201003320 六、發明說明： 【發明所屬之技術領域】 本發明是關於塗佈裝置。 本案是根據於2008年〇4月24日在日本所申請的日 本特願2008 — 113849號案與日本特願2008_ι1385〇來主 張優先權，在此引用其內容。 【先前技術】 在液晶顯示器等的構成顯示面板的玻璃基板上，形成 有配線或電極、彩色濾光片等的細微圖案。一般來說這種 圖案’是用例如光微影技術等的方法所形成。在光微影技 術中’分別進行：在玻璃基板上形成光阻膜的步驟、將該 光阻膜進行圖案曝光的步驟、及之後將該光阻膜予以顯像 的步驟。 作爲在基板的表面上塗佈光阻膜的裝置，已知的塗佈 裝置（例如參考專利文獻1)，是將狹縫噴嘴固定，對移 動於該狹縫噴嘴下方的玻璃基板塗佈光阻劑。例如當光阻 劑在狹縫噴嘴的前端凝固而附著時，會產生塗佈不均等情 形而塗佈性能會惡化，所以當維修時則需要清潔狹縫噴嘴 的前端。 狹縫噴嘴前端的清潔，通常是藉由作業者以手工作業 來擦拭在該狹縫噴嘴前端附著的異物來進行的。狹縫噴嘴 是設置在用來搬運基板的台部上，所以以往作業者是登上 台部而接取到狹縫噴嘴。 -5- 201003320 〔專利文獻1〕 日本特開2 00 5 — 23 60 92號公報 【發明內容】 〔發明欲解決的課題〕 可是’台部是設計用來搬運基板，原來並沒有預定作 業者的進入。因此，如果要作成讓作業者能在台部上安全 作案的話’維修步驟會變得很複雜。而且也可能會因爲作 業者登上台部而讓垃圾或塵埃等附著在台部上。 鑑於以上的情形，本發明的目的是要提供一種塗佈裝 置’可提升維修的效率性’並且能防止垃圾或塵埃等附著 到基板搬運部上。 〔用以解決課題的手段〕 爲了達成上述目的，本發明的第一型態的塗佈裝置， 具備有·在錯由基板搬運邰搬運基板的同時，將液狀體塗 佈於該基板的塗佈部，其特徵爲：上述塗佈部，具有吐出 上述液狀體的噴嘴，並且具備有：將上述塗佈部朝向上述 基板搬運方向或與基板搬運方向相反的方向移動至，作業 者可對上述噴嘴進行接取的區域的移動機構。 藉由本發明的第一型態的塗佈裝置，具備有：在藉由 基板搬運部搬運基板的同時，將液狀體塗佈於該基板的塗 佈部’該塗佈部，具有吐出液狀體的噴嘴，並且具備有·· 將塗佈部朝向基板搬運方向或與基板搬運方向相反的方向 -6- 201003320 移動至，作業者可相對於噴嘴進行接取的區域的移動機構 :所以作業者不必直接登上基板搬運部，則可進行噴嘴的 清潔等的維修。藉此，則可提升維修的效率性，並且能夠 防止垃圾或塵埃等附著到基板搬運部上。 在上述第一型態的塗佈裝置，上述移動機構，在上述 基板搬運部上，將上述基板搬運方向的基板搬入側及基板 搬出側的其中至少一方的端部，作爲上述區域而使上述塗 佈部移動。 藉由該構造的塗佈裝置，移動機構，在基板搬運部上 ，將基板搬運方向的基板搬入側及基板搬出側的其中至少 一方的端部，作爲上述作業者可接取的區域而使塗佈部移 動，所以能更容易讓作業者接取到噴嘴。 在上述第一型態的塗佈裝置，上述移動機構，將超過 上述基板搬運方向的基板搬入側及基板搬出側的其中至少 一方的上述基板搬運部的端部的部分，作爲上述區域而使 上述塗佈部移動。 藉由該構造的塗佈裝置，移動機構，將超過基板搬運 方向的基板搬入側及基板搬出側的其中至少一方的基板搬 運部的端部的部分，作爲上述作業者可接取的區域而使塗 佈部移動’所以作業者在偏離基板搬運部上的位置可接取 到噴嘴。藉此，則能更確實地防止垃圾或塵埃等附著在基 板搬運部上。 在上述第一型態的塗佈裝置，又具備有：將上述塗佈 部保持在上述基板搬運部上的預定位置的保持機構。 -7- 201003320 藉由該構造的塗佈裝置’又具備有：將塗佈部保持在 基板搬運部上的預定位置的保持機構’所以能使塗佈部的 位置更加穩定。藉此’讓作業者更容易接取到噴嘴。 在上述第一型態的塗佈裝置，又具備有：設置於上述 基板搬運部上，將上述噴嘴的狀態進行管理的管理部。 藉由該構造的塗佈裝置’又具備有：設置於基板搬運 部上，將噴嘴的狀態進行管理的管理部’所以除了可藉由 管理部管理噴嘴的狀態之外’作業者能更有效率地清潔噴 嘴，所以可獲得高維修性的塗佈裝置。 在上述第一型態的塗佈裝置，又具備有：使上述管理 部移動到上述基板搬入側及上述基板搬出側的其中至少一 方的管理部移動機構。 藉由該構造的塗佈裝置’又具備有：使管理部移動到 基板搬入側及基板搬出側的其中至少一方的管理部移動機 構’所以能配合噴嘴的移動位置使管理部的位置移動。藉 此，則能更有效率地進行作業者對噴嘴的維修。並且，藉 由以管理部移動機構使管理部移動，則也能與噴嘴同樣地 將管理部進行維修。 在上述第一型態的塗佈裝置’上述管理部配置於上述 區域上’上述移動機構使上述塗佈部移動到上述管理部上 〇 藉由該構造的塗佈裝置，管埋部配置於上述作業者可 接取的區域上，移動機構使塗佈部移動到管理部上，所以 當噴嘴進行維修時，可使管理部移動到噴嘴的下方。藉由 -8- 201003320 將管理部配置於噴嘴與基板搬運部之間，則例如在將噴嘴 清潔等的維修中，能夠防止凝固的液狀體等從噴嘴落下到 基板搬運部上，而能將基板搬運部上保持潔淨。 在上述第一型態的塗佈裝置，上述移動機構’超過上 述管理部來使上述塗佈部移動。 藉由該構造的塗佈裝置，移動機構，超過管理部來使 塗佈部移動，所以能夠與管理部的位置無關來設定塗佈部 的移動位置。藉此，作業者能更容易進行噴嘴的維修。 在上述第一型態的塗佈裝置，上述管理部移動機構， 與上述塗佈部的移動連動來使上述管理部移動。 藉由該構造的塗佈裝置，管理部移動機構，與塗佈部 的移動連動來使管理部移動，所以與個別進行塗佈部的移 動及管理部的移動的情況相比，可以更縮短移動時間，並 且能更容易地進行移動控制。 在上述第一型態的塗佈裝置，設置有複數個上述塗佈 部。 藉由該構造的塗佈裝置，由於設置有複數個塗佈部， 例如在藉由複數個塗佈部的其中一個塗佈部來進行液狀體 的塗佈的期間，可以對剩餘的塗佈部進行噴嘴的維修。藉 此’可以縮短處理節奏，可提高塗佈性能，能獲得維修性 良好的塗佈裝置。 在上述第一型態的塗佈裝置，上述移動機構，將一部 分的上述塗佈部朝向上述搬運方向的基板搬入側移動，將 剩餘的上述塗佈部朝上述基板搬出側移動。 201003320 藉由該構造的塗佈裝置，在設置有複數個塗佈部的情 況，將一部分的塗佈部朝向搬運方向的基板搬入側移動， 將剩餘的塗佈部朝基板搬出側移動’所以針對複數個塗佈 部，可以在基板搬入側及基板搬出側兩側同時進行噴嘴的 維修。對於複數個塗佈部可以分擔進行維修，所以可以減 輕作業者的負擔。 在上述第一型態的塗佈裝置，上述噴嘴可旋轉地設置 成朝上述區域側傾斜。 藉由該構造的塗佈裝置，噴嘴可旋轉地設置成朝區域 側傾斜，所以當作業者接取時，可以使噴嘴朝向作業者的 方向。藉此，作業者能容易進行噴嘴的維修。 爲了達成上述目的，本發明的第二型態的塗佈裝置， 是具備有：在藉由基板搬運部搬運基板的同時，將液狀體 塗佈於該基板的塗佈部，其特徵爲··上述塗佈部，具有吐 出上述液狀體的噴嘴，上述基板搬運部具備有變更機構， 該變更機構’可變更成：形成相對於上述噴嘴進行接取用 的作業者進入空間的空間形成狀態、與搬運上述基板的基 板搬運狀態。 藉由本發明的第二型態的塗佈裝置，基板搬運部具備 有變更機構’該變更機構，可變更成：形成相對於吐出液 狀體的噴嘴進行接取用的作業者進入空間的空間形成狀態 、與搬運基板的基板搬運狀態，所以當噴嘴進行維修時讓 基板搬運部成爲空間形成狀態，而可在作業者進入空間內 S襄作業者進行維修。藉此，則可避免作業者直接進入基板 -10- 201003320 搬運部上，所以可提升維修效率’並且能防止垃圾或塵埃 附著在基板搬運部上。 在上述第二型態的塗佈裝置，上述變更機構，設置成 可將至少上述基板搬運部的一部分移動。 藉由該構造的塗佈裝置，變更機構，設置成可將至少 基板搬運部的一部分移動，所以藉由使該一部分移動，則 可在基板搬運部有效率地形成作業者進入空間。 在上述第二型態的塗佈裝置，上述變更機構’設置成 可將上述基板搬運部的一部分與上述基板搬運部的剩餘部 分，於上述基板的搬運方向相對地移動。 藉由該構造的塗佈裝置’變更機構’設置成可將基板 搬運部的一部分與基板搬運部的剩餘部分’於基板的搬運 方向相對地移動，所以藉由使上述一部分與剩餘部分相對 地移動，則可在基板搬運部有效率地形成作業者進入空間 〇 在上述第二型態的塗佈裝置’在上述基板搬運部之中 將上述基板搬入的基板搬入側’將具有複數個溝部且從俯 視方向觀察爲梳齒狀的台部設置作爲上述一部分’設置於 上述台部的梳齒部分的上述搬運方向的尺寸’較上述基板 搬運部之中的上述基板搬入側的上述搬運方向的尺寸更小 0 藉由該構造的塗佈裝置’在基板搬運部之中將基板搬 入的基板搬入側，將具有複數個溝部且從俯視方向觀察爲 梳齒狀的台部設置作爲一部分’所以能夠谷易將基板搬入 -11 - 201003320 到基板搬運部上。設置於台部的梳齒部分的搬運方向的尺 寸’較基板搬運部之中的基板搬入側的搬運方向的尺寸更 小，所以當移動台部時，或者將台部與剩餘部分相對移動 時’可以避免台部相對於剩餘部分超出。藉此，即使在形 成有作業者進入空間的情況，也能穩定保持台部。 在上述第二型態的塗佈裝置，上述基板搬運部，具有 用來支承上述一部分的支承機構。 藉由該構造的塗佈裝置，基板搬運部，具有用來支承 一部分的支承機構，所以當使一部分移動時，可以將上述 一部分穩定支承。 在上述第二型態的塗佈裝置，上述變更機構，設置成 可將至少上述基板搬運部的一部分變形。 藉由該構造的塗佈裝置，變更機構，設置成可將基板 搬運部的至少一部分變形，所以藉由將該基板搬運部的至 少一部分變形，則能夠有效率地形成作業者進入空間。 在上述第二型態的塗佈裝置，上述變更機構’設置成 可將上述基板搬運部的一部分相對於上述基板搬運部的剩 餘部分彎折。 藉由該構造的塗佈裝置，變更機構，設置成可將基板 搬運部的一部分相對於基板搬運部的剩餘部分彎折’所以 藉由將上述一部分彎折，則可有效率的形成作業者進入空 間。 在上述第二型態的塗佈裝置，上述基板搬運部’具有 :具有複數個溝部且從俯視方向觀察爲梳齒狀的台部’上 -12- 201003320 述台部之中從俯視方向觀察爲梳齒的部分，作爲上述一部 分而設置成可集中在預定的部位。 藉由該構造的塗佈裝置，基板搬運部，具有：具有複 數個溝部且從俯視方向觀察爲梳齒狀的台部，該台部之中 從俯視方向觀察爲梳齒的部分，作爲一部分而設置成可集 中在預定的部位，所以藉由將台部的梳齒的部分集中在預 定的部位，則能有效率地形成作業者進入空間。 在上述第二型態的塗佈裝置，又具備有：將上述一部 分與上述剩餘部分之間的位置予以對準的位置對準機構。 藉由該構造的塗佈裝置，又具備有：將一部分與剩餘 部分之間的位置予以對準的位置對準機構，所以當從空間 形成狀態切換到基板搬運狀態時，可以防止基板搬運部的 形狀相對於原本的形狀不吻合。 在上述第二型態的塗佈裝置，上述基板搬運部，具有 對上述基板塗佈上述液狀體的塗佈區域，上述一部分，是 在上述基板搬運部之中對於上述塗佈區域，設置在上述基 板的搬運方向的基板搬入側及上述基板搬出側的其中至少 一方側的部分。 在基板塗佈液狀體的塗佈區域的形狀等的狀態變化時 ’塗佈於基板上的液狀體的狀態會大幅變化，塗佈狀態會 變得不穩定。藉由上述構造的塗佈裝置，基板搬運部’具 有對基板塗佈液狀體的塗佈區域，一部分，是在基板搬運 部之中相對於塗佈區域，設置在基板的搬運方向的基板搬 入側及基板搬出側的其中至少一方側的部位，所以可以避 -13- 201003320 免將作業者進入空間直接設置在塗佈區域。藉此，可以使 塗佈狀態穩定。 在上述第二型態的塗佈裝置，上述塗佈部，可朝上述 基板的搬運方向的基板搬入側及基板搬出側的其中至少其 中一方移動。 藉由該構造的塗佈裝置，塗佈部，可朝基板的搬運方 向的基板搬入側及基板搬出側的其中至少其中一方移動’ 所以可配合作業者進入空間的形成位置使塗佈部朝所希望 的位置移動。藉此，可更提高維修效率。 在上述第二型態的塗佈裝置，上述塗佈部設置有複數 個。 藉由該構造的塗佈裝置，塗佈部設置有複數個，例如 在藉由複數個塗佈部的其中一個塗佈部來進行液狀體的塗 佈的期間，可以對剩餘的塗佈部進行噴嘴的維修。藉此’ 可以縮短處理節奏，可提高塗佈性能，能獲得維修性良好 的塗佈裝置。 在上述第二型態的塗佈裝置，複數的上述塗佈部其中 一部分設置成可朝向上述基板搬入側移動，剩餘的塗佈部 設置成可朝上述基板搬出側移動。 藉由該構造的塗佈裝置，複數的塗佈部其中一部分設 置成可朝向基板搬入側移動，剩餘的塗佈部設置成可朝基 板搬出側移動’所以針對複數個塗佈部，可以在基板搬入 側及基板搬出側兩側同時進行噴嘴的維修。藉此可縮短維 修所需的時間，對於複數個塗佈部可以分擔進行維修，所 -14- 201003320 以可以減輕作業者的負擔。在該情況，將作業者進入空間 分別形成在基板搬入側及基板搬出側較佳。 在上述第二型態的塗佈裝置，在上述基板搬運部上， 又具備有：將上述噴嘴的狀態進行管理的管理部，上述管 理部’係可及於上述一部分及上述基板搬運部的剩餘部分 地沿著上述基板的搬運方向朝向基板的搬入側及基板的搬 出側的其中至少一方進行移動。 從噴嘴吐出的液狀體在凝固的狀態會附著於該噴嘴， 當作業者對噴嘴維修時，該凝固的液狀體可能會附著於基 板搬運部上。藉由上述構造的本發明的塗佈裝置，在基板 搬運部上，又具備有：將噴嘴的狀態進行管理的管理部， 管理部’涵蓋一部分及基板搬運部的剩餘部分，沿著基板 的搬運方向可移動到基板的搬入側及基板的搬出側的其中 至少一方，所以可配合噴嘴的位置將管理部移動到上述噴 嘴的正下方，所以可防止凝固的液狀體等的異物附著於基 板搬運部上。並且由於具有作業者進入空間，所以與噴嘴 同樣地能將管理部進行維修。 在上述第一或第二型態的塗佈裝置，上述基板搬運部 ’又具備有：使上述基板浮起的浮起機構。 如果作業者直接登上基板搬運部進行作業的話，垃圾 或塵埃等容易附著在基板搬運部上。當基板搬運部具備有 使基板浮起的浮起機構時，上述垃圾或塵埃等附著於基板 ’而可能使基板的品質降低。藉由上述構造的塗佈裝置， 作業者不需要直接登上基板搬運部進行作業，所以可防止 -15- 201003320 垃圾或塵埃等附著於基板搬運部上。藉此可避免讓基板品 質降低。 〔發明效果〕 藉由本發明的第一型態的塗佈裝置，具備有：在藉由 基板搬運部搬運基板的同時，將液狀體塗佈於上述基板的 塗佈部，塗佈裝置的上述塗佈部’具有吐出液狀體的噴嘴 ，並且具備有：將塗佈部朝向基板搬運方向或與基板搬運 方向相反的方向移動至，作業者可相對於噴嘴進行接取的 區域的移動機構，所以作業者不必直接登上基板搬運部’ 則可進行噴嘴的清潔等的維修。藉此，則可提升維修的效 率性，並且能夠防止垃圾或塵埃等附著到基板搬運部上。 藉由本發明的第二型態的塗佈裝置，基板搬運部具備 有變更機構，該變更機構，可變更成：形成相對於吐出液 狀體的噴嘴進行接取用的作業者進入空間的空間形成狀態 、與搬運基板的基板搬運狀態，所以當噴嘴進行維修時讓 基板搬運部成爲空間形成狀態，而可在作業者進入空間內 讓作業者進行維修。藉此，則可避免作業者直接進入基板 搬運部上，所以可提升維修效率，並且能防止垃圾或塵埃 附著在基板搬運部上。 【實施方式】 〔第一實施方式〕 根據圖面來說明本發明的第一實施方式。 -16- 201003320 第1圖是本實施方式的塗佈裝置1的立體圖。 如第1圖所示，本實施方式的塗佈裝置1，是例如在 液晶面板等所用的玻璃基板上塗佈光阻劑的塗佈裝置，是 以：基板搬運部2、塗佈部3、管理部4，爲主要構成元件 。該塗佈裝置1’是在藉由基板搬運部2使基板浮起的狀 態來進行搬運’且藉由塗佈部3將光阻劑塗佈於該基板上 ，藉由管理部4來管理塗佈部3的狀態。 第2圖是塗佈裝置1的正視圖，第3圖是塗佈裝置j 的俯視圖’第4圖是塗佈裝置I的側視圖。參考這些圖面 來詳細說明塗佈裝置1的構造。 以下在說明塗佈裝置1的構造時，爲了容易表示，使 用XYZ座標系統來說明圖中的方向。將基板搬運部2的 長軸方向也就是基板的搬運方向記爲X方向。將從俯視方 向觀察與X方向（基板搬運方向）垂直相交的方向記爲γ 方向。將與包含X方向軸及Y方向軸的平面垂直的方向 g己爲z方向。分別在X方向、γ方向及z方向，圖中箭頭 的方向爲+方向’與箭頭的方向相反的方向爲_方向。 (基板搬運部） 首先說明基板搬運部2的構造。 基板搬運部2具有：基板搬入區域20、塗佈處理區域 2 1、基板搬出區域2 2、搬運機構2 3、以及支承這些構造 的框架部24。在該基板搬運部2，是藉由搬運機構23將 基板S依序搬運到基板搬入區域2 0、塗佈處理區域2 1、 -17- 201003320 及基板搬出區域22。基板搬入區域20、塗佈處理逼 、及基板搬出區域22 ’是以該順序從基板搬運方向 側排列到下游側。搬運機構2 3，爲了要涵蓋基板搬 20'塗佈處理區域21、及基板搬出區域22的各部 設置在該各部分的其中一側。 基板搬入區域20’是將從裝置外部搬運過來的 予以搬入的部位，具有：搬入側台2 5、與升降機構 搬入側台2 5，設置在框架部2 4上的Y方向中 是例如由S U S等所構成的從俯視方向觀察爲矩形的 件。該搬入側台2 5，其X方向爲長軸。在搬入側ΐ 分別設有複數的空氣噴出孔2 5 a、與複數的升降銷 2 5 b。該空氣噴出孔2 5 a及升降銷出沒孔2 5 b，是設 穿搬入側台2 5。 空氣噴出孔25a，是將空氣噴出到搬入側台25 面2 5 c上的孔，例如在搬入側台2 5之中基板S通 域配置成從俯視方向觀察爲矩陣狀。該空氣噴出孔 接著沒有圖示的空氣供給源。在該搬入側台2 5，藉 氣噴出孔2 5 a所噴出的空氣而能使基板S朝+ Z方 〇 升降銷出沒孔2 5 b，是設置在搬入側台2 5之中 搬入的區域。該升降銷出沒孔25b，讓供給到台表 的空氣不會漏出。 在該搬入側台2 5之中的Y方向的兩端部，各 一個校準裝置25d。校準裝置25d，是將搬入到搬 £域21 的上游 入區域 分，而 基板S 2 6 ° 央部， 板狀構 Ξί 25 -出沒孔 置成貫 的台表 過的區 25a連 由從空 向浮起 基板S 面 2 5c 設置有 入側台 -18- 201003320 25的基板S予以定位的裝置。各校準裝置25d 孔部、與設在該長孔部內的定位構件，將搬入到 2 5的基板從兩側機械性地予以夾持。 升降機構2 6，是設置在搬入側台2 5的基板 的背面側。該升降機構26具有：升降構件26a、 升降銷26b。升降構件26a，連接於沒有圖示的 ，藉由該驅動機構的驅動而讓升降構件26a朝Z 。複數的升降銷26b，從升降構件26a的上面部 側台2 5豎立設置。各升降銷2 6 b，是配置在：從 觀察分別與上述升降銷出沒孔2 5 b重疊的位置。 降構件2 6 a朝Z方向移動，則各升降銷2 6 b會從 沒孔25b出沒於台表面25c上。各升降銷26b的 的端部是設置成分別與Z方向上的位置一致，而 置外部搬運過來的基板S保持爲水平的狀態。 塗佈處理區域2 1 ’是進行光阻劑的塗佈處理 設置有：將基板S浮起支承的處理台27。 處理台2 7 ’是以例如硬質氧化銘膜爲主成分 材料來覆盖台表面2 7 c的從俯視方向觀察爲矩形 件’是設置在相對於搬入側台2 5的+ X方向側 台2 7之中以光吸收材料覆蓋的部位，會抑制雷 光線反射。該處理台27，Y方向爲長軸。處理台 方向的尺寸’與搬入側台2 5的Y方向尺寸大致 處理台27設置有：將空氣噴出到台表面27c上 空氣噴出孔27a、與將台表面27c上的空氣予以 具有：長 搬入側台 搬入位置 與複數的 驅動機構 方向移動 朝向搬入 俯視方向 藉由讓升 升降銷出 + Z方向 能將從裝 的部位， 的光吸收 的板狀構 。在處理 时光等的 27的 Y 相同。在 的複數的 吸引的複 -19- 201003320 數的空氣吸引孔27b。這些空氣噴出孔27a及空氣吸引孔 2 7b，設置成貫穿處理台27。在處理台27的內部，設置有 :用來對通過於空氣噴出孔27a及空氣吸引孔27b的氣體 的壓力施加阻力的沒有圖示的複數個溝部。該複數個溝部 ，在台部內部連接於空氣噴出孔27a及空氣吸引孔27b。 在處理台27，空氣噴出孔27a的間距，是相較於設置 在搬入側台2 5的空氣噴出孔2 5 a的間距更狹窄，與搬入 側台25相比，將空氣噴出孔27a設置得較緊密。因此， 與其他的台部相比，在該處理台2 7能以較高精確度來調 節基板的浮起量，基板的浮起量例如可控制爲0 // m以上 100/zm以下，而0//m以上50#m以下較佳。 基板搬出區域22，是用來將塗佈有光阻劑的基板s 搬出到裝置外部的部位，具有：搬出側台2 8、與升降機構 29。該搬出側台28，設置在相對於處理台27的+ X方向 側，由與設置在基板搬入區域2 0的搬入側台2 5大致相同 的材質、尺寸所構成。與搬入側台2 5同樣地，在搬出側 台28設置有：空氣噴出孔28a及升降銷出沒孔28b。升降 機構29，設置在搬出側台28的基板搬出位置的背面側， 例如以框架部2 4來支承。升降機構2 9的升降構件2 9 a及 升降銷29b，與設置在基板搬入區域20的升降機構26的 各部位爲相同的構造。該升降機構29，當將搬出側台28 上的基板S搬出到外部裝置時，能錯由基板s交接用的升 降銷29b來將基板S抬起。 搬運機構23’具有：搬運機23a、真空襯墊23b、軌 -20- 201003320 道23c。搬運機23a的構造是在內部設置有例如線性馬達 ，藉由驅動該線性馬達’讓搬運機23a可於軌道23c上移 動。 該搬運機2 3 a是配置成：在俯視方向觀察讓預定的部 分23d重疊於基板S的- Y方向端部。與該基板S重疊的 部分23d，是設置在：較當使基板S浮起時的基板背面的 高度位置更低的位置。 真空襯墊23b ’是有複數個排列在搬運機23a之中與 上述基板S重疊的部分23d。該真空襯墊23b，具有用來 真空吸附基板S的吸附面’配置成讓該吸附面朝向上方。 真空襯墊2 3 b，藉由讓吸附面吸附住基板S的背面端部’ 則可保持住該基板S。各真空襯墊23b，其從搬運機23a 的上面部起算的高度位置是可調節的，例如可因應基板S 的浮起量而將真空襯墊23b的高度位置上下調整。 軌道23c，設置於框架部24的一 Y方向側的側部24a 上，是在：搬入側台2 5、處理台2 7、及搬出側台2 8的側 方涵蓋各台部地延伸著，藉由滑動於該軌道23c而能讓搬 運機23a沿著上述各台部移動。 (塗佈部） 接著說明塗佈部3的構造。 塗佈部3 ’是用來在基板S上塗佈光阻劑的部分，具 有：門型框架31、與噴嘴32。 門型框架3 1 ’具有：支柱構件3 1 a、與架橋構件3 1 b -21 - 201003320 ，是設置成在γ方向跨越處理台27。支柱構件31a’在 理台2 7的Y方向側各設置有—個，各支柱構件3 1 a分 支承於框架部24的Y方向側的兩側面。各支柱構件3 ，是設置成讓其上端部的高度位置一致。架橋構件3 1 b 是架橋於各支柱構件3 1 a的上端部之間’相對於該支柱 件3 1 a可進行升降。 該門型框架3 1是連接於移動機構3 4，移動機構3 4 具有框架構件3 5及驅動機構3 6。而在框架部2 4之中的 Y方向側的側部24a及+ Y方向側的側部24b上各設置 一條軌道構件3 5，分別朝X方向延伸。兩條軌道構件 的一 X方向的端部，設置成分別延伸至框架部24的側 2 4 a及2 4 b的一 X方向的端部。驅動機構3 6，是連接於 型框架3 1，且使塗佈部3沿著軌道構件3 5移動的致動 〇 藉由將軌道構件3 5設置至框架部2 4的側部2 4 a 2 4 b的一 X方向的端部，則塗佈部3可移動至搬入側台 的- X方向的端部。伴隨著塗佈部3的移動，設置於該 佈部3的噴嘴3 2也可移動至搬入側台2 5的一 X方向的 部。該門型框架31’藉由沒有圖示的移動機構讓其也可 Z方向移動。 噴嘴3 2 ’是作成其中一方向爲長軸的長條狀，是設 在門型框架3 1的架橋構件3〗b的~ z方向側的面部。 該噴嘴3 2之中的一 Z方向的前端，沿著本身的長軸方 設置有狹縫狀的開口部3 2 a ’從該開口部3 2 a將光阻劑 處 別 la 構 有 3 5 部 門 器 及 25 塗 端 朝 置 在 向 吐 -22- 201003320 出。噴嘴32，其開口部32a的長軸方向與γ方向平行， 並且該開口部32a配置成與處理台27相對向。開口部32a 的長軸方向的尺寸是較所搬運的基板S的γ方向的尺寸更 小’而不會將光阻劑塗佈到基板S的周邊區域。在噴嘴 3 2的內部設置有使光阻劑流通到開口部3 2 a的沒有圖示的 流通路。在該流通路連接著沒有圖示的光阻劑供給源。該 光阻劑供給源例如具有沒有圖示的泵浦，藉由以該泵浦將 光阻劑推出到開口部3 2 a ’則從開口部3 2 a將光阻劑吐出 。在支柱構件3 1 a設置有沒有圖示的移動機構，藉由該移 動機構，讓在架橋構件3 1 b所保持的噴嘴3 2可朝Z方向 移動。在噴嘴32設置有沒有圖示的移動機構，藉由該移 動機構讓噴嘴3 2可相對於架橋構件3 1 b朝Z方向移動。 在門型框架31的架橋構件31b下面安裝：用來將噴嘴32 的開口部32a，也就是噴嘴32的前端32c以及與該噴嘴前 端3 2 c相對向的相對向面之間的Z方向上的距離予以測定 的感應器3 3。沿著Y方向設置有例如三個該感應器3 3。 (管理部） 來說明管理部4的構造。 管理部4，是爲了讓吐出到基板S的光阻劑（液狀體 )的吐出量爲定量而將噴嘴3 2進行管理的部位’是設置 在：基板搬運部2之中的相對於塗佈部3的一 X方向側。 該管理部4 ’具有：預備吐出機構4 1、浸漬槽4 2、噴嘴洗 淨裝置4 3、將這些構造予以收容的收容部4 4、以及用來 -23- 201003320 保持該收容部的保持構件45。 預備吐出機構41'浸漬槽42、及噴嘴洗淨裝置43’ 是以該順序朝-X方向側排列。預備吐出機構4 1，是預備 性地將光阻劑吐出的部分，該預備吐出機構4 1是在將塗 佈部3配置於塗佈處理區域2 1上的狀態，設置在最接近 噴嘴3 2的位置，浸漬槽42，是在內部儲存有稀釋劑等的 溶劑的液體槽。噴嘴洗淨裝置43，是用來將噴嘴3 2的開 口部3 2 a附近予以沖洗的裝置，是具有：朝Y方向移動的 沒有圖示的洗淨機構、以及使該洗淨機構移動的沒有圖示 的移動機構。該移動機構，設置在較上述洗淨機構更靠近 - X方向側。噴嘴洗淨裝置4 3，藉由設置有移動機構的部 分，與預備吐出機構4 1及浸漬槽4 2相比，其X方向的尺 寸較大。而針對預備吐出機構41、浸漬槽42、噴嘴洗淨 裝置43的配置方式，並不限於本實施方式的配置方式， 也可以用其他的配置方式。 收容部44的Y方向的尺寸，較上述門型框架31的支 柱構件3 1 a之間的距離更小，上述門型框架3 1能超過收 容部44朝X方向移動。門型框架3 1，針對於在收容部44 內處設置的預備吐出機構4 1、浸漬槽42及噴嘴洗淨裝置 4 3，能夠跨越該各部分來接取。 保持構件4 5連接於管理部移動機構46。管理部移動 機構46，具有軌道構件47及驅動機構48。軌道構件47 在框架部2 4之中的一 γ方向側的側部2 4 a及+ Y方向側的 側部2 4b上各設有一條，分別朝X方向延伸。各軌道構件 -24- 201003320 47，是配廩在：與塗佈部3的門型框架3 1連接的兩條軌 道構件3 5之間。兩條軌道構件47的- X方向的端部，分 別設置至框架部24的側部24a及24b的一 X方向的端部 〇 驅動機構4 8 ’是連接於保持構件4 5而使管理部4沿 著軌道構件4 7上移動的致動器° 藉由將該軌道構件47設置至框架部24的側部24a及 24b的- X方向的端部’則管理部4可移動至搬入側台25 的- X方向的端部。而由於將各軌道構件4 7配置在軌道 構件3 5之間，所以管理部4可以鑽過塗佈部3的門型框 架3 1而移動。 (塗佈動作） 接著來說明如上述構造的塗佈裝置1的動作。 第5圖〜第8圖，是顯示塗佈裝置1的動作過程的俯 視圖。參考各圖來說明將光阻劑塗佈在基板S的動作。在 該動作’將基板S搬入到基板搬入區域2 0，使上述基板S 浮起而進行搬運’且在塗佈處理區域2 1塗佈光阻劑，將 已塗佈好該光阻劑的基板S從基板搬出區域22搬出。第 5圖〜第8圖僅以虛線顯示門型框架3 1及管理部4的輪廓 ，而容易判斷噴嘴3 2及處理台2 7的構造。以下來說明各 部分的詳細動作。 在將基板搬入到基板搬入區域2 0之前，使塗佈裝置1 待機。具體來說，在搬入側台25的基板搬入位置的一 γ -25- 201003320 方向側配置搬運機2 3 a，將真空襯墊2 3 b的高度位置定位 在基板的浮起高度位置，並且從搬入側台25的空氣噴出 孔25a、處理台27的空氣噴出孔27a、空氣吸引孔27b及 搬出側台2 8的空氣噴出孔2 8 a分別將空氣噴出或吸引， 成爲將空氣供給到讓基板浮起於各台部表面的程度的狀態 〇 在該狀態’例如藉由沒有圖示的搬運臂等，如第5圖 所示’若從外部將基板S搬運到基板搬入位置，則使升降 構件2 6 a朝+ Z方向移動，將升降銷2 6 b從升降銷出沒孔 25b突出到台表面25c。而藉由該升降構件26a的動作， 升降銷2 6 b將基板S抬起，進行該基板S的交接動作。 而從校準裝置25d的長孔使定位構件突出於台表面 25c。 在接收基板S之後，使升降構件26a下降將升降銷 26b收容於升降銷出沒孔25b內。由於在台表面25c形成 有空氣層，所以基板S藉由上述空氣而保持爲相對於台表 面2 5 c浮起的狀態。當基板S到達空氣層的表面時，藉由 校準裝置25d的定位構件來進行基板S的定位，將在基板 搬入位置的-Y方向側處配置的搬運機23a的真空襯墊 2 3 b真空吸附於基板S的-Y方向側端部。在第5圖顯示 了吸附住基板S的一 Y方向側端部的狀態。在藉由真空襯 墊23b吸附住基板S的-Y方向側端部之後，使搬運機 2 3 a沿著軌道2 3 c移動。由於基板S爲浮起的狀態，所以 即使搬運機2 3 a的驅動力較小，基板S也能沿著軌道2 3 c -26- 201003320 順利移動。 一旦基板S的搬運方向前端到達噴嘴32的開口部32a 的位置，如第6圖所示，則從噴嘴3 2的開口部3 2 a朝向 基板S吐出光阻劑。光阻劑的吐出動作，是使噴嘴3 2的 位置固定，藉由搬運機23 a —邊搬運基板S —邊來進行。 伴隨著基板S的移動，則如第7圖所示在基板S上塗 佈光阻膜R。藉由讓基板S通過，吐出光阻劑的開口部 3 2a下面，而在基板S的預定區域形成光阻膜R。 形成了光阻膜R的基板S，是藉由搬運機23a將其朝 向搬出側台2 8搬運。在搬出側台2 8，在相對於台表面 28c浮起的狀態，如第8圖所示將基板S搬運到基板搬出 位置。 一旦基板S到達基板搬出位置，則解除真空襯墊23b 的吸附，使升降機構29的升降構件29a朝向+ Z方向移 動。藉由升降構件2 9 a的移動，升降銷2 9 b從升降銷出沒 孔2 8b朝向基板S的背面突出，藉由升降銷29b將基板S 抬起。在該狀態，例如在搬出側台2 8的+ X方向側處設 置的外部的搬運臂，會接取於搬出側台28，而接收基板S 。在將基板S交接到搬運臂之後，將搬運機2 3 a再回到搬201003320 VI. Description of the invention: TECHNICAL FIELD OF THE INVENTION The present invention relates to a coating apparatus. This case is based on the Japanese Patent Application No. 2008-113849, which was filed in Japan on April 24, 2008, and Japan’s special wish 2008_ι1385. The content is quoted here. [Prior Art] On a glass substrate constituting a display panel such as a liquid crystal display, Formed with wiring or electrodes, A fine pattern of color filters or the like. Generally, such a pattern 'is formed by a method such as photolithography. In photolithography, 'respectively: a step of forming a photoresist film on a glass substrate, a step of patterning the photoresist film, And then, the step of developing the photoresist film. As a device for coating a photoresist film on the surface of a substrate, A known coating device (for example, refer to Patent Document 1), Is to fix the slit nozzle, A photoresist is applied to the glass substrate that is moved under the nozzle of the slit. For example, when the photoresist is solidified at the front end of the slit nozzle, Coating unevenness will occur and coating performance will deteriorate. Therefore, it is necessary to clean the front end of the slit nozzle when servicing. Cleaning the front end of the slit nozzle, Usually, the operator performs the manual work to wipe the foreign matter adhering to the tip end of the slit nozzle. The slit nozzle is disposed on the table for transporting the substrate. Therefore, in the past, the operator was attached to the stage and received the slit nozzle. -5-201003320 [Patent Document 1] Japanese Patent Laid-Open Publication No. 2 00 5 - 23 60 92 SUMMARY OF THE INVENTION [Problems to be Solved by the Invention] However, the table is designed to transport substrates. It was not originally scheduled for the entry of the operator. therefore, If it is to be done so that the operator can safely commit crimes on the platform, the maintenance steps can become complicated. It may also cause garbage or dust to adhere to the table because the operator is on the stage. In view of the above situation, SUMMARY OF THE INVENTION An object of the present invention is to provide a coating apparatus which can improve the efficiency of maintenance and prevent the adhesion of garbage, dust and the like to the substrate carrying portion. [Means for solving the problem] In order to achieve the above objectives, A first type of coating device of the present invention, There is a problem in that the substrate is transported by the substrate while being misplaced, Applying a liquid to the coating portion of the substrate, Its characteristics are: The above coating part, a nozzle having the liquid body discharged, And have: Moving the coating portion toward the substrate conveyance direction or a direction opposite to the substrate conveyance direction, A moving mechanism of an area in which the operator can pick up the nozzle. By the first type of coating device of the present invention, Have: While the substrate is being transported by the substrate transport unit, Applying a liquid to the coating portion of the substrate, the coating portion, a nozzle having a liquid discharge body, Further, the coating unit is moved toward the substrate conveyance direction or the direction opposite to the substrate conveyance direction -6-201003320, The moving mechanism of the area where the operator can pick up the nozzle: Therefore, the operator does not have to board the substrate handling unit directly. The nozzle can be cleaned and the like. With this, It can improve the efficiency of maintenance, Further, it is possible to prevent garbage, dust, or the like from adhering to the substrate carrying portion. In the above first type of coating device, The above moving mechanism, On the substrate carrying portion, At least one of the substrate carrying-in side and the substrate carrying-out side in the substrate transporting direction is The coating portion is moved as the above region. With the coating device of this configuration, Mobile agency, On the substrate carrying portion, At least one of the substrate carrying-in side and the substrate carrying-out side in the substrate transport direction is The coating portion is moved as an area that the operator can access, Therefore, it is easier for the operator to pick up the nozzle. In the above first type of coating device, The above moving mechanism, a portion exceeding an end portion of at least one of the substrate carrying portion on the substrate loading side and the substrate carrying-out side in the substrate conveyance direction, The coated portion is moved as the above region. With the coating device of this configuration, Mobile agency, a portion exceeding the end portion of the substrate transporting portion of at least one of the substrate carrying-in side and the substrate carrying-out side in the substrate transport direction, The coating portion is moved as an area that the operator can pick up. Therefore, the operator can access the nozzle at a position offset from the substrate conveying portion. With this, Therefore, it is possible to more reliably prevent rubbish, dust, or the like from adhering to the substrate conveying portion. In the above first type of coating device, Also has: A holding mechanism that holds the coating portion at a predetermined position on the substrate conveying portion. -7- 201003320 The coating device of this configuration is further provided with: The holding means for holding the coated portion at a predetermined position on the substrate carrying portion can make the position of the coated portion more stable. This makes it easier for the operator to access the nozzle. In the above first type of coating device, Also has: Provided on the substrate carrying portion, A management unit that manages the state of the above nozzles. The coating device of this configuration is further provided with: Set on the substrate carrying portion, The management unit that manages the state of the nozzles, so that the operator can clean the nozzle more efficiently, except that the state of the nozzle can be managed by the management unit. Therefore, a highly maintainable coating device can be obtained. In the above first type of coating device, Also has: The management unit moves the management unit moving mechanism to at least one of the substrate carrying-in side and the substrate carrying-out side. The coating device of this configuration is further provided with: The management unit is moved to at least one of the substrate carrying-in side and the substrate carrying-out side, so that the position of the management unit can be moved in accordance with the moving position of the nozzle. By this, The operator can perform maintenance on the nozzle more efficiently. and, By moving the management department by the management department moving mechanism, The management unit can also be repaired in the same manner as the nozzle. In the coating apparatus of the first type, the management unit is disposed on the area, and the moving unit moves the application unit to the management unit. The coating device having the structure is The buried portion is disposed on an area accessible by the operator, The moving mechanism moves the coating portion to the management portion, So when the nozzle is being repaired, The management unit can be moved below the nozzle. The management unit is disposed between the nozzle and the substrate transport unit by -8-201003320, For example, in the maintenance of cleaning the nozzle, etc. The liquid body or the like capable of preventing solidification from falling from the nozzle to the substrate conveying portion The substrate carrying portion can be kept clean. In the above first type of coating device, The moving mechanism ' exceeds the management unit to move the coating unit. With the coating device of this configuration, Mobile agency, Exceeding the management department to move the coating section, Therefore, the moving position of the application portion can be set regardless of the position of the management portion. With this, It is easier for the operator to perform nozzle maintenance. In the above first type of coating device, The above-mentioned management department moving mechanism, The management unit is moved in conjunction with the movement of the coating unit. With the coating device of this configuration, Management department mobile agency, The management unit is moved in conjunction with the movement of the coating unit. Therefore, compared with the case where the movement of the coating unit and the movement of the management unit are performed individually, Can shorten the movement time, And it is easier to move control. In the above first type of coating device, A plurality of the above coating portions are provided. With the coating device of this configuration, Since a plurality of coating sections are provided, For example, during the application of the liquid body by one of the plurality of application portions, The nozzle can be repaired for the remaining coating sections. By this, you can shorten the processing rhythm. Improve coating performance, A well-maintained coating device can be obtained. In the above first type of coating device, The above moving mechanism, A part of the application portion is moved toward the substrate carrying side in the conveyance direction, The remaining coating portion is moved toward the substrate carry-out side. 201003320 With the coating device of this configuration, In the case where a plurality of coating sections are provided, Moving a part of the application portion toward the substrate carrying side in the conveyance direction, The remaining coating portion is moved toward the substrate carry-out side. Therefore, for a plurality of coating portions, The nozzle can be repaired simultaneously on both the substrate loading side and the substrate carrying side. For a plurality of coating parts, it can be shared for maintenance. Therefore, the burden on the operator can be reduced. In the above first type of coating device, The nozzle is rotatably disposed to be inclined toward the side of the above region. With the coating device of this configuration, The nozzle is rotatably disposed to be inclined toward the side of the region, So when the operator picks up, The nozzle can be oriented in the direction of the operator. With this, The operator can easily perform nozzle maintenance. In order to achieve the above objectives, A second type of coating device of the present invention, Is equipped with: While transporting the substrate by the substrate transport unit, Applying a liquid to the coating portion of the substrate, The feature is that the coating unit is a nozzle having the liquid body discharged, The substrate transport unit includes a change mechanism. The change agency can be changed to: Forming a space forming state in which an operator entering the space with respect to the nozzle is inserted into the space, The substrate is transported with the substrate. By the second type of coating device of the present invention, The substrate transport unit includes a change mechanism ’ the change mechanism. Can be changed to: Forming a space forming state in which the operator who takes in the nozzle for discharging the liquid enters the space, The substrate transport state with the transfer substrate, Therefore, when the nozzle is being repaired, the substrate carrying portion is made into a space forming state. However, the operator can enter the space and the operator can perform maintenance. With this, It can prevent the operator from directly entering the substrate. -10- 201003320 On the transport department, Therefore, the maintenance efficiency can be improved and the garbage or dust can be prevented from adhering to the substrate carrying portion. In the above second type of coating device, The above change agency, It is provided that at least a part of the substrate carrying portion can be moved. With the coating device of this configuration, Change agency, Provided to move at least a part of the substrate carrying portion, So by moving the part, Then, the operator can enter the space efficiently in the substrate transporting portion. In the above second type of coating device, The changing mechanism is provided so that a part of the board conveying portion and the remaining portion of the board conveying portion can be The substrate is relatively moved in the transport direction of the substrate. The coating device 'changing mechanism' of this structure is provided so that a part of the substrate conveying portion and the remaining portion of the substrate conveying portion can be relatively moved in the conveying direction of the substrate. So by moving the above part relative to the rest, In the substrate transporting portion, the operator can enter the space efficiently. In the second type of the coating device, the substrate loading side in which the substrate is carried in the substrate transporting portion will have a plurality of grooves and will be viewed from above. The portion of the comb-toothed portion that is viewed in the direction of the comb is formed such that the size of the comb-tooth portion provided in the mesa portion in the transport direction is smaller than the dimension in the transport direction of the substrate transporting portion of the substrate transporting portion. 0 The coating device of the structure is carried in the substrate carrying-in side of the substrate carrying portion, A table portion having a plurality of groove portions and having a comb-tooth shape as seen from a plan view is provided as a part. Therefore, the substrate can be carried into the substrate transport portion by -11 - 201003320. The size of the conveying direction of the comb portion provided in the table portion is smaller than the size of the substrate carrying side in the conveying direction of the substrate conveying portion. So when moving the station, Or when the table portion is moved relative to the remaining portion, it is possible to prevent the table portion from exceeding the remaining portion. With this, Even in the case where an operator enters the space, It is also possible to maintain the platform in a stable manner. In the above second type of coating device, The substrate transporting unit, There is a support mechanism for supporting the aforementioned portion. With the coating device of this configuration, Substrate handling unit, Having a support mechanism for supporting a portion, So when moving a part, The above part can be stably supported. In the above second type of coating device, The above change agency, It is provided that at least a part of the substrate carrying portion can be deformed. With the coating device of this configuration, Change agency, Provided to deform at least a portion of the substrate carrying portion, Therefore, by deforming at least a part of the substrate carrying portion, It is possible to efficiently form an operator to enter the space. In the above second type of coating device, The changing mechanism is provided such that a part of the board conveying portion can be bent with respect to the remaining portion of the board conveying portion. With the coating device of this configuration, Change agency, It is provided that a part of the substrate conveying portion can be bent with respect to the remaining portion of the substrate conveying portion. Therefore, by bending the above portion, This can effectively form the operator into the space. In the above second type of coating device, The above substrate transporting portion ' has: a portion of the mesa having a plurality of grooves and having a comb-tooth shape as seen from a plan view. -12-201003320 A portion of the mesa that is comb-shaped as viewed from a plan view. As a part of the above, it is arranged to be concentrated at a predetermined portion. With the coating device of this configuration, Substrate handling unit, have: a table portion having a plurality of groove portions and having a comb shape as viewed from a plan view, The portion of the table portion that is combed from a plan view, As a part, it can be set to be concentrated in a predetermined part, Therefore, by concentrating the comb-tooth portion of the table at a predetermined location, It can effectively form the operator to enter the space. In the above second type of coating device, Also has: A position alignment mechanism that aligns a portion of the above portion with the remaining portion. With the coating device of this configuration, Also has: a position alignment mechanism that aligns a portion with a position between the remaining portions, Therefore, when switching from the space forming state to the substrate carrying state, It is possible to prevent the shape of the substrate carrying portion from being inconsistent with the original shape. In the above second type of coating device, The substrate transporting unit, a coating region for applying the liquid material to the substrate, The above part, In the above-described substrate carrying portion, for the above-described coating region, A portion on at least one of the substrate carrying-in side and the substrate carrying-out side in the conveyance direction of the substrate. When the state of the shape of the application region of the substrate coating liquid is changed, the state of the liquid applied to the substrate greatly changes. The coating state becomes unstable. With the coating device constructed as described above, The substrate transport unit ’ has a coating area for applying a liquid to the substrate, portion, In the substrate transporting portion, relative to the coating area, a portion provided on at least one of the substrate transfer side and the substrate carry-out side in the transport direction of the substrate, Therefore, it is possible to avoid -13-201003320 from placing the operator in the space directly in the coating area. With this, The coating state can be stabilized. In the above second type of coating device, The above coating part, At least one of the substrate carrying-in side and the substrate carrying-out side in the conveyance direction of the substrate can be moved. With the coating device of this configuration, Coating department, At least one of the substrate carrying-in side and the substrate carrying-out side in the transport direction of the substrate can be moved. Therefore, the application portion can be moved to a desired position in accordance with the position at which the operator enters the space. With this, Can improve maintenance efficiency. In the above second type of coating device, The coating unit is provided in plural. With the coating device of this configuration, There are a plurality of coating sections. For example, during the application of the liquid body by one of the plurality of coated portions, the coating of the liquid is performed. The nozzle can be repaired for the remaining coating sections. This can shorten the processing rhythm, Improve coating performance, A coating device with good maintainability can be obtained. In the above second type of coating device, A part of the plurality of coating portions is provided to be movable toward the substrate carrying-in side. The remaining coating portion is provided to be movable toward the substrate carry-out side. With the coating device of this configuration, A part of the plurality of coating portions is disposed to be movable toward the substrate carrying side. The remaining coating portion is provided to be movable toward the substrate carrying-out side, so for a plurality of coating portions, The nozzle can be repaired simultaneously on both the substrate loading side and the substrate carrying side. This will shorten the time required for maintenance. For a plurality of coating parts, it can be shared for maintenance. -14- 201003320 to reduce the burden on the operator. In this case, It is preferable to form the operator into the space on the substrate carrying side and the substrate carrying out side, respectively. In the above second type of coating device, On the substrate carrying portion, Also has: a management unit that manages the state of the above nozzles, The management unit is configured to move at least one of the portion and the remaining portion of the substrate transporting portion toward the transport side of the substrate and the transport side of the substrate along the transport direction of the substrate. The liquid discharged from the nozzle adheres to the nozzle in a solidified state. When the operator repairs the nozzle, The solidified liquid may adhere to the substrate carrying portion. With the coating device of the present invention constructed as described above, On the substrate carrying part, Also has: The management department that manages the state of the nozzle, The management department covers a part of the remaining part of the substrate handling unit, It is possible to move to at least one of the loading side of the substrate and the carrying-out side of the substrate along the conveyance direction of the substrate. Therefore, the management portion can be moved directly below the nozzle in accordance with the position of the nozzle. Therefore, it is possible to prevent foreign matter such as a solidified liquid from adhering to the substrate conveying portion. And because the operator enters the space, Therefore, the management unit can be repaired in the same manner as the nozzle. In the above first or second type of coating device, The substrate carrying unit ’ is further provided with: A floating mechanism that floats the substrate. If the operator directly goes to the substrate transport unit to work, Garbage, dust, etc. are likely to adhere to the substrate conveying portion. When the board conveying portion is provided with a floating mechanism for floating the substrate, The above-mentioned garbage, dust, or the like adheres to the substrate, and the quality of the substrate may be lowered. With the coating device constructed as described above, The operator does not need to board the substrate transport unit directly for work. Therefore, it is possible to prevent -15-201003320 from adhering to the substrate carrying portion such as garbage or dust. This can avoid the degradation of the substrate quality. [Effect of the Invention] According to the coating device of the first aspect of the present invention, Have: While the substrate is being transported by the substrate transport unit, Applying a liquid to the coating portion of the substrate, The above-mentioned coated portion of the coating device has a nozzle for discharging a liquid, And have: Moving the coated portion toward the substrate transport direction or in a direction opposite to the substrate transport direction, a moving mechanism of an area in which an operator can pick up the nozzle, Therefore, the operator can perform maintenance such as cleaning of the nozzle without having to directly board the board conveying portion. With this, It can improve the efficiency of maintenance, Further, it is possible to prevent garbage, dust, or the like from adhering to the board conveying portion. By the second type of coating device of the present invention, The substrate transport unit is provided with a change mechanism. The change agency, Can be changed to: Forming a space forming state in which the operator who takes in the nozzle for discharging the liquid enters the space, The substrate transport state with the transfer substrate, Therefore, when the nozzle is being repaired, the substrate carrying portion is made into a space forming state. The operator can enter the space to allow the operator to perform maintenance. With this, It can prevent the operator from directly entering the substrate carrying part. Therefore, the maintenance efficiency can be improved. Further, it is possible to prevent garbage or dust from adhering to the substrate carrying portion. [Embodiment] [First Embodiment] A first embodiment of the present invention will be described based on the drawings. -16- 201003320 Fig. 1 is a perspective view of the coating device 1 of the present embodiment. As shown in Figure 1, The coating device 1 of the present embodiment, For example, a coating device that applies a photoresist to a glass substrate used for a liquid crystal panel or the like, Yes to: Substrate handling unit 2 Coating unit 3, Management Department 4, As the main constituent element. The coating device 1' is conveyed in a state in which the substrate is lifted by the substrate conveyance unit 2, and the photoresist is applied onto the substrate by the coating portion 3. The state of the coating unit 3 is managed by the management unit 4. 