TW201034096A - Bonding method - Google Patents

Bonding method Download PDF

Info

Publication number
TW201034096A
TW201034096A TW098134959A TW98134959A TW201034096A TW 201034096 A TW201034096 A TW 201034096A TW 098134959 A TW098134959 A TW 098134959A TW 98134959 A TW98134959 A TW 98134959A TW 201034096 A TW201034096 A TW 201034096A
Authority
TW
Taiwan
Prior art keywords
output power
load
phase
pressing
metal unit
Prior art date
Application number
TW098134959A
Other languages
English (en)
Other versions
TWI424511B (zh
Inventor
Mitsuhiro Nakao
Original Assignee
Toshiba Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Kk filed Critical Toshiba Kk
Publication of TW201034096A publication Critical patent/TW201034096A/zh
Application granted granted Critical
Publication of TWI424511B publication Critical patent/TWI424511B/zh

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K20/00Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
    • B23K20/002Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating specially adapted for particular articles or work
    • B23K20/004Wire welding
    • B23K20/005Capillary welding
    • B23K20/007Ball bonding
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K20/00Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
    • B23K20/10Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating making use of vibrations, e.g. ultrasonic welding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L24/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00Articles made by soldering, welding or cutting
    • B23K2101/36Electric or electronic devices
    • B23K2101/40Semiconductor devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/0212Auxiliary members for bonding areas, e.g. spacers
    • H01L2224/02122Auxiliary members for bonding areas, e.g. spacers being formed on the semiconductor or solid-state body
    • H01L2224/02163Auxiliary members for bonding areas, e.g. spacers being formed on the semiconductor or solid-state body on the bonding area
    • H01L2224/02165Reinforcing structures
    • H01L2224/02166Collar structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/04Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L2224/05Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
    • H01L2224/0554External layer
    • H01L2224/05599Material
    • H01L2224/056Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/05617Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
    • H01L2224/05624Aluminium [Al] as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/4501Shape
    • H01L2224/45012Cross-sectional shape
    • H01L2224/45015Cross-sectional shape being circular
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45147Copper (Cu) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/484Connecting portions
    • H01L2224/48463Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/485Material
    • H01L2224/48505Material at the bonding interface
    • H01L2224/48599Principal constituent of the connecting portion of the wire connector being Gold (Au)
    • H01L2224/486Principal constituent of the connecting portion of the wire connector being Gold (Au) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/48617Principal constituent of the connecting portion of the wire connector being Gold (Au) with a principal constituent of the bonding area being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950 °C
    • H01L2224/48624Aluminium (Al) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/485Material
    • H01L2224/48505Material at the bonding interface
    • H01L2224/48799Principal constituent of the connecting portion of the wire connector being Copper (Cu)
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
    • H01L2224/78Apparatus for connecting with wire connectors
    • H01L2224/7825Means for applying energy, e.g. heating means
    • H01L2224/783Means for applying energy, e.g. heating means by means of pressure
    • H01L2224/78301Capillary
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/8512Aligning
    • H01L2224/85148Aligning involving movement of a part of the bonding apparatus
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/8512Aligning
    • H01L2224/85148Aligning involving movement of a part of the bonding apparatus
    • H01L2224/85169Aligning involving movement of a part of the bonding apparatus being the upper part of the bonding apparatus, i.e. bonding head, e.g. capillary or wedge
    • H01L2224/8518Translational movements
    • H01L2224/85181Translational movements connecting first on the semiconductor or solid-state body, i.e. on-chip, regular stitch
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/852Applying energy for connecting
    • H01L2224/85201Compression bonding
    • H01L2224/85205Ultrasonic bonding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/852Applying energy for connecting
    • H01L2224/85201Compression bonding
    • H01L2224/85205Ultrasonic bonding
    • H01L2224/85206Direction of oscillation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/42Wire connectors; Manufacturing methods related thereto
    • H01L24/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L24/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/74Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
    • H01L24/78Apparatus for connecting with wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00011Not relevant to the scope of the group, the symbol of which is combined with the symbol of this group
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/00015Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed as prior art
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01005Boron [B]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01029Copper [Cu]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01033Arsenic [As]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01079Gold [Au]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01082Lead [Pb]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/20Parameters
    • H01L2924/207Diameter ranges
    • H01L2924/20752Diameter ranges larger or equal to 20 microns less than 30 microns

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Wire Bonding (AREA)

