TWI481540B - Coating apparatus and coating method - Google Patents

Description

Coating device and coating method

The present invention relates to a coating apparatus and a coating method.

The present application claims priority based on Japanese Patent Application No. 2008-167362, filed on Jun. 26, 2008, the entire contents of

A fine pattern such as a wiring, an electrode, a color filter, or the like is formed on a glass substrate constituting a display panel such as a liquid crystal display. Generally, such a pattern is formed by a method such as photolithography. In the photolithography technique, a photoresist film forming step of forming a photoresist film on a glass substrate, an exposure step of patterning the photoresist film, and a subsequent image development of the photoresist film are respectively performed. step.

In the photoresist film forming step, the coating device used is coated with a photoresist film on the surface of the glass substrate. A structure of a known coating apparatus (for example, refer to Patent Document 1)), for example, a glass substrate that is floated on a table top and transported, and is moved by a slit nozzle that is provided to face the stage portion The surface is coated with a photoresist. As described in Patent Document 1, the transport mechanism for transporting the glass substrate is often provided on the side portion of the table portion.

The substrate holding portion for holding the side edge portion of the glass substrate is provided in the transport mechanism, and the glass substrate is transported while the side edge portion is held by the substrate holding portion. Since the substrate holding portion holds the glass substrate, it is usually provided to protrude toward the land portion more than the other portion of the conveying mechanism.

[Patent Document 1]

Japanese Patent Laid-Open Publication No. 2005-236092

However, when the glass substrate is to be moved, especially when the glass substrate starts to move or stops moving, a force in a direction opposite to the acceleration direction of the glass substrate is applied, and the holding position of the glass substrate may be caused by the opposite force. Offset. For example, when the glass substrate starts moving, if the positional deviation is maintained, the coating area of the photoresist is shifted with respect to the original coating area. If the offset of the holding position is large, it is also possible to apply the photoresist to the region deviated from the glass substrate and allow the photoresist to adhere to the land.

If the substrate holding portion is disposed to protrude toward the table portion side more than other portions of the conveying mechanism, when the conveying mechanism moves, it may collide with or contact with other constituent members of the coating device to become a conveying mechanism or the constituent member. The cause of defects such as damage, malfunction, etc.

In view of the above circumstances, an object of the present invention is to provide a coating apparatus and a coating method which can prevent a poor coating and keep the substrate carrying portion clean. Moreover, it is an object of the present invention to provide a coating apparatus which can avoid the disadvantages of damage, malfunction, and the like of the constituent members of the apparatus.

In order to achieve the above object, the coating apparatus of the present invention includes a substrate conveying unit that floats and transports the substrate, and a liquid material is applied to the substrate while being conveyed by the substrate conveying unit. The application unit of the application unit is provided with a holding unit that is provided in the substrate transport unit and that holds the substrate, and transports the substrate while holding the substrate, and The substrate is pressed against the auxiliary mechanism of the holding portion.

According to the present invention, the substrate transporting portion is provided with a transporting mechanism that holds the substrate and holds the substrate in a state in which the substrate is held, and includes an auxiliary mechanism that presses the substrate against the holding portion. In addition to the holding portion of the transport mechanism, the substrate can also be held by the auxiliary mechanism. Therefore, the substrate can be held more firmly, whereby the offset of the substrate can be suppressed. Moreover, it is possible to prevent the poor coating from being caused by the offset of the substrate, and it is possible to keep the substrate carrying portion clean.

In the above coating apparatus, the transport mechanism holds one of the substrates along one of the conveyance directions of the substrate.

According to the present invention, in the case where the transport mechanism holds the one side of the substrate along the transport direction of the substrate, the substrate can be held more firmly. Thereby, the holding area is not widened, and the substrate can be stably held.

In the above coating apparatus, the auxiliary mechanism is provided at a conveyance start position of the substrate.

According to the present invention, when the auxiliary mechanism is provided at the conveyance start position of the substrate, it is possible to prevent the substrate from being displaced at the conveyance start position of the substrate.

In the above coating apparatus, the auxiliary mechanism is provided to be movable in a conveyance direction of the substrate.