2 is a front view of the coating device 1, Fig. 3 is a plan view of the coating device j. Fig. 4 is a side view of the coating device 1. The construction of the coating device 1 will be described in detail with reference to these drawings. Hereinafter, when the configuration of the coating device 1 is explained, For easy presentation, Use the XYZ coordinate system to illustrate the direction in the diagram. The longitudinal direction of the substrate conveyance unit 2, that is, the conveyance direction of the substrate is referred to as the X direction. The direction perpendicular to the X direction (substrate conveyance direction) as viewed from the plan view is referred to as the γ direction. The direction g which is perpendicular to the plane including the X-axis and the Y-axis is the z direction. In the X direction, γ direction and z direction, The direction of the arrow in the figure is + direction 'the direction opposite to the direction of the arrow is the _ direction. (Substrate conveyance unit) First, the structure of the board conveyance unit 2 will be described. The substrate transport unit 2 has: The substrate loading area 20, Coating treatment area 2 1. Substrate carry-out area 2 2 Transport mechanism 2 3, And a frame portion 24 that supports these configurations. In the substrate carrying unit 2, The substrate S is sequentially transported to the substrate loading area 20 by the transport mechanism 23, Coating treatment area 2 1 -17- 201003320 and the substrate carry-out area 22. The substrate loading area 20, Coating treatment forced, The substrate carry-out area 22' is arranged in this order from the substrate transport direction side to the downstream side. Transport mechanism 2 3, In order to cover the substrate transfer 20' coating treatment area 21, And the respective portions of the substrate carry-out area 22 are provided on one side of each of the portions. The substrate carrying-in area 20' is a portion to be carried in from the outside of the device, and is carried in. have: Move into the side table 2 5 Moved to the side table 2 5 with the lifting mechanism, The Y direction provided on the frame portion 24 is, for example, a member formed of S U S or the like as a rectangle viewed from a plan view. The loading side table 25, Its X direction is the long axis. In the loading side, there are a plurality of air ejection holes 2 5 a, respectively. With a plurality of lift pins 2 5 b. The air ejection hole 2 5 a and the lifting pin exit hole 2 5 b, It is set to be carried into the side table 2 5 . Air ejection hole 25a, Is the hole that ejects air to the surface of the loading side table 25, 5 5 c, For example, in the loading side table 25, the substrate S is disposed in a matrix shape as viewed in a plan view. This air ejection hole is followed by an air supply source (not shown). At the loading side table 2 5, By the air ejected from the air venting holes 25 5 a, the substrate S can be lifted toward the + Z square 销 lifting pin 2 5 b, It is an area that is placed in the loading side table 25 and moved in. The lift pin has a hole 25b, Let the air supplied to the table not leak out. At both end portions of the loading side table 25 in the Y direction, One calibration device 25d. Calibration device 25d, It is moved into the upstream area of the moving area 21, And the substrate S 2 6 ° central part, Plate-shaped structure Ξί 25 - Inlet hole Perforated table surface Passing area 25a connection Floating from the air to the substrate S surface 2 5c is provided with a device for positioning the substrate S of the side table -18-201003320 25 . Each calibration device 25d hole portion, And a positioning member provided in the elongated hole portion, The substrate carried into the 25 is mechanically held from both sides. Lifting mechanism 2 6, It is provided on the back side of the substrate loaded into the side table 25. The lifting mechanism 26 has: Lifting member 26a, Lift pin 26b. Lifting member 26a, Connected to, not shown, The lifting member 26a is directed toward Z by the driving of the driving mechanism. a plurality of lift pins 26b, It is erected from the upper surface side table 25 of the elevating member 26a. Each lifting pin 2 6 b, Is configured in: The position overlapping with the above-mentioned lift pin exit hole 2 5 b is observed from the observation. The descending member 2 6 a moves in the Z direction, Then, each of the lift pins 2 6 b will be ejected from the non-hole 25b on the table surface 25c. The ends of the lift pins 26b are disposed to coincide with the positions in the Z direction, respectively. On the other hand, the substrate S transported outside is kept in a horizontal state. The coating treatment region 2 1 ' is a coating treatment for performing a photoresist. The processing table 27 that floats the substrate S is supported. The processing table 2 7 ' is a rectangular member that is viewed from a plan view direction by covering the table surface 2 7 c with a hard oxide film as a main component material, and is disposed in the + X direction side table 27 with respect to the loading side table 25 Where the light absorbing material is covered, It will suppress lightning reflection. The processing station 27, The Y direction is the long axis. The size of the processing table direction 'and the size of the loading side table 25 in the Y direction are substantially equal to the processing table 27: Air is ejected onto the table surface 27c, and the air ejection hole 27a, And the air on the table surface 27c is provided with: Long moving into the side table Loading position and multiple driving mechanisms Moving in the direction of loading into the top view direction By letting the lift pins out + Z direction can be loaded from the part, The light absorption of the plate-like structure. The Y of 27 in processing time is the same. In the plural of the attraction of the complex -19- 201003320 the number of air suction holes 27b. These air ejection holes 27a and air suction holes 27b, It is disposed to penetrate the processing table 27. Inside the processing station 27, The settings are: A plurality of groove portions (not shown) for applying a resistance to the pressure of the gas passing through the air ejection hole 27a and the air suction hole 27b. The plurality of grooves, The inside of the table is connected to the air ejection hole 27a and the air suction hole 27b. At the processing station 27, The spacing of the air ejection holes 27a, It is narrower than the distance between the air ejection holes 2 5 a provided in the loading side table 25, Compared with moving into the side table 25, The air ejection hole 27a is set to be relatively tight. therefore, Compared with other Taiwanese departments, At the processing station 27, the amount of floating of the substrate can be adjusted with higher precision. The floating amount of the substrate can be controlled, for example, to 0 // m or more and 100/zm or less. It is preferably 0/m or more and 50#m or less. Substrate carry-out area 22, Is used to carry the substrate s coated with the photoresist to the outside of the device. have: Move out of the side table 2 8, With the lifting mechanism 29 . The carry-out side table 28, Set on the +X direction side with respect to the processing table 27, It is substantially the same material as the loading side table 25 provided in the substrate loading area 20, The size is composed. Similarly to moving into the side table 2 5 The carry-out side table 28 is provided with: The air ejection hole 28a and the lift pin exit hole 28b. Lifting mechanism 29, It is provided on the back side of the substrate carry-out position of the carry-out side stand 28, For example, it is supported by the frame portion 24 . a lifting member 2 9 a of the lifting mechanism 29 and a lifting pin 29b, The same structure as each portion of the elevating mechanism 26 provided in the substrate loading area 20 is provided. The lifting mechanism 29, When the substrate S on the carry-out side table 28 is carried out to the external device, The substrate S can be lifted by the lift pin 29b for the substrate s to be transferred. The handling mechanism 23' has: Transporter 23a, Vacuum liner 23b, Track -20- 201003320 Road 23c. The configuration of the carrier 23a is internally provided with, for example, a linear motor. The carrier 23a can be moved on the rail 23c by driving the linear motor '. The carrier 2 3 a is configured to: The predetermined portion 23d is superposed on the end in the -Y direction of the substrate S as viewed in a plan view. a portion 23d overlapping the substrate S, Is set at: It is a position lower than the height position of the back surface of the substrate when the substrate S is floated. The vacuum pad 23b' has a plurality of portions 23d which are arranged in the carrier 23a and overlap the substrate S. The vacuum pad 23b, The adsorption surface ‘ having the vacuum adsorption substrate S is disposed such that the adsorption surface faces upward. Vacuum liner 2 3 b, The substrate S can be held by causing the adsorption surface to adsorb the back end portion of the substrate S. Each vacuum pad 23b, The height position from the upper face of the carrier 23a is adjustable. For example, the height position of the vacuum pad 23b can be adjusted up and down in response to the amount of floating of the substrate S. Track 23c, Provided on the side portion 24a of the frame portion 24 on the Y-direction side, Is at: Move into the side table 2 5 Processing station 2 7, And the side of the unloading side table 28 extends over each of the platforms. By moving on the rail 23c, the transporter 23a can be moved along each of the above-described decks. (Coating portion) Next, the structure of the coating portion 3 will be described. The coating portion 3' is a portion for applying a photoresist on the substrate S, Has: Door frame 31, With the nozzle 32. The portal frame 3 1 ' has: Pillar member 3 1 a, With the bridge member 3 1 b -21 - 201003320 , It is set to cross the processing table 27 in the γ direction. The pillar members 31a' are provided one on the Y-direction side of the table 27, respectively. Each of the strut members 3 1 a is supported by both side faces of the frame portion 24 on the Y direction side. Each strut member 3, It is set so that the height position of its upper end is the same. The bridging members 3 1 b are bridged between the upper end portions of the respective strut members 3 1 a and are movable up and down with respect to the strut members 31 1 a. The portal frame 31 is connected to the moving mechanism 34. The moving mechanism 3 4 has a frame member 35 and a drive mechanism 36. On the side of the frame portion 24, the side portion 24a on the Y direction side and the side portion 24b on the +Y direction side are provided with a rail member 35, Extend in the X direction. An X-direction end of the two track members, They are arranged to extend to the ends of the sides 2 4 a and 2 4 b of the frame portion 24, respectively, in the X direction. Drive mechanism 3 6, Is connected to the frame 3 1, And actuating the movable portion of the coating portion 3 along the rail member 35 by providing the rail member 35 to an end portion of the side portion 2 4 a 2 4 b of the frame portion 24 in an X direction. Then, the application portion 3 can be moved to the end portion in the -X direction of the loading side table. With the movement of the coating portion 3, The nozzle 3 2 provided in the cloth portion 3 can also be moved to a portion in the X direction of the loading side table 25. The portal frame 31' is also movable in the Z direction by a moving mechanism (not shown). The nozzle 3 2 ' is formed in a strip shape in which one direction is a long axis, It is a surface on the side of the z-direction of the bridging member 3b of the portal frame 3 1. a front end of the nozzle 32 in the Z direction, A slit-shaped opening portion 3 2 a ' is provided along the long axis of the body. From the opening portion 3 2 a, the photoresist is disposed at a position of 3 5 and the 25-coated end is placed toward the spit-22 - 201003320 Out. Nozzle 32, The long axis direction of the opening portion 32a is parallel to the γ direction. Further, the opening 32a is disposed to face the processing table 27. The dimension of the opening portion 32a in the major axis direction is smaller than the dimension of the substrate S to be transported in the γ direction. The photoresist is not applied to the peripheral region of the substrate S. Inside the nozzle 32, a flow path (not shown) through which the photoresist flows to the opening 3 2 a is provided. A photoresist supply source (not shown) is connected to the flow path. The photoresist supply source has, for example, a pump not shown. The photoresist is discharged from the opening portion 3 2 a by pushing the photoresist out to the opening portion 3 2 a ' by the pump. A moving mechanism (not shown) is provided in the strut member 3 1 a, With the mobile mechanism, The nozzle 3 2 held by the bridging member 3 1 b is allowed to move in the Z direction. The nozzle 32 is provided with a moving mechanism not shown, By means of the moving mechanism, the nozzle 3 2 is movable in the Z direction with respect to the bridging member 3 1 b. Installed under the bridging member 31b of the portal frame 31: Used to open the opening 32a of the nozzle 32, That is, the sensor 33 is measured by the distance between the front end 32c of the nozzle 32 and the opposing direction between the opposing faces of the nozzle front end 32c. For example, three of the inductors 3 3 are disposed along the Y direction. (Management Unit) The structure of the management unit 4 will be described. Management Department 4, The portion where the discharge amount of the photoresist (liquid) discharged to the substrate S is quantified and the nozzle 3 2 is managed is set to: One of the substrate transporting portions 2 with respect to the X-direction side of the coating portion 3. The management department 4' has: Preparing the spitting mechanism 4 1. Dip tank 4 2 Nozzle cleaning device 4 3, The accommodating portion for accommodating these structures 4 4 And a holding member 45 for holding the accommodating portion -23-201003320. Preparing the discharge mechanism 41' dip tank 42, And the nozzle cleaning device 43' is arranged in the -X direction side in this order. Prepared spitting mechanism 4 1, Is the part that is prepared to spit out the photoresist, The preliminary discharge mechanism 4 1 is in a state in which the coating portion 3 is placed on the coating processing region 21, Set at the position closest to the nozzle 3 2 Dipping tank 42, It is a liquid tank in which a solvent such as a diluent is stored. Nozzle cleaning device 43, It is a device for flushing the vicinity of the opening portion 3 2 a of the nozzle 3 2 , Is with: a cleaning mechanism (not shown) that moves in the Y direction. And a moving mechanism (not shown) that moves the cleaning mechanism. The mobile mechanism, It is placed closer to the X-direction side than the above-mentioned cleaning mechanism. Nozzle cleaning device 4 3, By providing a part of the moving mechanism, Compared with the preliminary discharge mechanism 4 1 and the immersion tank 4 2 , Its size in the X direction is large. And for the preparatory spitting mechanism 41, Dipping tank 42, The arrangement of the nozzle cleaning device 43, It is not limited to the configuration mode of the present embodiment. Other configurations can also be used. The size of the accommodating portion 44 in the Y direction, The distance between the pillar members 31 1 a of the above-described portal frame 31 is smaller, The door frame 3 1 can move beyond the receiving portion 44 in the X direction. Portal frame 3 1, For the preliminary discharge mechanism 4 1 provided in the accommodating portion 44, Dipping tank 42 and nozzle cleaning device 4 3, Can be accessed across the various parts. The holding member 45 is connected to the management unit moving mechanism 46. Management Department Mobile Agency 46, There is a rail member 47 and a drive mechanism 48. The rail member 47 is provided with one on each of the side portion 2 4 a on the γ direction side and the side portion 24 b on the + Y direction side among the frame portion 24 . Extend in the X direction. Each track member -24- 201003320 47, Is equipped with: Between the two rail members 35 connected to the portal frame 31 of the coating portion 3. The end of the two track members 47 in the -X direction, An X-direction end portion drive mechanism 4 8 ' provided to the side portions 24a and 24b of the frame portion 24, respectively, is an actuator that is coupled to the holding member 45 to move the management portion 4 along the rail member 47. By providing the rail member 47 to the end portion in the -X direction of the side portions 24a and 24b of the frame portion 24, the management portion 4 can be moved to the end portion of the loading side table 25 in the -X direction. And since each of the rail members 47 is disposed between the rail members 35, Therefore, the management unit 4 can move through the door frame 3 1 of the coating unit 3. (Coating Operation) Next, the operation of the coating device 1 having the above configuration will be described. Figure 5 to Figure 8, It is a top view showing the operation process of the coating device 1. The action of applying a photoresist to the substrate S will be described with reference to the respective drawings. In this operation, the substrate S is carried into the substrate loading area 20, The substrate S is floated and transported, and the photoresist is applied to the coating treatment region 21, The substrate S to which the photoresist has been applied is carried out from the substrate carry-out region 22. 5 to 8 show the outlines of the door frame 3 1 and the management unit 4 only in broken lines. It is easy to judge the configuration of the nozzle 3 2 and the processing table 27. The detailed actions of each part are explained below. Before loading the substrate into the substrate loading area 20, The coating device 1 is made to stand by. Specifically, The transporter 2 3 a is disposed on the side of the γ -25-201003320 direction of the substrate loading position of the loading side table 25, Positioning the height position of the vacuum liner 2 3 b at the floating height of the substrate, And the air ejection hole 25a that is carried into the side table 25, The air ejection hole 27a of the processing table 27, The air suction holes 27b and the air ejection holes 280a of the carry-out side table 28 respectively eject or attract air. In a state in which air is supplied to the surface of each of the mesa portions, 〇 in this state, for example, by a transport arm or the like (not shown), As shown in Fig. 5, if the substrate S is transported from the outside to the substrate loading position, Then moving the lifting member 2 6 a toward the + Z direction, The lift pin 2 6 b protrudes from the lift pin exit hole 25b to the table surface 25c. And by the action of the lifting member 26a, Lifting pin 2 6 b lifts substrate S, The transfer operation of the substrate S is performed. The positioning member protrudes from the elongated surface of the aligning device 25d to the table surface 25c. After receiving the substrate S, The elevating member 26a is lowered to accommodate the lift pin 26b in the lift pin exit hole 25b. Since an air layer is formed on the table surface 25c, Therefore, the substrate S is maintained in a state of being floated relative to the surface of the table surface 2 5 c by the above air. When the substrate S reaches the surface of the air layer, Positioning the substrate S by the positioning member of the calibration device 25d, The vacuum pad 2 3 b of the conveyor 23a disposed at the -Y direction side of the substrate carrying position is vacuum-adsorbed to the end portion of the substrate S on the -Y direction side. Fig. 5 shows a state in which the Y-direction side end portion of the substrate S is adsorbed. After the vacuum-liner 23b is attracted to the -Y-direction side end portion of the substrate S, The conveyor 2 3 a is moved along the track 2 3 c. Since the substrate S is in a floating state, So even if the driving force of the conveyor 2 3 a is small, The substrate S can also move smoothly along the track 2 3 c -26- 201003320. Once the leading end of the substrate S in the conveyance direction reaches the position of the opening portion 32a of the nozzle 32, As shown in Figure 6, Then, the photoresist is discharged from the opening 3 2 a of the nozzle 3 2 toward the substrate S. The discharge action of the photoresist, Is to fix the position of the nozzle 3 2 , This is carried out by transporting the substrate S while the transporter 23a. Along with the movement of the substrate S, Then, as shown in Fig. 7, a photoresist film R is coated on the substrate S. By letting the substrate S pass, Spit out the opening of the photoresist 3 2a, On the other hand, a photoresist film R is formed in a predetermined region of the substrate S. Forming the substrate S of the photoresist film R, It is transported to the side table 28 by the transporter 23a. Moving out of the side table 2 8, In a state of floating relative to the table surface 28c, The substrate S is transported to the substrate carry-out position as shown in Fig. 8. Once the substrate S reaches the substrate carry-out position, Then, the adsorption of the vacuum liner 23b is released, The elevating member 29a of the elevating mechanism 29 is moved in the +Z direction. By the movement of the lifting member 2 9 a, The lift pin 2 9 b protrudes from the lift pin, and the hole 2 8b protrudes toward the back surface of the substrate S. The substrate S is lifted up by the lift pins 29b. In this state, For example, an external transfer arm provided at the +X direction side of the carry-out side table 28, Will be taken out of the side table 28, And receiving the substrate S. After the substrate S is transferred to the carrying arm, Move the conveyor 2 3 a back to the moving