Description

201034096 六、發明說明: 前後參照相關申請案 此申請案係基於及主張來自2008年10月22日提出 之先前日本專利申請案第2008-272414號之優先權的利益 ;其整個內容係以引用的方式倂入本文中。 【發明所屬之技術領域】 φ 本發明有關一結合方法,以對一形成在半導體晶片等 上之電極墊片施行導線結合。 【先前技術】 習知導線結合方法利用超音波振動,以電連接半導體 晶片之電極墊片至引線框、配線基板、其他半導體晶片、 與類似者等(譬如,日本專利第JP-A 2004-24 1 7 12號( Kokai ))。 〇 雖然黃金通常被用於傳統之結合導線,特別是近年來 黃金價格中之暴漲已增加使用不貴之銅或銅合金的導線之 需求。然而,銅係遠比黃金更硬的。因此,當結合一導線 端部至該電極墊片時,其係需要增加該導線端部的球狀物 在該電極墊片上之衝擊負載,以使該球狀物充分變形,以 確保該想要之結合強度。藉此,保持關切的是使用銅之導 線結合不幸地造成損壞,諸如電極墊片、半導體晶片等之 碎裂,與其中該球狀物下方的一部份電極墊片被由環繞該 球狀物壓出之偏差。由於此等問題’黃金導線目前壓倒性 201034096 地被使用當作結合導線,即使銅係比黃金較便宜。 【發明內容】 根據本發明的一態樣,提供有一結合方法,其施加振 動至包括銅之金屬單元,同時將該金屬單元壓按至一結合 物件上,以將該金屬單元結合至該結合物件,該方法包括 :施加振動至該金屬單元,並將該金屬單元帶入與該結合 物件接觸,同時施加該等振動;逐漸地增加該金屬單元在 _ 該結合物件上之壓按負載至第一壓按負載;及將該壓按負 載減少至比該第一壓按負載較小之第二壓按負載,且在該 壓按負載抵達該第一壓按負載之後,逐漸地增加該等振動 之輸出功率由第一輸出功率至第二輸出功率,該第一輸出 功率係於該第一壓按負載期間施加。 根據本發明之另一態樣,提供有一結合方法,其施加 振動至包括銅之金屬單元,同時將該金屬單元壓按至一結 合物件上,以將該金屬單元結合至該結合物件,該方法包 G 括:施加振動至該金屬單元,並將該金屬單元帶入與該結 合物件接觸,同時施加該等振動;逐漸地增加該金屬單元 在該結合物件上之壓按負載至第一壓按負載;及將該壓按 負載減少至比該第一壓按負載較小之第二壓按負載,並在 該壓按負載抵達該第一壓按負載之後停止施加該等振動, 且接著將該等振動之輸出功率逐漸地增加至第二輸出功率 ,該第二輸出功率係大於在該第一壓按負載期間所施加之 第一輸出功率。 -6- 201034096 【實施方式】 現在將參考該等圖面敘述本發明之具體實施例。 根據本發明的一具體實施例之結合方法施加振動至一 包括銅之金屬單元,同時將該金屬單元壓按至一結合物件 上,以將該金屬單元結合至該結合物件。特別地是,超音 波導線結合在下文之具體實施例中被敘述爲一範例,其利 用超音波振動以將由銅或包括當作該主要成份之銅的合金 φ 所製成之結合導線(下文亦僅只被稱爲“導線”)結合至 一形成在半導體晶片等上之電極墊片。 如圖1D所說明,一導線21通過一固持工具、亦即 一中空毛細管20。該毛細管20的一頂部被火花所熔化, 以形成一球狀物。該球狀物22之形成可被施行,同時譬 如吹入一含有氫等之氣體,以防止銅之氧化。譬如,該導 線21之直徑可爲25微米,且該球狀物22之直徑可爲46 微米。 〇 該毛細管20係附接至一未示出角狀物之尖部。該角 狀物之另一端部係耦接至一超音波產生器(超音波振動器 )。藉由該超音波產生器所產生之超音波振動經由該角狀 物及該毛細管20被傳送(施加)至該導線21。該角狀物 之尖部係藉由諸如馬達之驅動器裝置可直立地運動。據此 ’附接至該角狀物尖部之毛細管20亦可直立地運動。 現在將敘述依據此具體實施例之超音波導線結合方法 圖1A說明該毛細管20於一直立方向中之位置的暫 201034096 時性位移。圖1A中之直線的一較大傾斜指示該毛細管20 之較高下降或上昇比率。圖1Β說明電極墊片(譬如由鋁 所製成)11、亦即該結合物件上之球狀物22的壓按負載 之暫時性變化。亦即,此壓按負載係藉著該電極墊片11 由於該球狀物22所經歷之實際負載。該壓力係經由該毛 細管20施加至該球狀物22。圖1C說明該球狀物22 (或 該球狀物22及該電極墊片11間之接觸表面)之超音波振 動的輸出功率(或幅度)之暫時性變化。 _ 首先,在時間to,上述超音波產生器被驅動,以經由 該角狀物及該毛細管20施加超音波振動至該導線21之球 狀物22。