TW201108336A - Manufacturing method of semiconductor integrated circuit device - Google Patents

Manufacturing method of semiconductor integrated circuit device Download PDF

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Publication number
TW201108336A
TW201108336A TW099107105A TW99107105A TW201108336A TW 201108336 A TW201108336 A TW 201108336A TW 099107105 A TW099107105 A TW 099107105A TW 99107105 A TW99107105 A TW 99107105A TW 201108336 A TW201108336 A TW 201108336A
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TW
Taiwan
Prior art keywords
wafer
integrated circuit
semiconductor integrated
manufacturing
circuit device
Prior art date
Application number
TW099107105A
Other languages
English (en)
Inventor
Hiroshi Maki
Makoto Ise
Original Assignee
Renesas Tech Corp
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Publication date
Application filed by Renesas Tech Corp filed Critical Renesas Tech Corp
Publication of TW201108336A publication Critical patent/TW201108336A/zh

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    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
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    • H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
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  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Geometry (AREA)
  • Die Bonding (AREA)
  • Pressure Welding/Diffusion-Bonding (AREA)

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201108336 六、發明說明： 【發明所屬之技術領域】 本發明係關於一種有效適用於半導體積體電路裝置（或 半導體裝置）之製造方法之晶粒黏合技術之技術。 【先前技術】 於曰本特開2009-27054號公報（專利文獻1)，揭示有於具 有半導體晶片之凸塊電極之器件面（表側主面）具有接著膜 之狀態’以使器件面對向於配線基板之主面之方式接著之 狀態，使靜氣壓及熱作用於配線基板上，使接著膜硬化之 覆晶黏合法。 [先前技術文獻] [專利文獻] 專利文獻1:日本特開2009-27054號公報 【發明内容】 [發明所欲解決之問題] 近年來，記憶體器件、SIP(System in Package，系統級 封裝）製品等之半導體器件中，力多層有機配線基板之器 件搭載面上矩陣狀設置器件區域（單位器件區域）（即所謂 「基板品」）。因4匕，採用於各器件區域藉由將半導體晶 片例如階梯狀積層(例如從2層至16層)予以晶粒黏合，而： 高積體度之方法。 