入側台2 5的基板搬入位置，待機直到要搬運下個基板S 〇 在尙未要搬運下個基板s的期間，在塗佈部3，進行 用來保持噴嘴3 2的吐出狀態的預備吐出動作。如第9圖 所示，藉由軌道構件3 5使門型框架3 1朝一 X方向移動到 -27- 201003320 管理部4的位置。 在使門型框架3 1移動到管理部4的位置之後，調整 門型框架31的位置將噴嘴3 2的前端接取到噴嘴洗淨裝置 43。藉由該噴嘴洗淨裝置43將噴嘴前端32c洗淨。 在噴嘴前端3 2c洗淨後，將上述噴嘴3 2接取到預備 吐出機構4 1。在預備吐出機構4 1 ’會一邊將開口部3 2 a 與預備吐出面之間的距離予以測定，一邊將噴嘴3 2的前 端的開口部32a移動到Z方向上的預定位置，一邊使噴嘴 32朝一X方向移動，一邊從開口部32a預備吐出光阻劑。 在預備吐出動作之後，將門型框架3 1回到原來位置 。當要搬運下個基板S時，如第10圖所示，使噴嘴32移 動到Z方向上的預定位置。藉由對基板S反覆進行塗佈光 阻膜R的塗佈動作與預備吐出動作，則在基板S形成優質 的光阻膜R。 而也可因應需要，例如每預定次數接取到管理部4後 ，則將上述噴嘴32接取到浸漬槽42內。在浸漬槽42，是 藉由將噴嘴32的開口部暴露於，儲存於浸漬槽42的 溶劑（稀釋劑）的蒸氣環境，來防止噴嘴3 2乾燥。 (維修） 接著，針對噴嘴3 2的維修來加以說明。在本實施方 式，針對噴嘴3 2的維修之中的對噴嘴3 2的清潔來說明。 噴嘴3 2的清潔，是藉由作業者以手工作業來擦拭噴嘴3 2 所進行的。 -28- 201003320 首先’如第1 1圖所示’將與塗佈部3的門型框架31 連接的驅動機構3 6予以驅動，使在基板搬運部2的塗佈 處理區域2 1上配置的塗佈部3，移動至基板搬運部2的基 板搬入區域20的一 X方向的端部。此時，塗佈部3是移 動超過管理部4。 接著’如第1 2圖所示’驅動與管理部4的保持構件 45連接的驅動機構48，使管理部4移動至基板搬運部2 的基板搬入區域2 0的- X方向的端部。藉由管理部4的 該動作，而將管理部4配置在門型框架3 1的正下方也就 是噴嘴3 2的正下方。針對塗佈部3的移動以及管理部4 的移動’即使個別移動也可以，也可同時將驅動機構3 6 及驅動機構4 8驅動而讓塗佈部3與管理部4連動。 接著’如第1 3圖所示，在框架部2 4的一 X方向側設 置作業台60。該作業台60，設置成讓其γ方向的尺寸至 少較噴嘴32的Y方向的尺寸更大，設置在於Y方向覆蓋 噴嘴3 2的範圍。而針對作業台60，也可預先設置於框架 部24內而因應需要使其出沒，也可從外部運過來設置。 在作業台6 0設置後，如第14圖所示，作業者P登上 作業台60上。在作業者P登上作業台60的狀態，作業者 P可接取（access)的範圍Q，是作業者P的手可觸及的 空間，也就是基板搬運部2上的空間之中包含- X方向的 端部的空間及作業台60上的空間。門型框架3 1移動到基 板搬運部2的- X方向的端部，所以包含於作業者P可接 取的範圍Q。作業者P接取到：位於可接取的範圍Q內的 -29- 201003320 噴嘴3 2，進行擦拭噴嘴前端的作業。在擦拭後， 架3 2及管理部4的位置回到原本的位置，而進 作。 藉由本實施方式，由於具備有：使塗佈部3 S的搬運方向或與基板S的搬運方向相反的方向 作業者P可相對於噴嘴3 2進行接取的區域Q的 34，所以作業者P不用直接登上基板搬運部2， 對噴嘴3擦拭等的維修動作。藉此，可提升維修 ，並且能夠防止垃圾或塵埃等附著於基板搬運部 藉由本實施方式，又具備有：使管理部4朝 入側及基板搬出側的其中至少一方移動的管理部 46，所以能配合噴嘴32的移動位置而使管理部 移動。藉此，能更有效率地進行作業者P對噴嘴 修動作。 藉由本實施方式，管理部4配置在上述作業 的區域Q上，藉由移動機構3 4及管理部移動機精 佈部3移動到管理部4上，所以當噴嘴3 2進行 使管理部4移動到噴嘴3 2的下方。藉由將管理？ 在噴嘴3 2與基板搬運部2之間，例如在噴嘴3 2 的維修過程中，可以防止凝固的光阻劑等從噴嘴 到基板搬運部2的搬入側台2 5上，而可以將基板 上保持潔淨。 〔第二實施方式〕 使門型框 行塗佈動 朝向基板 ，移動至 移動機構 則可進行 的效率性 2上。 向基板搬 移動機構 4的位置 3 2的維 者可接取 ί 4 6將塗 維修時可 形4配置 的清潔等 32落下 搬運部2 -30- 201003320 接著來說明本發明的第二實施方式，與第一實施方式 同樣地，在以下的圖中，爲了讓各構件成爲可辨識的大小 ’將比例尺適當變更。針對與第一實施方式相同的構成元 件’用相同圖號而省略說明。在本實施方式，框架部24 的構造及軌道構件3 5、軌道構件4 7的構造與第一實施方 式不同，以該點爲中心來說明。 第15圖是顯不本實施方式的塗佈裝置1的構造的立 體圖’對應於第一實施方式的第1圖。在本實施方式，框 架部2 4的側部2 4 a及2 4 b的一 X方向的端部τ 1，成爲較 基板搬運部2的搬入側台2 5的一 X方向的端部τ 2更朝一 X方向側超出的狀態。軌道構件3 5及軌道構件4 7是設置 至框架部24的側部24a及24b的端部T1。其他構造與第 一實施方式相同。 在第1 5圖所示的構造，塗佈部3及管理部4能移動 至超過基板搬運部2的搬入側台2 5的一 X方向的端部T 2 的位置。例如，如第1 5圖所示，在對準框架部24的側部 2 4 a及2 4 b的—X方向的端部Τ1，來設置作業台6 0的情 況，作業者可接取的區域Q，爲框架部24的側部24a及 2 4 b上的空間之中包含- X方向的端部的空間及作業台6 0 上的空間。於是，塗佈部3及管理部4是設置成可移動至 作業者可接取的區域Q。 藉由本實施方式，將超過基板搬運部2的- X方向的 端部T2的部分作爲上述作業者可接取的區域Q，沿著軌 道構件3 5使塗佈部3移動，所以在從基板搬運部2上偏 -31 - 201003320 離的位置可以讓作業者進行維修。藉此，則可更確實地防 止垃圾、塵埃等附著到基板搬運部2上。而在本實施方式 ，即使是只有軌道構件3 5超過基板搬運部2的- X方向 的端部T2，也可獲得同樣的效果。 〔第三實施方式〕 接著來說明本發明的第三實施方式，與第一實施方式 同樣地，在以下的圖中，爲了讓各構件成爲可辨識的大小 ’將比例尺適當變更。針對與第一實施方式相同的構成元 件，用相同圖號而省略說明。在本實施方式，框架部24 的構造及軌道構件3 5、軌道構件4 7的構造與第一實施方 式不同，以該點爲中心來說明。 第16圖是顯示本實施方式的塗佈裝置1的構造的立 體圖，對應於第一實施方式的第1圖。在本實施方式，軌 道構件35及軌道構件47設置成從框架部24的側部24a 及24b的一 X方向側的端部起到+ X方向側的端部。其他 構造與第一實施方式相同。 在第1 6圖所不的構造，塗佈部3及管理部4設置成 可移動至：基板搬運部2的搬入側台2 5的一 X方向側的 端部及搬出側台2 8的+ X方向側的端部。例如，如第1 6 圖所示，在沿著搬入側台2 5的- X方向側端部來設置作 業台60的情況’作業者可接取的區域Q 1，是在基板搬運 部2上的空間之中包含一 X方向的端部的空間及作業台60 上的空間。例如在沿著搬出側台2 8的+ X方向側端部來 -32- 201003320 設置作業台6 1的情況，作業者可接取的區域Q2，是在基 板搬運部2上的空間之中包含+ X方向的端部的空間及作 業台61上的空間。於是，塗佈部3及管理部4設置成可 移動至作業者可接取的區域Q1及Q2。 藉由本實施方式，塗佈部3及管理部4設置成可移動 至作業者可接取的兩個區域Q 1及Q2，所以當噴嘴32的 清潔等的維修時，從塗佈裝置1的基板搬入側及基板搬出 側的任何一方都可以接取到噴嘴3 2。藉此，則可因應塗佈 裝置1的設置環境隨意地設定塗佈部3的移動位置。 〔第四實施方式〕 接著來說明本發明的第四實施方式，與第一實施方式 同樣地’在以下的圖中’爲了讓各構件成爲可辨識的大小 ’將比例尺適當變更。針對與第一實施方式相同的構成元 件’用相同圖號而省略說明。在本實施方式，塗佈部3的 構造及軌道構件35、軌道構件47的構造與第一實施方式 不同，以該點爲中心來說明。 第17圖是顯示本實施方式的塗佈裝置1的構造的立 體圖’是對應於第一實施方式的第1圖。在本實施方式， 塗佈部是複數個’例如設置有兩個，在基板搬入區域2〇 側設置有塗佈部3 a，在基板搬出區域2 2側設置有塗佈部 3b ° 在本實施方式，與第三實施方式同樣地，將軌道構件 3 5及軌道構件4 7 置成：從框架部2 4的側部2 4 &及2 4 b 33 - 201003320 的- X方向側的端部起至+ X方向側的端部。其他構造是 與第一實施方式相同。 在第1 7圖所示的構造，塗佈部3 a設置成可移動到基 板搬運部2的搬入側台2 5的- X方向側的端部’塗佈部 3 b設置成可移動到搬出側台2 8的+ X方向側的端部。例 如如第1 7圖所示，在沿著搬入側台2 5的- X方向側端部 來設置作業台6 0的情況，作業者可接取的區域Q1 ’與第 三實施方式同樣地，是在基板搬運部2上的空間之中包含 - X方向的端部的空間及作業台6 0上的空間。例如在沿 著搬出側台2 8的+ X方向側端部來設置作業台6 1的情況 ，作業者可接取的區域Q 2，與第三實施方式同樣地’是 在基板搬運部2上的空間之中包含+ X方向的端部的空間 及作業台6 1上的空間。塗佈部3 a設置成可移動到作業者 可接取的區域Q 1，塗佈部3b設置成可移動到作業者可接 取的區域Q 2。 藉由本實施方式，在設置有複數個塗佈部的情況’使 塗佈部3 a朝向基板搬入區域2 0側移動，使塗佈部3 b朝 向基板搬出區域2 2側移動，所以在基板搬入側及基板搬 出側的兩側可同時進行噴嘴3 2的維修。藉此，則可將維 修所需要的時間縮短。在設置於基板搬入區域2 0側的作 業台60、設置於基板搬出區域22側的作業台61，各作業 者可對於塗佈部3 a及3 b分擔來進行噴嘴3 2的維修，而 能提升維修效率。 在本實施方式，雖然設置有兩個塗佈部，而並不限於 -34- 201003320 此’即使設置例如三個以上的塗佈部，也可適用本發明。 該情況’將複數的塗佈部其中的一部分移動到基板搬入區 域2 0側，使剩餘的部分移動到基板搬出區域2 2側較佳。 本發明的技術範圍並不限定於上述實施方式，只要在 不脫離本發明主旨的範圍而可適當變更。 例如，作爲將塗佈部3移動到作業者可接取的區域的 手段，也可以伺服器作動，以編碼器（線性標尺）進行定 位，也可加上界限感應器。而也可設置：在使塗佈部3移 動後，將其機械性地保持的保持機構，作爲該保持機構， 也可設置如第1 8圖所示的夾持機構6 2。該夾持機構6 2設 置在支柱構件3 1 b之中與軌道3 5相對向的位置，例如設 置在軌道構件3 5的圖中左右方向的兩側，也就是設置在 塗佈部3的移動方向的側方。在塗佈部3移動到所希望的 位置之後，夾持機構62突出而抵接於軌道構件3 5 ’藉由 從兩側夾持軌道構件3 5 ’來保持塗佈部3的位置。 藉由具有：將塗佈部3保持於基板搬運部2上的預定 位置的夾持機構62，則可以使塗佈部3的位置更穩定。藉 此，讓作業者更容易進行噴嘴32的維修。也可將夾持機 構6 2設置在管理部4的保持構件4 5。而針對夾持機構6 2 的構造，並不限於第1 8圖所示的構造’也可是其他構造 〇 例如如第1 9圖所示，也可將噴嘴3 2可旋轉地設置成 朝作業者P側傾斜。藉由該構造’則噴嘴3 2的初端3 2 c 朝向作業者P的方向，所以作業者p可容易地接取到噴嘴 -35- 201003320 3 2。藉此可讓維修的效率提升。 針對塗佈裝置1的全體構造，在上述實施方式，雖然 是將搬運機構2 3配置在各台部的一 Y方向側’而並不限 於此。例如，也可將搬運機構2 3配置在各台部的+ Y方 向側。而如第2 0圖所示，也可在各台部的- Y方向側配 置上述搬運機構23 (搬運機23a、真空襯墊23b、軌道 2 3 c )，在+ Y方向側配置與該搬運機構2 3爲相同構造的 搬運機構53(搬運機53a、真空襯墊53b、軌道53c)， 而能以搬運機構23與搬運機構53來搬運不同的基板。例 如，如該圖所示，在搬運機構23搬運基板S1，在搬運機 構53搬運基板S2。在該情況，則能以搬運機構23與搬 運機構53來交互搬運基板，讓生產能力提升。而在要將 具有上述基板S、SI、S2的一半程度的面積的基板進行搬 運的情況，例如以搬運機構2 3與搬運機構5 3各保持一枚 ，藉由使搬運機構23與搬運機構53朝+ X方向一同行進 ，則能同時搬運兩枚基板。藉由這種構造，則能讓生產能 力提升。 在上述實施方式，雖然是將移動機構34的軌道構件 3 5及移動機構46的軌道構件47分別設置在框架部24的 側部2 4 a及2 4 b的上面部，而並不限於此，例如如第2 j 圖所示，軌道構件3 5及軌道構件4 7也可分別設置在框架 部24的側部24a及24b的內部。 在第2 1圖’是將溝邰2 4 c及溝部2 4 d沿著X方向設 置在框架部2 4的側部2 4 a及2 4 b，並且將軌道構件3 5設 -36- 201003320 置於溝部24c內，將軌道構件47設置在溝部24d。在將塗 佈部3的支柱構件3 1 a的一Z方向的端部插入於溝部24c 內的狀態，將支柱構件3 1 a配置於軌道3 5上，在將管理 部4的保持構件4 5的-Z方向的端部插入於溝部2 4 d內 的狀態，將保持構件45配置於軌道構件47上。 在第21圖，雖然溝部2 4 c的Z方向的尺寸大於溝部 2 4 d的Z方向的尺寸，當然並不限於此，也可讓溝部2 4 d 的Z方向的尺寸大於溝部24c的Z方向的尺寸，也可讓溝 部2 4 c與溝部2 4 d的Z方向的尺寸相同。 在上述實施方式，雖然舉例說明使基板S浮起進行搬 運的塗佈裝置1，而沒有這種限制，只要是使基板搬運且 進行塗佈的塗佈裝置，本發明也可適用於：浮起搬運型以 外的塗佈裝置，例如藉由搬運輥子等的搬運機構來搬運基 板的塗佈裝置。 在上述實施方式，雖然只說明作業者進行噴嘴3的維 修，而並不限於此，例如也可使管理部4移動到可接取的 區域Q，來進行管理部4的維修。例如使塗佈部3及管理 部4移動到作業者可接取的區域Q，在將管理部4配置在 噴嘴3 2的正下方的狀態，先進行噴嘴3 2的維修，在噴嘴 3 2的維修完成後，將塗佈部3移動到塗佈處理區域2 1 , 然後進行管理部4的維修。藉此，則可使塗佈裝置1的維 修效率提升。 〔第五實施方式〕 -37- 201003320 根據圖面來說明本發明的第五實施方式。 第22圖是本實施方式的塗佈裝置la的立體圖。 如第22圖所示，本實施方式的塗佈裝置丨&，是例如 在液晶面板等所用的玻璃基板上塗佈光阻劑的塗佈裝置， 疋以.基板搬運部2、塗佈邰3、管理部4 ,爲主要構成元 件。該塗佈裝置1 a，是在藉由基板搬運部2使基板浮起的 狀態來進行搬運’且藉由塗佈部3將光阻劑塗佈於該基板 上’藉由管理部4來管理塗佈部3的狀態。在該塗佈裝置 1 a設置有變更機構5 ’該變更機構5，可變更成：形成相 對於設置在塗佈部3的噴嘴（參考第23圖）作業者進行 接取用的作業者進入空間的空間形成狀態、與搬運基板的 基板搬運狀態。 第23圖是塗佈裝置la的正視圖，第24圖是塗佈裝 置1 a的俯視圖’第2 5圖是塗佈裝置1 a的側視圖。參考 這些圖面，來說明塗佈裝置1 a的詳細構造。 (基板搬運部） 首先說明基板搬運部2的構造。 基板搬運部2具有：基板搬入區域20、塗佈處理區域 21、基板搬出區域22、搬運機構23、以及支承這些構造 的框架部2 4。 在該基板搬運部2，是藉由搬運機構23將基板S依 序搬運到基板搬入區域20、塗佈處理區域 2 1、及基板搬 出區域2 2。基板搬入區域2 0、塗佈處理區域2 1、及基板 -38- 201003320 搬出區域2 2 ’是以該順序從基板搬運方向的上游側排列到 下游側。搬運機構2 3 ’爲了要涵蓋基板搬入區域2 〇、塗 佈處理區域2 1、及基板搬出區域2 2的各部分，而設置在 該各部分的其中一側。 基板搬入區域2 0 ’是將從裝置外部搬運過來的基板s 予以搬入的部位，具有：搬入側台25、與升降機構26。 搬入側台2 5，設置在框架部2 4上的Y方向中央部， 是例如由SUS等所構成的從俯視方向觀察爲矩形的板狀構 件。該搬入側台2 5，其X方向爲長軸。在搬入側台2 5， 分別設有複數的空氣噴出孔2 5 a、與複數的升降銷出沒孔 25b。該空氣噴出孔25a及升降銷出沒孔25b，是設置成貫 穿搬入側台2 5。 空氣噴出孔25a，是將空氣噴出到搬入側台25的台表 面2 5 c上的孔，例如在搬入側台2 5之中基板S通過的區 域配置成從俯視方向觀察爲矩陣狀。該空氣噴出孔2 5 a連 接著空氣供給機構2 5 e。在該第五實施方式，搬入側台2 5 與空氣供給機構25e是設置成一體。在該搬入側台25，藉 由從空氣噴出孔25a所噴出的空氣而能使基板S朝+ Z方 向浮起。 升降銷出沒孔2 5 b，是設置在搬入側台2 5之中基板S 搬入的區域。該升降銷出沒孔2 5 b，讓供給到台表面2 5 c 的空氣不會漏出。 在該搬入側台25之中的Y方向的兩端部，各設置有 一個校準裝置25d。校準裝置25d，是將搬入到搬入側台 -39 - 201003320 25的基板S予以定位的裝置。各校準裝置25d具有：長 孔部、與設在該長孔部內的定位構件’將搬入到搬入側台 2 5的基板從兩側機械性地予以夾持。 升降機構2 6，是設置在搬入側台2 5的基板搬入位置 的背面側。該升降機構2 6具有：升降構件2 6 a '與複數的 升降銷26b。升降構件26a，連接於沒有圖示的驅動機構 ，藉由該驅動機構的驅動而讓升降構件26a朝Z方向移動 。複數的升降銷26b，從升降構件26a的上面部朝向搬入 側台2 5豎立設置。各升降銷2 6b，是配置在：從俯視方向 觀察分別與上述升降銷出沒孔2 5 b重疊的位置。藉由讓升 降構件26a朝Z方向移動，則各升降銷26b會從升降銷出 沒孔25b出沒於台表面25c上。各升降銷26b的+ Z方向 的端部是設置成分別與Z方向上的位置一致，而能將從裝 置外部搬運過來的基板S保持爲水平的狀態。 第五實施方式的框架部24，具有：配置在+ X方向側 的框架側部24a、配置在-X方向側的框架側部24b、以 及配置在中央部的框架中央部24c;在框架中央部24c上 設置有搬入側台2 5。在框架中央部2 4 c上設置有變更機構 5。變更機構5例如是沿著X方向設置在框架中央部2 4 c 上的軌道狀構件，在Y方向設置有兩條。變更機構5，成 爲嵌合於溝部25g的狀態（第25圖），該溝部25g設置 於搬入側台2 5的下面部2 5 f。 搬入側台25可沿著上述變更機構5朝- X方向移動 。搬入側台2 5也可藉由作業者的手使其移動，例如也可 -40- 201003320 藉由安裝沒有圖示的驅動機構使其自動移動。作爲驅動機 構，例如也可以伺服器作動，以編碼器（線性標尺）進行 定位，也可加上界限感應器。當安裝有驅動機構時，該驅 動機構及軌道狀構件包含於變更機構5。藉由讓搬入側台 25朝- X方向移動，上述搬入側台25與基板搬運部2的 剩餘部分（處理台27及搬出側台）在X方向相對移動。 在第22圖〜第25圖，成爲將搬入側台25支承於框架中 央部24c上的狀態，而成爲可搬運基板S的狀態。該狀態 是搬運基板的基板搬運狀態。 第五實施方式的塗佈處理區域21，是進行光阻劑的塗 佈處理的部位’設置有：將基板S浮起支承的處理台2 7 〇 處理台2 7 ’是以例如硬質氧化鋁膜爲主成分的光吸收 材料來覆蓋台表面2 7 c的從俯視方向觀察爲矩形的板狀構 件’是設置在相對於搬入側台2 5的+ X方向側。在處理 台2 7之中以光吸收材料覆蓋的部位，會抑制雷射光等的 光線反射。該處理台27，Y方向爲長軸。處理台27的Y 方向的尺寸’與搬入側台25的Y方向尺寸大致相同。在 處理台27設置有：將空氣噴出到台表面27c上的複數的 空氣噴出孔27a、與將台表面27c上的空氣予以吸引的複 數的空氣吸引孔27b。這些空氣噴出孔27a及空氣吸引孔 27b ’設置成貫穿處理台27。在處理台27的內部，設置有 :用來對通過於空氣噴出孔27a及空氣吸引孔27b的氣體 的壓力施加阻力的沒有圖示的複數個溝部。該複數個溝部 -41 - 201003320 ，在台部內部連接於空氣噴出孔27a及空氣吸引孔27b。 在處理台27，空氣噴出孔27a的間距，是相較於設 在搬入側台2 5的空氣噴出孔2 5 a的間距更狹窄，與搬 側台2 5相比，將空氣噴出孔2 7 a設置得較緊密。因此 與其他的台部相比，在該處理台27能以較高精確度來 節基板的浮起量，基板的浮起量例如可控制爲〇 # m以 ΙΟΟμιη以下，而0//m以上50//m以下較佳。 該第五實施方式的基板搬出區域22，是用來將塗佈 光阻劑的基板S搬出到裝置外部的部位，具有：搬出側 28、與升降機構29。該搬出側台28，設置在相對於處 台2 7的+ X方向側，由與設置在基板搬入區域2 0的搬 側台25大致相同的材質、尺寸所構成。與搬入側台25 樣地，在搬出側台2 8設置有：空氣噴出孔2 8a及升降 出沒孔2 8 b。升降機構2 9，設置在搬出側台2 8的基板 出位置的背面側，例如以框架部24來支承。升降機構 的升降構件29a及升降銷29b’與設置在基板搬入區域 的升降機構2 6的各部位爲相同的構造。該升降機構29 當將搬出側台2 8上的基板S搬出到外部裝置時’能藉 基板S交接用的升降銷2 9b來將基板S抬起。 搬運機構23，具有：搬運機23a、真空襯墊2；3b、 道23c。搬運機23a的構造是在內部設置有例如線性馬 ，藉由驅動該線性馬達，讓搬運機23a可於軌道23c上 動。該搬運機23a是配置成：在俯視方向觀察讓預定的 分23d重疊於基板S的- Y方向端部。與該基板s重疊 置 入 調 上 有 台 理 入 同 銷 搬 29 20 由 軌 達 移 部 的 -42- 201003320 部分2 3 d，是設置在：較當使基板S浮起時的基板背面的 高度位置更低的位置。 真空襯墊23b ’是有複數個排列在搬運機23a之中與 上述基板S重疊的部分23d。該真空襯墊23b，具有用來 真空吸附基板S的吸附面，配置成讓該吸附面朝向上方。 真空襯墊23b ’藉由讓吸附面吸附住基板S的背面端部， 則可保持住該基板S。各真空襯墊2 3 b，其從搬運機2 3 a 的上面部起算的高度位置是可調節的，例如可因應基板S 的浮起量而將真空襯墊2 3 b的高度位置上下調整。 第五實施方式的軌道23c，設置於框架側部24a上， 是在：搬入側台2 5、處理台2 7、及搬出側台2 8的側方涵 蓋各台部地延伸著，藉由滑動於該軌道23c而能讓搬運機 23a沿者上述各台部移動。 (塗佈部） 接著說明塗佈部3的構造。 塗佈部3，是用來在基板S上塗佈光阻劑的部分，具 有：門型框架31、與噴嘴32。 門型框架3 1，具有：支柱構件3 1 a、與架橋構件3 i b ，是設置成在Y方向跨越處理台27。支柱構件31a，在處 理台2 7的Y方向側各設置有一個’各支柱構件3 1 a分別 支承於框架部24的Y方向側的兩側面。各支柱構件31a ，是設置成讓其上端部的高度位置一致。架橋構件3 1 b， 是架橋於各支柱構件3 1 a的上端部之間’相對於該支柱構 -43 - 201003320 件3 1 a可進行升降。 該門型框架3 1是連接於移動機構3 4，移動機構3 4， 具有框架構件35及驅動機構36。在第五實施方式，而在 框架側部24a及框架側部24b上各設置有一條軌道構件3 5 ’分別朝X方向延伸。軌道構件3 5設置成跨越搬入側台 2 5、處理台2 7及搬出側台2 8。因此，塗佈部3可沿著該 軌道構件2 5而移動涵蓋搬入側台2 5、處理台2 7及搬出側 台2 8。驅動機構3 6 ’是連接於門型框架3 1，且使塗佈部 3沿著軌道構件3 5移動的致動器。該門型框架3 1，藉由 沒有圖示的移動機構讓其也可朝Z方向移動。 噴嘴32，是作成其中—方向爲長軸的長條狀，是設置 在門型框架3 1的架橋構件3 1 b的-Z方向側的面部。在 該噴嘴32之中的-z方向的前端，沿著本身的長軸方向 設置有狹縫狀的開口部3 2 a，從該開口部3 2 a將光阻劑吐 出。噴嘴32’其開口部32a的長軸方向與γ方向平行， 並且該開口部32a配置成與處理台27相對向。開口部32a 的長軸方向的尺寸是較所搬運的基板8的γ方向的尺寸更 小’而不會將光阻劑塗佈到基板S的周邊區域。在噴嘴 32的內部設置有使光阻劑流通到開口部32a的沒有圖示的 流通路。在該流通路連接著沒有圖示的光阻劑供給源。該 光阻劑供給源例如具有沒有圖示的泵浦，藉由以該泵浦將 光阻劑推出到開口部3 2 a，則從開口部3 2 a將光阻劑吐出 。在支柱構件3 1 a設置有沒有圖示的移動機構，藉由該移 動機構’讓在架橋構件3 1 b所保持的噴嘴3 2可朝Z方向 -44- 201003320 移動。在噴嘴32設置有沒有圖示的移動機構，藉由該移 動機構讓噴嘴3 2可相對於架橋構件3 1 b朝z方向移動。 在門型框架31的架橋構件31b下面安裝：用來將噴嘴32 的開口部3〗a，也就是噴嘴32的前端32c以及與該噴嘴前 端3 2 c相對向的相對向面之間的Z方向上的距離予以測定 的感應器3 3。沿著Y方向設置有例如三個該感應器3 3。 (管理部） 來說明管理部4的構造。 管理部4，是爲了讓吐出到基板S的光阻劑（液狀體 )的吐出量爲定量而將噴嘴3 2進行管理的部位，是設置 在：基板搬運部2之中的相對於塗佈部3的- X方向側。 該管理部4，具有：預備吐出機構41、浸漬槽42、噴嘴洗 淨裝置43、將這些構造予以收容的收容部44、以及用來 保持該收容部的保持構件45。 預備吐出機構4 1、浸漬槽4 2、及噴嘴洗淨裝置4 3 ’ 是以該順序朝一 X方向側排列。預備吐出機構4 1 ’是預備 性地將光阻劑吐出的部分，該預備吐出機構4 1是在將塗 佈部3配置於塗佈處理區域2 1上的狀態，設置在最接近 噴嘴32的位置，浸漬槽42，是在內部儲存有稀釋劑等的 溶劑的液體槽。噴嘴洗淨裝置43，是用來將噴嘴3 2的開 口部3 2 a附近予以沖洗的裝置，是具有：朝Y方向移動的 沒有圖示的洗淨機構、以及使該洗淨機構移動的沒有圖示 的移動機構。該移動機構，設置在較上述洗淨機構更靠近 45 - 201003320 - X方向側。噴嘴洗淨裝置43 ’藉由設置有移動機構的部 分，與預備吐出機構41及浸漬槽42相比’其X方向的尺 寸較大。而針對預備吐出機構41、浸漬槽42、噴嘴洗淨 裝置4 3的配置方式，並不限於本實施方式的配置方式， 也可以用其他的配置方式。 收容部44的Y方向的尺寸’較上述門型框架31的支 柱構件3 1 a之間的距離更小，上述門型框架3 1能超過收 容部44朝X方向移動。門型框架3 1，針對於在收容部44 內處設置的預備吐出機構41、浸漬槽42及噴嘴洗淨裝置 43，能夠跨越該各部分來接取。 保持構件4 5連接於管理部移動機構46。管理部移動 機構46，具有軌道構件47及驅動機構48。軌道構件47 在框架側部24a及框架側部24b上各設有一條，分別朝X 方向延伸。各軌道構件47，是配置在：與塗佈部3的門型 框架3 1連接的兩條軌道構件3 5之間。軌道構件47設置 成跨越搬入側台25、處理台27及搬出側台28。因此，管 理部4可沿著上述軌道構件47而移動涵蓋搬入側台25、 處理台2 7及搬出側台2 8。驅動機構4 8，是連接於保持構 件45而使管理部4沿著軌道構件47上移動的致動器。而 由於將各軌道構件47配置在軌道構件3 5之間，所以管理 部4可以鑽過塗佈部3的門型框架3 1而移動。 (塗佈動作） 接著來說明如上述構造的塗佈裝置1 a的動作。 -46- 201003320 第5圖〜第8圖’是顯示塗佈裝置1 a的動作過程的 俯視圖。參考各圖來說明將光阻劑塗佈在基板S的動作。 在該動作’將基板S搬入到基板搬入區域2 0，使上述基 板S浮起而進行搬運，且在塗佈處理區域2 1塗佈光阻劑 ’將已塗佈好該光阻劑的基板S從基板搬出區域2 2搬出 。第5圖〜第8圖僅以虛線顯示門型框架3 1及管理部4 的輪廓，而容易判斷噴嘴3 2及處理台2 7的構造。以下來 說明各部分的詳細動作。 在將基板搬入到基板搬入區域2 0之前，使塗佈裝置 1 a待機。具體來說，在搬入側台2 5的基板搬入位置的一 Y方向側配置搬運機23a，將真空襯墊23b的高度位置定 位在基板的浮起高度位置，並且從搬入側台25的空氣噴 出孔25a、處理台27的空氣噴出孔27a、空氣吸引孔27b 及搬出側台2 8的空氣噴出孔2 8 a分別將空氣噴出或吸引 ’成爲將空氣供給到讓基板浮起於各台部表面的程度的狀 態。 在該狀態，例如藉由沒有圖示的搬運臂等，如第5圖 所示，若從外部將基板S搬運到基板搬入位置，則使升降 構件2 6 a朝+ Z方向移動，將升降銷2 6 b從升降銷出沒孔 25b突出到台表面25c。而藉由該升降構件26a的動作， 升降銷26b將基板S抬起，進行該基板8的交接動作。 而從校準裝置2 5 d的長孔使定位構件突出於台表面 25c - 在接收基板S之後’使升降構件2 6 a下降將升降銷 -47- 201003320 26b收容於升降銷出沒孔25b內。由於在台表面25c形成 有空氣層，所以基板S藉由上述空氣而保持爲相對於台表 面2 5 c浮起的狀態。當基板S到達空氣層的表面時’藉由 校準裝置25d的定位構件來進行基板S的定位’將在基板 搬入位置的- Y方向側處配置的搬運機2 3 a的真空襯墊 2 3 b真空吸附於基板S的_ Y方向側端部。在第5圖顯示 了吸附住基板S的- Y方向側端部的狀態。在藉由真空襯 墊2 3 b吸附住基板S的- Y方向側端部之後’使搬運機 23a沿著軌道23c移動。由於基板S爲浮起的狀態，所以 即使搬運機2 3 a的驅動力較小，基板S也能沿著軌道2 3 c 順利移動。 一旦基板S的搬運方向前端到達噴嘴32的開口部32a 的位置，如第6圖所示，則從噴嘴3 2的開口部3 2 a朝向 基板S吐出光阻劑。光阻劑的吐出動作，是使噴嘴3 2的 位置固定，藉由搬運機23 a —邊搬運基板S —邊來進行。 伴隨著基板S的移動，則如第7圖所示在基板S上塗 佈光阻膜R。藉由讓基板S通過，吐出光阻劑的開口部 3 2a下面，而在基板S的預定區域形成光阻膜R。 形成了光阻膜R的基板S，是藉由搬運機2 3 a將其朝 向搬出側台2 8搬運。在搬出側台2 8，在相對於台表面 2 8c浮起的狀態，如第8圖所示將基板S搬運到基板搬出 位置。 一旦基板S到達基板搬出位置，則解除真空襯墊2 3 b 的吸附，使升降機構2 9的升降構件2 9 a朝向+ Z方向移 -48- 201003320 動。藉由升降構件2 9 a的移動，升降銷2 9 b從升降銷出沒 孔2 8 b朝向基板S的背面突出，藉由升降銷2 9 b將基板S 抬起。在該狀態，例如在搬出側台2 8的+ X方向側處設 置的外部的搬運臂，會接取於搬出側台28，而接收基板S 。在將基板S交接到搬運臂之後，將搬運機2 3 a再回到搬 入側台2 5的基板搬入位置，待機直到要搬運下個基板s 〇 在尙未要搬運下個基板S的期間，在塗佈部3 ,進行 用來保持噴嘴3 2的吐出狀態的預備吐出動作。如第9圖 所示，藉由軌道構件35使門型框架31朝- X方向移動到 管理部4的位置。 在使門型框架3 1移動到管理部4的位置之後，調整 門型框架31的位置將噴嘴3 2的前端接取到噴嘴洗淨裝置 43。藉由該噴嘴洗淨裝置43將噴嘴前端32c洗淨。 在噴嘴前端3 2c洗淨後，將上述噴嘴3 2接取到預備 吐出機構41。在預備吐出機構41，會一邊將開口部32a 與預備吐出面之間的距離予以測定，一邊將噴嘴3 2的前 端的開口部3 2 a移動到z方向上的預定位置，一邊使噴嘴 3 2朝—X方向移動，—邊從開口部3 2 a預備吐出光阻劑。 在預備吐出動作之後，將門型框架 3 1回到原來位置 。當要搬運下個基板S時，如第1 0圖所示，使噴嘴3 2移 動到Z方向上的預定位置。藉由對基板S反覆進行塗佈光 阻膜R的塗佈動作與預備吐出動作，則在基板S形成優質 的光阻膜R。 -49- 201003320 而也可因應需要，例如每預定次數接取到管理部4 ，則將上述噴嘴32接取到浸漬槽42內。在浸漬槽42， 藉由將噴嘴32的開口部32a暴露於，儲存於浸漬槽42 溶劑（稀釋劑）的蒸氣環境，來防止噴嘴3 2乾燥。 (維修） 接著，針對噴嘴3 2的維修來加以說明。在本實施 式，針對噴嘴3 2的維修之中的對噴嘴3 2的清潔來說明 噴嘴3 2的清潔，是藉由作業者以手工作業來擦拭噴嘴 所進行的。 當進行維修時’將基板搬運部2從基板搬運狀態切 成空間形成狀態。以下來說明朝向空間形成狀態的切換 作。如第2 6圖所示，在框架中央部2 4 c的一 X方向側 置支承台7 0。該支承台7 0，將其γ方向的尺寸設置成 少大於搬入側台2 5的Y方向的尺寸，設置成在γ方向 蓋搬入側台2 5的範圍。針對支承台7 0的Z方向的尺寸 設置成與框架中央部24c的Z方向的尺寸相同。針對支 台70’也可作成預先配置在框架部24的其中之一的內 而因應需要使其出沒’也可設置成從外部運過來。 設置好支承台7 0之後，如第2 6圖所示，沿著變更 構5使搬入側台2 5朝—X方向移動。藉由搬入側台2 5 移動’則在搬入側台2 5的+ X方向的端部與塗佈處理 2 7之間形成空間6。該空間6，成爲讓要接取到噴嘴3 2 作業者進入的作業者進入空間。藉由搬入側台2 5的移 後 曰 疋 的 方 〇 32 換 動 設 至 覆 承 部 機 的 台 的 動 -50- 201003320 ’該搬入側台25的一 χ方向的端部從框架部24超出於一 X方向。該超出的部分藉由支承台7〇所支承，而穩定支 承搬入側台2 5全體。在基板搬運台2上形成作業者進入 空間6的狀態爲空間形成狀態。 在移動搬入側台2 5之後，如第2 7圖所示’作業者P 進入：形成於框架中央部2 4 c上的作業者進入空間6。此 時，例如在作業者進入空間6上配置有管理部4，而作業 者P沒有進入到作業者進入空間6的情況，使上述管理部 4朝+ X方向或一 X方向移動，而讓作業者進入空間6上 空出來。在進入作業者進入空間6之後，作業者P接取到 噴嘴32’進行擦拭噴嘴前端的作業。在作業者p無法接 取到噴嘴3 2的情況，例如在作業者p的手無法觸及噴嘴 3 2的情況等’則使噴嘴移動到作業者p的手觸及的位置 。當擦拭噴嘴前端時，要防止凝固的光阻劑附著於基板搬 運邰2 ’所以預先將管理部4移動到噴嘴3 2下方較佳。在 作業者P進入作業者進入空間6內之前，也可預先調節噴 嘴3 2的位置。 在作業完成之後’作業者P從作業者進入空間6離開 。作業者P離開後，使搬入側台25朝+ X方向移動，使 搬入側台2 5回到基板搬運時的位置。在回到搬入側台2 5 的位置之後’將支承台7 〇撤掉或將其收容，使塗佈裝置 1 a回到基板搬運狀態。在使塗佈裝置1 a回到基板搬運狀 態之後’如第5圖〜第8圖所示進行塗佈動作。 藉由本實施方式，基板搬運部2具有變更機構5，該 -51 - 201003320 變更機構5 ’可變更成：形成相對於噴嘴3 2進行接取用的 作業者進入空間6的空間形成狀態、與搬運基板8的基板 搬運狀態；所以當噴嘴3 2進行維修時讓基板搬運部2成 爲空間形成狀態’而作業者P可在作業者進入空間6內進 行維修。藉此’可避免作業者P直接進入到基板搬運部2 的搬入側台2 5上’所以可提升維修效率，並且能防止垃 圾或塵埃等附著在基板搬運部2上。 藉由本實施方式，將變更機構5設置成至少可將基板 搬運部2的搬入側台2 5移動，所以可在基板搬運部2有 效率地形成作業者進入空間6。而變更機構5設置成：可 將基板搬運部2的搬入側台25與基板搬運部2的剩餘部 分（處理台2 7及搬出側台2 8 )在X方向相對地移動，所 以可在上述基板搬運部2有效率地形成作業者進入空間6 〇 藉由本實施方式，藉由變更機構5而可移動的部分， 是基板搬運部2之中，相對於塗佈處理區域2 1設置於基 板搬入側的搬入側台2 5 ’所以不使塗佈處理區域21移動 而可形成作業者進入空間6。藉此’可防止塗佈處理區域 2 1的狀態變化，而能使塗佈狀態穩定。 藉由本實施方式’讓塗佈部3可朝+ X方向及一 X方 向之中至少其中一方移動’所以可以配合作業者進入空間 6的形成位置使塗佈部3朝所希望的位置移動。藉此’即 使在作業者p的手觸及的範圍有誤差的情況’也能確實地 進行維修。 -52- 201003320 藉由本實施方式，管理部4可涵蓋搬入側台2 5、處理 台27及搬出側台28朝X方向移動，所以可配合噴嘴32 的位置，使管理部4移動到該噴嘴3 2的正下方。藉此， 可防止凝固的光阻劑等的異物附著於基板搬運部2上。在 藉由搬入側台2 5的移動而在重疊於管理部4的位置形成 作業者進入空間6時，則可藉由使管理部4移動而空出作 業者進入空間6上的空間。 〔第六實施方式〕 接著來說明本發明的第六實施方式，與第五實施方式 同樣地，在以下的圖中，爲了讓各構件成爲可辨識的大小 ，將比例尺適當變更。針對與第五實施方式相同的構成元 件，用相同圖號而省略說明。在本實施方式，搬入側台2 5 的形狀與第五實施方式不同’以該點爲中心來說明。 第28A圖是顯示本實施方式的塗佈裝置1 a的構造的 俯視圖。第2 8 B圖是顯示本實施方式的塗佈裝置1 a的局 部構造的正視圖。 如第28A圖所示，在本實施方式，搬入側台25的形 狀從俯視方向觀察爲梳齒狀。具體來說，在搬入側台2 5 設置有複數個溝部25b，將台部構件25i獨立設置成夾著 該溝部25b的狀態。在該溝部25b，當從外部搬運機構收 容基板S時可收容該外部搬運機構的一部分，或者可以配 置搬運輥子等。溝部2 5 b ’是在搬入側台2 5的基板S的 搬入區域之中’從—X方向的端部朝向+ x方向設置在大 -53- 201003320 致整個面，且在Y方向設置有複數個。 如第28Α圖所示，搬入側台25的X方向的尺寸 基板搬入區域的框架中央部24c的X方向的尺寸更小 架部24的一 X方向的端部則相較於搬入側台2 5的-向的端部朝- X方向側超出。對於設置於框架中央部 上的兩條軌道狀的變更機構5，也設置至中央部24c X方向的端部，成爲從搬入側台25超出的狀態。在 造，搬入側台25可沿著變更機構5朝X方向移動， 該移動讓搬入側台2 5可相對於基板搬運部2的剩餘 (處理台2 7及搬出側台2 8 )相對移動。 第28B圖，是顯示搬入側台 25移動至框架中 24c的- X方向端部時的狀態。如該圖所示，在搬入 25已移動的狀態，在該搬入側台25與處理台27之間 作業者進入空間6。而搬入側台2 5全體成爲被支承於 中央部24c的-X方向的端部的狀態。 藉由本實施方式，搬入側台25爲具有複數個溝部 而從俯視方向觀察爲梳齒狀的構造，所以能夠容易將 S搬入到搬入側台2 5上。而形成有溝部2 5 b的搬入 25的X方向的尺寸是較基板搬運部2之中的基板搬 域的X方向的尺寸更小，所以即使在搬入側台25相 動的狀況，搬入側台25全體會被框架中央部24c所 。藉此，則在形成作業者進入空間6的情況，也能穩 持搬入側台2 5。 在本實施方式，搬入側台2 5設置成可相對於基 ，較 ，框 X方 2 4c 的— 該構 藉由 部分 央部 側台 形成 框架 25b 基板 側台 入區 對移 支承 定保 板搬 -54 - 201003320 運部2的剩餘區域移動，搬入側台2 5的X方向的尺寸是 較基板搬入區域20的框架中央部24c的X方向的尺寸更 小，而並不限於此。例如也可將搬出側台2 8設置成可相 對於基板搬運部2的剩餘區域移動。除此之外，搬出側台 2 8的X方向的尺寸也可小於基板搬出區域2 1的框架中央 部24c的X方向的尺寸。在該情況，藉由使搬出側台28 朝+ X方向移動，則會在搬出側台2 8與處理台2 7之間形 成作業者進入空間6。而在該情況，也可得到上述相同的 效果。 〔第七實施方式〕 接著來說明本發明的第七實施方式，與第五實施方式 同樣地，在以下的圖中，爲了讓各構件成爲可辨識的大小 ，將比例尺適當變更。針對與第五實施方式相同的構成元 件，用相同圖號而省略說明。在本實施方式，與第六實施 方式同樣，搬入側台2 5形成爲從俯視方向觀察爲梳齒狀 ，變更機構5的構造與第六實施方式不同。 第29A圖及第29B圖，是顯示本實施方式的塗佈裝置 1 a的構造的俯視圖。如這些圖面所示，在本實施方式’搬 入側台2 5爲具有溝部2 5 b而從俯視方向觀察爲梳齒狀的 構造，基板搬入區域20側的框架部24的X方向的尺寸與 搬入側台2 5的X方向的尺寸大致相同。 在本實施方式，將軌道狀的變更機構5沿著Υ方向設 置於框架中央部24c上，將搬入側台25的各台部構件251 -55- 201003320 可獨立移動地配置於變更機構5上。在該構造，可將各台 部構件25i集中在基板搬入區域20之中的Y方向的一處 位置。在第29B圖，爲將各台部構件25i集中於十Y方向 的端部的狀態。其他，例如也可成爲將各台部構件2 5 i集 中於- Y方向的端部的狀態，也可成爲將各台部構件2 5 i 集中於Y方向的中央部的狀態。 藉由本實施方式，變更機構5將基板搬運部2的搬入 側台25設置成可變形’並且具有複數個溝部25b而從俯 視方向觀察梳齒狀的搬入側台2 5之中，從俯視方向觀察 爲梳齒的部分（各台部構件2 5 i )’可集中設置於Y方向 上的預定部位，所以可以在基板搬運部2上有效地形成作 業者進入空間6。 〔第八實施方式〕 接著來說明本發明的第八實施方式’與第五實施方式 同樣地，在以下的圖中’爲了讓各構件成爲可辨識的大小 ，將比例尺適當變更。針對與第五實施方式相同的構成元 件，用相同圖號而省略說明。在本實施方式’搬入側台2 5 的構造及變更機構5的構造的構造與第五實施方式不同’ 以該點爲中心來說明。 第30圖是顯示本實施方式的塗佈裝置la的局部構造 的正視圖。