole and the cassette fixing means are formed in the intermediate part of two sides which oppose, you may form in four corners of the cassette 81, for example. In addition, as shown in FIG. 12, instead of the through hole 83c, the cassette 81 is provided with a groove portion 83d facing the side surface of the cassette 81, and the cylindrical shaft member 93a is provided with a groove portion. The cassette 81 may be fixed by inserting into the recessed portion 91b of the support body 91 through 83d. In addition, instead of the cylindrical shaft member 93a, the cassette fixing means may be the polygonal shaft member 93e shown in FIG. 13, and if the shape of the through-hole 83c and the recessed part 91b is changed accordingly, do. In particular, by using the cassette fixing means as a combination of the cylindrical shaft member 93a and the polygonal shaft member 93e, the cassette 81 can be mounted at the regular position of the support 82 without making a mistake. In addition, the cassette fixing means as shown in FIG. 11 and FIG. 12 can be used together with the cassette fixing means 93 shown in FIG.

Alternatively, as shown in FIG. 14A, a circumferential protrusion 93b or a polygonal protrusion as cassette fixing means is formed at four corners of the cassette 81, and as shown in FIG. 14B, the support body You may align with the hole part or the groove part 91c formed in the side of 91. Alternatively, as shown in Fig. 15A, the stern part 93c is formed on two opposite sides of the cassette 81, and as shown in Fig. 15B, on the support body 91 side. You may make it alignment with the formed hole part or the groove part 91d. Moreover, although it is preferable that the stirrer part 93c is formed in two sides from the adhesiveness surface, as shown by the dashed-dotted line of FIG. 15 (a), the stirrer part 93c is also formed in the remaining two sides which oppose. You may also Moreover, the circumferential protrusion 93b shown to Fig.14 (a) and the stirrer part 93c shown to Fig.15 (a) are formed in the support body 91 side, and a hole part and a groove part are provided in the cassette 81 side. The structure to form may be sufficient. And the cassette fixing means shown to FIG. 14A and FIG. 15A can also be used with the cassette fixing means 93 shown in FIG.

As illustrated in FIG. 6, a long male thread 97a extending rearward from an adjacent light source portion 73 is fixed to the rear surface of the frame-shaped light source support portion 83. The tip of 97a is screwed to the nut 97b which is rotationally driven by the motor 98 fixed to the bottom of the lamp press cover 84. When the motor 98 is actuated and the nut 97b rotates, the light source support 83 is pulled or pressed to elastically deform through the male screw 97a which is screwed, thereby being fixed to the light source support 83. The optical axis angle of the light source unit 73 is adjusted. In other words, the male screw 97a, the nut 97b, and the motor 98 constitute an optical axis angle adjustment mechanism 99 for adjusting the optical axis angle of each light source unit 73 with respect to the integrator lens 74.

On the other hand, the optical axis angle of each light source part 73 adjusted by the optical axis angle adjustment mechanism 99 is the angle which can correct the spread of the light which generate | occur | produces with the passage of the irradiation time of the light source part 73, for example, 1 degrees or less. Since a small angle is enough, it can adjust within the range of the elastic deformation of the light source support part 83. In addition, the optical axis angle adjustment mechanism 99 is not limited to the mechanism which consists of the above-mentioned external thread 97a, the nut 97b, and the motor 98, and can employ | adopt arbitrary mechanisms, and is the back side of the light source part 73. You may arrange | position to the lamp | lamp press mechanism 87 which presses.

In addition, as shown in FIG. 8, a photodetector 101 such as an illuminometer is disposed adjacent to the integrator lens 74. The photodetector 101 detects the amount of leaked light irradiated out of the integrator lens 74 without being incident on the integrator lens 74 by the diffusion of the light of the light source unit 73 generated with the passage of the irradiation time. . In addition, the motor 98 of the photodetector 101 and the optical axis angle adjustment mechanism 99 is connected to the control apparatus 102 by the electric wire 103, respectively.

When the light detecting device 101 detects the amount of leakage light, the motor 98 is operated to make 70? The optical axis angle of the light source part 73 is adjusted so that the light of 100% of irradiation amount may be incident on the integrator lens 74, and the diffusion of light is corrected. More specifically, when the photodetecting device 101 detects an amount of light exceeding the set predetermined threshold, the control device 102 transmits an operation command to the motor 98 to operate it to rotate the nut 97b. . Thereby, the male screw 97a screwed to the nut 97b is inserted in the motor 98 direction, and the light source support part 83 is elastically deformed in the direction which becomes a curvature radius, and the optical-axis angle of each light source part 73 is inward. Towards this side, the diffusion of light is corrected. Thus, when the amount of light detected by the photodetector 101 is reduced to the initial value or less, that is, 70? When 100% of the dose of light enters the integrator lens 74 as in the initial state, the operation of the motor 98 is stopped.