雖於該晶粒黏合時之半導體晶片之背面，設置⑽⑼e Attach Film，晶粒附著膜）等接著劑層，但先前之晶粒黏 合步驟或之後有必要成為接著劑層之接著狀態確實者。此 146729.doc 201108336 係因為下層之小空隙成為影響上層之大空隙並造成壓著不 良i最終有成為回流.龜裂等之可能性。因此有必要暫時 壓者接合’之後’進行積層處理(正式壓著），而抑制空 隙。此時’通常以押壓構件將晶片從上方下壓同時施加 熱’進行接著劑之硬化。 但’根據本申請案發明者之研究’已知伴隨晶片之薄膜 化’以此種機械性加壓方式，於積層晶片之積層處理中存 在種種問題。即，懸空(。verhang)狀態部分之晶片損傷、 彎曲及不均等之因加壓造成之晶片位置偏移等。又，於上 方無晶片之下層晶片中，亦有加壓力無法正常作用，益法 進行確實之積層處理等問題。只進行黏合之情形亦同樣於 懸空狀態下無法施加大荷重。又，亦有必要抑制因爽頭吸 著孔引起之空隙。 本發明係為解決該等問題而完成者。 本發明之目的在於提供_種信賴性高之半導體積體電路 裝置之製造方法。 本發明之則述及其他目的與新穎特徵可從本說明書之記 述及附加圖式了解。 [解決問題之技術手段] 對本申請案所揭示之發B月中之代表性者之概要如下所述 進行簡單說明。 即，本申請案之-發明，係於基板品之晶粒點合少驟 中，於電路基板上積層複數之半導體晶片予以暫時麈著 後’藉由靜氣壓實行積層處理。 146729.doc 201108336 [發明之效果] 對由本申請案揭示之發明 所述進行簡單說明。 中之代表性者獲得之效果如下 /娜T，於電路基板上積屏 數之半導體晶片予以暫時壓著後，藉由靜氣壓實行積；處 理’故即使最上層之晶片與下岸之a μ 4 曰地 乃/、r層之晶片彼此錯位黏合 亦可均等地加壓。 ’ 【實施方式】 [實施形態之概要] 首先，對於本申請案揭示之發明之代表性實施形態進A 概要說明。 订 1·包含以下步驟之半導體積體電路裝置之製造方法· (a)將於第i主面上具有複數之器件區域之電路基板，導入 晶粒黏合裝置内之步驟；（b)於前述晶粒黏合裝置内，於各 器件區域，將具有上層半導體晶片與其背面之接著劑層之 複數之晶片狀積層體以使其彼此錯位積層之方式固定之+ 驟；及（C)前述步驟（b)後，於前述晶粒黏合裝置内，以將 各晶片狀積層體加熱至第1溫度之狀態，對各晶片狀積層 體之露出表面作用均一之靜氣壓之步驟。 2.前述第1項之半導體積體電路裝置之製造方法中，進 而包含以下步驟：（d)於前述步驟（b)之後、前述步驟（^之 前’於前述晶粒黏合裝置内，以比前述第1溫度低之第i溫 度範圍内之狀態，對各晶片狀積層體之露出表面作用均— 之靜氣壓之步驟。 146729.doc 201108336 3.前述第1或第2項 ^ _ 牛導體積體電路裝置 中，前述接著劑層係Da 製 4.前述第1至第3中 釁 4 —項之半導體積體電絡裝I 古…一一 狀積廣艘收 半導體積體電 製 ^法中’前述步驟⑷係以將前述複數之晶片 容於单一密閉室之狀態實行。 5·前述第2至第4中权= 姑f之 任—項之半導體積體電絡裝露 造方法中，前述步驟⑷係以將前述複數之晶片狀積廣^ 容於單一密閉室之狀態實行。 述第頁之半導體積體電路裝置之製造方法中 述步驟⑷係以收容於與前述步 之前述密閉家 狀態實行。 7·前述第1至第3中任-項之半導體積體電絡装置- 造方法中，前述步驟⑷係以將前述複數之晶片狀積廣艘 前述電路基板—併收容於單 8. 刖述第1至第3中任-項之半導體積體電路裝置之 造方法中’前述步驟⑷係以將前述複數之晶片狀積廣艘 前述料基板—併收容於單1閉室之狀態實行。 9. 則述第8項之半導體積體電路裝置之製造方法中’ 述步驟⑷係、以收容於與前述步驟⑷相同之前述密閉室 狀態實行。 10.前述第1至第9中任—項之半導體積體電路裝置之製 以方法中’刖述複數之晶片狀積層體係積層成階梯狀。 Π·別述第1至第1〇中任—項之半導體積體電路裝置之製 造方法中，前述靜氣壓係靜空氣壓。 146729.doc 201108336 12.前述第1至第11中任—瑁 項之+導體積體電路裝置之製 造方法中’各半導體晶片之厚 厚度係75微米以下、5微米以 上0 13·前述第i至第U中任1之半導體積體電路裝置之製造 方法中’各半導體晶片之厚度係5〇微来以下、5微来以上。 14.刖述第1至第"中任—項之半導體積體電路裝置之製 造方法中’各半導體晶片之厚度係％微米以下、$微米以 上。 5.