在此時,該球狀物22係仍然直立地位於該電極 墊片11遠側,且不會接觸該電極墊片11,如圖1D中所 示。 該毛細管20下降朝向該電極墊片11,同時施加上述 之超音波振動。在由該時間to過去一間隔tl之後,當開 始該超音波振動施加時,該球狀物22抵達及接觸該電極 @ 墊片11之表面。在接觸之後,該電極墊片11上之球狀物 22的壓按負載開始逐漸地增加,如圖1B中所示。在此時 ,該負載係該球狀物22撞擊該電極墊片11之撞擊負載。 於此具體實施例中,藉由將該毛細管20之下降比率控制 爲相當低,在該球狀物22接觸該電極墊片11之後的負載 斜升被控制爲漸進的。 通常用作傳統結合導線之黃金係相當柔軟,且該球狀 物撞擊該電極墊片之撞擊負載係增加,以使該球狀物變形 -8 - 201034096 至該想要之直徑及將該球狀物壓按至該電極墊片上。然而 ,銅係比黃金較硬,且因此於該電極墊片被一大撞擊負載 所撞擊之案例中,不合意地導致損壞、諸如該電極墊片及 在其下面之晶片表面的碎裂。 因此,於此具體實施例中,在該球狀物22的接觸之 後,該斜升負載被控制爲漸進的,且一大負載不會即刻地 施加至該電極墊片11,如上面參考圖1B所敘述。藉此, φ 防止對該電極墊片11及在其下面之部份的損壞。 在該球狀物22接觸該電極墊片11之後,該負載增加 至第一壓按負載W1。該第一壓按負載W1具有一需要使 該球狀物22變形至該想要之直徑的量値。換句話說,於 此具體實施例中,該壓按負載係在該球狀物22接觸該電 極墊片11之後逐漸地增加至該第一壓按負載W1,且該球 狀物2 2變形至該想要之直徑,如圖1E中所說明。譬如, 在變形(圖1E)之後,於變形(圖1D)可具有56微米 的直徑之前’一球狀物22具有46微米之直徑。 因爲該球狀物22及該電極墊片11間之撞擊負載的斜 升係漸進的,且該球狀物22係由硬銅或銅合金所製成’ 僅只藉由此具體實施例中之負載所產生的效果係不足以增 加該球狀物22及該電極墊片11間之接觸力。因此’於此 具體實施例中,超音波振動係於該球狀物22及該電極墊 片11接觸之前施加至該球狀物22’且及該球狀物22係 壓按至該電極墊片11上’同時施加該等超音波振動。因 此,該球狀物22於該電極墊片11上之接觸力能藉由以超 201034096 音波振動之能量補充一小壓按負載所增加,甚至同時藉由 使用該小負載防止對該電極墊片11之損壞。 該超音波振動之輸出功率被維持在第一輸出功率pl ,而當該等振動之施加係經過該間隔11開始直至該球狀 物22接觸該電極墊片11及進一步在一隨後之間隔t2期 間,不會由該時間to起伏。 該間隔t2之相位係一相位,其中該球狀物22及該電 極墊片11間之接觸力係增加至使該球狀物22變形至該想 @ 要之直徑。雖然熔合(結合)可在此相位期間局部地發生 於該球狀物22及該電極墊片11之間,結合不會發生遍及 該球狀物22及該電極墊片11之整個接觸表面。換句話說 ,該間隔t2之相位係一相位,其中該球狀物22遍及該想 要之表面積被帶入與該電極墊片11造成接觸,該結合部 份中之間隙被消除,且獲得一狀態,其中可輕易地有利於 金屬之擴散結合。 於該下一相位中,該球狀物22及該電極墊片11係於 ❺ 該表面方向中結合在該整個接觸表面上方。爲此目的,該 壓按負載係減少至比該第一壓按負載W1較小之第二壓按 負載W2,同時逐漸地增加該超音波振動之輸出功率由第 一輸出功率P1至第二輸出功率P2。 特別地是,該壓按負載係在該壓按負載抵達該第一壓 按負載W1之後減少。當該壓按負載抵達該第二壓按負載 W2之後或緊接在其後,該超音波振動之輸出功率係逐漸 地由第一輸出功率P1增加至該第二輸出功率P2。 -10- 201034096 與該間隔t2之相位的壓按負載及輸出功率作比較’ 一間隔t3之相位具有一較小壓按負載及一影響該結合部 份之較大的超音波振動之輸出功率,在此該間隔t2之相 位係由當該球狀物22接觸該電極墊片11與發生該壓按負 載時,直至該等超音波振動之輸出功率由P1增加(圖1E 中所說明之狀態),且該間隔t3之相位係由該等超音波 振動之輸出功率P1的增加開始,同時該壓按負載被維持 φ 在該第二壓按負載W2,直至該壓按負載隨後減少至零( 圖1F中所說明之狀態)。 如此,該球狀物22及該電極墊片1 1係於該間隔t3 之相位期間完全地結合,其中該等超音波振動之輸出功率 係由P1至P2逐漸地增加,同時該壓按負載被維持在由該 第一壓按負載W1所減少之第二壓按負載W2。