 On the other hand, the light detecting device 101 is not limited to the light detecting device 101 as long as it can detect the light diffusion of the light source unit 73 due to the irradiation time, and detects the amount of light disposed on the incident surface of the integrator lens 74. An apparatus, a timer which counts irradiation time, etc. may be sufficient. When the light amount detecting device is disposed in the integrator lens 74, when the light amount detected by the light amount detecting device is smaller than a predetermined threshold, the optical axis angle adjusting mechanism 99 causes the optical axis angle of each light source unit 73 to be adjusted. To adjust the light to enter the center side of the integrator lens 74. When the detected light amount returns to the initial value, the operation is stopped. On the other hand, even when the optical axis angle of each light source part 73 is adjusted by the optical axis angle adjustment mechanism 99, when it is less than a predetermined threshold, it is judged that the illuminance of the lamp 71 itself fell, and the Perform the exchange.

In addition, when timer control is carried out, the relationship between the irradiation time of the light source part 73 and the diffusion angle of light is irradiated beforehand, and when the predetermined irradiation time elapses, the optical axis angle of each light source part 73 is adjusted.

Moreover, although illuminance is checked even after the lamp 71 is replaced, the illuminance may not return. For example, when the cover glass 85 is contaminated, the cover glass 85 is replaced. Contamination of the cover glass 85 may be visually confirmed or may be confirmed by a sensor. As the sensor, a transmissive photodetector, a reflective photodetector, or an eddy current sensor can be used.

In the exposure apparatus PE comprised in this way, in the illumination optical system 70, when the exposure control shutter 78 is opened-controlled at the time of exposure, the light irradiated from the ultrahigh pressure mercury lamp 71 will be carried out by the integrator lens 74. Incident on the incident surface. The light generated at the exit surface of the integrator lens 74 is converted into parallel light while the traveling direction thereof is changed by the concave mirror 77. The parallel light is irradiated as light for pattern exposure substantially perpendicularly to the surface of the mask M held by the mask stage 10 and furthermore, the surface of the substrate W held by the substrate stage 20. The pattern P of M) is exposed-transferred on the board | substrate W. FIG.

Here, even if the ultrahigh pressure mercury lamp 71 is an unused lamp, the light irradiated from the ultrahigh pressure mercury lamp 71 has a light diffusion angle of about 2 °, for example, between the electrodes 95 and 96 to obtain a high output. When a large current is supplied to the tungsten electrode, the tungsten electrodes 95 and 96 gradually evaporate in the light emitting tube 94 as the use time elapses, and the interval between the two electrodes 95 and 96 becomes wider, and the starting point of the light source becomes larger. The light is diffused so that the irradiation angle is widened to 2.2 °, for example. This wear phenomenon in the ultrahigh pressure mercury lamp 71 supplied with direct current tends to be more pronounced than the ultrahigh pressure mercury lamp supplied with alternating current because current flows in one direction.

From the viewpoint of the utilization efficiency of light, 70? From the entire light source unit 73 at the time of attachment of the illumination optical system 70. Light of 100% of the irradiation amount is adjusted to be incident on the incident surface of the integrator lens 74. However, when the photodetecting device 101 detects the amount of leaked light (diffusion of light) by the diffusion of the light according to the use time of the ultra-high pressure mercury lamp 71 described above, the control device 102 operates the motor 98. And elastically deform by pulling the light source support part 83 through the male screw 97a. Thereby, the optical axis angle is adjusted so that each light source part 73 fixed to the light source support part 83 may face inward and correct the diffusion of light.

As mentioned above, according to the light irradiation apparatus 80 for exposure apparatuses of 1st Embodiment, the several light source part 73 containing the light emission part 71 and the reflection optical system 72, and the predetermined number of light source parts 73 The plurality of cassettes 81 which support the light source unit 73 by the light source support part 83, and the light of all the light source parts 73 are made into the integrator lens A support body 82 having a plurality of cassette mounting portions 90 for mounting a plurality of cassettes 81 so as to be incident on the incident surface of the 74, and an optical axis angle adjusting mechanism 99 capable of adjusting the optical axis angles of the respective light source portions 73. ), The diffusion of light generated in accordance with the elapse of the irradiation time of the light source unit 73 is corrected, and 70? Light of 100% of the irradiation amount can be incident on the integrator lens 74, whereby the light utilization efficiency can be increased, and the fall of illuminance can be suppressed.

In addition, since the light irradiation device 80 is controlled to detect the diffusion of light generated as the irradiation time of each light source unit 73 elapses and to correct the diffusion of the light detected by the optical axis angle adjustment mechanism 99, 70 from the light source unit 73? Light of 100% of the irradiation amount can be reliably incident on the integrator lens 74, and the fall of illuminance is prevented. On the other hand, in the above embodiment, the light axis angle of the light source unit 73 is automatically adjusted by detecting the light diffusion, but the relationship between the life irradiation time and the light diffusion is predicted, and each light source unit 73 is previously determined by the angle. Even if it adjusts inward, the utilization efficiency of light can be improved to some extent.