刖述第1至第Μ中任一項之半導體積體電路裝置之製 造方法中’前述電路基板係有機系電路基板。 月J述第1至第15中任一項之半導體積體電路裝置之製 造方法中’前述接著劑層係以熱硬化性樹脂為主要成分。 17. 月〕述第2至第16中任一項之半導體積體電路裝置之製 造方法中，則述步驟（b)係以使前述半導體晶片處於前述第 1溫度範圍内之狀態實行。 18. 則述第1至第17中任一項之半導體積體電路裝置之製 造方法中’前述第1溫度係攝氏70度至攝氏160度。 19. 則述第1至第18中任一項之半導體積體電路裝置之製 过方法中，則述第1溫度範圍係常溫至攝氏100度。 月1J述第1至第18中任一項之半導體積體電路裝置之製 这方法中’則述第1溫度範圍係攝氏60度至攝氏100度。 [申請案之記載形式、基本用語、用法之說明] 於本申請案中，實施形態之記載雖根據需要存在方 便起見分成複數片段記載之情形，但除特別明示並非如此 146729.doc 201108336 之情形，該等並非彼此獨立之單獨個體，作為單一例之各 部分，一方係另一方之局部詳細或一部分或全部之變平 例。又，原則上省略重複同樣部分。又，實施形態之各構 成要素並未特別明示之情形，除理論上限定其數量之情形 及文中明確不同於此之情形，並非必須。 此外，本申請案中’所謂「半導體積體電路裝置」，主 要係以各種晶體管（主動元件）為中心，將電阻、電容器等 積體於半導體晶片等（例如單晶矽基板）上。 2.同樣於實施形態等之記載，對於材料、組成等，以 及「由A構成之X」等’除特別明示並非如此之情形及從 文中明確並非如此之情形，並非排除A以外之要素為主要 構成要素之-者。例如’關於成分，係、「包含以a為主要 成分之X」等之意味。例如，即使所謂「矽構件」等，並 非限定於純粹之矽，亦可為以8丨以合金或其他矽為主要成 分之多7C合金，亦包含其他添加物等之構件。 位置 屬性等，雖有較好之 乂同樣，關於圖形 示’但，除特別明示並非如此之情形及文中明確並非如 之情形，無疑並非嚴密地限定於此。 此外，5及特定之數值、數量時，除特別明示並 此之情形、理論上限定於該數之情形及文中明確並非 數值之數值，亦可為不足: q卞守通積骽電路裝置（4 裝置、電子裝置亦相 Μ 係指其上形成之單晶妙 146729.doc 201108336 無疑亦包含磊晶晶圓、SOI基板、LCD玻璃基板等絕緣基 板與半導體層等之複合晶圓等。於本申請案中，不僅分離 成各個晶片之前者’亦為藉由切割等分離，貼著於切割帶 等者，作為晶片之集合體亦有稱為「晶圓」之情況。 6.氣壓之表示係以標準大氣壓’即ι.〇13χ1〇5 為基準 加以表示。 [實施形態之詳細] 對實施形態進行進一步詳述。於各圖中，同一或同樣之 部分以同一或類似之記號或參考編號顯示，說明原則上不 重覆。 又，於附加圖式’相&，於煩雜之情形或與空隙之區別 明確之情形，存在即使剖面亦省略陰影線等之情形。與之 關聯，於從說明等明確之情形等，即使平面性閉合之孔， 亦存在省略背景之輪_之情形。此外，即使並非剖面， 存在為明示非空隙，標以陰影線之情形。 又，關於晶粒黏合之晶片之剝離，亦即關於晶粒選取步 驟等之細節，因詳細記載於本申請案發明者等之日本專利 第綱8·299643號（日本申請日細8年叫Μ日）、日本專利 第2_-137631號（日本巾請日2_年5月27日卜日本專利 第2_-_965號（日本t請日_年4月8日）及盆對應之美 國專利公開2〇〇8-〇3 18346號公報（公開日2008年12月Μ 曰），故本申請案原則上除特 j I之情形外不重複該等 部分之說明。 1.本申請案之一實施形態之半導體 一心干等髖積體電路裝置之製 146729.doc 201108336 造方法所使用之黏晶機等之說明（主要從圖3至圖6) 圖3係本申請案之一實施形態之半導體積體電路裝置之 製造方法所使用之黏晶機5丨之正面模式圖。 首先，基於圖3’說明本申請案之一實施形態之半導體 積體電路裝置之製造方法所使用之黏晶機之重要部份之概 要。如圖3所示，黏晶機5 1 (晶粒剝離及黏合裝置）之外罩， 由下部基體63、上部基體64及連接該等之支柱65等構成。 於下部基體63上之晶片剝離部66，設置晶圓支座用χγι 作台69，於其上載置保持晶圓丨（通常已分割成各個晶片）之 晶圓支座70。 另一方面，於上部基體64之下面，設置晶粒黏合頭用 XY工作台69,於其上設置晶粒黏合頭73。又，於晶粒黏 合頭73之下端，設置用於真空吸著半導體晶片2(圖4)等之 吸著夾頭74(晶片保持具）。 