於此結合 期間,該等超音波振動大幅地起作用;且因爲該壓按負載 係小的,該球狀物22不會進一步變形,並被維持在與該 Φ 間隔t2之相位相同的直徑。藉此,下面所敘述之電極墊 片11的所謂“噴濺”偏差能被避免。 停止施加該等超音波振動的一命令係在該間隔t3之 後半部中發出,在其中維持該第二壓按負載W2,且該等 超音波振動之輸出功率由該第二輸出功率P2減少朝向零 。當該等超音波振動之輸出功率減少時,該毛細管20被 舉起,且該壓按負載由該第二壓按負載W2減少至零。然 而,隨著該等超音波振動之輸出功率由P2減少,該壓按 負載可同時地由該第二壓按負載W2減少至零。 -11 - 201034096 該球狀物22被結合至該電極墊片11,且該毛細管20 因此被舉起,同時由該毛細管20之尖部開口放出該導線 21。該毛細管20在另一結合物體(一引線框之引線、一 配線基板之墊片、另一半導體晶片之墊片等)上方運動, 且施行所謂之楔結合,而不會形成一球狀物。然後,該毛 細管20上昇,且一未示出之夾子接近至切斷該導線21。 藉此,該半導體晶片之電極墊片11係經由該導線21電連 接至該引線框、配線基板、其他半導體晶片等。 _ 現在將參考圖8A至8F敘述一用於此具體實施例之 比較範例。 圖8A說明該比較範例的毛細管20於一直立方向中 之位置的暫時性位移。圖8B說明該比較範例的電極墊片 11上之球狀物22的壓按負載之暫時性變化(該電極墊片 11由於該球狀物22所經歷之實際負載)。圖8C說明該 球狀物22 (或該球狀物22及該電極墊片11間之接觸表 面)之超音波振動的輸出功率(或幅度)之暫時性變化。 ❹ 於間隔tl、t2及t3之每一個中,該球狀物22之狀態係分 別槪要地說明於圖8D、8E '及8F中。 於此比較範例中,該壓按負載係在該球狀物22接觸 該電極墊片11之後逐渐地增加至抵達一壓按負載W3。維 持該壓按負載W3,直至該球狀物22及該電極墊片11間 之結合被完成。該壓按負載W3係上述此具體實施例之第 二壓按負載W2的至少兩倍,且係稍微比該第一壓按負載 W 1較小。 -12- 201034096 在該時間to開始施加該超音波振動之後,於該等間 隔tl及t2期間維持一輸出功率P3。於維持該壓按負載 W3之間隔t3期間,該輸出功率被減少至—比p3較小之 輸出功率P4。P3係大於上述此具體實施例之P1,且稍微 比P 2較小。P 4係稍微大於p 1。 於此比較範例中,在該壓按負載係斜升之後,維持該 相當大之負載W3,直至結合之完成。藉此,該電極墊片 φ 11之所謂噴濺偏差不合意地發生,如圖9A及9B中所說 明。圖9A槪要地說明該狀態,在此已發生該電極墊片11 之噴濺。圖9B係該相同狀態之一電子顯微鏡影像。該電 極墊片11係形成在半導體晶片13之表面上。該半導體晶 片13之表面被一介電保護薄膜12所覆蓋。異於該周邊部 份的電極墊片11之表面係由該介電保護薄膜12暴露。 “噴濺”意指該偏差,在此由於該球狀物22之壓按 負載在導線結合期間變得過大,且該電極墊片11在該球 φ 狀物22下方的一部份1 la被向上壓按與由環繞該球狀物 22壓出。該部份11a係由該電極墊片11壓出,且由於該 等超音波振動之施加延伸或散開在該振動方向中。譬如’ 於於該等電極墊片1 1之間具有60微米或更少的間距之所 謂細間距產品的案例中,該部份1 1 a可被壓出’以抵達該 鄰接之電極墊片,且於該等電極墊片之間不合意地造成一 短路缺陷。當噴濺發生時,因爲靠近其中心部份之電極墊 片11變薄,亦有一不佳可靠性之風險。 反之,如上面於此具體實施例中參考圖1A至1F所 -13- 201034096 敘述,該球狀物22係於該間隔t2之相位中變形至該想要 之直徑;且接著於該下一結合相位中,在減少該壓按負載 由第一壓按負載W1至該第二壓按負載W2之後,該等超 音波振動之輸出功率係由P1增加至P2。該電極墊片11 之噴濺能藉由減少該壓按負載被抑制,藉此於該結合相位 期間防止一過大壓按負載之效應。該等超音波振動主要地 於該結合相位期間起作用,且藉由該球狀物22及該電極 墊片11之間於該表面方向中的有關振動所造成之摩擦促 ❿ 進該球狀物22及該電極墊片11之結合。 在此,於以諸設定施行結合而使得該等超音波振動之 輸出功率係由P1突然改變至P2(在90度或接近此之斜 升角)之案例中,如藉由圖1C中之單點虛線所說明,由 於大量能量瞬時地影響該結合部份,不合意地發生該電極 墊片11之噴濺,甚至於該壓按負載係減少至該第二壓按 負載W2之案例中。