(2nd embodiment)

Next, with respect to the divided-sequential proximity exposure apparatus according to the second embodiment of the present invention, Figs. This will be described with reference to 19. In addition, since the split sequential exposure apparatus of this embodiment makes the basic structure the same as the split sequential proximity exposure apparatus of 1st Embodiment, the same code | symbol is attached | subjected to the same part, the description is abbreviate | omitted, and a different part is explained in full detail. .

As shown to FIG. 17, 18, in the division sequential exposure apparatus PE of this embodiment, the wavelength cut filter 186 is arrange | positioned in the cassette 81 in the front surface corresponding to the desired lamp 71, have. As the wavelength cut filter 186, any of a low pass filter, a high pass filter, and a band pass filter may be sufficient, and the ND (photosensitive) filter which reduces the intensity | strength of a desired wavelength may be sufficient. Moreover, it is preferable to provide the wavelength cut filter 186 by point symmetry, and in this embodiment, it is provided in six lamps of the upper end and six lamps of the lower end (the diagonal part of FIGS. 17 and 18). Thereby, the cassette 81 is configured with two kinds of light source portions 73 different in spectral characteristics. Hereinafter, the light source part 73 with the wavelength cut filter 186 is called the light source part 73A with a filter, and the light source part 73 without the wavelength cut filter 186 is called the light source part 73B without a filter.

As shown in FIG. 16, an opening 77a is formed in a part of the concave mirror 77, and a g line, a h line, an i line, a j line, a k line, or the like is formed behind the opening 77a. Each illuminometer 79 for measuring the illuminance of each wavelength in the apparatus is provided.

In addition, the optical control unit 76 measures in advance the respective spectral characteristics of the light source unit 73A with the filter and the light source unit 73B without the filter, in particular, the peak height of each wavelength, and stores it as a database. In addition, since the spectral characteristics change when the lamp 71 continues to be used, the light source parts 73A and 73B measure the illuminance at each wavelength of each light source part 73A and 73B without exposure. Do it.

In the light irradiation apparatus 80 configured as described above, the power and the number of lamps 71 to light up the respective light source units 73A and 73B are determined based on the results measured by the illuminometer 79. . Here, when the number of the lamps 71 to be lit is large, even if the method of turning off the lamp 71 is not point symmetrical, the influence on the exposure surface roughness distribution is small, but when the number of the lamps 71 to light is small, For example, when turning off about 50% of the 216 lamps 71, if the method of turning off the lamps 71 is not symmetrical, there is a possibility that the exposure surface roughness distribution is deteriorated. For this reason, it is preferable that the light source part 73A with a filter and the light source part 73B without a filter turn on the lamp 71 so that it may become point symmetry, respectively.

The light emitted from the mercury lamp 71 is generally incoherent light, and when the light reaches the exposure surface through an illumination optical system composed of the integrator lens 74, the concave mirror 77, or the like, the intensity is changed for each wavelength. Given as a sum. By forming the light source part 73A with a filter and the light source part 73B without a filter, the spectral intensity ratio in each wavelength can be controlled to some extent.

Here, the measurement test of illuminance was performed when the two types of lamps from which a spectral characteristic is used, and the wavelength cut filter were installed in the lamp with the same spectral characteristic. Specifically, in a test using two kinds of lamps having different spectral characteristics, when four first lamps are used, two first lamps are used when four second lamps with stronger intensity on the shorter wavelength side than the first lamps are used. And illuminance was measured when two second lamps were used. In the test with a wavelength cut filter, four second lamps are used, and when the wavelength cut filter is not installed, when the wavelength cut filter is installed in two lamps, the wavelength cut filter is installed in four lamps. In one case roughness was measured. The result at the time of using two types of lamps is shown in Table 1, and the result at the time of providing a wavelength cut filter is shown in Table 2.

In addition, as an illuminance meter used in this test, the UV integrated photometer UIT-250 by Ushio Electric Co., Ltd., and the light receiver UVD-S365 for measuring 365 nm, and the light receiver UVD-S313 for measuring 313 nm are used for the light receiving part, In these light-receiving parts, the intensity | strength of i line | wire (365 nm) and j line | wire (313 nm) in the center part of the 200 mm x 200 mm exposure surface was measured.

As a result, as shown in Table 1 and Table 2, it can be seen that by changing the number of DUV filters, the intensity at each wavelength can be changed in the same manner as when the type of lamp is changed.