According to the present invention, when the auxiliary mechanism is provided to be movable in the conveyance direction of the substrate, the auxiliary mechanism can be moved in accordance with the movement of the substrate. Therefore, for example, the substrate can be pressed against the holding portion during the movement of the substrate. Thereby, the substrate can be stably held.

In the above coating apparatus, the auxiliary mechanism is mounted on the transport mechanism.

According to the present invention, when the auxiliary mechanism is mounted on the transport mechanism, the transport mechanism and the auxiliary mechanism can be integrally moved. Thereby, the positional deviation of the two mechanisms can be prevented without adjusting the moving speed of the transport mechanism and the moving speed of the auxiliary mechanism, so that stable holding of the substrate can be more easily achieved.

In the above coating apparatus, the auxiliary mechanism has a retracting mechanism.

According to the present invention, in the case where the assisting mechanism has the retracting mechanism, for example, if other constituent members or the like are provided on the moving route, the other constituent members can be avoided. Thereby, collision or contact between the auxiliary mechanism and the constituent member can be avoided, and the disadvantages of device damage, malfunction, and the like can be avoided.

In the above coating apparatus, the auxiliary mechanism presses a surface of the substrate different from a surface held by the transport mechanism.

According to the present invention, when the auxiliary mechanism presses a face different from the face held by the transport mechanism among the substrates, the front and back sides of the substrate are held by the transport mechanism and the auxiliary mechanism. This allows the substrate to be less offset.

In the above-described coating device, the auxiliary mechanism includes a pressing portion that presses the substrate, and the pressing portion is formed of a material that holds a pressing surface of the substrate.

According to the present invention, the auxiliary mechanism has a pressing portion for pressing the substrate, and the pressing portion is formed of a material that holds the pressing surface of the substrate. When the substrate is pressed by the auxiliary mechanism, the substrate can be suppressed. The state of the pressing surface changes. In general, the state of the liquid applied to the substrate changes depending on the state of the pressing surface (temperature, presence or absence of scratches, etc.). On the other hand, in the present invention, it is possible to suppress the state change of the pressing surface, and therefore the state of the liquid body can be stabilized.

In the above coating apparatus, the auxiliary mechanism presses a position overlapping the holding portion as viewed in a plan view.

According to the present invention, when the auxiliary mechanism presses the position overlapping the holding portion in the plan view direction, the substrate can be held by the auxiliary mechanism and the holding portion with precise positioning. This allows the substrate to be less offset.

In the above coating apparatus, the auxiliary mechanism has a gas ejecting portion that ejects a gas toward the substrate, and the substrate is pressed in a non-contact manner by the ejecting of the gas.

According to the invention, the auxiliary mechanism has the gas ejecting portion that ejects the gas toward the substrate, and the substrate is pressed in a non-contact manner by the ejection of the gas, whereby the mechanical contact with the substrate can be reduced. Thereby, deformation of the substrate, generation of scratches, and the like can be suppressed.

In the above coating apparatus, a plurality of the gas ejecting portions are provided in the transport direction of the substrate.

According to the present invention, when a plurality of gas ejecting portions are provided in the transport direction of the substrate, the substrate can be pressed in a non-contact manner on the moving path of the transport substrate. Thereby, the substrate can be held more stably.

In the above coating apparatus, the auxiliary mechanism attracts the same surface of the substrate as the surface held by the transport mechanism.

According to the present invention, in the auxiliary mechanism, the same surface as the face held by the transport mechanism is attracted to the substrate, whereby the space can be secured on the face opposite to the face held by the substrate.

In the above coating apparatus, the auxiliary mechanism includes a suction portion that is attracted to the substrate, and the suction portion is formed of a material that holds the suction surface of the substrate.

According to the present invention, the auxiliary mechanism includes a suction portion that contacts the substrate to attract the suction portion, and the suction portion is formed of a material that holds the state of the suction surface of the substrate. When the substrate is attracted by the auxiliary mechanism, it can be suppressed. The state of the attraction surface of the substrate changes. Thereby, the state of the liquid body applied on the substrate can be stabilized.

In the above coating apparatus, the auxiliary mechanism includes an adsorption unit that is adsorbed on the substrate.

According to the invention, the auxiliary mechanism has the adsorption portion that is adsorbed on the substrate, so that the substrate can be stably held by the adsorption portion.