如該圖所示’搬入側台2 5的+ X方向的端部 設置成可朝- Z方向彎折。具體來說，在搬入側台2 5的 + X方向的端部設置有彎折部25h ’該彎折部25h是隔介 -56 - 201003320 著變更機構5而對於搬入側台2 5的台部主體2 5 k安裝。 該變更機構5 ’具備有鉸鏈機構，該鉸鏈機構例如在γ方 向具有旋轉軸，彎折部25h以變更機構5爲軸部而朝〜z 方向彎折。而在該彎折部25h彎折的狀態，則在搬入側台 2 5與處理台2 7之間形成作業者進入空間6。 藉由本實施方式，變更機構5設置成可將搬入側台25 的一部分也就是彎折部2 5 h對於剩餘部分也就是台部主體 2 5 k彎折’所以能有效率地形成作業者進入空間。而在本 實施方式，雖然變更機構5的旋轉軸爲Y方向，而並不限 於此，例如也可具有X方向的旋轉軸。而雖然彎折部2 5 h 的彎折方向爲一Z方向，而也可作成朝+ Z方向彎折的構 造。 本發明的技術範圍並不限定於上述實施方式，在沒有 脫離本發明的主旨的範圍可以進行適當的變更。 例如，如第3 1圖所示，也可具有：在維修完成後， 使搬入側台2 5朝+ X方向移動而回到基板搬運狀態的定 位機構。具體來說，例如如該圖所示，在搬入側台25的 + X方向的端面設置有凸部2 5j，在處理台27的一 X方向 的端面設置有凹部27j。在該構造，在凸部25j及凹部27j 形成有相同角度的傾斜面。當使搬入側台2 5移動時，藉 由使凸部2 5 j與凹部2 7 j嵌合來使傾斜面一致，則可將其 與處理台27之間的位置正確地定位。 在上述實施方式，雖然只設置有一個塗佈部3，而並 不限於此，也可配置有複數個塗佈部3。例如在第3 2圖， -57- 201003320 顯示設置有兩個塗佈部3的構造（塗佈部3 a及塗佈部3 b )。在設置有複數個塗佈部的情況’使一部分的塗佈部朝 基板搬入區域2 0側移動’使剩餘的塗佈部朝基板搬出區 域2 2側移動較佳。在第3 2圖’則可以使兩個塗佈部之中 的塗佈部3a朝基板搬入區域20側移動’使塗佈部3b朝 基板搬出區域22側移動。 在上述實施方式，移動機構3 4的軌道構件3 5及移動 機構46的軌道構件47分別設置於框架部24的側部24a 及2 4b的上面部，而並不限於此，例如如第2 1圖所示’ 也可將軌道構件3 5及軌道構件47分別設置於框架部24 的側部2 4 a及2 4 b的內部。 例如在第3 3圖，將溝部24c及溝部24d沿著X方向 設置在框架部24的側部24a及24b，並且將軌道構件35 設置在溝部24c內，而將軌道構件47設置在溝部24d。而 在將塗佈部3的支柱構件3 1 a的- Z方向的端部插入於溝 部2 4c內的狀態，將支柱構件3 1 a配置於軌道3 5上，在 將管理部4的保持構件45的- Z方向的端部插入於溝部 24d內的狀態，將保持構件45配置於軌道構件47上。 在第33圖，溝部24c的Z方向的尺寸較溝部24 d的 Z方向的尺寸更大，而當然並不限於此，例如溝部2 4 d的 Z方向的尺寸大於溝部24c的Z方向的尺寸也沒關係，而 溝部2k與溝部24d在Z方向的尺寸相同也沒關係。 針對塗佈裝置1 a的全體構造，在上述實施方式，搬 運機構2 3雖然是配置於台部的一 γ方向側，而並不限於 -58- 201003320 此。例如，也可將搬運機構2 3配置在各台部的+ γ方向 側。而如第34圖所示，也可在各台部的一 γ方向側配置 上述搬運機構23 (搬運機23a、真空襯墊23b、軌道23c )’在+ Y方向側配置與該搬運機構23爲相同構造的搬 運機構53 (搬運機53a、真空襯墊53b、軌道53c)，而 能以搬運機構2 3與搬運機構5 3來搬運不同的基板。例如 ’如該圖所示，在搬運機構23搬運基板S1，在搬運機構 5 3搬運基板s 2。在該情況，則能以搬運機構2 3與搬運機 構53來交互搬運基板，讓生產能力提升。而在要將具有 上述基板S、SI、S2的一半程度的面積的基板進行搬運的 情況’例如以搬運機構2 3與搬運機構5 3各保持一枚，藉 由使搬運機構2 3與搬運機構5 3朝十X方向一同行進，則 能同時搬運兩枚基板。藉由這種構造，則能讓生產能力提 升。 在上述實施方式，雖然舉例說明使基板S浮起進行搬 運的塗佈裝置1 a，而沒有這種限制，只要是使基板搬運且 進行塗佈的塗佈裝置，本發明也可適用於：浮起搬運型以 外的塗佈裝置，例如藉由搬運輥子等的搬運機構來搬運基 板的塗佈裝置。 在上述各實施方式，也可先使管理部4位於噴嘴32 的前端32c的下方加以固定之後，再形成空間6。並且， 在上述各實施方式’雖然是預先固定塗佈部3再進行維修 的情況’而也可先使塗佈部3移動於搬入側台25上，使 其位於塗佈部3的噴嘴3 2c下位於管理部4上，然後作業 -59- 201003320 者p進行作業。藉由使管理部4位於噴嘴3 2的下方，則 當維修時即使光阻劑的凝固物落下’也可防止污染到搬入 側台25、處理台27等。 在上述實施方式，雖然僅說明在作業者進入空間6對 噴嘴3 2進行維修的情況，而並不限於此’例如也可在作 業者進入空間6進行管理部4的維修。而例如朝作業者進 入空間6的+ X方向側使塗佈部3移動’朝作業者進入空 間6的- X方向側使管理部4移動，藉此例如作業者先朝 + X方向進行塗佈部3的維修’然後朝向- X方向進行管 理部4的維修。藉此可使塗佈裝置1 a的維修效率提升。 以上雖然說明了本發明的較佳實施方式，而本發明並 不限定於該實施方式。在不脫離本發明主旨的範圍，可以 進行構造的追加、省略、置換、及其他變更。本發明不被 上述說明所限定’只被所附的申請專利範圍所限定。 【圖式簡單說明】 第1圖是顯示本發明的第一實施方式的塗佈裝置的構 造的立體圖。 第2圖是顯示本實施方式的塗佈裝置的構造的正視圖 〇 第3圖是顯示本實施方式的塗佈裝置的構造的俯視圖 〇 第4圖是顯示本實施方式的塗佈裝置的構造的側視圖 -60- 201003320 第5圖是顯不本發明的第一實施方式與第五實施方式 的塗佈裝置的動作的俯視圖。 第6圖是顯示與第5圖連續的動作過程的俯視圖。 第7圖是顯示與第6圖連續的動作過程的俯視圖。 第8圖是顯示與第7圖連續的動作過程的俯視圖。 第9圖是顯示與第8圖連續的動作過程的俯視圖。 第1 〇圖是顯示與第9圖連續的動作過程的俯視圖。 第1 1圖是本實施方式的塗佈裝置的維修步驟的顯示 圖。 第1 2圖是與第1 1圖連續進行維修的步驟的顯示圖。 第1 3圖是與第1 2圖連續進行維修的步驟的顯示圖。 第1 4圖是與第1 3圖連續進行維修的步驟的顯示圖。 第15圖是顯示本發明的第二實施方式的塗佈裝置的 構造的立體圖。 第1 6圖是顯示本發明的第三實施方式的塗佈裝置的 構造的立體圖。 第1 7圖是顯示本發明的第四實施方式的塗佈裝置的 構造的立體圖。 第1 8圖是本發明的塗佈裝置的其他構造的顯示圖。 第1 9圖是本發明的塗佈裝置的其他構造的顯示圖。 第20圖是本發明的塗佈裝置的其他構造的顯示圖。 第2 1圖是本發明的塗佈裝置的其他構造的顯示圖。 第22圖是顯不本發明的第五實施方式的塗佈裝置的 構造的立體圖。 -61 - 201003320 第2 3圖是顯示本實施方式的塗佈裝置的構造的正視 圖。 第2 4圖是顯示本實施方式的塗佈裝置的構造的俯視 圖。 第2 5圖是顯示本實施方式的塗佈裝置的構造的側視 圖。 第26圖是本實施方式的塗佈裝置的維修步驟的顯示 圖。 第2 7圖是與第2 6圖連續進f了維修的步驟的顯不圖。 第28A圖〜第28B圖是本發明的第六實施方式的塗佈 裝置的構造的顯示圖。 第29A圖〜第29B圖是本發明的第七實施方式的塗佈 裝置的構造的顯示圖。 第3 0圖是本發明的第八實施方式的塗佈裝置的構造 的顯示圖。 第3 1圖是本發明的塗佈裝置的其他構造的顯示圖。 第3 2圖是本發明的塗佈裝置的其他構造的顯示圖。 第3 3圖是本發明的塗佈裝置的其他構造的顯示圖。 第3 4圖是本發明的塗佈裝置的其他構造的顯示圖。 【主要元件符號說明】 1、1 a :塗佈裝置 2 :基板搬運部 3 :塗佈部 -62- 201003320 4 :管理部 5 ‘·變更機構 6 :作業者進入空間 2 4 :框架部 24b :側部 2 5 :搬入側台 2 8 :搬出側台 3 1 :門型框架 34 :移動機構 4 5 :保持構件 46 :移動機構 6 0、6 1 :作業台 6 2 :夾持機構 7 0 :支承台 P :作業者 Q ' Q1 ' Q 2 ·區域 T1、T 2 :端部 -63The substrate loading position of the side table 25 is waited until the next substrate S is transported. When the next substrate s is not transported, the application unit 3 performs preliminary discharge for maintaining the discharge state of the nozzle 3 2 . action. As shown in Fig. 9, the portal frame 3 1 is moved in the X direction by the rail member 35 to the position of the management portion 4 of -27-201003320. After the door frame 3 1 is moved to the position of the management unit 4, the position of the door frame 31 is adjusted to take the front end of the nozzle 3 2 to the nozzle cleaning device 43. The nozzle tip end 32c is washed by the nozzle cleaning device 43. After the nozzle tip end 32c is washed, the nozzle 3 2 is taken up to the preliminary discharge mechanism 41. In the preliminary discharge mechanism 4 1 ', the distance between the opening 3 2 a and the preliminary discharge surface is measured, and the nozzle 32 is moved while moving the opening 32 a of the tip end of the nozzle 3 2 to a predetermined position in the Z direction. The photoresist is prepared to be ejected from the opening 32a while moving in the X direction. After the preliminary ejection operation, the portal frame 3 1 is returned to the original position. When the next substrate S is to be transported, as shown in Fig. 10, the nozzle 32 is moved to a predetermined position in the Z direction. By applying the coating operation of the photoresist film R and the preliminary discharge operation to the substrate S, a high-quality photoresist film R is formed on the substrate S. Alternatively, if necessary, for example, after receiving the management unit 4 every predetermined number of times, the nozzle 32 is taken into the dipping tank 42. In the immersion tank 42, the nozzle 32 is prevented from drying by exposing the opening of the nozzle 32 to the vapor atmosphere of the solvent (diluent) stored in the immersion tank 42. (Maintenance) Next, the maintenance of the nozzle 32 will be described. In the present embodiment, the cleaning of the nozzle 32 in the maintenance of the nozzle 32 will be described. The cleaning of the nozzle 32 is performed by the operator wiping the nozzle 3 2 by manual work. -28-201003320 First, as shown in Fig. 1, a drive mechanism 36 connected to the portal frame 31 of the coating unit 3 is driven to be disposed on the coating processing region 21 of the substrate conveyance unit 2. The application unit 3 moves to an end portion of the substrate carrying-in region 20 of the substrate conveyance unit 2 in the X direction. At this time, the application unit 3 is moved beyond the management unit 4. Then, as shown in Fig. 2, the drive mechanism 48 that is connected to the holding member 45 of the management unit 4 is moved to the end portion in the -X direction of the substrate loading area 20 of the substrate transport unit 2. By the operation of the management unit 4, the management unit 4 is disposed immediately below the portal frame 3 1 so as to be directly below the nozzle 3 2 . The movement of the application unit 3 and the movement of the management unit 4 may be individually moved, and the drive mechanism 36 and the drive mechanism 48 may be simultaneously driven to cause the application unit 3 to interlock with the management unit 4. Next, as shown in Fig. 1, a work table 60 is provided on one X-direction side of the frame portion 24. The work table 60 is disposed such that its dimension in the γ direction is at least larger than the dimension of the nozzle 32 in the Y direction, and is provided in a range in which the Y direction covers the nozzle 32. On the other hand, the work table 60 may be installed in the frame unit 24 in advance and may be transported from the outside. After the work table 60 is set, as shown in Fig. 14, the operator P climbs onto the work table 60. In the state where the operator P is placed on the work table 60, the range Q that the operator P can access is the space accessible to the hand of the worker P, that is, the space on the substrate transport unit 2 includes -X The space at the end of the direction and the space on the work table 60. Since the door frame 3 1 is moved to the end in the -X direction of the substrate conveying portion 2, it is included in the range Q that the operator P can access. The operator P picks up the -29-201003320 nozzle 3 2 located in the reachable range Q to perform the operation of wiping the nozzle tip. After wiping, the position of the frame 3 2 and the management unit 4 is returned to the original position, and the operation is performed. According to the present embodiment, the operator P can receive the region Q that can be picked up by the operator 32 in the direction opposite to the conveyance direction of the application portion 3 S or the conveyance direction of the substrate S. Therefore, the operator P is provided. It is not necessary to directly board the board conveying unit 2 and perform maintenance operations such as wiping the nozzle 3. In this way, the management unit 46 that moves the management unit 4 toward at least one of the entry side and the substrate carry-out side is provided in the present embodiment. The management unit can be moved in accordance with the moving position of the nozzle 32. Thereby, the operator P can perform the nozzle cleaning operation more efficiently. According to the present embodiment, the management unit 4 is placed in the area Q of the work, and the moving unit 34 and the management unit moving machine unit 3 are moved to the management unit 4, so that the nozzle 3 2 moves the management unit 4 Below the nozzle 3 2 . By managing? Between the nozzles 3 2 and the substrate conveyance unit 2, for example, during the maintenance of the nozzles 3 2, it is possible to prevent the solidified photoresist or the like from being transferred from the nozzles to the loading side table 25 of the substrate conveyance unit 2, and the substrate can be placed on the substrate. Keep it clean. [Second Embodiment] The efficiency of the gate frame can be moved toward the substrate and moved to the moving mechanism. The position of the position 3 2 of the substrate transfer mechanism 4 can be picked up. The cleaning or the like which can be arranged in the form of the cover 4 can be dropped. The transport unit 2 -30-201003320 Next, the second embodiment of the present invention will be described. Similarly to the first embodiment, in the following drawings, the scale is appropriately changed in order to make each member a recognizable size. The same components as those of the first embodiment are denoted by the same reference numerals and will not be described. In the present embodiment, the structure of the frame portion 24, the structure of the rail member 35, and the rail member 47 are different from those of the first embodiment, and the point will be mainly described. Fig. 15 is a perspective view showing a structure of the coating device 1 of the present embodiment, corresponding to Fig. 1 of the first embodiment. In the present embodiment, the end portion τ 1 of the side portions 2 4 a and 2 4 b of the frame portion 24 is an end portion τ 2 in the X direction of the loading side table 25 of the board conveying portion 2 . It is more than one side in the X direction. The rail member 35 and the rail member 47 are end portions T1 provided to the side portions 24a and 24b of the frame portion 24. The other configuration is the same as that of the first embodiment. In the structure shown in Fig. 15, the application portion 3 and the management portion 4 can be moved to a position exceeding the end portion T 2 of the loading side table 25 of the substrate conveyance portion 2 in the X direction. For example, as shown in Fig. 15, in the -X direction end portion 21 of the side portions 2 4 a and 2 4 b of the frame portion 24, the work table 60 is provided, and the operator can take it. The region Q is a space including an end portion in the -X direction and a space on the work table 60 in the space on the side portions 24a and 2 4 b of the frame portion 24. Then, the application unit 3 and the management unit 4 are provided so as to be movable to the area Q accessible to the operator. According to the present embodiment, the portion exceeding the end portion T2 in the -X direction of the substrate conveyance portion 2 is moved as the region Q that the operator can pick up, and the application portion 3 is moved along the rail member 35, so that the portion is moved from the substrate. Part 2 is off -31 - 201003320 The location away from the operator allows the operator to perform repairs. Thereby, it is possible to more reliably prevent garbage, dust, and the like from adhering to the substrate conveying portion 2. On the other hand, in the present embodiment, the same effect can be obtained even if only the rail member 35 exceeds the end portion T2 of the board conveying portion 2 in the -X direction. [Third Embodiment] Next, a third embodiment of the present invention will be described. Similarly to the first embodiment, in the following drawings, the scale is appropriately changed in order to make each member recognizable. The same components as those of the first embodiment are denoted by the same reference numerals and will not be described. In the present embodiment, the structure of the frame portion 24, the structure of the rail member 35, and the rail member 47 are different from those of the first embodiment, and the point will be mainly described. Fig. 16 is a perspective view showing the structure of the coating device 1 of the present embodiment, and corresponds to Fig. 1 of the first embodiment. In the present embodiment, the rail member 35 and the rail member 47 are provided from the end portion on the X-direction side of the side portions 24a and 24b of the frame portion 24 to the end portion on the +X-direction side. Other configurations are the same as those of the first embodiment. In the structure of the first embodiment, the application unit 3 and the management unit 4 are provided so as to be movable to an end portion on the X-direction side of the loading-side table 25 of the substrate conveyance unit 2 and a + of the carry-out side table 28 The end of the X direction side. For example, as shown in FIG. 16 , when the work table 60 is provided along the −X direction side end of the loading side table 25 — the area Q 1 that the operator can pick up is on the substrate conveying unit 2 . The space includes an space in the X-direction end and a space on the work table 60. For example, when the work table 6 1 is provided along the +X direction side end portion of the carry-out side stand 28 from -32 to 201003320, the area Q2 that the operator can pick up is included in the space on the board conveyance unit 2. + Space at the end in the X direction and space on the work table 61. Thus, the application unit 3 and the management unit 4 are provided to be movable to the areas Q1 and Q2 accessible to the operator. According to the present embodiment, the application unit 3 and the management unit 4 are provided so as to be movable to the two areas Q 1 and Q2 that can be accessed by the operator. Therefore, when the nozzle 32 is cleaned or the like, the substrate of the coating apparatus 1 is used. Any one of the carry-in side and the substrate carry-out side can pick up the nozzle 3 2 . Thereby, the moving position of the application portion 3 can be arbitrarily set in accordance with the installation environment of the coating device 1. [Fourth embodiment] Next, a fourth embodiment of the present invention will be described. In the same manner as the first embodiment, the scale is appropriately changed in order to make each member recognizable. The same components as those of the first embodiment are denoted by the same reference numerals and will not be described. In the present embodiment, the structure of the coating portion 3, the structure of the rail member 35, and the rail member 47 are different from those of the first embodiment, and this point will be mainly described. Fig. 17 is a perspective view showing the structure of the coating device 1 of the present embodiment, which is a first view corresponding to the first embodiment. In the present embodiment, the application portion is plural, for example, two are provided, the application portion 3a is provided on the side of the substrate loading region 2, and the application portion 3b is provided on the substrate carrying-out region 2 2 side. In the same manner as the third embodiment, the rail member 35 and the rail member 47 are placed at the end of the side portion 2 4 & and 2 4 b 33 - 201003320 from the side of the frame portion 24 From the end to the +X direction side. The other configuration is the same as that of the first embodiment. In the structure shown in FIG. 7 , the application portion 3 a is provided so as to be movable to the end portion of the loading side table 25 of the substrate conveyance unit 2 on the −X direction side. The application portion 3 b is provided to be movable to carry out The end of the side table 2 8 on the +X direction side. For example, as shown in FIG. 7 , when the work table 60 is provided along the −X direction side end portion of the loading side table 25 , the area Q1 ′ that the operator can access is the same as that of the third embodiment. The space in the -X direction is included in the space on the board conveying portion 2 and the space on the work table 60. For example, when the work table 61 is provided along the + X-direction side end portion of the carry-out side stand 28, the area Q 2 that the operator can pick up is similar to the third embodiment, and is on the board conveyance unit 2 The space in the space includes the space at the end in the X direction and the space on the work table 61. The coating portion 3a is provided to be movable to the area Q1 accessible to the operator, and the application portion 3b is set to be movable to the area Q2 accessible to the operator. According to the present embodiment, when a plurality of application portions are provided, the application portion 3 a is moved toward the substrate loading region 20 side, and the application portion 3 b is moved toward the substrate carry-out region 2 2 side, so that the substrate is carried in. The maintenance of the nozzle 32 can be performed simultaneously on both sides of the side and the substrate carry-out side. This will shorten the time required for maintenance. In the work table 60 provided on the substrate loading area 20 side and the work table 61 provided on the substrate carry-out area 22 side, each operator can share the application of the nozzles 3 2 with the application portions 3 a and 3 b. Improve maintenance efficiency. In the present embodiment, although two application portions are provided, it is not limited to -34 to 201003320. The present invention can be applied even if three or more application portions are provided, for example. In this case, it is preferable to move a part of the plurality of application portions to the substrate loading area 20 side and to move the remaining portion to the substrate carrying-out area 2 2 side. The technical scope of the present invention is not limited to the above-described embodiments, and can be appropriately changed without departing from the scope of the present invention. For example, as means for moving the application portion 3 to an area accessible to the operator, the servo may be actuated to be positioned by an encoder (linear scale), or a limit sensor may be added. Alternatively, a holding mechanism that mechanically holds the application portion 3 after moving the application portion 3 may be provided as the holding mechanism, and a holding mechanism 6 2 as shown in Fig. 18 may be provided. The holding mechanism 6 2 is disposed