Roughness (mW / ㎠) 365 (nm) 313 (nm) 4 first lamps 40.5 15.9 4 second lamps 34.9 23.0 2nd lamps
2nd lamp 2 37.8 19.4

Roughness (mW / ㎠) 365 (nm) 313 (nm) No DUV Filter 34.9 23.0 4 DUV Filters 32.1 1.02 2 x DUV filters 33.5 11.7

As described above, according to the exposure apparatus 80 and the exposure apparatus PE of the present embodiment, the predetermined number of light source units 73 including the lamp 71 and the reflector 72 and the predetermined number And a cassette 81 for supporting the light source unit 73 so that the light from the light source unit 73 is incident on the incidence plane of the integrator lens 74, and the predetermined number of light source units 73 have two different spectral characteristics. It is comprised by the light source part 73 of a kind. Thereby, the intensity | strength for every wavelength can be set freely, without replacing the light source part 73. FIG. In particular, each lamp 71 of the predetermined number of light source units 73 has the same spectral characteristics, and the predetermined number of light source units 73 has two kinds of different spectral characteristics by disposing the wavelength cut filter 186 in a part thereof. The light source unit 73 is configured. Thereby, the intensity | strength for every wavelength can be set freely, without replacing the light source part 73, and without using the light source part from which a spectral characteristic differs.

In addition, a plurality of cassettes 81 are provided, and a support 82 on which the plurality of cassettes 81 are mounted is further provided so that the light of all the light source portions 73 is incident on the incident surface of the integrator lens 74. By doing so, the lamp 71 can be unitized and managed, so that the replacement time of the lamp 71 and the down time of the device can be shortened. The light source portion 73 can be disposed on a single curved surface.

And according to the lighting control method and exposure method of the light irradiation apparatus for exposure apparatuses of this embodiment, the light irradiation apparatus 80 is the some light source part 73, the some cassette 81, and the support body 82 mentioned above. And an illuminometer 79 disposed downstream of the integrator lens 74 and measuring illuminance corresponding to the respective wavelengths, and an optical control unit for controlling the lighting / lighting off and illuminance of each lamp 71. 76 is provided. And the optical control part 76 controls each light source part 73 in the cassette 81 so that a desired illuminance may be obtained at a predetermined wavelength based on the illuminance corresponding to each wavelength measured by the illuminometer 79. . Thereby, the required lamp 71 can be turned on to set the intensity | strength in the wavelength component required for exposure freely, and the lifetime of the lamp 71 can be extended.

In addition, in the said embodiment, although two types of light source parts 73A and 73B from which a spectral characteristic differs are comprised using one type of wavelength cut filter 186, as shown to Fig.19 (a) and (b). Similarly, two kinds of wavelength cut filters 186a and 186b may be used to configure three kinds of light source portions 73A1, 73A2, and 73B having different spectral characteristics. For example, three kinds of light source portions 73A1, 73A2, and 73B may be configured as 8: 8: 8 as shown in Fig. 19A, and as shown in Fig. 19B, 10:10. You may comprise with 4 :. Also in these cases, it is preferable to configure three types of light source parts 73A1, 73A2, and 73B in point symmetry, and when the lamp 71 of FIG. 19A is turned off by the optical control unit 76, What is necessary is just to light it out by point symmetry, as shown to the part shown by the net of FIG.19 (c).

(Third embodiment)

Next, a proximity scan exposure apparatus according to a third embodiment of the present invention will be described with reference to FIGS. It demonstrates with reference to FIG.

As shown in FIG. 23, the proximity scan exposure apparatus 200 includes a plurality of masks in which a pattern P is formed on a substantially rectangular substrate W conveyed in a predetermined direction while approaching the mask M ( The light L for exposure is irradiated through M), and the pattern P is exposed and transferred to the board | substrate W. FIG. That is, the exposure apparatus 200 employs a scan exposure method in which exposure transfer is performed while the substrate W is relatively moved with respect to the plurality of masks M. As shown in FIG. In addition, the size of the mask used by this embodiment is set to 350 mm x 250 mm, and the X direction length of the pattern P corresponds to the X direction length of an effective exposure area | region.

As shown in FIGS. 20 and 21, the proximity scan exposure apparatus 200 floats and supports the substrate W and transports the substrate W in a predetermined direction (X direction in the drawing). A mask having a mechanism 120 and a plurality of mask holding portions 171 arranged in two rows in a zigzag shape along a direction (Y direction in the drawing) that holds a plurality of masks M and intersects with a predetermined direction. A plurality of irradiation units 180 as illumination optical systems that are respectively disposed on the holding mechanism 170 and the plurality of mask holding units 171 and irradiate the light L for exposure, a plurality of irradiation units 180, and a plurality of It is provided between the mask holding | maintenance parts 171, and is provided with the some light shielding device 190 which shields the exposure light L radiate | emitted from the irradiation part 180. As shown in FIG.