再者於下。卩基體52之上面後部，設置用於搬送電路基 板3之一對基板搬送路71，於該等之間之暫時壓著部π: 設置用於實行晶㈣合（暫時料）之晶辣合王作台72(暫 時壓著工作台）。 13 又，於靜壓加壓部（正式熱壓著部）68，設置作為開閉： 密閉箱之靜壓加壓室（積層處理室）54。 圖4係顯示設於圖3之黏晶機之晶粒點合頭之下端部之$ 著夹頭74之構造之剖面圖。如圖4所示，吸著夫頭74“ 如上部之金屬等構成之橡膠晶片保持部％、及安裝於 部之橡膠晶片75等構成，於夂白夕咖4r? ^ 成於各自之内部， 146729.doc 201108336 77、78，對半導體晶片2之上面2a(器件面）真空吸著。該橡 膠晶片75可例示為例如「簫氏（Shore) A」硬度為50左右之 熱硬化性橡膠（亦可為熱塑性橡膠等，惟其中熱硬化性構 件較不易受到熱之影響）等彈性體為主要構成要素者。 又，作為硬度之較好之範圍，可例示為30至70。又，吸著 夾頭74亦可為幾乎整體為硬質金屬等構成者。惟，一般以 使用如此處所示之橡膠晶片7 5者，於空隙等晶粒黏合特性 上較為良好。 於牛V體μ片2之下面，形成接著劑層5，即DAF(Die Attach Film，晶粒附著膜），以半導體晶片2、接著劑層 5(厚度例如20微米左右）等構成晶片狀積層體1J。 圖5係圖3之黏晶機之靜壓加壓部（正式熱壓著部）之側剖 面圖，圖6係圖3之黏晶機之靜壓加壓部68(正式熱壓著部） 之靜壓加壓室54(積層處理室）周邊之正剖面圖。如圖5及圖 6所示，於靜壓加壓室54内，將電路基板（有機多層配線基 板）3設於用於使其器件面3a向上保持之電路基板工作△ 55。又，對於電路基板3、更具體而言對於加熱半導體: 片2之機構，雖存在各種各樣之變化，但就速度方 言，以遠紅外加熱器62a、62b之任一者為有利^為^ 之配置，有例如外部遠紅外加熱器62a之方式，於靜壓 壓室54之上面設置透明窗61，且 ^ ° 於外。卩放置外部遠紅外加 熱器62&之做法’與如内部遠紅外加熱器叫之方式 於靜壓加壓室54之内部之做法。其中，以外部遠L外加= 器62b就降溫速度之點而言較有利。又 ·、、、 1F兩間易之做 146729.doc 201108336 /去亦存在於電路基板工作台55之内部或下部等放置加熱 框6 2 c之做法。 靜壓加壓至54藉由靜壓加壓室開閉機構56開閉，使電路 基板3可收容、排出’靜壓加壓室開閉機構56之内部可藉 由其與加壓空氣源57(高壓空氣源）之間連接之空氣壓調整 β 58( a又疋必要之最大氣壓）、電磁開閉閥59(電性控制開 閉）、電空調壓閥(附壓力感測器之自動壓力調整電磁閥州 等而設定為期望之氣壓。此處，電空調壓閥6〇藉由其輸出 側之壓力感測器而重複進行開/閉，將動作中之靜壓加壓 室54内保持在特定之加壓狀態。 2.本申請案之-實施形態之半導體積體電路裝置之製造方 法中之組裝步驟之概要說明（主要係圖i、圖2及圖8至圖⑺ 如圖8至圖17等所示者，雖為微犯之例，但其縱為⑴ 毫米左右’橫為19.2毫米左右，若積層為階梯狀，則存在 與其積層片數成比例而累積晶片配置誤差之傾向。現在之 積層片數’即使為16層左右之高度積層構造亦不算罕見， 對晶粒黏合之精度提高之要求越來越高。對該晶粒黏合之 位置精度之提高之要求，並非限於微SD，MAP(副 A"ay Pr〇Cess ’模製陣列製程）等亦同樣。X，並非限於階 梯狀積層，積|品同樣成為重要問題。 此處’基於圖1、圖2及圖s ^ 圖8至圖，說明包含晶粒黏合 步驟之組裝步驟之概要。首先，說明1之晶粒黏合步驟 101。該步驟於圖3所說明之晶粒黏合裝置51内進行。 首先’如圖2所示，將電路基板3裝載於晶粒黏合裝置 146729.doc 201108336 5 1 (基板裝載步驟11 〇)。然後’如圖2所示，使電路基板3於 暫時壓著工作台72上移動，實行暫時壓著處理i n。即， 如圖8所示’為從真空吸著於晶粒黏合裝置5 1之晶片剝離 部66之晶圓工作台（晶片剝離工作台）7〇之切割帶12上所粘 著之複數之晶片2中剝離作為目的之晶片而使吸著夾頭 74(更正確而言係圖4之橡膠晶片75之下面）著地於目的晶片 2之盗件面2a。又，於晶片2之器件面2a，設置例如鋁系之 接合墊7等。 然後，如圖9所示，使吸著夾頭74上昇，使晶片2從切割 帶12完全剝離。更正確地而言，係使由半導體晶片2、接 著劑層5等構成之晶片狀積層體丨丨從切割帶丨2完全剝離。 