In the above coating apparatus, the auxiliary mechanism has a gas suction portion that sucks gas between the substrate and the substrate, and sucks the substrate in a non-contact manner by suction of the gas.

According to the present invention, the auxiliary mechanism has the gas suction portion that sucks the gas between the substrate and the substrate, and the substrate is attracted by the suction of the gas in a non-contact manner, whereby the mechanical contact with the substrate can be reduced. Thereby, it is possible to suppress the deformation of the substrate or the occurrence of scratches.

In the coating device, at least one of the upstream side and the downstream side of the application portion is provided with a table portion provided with a floating mechanism for floating the substrate, and the table portion has a substantially square shape as viewed from a plan view. shape.

According to the invention, at least one of the upstream side and the downstream side of the application portion is provided with a table portion provided with a floating mechanism for floating the substrate, and the substrate can be reliably prevented when the substrate is transported on the table portion. The offset of the substrate. On the other hand, when the base portion has a substantially square shape as viewed from a plan view, the substrate can be transported in any direction in the long axis and the short axis direction of the substrate regardless of whether the substrate has a long axis or a short axis direction.

In the coating method of the present invention, the substrate is coated with a liquid, and the method of applying the liquid to the substrate is characterized in that the substrate is held by a holding portion of a transport mechanism that transports the substrate. In the substrate, the substrate held by the holding portion is pressed toward the holding portion, and the substrate is conveyed while the substrate is held, and the liquid material is applied.

According to the present invention, the substrate is held by the holding portion of the transport mechanism that transports the substrate, and the substrate held by the holding portion is pressed toward the holding portion, and the substrate is transported while the substrate is held to apply the liquid material. Therefore, the substrate can be held more firmly than in the case where the substrate is held only by the holding portion, whereby the offset of the substrate can be suppressed. Moreover, it is possible to prevent the poor coating from being caused by the offset of the substrate, and it is possible to keep the substrate carrying portion clean.

In the above coating method, the substrate is conveyed while the substrate is pressed.

According to the present invention, when the substrate is conveyed while the substrate is pressed, the holding position of the substrate can be more reliably prevented from shifting.

In the above coating method, the pressing of the holding portion of the substrate is released before the substrate is conveyed.

According to the present invention, it is possible to easily control the substrate conveyance when the pressing of the holding portion of the substrate is released before the substrate is transferred.

In the above coating method, when the substrate is conveyed, the pressing of the holding portion of the substrate is released.

According to the present invention, when the substrate is transported, the pressing of the holding portion of the substrate is released, whereby the control of the substrate transport can be easily performed. Therefore, it is possible to easily prevent the substrate holding position from being shifted, and it is easy to control the substrate conveyance.

In the above coating method, the pressing of the holding portion of the substrate is released before the application of the liquid material.

According to the present invention, the pressing of the holding portion of the substrate is released before the application of the liquid material, and the deviation of the substrate can be easily avoided, and the control of the substrate transportation during coating can be easily performed.

The coating apparatus of the present invention includes a substrate conveying unit that conveys a substrate, and a coating unit that applies a liquid to the substrate while being conveyed by the substrate conveying unit. In the apparatus, the apparatus includes a holding unit that holds the substrate, and a transport mechanism that transports the substrate while holding the substrate. The transport mechanism is provided to be The conveyance direction of the substrate moves, and the holding portion is provided to be movable in a direction different from the conveyance direction.

According to the present invention, the transport mechanism for transporting the substrate is provided so as to be movable in the transport direction of the substrate, and is provided in the holding portion of the transport mechanism so as to be movable in a direction different from the transport direction. Therefore, even in the transport direction with respect to the transport portion In the case where other constituent members are provided on the moving area, the constituent members can be avoided. Thereby, it is possible to avoid the loss of damage, malfunction, and the like of the constituent members of the device.

In the above coating apparatus, the substrate conveying unit includes a floating mechanism that floats the substrate.

According to the present invention, when the substrate transporting portion is provided with a floating mechanism for floating the substrate, even when the substrate is floated and transported, if other components are provided in the moving region of the holding portion, it is possible to avoid The component is made up. When the substrate is floated and moved, it is necessary to have a more precise structure as the holding portion, so it is of great significance to avoid collision or contact with other constituent members.