These board | substrate conveyance mechanism 120, the mask holding mechanism 170, the some irradiation part 180, and the light shielding device 190 are arrange | positioned on the apparatus base 201 provided in the ground via a level block (not shown). It is. Here, as shown in FIG. 21, in the area | region where the board | substrate conveyance mechanism 120 conveys the board | substrate W, the area | region where the mask holding | maintenance mechanism 170 is arrange | positioned above is used for mask arrangement | positioning area EA and mask arrangement area | region ( The region on the upstream side with respect to EA) is referred to as the substrate carrying-in region IA and the region downstream on the mask placement region EA is referred to as the substrate carrying-out region OA.

The board | substrate conveyance mechanism 120 is arrange | positioned on the carrying-in frame 105, the precision frame 106, and the carrying out frame 107 provided on the apparatus base 201 via another level block (not shown), and an aero substrate ( The floating unit 121 serving as the substrate holding unit for floating and supporting W) and the frame 109 provided on the apparatus base 201 via another level block 108 on the Y-direction side of the floating unit 121. It is arrange | positioned on the board | substrate, and is equipped with the board | substrate drive unit 140 which conveys the board | substrate W in an X direction.

As shown in FIG. 22, the floating unit 121 includes a plurality of long-shaped shapes in which a plurality of connecting rods 122 extending upward from the upper surface of the carry-out and precision frames 105, 106, and 107 are mounted on the lower surface, respectively. From the exhaust air pad 123 (refer to FIG. 21, 124) and the plurality of long intake and exhaust air pads 125a and 125b, and the plurality of exhaust holes 126 formed in each air pad 123, 124, 125a and 125b, respectively. Air suction system 132 and air suction for sucking air from air discharge system 130 for discharging air and pump 131 for air discharge, and intake holes 127 formed in the intake and exhaust air pads 125a and 125b. A pump 133 is provided.

In addition, the intake and exhaust air pads 125a and 125b have a plurality of exhaust holes 126 and a plurality of intake holes 127, and are provided between the support surface 134 and the substrate W of the air pads 125a and 125b. By adjusting the air pressure, the air pressure can be set with high precision at a predetermined floating amount, and can be horizontally supported at a stable height.

As shown in FIG. 21, the substrate drive unit 140 includes a holding member 141 for holding the substrate W by vacuum suction and a linear guide 142 for guiding the holding member 141 along the X direction. And the drive motor 143 and the ball screw mechanism 144 for driving the gripping member 141 along the X direction, and the frame 109 in the substrate loading area IA so as to protrude from the upper surface of the frame 109. A plurality of workpiece collision preventing rollers 145 which are mounted on the side of the back panel so as to be movable in the Z direction and rotate freely, and which support the lower surface of the substrate W waiting to be conveyed to the mask holding mechanism 170. do.

Moreover, the board | substrate conveyance mechanism 120 is formed in the board | substrate carrying-in side area | region IA, and the board | substrate prealignment mechanism 150 which performs prealignment of the board | substrate W waited in this board | substrate carrying-in side area IA, and And a substrate alignment mechanism 160 for aligning the substrate W. FIG.

As shown in FIG. 21 and FIG. 22, the mask holding mechanism 170 is formed for each of the mask holding portions 171 and the mask holding portions 171 described above, and the mask holding portion 171 is formed by X, And a plurality of mask driving portions 172 which are driven around the Y, Z, and θ directions, that is, the vertical direction with respect to the horizontal plane with the predetermined direction, the crossing direction, the predetermined direction and the crossing direction, and the normal of the horizontal plane.

The plurality of mask holders 171 arranged in two rows in a zigzag shape along the Y direction are arranged on the downstream side with the plurality of upstream mask holders 171a (six in this embodiment) arranged on the upstream side. It consists of several downstream mask holding | maintenance part 171b (6 in this embodiment) to become, and it is an upstream side between the column part 112 (refer FIG. 20) installed upright on both sides of the Y direction of the apparatus base 201. It is supported by the mask drive part 172 in the main frame 113 hypothesized by the two and downstream, respectively. Each mask holding part 171 has the opening 177 which penetrates in a Z direction, and the mask M is vacuum-suctioned by the lower surface of the peripheral part.

The mask driver 172 is mounted on the main frame 113, is mounted on the X direction driver 173 moving along the X direction, and is mounted on the tip of the X direction driver 173, and is driven in the Z direction. 174, the Y-direction driver 175 mounted to the Z-direction driver 174 and driving in the Y-direction, and the θ-direction driver 176 mounted to the Y-direction driver 175 and driven in the θ direction. The mask holding part 171 is attached to the front-end | tip of the (theta) direction drive part 176. As shown in FIG.