然後，如圖10所示，伴隨晶粒黏合頭73(圖3),使保持 晶片狀積層體11之吸著夾頭74朝向放置於暫時壓著部67之 暫時C著工作台72上之配線基板3下降。於配線基板3之器 件面3a上之各個器件區域4(單位器件區域），設置複數之外 部導線6等。X，於暫時壓著工作台72之下部或内部設置 加熱塊81等之加熱機構，可加熱保持於自常溫至攝氏 度左右（溫度係以加熱塊之設定溫度顯示）。該暫時壓著之 步驟中’通常，於常溫範圍（攝氏15度至35度）至攝氏⑽度 之溫度範圍實施，從接著劑層5等熱履歷之觀點而言，係 車又好。又’右超過攝氏1GG度，因接近作為通用基板材料 (有機系電路基板之情形）之玻璃環氧樹脂之玻璃轉移溫度 (攝氏130度左右），故存在熱應變增大等之問題。又，為柔 軟地對應於各種接著劑材料，暫時壓著之溫度範圍亦有下 146729.doc -】3· 201108336 限適當地為6 0度或7 0度之情形。此處，加熱塊8 1之設定溫 度係例如攝氏80度左右（作為較好的範圍係攝氏60度至攝 氏1 〇〇度左右）。當然’該等問題少時，亦可設定為常溫至 攝氏160度左右之大範圍。 然後，如圖11所示，藉由加熱塊8 1，使保持晶片狀積層 體11於加熱保持至攝氏80度左右之暫時壓著工作台72上之 配線基板3之器件面3a上之吸著夾頭74著地，就此保持黏 &荷重一疋時間。黏合荷重係例如〇. i百萬帕斯卡左右（較 好之範圍係0.05至0.2百萬帕斯卡左右），保持時間（荷重施 加時間）係例如1秒左右（較好之範圍係〇 〇5至2秒左右）。 如圖1 2所示，重覆如此之剝離與晶粒黏合，於最初之器 件區域4積層特定之積層片數（此處雖為4片，但通常根據 需要從2片至10片左右之中選擇）結束後，如圖13所示，移 至其他器件區域4(通常係鄰接者），同樣地重覆剝離與晶粒 黏：：依次實行特定積層片數之暫時壓著，最後完成預定 之全器件區域4之積層暫時壓著。 圖14係圖13之各器件區域4之放大圖（電路基板上之圖案 :略)’圖15係對應於圖14之【又，剖面之模式器件及裝置 =二=屬積層單位15之半導體晶片2(晶片狀 夕)係積層為階梯狀。若屬於第1積層單位15之半導 體晶W晶片狀積層體U)、结束後，移往正 :： 層處理）112(圖2)，但對於正式壓著處理（積層處理)u 於第3部分銳明L ^ 、顸增慝理）112， %二 故此處對其之後之步驟進行說明。 正式壓著處理（積層處理川2結束（晶粒黏合步驟101結 146729.doc •14: 201108336 束）後，如圖1所示，卸載配線基板3(圖2之基板卸載步驟 119) ’移送至線黏合裝置52。如圖16所示實行線黏合步驟 102。此處，線8係例如金系之黏合線。又，亦可為銅系或 銘糸之黏合線。 線黏合步驟1 02結束後，如圖1所示，配線基板3移送至 樹脂封裝裝置53，如圖17所示實行封裝步驟1 〇3。此處， 樹脂封裝體（封裝樹脂部）9包含以例如環氧樹脂系樹脂作為 主要成分之一。 3.作為本申請案之一實施形態之半導體積體電路裝置 之製造方法之重要部份之晶粒黏合步驟之詳細說明（主要 以圖1、圖2、圖3、圖5至圖7、圖15及圖18) 圖2係顯示作為本申請案之一實施形態之半導體積體電 路裝置之製造方法之重要部份之晶粒黏合步驟之詳細之步 驟流程方塊圖。圖7係顯示圖2之正式壓著處理（積層處理） 之製程順序之一例之詳細製程順序圖。該部分中，對第2 部分所說明之圖1之晶粒黏合步驟1〇1内之正式壓著處理 (積層處理）112(圖2)進行說明。 如圖2、圖5、圖6(此處對作為加熱機構僅為外部遠紅外 線加熱器62a與加熱框62c之情形進行說明）及圖7所示，結 束暫時壓著處理111後’於時間11，打開靜壓加壓室5 4， 接收電路基板3至其電路基板工作台55上，閉鎖靜壓加壓 室54。從該tl至t2之時間係例如5秒左右。 然後，於時間t2，靜壓加壓室54之加壓為開啟狀態，該 狀態保持至時間t3(氣相靜壓加壓步驟115) ^此時之電路基 146729.doc -15- 201108336 板工作台55之設定溫度（氣相靜壓加壓溫度T2或正式熱壓 著前處理溫度）係例如常溫（攝氏25度左右）^從該t2至t3之 時間，係例如2秒左右（作為較好之範圍，可例示1秒至1〇 秒左右）。又’加壓為開啟狀態之靜壓加壓室54内之氣壓 (以下之開啟狀態亦相同）係例如0.2百萬帕斯卡左右。作為 較好之範圍’可例示為〇.〇5百萬帕斯卡至〇 6百萬帕斯卡左 右。