JP7240260B2 - ガス溶解液供給装置およびガス溶解液供給方法 - Google Patents
ガス溶解液供給装置およびガス溶解液供給方法 Download PDFInfo
- Publication number
- JP7240260B2 JP7240260B2 JP2019104150A JP2019104150A JP7240260B2 JP 7240260 B2 JP7240260 B2 JP 7240260B2 JP 2019104150 A JP2019104150 A JP 2019104150A JP 2019104150 A JP2019104150 A JP 2019104150A JP 7240260 B2 JP7240260 B2 JP 7240260B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- solution
- gas solution
- flow rate
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
- B01F23/23105—Arrangement or manipulation of the gas bubbling devices
- B01F23/2311—Mounting the bubbling devices or the diffusers
- B01F23/23114—Mounting the bubbling devices or the diffusers characterised by the way in which the different elements of the bubbling installation are mounted
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/2366—Parts; Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/2366—Parts; Accessories
- B01F23/2368—Mixing receptacles, e.g. tanks, vessels or reactors, being completely closed, e.g. hermetically closed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/237—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media
- B01F23/2376—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media characterised by the gas being introduced
- B01F23/23761—Aerating, i.e. introducing oxygen containing gas in liquids
- B01F23/237613—Ozone
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/29—Mixing systems, i.e. flow charts or diagrams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/20—Measuring; Control or regulation
- B01F35/21—Measuring
- B01F35/211—Measuring of the operational parameters
- B01F35/2111—Flow rate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/20—Measuring; Control or regulation
- B01F35/21—Measuring
- B01F35/211—Measuring of the operational parameters
- B01F35/2115—Temperature
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/008—Control or steering systems not provided for elsewhere in subclass C02F
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F2101/00—Mixing characterised by the nature of the mixed materials or by the application field
- B01F2101/48—Mixing water in water-taps with other ingredients, e.g. air, detergents or disinfectants
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F2101/00—Mixing characterised by the nature of the mixed materials or by the application field
- B01F2101/58—Mixing semiconducting materials, e.g. during semiconductor or wafer manufacturing processes
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/02—Non-contaminated water, e.g. for industrial water supply
- C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/78—Details relating to ozone treatment devices
- C02F2201/784—Diffusers or nozzles for ozonation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/02—Temperature
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/03—Pressure
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/40—Liquid flow rate