As shown in FIG. 24 and FIG. 25, the some irradiation part 180 is the light irradiation apparatus 80A, the integrator lens 74, and the optical control part which are comprised in the casing 181 similarly to 1st Embodiment. 76, a concave mirror 77, and an exposure control shutter 78, between the light source unit 73A and the exposure control shutter 78, and an integrator lens 74 and a concave mirror 77. And planar mirrors 280, 281, 282 disposed between them. In addition, in the concave mirror 77 or the planar mirror 282 as the folding mirror, a declination angle correction means capable of manually or automatically changing the curvature of the mirror may be provided.

The light irradiation apparatus 80A has three cassettes 81A, each including eight ultra-high pressure mercury lamps 71 and reflectors 72, including eight light source sections 73 in four columns and two rows in a linear shape. It has the aligned support 82A. Similarly to the first embodiment, in the cassette 81A, the lamp press cover 84 is attached to the light source support part 83 on which the eight light source parts 73 are supported, whereby 70% from each light source part 73. Each light source part 73 is positioned so that light of 100% of the irradiation amount can be incident on the integrator lens 74. Moreover, when each cassette 81A is attached to the some cassette mounting part 90 of the support body 82A, it is 70% from each light source part 73. Each cassette 81A is positioned so that 100% of the dose of light can be incident on the integrator lens 74.

Between the frame-shaped light source support part 83 and the bottom part of the lamp press cover 84, the optical-axis angle adjustment mechanism 99 which consists of a long male thread 97, the nut 97b, and the motor 98 is arrange | positioned. . In addition, in the photodetector 101 and the optical axis angle adjustment mechanism 99 which are disposed adjacent to the integrator lens 74, it is the first embodiment that the control device 102 is connected by an electric wire 103. same.

As shown in FIG. 22, the plurality of light blocking devices 190 has a pair of plate-shaped blind members 208 and 209 for changing the inclination angle, and the pair of blind members (blind drive unit 192). The inclination angles of 208 and 209 are changed. Thereby, in the vicinity of the mask M hold | maintained by the mask holding | maintenance part 171, while shielding the light L for exposure emitted from the irradiation part 180, and in the predetermined direction which light-shields the light L for exposure, The light shielding width, that is, the projection area seen in the Z direction can be made variable.

In addition, the proximity scan exposure apparatus 200 is held in the upstream and downstream mask holding portions 171a and 171b by driving a pair of mask tray portions (not shown) holding the mask M in the Y direction. While the mask changer 220 which replaces the mask M which has been set is formed, while positioning the mask M, the positioning pin (not shown) is masked by pushing and holding the mask M which is floated and supported with respect to the mask tray part 221 before replacing the mask. The mask prealignment mechanism 240 which performs prealignment by making contact with (M) is formed.

As shown in FIG. 22, the proximity scan exposure apparatus 200 includes a laser displacement meter 260, a mask alignment camera (not shown), a tracking camera (not shown), a tracking light 273, and the like. Detection means are arranged.

Next, the exposure transfer of the board | substrate W is demonstrated using the proximity scan exposure apparatus 200 comprised as mentioned above. In addition, in this embodiment, the pattern of any of R (red), G (green), and B (blue) is drawn with respect to the color filter board | substrate W on which the base pattern (for example, black matrix) was drawn. The case will be described.

The proximity scan exposure apparatus 200 lifts and supports the board | substrate W conveyed to the board | substrate loading area IA with the air from the exhaust air pad 123 by the loader etc. which are not shown in figure, and the board | substrate W After performing the pre-alignment operation and the alignment operation, the substrate W chucked by the gripping member 141 of the substrate driving unit 140 is conveyed to the mask placement area EA.

Thereafter, the substrate W moves in the X direction along the linear guide 142 by driving the drive motor 143 of the substrate drive unit 140. Subsequently, the substrate W is moved onto the exhaust air pad 124 and the intake and exhaust air pads 125a and 125b formed in the mask arrangement area EA, and is floated and supported in a state where vibration is eliminated as much as possible. And when the exposure light L is emitted from the light source in the irradiation part 180, this exposure light L passes through the mask M hold | maintained by the mask holding part 171, and exposes a pattern to the board | substrate W. As shown in FIG. Warriors

In addition, since the exposure apparatus 200 has a tracking camera (not shown) or a laser displacement meter 260, the relative position shift between the mask M and the substrate W is detected during the exposure operation, and thus the detected exposure apparatus 200 is detected. The mask drive part 172 is driven based on the relative position shift, and the position of the mask M is followed by the board | substrate W in real time. At the same time, the gap between the mask M and the substrate W is detected, and the mask driver 172 is driven based on the detected gap to correct the gap between the mask M and the substrate W in real time.

