JP2011520609A - 液体内のガス無気泡溶液を作成するガス化システムおよび方法 - Google Patents

液体内のガス無気泡溶液を作成するガス化システムおよび方法 Download PDF

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JP2011520609A
JP2011520609A JP2011510619A JP2011510619A JP2011520609A JP 2011520609 A JP2011520609 A JP 2011520609A JP 2011510619 A JP2011510619 A JP 2011510619A JP 2011510619 A JP2011510619 A JP 2011510619A JP 2011520609 A JP2011520609 A JP 2011520609A
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gas
liquid
contactor
flow rate
pressure
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JP2011520609A5 (enExample
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ヤンアン アニー シア，
ジェイ． カール ニアーメイヤー，
ロザリオ モリカ，
グレッグ ティー． コナー，
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エンテグリース，インコーポレイテッド
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/2319—Methods of introducing gases into liquid media
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/29—Mixing systems, i.e. flow charts or diagrams
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/20—Measuring; Control or regulation
    • B01F35/21—Measuring
    • B01F35/213—Measuring of the properties of the mixtures, e.g. temperature, density or colour
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/231—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids by bubbling
    • B01F23/23105—Arrangement or manipulation of the gas bubbling devices
    • B01F23/2312—Diffusers
    • B01F23/23124—Diffusers consisting of flexible porous or perforated material, e.g. fabric
    • B01F23/231244—Dissolving, hollow fiber membranes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/0318—Processes

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Accessories For Mixers (AREA)
JP2011510619A 2008-05-19 2009-05-18 液体内のガス無気泡溶液を作成するガス化システムおよび方法 Pending JP2011520609A (ja)

Applications Claiming Priority (9)

Application Number Priority Date Filing Date Title
US5422308P 2008-05-19 2008-05-19
US61/054,223 2008-05-19
US8253508P 2008-07-22 2008-07-22
US61/082,535 2008-07-22
US9523008P 2008-09-08 2008-09-08
US61/095,230 2008-09-08
US10150108P 2008-09-30 2008-09-30
US61/101,501 2008-09-30
PCT/US2009/044343 WO2009143056A1 (en) 2008-05-19 2009-05-18 Gasification systems and methods for making bubble free solutions of gas in liquid

Publications (2)

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JP2011520609A true JP2011520609A (ja) 2011-07-21
JP2011520609A5 JP2011520609A5 (enExample) 2014-08-14

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JP2011510619A Pending JP2011520609A (ja) 2008-05-19 2009-05-18 液体内のガス無気泡溶液を作成するガス化システムおよび方法

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Country Link
US (2) US8844909B2 (enExample)
JP (1) JP2011520609A (enExample)
KR (1) KR20110008319A (enExample)
CN (2) CN102036742B (enExample)
DE (1) DE112009001233T5 (enExample)
TW (1) TW201004707A (enExample)
WO (1) WO2009143056A1 (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016198726A (ja) * 2015-04-10 2016-12-01 タカラベルモント株式会社 炭酸水生成装置
JPWO2016167134A1 (ja) * 2015-04-13 2018-01-25 Dic株式会社 比抵抗値調整装置及び比抵抗値調整方法
JP2019065039A (ja) * 2013-02-28 2019-04-25 ニュー・ヘルス・サイエンシーズ・インコーポレイテッドＮｅｗ Ｈｅａｌｔｈ Ｓｃｉｅｎｃｅｓ， Ｉｎｃ． 血液処理のためのガス枯渇化およびガス添加デバイス
JP2019150760A (ja) * 2018-03-02 2019-09-12 栗田工業株式会社 オゾン溶解水の製造装置及びこれを用いたオゾン溶解水の製造方法
JP2025031952A (ja) * 2019-04-08 2025-03-07 エムケイエス インストゥルメンツ， インコーポレイテッド 溶存キャリアガス及び酸素含有量が低減されたアンモニア溶液を生成するためのシステムおよび方法