據此,其重要的是該等超音波振動之 輸出功率係由P1逐漸地增加至P2。 ❹ 依據上述具體實施例,使用一由銅或具有當作該主要 成份之銅的合金所製成之導線的導線結合能提供一具有高 可靠性之結合,而不會發生影響此導線結合之問題,諸如 電極墊片噴濺及對該電極墊片及/或半導體晶片造成損壞 ,且藉由使用一由銅或具有當作該主要成份之銅的合金所 製成之導線實現成本減少,該銅係比金較便宜的。再者, 因爲不會發生噴濺,具有一較細間距(例如60微米或更 少)的電極墊片之導線結合能被實現,而不會發生墊片間 -14- 201034096 之短路。 用於該第二壓按負載W2對圖1B之第一壓按負載W1 的各種比率,本發明家施行導線結合,且對於多數樣本在 每一比率測量該電極墊片噴濺量(微米)。該等結果被說 明在圖2中。該噴濺量(微米)係總共Wa + Wb,在此Wa 及Wb係圖9A中所說明之電極墊片11的噴濺之部份Ua 的超音波振動方向中之長度。 φ 當W2/W1由0.5增加朝向1時,圖2之結果顯示該 噴濺量增加;當該第二壓按負載W2被減少達0.5及更少 之W2/W1時,於該噴濺量中有極小之變化;及該噴濺量 被抑制至一水準,對於0.5及更少之W2/W1不會造成任 何實際之問題。據此,其想要的是該第二壓按負載W2之 量値係大於零,且不大於該第一壓按負載W1之量値的一 半。然而,太小之第二壓按負載W2導致該結合部份之不 佳的剝離強度。因此,其係需要將該第二壓按負載W2之 〇 下限適當地設定於一範圍中,使得該剝離強度係充足的。 在此,“剝離強度”意指於一水平方向中造成被結合 至該電極墊片之球狀物由該電極墊片剝離的力量。該剝離 強度(mN)及上述該等超音波振動之第二輸出功率P2對 第一輸出功率P1的比率(P2、P1)間之關係被確定。該 等結果被說明在圖3中。 在P2及P1之量値係同等的案例中,該結合係不足的 ,且該剝離強度係不佳的。當P2係增加至高於P 1時,該 剝離強度亦增加。當P2係P1之兩倍或更高時,圖3之結 -15- 201034096 果顯示增加之P2於該剝離強度中造成極小變化;且當P2 係P1之兩倍或更高時,確保該需要之剝離強度。然而, 當P2係太高時發生噴濺。因此,其係需要將P2之上限適 當地設定於一範圍中,使得該噴濺量不是問題。 一斜升角Θ被界定爲該等超音波振動之輸出功率由該 第一輸出功率P1增加至該第二輸出功率P2的斜升角,如 圖4A至4C中所說明。該角度Θ及該噴濺量(圖9A之 Wa + Wb )間之關係被確定。該等結果被所說明在圖5中。 當該斜升角Θ增加時,該等超音波振動之輸出功率於 一較短之時間量(更急遽地)由P1轉變至P2。圖4A說 明該案例,在此Θ = Π=大約35度。圖4B說明該案例,在 此0 = J2 =大約45度。圖4C說明該案例,在此0 = J3 =大約 75度。 圖5之結果顯示當該等超音波振動之輸出功率由P1 至P2的斜升角Θ減少時,亦即當該輸出功率由P 1更緩和 地轉變至P2時,該噴濺量減少。 本發明家調查開始增加該等超音波振動之輸出功率由 P1至P2的時機。圖1B中所說明之壓按負載的波形不只 是一命令信號値,同時爲視該結合表面之狀態等而定的實 際負載。該壓按負載不須馬上由該第一壓按負載W1轉變 (減少)至該第二壓按負載W2。於該超音波振動之增加 係經過由第一壓按負載W1轉變至該第二壓按負載W2( 特別是在靠近該第一壓按負載W1之區域中)的中途開始 之案例中,上面所陳述之噴濺可發生。 -16- 201034096 據此,其想要的是在開始該等超音波振動之輸出功率 的增加之前,等候該壓按負載抵達該第二壓按負載W2, 亦即,當抵達該第二壓按負載W2時或在抵達該第二壓按 負載W2之後,開始該輸出功率之增加。藉由施行此一控 制,該等超音波振動能被可靠地防止超過P1,同時該壓 按負載係大於該第二壓按負載W2;上面所陳述之噴濺能 被防止;且該可靠性能更增加。 ❹ 關於獲得上述效果,該間隔t2及該間隔t3間之長度 關係沒有問題,在此該壓按負載被改變至W1,且該等超 音波振動之輸出功率於該間隔t2期間被維持在P 1,及該 壓按負載被維持在W2,且該等超音波振動之輸出功率於 該間隔t3期間被改變至P2。然而,該間隔t3係一用於結 合之間隔;且因此,於該間隔t3係不大於該間隔t2之案 例中,該間隔t3通常係不足以獲得充分強度之結合,其 中該球狀物係變形。雖然其係可能使用一相當長之間隔t2 參 ,在該球狀物已變形至該想要直徑之後,爲維持該間隔t2 的狀態係時間之浪費,且該效率減少。