As described above, by performing continuous exposure in the same manner, the pattern can be exposed to the entire substrate W. FIG. Since the mask M held by the mask holding | maintenance part 171 is arrange | positioned in zigzag shape, even if the mask M hold | maintained by the mask holding | maintenance parts 171a and 171b of an upstream or downstream side is spaced apart and aligned, A pattern can be formed in the substrate W without a gap.

In addition, when cutting out several panel from the board | substrate W, the non-exposure area | region which does not irradiate exposure light L in the area | region corresponding between adjacent panels is formed. For this reason, during the exposure operation, the substrate W is transported in accordance with the transport speed of the substrate W so that the pair of blind members 208 and 209 are opened and closed so that the blind members 208 and 209 are located in the non-exposed areas. The blind members 208 and 209 are moved in the same direction as the direction.

Also in this embodiment, since a large current is supplied between the electrodes 95 and 96 of the ultrahigh pressure mercury lamp 71 during the exposure operation, the electrodes 95 and 96 are evaporated with the passage of the use time and light diffusion occurs. However, similarly to the first embodiment, the light diffusion is detected by the photodetector 101, and the optical axis angle adjustment mechanism 99 causes the optical axis LA of each light source portion 73 to face inward, thereby adjusting the optical axis angle. Adjust

Therefore, also in the proximity scan exposure apparatus like this embodiment, the light-diffusion apparatus 101 detects the spread of the light which generate | occur | produces with the passage of the irradiation time of each light source part 73, and the optical-axis angle adjustment mechanism 99 detects it. And 70? From each light source unit 73 by controlling the light irradiation apparatus 80 to correct the diffusion of the detected light. Light of 100% of the irradiation amount can be incident on the integrator lens 74 reliably, and the fall of illuminance can be suppressed.

(Fourth Embodiment)

Next, a proximity scan exposure apparatus according to a fourth embodiment of the present invention will be described with reference to FIGS. This will be described with reference to 27. In addition, since the proximity scan exposure apparatus of this embodiment makes the basic structure the same as the proximity scan exposure apparatus of 3rd Embodiment, the description is abbreviate | omitted by attaching | subjecting the same code | symbol to the same part, and the different part is explained in full detail. do.

In the proximity scan exposure apparatus 200 of this embodiment, as shown in FIG. 26, an opening 77a is formed in a part of the concave mirror 77 in the casing 181 of the plurality of irradiation units 180. Behind the opening 77a, each illuminometer 79 for measuring the illuminance of each wavelength in the g line, the h line, the i line, the j line, the k line, or the like is provided. In Fig. 26, reference numeral 195 denotes a lighting power supply, and reference numeral 196 denotes a control circuit.

The light irradiation apparatus 80A includes three ultra-high pressure mercury lamps 71 and reflectors 72 each having, for example, three cassettes 81 including 24 light source sections 73 in six columns and four rows. It has an aligned support 82A. Similarly to the first embodiment, in the cassette 81, the cassette press cover 84 is attached to the light source support part 83 on which the 24 light source parts 73 are supported, thereby providing 70%? Each light source part 73 is positioned so that the light of 100% of irradiation amount may be incident on the integrator lens 74. Moreover, when each cassette 81 is attached to the support body 82A, it is 70% from each light source part 73. Each cassette 81 is positioned so that 100% of the dose of light can be incident on the integrator lens 74.

Moreover, also in the light irradiation apparatus 80A of this embodiment, each light emitting part 71 of the predetermined number of light source parts 73 has the same spectral characteristic, and the predetermined number of light source parts 73 have a wavelength cut filter ( By arrange | positioning 186, the two types of light source parts 73 from which a spectral characteristic differs are comprised.

Therefore, also in the proximity scan exposure apparatus 200 like this embodiment, the light of the predetermined number of light source parts 73 and the predetermined number of light source parts 73 including the light emission part 71 and the reflection optical system 72 is And a cassette 81 for supporting the light source unit 73 so as to be incident on the incident surface of the integrator lens 74, wherein each lamp 71 of the predetermined number of light source units 73 has the same spectral characteristics and a predetermined number of The light source part 73 arrange | positions the wavelength cut filter 186 in the one part, and comprises two types of light source parts 73 from which a spectral characteristic differs. Thereby, the intensity | strength for every wavelength can be set freely, without replacing the lamp 71 and using the light source part from which a spectral characteristic differs.

In addition, this invention is not limited to embodiment mentioned above, A deformation | transformation, improvement, etc. are possible suitably. For example, in the said embodiment, although the division sequential proximity exposure apparatus and the scanning proximity exposure apparatus were demonstrated as an exposure apparatus, it is not limited to this, This invention is a mirror projection type exposure apparatus, a lens projection type exposure apparatus, and close_type exposure. Applicable to the device as well. Moreover, this invention can be applied to any exposure method, such as a batch type | mold, a sequential type, a scanning type.