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010234298A (ja) * 2009-03-31 2010-10-21 Kurita Water Ind Ltd ガス溶解水供給装置及びガス溶解水の製造方法
US8438969B2 (en) * 2010-05-06 2013-05-14 Dr Pepper/Seven Up, Inc. Apparatus and method for dissolving gases in a beverage
US9403102B2 (en) * 2012-02-13 2016-08-02 United Technologies Corporation Heat exchange system configured with a membrane contactor
JP5914037B2 (ja) * 2012-02-23 2016-05-11 東京エレクトロン株式会社 冷却システム、冷却システムを備える基板処理装置及び冷却方法
CN102692926B (zh) * 2012-06-05 2014-10-22 哈尔滨工程大学 基于tms320c6713的船舶航向模糊pid融合控制器及控制方法
GB2506689A (en) * 2012-10-08 2014-04-09 Odour Services Internat Ltd Air pollution control apparatus and method of use
JP6362710B2 (ja) * 2014-05-15 2018-07-25 東京エレクトロン株式会社 フォトレジスト分注システムにおける増加した再循環及び濾過のための方法及び装置
AU2015100137A4 (en) * 2015-01-12 2015-03-05 Macau University Of Science And Technology Optimization of Start-up Transient Processes for Dual-Armed Cluster Tools with Wafer Revisiting
FR3036629B1 (fr) 2015-05-29 2019-06-21 Nicolas POURTAUD Dispositif de regulation de la concentration d'un gaz dans un liquide
US10732099B2 (en) * 2016-01-06 2020-08-04 Tokushima University Gas analysis device and gas analysis method using laser beam
US10228355B2 (en) 2016-05-06 2019-03-12 Board Of Regents, The University Of Texas System Volatile eluent preparation
CN106474768B (zh) * 2016-09-12 2019-01-29 华中科技大学 一种高精度耐腐蚀的自动配液换液装置
WO2018085892A1 (en) * 2016-11-11 2018-05-17 PTI Pacific Pty Ltd Modular system for gassing and degassing liquids
KR102558885B1 (ko) 2016-11-11 2023-07-24 엠케이에스 인스트루먼츠, 인코포레이티드 암모니아 가스가 용해되어 있는 탈이온수를 포함하는 전도성 액체를 생성하기 위한 시스템들 및 방법
MX391937B (es) * 2017-03-28 2025-03-21 Flow Control LLC Sistema de infusión de gas/líquido con gestión de nivel inteligente y salida de absorción ajustable
CN108854609B (zh) * 2017-05-10 2025-08-12 青岛经济技术开发区海尔热水器有限公司 一种微气泡水生产装置
JP7240260B2 (ja) * 2019-06-04 2023-03-15 株式会社荏原製作所 ガス溶解液供給装置およびガス溶解液供給方法
CN110773012A (zh) * 2019-12-02 2020-02-11 杭州老板电器股份有限公司 微纳米气泡制备装置及其制备方法
WO2023114129A1 (en) * 2021-12-14 2023-06-22 Mks Instruments, Inc. Dissolved ammonia delivery system and methods of use
CN118893499B (zh) * 2024-09-12 2025-11-14 福建理工大学 一种基于pid控制气体辅助抛光系统的设计方法

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08276121A (ja) * 1995-03-15 1996-10-22 Permea Inc 液体中の溶解したガスの量を調節する方法と装置、ならびに気／液接触体モジュールとその利用法
JP2002233878A (ja) * 2001-02-06 2002-08-20 Roki Techno Co Ltd 給水配管の殺菌洗浄方法
WO2003020405A1 (en) * 2001-08-28 2003-03-13 Mitsubishi Rayon Co.,Ltd. Device and method for manufacturing carbonated spring and carbonic water, control method for gas density applied thereto, and membrane module
JP2003154242A (ja) * 2001-11-26 2003-05-27 Texas Instr Japan Ltd 流体混合装置
JP2004079990A (ja) * 2002-06-20 2004-03-11 Dainippon Screen Mfg Co Ltd 基板処理装置および不活性ガス濃度制御方法
JP2004130205A (ja) * 2002-10-10 2004-04-30 Fuji Electric Systems Co Ltd オゾン含有水を用いたろ過膜の逆洗方法および逆洗装置
JP2005270793A (ja) * 2004-03-24 2005-10-06 Kurita Water Ind Ltd 窒素溶解水の製造装置
JP2007319843A (ja) * 2006-06-05 2007-12-13 Kurita Water Ind Ltd 気体溶解モジュール
JP2008093611A (ja) * 2006-10-13 2008-04-24 National Institute Of Advanced Industrial & Technology 極微小気泡を含む水の製造方法および極微小気泡を含む水
JP2008155186A (ja) * 2006-12-26 2008-07-10 Nomura Micro Sci Co Ltd オゾン水の製造方法及び製造装置

