SG10202005037PA - Gas dissolution supply apparatus and gas dissolution supply method - Google Patents
Gas dissolution supply apparatus and gas dissolution supply methodInfo
- Publication number
- SG10202005037PA SG10202005037PA SG10202005037PA SG10202005037PA SG10202005037PA SG 10202005037P A SG10202005037P A SG 10202005037PA SG 10202005037P A SG10202005037P A SG 10202005037PA SG 10202005037P A SG10202005037P A SG 10202005037PA SG 10202005037P A SG10202005037P A SG 10202005037PA
- Authority
- SG
- Singapore
- Prior art keywords
- gas dissolution
- dissolution supply
- supply apparatus
- supply method
- gas
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/72—Treatment of water, waste water, or sewage by oxidation
- C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
- B01F23/23105—Arrangement or manipulation of the gas bubbling devices
- B01F23/2311—Mounting the bubbling devices or the diffusers
- B01F23/23114—Mounting the bubbling devices or the diffusers characterised by the way in which the different elements of the bubbling installation are mounted
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/2366—Parts; Accessories
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/2366—Parts; Accessories
- B01F23/2368—Mixing receptacles, e.g. tanks, vessels or reactors, being completely closed, e.g. hermetically closed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
- B01F23/237—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media
- B01F23/2376—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media characterised by the gas being introduced
- B01F23/23761—Aerating, i.e. introducing oxygen containing gas in liquids
- B01F23/237613—Ozone
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/20—Mixing gases with liquids
- B01F23/29—Mixing systems, i.e. flow charts or diagrams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/20—Measuring; Control or regulation
- B01F35/21—Measuring
- B01F35/211—Measuring of the operational parameters
- B01F35/2111—Flow rate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/20—Measuring; Control or regulation
- B01F35/21—Measuring
- B01F35/211—Measuring of the operational parameters
- B01F35/2115—Temperature
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/008—Control or steering systems not provided for elsewhere in subclass C02F
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F2101/00—Mixing characterised by the nature of the mixed materials or by the application field
- B01F2101/48—Mixing water in water-taps with other ingredients, e.g. air, detergents or disinfectants
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F2101/00—Mixing characterised by the nature of the mixed materials or by the application field
- B01F2101/58—Mixing semiconducting materials, e.g. during semiconductor or wafer manufacturing processes
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/02—Non-contaminated water, e.g. for industrial water supply
- C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/78—Details relating to ozone treatment devices
- C02F2201/784—Diffusers or nozzles for ozonation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/02—Temperature
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/03—Pressure
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2209/00—Controlling or monitoring parameters in water treatment
- C02F2209/40—Liquid flow rate
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F15/00—Details of, or accessories for, apparatus of groups G01F1/00 - G01F13/00 insofar as such details or appliances are not adapted to particular types of such apparatus
- G01F15/08—Air or gas separators in combination with liquid meters; Liquid separators in combination with gas-meters
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Water Supply & Treatment (AREA)
- Organic Chemistry (AREA)
- Hydrology & Water Resources (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Fluid Mechanics (AREA)
- Accessories For Mixers (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019104150A JP7240260B2 (en) | 2019-06-04 | 2019-06-04 | GAS SOLUTION SUPPLY DEVICE AND GAS SOLUTION SUPPLY METHOD |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10202005037PA true SG10202005037PA (en) | 2021-01-28 |