又，氣相靜壓加壓溫度T2，從接著劑層5之熱履歷之 觀點而言’雖宜為常溫區域’即攝氏15度至35度左右，但 一般為對應於多用之接著劑，較好地為於攝氏6〇度或攝氏 70度至1〇〇度左右之第！溫度範圍尺〗，（相對高溫範圍）進行。 從而’作為充分考慮接著劑特性之情形之氣相靜壓加壓溫 度T2可適用之第1溫度範圍^^，可例示從攝氏ι5度至1〇〇度 左右。 然後於時間t3，外部遠紅外線加熱器62a成為開啟狀 態’使電路基板3上之各半導體晶片2開始昇溫，於時間14 到達第1溫度τι(積層溫度或正式壓著溫度）。從該13至14之 時間例如5秒左右。積層溫度係例如攝氏丨5〇度左右。作為 較好之範圍，可例示攝氏7〇度至1 6〇度左右。 然後，維持該狀態至時間t5(氣相靜壓熱壓’著步驟丨丨6)。 從該t4至t5之時間（正式熱壓著處理時間）例如8秒左右。作 為該正式熱壓著處理時間之較好之範圍，可例示2秒至60 秒左右。 然後’於時間t5，外部遠紅外線加熱器62a成為關閉， 各半導體晶片2開始降溫，於時間t6，降低至與氣相靜壓 146729.doc 16 201108336 加壓溫度（正式熱壓著前處理溫度）T2相同之溫度。該6至 t6之時間例如3秒左右。
接著，幾乎同時地於時間t6，靜壓加壓室54之加壓成為 關閉狀態（常壓）（壓力釋放117)，於時間t7，靜壓加壓室M 開啟’將電路基板3開始向靜壓加壓室54外#出。從該t6 至t7之時間例如2秒左右。 然後，於時間t8，結束電路基板3向靜壓加壓室54外之 取出。從該t7至t8之時間例如5秒左右。 藉由包含如此之氣相靜壓熱壓著步驟丨丨6(圖2)之晶粒黏 合方法’如圖15或圖18, gj晶片2即使對於成為懸空部分 亦自上下幾乎作用同樣之均一壓力，故不會發生彎曲或龜 裂。又，由於晶片成為階梯狀，對於上方無其他晶片之部 分亦自上方作用幾乎相同之均一壓力，故亦對於該等部分 進仃均一之接著。又，在機械性押壓下，容易作用水平方 向之偏差力，因而會有發生晶片水平偏移之虞，但在本情 形時因水平方向之壓力於晶片2(晶片狀積層體u)之前後左 右平衡’故不會發生水平方向之位置偏移。 又，如圖2及圖7所示’若於氣相靜壓熱壓著處理116之 前，實施氣相靜壓加壓處理115(正式熱壓著前處理），則可 藉由氣相靜壓加壓處理115充分排除接著劑層5内部及接著 劑層5與被接著面間之空氣層或氣泡等後，於氣相靜壓熱 壓著處理116中進行接著劑層5之硬化（接著劑層5以熱硬化 性树脂為主要成分之情形），故可實現無空隙等之強固之 晶粒黏合。如此氣相靜壓加壓處理115雖非必須，但若附 146729.doc 201108336 加’將有助於晶粒黏合特性之提古 理11 5亦無必要為獨立之步驟 (t3至t4)一體而導入。 又，氣相靜壓加壓處 亦可作為與圖7之昇溫步驟 如圖2及圖15所不’即使只由暫時壓著處理形成之比較 弱之接著狀態之夕重積層晶片，因以氣相靜壓加壓處理 (或對該處理附加加熱)實行正式壓著處理ιΐ2(積層處理）， 故即使為比較不料之構造，亦可不受限於晶片面積或具 體積層構造而施加均一加壓。 又，因正式壓著處理112(積層處理）可一併實行，故相較 於機械式地針對每㈣劃或每數㈣劃實行正式壓著處理 112(積層處理）之情形，可大幅改善產出效能。 附加加熱）實行如此之 於薄膜晶片，即晶片 又’晶片之厚度在50 晶片之厚度在30微米 又，以氣相靜壓加壓處理（或對其 正式壓著處理112(積層處理）之方法， 之厚度在75微米以下之情形為有效。 微米以下之情形’特別有效，此外， 以下之情形，就確保信賴性方面特別有效。又晶片之厚 度下限雖亦依存於器件之種類，但若為通常之積體電路， 則可考慮為5微米。 4.於本申請案之一實施形態之半導體積體電路裝置之 製造方法，顯示更多重積層情形之一例之組裝步驟之概要 說明（主要從圖丨8至圖2〇) 該部分中’於第2部分說明之組裝步驟，對積層片數更 多情形之處理順序之一例進行說明。於積層片數更多之情 形，如圖16所示，線黏合步驟102結束時刻（若為合併圖i 146729.doc -18- 201108336 之晶粒黏合步驟101及線黏合步驟102成為黏合步驟1〇4， 則為接合步驟104之結束時刻），再次使電路基板3返回至 同一或同樣之另一晶粒黏合裝置51，實行晶粒黏合步驟 101。即，例如，如圖18所示，於屬於第！積層單位15之最 上位置之半導體晶片2(最上位置之晶片狀積層體上，反 轉晶片2之配向，使屬於第2積層單㈣之肖定片數（此處 為與第1積層單位丨5之片數相同）之半導體晶片2與先前之 第1積層單位15之半導體晶片2(晶片狀積層體u)同樣，實 行晶粒黏合步驟101 (暫時壓著及正式壓著）。 