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3751879A (en) * 1971-04-26 1973-08-14 Instrumentation Specialties Co Apparatus for reducing the dissolved gas concentration in a liquid
EP0360009B1 (en) * 1988-08-20 1996-05-08 Nitto Denko Corporation Method of removing dissolved gas from liquid
US5766479A (en) * 1995-08-07 1998-06-16 Zenon Environmental Inc. Production of high purity water using reverse osmosis
JPH10324502A (ja) * 1997-05-21 1998-12-08 Dainippon Ink & Chem Inc 超純水の炭酸ガス付加装置及び付加方法
US6582496B1 (en) * 2000-01-28 2003-06-24 Mykrolis Corporation Hollow fiber membrane contactor
US6328905B1 (en) 1999-08-12 2001-12-11 Advanced Micro Devices, Inc. Residue removal by CO2 water rinse in conjunction with post metal etch plasma strip
US6982006B1 (en) * 1999-10-19 2006-01-03 Boyers David G Method and apparatus for treating a substrate with an ozone-solvent solution
US6805791B2 (en) * 2000-09-01 2004-10-19 Applied Science And Technology, Inc. Ozonated water flow and concentration control apparatus
US6884359B2 (en) * 2000-09-27 2005-04-26 Dainippon Ink And Chemicals, Inc. Apparatus and method for controlling resistivity of ultra pure water
CN1642628B (zh) 2002-03-19 2010-06-16 安格斯公司 中空纤维膜接触装置及方法
WO2004094022A2 (en) 2003-04-22 2004-11-04 Mykrolis Corporation Pleated construction for effecting gas transfer membrane
JP4330959B2 (ja) * 2003-09-05 2009-09-16 株式会社東芝 半導体基板の洗浄方法および洗浄装置、半導体基板、ならびに半導体装置
US7273549B2 (en) 2004-01-23 2007-09-25 Geoscience Support Services Inc. Membrane contactor apparatus including a module having hollow fiber membranes
JP2007519522A (ja) 2004-01-27 2007-07-19 インテグリス・インコーポレーテッド 液体から微細気泡を除去するための方法。
US20050279207A1 (en) 2004-06-16 2005-12-22 Advanced Technology Materials, Inc. Liquid delivery system
CN101479365A (zh) * 2006-05-05 2009-07-08 普拉斯科能源Ip控股公司毕尔巴鄂-沙夫豪森分公司 用于与气化器一起使用的热量回收系统
KR20090009950A (ko) * 2006-05-05 2009-01-23 플라스코에너지 아이피 홀딩스, 에스.엘., 빌바오, 샤프하우젠 브랜치 가스 균질화 시스템
US7641795B2 (en) * 2006-06-05 2010-01-05 Celgard Llc Membrane contactor
EP2044488A1 (en) * 2006-07-21 2009-04-08 Entegris, Inc. Apparatus and method for conditioning an immersion fluid
EP2104648B1 (en) * 2006-10-17 2013-04-17 MKS Instruments, Inc. System and method for carbonation of deionized water

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08276121A (ja) * 1995-03-15 1996-10-22 Permea Inc 液体中の溶解したガスの量を調節する方法と装置、ならびに気／液接触体モジュールとその利用法
JP2002233878A (ja) * 2001-02-06 2002-08-20 Roki Techno Co Ltd 給水配管の殺菌洗浄方法
WO2003020405A1 (en) * 2001-08-28 2003-03-13 Mitsubishi Rayon Co.,Ltd. Device and method for manufacturing carbonated spring and carbonic water, control method for gas density applied thereto, and membrane module
JP2003154242A (ja) * 2001-11-26 2003-05-27 Texas Instr Japan Ltd 流体混合装置
JP2004079990A (ja) * 2002-06-20 2004-03-11 Dainippon Screen Mfg Co Ltd 基板処理装置および不活性ガス濃度制御方法
JP2004130205A (ja) * 2002-10-10 2004-04-30 Fuji Electric Systems Co Ltd オゾン含有水を用いたろ過膜の逆洗方法および逆洗装置
JP2005270793A (ja) * 2004-03-24 2005-10-06 Kurita Water Ind Ltd 窒素溶解水の製造装置
JP2007319843A (ja) * 2006-06-05 2007-12-13 Kurita Water Ind Ltd 気体溶解モジュール
JP2008093611A (ja) * 2006-10-13 2008-04-24 National Institute Of Advanced Industrial & Technology 極微小気泡を含む水の製造方法および極微小気泡を含む水
JP2008155186A (ja) * 2006-12-26 2008-07-10 Nomura Micro Sci Co Ltd オゾン水の製造方法及び製造装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019065039A (ja) * 2013-02-28 2019-04-25 ニュー・ヘルス・サイエンシーズ・インコーポレイテッドＮｅｗ Ｈｅａｌｔｈ Ｓｃｉｅｎｃｅｓ， Ｉｎｃ． 血液処理のためのガス枯渇化およびガス添加デバイス
JP2016198726A (ja) * 2015-04-10 2016-12-01 タカラベルモント株式会社 炭酸水生成装置
JPWO2016167134A1 (ja) * 2015-04-13 2018-01-25 Dic株式会社 比抵抗値調整装置及び比抵抗値調整方法
US10792623B2 (en) 2015-04-13 2020-10-06 Dic Corporation Device for adjusting specific resistance value and method for adjusting specific resistance value
JP2019150760A (ja) * 2018-03-02 2019-09-12 栗田工業株式会社 オゾン溶解水の製造装置及びこれを用いたオゾン溶解水の製造方法
JP7052423B2 (ja) 2018-03-02 2022-04-12 栗田工業株式会社 オゾン溶解水の製造装置及びこれを用いたオゾン溶解水の製造方法
JP2025031952A (ja) * 2019-04-08 2025-03-07 エムケイエス インストゥルメンツ， インコーポレイテッド 溶存キャリアガス及び酸素含有量が低減されたアンモニア溶液を生成するためのシステムおよび方法

Also Published As

Publication number Publication date
DE112009001233T5 (de) 2011-07-21
TW201004707A (en) 2010-02-01
WO2009143056A1 (en) 2009-11-26
CN102036742A (zh) 2011-04-27
US20140357734A1 (en) 2014-12-04
US8844909B2 (en) 2014-09-30
US20110180148A1 (en) 2011-07-28
CN102036742B (zh) 2015-02-11
KR20110008319A (ko) 2011-01-26
CN104722239A (zh) 2015-06-24

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