at a position opposed to the rail 35 in the pillar members 31b, for example, on both sides in the left-right direction in the drawing of the rail member 35, that is, the movement provided in the coating portion 3. The side of the direction. After the application portion 3 is moved to the desired position, the clamp mechanism 62 protrudes and abuts against the rail member 35' to hold the position of the coating portion 3 by sandwiching the rail member 35' from both sides. By having the holding mechanism 62 that holds the application portion 3 at a predetermined position on the substrate conveyance portion 2, the position of the application portion 3 can be made more stable. Thereby, it is easier for the operator to perform the maintenance of the nozzle 32. The holding mechanism 62 may be provided in the holding member 45 of the management unit 4. The configuration of the clamping mechanism 6 2 is not limited to the configuration shown in FIG. 8 or other configurations, for example, as shown in FIG. 19 , the nozzle 3 2 may be rotatably disposed toward the operator. The P side is inclined. With this configuration, the initial end 3 2 c of the nozzle 3 2 faces the direction of the operator P, so that the operator p can easily take the nozzle -35 - 201003320 3 2 . This will increase the efficiency of maintenance. In the entire configuration of the coating apparatus 1, in the above-described embodiment, the transport mechanism 23 is disposed on the Y-direction side of each of the stages, and is not limited thereto. For example, the transport mechanism 23 may be disposed on the +Y direction side of each of the stages. Further, as shown in Fig. 20, the transport mechanism 23 (the transporter 23a, the vacuum cushion 23b, and the rail 2 3 c ) may be disposed on the -Y direction side of each of the base portions, and may be disposed on the +Y direction side. The mechanism 23 is a transport mechanism 53 (the transporter 53a, the vacuum cushion 53b, and the rail 53c) having the same structure, and the transport mechanism 23 and the transport mechanism 53 can transport different substrates. For example, as shown in the figure, the substrate S1 is transported by the transport mechanism 23, and the substrate S2 is transported by the transport mechanism 53. In this case, the substrate can be transported by the transport mechanism 23 and the transport mechanism 53 to increase the productivity. On the other hand, when the substrate having the area of half of the substrates S, SI, and S2 is to be transported, for example, the transport mechanism 23 and the transport mechanism 53 are held one by one, and the transport mechanism 23 and the transport mechanism 53 are provided. Moving in the +X direction, you can carry two substrates at the same time. With this configuration, production capacity can be improved. In the above embodiment, the rail member 35 of the moving mechanism 34 and the rail member 47 of the moving mechanism 46 are respectively provided on the upper surface portions of the side portions 24a and 24b of the frame portion 24, and are not limited thereto. For example, as shown in Fig. 2j, the rail member 35 and the rail member 47 may be provided inside the side portions 24a and 24b of the frame portion 24, respectively. In Fig. 2', the groove 2 4 c and the groove portion 24 d are disposed on the side portions 2 4 a and 2 4 b of the frame portion 24 in the X direction, and the rail member 35 is set to -36 - 201003320 The rail member 47 is placed in the groove portion 24c, and the rail member 47 is placed in the groove portion 24d. In a state in which the end portion in the Z direction of the pillar member 3 1 a of the application portion 3 is inserted into the groove portion 24c, the pillar member 3 1 a is placed on the rail 35, and the holding member 45 of the management portion 4 is placed. The end portion in the -Z direction is inserted into the groove portion 24 d, and the holding member 45 is placed on the rail member 47. In Fig. 21, although the dimension of the groove portion 24c in the Z direction is larger than the dimension of the groove portion 24d in the Z direction, it is of course not limited thereto, and the dimension of the groove portion 24d in the Z direction may be larger than the Z direction of the groove portion 24c. The size of the groove portion 24c may be the same as the dimension of the groove portion 24d in the Z direction. In the above-described embodiment, the coating device 1 for transporting the substrate S is described as an example. However, the present invention is also applicable to a floating device as long as it is a coating device that transports and transports the substrate. The coating device other than the conveyance type is a coating device that conveys the substrate by, for example, a conveyance mechanism such as a conveyance roller. In the above-described embodiment, only the operator performs the maintenance of the nozzle 3, and the present invention is not limited thereto. For example, the management unit 4 may be moved to the pick-up area Q to perform maintenance of the management unit 4. For example, the application unit 3 and the management unit 4 are moved to the area Q that the operator can access, and the management unit 4 is placed directly under the nozzle 3 2, and the nozzle 3 2 is first repaired, and the nozzle 3 2 is After the repair is completed, the coating unit 3 is moved to the coating processing region 2 1 , and then the maintenance of the management unit 4 is performed. Thereby, the maintenance efficiency of the coating device 1 can be improved. [Fifth Embodiment] -37-201003320 A fifth embodiment of the present invention will be described based on the drawings. Fig. 22 is a perspective view of the coating device 1a of the present embodiment. As shown in Fig. 22, the coating device 本& of the present embodiment is, for example, a coating device for applying a photoresist to a glass substrate used for a liquid crystal panel or the like. Substrate handling unit 2 Coating 邰3, Management Department 4, It is the main constituent element. The coating device 1 a, The substrate is transported by the substrate transport unit 2, and the photoresist is applied to the substrate by the application unit 3. The state of the application unit 3 is managed by the management unit 4. The coating device 1a is provided with a changing mechanism 5', the changing mechanism 5, Can be changed to: Forming a space forming state in which the operator who takes the pick-up in accordance with the nozzle provided in the coating unit 3 (refer to Fig. 23) enters the space, The substrate transport state with the substrate being transported. Figure 23 is a front view of the coating device la, Fig. 24 is a plan view of the coating device 1a. Fig. 25 is a side view of the coating device 1a. Refer to these drawings, The detailed configuration of the coating device 1a will be described. (Substrate conveyance unit) First, the structure of the board conveyance unit 2 will be described. The substrate transport unit 2 has: The substrate loading area 20, Coating treatment area 21 Substrate carry-out area 22, Transport mechanism 23, And a frame portion 24 that supports these configurations. In the substrate carrying unit 2, The substrate S is sequentially transported to the substrate loading area 20 by the transport mechanism 23, Coating treatment area 2 1. And the substrate carrying-out area 2 2 . The substrate loading area 20, Coating treatment area 2 1 And the substrate -38 - 201003320 The carry-out area 2 2 ' is arranged in this order from the upstream side to the downstream side in the substrate conveyance direction. The transport mechanism 2 3 ' is intended to cover the substrate loading area 2 〇, Coating treatment area 2 1. And each part of the substrate carry-out area 2 2 It is placed on one side of each part. The substrate loading area 20' is a portion into which the substrate s conveyed from the outside of the apparatus is carried. have: Moved into the side table 25, With the lifting mechanism 26. Move into the side table 2 5, Provided in the central portion of the frame portion 24 in the Y direction, For example, it is a plate-like member which is formed of SUS or the like and has a rectangular shape when viewed from a plan view. The loading side table 25, Its X direction is the long axis. Moving into the side table 2 5, There are a plurality of air ejection holes 2 5 a, respectively With the plurality of lifting pins, there is no hole 25b. The air ejection hole 25a and the lift pin exit hole 25b, It is set to be inserted into the side table 2 5 . Air ejection hole 25a, It is a hole that ejects air to the table surface 2 5 c of the loading side table 25, For example, in the loading side table 25, the area through which the substrate S passes is arranged in a matrix shape as viewed in plan view. The air ejection hole 25 5 a is connected to the air supply mechanism 2 5 e. In the fifth embodiment, The loading side table 2 5 is provided integrally with the air supply mechanism 25e. At the loading side table 25, The substrate S can be floated in the +Z direction by the air ejected from the air ejection hole 25a. Lifting pin and exit hole 2 5 b, It is an area that is placed in the loading side table 25 and into which the substrate S is carried. The lifting pin has a hole 2 5 b, The air supplied to the surface of the table 2 5 c is not leaked. Both ends of the loading side table 25 in the Y direction, Each setting has a calibration device 25d. Calibration device 25d, It is a device that is moved into the substrate S that is moved into the side table -39 - 201003320 25 to be positioned. Each calibration device 25d has: Long hole, The substrate carried into the loading side table 25 is mechanically sandwiched from both sides with the positioning member ' provided in the long hole portion. Lifting mechanism 2 6, It is provided on the back side of the substrate loading position of the loading side table 25. The lifting mechanism 26 has: The lifting member 2 6 a ' and the plurality of lifting pins 26b. Lifting member 26a, Connected to a drive mechanism not shown, The elevating member 26a is moved in the Z direction by the driving of the drive mechanism. a plurality of lift pins 26b, The upper surface portion of the elevating member 26a is erected toward the loading side table 25. Each lifting pin 2 6b, Is configured in: The position overlapping with the above-mentioned lift pin exit hole 2 5 b is observed from a plan view. By moving the lifting member 26a in the Z direction, Then, the lift pins 26b are ejected from the lift pin exit holes 25b on the table surface 25c. The ends of the lift pins 26b in the +Z direction are arranged to coincide with the positions in the Z direction, respectively. On the other hand, the substrate S transported from the outside of the apparatus can be kept in a horizontal state. The frame portion 24 of the fifth embodiment, have: The frame side portion 24a disposed on the +X direction side, The frame side portion 24b disposed on the -X direction side, And a frame center portion 24c disposed at the center portion; A loading side table 25 is provided in the frame center portion 24c. A change mechanism 5 is provided in the frame center portion 2 4 c. The changing mechanism 5 is, for example, a rail-shaped member provided on the center portion 2 4 c of the frame in the X direction. There are two in the Y direction. Change agency 5, In a state of being fitted into the groove portion 25g (Fig. 25), The groove portion 25g is provided on the lower surface portion 2 5 f of the loading side table 25 . The loading side table 25 is movable in the -X direction along the above-described changing mechanism 5. Moving into the side table 2 5 can also be moved by the operator's hand. For example, it is also possible to automatically move by -40-201003320 by installing a drive mechanism (not shown). As a driving mechanism, For example, it can also be actuated by a server. Positioning with an encoder (linear scale), A limit sensor can also be added. When a drive mechanism is installed, The drive mechanism and the rail-shaped member are included in the change mechanism 5. By moving the loading side table 25 in the -X direction, The carry-in side table 25 and the remaining portion of the board conveyance unit 2 (the processing table 27 and the carry-out side table) relatively move in the X direction. In the 22nd to 25th, In a state in which the loading side table 25 is supported by the center portion 24c of the frame, It is in a state in which the substrate S can be transported. This state is the substrate transport state of the transport substrate. The coating treatment region 21 of the fifth embodiment, It is a portion where the coating treatment of the photoresist is performed. The processing table 2 7 浮 processing table 2 7 ′ which floats and supports the substrate S is a plate-shaped member which is rectangular in plan view when the surface of the table surface 27 c is covered with a light absorbing material containing, for example, a hard aluminum oxide film as a main component. It is disposed on the +X direction side with respect to the loading side table 25. The portion covered by the light absorbing material in the processing station 27, It suppresses reflection of light such as laser light. The processing station 27, The Y direction is the long axis. The dimension ' in the Y direction of the processing table 27 is substantially the same as the dimension in the Y direction of the loading side table 25. At the processing station 27, there are: a plurality of air ejection holes 27a for ejecting air onto the table surface 27c, A plurality of air suction holes 27b that attract the air on the table surface 27c. These air ejection holes 27a and air suction holes 27b' are provided to penetrate the processing table 27. Inside the processing station 27, The settings are: A plurality of groove portions (not shown) for applying a resistance to the pressure of the gas passing through the air ejection hole 27a and the air suction hole 27b. The plurality of ditch parts -41 - 201003320 , The inside of the table is connected to the air ejection hole 27a and the air suction hole 27b. At the processing station 27, The spacing of the air ejection holes 27a, It is narrower than the distance between the air ejection holes 25 5 a provided on the loading side table 25, Compared with the moving side table 2 5 The air ejection holes 27 7 a are set tightly. Therefore, compared with other Taiwanese departments, At the processing station 27, the amount of floating of the substrate can be increased with high precision. The amount of floating of the substrate can be controlled, for example, to 〇 #m to ΙΟΟμηη or less. It is preferably 0//m or more and 50//m or less. The substrate carry-out area 22 of the fifth embodiment, Is used to carry the substrate S coated with the photoresist out to the outside of the device. have: Moving out of the side 28, With the lifting mechanism 29. The carry-out side table 28, Set at the +X direction side with respect to the station 2 7 The material is substantially the same as that of the transfer side table 25 provided in the substrate loading area 20, The size is composed. With the loading side table 25, The moving out side table 28 is provided with: The air ejection hole 2 8a and the lifting and lowering hole 2 8 b. Lifting mechanism 2 9, It is provided on the back side of the substrate exit position of the carry-out side table 28, For example, it is supported by the frame portion 24. The elevating member 29a and the elevating pin 29b' of the elevating mechanism have the same structure as the respective portions of the elevating mechanism 26 provided in the substrate carrying-in area. When the substrate S on the carry-out side table 28 is carried out to the external device, the elevating mechanism 29 can lift the substrate S by the lift pins 29b for the transfer of the substrate S. Transport mechanism 23, have: Transporter 23a, Vacuum liner 2; 3b, Road 23c. The configuration of the carrier 23a is internally provided with, for example, a linear horse. By driving the linear motor, The carrier 23a is allowed to move up on the rail 23c. The carrier 23a is configured to: The predetermined portion 23d is superposed on the end in the -Y direction of the substrate S as viewed in a plan view. Overlapped with the substrate s, there is a modulo on the same side, and the part of the rail is moved to the section 42 - 201003320 part 2 3 d, Is set at: It is a position lower than the height position of the back surface of the substrate when the substrate S is floated. The vacuum pad 23b' has a plurality of portions 23d which are arranged in the carrier 23a and overlap the substrate S. The vacuum pad 23b, Having an adsorption surface for vacuum adsorbing the substrate S, It is configured such that the adsorption surface faces upward. The vacuum liner 23b' causes the adsorption surface to adsorb the back end of the substrate S, The substrate S can be held. Each vacuum liner 2 3 b, The height position from the upper face of the transporter 2 3 a is adjustable. For example, the height position of the vacuum pad 2 3 b can be adjusted up and down in response to the amount of floating of the substrate S. The track 23c of the fifth embodiment, Provided on the frame side portion 24a, Is at: Move into the side table 2 5 Processing station 2 7, And the side culverts of the unloading side tables 28 are extended by the respective bases. By sliding on the rail 23c, the transporter 23a can be moved along the respective decks. (Coating portion) Next, the structure of the coating portion 3 will be described. Coating section 3, Is a portion for applying a photoresist on the substrate S, Has: Door frame 31, With the nozzle 32. Portal frame 3 1, have: Pillar member 3 1 a, With the bridge member 3 i b , It is set to cross the processing table 27 in the Y direction. Pillar member 31a, One of the pillar members 3 1 a is provided on each of the Y-direction sides of the processing table 27, and is supported by both side faces of the frame portion 24 on the Y-direction side. Each strut member 31a, It is set so that the height position of its upper end is the same. Bridging member 3 1 b, It is a bridge between the upper end portions of the respective strut members 3 1 a and can be raised and lowered with respect to the strut structure -43 - 201003320 pieces 3 1 a. The portal frame 31 is connected to the moving mechanism 34. Mobile mechanism 3 4, There is a frame member 35 and a drive mechanism 36. In the fifth embodiment, On the other hand, the frame side portion 24a and the frame side portion 24b are each provided with a rail member 35' extending in the X direction. The rail member 35 is disposed to be moved across the loading side table 25, The processing table 27 and the loading side table 28 are removed. therefore, The coating portion 3 is movable along the rail member 25 to cover the loading side table 25, The processing station 27 and the loading station 28 are removed. The drive mechanism 3 6 ' is connected to the portal frame 3 1 And an actuator that moves the coating portion 3 along the rail member 35. The portal frame 3 1, It can also be moved in the Z direction by a moving mechanism not shown. Nozzle 32, Is made into a long strip with a long axis in the direction, It is a surface provided on the -Z direction side of the bridging member 3 1 b