然後如圖19所示，將電路基板3移送至與先前同一或相 同之另一線黏合裝置52,實行線黏合步驟1〇2。即，若有 必要，則重覆該黏合步驟1〇4 ,將必要之所有半導體晶片 2(晶片狀積層體11)Z字形階梯狀積層晶粒黏合。之後，如 圖20所示’實行樹脂封裝步驟丨〇3。 5.總結 以上雖對由本發明者完成之發明基於實施形態進行具體 說明’但本發明並非侷限於此者，無疑在不脫離其要旨之 範圍内可進行各種各樣之變更。 例如’前述實施形態中’雖以階梯狀積層晶片之情形為 例進行具體地說明，但本申請案發明並非限定於此者無 疑亦可適用於其他積層方法之情形。 【圖式簡單說明】 圖1係顯示本中請案之-實施形態之半導體積體電路裝 置之製造方法之組㈣程整體流程之製程流程方塊圖； H6729.doc -19- 201108336 圖2係顯示本申請案之一實施形態之半導體積體電路裝 置之製造方法之重要部份之晶粒黏合步驟之細節之步驟流 程方塊圖； 圖3係本申請案之一實施形態之半導體積體電路裝置之 製方法所使用之黏晶機之正面模式圖； 圖4係顯示設於圖3之黏晶機之晶粒黏合頭之下端部之吸 著夾頭構造之剖面圖； 圖5係圖3之黏晶機之靜壓加壓部（正式熱壓著部）之側剖 面圖； 圖6係圖3之黏晶機之靜壓加壓部（正式 加®室（積層處理室）周邊之正剖面圖； 圖7係顯示圖2之正式壓著處理（積層處理）之製程順序 一例之詳細製程順序圖； 圖8係顯示圖3之黏晶機之晶片剝離部之晶圓工作 片剝離工作台)上之剝離製程之器件及裝置模式剖面： 圖（用於剝離之夾頭著地）；
圖9係顯示圖3之黏晶機之晶片剝離部之晶圓工作 片剝離工作台）上之剝離製程之 D 圖（剝離結束）； /1〇係顯示圖3之黏晶機之暫時壓著部之暫時壓著工 。上之暫時壓著製程之器件及裝’ 晶粒點合之夾頭降下)； 式—⑷ 圖11係顯示圖3之黏晶機之暫時 A μ ^ $者。卩之暫時壓著 «上之暫時壓著製程之器件及裝 吋I者工4 146729.doc -20. 201108336 晶粒黏合之夹頭著地）； 圖12係顯示圖3之黏晶機之暫時壓著部之暫時壓著工作 台上之暫時壓著製程之電路基板之上面圖(於最初之器件 區域晶片之積層固定結束時刻）； 圓13係顯示圖3之黏晶機之暫時壓著部之暫時壓著工作 台上之暫時壓著製程之電路基板之上面圖(於所有器件區 域晶片之積層固定結束時刻）； 圖14係圖13之各器件區域之放大圖（省略電路基板上之 圖案）； 圖15係顯示圖3之黏晶機之暫時壓著部之暫時壓著工作 口上之暫時壓著製程之器件及裝置模式剖面流程圖（第】積 層單位之晶片積層結束時刻）； 圖16係顯示打線機之線黏合工作台上之線黏合製程之繼 圖15之後之益件及裝置模式剖面流程圖（第丨積層單位之晶 片積層後之線黏合結束時刻）； 圖17係顯示樹脂封裝裝置内之樹脂封裝狀態之繼圖“之 後之器件模式刮面流程圖； 圖18係於更多段積層之情形之對應於圖15之器件及裳置 模式剖面流程圖（第2積層單位之晶片積層結束時刻）； 圖19係於更多段積層之情形之對應於圖16之器件及裝置 模式剖面流程圖（第2積層單位之晶片積層後之線黏合結束 時刻）；及 圖20係於更多段積層之情形之對應於圖丨7之器件模式剖 面流程圖（樹脂封裝）。 146729.doc 21 201108336 【主要元件符號說明】 1 半導體晶圓 2 半導體晶片 2a 半導體晶片之器件面 3 電路基板（有機多層配線基板） 3a 電路基板之器件安裝面（第1主面） 4 器件區域 5 接著劑層 6 外部導線 7 接合墊 8 接合線 9 樹脂封裝體（封裝樹脂部） 11 晶片狀積層體 12 切割帶 15 第1積層單位 16 第2積層單位 51 晶粒黏合裝置 52 線黏合裝置 53 樹脂封裝裝置 54 靜壓加壓室（積層處理室） 55 靜壓加壓室之電路基板工作台 56 靜壓加壓室開閉機構 57 加壓空氣源 58 空氣壓調整器 146729.doc -22- 201108336 59 電磁開閉閥 60 電空控制器（附壓力感測器之自動壓力調整 電磁闕） 61 透明窗 62a 外部遠紅外線加熱器 62b 内部遠紅外線加熱器 62c 靜壓加壓室之加熱框（陶瓷加熱器） 63 下部基台 64 上部保持體（上部基體） 65 支柱 66 晶片剝離部 67 暫時壓著部 68 靜壓加壓部（正式熱壓著部） 69 XY工作台 70 