This application is Japanese Patent Application No. 2010-165163, filed July 22, 2010, Japanese Patent Application No. 2010-191288, filed August 27, 2010, and Japanese Patent Application No. 2011-154669, filed July 13, 2011. It is based on a call, the contents of which are incorporated herein by reference.

12 ... Mask Retention Frame (Mask Retention Part)
21 ... Board Holder
70... Illumination optical system
71. Ultra high pressure mercury lamp (light emitting unit)
72. Reflector (reflective optics)
73, 73A, 73B... Light source
74. Integrator lens
80, 80A... Light irradiation apparatus for exposure apparatus
81, 81A... cassette
82, 82A... Support
83... Light source support
90... Cassette compartment
99. Optical axis angle adjustment mechanism
171. Mask holder
171a. Upstream Mask Holder
171b. Downstream mask holder
180... Irradiation unit (lighting system)
186. Wavelength cut filter
200 ... Proximity scan exposure device (exposure device)
LA… Optical axis
M… Mask
P… pattern
PE… Split sequential proximity exposure device (exposure device)
W… Substrate, Glass Substrate, Color Filter Substrate (Exposed Material)

Claims (8)

A plurality of light source portions each including a light emitting portion and a reflection optical system which gives directivity to the light generated by the light emitting portion and emits the light;
A plurality of cassettes each having a light source support portion for supporting the light source portion such that light of the predetermined number of light source portions is incident on an incident surface of the integrator lens;
A support having a plurality of cassette mounting portions on which the plurality of cassettes are respectively mounted so that the light of all the light source portions is incident on the incident surface of the integrator lens;
And an optical axis angle adjusting mechanism capable of adjusting an optical axis angle with respect to the integrator lens of each light source unit so as to correct diffusion of the light generated as the irradiation time of each light source unit elapses. Probe device. The method of claim 1,
The said predetermined number of light source parts are comprised by the several kind of light source part from which a spectral characteristic differs, The light irradiation apparatus for exposure apparatuses characterized by the above-mentioned. The method of claim 2,
Each light emitting part of said predetermined number of light source parts has the same spectral characteristics,
The said predetermined number of light source parts arrange | position a wavelength cut filter in the one part, and comprise the several kind of light source part from which a spectral characteristic differs, The light irradiation apparatus for exposure apparatuses characterized by the above-mentioned. A substrate holding part for holding a substrate as an exposed material;
A mask holding part for holding a mask so as to face the substrate;
The illumination optical system which has the said light irradiation apparatus as described in any one of Claims 1-3, and the integrator lens which injects the light radiate | emitted from the several light source part of this light irradiation apparatus,
And the substrate is irradiated with light from the illumination optical system with the mask interposed therebetween. A plurality of light source portions each including a light emitting portion and a reflection optical system which gives directivity to the light generated by the light emitting portion and emits the light;
A plurality of cassettes each having a light source support portion for supporting the light source portion such that light of the predetermined number of light source portions is incident on an incident surface of the integrator lens;
A support having a plurality of cassette mounting portions on which the plurality of cassettes are respectively mounted so that the light of all the light source portions is incident on the incident surface of the integrator lens;
Control of the light irradiation apparatus for exposure apparatus provided with the optical axis angle adjustment mechanism which can adjust the optical-axis angle with respect to the said integrator lens of each said light source part so that the spread of the light which generate | occur | produces with passage of the irradiation time of each said light source part may be provided. As a method,
Detecting the diffusion of the light generated as the irradiation time of each light source unit elapses;
And a step of correcting the diffusion of the light by the optical axis angle adjustment mechanism. The method of claim 5, wherein
An illuminometer disposed downstream of the integrator lens and measuring illuminance corresponding to each wavelength;
Further comprising a control unit for controlling the lighting, lighting, and illuminance of the light emitting unit,
The predetermined number of light source units is constituted by a plurality of light source units having different spectral characteristics,
The control unit controls each light source unit in the cassette so as to obtain desired illuminance at a predetermined wavelength based on the illuminance corresponding to each wavelength measured by the illuminometer. Control method. The method according to claim 6,
Each light emitting part of said predetermined number of light source parts has the same spectral characteristics,
The predetermined number of light source parts arrange | position a wavelength cut filter in the one part, and comprise the several kind of light source part from which a spectral characteristic differs, The control method of the light irradiation apparatus for exposure apparatuses characterized by the above-mentioned. A substrate holding part for holding a substrate as an exposed material;
A mask holding part for holding a mask so as to face the substrate;
The illumination optical system which has the said light irradiation apparatus as described in any one of Claims 5-7, and the integrator lens which the light radiate | emitted from the several light source part of this light irradiation apparatus injects,
The pattern formed in the said mask by irradiating the said light from the said illumination optical system with the said mask through the said mask, performing the control method of the said light irradiation apparatus in any one of Claims 5-7. Exposure transfer to said substrate.

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