of the portal frame 3 1 . In the front end of the nozzle 32 in the -z direction, a slit-shaped opening portion 3 2 a is provided along the longitudinal direction of the body, The photoresist is discharged from the opening 3 2 a. The nozzle 32' has a long axis direction of the opening portion 32a parallel to the γ direction. Further, the opening 32a is disposed to face the processing table 27. The dimension of the opening portion 32a in the longitudinal direction is smaller than the dimension of the substrate 8 to be transported in the γ direction, and the photoresist is not applied to the peripheral region of the substrate S. A flow path (not shown) through which the photoresist flows to the opening 32a is provided inside the nozzle 32. A photoresist supply source (not shown) is connected to the flow path. The photoresist supply source has, for example, a pump not shown. By pushing the photoresist out to the opening portion 3 2 a by the pump, Then, the photoresist is discharged from the opening 3 2 a. A moving mechanism (not shown) is provided in the strut member 3 1 a, By the moving mechanism, the nozzle 3 2 held by the bridging member 3 1 b can be moved in the Z direction -44 - 201003320. The nozzle 32 is provided with a moving mechanism not shown, By means of the moving mechanism, the nozzle 3 2 is movable in the z direction with respect to the bridging member 3 1 b. Installed under the bridging member 31b of the portal frame 31: Used to open the opening 3 of the nozzle 32, That is, the sensor 33 is measured by the distance between the front end 32c of the nozzle 32 and the opposing direction between the opposing faces of the nozzle front end 32c. For example, three of the inductors 3 3 are disposed along the Y direction. (Management Unit) The structure of the management unit 4 will be described. Management Department 4, In order to control the amount of discharge of the photoresist (liquid) discharged to the substrate S to a predetermined amount, the nozzle 3 2 is managed. Is set in: The side of the substrate conveyance unit 2 with respect to the -X direction of the application portion 3. The management department 4, have: Preparing the spitting mechanism 41, Dipping tank 42, Nozzle cleaning device 43, The accommodating portion 44 for accommodating these structures, And a holding member 45 for holding the housing portion. Preparing the spitting mechanism 4 1. Dip tank 4 2 And the nozzle cleaning devices 4 3 ' are arranged in the X direction side in this order. The preliminary discharge mechanism 4 1 ' is a portion that preliminarily discharges the photoresist. The preliminary discharge mechanism 4 1 is in a state in which the coating portion 3 is placed on the coating processing region 21, Set at the position closest to the nozzle 32, Dipping tank 42, It is a liquid tank in which a solvent such as a diluent is stored. Nozzle cleaning device 43, It is a device for flushing the vicinity of the opening portion 3 2 a of the nozzle 3 2 , Is with: a cleaning mechanism (not shown) that moves in the Y direction. And a moving mechanism (not shown) that moves the cleaning mechanism. The mobile mechanism, Set closer to the above-mentioned cleaning mechanism 45 - 201003320 - X direction side. The nozzle cleaning device 43' is provided with a portion of the moving mechanism, The size in the X direction is larger than that of the preliminary discharge mechanism 41 and the dipping tank 42. And for the preparatory spitting mechanism 41, Dipping tank 42, The arrangement of the nozzle cleaning device 4 3, It is not limited to the configuration mode of the present embodiment. Other configurations can also be used. The size of the accommodating portion 44 in the Y direction is smaller than the distance between the struts 3 1 a of the door frame 31. The door frame 3 1 can move beyond the receiving portion 44 in the X direction. Portal frame 3 1, For the preliminary discharge mechanism 41 provided in the housing portion 44, Dipping tank 42 and nozzle cleaning device 43, Can be accessed across the various parts. The holding member 45 is connected to the management unit moving mechanism 46. Management Department Mobile Agency 46, There is a rail member 47 and a drive mechanism 48. The rail member 47 is provided with one on each of the frame side portion 24a and the frame side portion 24b. Extend in the X direction. Each track member 47, Is configured in: Between the two rail members 35 connected to the portal frame 3 1 of the coating portion 3. The rail member 47 is disposed to straddle the loading side table 25, The processing table 27 and the carrying-out table 28 are removed. therefore, The management unit 4 is movable along the above-described rail member 47 to cover the loading side table 25, The processing table 27 and the loading side table 28 are removed. Drive mechanism 4 8, It is an actuator that is connected to the holding member 45 to move the management portion 4 along the rail member 47. And since each of the rail members 47 is disposed between the rail members 35, Therefore, the management unit 4 can be moved by drilling through the portal frame 31 of the coating unit 3. (Coating operation) Next, the operation of the coating device 1a having the above configuration will be described. -46-201003320 Fig. 5 to Fig. 8' are plan views showing the operation of the coating device 1a. The action of applying a photoresist to the substrate S will be described with reference to the respective drawings. In this operation, the substrate S is carried into the substrate loading area 20, The substrate S is floated and transported. Further, a photoresist is applied to the coating treatment region 21, and the substrate S to which the photoresist has been applied is carried out from the substrate carry-out region 2 2 . 5 to 8 show the outlines of the portal frame 3 1 and the management unit 4 only in broken lines. It is easy to judge the configuration of the nozzle 3 2 and the processing table 27. The detailed actions of each part are explained below. Before loading the substrate into the substrate loading area 20, The coating device 1 a is placed on standby. Specifically, The transporter 23a is disposed on the Y-direction side of the substrate loading position of the loading side table 25, Positioning the height of the vacuum liner 23b at the floating height position of the substrate, And the air ejection hole 25a that is carried into the side table 25, The air ejection hole 27a of the processing table 27, The air suction holes 27b and the air ejection holes 280a of the carry-out side table 28 respectively discharge or suck the air into a state in which air is supplied to the extent that the substrate floats on the surface of each of the stages. In this state, For example, by a transport arm or the like not shown, As shown in Figure 5, If the substrate S is transported from the outside to the substrate loading position, Then moving the lifting member 2 6 a toward the + Z direction, The lift pin 2 6 b protrudes from the lift pin exit hole 25b to the table surface 25c. And by the action of the lifting member 26a, The lift pin 26b lifts the substrate S, The transfer operation of the substrate 8 is performed. On the other hand, the positioning member protrudes from the long hole of the aligning device 25 d to the table surface 25c - after receiving the substrate S, the lowering member 26 6a is lowered, and the lifting pin - 47 - 201003320 26b is housed in the lifting pin exit hole 25b. Since an air layer is formed on the table surface 25c, Therefore, the substrate S is maintained in a state of being floated relative to the surface of the table surface 2 5 c by the above air. When the substrate S reaches the surface of the air layer, 'the positioning of the substrate S is performed by the positioning member of the calibration device 25d'. The vacuum pad 2 3 b of the carrier 2 3 a disposed at the -Y direction side of the substrate loading position The vacuum is adsorbed to the end portion of the substrate S on the _Y direction side. Fig. 5 shows a state in which the end portion of the substrate S in the -Y direction is adsorbed. The carrier 23a is moved along the rail 23c after the vacuum-liner 2 3 b is attracted to the -Y-direction side end portion of the substrate S. Since the substrate S is in a floating state, So even if the driving force of the conveyor 2 3 a is small, The substrate S can also smoothly move along the track 2 3 c. Once the leading end of the substrate S in the conveyance direction reaches the position of the opening portion 32a of the nozzle 32, As shown in Figure 6, Then, the photoresist is discharged from the opening 3 2 a of the nozzle 3 2 toward the substrate S. The discharge action of the photoresist, Is to fix the position of the nozzle 3 2 , This is carried out by transporting the substrate S while the transporter 23a. Along with the movement of the substrate S, Then, as shown in Fig. 7, a photoresist film R is coated on the substrate S. By letting the substrate S pass, Spit out the opening of the photoresist 3 2a, On the other hand, a photoresist film R is formed in a predetermined region of the substrate S. Forming the substrate S of the photoresist film R, It is transported to the side table 28 by the transporter 2 3 a. Moving out of the side table 2 8, In a state of floating relative to the table surface 2 8c, The substrate S is transported to the substrate carry-out position as shown in Fig. 8. Once the substrate S reaches the substrate carry-out position, Then the adsorption of the vacuum liner 2 3 b is released, The lifting member 209a of the lifting mechanism 29 is moved in the +Z direction by -48-201003320. By the movement of the lifting member 2 9 a, The lift pin 2 9 b protrudes from the lift pin, and the hole 2 8 b protrudes toward the back surface of the substrate S. The substrate S is lifted by the lift pins 2 9 b. In this state, For example, an external transfer arm provided at the +X direction side of the carry-out side table 28, Will be taken out of the side table 28, And receiving the substrate S. After the substrate S is transferred to the carrying arm, Returning the transporter 2 3 a to the substrate loading position of the loading side table 25, Stand by until the next substrate s is to be transported 〇 While the next substrate S is not being transported, In the coating section 3, A preliminary discharge operation for maintaining the discharge state of the nozzles 3 2 is performed. As shown in Figure 9, The door frame 31 is moved to the position of the management portion 4 in the -X direction by the rail member 35. After moving the portal frame 31 to the position of the management unit 4, The position of the door frame 31 is adjusted to take the front end of the nozzle 32 to the nozzle cleaning device 43. The nozzle tip end 32c is washed by the nozzle cleaning device 43. After the nozzle front end 3 2c is washed, The nozzle 3 2 is taken up to the preliminary discharge mechanism 41. In the preliminary discharge mechanism 41, The distance between the opening 32a and the preliminary discharge surface is measured. While moving the opening portion 3 2 a of the front end of the nozzle 3 2 to a predetermined position in the z direction, While moving the nozzle 3 2 toward the -X direction, - The photoresist is prepared to be ejected from the opening 3 2 a. After preparing for the spit, Return the portal frame 3 1 to its original position. When the next substrate S is to be transported, As shown in Figure 10, The nozzle 3 2 is moved to a predetermined position in the Z direction. The application operation of the photoresist film R and the preliminary discharge operation are performed by repeatedly applying the substrate S to the substrate S. Then, a high-quality photoresist film R is formed on the substrate S. -49- 201003320 but also according to the needs, For example, the management unit 4 is accessed every predetermined number of times. Then, the nozzle 32 is taken into the dipping tank 42. In the dipping tank 42, By exposing the opening portion 32a of the nozzle 32, Stored in a vapor environment of the solvent (diluent) of the dipping tank 42 To prevent the nozzle 32 from drying. (maintenance) Next, The maintenance of the nozzle 32 will be described. In this embodiment, The cleaning of the nozzle 32 is explained for the cleaning of the nozzle 32 in the maintenance of the nozzle 32, This is done by the operator wiping the nozzle by hand. When the maintenance is performed, the substrate conveyance unit 2 is cut into a space formation state from the substrate conveyance state. The switching to the spatial formation state will be described below. As shown in Figure 2, The support table 70 is placed sideways in the X direction of the center portion 2 4 c of the frame. The support table 70, The size in the γ direction is set to be smaller than the size in the Y direction of the loading side table 25, It is set to the range in which the cover is carried into the side table 25 in the γ direction. The dimension in the Z direction of the support base 70 is set to be the same as the dimension of the frame center portion 24c in the Z direction. The support table 70' may be pre-arranged in one of the frame portions 24 and may be brought in and out as needed. After setting the support table 70, As shown in Figure 2, The loading side table 2 5 is moved in the -X direction along the changing mechanism 5. By moving into the side table 2 5, a space 6 is formed between the end portion of the loading side table 25 in the +X direction and the coating process 27 . The space 6, It becomes an operator who enters the nozzle 3 2 and enters the space. By moving the square 〇 32 of the rear side of the side table 25, the movement of the table to the cover machine is shifted to the movement of the table 50-201003320. The end of the loading side table 25 in one direction is beyond the frame portion 24. In an X direction. The excess portion is supported by the support table 7〇, The stable support is carried into the side table 2 5 . The state in which the operator enters the space 6 on the substrate transfer table 2 is a space forming state. After moving into the side table 2 5 , As shown in Figure 2, 'operator P enters: The operator formed on the center portion 2 4 c of the frame enters the space 6. at this time, For example, the management unit 4 is disposed in the operator entering space 6. The operator P does not enter the case where the operator enters the space 6, Moving the management unit 4 in the +X direction or the X direction, Let the operator enter space 6 and vacate. After entering the operator entering space 6, The operator P picks up the nozzle 32' to perform the work of wiping the tip of the nozzle. In the case where the operator p cannot access the nozzle 32, For example, when the hand of the operator p cannot reach the nozzle 3 or the like, the nozzle is moved to the position touched by the hand of the operator p. When wiping the front end of the nozzle, It is preferable to move the management unit 4 below the nozzle 3 2 in order to prevent the solidified photoresist from adhering to the substrate transport cassette 2'. Before the operator P enters the operator into the space 6, The position of the nozzle 3 2 can also be adjusted in advance. After the job is completed, the operator P leaves from the operator entering the space 6. After the operator P leaves, Moving the loading side table 25 in the +X direction, The loading side table 25 is returned to the position at the time of substrate conveyance. After returning to the position of the loading side table 25, the support table 7 is removed or received. The coating device 1a is returned to the substrate conveyance state. After the coating device 1a is returned to the substrate transport state, the coating operation is performed as shown in Figs. 5 to 8 . With the present embodiment, The board conveying unit 2 has a changing mechanism 5, The -51 - 201003320 change agency 5 ’ can be changed to: Forming a space forming state in which the operator entering the space 6 for picking up with respect to the nozzle 3 2 The substrate transport state with the substrate 8; Therefore, when the nozzle 32 is being repaired, the substrate transporting portion 2 is brought into a space forming state', and the operator P can perform maintenance in the operator entering the space 6. Therefore, it is possible to prevent the operator P from directly entering the loading side table 25 of the board conveying unit 2, so that the maintenance efficiency can be improved. Further, it is possible to prevent rubbish, dust, or the like from adhering to the board conveying portion 2. With the present embodiment, The changing mechanism 5 is provided to move at least the loading side table 25 of the substrate conveying unit 2, Therefore, the operator entering space 6 can be efficiently formed in the substrate transport unit 2. The change organization 5 is set to: The loading side table 25 of the board conveying unit 2 and the remaining portion of the board conveying unit 2 (the processing table 27 and the carrying-side table 28) can be relatively moved in the X direction. Therefore, the operator can enter the space 6 efficiently in the substrate transport unit 2, by the present embodiment. The part that can be moved by changing the mechanism 5, In the substrate transport unit 2, Since the coating processing region 2 1 is provided on the loading side table 2 5 ' on the substrate carrying side, the operator enters the space 6 without moving the coating processing region 21 . Thereby, the state of the coating treatment region 21 can be prevented from changing. The coating state can be stabilized. According to the present embodiment, the application portion 3 can be moved in at least one of the +X direction and the X direction, so that the application portion 3 can be moved to a desired position in accordance with the position at which the operator enters the space 6. By this, even if there is an error in the range touched by the hand of the operator p, the maintenance can be surely performed. -52- 201003320 By the present embodiment, The management unit 4 can cover the loading side table 2 5 The processing table 27 and the carry-out side table 28 move in the X direction. Therefore, the position of the nozzle 32 can be matched. The management unit 4 is moved directly below the nozzle 3 2 . With this, Foreign matter such as a solidified photoresist can be prevented from adhering to the board conveying portion 2 . When the operator enters the space 6 at a position overlapping the management unit 4 by the movement of the loading side table 25, Then, the operator can enter the space on the space 6 by moving the management unit 4. Sixth Embodiment Next, a sixth embodiment of the present invention will be described. As in the fifth embodiment, In the figure below, In order to make the components recognizable, Change the scale appropriately. For the same constituent elements as the fifth embodiment, The description is omitted with the same reference numerals. In the present embodiment, The shape of the loading side table 2 5 is different from that of the fifth embodiment, and this point will be mainly described. Fig. 28A is a plan view showing the structure of the coating device 1a of the present embodiment. Fig. 2B is a front view showing the local structure of the coating device 1a of the present embodiment. As shown in Figure 