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F15/00—Details of, or accessories for, apparatus of groups G01F1/00 - G01F13/00 insofar as such details or appliances are not adapted to particular types of such apparatus
- G01F15/08—Air or gas separators in combination with liquid meters; Liquid separators in combination with gas-meters
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Water Supply & Treatment (AREA)
- Organic Chemistry (AREA)
- Hydrology & Water Resources (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Fluid Mechanics (AREA)
- Accessories For Mixers (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Description
2 原料ガス供給部
3 放電部(ガス供給部)
4 純水供給部(液体供給部)
5 ガス溶解部
6 気液分離タンク(ガス溶解液タンク)
7 純水流量計
8 純水流量調整部
9 水位計
10 オゾンガス分解器
11 第1圧力調整部
12 ポンプ
13 供給配管
14 戻し配管
15 第1流量計(流量測定部)
16 第2流量計(第2の流量測定部)
17 圧力センサ
18 第2圧力調整部
19 温度計(温度測定部)
20 濃度計
21 ゼロ点計測配管
22 排水配管
23 第1バルブ
24 第2バルブ
25 第3バルブ
26 第3圧力調整部
Claims (7)
- ガス溶解液の原料となるガスを供給するガス供給部と、
前記ガス溶解液の原料となる液体を供給する液体供給部と、
前記液体供給部から供給された液体に前記ガス供給部から供給されたガスを溶解させてガス溶解液を生成するガス溶解部と、
前記ガス溶解部で生成されたガス溶解液が溜められるガス溶解液タンクと、
前記ガス溶解液タンクからユースポイントにガス溶解液を供給するための供給配管と、
前記ユースポイントに供給されるガス溶解液を前記ガス溶解部に戻すための戻し配管と、
前記戻し配管に設けられ、前記ガス溶解部に戻されるガス溶解液の流量を測定する流量測定部と、
前記戻し配管に設けられ、前記供給配管内の圧力を一定にする圧力調整部と、
前記戻し配管に設けられた前記流量測定部の測定結果に応じて、前記液体供給部から前記ガス溶解部に供給される液体の流量を調整する流量調整部と、
を備え、
前記戻し配管は、前記ユースポイントの上流側で前記供給配管から分岐して、前記ガス溶解部へ接続されており、
前記ガス溶解部では、前記液体供給部から供給された液体と前記戻し配管から戻されたガス溶解液に、前記ガス供給部から供給されたガスを溶解させることにより、前記ガス溶解部から前記ガス溶解液タンクへ送られて前記ガス溶解液タンクに溜められるガス溶解液が生成される、ガス溶解液供給装置。 - 前記供給配管には、前記ガス溶解液タンクから前記ユースポイントにガス溶解液を送り出すためのポンプが設けられ、
前記ポンプは、エアー駆動式のポンプで構成されている、請求項1に記載のガス溶解液供給装置。 - 前記供給配管には、前記ユースポイントに供給されるガス溶解液の流量を測定する第2の流量測定部が設けられ、
前記流量調整部は、前記流量測定部の測定結果と前記第2の流量測定部の測定結果に応じて、前記液体供給部から前記ガス溶解部に供給される液体の流量を調整する、請求項1または請求項2に記載のガス溶解液供給装置。 - 前記戻し配管には、前記ガス溶解部に戻されるガス溶解液の温度を測定する温度測定部が設けられている、請求項1~請求項3のいずれか一項に記載のガス溶解液供給装置。
- 前記ガス溶解液タンクの圧力を0~100KPaに調整することができる他の圧力調整部が設けられている、請求項1~請求項3のいずれか一項に記載のガス溶解液供給装置。
- 前記ガス溶解液の原料となるガスは、オゾンガスであり、
前記ガス溶解液の原料となる液体は、純水であり、
前記ガス溶解液は、オゾン水である、請求項1~請求項5のいずれか一項に記載のガス溶解液供給装置。 - ガス溶解液供給装置で実行されるガス溶解液供給方法であって、
前記ガス溶解液供給方法は、
液体供給部から供給された液体にガス供給部から供給されたガスをガス溶解部で溶解させてガス溶解液を生成することと、
前記ガス溶解部で生成されたガス溶解液をガス溶解液タンクに溜めることと、
前記ガス溶解液タンクから前記ガス溶解液を供給配管を介してユースポイントに供給することと、
前記ユースポイントに供給されるガス溶解液を前記ガス溶解部に戻すための戻し配管において、前記ユースポイントに供給されるガス溶解液のうち前記ガス溶解部に戻されるガス溶解液の流量を測定することと、
前記戻し配管において、前記供給配管内の圧力を一定にする圧力調整を行うことと、
前記戻し配管における前記ガス溶解液の流量の測定結果に応じて、前記液体供給部から前記ガス溶解部に供給される液体の流量を調整することと、
を含み、
前記戻し配管は、前記ユースポイントの上流側で前記供給配管から分岐して、前記ガス溶解部へ接続されており、
前記ガス溶解部では、前記液体供給部から供給された液体と前記戻し配管から戻されたガス溶解液に、前記ガス供給部から供給されたガスを溶解させることにより、前記ガス溶解部から前記ガス溶解液タンクへ送られて前記ガス溶解液タンクに溜められるガス溶解液が生成される、ガス溶解液供給方法。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019104150A JP7240260B2 (ja) | 2019-06-04 | 2019-06-04 | ガス溶解液供給装置およびガス溶解液供給方法 |
TW109114895A TWI815010B (zh) | 2019-06-04 | 2020-05-05 | 氣體溶解液供給裝置及氣體溶解液供給方法 |
SG10202005037PA SG10202005037PA (en) | 2019-06-04 | 2020-05-28 | Gas dissolution supply apparatus and gas dissolution supply method |
US16/885,794 US11352274B2 (en) | 2019-06-04 | 2020-05-28 | Gas dissolution supply apparatus and gas dissolution supply method |