晶圓工作台（晶片剝離工作台） 71 基板搬送路 72 暫時壓著工作台 73 晶粒接合頭 74 吸著夾頭 75 橡膠晶片 76 橡膠晶片保持部 77 ' 78 真空吸引孔 81 暫時壓著工作台之加熱框 91 線黏合工作台 146729.doc -23- 201108336 101 晶粒黏合步驟 102 線黏合步驟 103 封裝步驟 104 黏合步驟 110 基板裝載 111 暫時壓著處理 112 正式壓著處理（積層處理） 115 氣相靜壓加壓（正式熱壓著前處理） 116 氣相靜壓熱壓著 117 壓力釋放 119 基板卸載 R1 > Rl' 第1溫度範圍 R2 正式熱壓著溫度範圍 R3 常溫區域（室溫範圍） T1 第1溫度（積溫度） T2 氣相靜壓加壓溫度（正式熱壓著前處理溫度） tl 基板裝載開始時間 t2 加壓開始時間 t3 昇溫開始時間 t4 高溫到達時間 t5 降溫開始時間 t6 減壓開始時間 XI 基板卸載開始時間 t8 基板卸載結束時間 146729.doc -24-

Claims (1)

  1. 201108336 七、申請專利範圍： 1. 一種半導體積體電路裝置之製造方法，包含以下步驟： (a)將於第1主面上具有複數之器件區域之電路基板，導 入晶粒黏合裝置内之步驟；（b)於前述晶粒黏合裴置内， 於各器件區域，將具有上層半導體晶片與其背面之接著 劑層之複數之晶片狀積層體以使其彼此錯位積層之方式 固疋之步驟；及（c)前述步驟（b)後，於前述晶粒黏合裝置 内’以將各晶片狀積層體加熱至第1溫度之狀態，對各 晶片狀積層體之露出表面作用均一之靜氣壓之步驟。 2. 如請求項1之半導體積體電路裝置之製造方法，其進而 包含以下步驟：（d)在前述步驟（b)之後、前述步驟（^之 刖’於前述晶粒黏合裝置内，以處於比前述第丨溫度低 之第1溫度範圍内之狀態，對各晶片狀積層體之露出表 面作用均一之靜氣壓之步驟。 3. 如請求項2之半導體積體電路裝置之製造方法，其中前 述接著劑層係DAF。 4·如請求項3之半 π肚很瓶电路裝置〜衣通乃凊，艾中育 述步驟⑷係以將前述複數之晶片狀積層體收容於單 閉室之狀態實行。 5.如請求項4之半導體積體電路裝置之製造方法，盆中負 逑步驟⑷係以將前述複數之晶片狀積層體收容 閉室之狀態實行。 ' &如請求項5之半導體積體電路裝置之製造方法， 述步驟⑷係以收容於與前述步驟⑷相同之前述密閉^ 146729.doc 201108336 狀態實行。 7·如μ求項3之半導體積體電路裝置之製造方法，其中前 述步驟（c)係以將前述複數之晶片狀積層體與前述電路基 板併收容於單一密閉室之狀態實行。 8. 如％求項7之半導體積體電路裝置之製造方法，其中前 述步驟（d)係以將前述複數之晶片狀積層體與前述電路基 板併收容於單一密閉室之狀態實行。 9. 如印求項8之半導體積體電路裝置之製造方法，其中前 述步驟（句係以收容於與前述步驟（c)相同之前述密閉室之 狀態實行。 10. 如清求項7之半導體積體電路裝置之製造方法，其中前 述複數之晶片狀積層體係積層為階梯狀。 11. 如凊求項丨之半導體積體電路裝置之製造方法，其中前 述靜氣壓係靜空氣壓。 12. 如请求項1之半導體積體電路裝置之製造方法，其中各 半導體晶片之厚度係75微米以下、5微米以上。 13. 如晴求項！之半導體積體電路裝置之製造方法，其中各 半導體晶片之厚度係50微米以下、5微米以上。 14. 如晴求項1之半導體積體電路裝置之製造方法，其中各 半導體晶片之厚度係30微米以下、5微米以上。 15. 如請求項1之半導體積體電路裝置之製造方法，其中前 述電路基板係有機系電路基板。 16. 如請求項1之半導體積體電路裝置之製造方法，其中前 述接著劑層係以熱硬化性樹脂為主要成分。 146729.doc 201108336 17. 如請求項12之半導體積體電路裝置之製造方法，其中前 述步驟（b)係以前述半導體晶片處於前述第1溫度範圍内 之狀態實行。 18. 如請求項12之半導體積體電路裝置之製造方法，其中前 述第1溫度係攝氏70度至攝氏160度。 19. 如請求項12之半導體積體電路裝置之製造方法，其中前 述第1溫度範圍係常溫至攝氏100度。， 20. 如請求項12之半導體積體電路裝置之製造方法，其中前 述第1溫度範圍係攝氏60度至攝氏100度。 146729.doc
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