28A, In the present embodiment, The shape of the loading side table 25 is comb-toothed as viewed in a plan view. Specifically, a plurality of grooves 25b are provided on the loading side table 2 5 , The table member 25i is independently provided in a state of sandwiching the groove portion 25b. In the groove portion 25b, When the substrate S is received from the external transport mechanism, a part of the external transport mechanism can be accommodated. Or you can configure a carrying roller, etc. The groove portion 2 5 b ' is disposed in the loading region of the substrate S of the loading side table 25 from the end portion in the -X direction toward the + x direction to the entire surface of the large -53-201003320. And a plurality of are arranged in the Y direction. As shown in Figure 28, The size of the frame center portion 24c of the size substrate loading region of the loading side table 25 in the X direction is smaller. The end portion of the frame portion 24 in the X direction is opposite to the end portion of the loading side table 25 toward - The X direction side is exceeded. For the two rail-shaped changing mechanisms 5 provided on the central portion of the frame, Also provided to the end of the central portion 24c in the X direction, It is in a state that it is beyond the loading side table 25. In making, The loading side table 25 is movable in the X direction along the changing mechanism 5 This movement allows the carry-in side table 25 to relatively move with respect to the remaining of the board conveyance unit 2 (the processing stage 27 and the carry-out side stage 28). Figure 28B, It is a state in which the loading side table 25 is moved to the -X direction end portion of the frame 24c. As shown in the figure, After moving in 25 moved state, The operator enters the space 6 between the loading side table 25 and the processing table 27. The entire loading side table 25 is in a state of being supported by the end portion of the center portion 24c in the -X direction. With the present embodiment, The loading side table 25 has a structure in which a plurality of grooves are formed and viewed in a plan view from a comb-tooth shape. Therefore, it is possible to easily carry S into the loading side table 25. The dimension of the loading 25 in which the groove portion 25b is formed is smaller in the X direction than the substrate direction of the substrate conveying portion 2. Therefore, even if it is moved to the side table 25, The entire loading side table 25 is placed by the frame center portion 24c. With this, Then, in the case where the operator enters the space 6, It can also be moved into the side table 2 5 . In the present embodiment, Moving into the side table 2 5 is set to be relative to the base, Compared The frame X side 2 4c - the structure is formed by the partial central portion side frame 25b substrate side entry area to the opposite side of the transport area 2 - move to the remaining area of the transport unit 2 The size of the loading side table 25 in the X direction is smaller than the size of the frame center portion 24c of the substrate loading area 20 in the X direction. It is not limited to this. For example, the carry-out side table 28 may be disposed to be movable relative to the remaining area of the substrate transport unit 2. Other than that, The size of the carry-out side table 28 in the X direction may be smaller than the dimension of the frame center portion 24c of the substrate carry-out area 2 1 in the X direction. In this case, By moving the carry-out side table 28 in the +X direction, An operator enters the space 6 between the carry-out side table 28 and the processing table 27. And in this case, The same effect as described above can also be obtained. [Seventh embodiment] Next, a seventh embodiment of the present invention will be described. As in the fifth embodiment, In the figure below, In order to make the components recognizable, Change the scale appropriately. For the same constituent elements as the fifth embodiment, The description is omitted with the same reference numerals. In the present embodiment, As in the sixth embodiment, The loading side table 25 is formed to have a comb shape as viewed from a plan view. The configuration of the changing mechanism 5 is different from that of the sixth embodiment. Figures 29A and 29B, It is a top view which shows the structure of the coating apparatus 1a of this embodiment. As shown in these figures, In the present embodiment, the loading side table 25 has a groove portion 2 5 b and has a comb-tooth shape as seen from a plan view. The dimension of the frame portion 24 on the substrate carrying-in region 20 side in the X direction is substantially the same as the dimension of the loading side table 25 in the X direction. In the present embodiment, The rail-shaped changing mechanism 5 is placed on the frame center portion 24c in the meandering direction. Each of the table members 251 - 55 - 201003320 that are carried into the side table 25 can be independently moved and placed on the changing mechanism 5 . In this configuration, Each of the base members 25i can be concentrated at a position in the Y direction among the substrate loading regions 20. In Figure 29B, It is a state in which the respective base members 25i are concentrated at the ends in the ten-Y direction. other, For example, the state in which each of the base members 2 5 i is concentrated in the -Y direction may be obtained. It is also possible to concentrate the respective base members 2 5 i in the central portion in the Y direction. With the present embodiment, The changing mechanism 5 is provided with the loading side table 25 of the board conveying unit 2 so as to be deformable and has a plurality of groove portions 25b, and the comb-shaped loading side table 25 is viewed from the downward direction. The portion (each of the base members 2 5 i )' which is a comb tooth viewed from a plan view can be collectively disposed at a predetermined portion in the Y direction. Therefore, the operator entering space 6 can be effectively formed on the substrate carrying portion 2. [Eighth Embodiment] Next, an eighth embodiment of the present invention will be described. Similarly to the fifth embodiment, In the following figures, in order to make each component recognizable, Change the scale appropriately. For the same constituent elements as the fifth embodiment, The description is omitted with the same reference numerals. In the present embodiment, the structure of the loading-side table 2 5 and the structure of the structure of the changing mechanism 5 are different from those of the fifth embodiment, and this point will be mainly described. Fig. 30 is a front elevational view showing a partial structure of the coating device 1a of the present embodiment. As shown in the figure, the end portion of the loading side table 25 in the +X direction is provided so as to be bendable in the -Z direction. Specifically, A bent portion 25h is provided at an end portion of the loading side table 25 in the +X direction. The bent portion 25h is a partition mechanism 56-201003320, and the table body 2 5 k for the loading side table 25 is changed. installation. The changing mechanism 5' is provided with a hinge mechanism. The hinge mechanism has a rotation axis, for example, in the γ direction. The bent portion 25h is bent in the −z direction with the changing mechanism 5 as a shaft portion. In a state in which the bent portion 25h is bent, Then, an operator entering space 6 is formed between the loading side table 25 and the processing table 27. With the present embodiment, The changing mechanism 5 is provided so that a part of the carry-in side table 25, that is, the bent portion 25h can be bent about the remaining portion, that is, the table main body 25k, so that the operator can enter the space efficiently. In the present embodiment, Although the rotation axis of the changing mechanism 5 is the Y direction, And not limited to this, For example, it is also possible to have a rotation axis in the X direction. And although the bending direction of the bent portion 2 5 h is a Z direction, It can also be made into a structure that is bent in the +Z direction. The technical scope of the present invention is not limited to the above embodiment. Appropriate changes can be made without departing from the spirit of the invention. E.g, As shown in Figure 31, Can also have: After the repair is completed, The positioning mechanism that moves the loading side table 25 in the +X direction and returns to the substrate conveyance state. Specifically, For example, as shown in the figure, A convex portion 2 5j is provided on an end surface of the loading side table 25 in the +X direction, A concave portion 27j is provided on an end surface of the processing table 27 in the X direction. In this configuration, An inclined surface having the same angle is formed in the convex portion 25j and the concave portion 27j. When moving the loading side table 25, By fitting the convex portion 2 5 j to the concave portion 2 7 j to make the inclined surfaces coincide, The position between it and the processing station 27 can then be correctly positioned. In the above embodiment, Although only one coating portion 3 is provided, And not limited to this, A plurality of coating portions 3 may also be disposed. For example, in Figure 3 2, -57-201003320 The structure in which the two application portions 3 are provided (the application portion 3a and the application portion 3b) is displayed. In the case where a plurality of application portions are provided, it is preferable to move a part of the application portion toward the substrate carry-in region 20 side to move the remaining application portion toward the substrate carry-out region 2 2 side. In the third embodiment, the application portion 3a of the two application portions can be moved toward the substrate loading region 20 side, and the application portion 3b can be moved toward the substrate carry-out region 22 side. In the above embodiment, The rail member 35 of the moving mechanism 34 and the rail member 47 of the moving mechanism 46 are respectively disposed on the upper faces of the side portions 24a and 24b of the frame portion 24. And not limited to this, For example, as shown in Fig. 2, the rail member 35 and the rail member 47 may be provided inside the side portions 24a and 24b of the frame portion 24, respectively. For example, in Figure 3, The groove portion 24c and the groove portion 24d are provided on the side portions 24a and 24b of the frame portion 24 in the X direction. And the rail member 35 is disposed in the groove portion 24c, The rail member 47 is placed in the groove portion 24d. In the state in which the end portion in the -Z direction of the strut member 3 1 a of the application portion 3 is inserted into the groove portion 24c, Disposing the strut members 31 1 a on the rails 35, In a state in which the end portion of the holding member 45 of the management unit 4 in the -Z direction is inserted into the groove portion 24d, The holding member 45 is disposed on the rail member 47. In Figure 33, The dimension of the groove portion 24c in the Z direction is larger than the dimension of the groove portion 24d in the Z direction. And of course not limited to this, For example, the dimension of the groove portion 24d in the Z direction is larger than the dimension of the groove portion 24c in the Z direction. Further, the groove portion 2k and the groove portion 24d may have the same size in the Z direction. For the overall configuration of the coating device 1 a, In the above embodiment, The transport mechanism 2 3 is disposed on a γ-direction side of the table portion. It is not limited to -58- 201003320. E.g, The transport mechanism 23 may be disposed on the + γ direction side of each of the stages. As shown in Figure 34, The transport mechanism 23 (the transporter 23a, the transporter 23a, may be disposed on one γ direction side of each of the bases) Vacuum liner 23b, The rail 23c)' is disposed on the +Y direction side with the transport mechanism 53 having the same structure as the transport mechanism 23 (the transporter 53a, Vacuum liner 53b, Track 53c), Further, different substrates can be transported by the transport mechanism 23 and the transport mechanism 53. For example, as shown in the figure, The substrate S1 is transported by the transport mechanism 23, The substrate s 2 is transported at the transport mechanism 5 3 . In this case, The substrate can be transported by the transport mechanism 23 and the transport mechanism 53 in an interactive manner. Let production capacity increase. And in order to have the above substrate S, SI, In the case where the substrate of half the area of S2 is transported, for example, one of the transport mechanism 23 and the transport mechanism 53 is held one by one. By moving the transport mechanism 2 3 and the transport mechanism 5 3 into the direction of the X X, It is possible to carry two substrates at the same time. With this configuration, It can increase production capacity. In the above embodiment, Although the coating device 1a for lifting and transporting the substrate S is exemplified, Without such restrictions, As long as it is a coating device that transports a substrate and applies it, The invention is also applicable to: a coating device other than the floating type, For example, the coating device for the substrate is conveyed by a conveyance mechanism such as a conveyance roller. In each of the above embodiments, Alternatively, after the management unit 4 is positioned below the front end 32c of the nozzle 32, The space 6 is formed again. and, In the above embodiments, the case where the application unit 3 is fixed in advance and the maintenance is performed is performed, and the application unit 3 may be first moved to the loading side table 25, Put it under the nozzle 3 2c of the coating portion 3 on the management portion 4, Then the job -59- 201003320 person p work. By placing the management unit 4 below the nozzle 3 2 , Then, even if the solidification of the photoresist falls during maintenance, contamination can be prevented from being carried into the side table 25, Processing station 27 and the like. In the above embodiment, Although only the case where the operator enters the space 6 to repair the nozzle 3 2 is described, The present invention is not limited to this. For example, the maintenance of the management unit 4 may be performed by the operator entering the space 6. For example, the application unit 3 is moved toward the +X direction side of the operator's entrance space 6 to move the management unit 4 toward the -X direction side of the operator entering the space 6. Thereby, for example, the operator performs the maintenance of the application unit 3 in the +X direction, and then the maintenance of the management unit 4 is performed in the -X direction. Thereby, the maintenance efficiency of the coating device 1a can be improved. Although the above description of the preferred embodiment of the present invention, The present invention is not limited to the embodiment. Without departing from the scope of the invention, Can be added to the structure, Omitted, Replacement, And other changes. The present invention is not limited by the above description, and is only limited by the scope of the appended claims. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing the configuration of a coating apparatus according to a first embodiment of the present invention. 2 is a front view showing a structure of a coating device according to the present embodiment. FIG. 3 is a plan view showing a structure of the coating device according to the embodiment. FIG. 4 is a view showing a structure of the coating device according to the embodiment. Side view - 60 - 201003320 Fig. 5 is a plan view showing the operation of the coating apparatus according to the first embodiment and the fifth embodiment of the present invention. Fig. 6 is a plan view showing an operation process continuous with Fig. 5. Fig. 7 is a plan view showing a continuous operation process from Fig. 6. Fig. 8 is a plan view showing a continuous operation process from Fig. 7. Fig. 9 is a plan view showing a continuous operation process from Fig. 8. The first drawing is a plan view showing the operation process continuous with the ninth drawing. Fig. 1 is a view showing a maintenance procedure of the coating device of the present embodiment. Fig. 1 is a view showing a step of continuously performing maintenance with the first one. Fig. 13 is a view showing a step of continuously performing maintenance with Fig. 12. Fig. 14 is a view showing a step of continuously performing maintenance with Fig. 3 . Fig. 15 is a perspective view showing the structure of a coating apparatus according to a second embodiment of the present invention. Fig. 16 is a perspective view showing the structure of a coating apparatus according to a third embodiment of the present invention. Fig. 17 is a perspective view showing the structure of a coating apparatus according to a fourth embodiment of the present invention. Fig. 18 is a view showing the other structure of the coating apparatus of the present invention. Fig. 19 is a view showing the other structure of the coating apparatus of the present invention. Fig. 20 is a view showing the other structure of the coating apparatus of the present invention. Fig. 2 is a view showing the other structure of the coating apparatus of the present invention. Fig. 22 is a perspective view showing the structure of a coating apparatus according to a fifth embodiment of the present invention. -61 - 201003320 Fig. 2 is a front elevational view showing the structure of the coating apparatus of the present embodiment. Fig. 24 is a plan view showing the structure of the coating apparatus of the present embodiment. Fig. 25 is a side view showing the structure of the coating device of the embodiment. Fig. 26 is a view showing the maintenance procedure of the coating apparatus of the present embodiment. Fig. 2 is a diagram showing the steps of the maintenance in succession with Fig. 26. 28A to 28B are diagrams showing the structure of a coating apparatus according to a sixth embodiment of the present invention. 29A to 29B are diagrams showing the structure of a coating apparatus according to a seventh embodiment of the present invention. Fig. 30 is a view showing the structure of a coating apparatus according to an eighth embodiment of the present invention. Fig. 3 is a view showing the other structure of the coating apparatus of the present invention. Fig. 3 is a view showing the other structure of the coating apparatus of the present invention. Fig. 3 is a view showing the other structure of the coating apparatus of the present invention. Fig. 4 is a view showing the other structure of the coating apparatus of the present invention. [Main component symbol description] 1. 1 a : Coating device 2 : Substrate handling unit 3 : Coating Department -62- 201003320 4 : Management Department 5 ‘·Change Organization 6 : The operator enters the space 2 4 : Frame part 24b: Side 2 5 : Move into the side table 2 8 : Moving out of the side table 3 1 : Portal frame 34 : Mobile mechanism 4 5 : Holding member 46 : Mobile agency 6 0, 6 1 : Workbench 6 2 : Clamping mechanism 7 0 : Support table P : Operator Q ' Q1 ' Q 2 · Area T1 T 2 : End -63