KR1020200064882A KR102639443B1 (ko) | 2019-06-04 | 2020-05-29 | 가스 용해액 공급 장치 및 가스 용해액 공급 방법 |
EP20177920.4A EP3747535B1 (en) | 2019-06-04 | 2020-06-02 | Gas dissolution supply apparatus and gas dissolution supply method |
CN202010493049.0A CN112023736A (zh) | 2019-06-04 | 2020-06-03 | 气体溶解液供给装置及气体溶解液供给方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019104150A JP7240260B2 (ja) | 2019-06-04 | 2019-06-04 | ガス溶解液供給装置およびガス溶解液供給方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2020195967A JP2020195967A (ja) | 2020-12-10 |
JP7240260B2 true JP7240260B2 (ja) | 2023-03-15 |
Family
ID=70977356
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2019104150A Active JP7240260B2 (ja) | 2019-06-04 | 2019-06-04 | ガス溶解液供給装置およびガス溶解液供給方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US11352274B2 (ja) |
EP (1) | EP3747535B1 (ja) |
JP (1) | JP7240260B2 (ja) |
KR (1) | KR102639443B1 (ja) |
CN (1) | CN112023736A (ja) |
SG (1) | SG10202005037PA (ja) |
TW (1) | TWI815010B (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7412200B2 (ja) * | 2020-02-06 | 2024-01-12 | 株式会社荏原製作所 | ガス溶解液製造装置 |
KR102564803B1 (ko) | 2021-05-20 | 2023-08-07 | 홍승훈 | 가스 용해 시스템 |
CN114057273B (zh) * | 2021-11-22 | 2022-08-19 | 三峡大学 | 一种高溶解气水制备装置、高溶解气水制备方法及应用 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001137862A (ja) | 1999-11-11 | 2001-05-22 | Teeiku Wan Sogo Jimusho:Kk | オゾン水製造装置 |
JP2003117364A (ja) | 2001-10-19 | 2003-04-22 | Mitsubishi Heavy Ind Ltd | 液体に気体を溶解させる装置及び方法並びに気体溶解済み液の製造方法 |
JP2005161284A (ja) | 2003-11-28 | 2005-06-23 | Nittetu Chemical Engineering Ltd | 定濃度オゾン水の供給方法 |
JP2011224519A (ja) | 2010-04-23 | 2011-11-10 | Panasonic Electric Works Co Ltd | 酸素水生成装置 |
JP2014117628A (ja) | 2012-12-13 | 2014-06-30 | Ebara Corp | 循環式オゾン水供給方法、及び循環式オゾン水供給装置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2749495B2 (ja) * | 1993-03-15 | 1998-05-13 | 長廣 仁蔵 | 高濃度オゾン水製造方法及び高濃度オゾン水製造装置 |
JPH11244873A (ja) | 1998-03-05 | 1999-09-14 | Meidensha Corp | 光触媒反応装置 |
US6561382B2 (en) * | 2001-06-15 | 2003-05-13 | S.I.P. Technologies, L.L.C. | Method and apparatus for disinfecting a water cooler reservoir and its dispensing spigot(s) |
US6805791B2 (en) | 2000-09-01 | 2004-10-19 | Applied Science And Technology, Inc. | Ozonated water flow and concentration control apparatus |
JP2002316027A (ja) | 2001-04-19 | 2002-10-29 | Ebara Corp | ガス溶解水製造装置、およびその方法、超音波洗浄装置、およびその方法 |
KR200294901Y1 (ko) * | 2002-07-18 | 2002-11-13 | 동우기연 주식회사 | 오존수 생성장치 |
TW201004707A (en) * | 2008-05-19 | 2010-02-01 | Entegris Inc | Gasification systems and methods for making bubble free solutions of gas in liquid |
JP6734621B2 (ja) * | 2014-02-20 | 2020-08-05 | オルガノ株式会社 | オゾン水供給方法及びオゾン水供給装置 |
JP6210917B2 (ja) * | 2014-03-26 | 2017-10-11 | トスレック株式会社 | ナノバブル製造装置 |
JP6826437B2 (ja) * | 2016-01-15 | 2021-02-03 | 株式会社荏原製作所 | 供給液体製造装置および供給液体製造方法 |
JP7051410B2 (ja) | 2017-12-11 | 2022-04-11 | 富士通コンポーネント株式会社 | 印刷装置 |
CN208642344U (zh) * | 2018-07-19 | 2019-03-26 | 苏州方舟环保科技有限公司 | 一种用于杀菌消毒的高浓度臭氧水制造设备 |
-
2019