因此,t2<t3係有 利的。 圖6A至6C係類似於根據本發明的另一具體實施例 之超音波導線結合方法的圖1A至1C之那些的時序圖。 當該等超音波振動係於接觸該電極墊片之前施加至該 球狀物時,該間隔11由該時間t0之相位及該間隔t2之相 位係類似於圖1 A至1 C中所說明之上述具體實施例的那 些者。 -17- 201034096 於此具體實施例中,在由第一壓按負載W1減少該壓 按負載至該第二壓按負載W2之後,停止該等超音波振動 之施加(該輸出功率由P1減少至零),且接著該輸出功 率係逐漸地增加至該第二輸出功率P2。特別地是,該等 超音波振動之輸出功率由P1的減少在該間隔t2消逝之後 開始,且當該間隔t3已由該減少之開始消逝時,該輸出 功率抵達零。然後,類似於上面所陳述之具體實施例,該 等超音波振動之輸出功率係由零逐漸地增加至該第二輸出 φ 功率P2,同時該壓按負載被維持在該第二壓按負載W2, 且該球狀物及該電極墊片被結合。 於此具體實施例中,一旦中途經過由P1至P2之增加 的轉變,該等超音波振動之輸出功率係由P1減少至零。 藉此,當該壓按負載在降落至該第二壓按負載W2之前的 一階段係相當大時,該等超音波振動能被可靠地防止免於 不合意地超過P1;上面所陳述之噴濺能被可靠地防止; 及該可靠性能被更增加。 @ 圖7A至7C係類似於根據本發明的又另一具體實施 例之超音波導線結合方法的圖1A至1C之那些的時序圖 〇 亦於此具體實施例中,類似於圖6A至6C中所說明 之上面所陳述的具體實施例,一旦中途經過由P1至P2之 增加的轉變,該等超音波振動之輸出功率係由P1減少至 零。藉此,當該壓按負載在降落至該第二壓按負載W2之 前的一階段係相當大時,該等超音波振動能被可靠地防止 -18- 201034096 免於不合意地超過PI;上面所陳述之噴濺能被可靠地防 止;及該可靠性能被更增加。 於此具體實施例中,雖然該等超音波振動之輸出功率 馬上由P 1降下至零,其係更易於控制如圖6A至6C所說 明之輸出功率,以由Pi逐漸地減少至零。 在上文’本發明之示範具體實施例係參考特定範例敘 述。然而’本發明係不限於此。基於本發明之技術精神, φ 各種修改係可能的。 該結合物件係不限於半導體晶片之電極墊片,並可包 括一墊片及/或一配線基板之配線、一引線框之引線等。 再者’本發明能將一包括銅之金屬單元結合至一較柔軟之 結合物件,而不會發生上述之損壞或噴濺;且本發明不被 限制於上面所陳述之示範具體實施例中所敘述的導線結合 。例如,用於經由該等凸塊將包括諸如覆晶封裝之凸塊的 零組件等結合至結合物件,本發明係有效的。 參 【圖式簡單說明】 圖1 A至1 F係槪要視圖,顯示根據此具體實施例的 結合方法中之毛細管位移(capillary displacement)、一 壓按負載與超音波振動之輸出功率的暫時性變化、及主要 相位中之結合部份的狀態; 圖2係一曲線圖,顯不圖1B中之(桌一壓按負載 W2/第一壓按負載W1)與一墊片噴濺量間之關係; 圖3係一曲線圖,顯示圖1C中之(第二輸出功率 -19- 201034096 P2/第一輸出功率PI )與結合部份的剝離強度間之關係; 圖4A至4C係槪要視圖,顯示一斜升角0於超音波振 動之輸出功率由P1增加至P2期間的變化; 圖5係一曲線圖’顯示圖4A至4C中所示斜升角Θ與 該墊片噴濺量間之關係; 圖6A至6C係槪要視圖,顯不根據另一具體實施例 的結合方法中之毛細管位移、壓按負載與該等超音波振動 之輸出功率的暫時性變化; 圖7A至7C係槪要視圖,顯示根據又另一具體實施 例的結合方法中之毛細管位移、壓按負載與該等超音波振 動之輸出功率的暫時性變化; 圖8A至8F係槪要視圖,顯示根據一比較範例的結 合方法中之毛細管位移、一壓按負載與該等超音波振動之 輸出功率的暫時性變化、及主要相位中之結合部份的狀態 ;及 圖9A係一槪要視圖,用於敘述該電極墊片之“噴濺 ”,且圖9B係發生“噴濺”之結合部份的被觀察電子顯 微鏡影像。 【主要元件符號說明】 1 1 :電極墊片 1 1 a :部份 12 :保護薄膜 1 3 =半導體晶片 -20- 201034096 20 :毛細管 2 1 :導線 2 2 :球狀物 P 1 :輸出功率 P 2 :輸出功率 P 3 :輸出功率 P4 :輸出功率 tO :時間 11 :間隔 t2 :間隔 t3 :間隔 W1 :壓按負載 W2 :壓按負載 W3 :壓按負載

Claims (1)

  1. 201034096 七、申請專利範園: 1· 一種結合方法,其施加振動至包括銅之金屬單元, 同時將該金屬單元壓按至一結合物件上,以將該金屬單元 結合至該結合物件,該方法包括: 施加振動至該金屬單元,並使該金屬單元與該結合物 件接觸,同時施加該等振動: 逐漸地增加該金屬單元在該結合物件上之壓按負載至 第一壓按負載;及 將該壓按負載減少至比該第一壓按負載較小之第二壓 按負載’且在該壓按負載到達該第一壓按負載之後,逐漸 地增加該等振動之輸出功率由第一輸出功率至第二輸出功 率’該第一輸出功率係於該第一壓按負載期間施加。 2. 如申請專利範圍第1項之結合方法,其中該第二壓 按負載之量値係大於零及不大於該第一壓按負載之量値的 一半。 3. 如申請專利範圍第1項之結合方法,其中當該壓按 負載到達該第二壓按負載時,該等振動之輸出功率開始增 加。 4. 如申請專利範圍第1項之結合方法,其中在該壓按 負載到達該第二壓按負載之後,該等振動之輸出功率開始 增加。 5·如申請專利範圍第1項之結合方法,其中該金屬單 元係形成在導線的一端部上之球狀物。 6.如申請專利範圍第1項之結合方法,其中該金屬單 201034096 元係在第一相位中變形,在該第一相位將該壓按負載逐漸 地增加至該第一壓按負載,同時將該輸出功率維持在該第 一輸出功率。 7.如申請專利範圍第6項之結合方法,其中該金屬單 元在第二相位中的變形不會超過在該第一相位中的變形, 該第二相位將該輸出功率增加至該第二輸出功率,同時將 該壓按負載維持在該第二壓按負載。 0 8.如申請專利範圍第1項之結合方法,其中該第二輸 出功率係不少於該第一輸出功率之兩倍。 9. 如申請專利範圍第1項之結合方法,其中第二相位 之間隔係比第一相位之間隔較長,該第一相位將該壓按負 載逐漸地增加至該第一壓按負載,同時將該輸出功率維持 在該第一輸出功率,該第二相位將該輸出功率改變至該第 二輸出功率’同時將該壓按負載維持在該第二壓按負載。 10. 如申請專利範圍第1項之結合方法,其中該等振 φ 動包括超音波振動。 Ϊ1_ —種結合方法’其施加振動至包括銅之金屬單元 ’同時將該金屬單元壓按至一結合物件上,以將該金屬單 元結合至該結合物件,該方法包括: 施加振動至該金屬單元,並使該金屬單元與該結合物 件接觸,同時施加該等振動; •逐漸地增加該金屬單元在該結合物件上之壓按負載至 第一壓按負載;及 將該壓按負載減少至比該第一壓按負載較小之第二壓 -23- 201034096 按負載,並在該壓按負載到達該第一壓按負載之後停止施 加該等振動,且接著將該等振動之輸出功率逐漸地增加至 第二輸出功率,該第二輸出功率係大於在該第一壓按負載 期間所施加之第一輸出功率。 12. 如申請專利範圍第11項之結合方法,其中該第二 壓按負載之量値係大於零及不大於該第一壓按負載之量値 的一半。 13. 如申請專利範圍第11項之結合方法,其中當該壓 φ 按負載到達該第二壓按負載時,該等振動之輸出功率開始 增加。 14. 如申請專利範圍第11項之結合方法,其中在該壓 按負載抵達該第二壓按負載之後’該等振動之輸出功率開 始增加。 15. 如申請專利範圍第11項之結合方法,其中該金屬 單元係形成在導線的一端部上之球狀物。 16. 如申請專利範圍第11項之結合方法’其中該金屬 〇 單元係在第一相位中變形,在該第一相位將該壓按負載逐 漸地增加至該第一壓按負載’同時將該輸出功率維持在該 第一輸出功率。 17. 如申請專利範圍第16項之結合方法’其中該金屬 單元在第二相位中的變形不會超過在該第~相位中的變形 ,該第二相位將該輸出功率增加至該第二輸出功率,同時 將該壓按負載維持在該第二壓按負載。 18. 如申請專利範圍第11項之結合方法,其中該第二 -24- 201034096 輸出功率係不少於該第一輸出功率之兩倍。 I9·如申請專利範圍第11項之結合方法,其中 位之間隔係比第一相位之間隔較長,該第一相位將 負載逐渐地增加至該第一壓按負載,同時將該輸出 持在該第一輸出功率,該第二相位將該輸出功率改 第二輸出功率,同時將該壓按負載維持在該第二壓 〇 φ 20.如申請專利範圍第n項之結合方法,其中 動包括超音波振動。 第二相 該壓按 功率維 變至該 按負載 該等振 -25-
TW098134959A 2008-10-22 2009-10-15 結合方法 TWI424511B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008272414A JP5135164B2 (ja) 2008-10-22 2008-10-22 ボンディング方法

Publications (2)

Publication Number Publication Date
TW201034096A true TW201034096A (en) 2010-09-16
TWI424511B TWI424511B (zh) 2014-01-21

Family

ID=42107846

Family Applications (1)

Application Number Title Priority Date Filing Date
TW098134959A TWI424511B (zh) 2008-10-22 2009-10-15 結合方法

Country Status (4)

Country Link
US (1) US8308049B2 (zh)
JP (1) JP5135164B2 (zh)
CN (1) CN101728290B (zh)
TW (1) TWI424511B (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102484080B (zh) * 2009-06-18 2015-07-22 罗姆股份有限公司 半导体装置
JP2012138476A (ja) * 2010-12-27 2012-07-19 Renesas Electronics Corp 半導体装置の製造方法
JP5893266B2 (ja) * 2011-05-13 2016-03-23 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
US8907485B2 (en) * 2012-08-24 2014-12-09 Freescale Semiconductor, Inc. Copper ball bond features and structure
JP6810222B2 (ja) * 2014-07-11 2021-01-06 ローム株式会社 電子装置
CN106206339B (zh) * 2016-07-12 2018-12-21 中南大学 一种微铜柱间铜铜直接热超声倒装键合方法及其装置
US11517977B2 (en) * 2017-09-15 2022-12-06 Tech-Sonic, Inc. Dual cam servo weld splicer
JP2020072169A (ja) * 2018-10-31 2020-05-07 ルネサスエレクトロニクス株式会社 半導体装置及び半導体装置の製造方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5192015A (en) * 1991-11-20 1993-03-09 Santa Barbara Research Center Method for wire bonding
JPH08181175A (ja) * 1994-12-22 1996-07-12 Toshiba Corp ワイヤボンディング方法
TW335526B (en) 1996-07-15 1998-07-01 Matsushita Electron Co Ltd A semiconductor and the manufacturing method
JP3504448B2 (ja) * 1996-10-17 2004-03-08 株式会社ルネサステクノロジ 半導体装置
JP3377934B2 (ja) * 1997-07-22 2003-02-17 松下電器産業株式会社 バンプボンディング方法およびバンプボンディング装置
JP3833812B2 (ja) 1998-03-17 2006-10-18 松下電器産業株式会社 バンプ付電子部品のボンディング方法
JP3942738B2 (ja) * 1998-07-17 2007-07-11 松下電器産業株式会社 バンプ接合装置及び方法、並びに半導体部品製造装置
JP2000216190A (ja) 1999-01-26 2000-08-04 Sumitomo Electric Ind Ltd ボンディングツ―ル及びボンディング方法
JP2002353266A (ja) * 2001-05-30 2002-12-06 Moric Co Ltd ワイヤボンディング方法および装置
JP2004241712A (ja) 2003-02-07 2004-08-26 Matsushita Electric Ind Co Ltd 超音波ボンディング方法
DE102004048220A1 (de) * 2004-09-30 2006-04-06 Basf Ag Kontaktierung thermoelektrischer Materialien durch Ultraschallschweißen
JP2006135207A (ja) * 2004-11-09 2006-05-25 Fujitsu Ltd フリップチップ接合方法
TW200732154A (en) * 2005-11-02 2007-09-01 Checkpoint Systems Inc In-mold chip attach
JP4984552B2 (ja) 2006-01-30 2012-07-25 ルネサスエレクトロニクス株式会社 半導体装置の製造方法
US20120153444A1 (en) * 2009-06-18 2012-06-21 Rohm Co., Ltd Semiconductor device

Also Published As

Publication number Publication date
US20100096437A1 (en) 2010-04-22
TWI424511B (zh) 2014-01-21
CN101728290A (zh) 2010-06-09
JP5135164B2 (ja) 2013-01-30
US8308049B2 (en) 2012-11-13
CN101728290B (zh) 2012-07-04
JP2010103259A (ja) 2010-05-06

Similar Documents

Publication Publication Date Title
TWI424511B (zh) 結合方法
US8298947B2 (en) Semiconductor device having solder-free gold bump contacts for stability in repeated temperature cycles
TW200901345A (en) System and method for increased stand-off height in stud bumping process
JP4768343B2 (ja) 半導体素子の実装方法
JP2006278407A (ja) 半導体装置の製造方法
JP2735022B2 (ja) バンプ製造方法
JP2008066331A (ja) 半導体装置の製造方法
US20050191839A1 (en) Multiple-ball wire bonds
JP2007053130A (ja) 接合構造および接合方法
JP3902640B2 (ja) ワイヤボンディング方法
JP4041045B2 (ja) 超音波フリップチップ接合方法
JPH10261664A (ja) 半導体素子、突起電極の形成方法およびワイヤボンディング方法
JP3202193B2 (ja) ワイヤボンディング方法
US6165888A (en) Two step wire bond process
JP3233194B2 (ja) ワイヤボンディング方法
JP2011119563A (ja) ワイヤボンディング方法および半導体装置
JP2008085094A (ja) 半導体装置の製造方法
JP2006114649A (ja) 半導体装置の製造方法およびその製造装置
JP2003282629A (ja) 超音波フリップチップ実装方法
JP4444022B2 (ja) 半導体装置の製造方法
JPH10261645A (ja) 半導体素子、突起電極の形成方法およびワイヤボンディング方法
JP2003100791A (ja) 多段バンプ形成方法
JP2002043354A (ja) フリップチップ実装方法
JP2003303844A (ja) 半導体構造およびボンディング方法
JP2595901B2 (ja) バンプ形成方法