Family
ID=70977356
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10202005037PA SG10202005037PA (en) | 2019-06-04 | 2020-05-28 | Gas dissolution supply apparatus and gas dissolution supply method |
Country Status (7)
Country | Link |
---|---|
US (1) | US11352274B2 (en) |
EP (1) | EP3747535B1 (en) |
JP (1) | JP7240260B2 (en) |
KR (1) | KR102639443B1 (en) |
CN (1) | CN112023736A (en) |
SG (1) | SG10202005037PA (en) |
TW (1) | TWI815010B (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7412200B2 (en) * | 2020-02-06 | 2024-01-12 | 株式会社荏原製作所 | Gas solution manufacturing equipment |
KR102564803B1 (en) * | 2021-05-20 | 2023-08-07 | 홍승훈 | System for dissolving gas |
CN114057273B (en) * | 2021-11-22 | 2022-08-19 | 三峡大学 | High-solution gas water preparation device, high-solution gas water preparation method and application |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2749495B2 (en) * | 1993-03-15 | 1998-05-13 | 長廣 仁蔵 | High concentration ozone water production method and high concentration ozone water production device |
JPH11244873A (en) | 1998-03-05 | 1999-09-14 | Meidensha Corp | Photocatalyst reactor |
US6561382B2 (en) * | 2001-06-15 | 2003-05-13 | S.I.P. Technologies, L.L.C. | Method and apparatus for disinfecting a water cooler reservoir and its dispensing spigot(s) |
JP2001137862A (en) | 1999-11-11 | 2001-05-22 | Teeiku Wan Sogo Jimusho:Kk | Ozonized water generator |
US6805791B2 (en) | 2000-09-01 | 2004-10-19 | Applied Science And Technology, Inc. | Ozonated water flow and concentration control apparatus |
JP2002316027A (en) | 2001-04-19 | 2002-10-29 | Ebara Corp | Device and method for manufacturing gas-dissolved water, device and method for ultrasonic cleaning |
JP2003117364A (en) | 2001-10-19 | 2003-04-22 | Mitsubishi Heavy Ind Ltd | Apparatus and method of dissolving gas in liquid and method of manufacturing gas-dissolved liquid |
KR200294901Y1 (en) * | 2002-07-18 | 2002-11-13 | 동우기연 주식회사 | The System for Generating Ozonied-Water |
JP2005161284A (en) * | 2003-11-28 | 2005-06-23 | Nittetu Chemical Engineering Ltd | Method for supplying ozonized water of constant concentration |
CN104722239A (en) | 2008-05-19 | 2015-06-24 | 恩特格里公司 | Gasification method and device for making bubble free solutions of gas in liquid |
JP5635800B2 (en) | 2010-04-23 | 2014-12-03 | パナソニック株式会社 | Oxygen water generator |
JP2014117628A (en) | 2012-12-13 | 2014-06-30 | Ebara Corp | Circulation type method and apparatus for supplying ozone water |
JP6734621B2 (en) * | 2014-02-20 | 2020-08-05 | オルガノ株式会社 | Ozone water supply method and ozone water supply device |
JP6210917B2 (en) * | 2014-03-26 | 2017-10-11 | トスレック株式会社 | Nano bubble production equipment |
JP6826437B2 (en) * | 2016-01-15 | 2021-02-03 | 株式会社荏原製作所 | Supply liquid manufacturing equipment and supply liquid manufacturing method |
JP7051410B2 (en) | 2017-12-11 | 2022-04-11 | 富士通コンポーネント株式会社 | Printing equipment |
CN208642344U (en) * | 2018-07-19 | 2019-03-26 | 苏州方舟环保科技有限公司 | A kind of high-concentration ozone water manufacturing equipment for sterilizing |
-
2019
- 2019-06-04 JP JP2019104150A patent/JP7240260B2/en active Active
-
2020
- 2020-05-05 TW TW109114895A patent/TWI815010B/en active
- 2020-05-28 US US16/885,794 patent/US11352274B2/en active Active
- 2020-05-28 SG SG10202005037PA patent/SG10202005037PA/en unknown
- 2020-05-29 KR KR1020200064882A patent/KR102639443B1/en active IP Right Grant
- 2020-06-02 EP EP20177920.4A patent/EP3747535B1/en active Active
- 2020-06-03 CN CN202010493049.0A patent/CN112023736A/en active Pending
Also Published As
Publication number | Publication date |
---|---|
US11352274B2 (en) | 2022-06-07 |
KR102639443B1 (en) | 2024-02-23 |
JP2020195967A (en) | 2020-12-10 |
TW202100234A (en) | 2021-01-01 |
EP3747535B1 (en) | 2022-05-18 |
CN112023736A (en) | 2020-12-04 |
TWI815010B (en) | 2023-09-11 |
JP7240260B2 (en) | 2023-03-15 |
KR20200139630A (en) | 2020-12-14 |
EP3747535A1 (en) | 2020-12-09 |
US20200385295A1 (en) | 2020-12-10 |
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