- 2019-06-04 JP JP2019104150A patent/JP7240260B2/ja active Active
-
2020
- 2020-05-05 TW TW109114895A patent/TWI815010B/zh active
- 2020-05-28 US US16/885,794 patent/US11352274B2/en active Active
- 2020-05-28 SG SG10202005037PA patent/SG10202005037PA/en unknown
- 2020-05-29 KR KR1020200064882A patent/KR102639443B1/ko active IP Right Grant
- 2020-06-02 EP EP20177920.4A patent/EP3747535B1/en active Active
- 2020-06-03 CN CN202010493049.0A patent/CN112023736A/zh active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001137862A (ja) | 1999-11-11 | 2001-05-22 | Teeiku Wan Sogo Jimusho:Kk | オゾン水製造装置 |
JP2003117364A (ja) | 2001-10-19 | 2003-04-22 | Mitsubishi Heavy Ind Ltd | 液体に気体を溶解させる装置及び方法並びに気体溶解済み液の製造方法 |
JP2005161284A (ja) | 2003-11-28 | 2005-06-23 | Nittetu Chemical Engineering Ltd | 定濃度オゾン水の供給方法 |
JP2011224519A (ja) | 2010-04-23 | 2011-11-10 | Panasonic Electric Works Co Ltd | 酸素水生成装置 |
JP2014117628A (ja) | 2012-12-13 | 2014-06-30 | Ebara Corp | 循環式オゾン水供給方法、及び循環式オゾン水供給装置 |
Also Published As
Publication number | Publication date |
---|---|
CN112023736A (zh) | 2020-12-04 |
EP3747535B1 (en) | 2022-05-18 |
US11352274B2 (en) | 2022-06-07 |
US20200385295A1 (en) | 2020-12-10 |
TWI815010B (zh) | 2023-09-11 |
TW202100234A (zh) | 2021-01-01 |
KR102639443B1 (ko) | 2024-02-23 |
SG10202005037PA (en) | 2021-01-28 |
EP3747535A1 (en) | 2020-12-09 |
JP2020195967A (ja) | 2020-12-10 |
KR20200139630A (ko) | 2020-12-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP7240260B2 (ja) | ガス溶解液供給装置およびガス溶解液供給方法 | |
KR102571000B1 (ko) | 공급 액체 제조 방법 | |
JP2019155221A (ja) | 循環式ガス溶解液供給装置および循環式ガス溶解液供給方法 | |
US8999069B2 (en) | Method for producing cleaning water for an electronic material | |
WO2015125500A1 (ja) | オゾン水供給方法及びオゾン水供給装置 | |
KR20170058928A (ko) | 가스 용해수 제조 장치 및 제조 방법 | |
KR102573112B1 (ko) | 가스 용해액 제조 장치 | |
JP4909648B2 (ja) | 循環型オゾン水製造装置及び該装置の運転方法 | |
WO2017122771A1 (ja) | 供給液体製造装置および供給液体製造方法 | |
TW201838930A (zh) | 洗淨水供給裝置 | |
TW202220746A (zh) | 氣體溶解液供給裝置 | |
JP2005262031A (ja) | 循環式ガス溶解水供給装置及び該装置の運転方法 | |
JP2010046570A (ja) | 超音波処理装置用供給液の製造装置、超音波処理装置用供給液の製造方法及び超音波処理システム | |
JP7550720B2 (ja) | ガス溶解液供給装置 | |
JP2022185727A (ja) | 供給液体製造装置 | |
JP7052423B2 (ja) | オゾン溶解水の製造装置及びこれを用いたオゾン溶解水の製造方法 | |
US20240075410A1 (en) | Gas solution supply apparatus | |
JP7292957B2 (ja) | ガス溶解水製造装置および方法 | |
JP2024032251A (ja) | ウェハ洗浄水供給装置 | |
JP2000000579A (ja) | オゾン水製造装置 | |
KR20050058752A (ko) | 오존유니트 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20210922 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20220519 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20220621 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20220720 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20221025 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20221124 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20230228 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20230303 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 7240260 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |