TW201004707A - Gasification systems and methods for making bubble free solutions of gas in liquid - Google Patents
Gasification systems and methods for making bubble free solutions of gas in liquid Download PDFInfo
- Publication number
- TW201004707A TW201004707A TW98116469A TW98116469A TW201004707A TW 201004707 A TW201004707 A TW 201004707A TW 98116469 A TW98116469 A TW 98116469A TW 98116469 A TW98116469 A TW 98116469A TW 201004707 A TW201004707 A TW 201004707A
- Authority
- TW
- Taiwan
- Prior art keywords
- gas
- liquid
- contactor
- flow rate
- feed
- Prior art date
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 449
- 238000002309 gasification Methods 0.000 title claims description 79
- 238000000034 method Methods 0.000 title claims description 75
- 230000002829 reductive effect Effects 0.000 claims abstract description 63
- 239000007789 gas Substances 0.000 claims description 551
- 239000012528 membrane Substances 0.000 claims description 81
- 230000008859 change Effects 0.000 claims description 63
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 55
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 33
- 230000008569 process Effects 0.000 claims description 29
- 239000001569 carbon dioxide Substances 0.000 claims description 26
- 230000006837 decompression Effects 0.000 claims description 20
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 17
- 239000012530 fluid Substances 0.000 claims description 14
- 229910052757 nitrogen Inorganic materials 0.000 claims description 8
- 238000009834 vaporization Methods 0.000 claims description 6
- 230000008016 vaporization Effects 0.000 claims description 6
- 230000007935 neutral effect Effects 0.000 claims description 3
- 238000002955 isolation Methods 0.000 claims description 2
- 230000004044 response Effects 0.000 abstract description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 170
- 229910001868 water Inorganic materials 0.000 description 127
- 239000000203 mixture Substances 0.000 description 43
- 230000036961 partial effect Effects 0.000 description 37
- 239000000243 solution Substances 0.000 description 20
- 238000004519 manufacturing process Methods 0.000 description 16
- 238000004140 cleaning Methods 0.000 description 13
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- 238000005259 measurement Methods 0.000 description 9
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- 230000001276 controlling effect Effects 0.000 description 7
- 238000010790 dilution Methods 0.000 description 7
- 239000012895 dilution Substances 0.000 description 7
- 239000001307 helium Substances 0.000 description 7
- 229910052734 helium Inorganic materials 0.000 description 7
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 7
- 239000011261 inert gas Substances 0.000 description 7
- 230000000670 limiting effect Effects 0.000 description 7
- 238000013461 design Methods 0.000 description 6
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- 230000007423 decrease Effects 0.000 description 4
- 229910021641 deionized water Inorganic materials 0.000 description 4
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- 238000010926 purge Methods 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 238000007792 addition Methods 0.000 description 3
- 238000013500 data storage Methods 0.000 description 3
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- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
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- BVKZGUZCCUSVTD-UHFFFAOYSA-M Bicarbonate Chemical compound OC([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-M 0.000 description 1
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- 229910052799 carbon Inorganic materials 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
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- 229920002120 photoresistant polymer Polymers 0.000 description 1
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- 229910021642 ultra pure water Inorganic materials 0.000 description 1
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- 238000011144 upstream manufacturing Methods 0.000 description 1
- 238000009849 vacuum degassing Methods 0.000 description 1
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/2319—Methods of introducing gases into liquid media
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
- B01F23/23105—Arrangement or manipulation of the gas bubbling devices
- B01F23/2312—Diffusers
- B01F23/23124—Diffusers consisting of flexible porous or perforated material, e.g. fabric
- B01F23/231244—Dissolving, hollow fiber membranes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/29—Mixing systems, i.e. flow charts or diagrams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/20—Measuring; Control or regulation
- B01F35/21—Measuring
- B01F35/213—Measuring of the properties of the mixtures, e.g. temperature, density or colour
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0318—Processes
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Degasification And Air Bubble Elimination (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Accessories For Mixers (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US5422308P | 2008-05-19 | 2008-05-19 | |
| US8253508P | 2008-07-22 | 2008-07-22 | |
| US9523008P | 2008-09-08 | 2008-09-08 | |
| US10150108P | 2008-09-30 | 2008-09-30 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW201004707A true TW201004707A (en) | 2010-02-01 |
Family
ID=41340494
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW98116469A TW201004707A (en) | 2008-05-19 | 2009-05-18 | Gasification systems and methods for making bubble free solutions of gas in liquid |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US8844909B2 (enExample) |
| JP (1) | JP2011520609A (enExample) |
| KR (1) | KR20110008319A (enExample) |
| CN (2) | CN104722239A (enExample) |
| DE (1) | DE112009001233T5 (enExample) |
| TW (1) | TW201004707A (enExample) |
| WO (1) | WO2009143056A1 (enExample) |
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| JP2010234298A (ja) * | 2009-03-31 | 2010-10-21 | Kurita Water Ind Ltd | ガス溶解水供給装置及びガス溶解水の製造方法 |
| US8438969B2 (en) * | 2010-05-06 | 2013-05-14 | Dr Pepper/Seven Up, Inc. | Apparatus and method for dissolving gases in a beverage |
| US9403102B2 (en) * | 2012-02-13 | 2016-08-02 | United Technologies Corporation | Heat exchange system configured with a membrane contactor |
| JP5914037B2 (ja) * | 2012-02-23 | 2016-05-11 | 東京エレクトロン株式会社 | 冷却システム、冷却システムを備える基板処理装置及び冷却方法 |
| CN102692926B (zh) * | 2012-06-05 | 2014-10-22 | 哈尔滨工程大学 | 基于tms320c6713的船舶航向模糊pid融合控制器及控制方法 |
| GB2506689A (en) * | 2012-10-08 | 2014-04-09 | Odour Services Internat Ltd | Air pollution control apparatus and method of use |
| CA2902061C (en) * | 2013-02-28 | 2023-08-08 | New Health Sciences, Inc. | Gas depletion and gas addition devices for blood treatment |
| WO2015175790A1 (en) * | 2014-05-15 | 2015-11-19 | Tokyo Electron Limited | Method and apparatus for increased recirculation and filtration in a photoresist dispense system |
| AU2015100137A4 (en) * | 2015-01-12 | 2015-03-05 | Macau University Of Science And Technology | Optimization of Start-up Transient Processes for Dual-Armed Cluster Tools with Wafer Revisiting |
| JP6993626B2 (ja) * | 2015-04-10 | 2022-01-13 | タカラベルモント株式会社 | 炭酸水生成装置 |
| EP3284530A4 (en) * | 2015-04-13 | 2018-12-19 | DIC Corporation | Device for adjusting specific resistance value and method for adjusting specific resistance value |
| FR3036629B1 (fr) | 2015-05-29 | 2019-06-21 | Nicolas POURTAUD | Dispositif de regulation de la concentration d'un gaz dans un liquide |
| JP6761431B2 (ja) * | 2016-01-06 | 2020-09-23 | 国立大学法人徳島大学 | レーザ光を用いたガス分析装置及びガス分析方法 |
| US10228355B2 (en) | 2016-05-06 | 2019-03-12 | Board Of Regents, The University Of Texas System | Volatile eluent preparation |
| CN106474768B (zh) * | 2016-09-12 | 2019-01-29 | 华中科技大学 | 一种高精度耐腐蚀的自动配液换液装置 |
| WO2018085892A1 (en) * | 2016-11-11 | 2018-05-17 | PTI Pacific Pty Ltd | Modular system for gassing and degassing liquids |
| CN110168713B (zh) * | 2016-11-11 | 2023-08-08 | Mks仪器有限公司 | 用于产生包括其中溶解有氨气的去离子水的导电液体的系统和方法 |
| EP3601147A4 (en) * | 2017-03-28 | 2021-01-06 | Flow Control LLC. | Gas/liquid infusion system with intelligent level management and adjustable absorption output |
| CN108854609B (zh) * | 2017-05-10 | 2025-08-12 | 青岛经济技术开发区海尔热水器有限公司 | 一种微气泡水生产装置 |
| JP7052423B2 (ja) * | 2018-03-02 | 2022-04-12 | 栗田工業株式会社 | オゾン溶解水の製造装置及びこれを用いたオゾン溶解水の製造方法 |
| WO2020210243A1 (en) | 2019-04-08 | 2020-10-15 | Mks Instruments, Inc. | Systems and methods for generating a dissolved ammonia solution with reduced dissolved carrier gas and oxygen content |
| JP7240260B2 (ja) | 2019-06-04 | 2023-03-15 | 株式会社荏原製作所 | ガス溶解液供給装置およびガス溶解液供給方法 |
| CN110773012A (zh) * | 2019-12-02 | 2020-02-11 | 杭州老板电器股份有限公司 | 微纳米气泡制备装置及其制备方法 |
| JP2024546262A (ja) * | 2021-12-14 | 2024-12-19 | エムケーエス インストゥルメンツ，インコーポレイテッド | 溶解アンモニアデリバリシステム及び使用方法 |
| CN118893499B (zh) * | 2024-09-12 | 2025-11-14 | 福建理工大学 | 一种基于pid控制气体辅助抛光系统的设计方法 |
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| US3751879A (en) * | 1971-04-26 | 1973-08-14 | Instrumentation Specialties Co | Apparatus for reducing the dissolved gas concentration in a liquid |
| DE68926421T2 (de) * | 1988-08-20 | 1996-09-12 | Nitto Denko Corp | Verfahren zur Entfernung von gelösten Gasen aus einer Flüssigkeit |
| US5565149A (en) | 1995-03-15 | 1996-10-15 | Permea, Inc. | Control of dissolved gases in liquids |
| US5766479A (en) | 1995-08-07 | 1998-06-16 | Zenon Environmental Inc. | Production of high purity water using reverse osmosis |
| JPH10324502A (ja) | 1997-05-21 | 1998-12-08 | Dainippon Ink & Chem Inc | 超純水の炭酸ガス付加装置及び付加方法 |
| US6582496B1 (en) | 2000-01-28 | 2003-06-24 | Mykrolis Corporation | Hollow fiber membrane contactor |
| US6328905B1 (en) | 1999-08-12 | 2001-12-11 | Advanced Micro Devices, Inc. | Residue removal by CO2 water rinse in conjunction with post metal etch plasma strip |
| US6982006B1 (en) * | 1999-10-19 | 2006-01-03 | Boyers David G | Method and apparatus for treating a substrate with an ozone-solvent solution |
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| US6884359B2 (en) | 2000-09-27 | 2005-04-26 | Dainippon Ink And Chemicals, Inc. | Apparatus and method for controlling resistivity of ultra pure water |
| JP2002233878A (ja) * | 2001-02-06 | 2002-08-20 | Roki Techno Co Ltd | 給水配管の殺菌洗浄方法 |
| CN100469425C (zh) * | 2001-08-28 | 2009-03-18 | 三菱丽阳株式会社 | 碳酸泉和碳酸水的制造装置及制造方法、及其应用的气体浓度控制方法和膜组件 |
| JP2003154242A (ja) * | 2001-11-26 | 2003-05-27 | Texas Instr Japan Ltd | 流体混合装置 |
| CN1642628B (zh) * | 2002-03-19 | 2010-06-16 | 安格斯公司 | 中空纤维膜接触装置及方法 |
| JP4319445B2 (ja) | 2002-06-20 | 2009-08-26 | 大日本スクリーン製造株式会社 | 基板処理装置 |
| JP2004130205A (ja) * | 2002-10-10 | 2004-04-30 | Fuji Electric Systems Co Ltd | オゾン含有水を用いたろ過膜の逆洗方法および逆洗装置 |
| JP2006524133A (ja) | 2003-04-22 | 2006-10-26 | インテグリス・インコーポレーテッド | 気体移送薄膜をもたらすためのプリ−ツ形構造 |
| JP4330959B2 (ja) | 2003-09-05 | 2009-09-16 | 株式会社東芝 | 半導体基板の洗浄方法および洗浄装置、半導体基板、ならびに半導体装置 |
| US7273549B2 (en) | 2004-01-23 | 2007-09-25 | Geoscience Support Services Inc. | Membrane contactor apparatus including a module having hollow fiber membranes |
| CN1913946A (zh) | 2004-01-27 | 2007-02-14 | 安格斯公司 | 由液体中除去微气泡的方法 |
| JP4470101B2 (ja) | 2004-03-24 | 2010-06-02 | 栗田工業株式会社 | 窒素溶解超純水の製造方法 |
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| AU2007247895A1 (en) * | 2006-05-05 | 2007-11-15 | Plascoenergy Ip Holdings, S.L., Bilbao, Schaffhausen Branch | A gas homogenization system |
| CN101479365A (zh) * | 2006-05-05 | 2009-07-08 | 普拉斯科能源Ip控股公司毕尔巴鄂-沙夫豪森分公司 | 用于与气化器一起使用的热量回收系统 |
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| JP2007319843A (ja) | 2006-06-05 | 2007-12-13 | Kurita Water Ind Ltd | 気体溶解モジュール |
| JP2009545136A (ja) * | 2006-07-21 | 2009-12-17 | インテグリス・インコーポレーテッド | 浸漬流体を調整するための装置および方法 |
| JP4931201B2 (ja) | 2006-10-13 | 2012-05-16 | 独立行政法人産業技術総合研究所 | 極微小気泡を含む水の製造方法および極微小気泡を含む水 |
| EP2104648B1 (en) | 2006-10-17 | 2013-04-17 | MKS Instruments, Inc. | System and method for carbonation of deionized water |
| JP2008155186A (ja) * | 2006-12-26 | 2008-07-10 | Nomura Micro Sci Co Ltd | オゾン水の製造方法及び製造装置 |
-
2009
- 2009-05-18 CN CN201510020227.7A patent/CN104722239A/zh active Pending
- 2009-05-18 CN CN200980118387.8A patent/CN102036742B/zh not_active Expired - Fee Related
- 2009-05-18 WO PCT/US2009/044343 patent/WO2009143056A1/en not_active Ceased
- 2009-05-18 DE DE112009001233T patent/DE112009001233T5/de not_active Withdrawn
- 2009-05-18 JP JP2011510619A patent/JP2011520609A/ja active Pending
- 2009-05-18 KR KR1020107027647A patent/KR20110008319A/ko not_active Ceased
- 2009-05-18 TW TW98116469A patent/TW201004707A/zh unknown
- 2009-05-18 US US12/993,791 patent/US8844909B2/en not_active Expired - Fee Related
-
2014
- 2014-08-19 US US14/462,950 patent/US20140357734A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| DE112009001233T5 (de) | 2011-07-21 |
| JP2011520609A (ja) | 2011-07-21 |
| US8844909B2 (en) | 2014-09-30 |
| CN102036742A (zh) | 2011-04-27 |
| US20140357734A1 (en) | 2014-12-04 |
| CN104722239A (zh) | 2015-06-24 |
| CN102036742B (zh) | 2015-02-11 |
| KR20110008319A (ko) | 2011-01-26 |
| WO2009143056A1 (en) | 2009-11-26 |
| US20110180148A1 (en) | 2011-07-28 |
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