TW201145488A - High holding voltage device - Google Patents

High holding voltage device Download PDF

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Publication number
TW201145488A
TW201145488A TW100105853A TW100105853A TW201145488A TW 201145488 A TW201145488 A TW 201145488A TW 100105853 A TW100105853 A TW 100105853A TW 100105853 A TW100105853 A TW 100105853A TW 201145488 A TW201145488 A TW 201145488A
Authority
TW
Taiwan
Prior art keywords
region
doped region
low
protection circuit
highly doped
Prior art date
Application number
TW100105853A
Other languages
English (en)
Chinese (zh)
Inventor
Wijmeersch Sven Van
Olivier Marichal
Original Assignee
Sofics Bvba
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sofics Bvba filed Critical Sofics Bvba
Publication of TW201145488A publication Critical patent/TW201145488A/zh

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Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D89/00Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
    • H10D89/60Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD]
    • H10D89/601Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs
    • H10D89/711Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using bipolar transistors as protective elements
    • H10D89/713Integrated devices comprising arrangements for electrical or thermal protection, e.g. protection circuits against electrostatic discharge [ESD] for devices having insulated gate electrodes, e.g. for IGFETs or IGBTs using bipolar transistors as protective elements including a PNP transistor and a NPN transistor, wherein each of said transistors has its base region coupled to the collector region of the other transistor, e.g. silicon controlled rectifier [SCR] devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D8/00Diodes
    • H10D8/80PNPN diodes, e.g. Shockley diodes or break-over diodes

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Thyristors (AREA)
  • Bipolar Integrated Circuits (AREA)
  • Emergency Protection Circuit Devices (AREA)
TW100105853A 2010-02-22 2011-02-22 High holding voltage device TW201145488A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US30665810P 2010-02-22 2010-02-22

Publications (1)

Publication Number Publication Date
TW201145488A true TW201145488A (en) 2011-12-16

Family

ID=44370630

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100105853A TW201145488A (en) 2010-02-22 2011-02-22 High holding voltage device

Country Status (6)

Country Link
US (1) US8653557B2 (enExample)
EP (1) EP2539934B1 (enExample)
JP (1) JP5904644B2 (enExample)
CN (1) CN102884624B (enExample)
TW (1) TW201145488A (enExample)
WO (1) WO2011101484A2 (enExample)

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Publication number Priority date Publication date Assignee Title
JP6187984B2 (ja) * 2012-02-07 2017-08-30 ソフィックス ビーヴィービーエー 交互伝導タイプの領域を有する静電放電保護用の半導体デバイス
CN102569294B (zh) * 2012-02-28 2016-01-13 北京燕东微电子有限公司 提高静电保护器件维持电压的方法
FR2987938A1 (fr) * 2012-03-12 2013-09-13 St Microelectronics Sa Dispositif electronique de protection contre les decharges electrostatiques, a structure concentrique
KR101975894B1 (ko) 2012-12-04 2019-08-28 삼성전자주식회사 정전기 방전 보호 장치
US9502890B2 (en) 2013-05-22 2016-11-22 Freescale Semiconductor, Inc. Protection device and related fabrication methods
US9129806B2 (en) 2013-05-22 2015-09-08 Freescale Semiconductor Inc. Protection device and related fabrication methods
JP6052068B2 (ja) * 2013-06-07 2016-12-27 株式会社デンソー 半導体装置の保護回路
US9543420B2 (en) 2013-07-19 2017-01-10 Nxp Usa, Inc. Protection device and related fabrication methods
US9685431B2 (en) * 2013-09-27 2017-06-20 Sofics Bvba Semiconductor device for electrostatic discharge protection
TWI548060B (zh) * 2014-04-23 2016-09-01 立錡科技股份有限公司 為高電壓積體電路提供靜電防護的矽控整流器
US9287255B2 (en) 2014-07-09 2016-03-15 Freescale Semiconductor Inc. ESD protection device and related fabrication methods
KR102238544B1 (ko) 2014-12-08 2021-04-09 삼성전자주식회사 정전기 방전 보호 장치 및 이를 포함하는 전자 장치
CN104538436A (zh) * 2015-01-05 2015-04-22 武汉新芯集成电路制造有限公司 一种高保持电压的可控硅整流器
EP3116027A1 (en) * 2015-07-10 2017-01-11 Nxp B.V. An electrostatic discharge protection device comprising a silicon controlled rectifier
CN105655333A (zh) * 2016-03-30 2016-06-08 中国电子科技集团公司第二十四研究所 一种高维持电压的双向scr保护结构
EP3451379A1 (en) * 2017-09-01 2019-03-06 NXP USA, Inc. Electrostatic discharge protection circuit with a bi-directional silicon controlled rectifier (scr)
CN109979931B (zh) * 2017-12-28 2020-11-10 无锡华润上华科技有限公司 一种双向静电放电保护器件
CN111785717B (zh) * 2019-04-04 2023-05-26 中芯国际集成电路制造(上海)有限公司 Scr静电保护结构及其形成方法
CN113497027B (zh) * 2020-04-03 2024-03-26 长鑫存储技术有限公司 半导体器件
EP3951884A1 (en) * 2020-08-05 2022-02-09 Nexperia B.V. A semiconductor device and a method of manufacture of a semiconductor device
CN117790500B (zh) * 2024-02-19 2024-05-10 成都芯翼科技有限公司 一种用于m-lvds端口的静电放电保护结构

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US6538266B2 (en) * 2000-08-11 2003-03-25 Samsung Electronics Co., Ltd. Protection device with a silicon-controlled rectifier
US6433368B1 (en) 2001-01-22 2002-08-13 National Semiconductor Corporation LVTSCR with a holding voltage that is greater than a DC bias voltage on a to-be-protected node
JP4005920B2 (ja) 2001-03-16 2007-11-14 サーノフ コーポレーション ラッチアップ耐性のための高保持電流を有する静電放電保護構造
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US8247839B2 (en) 2008-07-09 2012-08-21 Sofics Bvba ESD protection device with increased holding voltage during normal operation

Also Published As

Publication number Publication date
US8653557B2 (en) 2014-02-18
CN102884624B (zh) 2015-08-26
WO2011101484A2 (en) 2011-08-25
EP2539934A2 (en) 2013-01-02
JP2013520789A (ja) 2013-06-06
US20110204415A1 (en) 2011-08-25
CN102884624A (zh) 2013-01-16
EP2539934B1 (en) 2020-12-16
JP5904644B2 (ja) 2016-04-13
WO2011101484A3 (en) 2011-11-24

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