In the above-described coating device, the holding portion includes a retracting mechanism that returns to the substrate conveying portion in a retracted state after the substrate is conveyed.

According to the present invention, the holding portion is provided with a retracting mechanism that returns to the board conveying portion in a retracted state after the substrate is transported, and even when returning to the board conveying portion, the moving portion of the holding portion is provided In the case of other component members, it is also possible to move in a manner that avoids other component members.

In the coating device, at least one of the upstream side and the downstream side of the application portion is provided with a table portion provided with a floating mechanism for floating the substrate, and the table portion has a substantially square shape as viewed from a plan view. shape.

According to the invention, at least one of the upstream side and the downstream side of the application portion is provided with a table portion provided with a floating mechanism for floating the substrate, and the substrate can be reliably prevented when the substrate is transported on the table portion. The offset of the substrate. On the other hand, when the base portion has a substantially square shape as viewed from a plan view, the substrate can be transported in any direction in the long axis and the short axis direction of the substrate regardless of whether the substrate has a long axis or a short axis direction.

According to the present invention, the substrate transporting portion is provided with a transporting mechanism that holds the substrate and holds the substrate in a state in which the substrate is held, and includes an auxiliary mechanism that presses the substrate against the holding portion. In addition to the holding portion of the transport mechanism, the substrate can also be held by the auxiliary mechanism. Therefore, the substrate can be held more firmly, whereby the offset of the substrate can be suppressed. Moreover, it is possible to prevent the poor coating from being caused by the offset of the substrate, and it is possible to keep the substrate carrying portion clean.

According to the present invention, the transport mechanism for transporting the substrate is provided so as to be movable in the transport direction of the substrate, and is provided in the holding portion of the transport mechanism so as to be movable in a direction different from the transport direction. Therefore, even in the transport direction with respect to the transport portion In the case where other constituent members are provided on the moving area, the constituent members can be avoided. Thereby, it is possible to avoid the loss of damage, malfunction, and the like of the constituent members of the device.

The first embodiment of the present invention will be described based on the drawings.

Fig. 1 is a perspective view of the coating device 1 of the present embodiment.

As shown in FIG. 1 , the coating device 1 of the present embodiment is, for example, a coating device that applies a photoresist to a glass substrate used for a liquid crystal panel or the like, and is a substrate conveying unit 2 and a coating unit 3 . The management unit 4 is a main constituent element. The coating device 1 is transported while the substrate is being lifted by the substrate transport unit 2, and the photoresist is applied to the substrate by the coating unit 3, and the coating unit manages the coating. The state of the cloth portion 3.

2 is a front view of the coating device 1, FIG. 3 is a plan view of the coating device 1, and FIG. 4 is a side view of the coating device 1. The configuration of the coating device 1 will be described in detail with reference to these drawings. Hereinafter, in explaining the structure of the coating apparatus 1, the direction in the drawing will be described using an XYZ coordinate system for easy display. The longitudinal direction of the substrate conveyance unit 2, that is, the conveyance direction of the substrate is referred to as the X direction. The direction perpendicular to the X direction (substrate conveyance direction) as viewed from the plan view is referred to as the Y direction. The direction perpendicular to the plane including the X-axis and the Y-axis is referred to as the Z direction. In the X direction, the Y direction, and the Z direction, respectively, the direction of the arrow in the figure is the + direction, and the direction opposite to the direction of the arrow is the - direction.

(substrate conveying unit)

First, the structure of the substrate conveyance unit 2 will be described.

The board conveyance unit 2 includes a frame 21, a table portion 22, a conveyance mechanism 23, and an auxiliary mechanism 24. In the board conveyance unit 2, the substrate S is conveyed in the +X direction on the table portion 22 by the characteristic components of the present embodiment, that is, the conveyance mechanism 23 and the auxiliary mechanism 24.

The frame 21 is, for example, a support member that is placed on the ground and that supports the table portion 22 and the transport mechanism 23. The frame 21 is divided into three sections which are arranged in the Y direction. The frame center portion 21a is a portion that is disposed at the center in the Y direction among the three divided portions, and supports the table portion 22. The frame side portion 21b is disposed on the -Y direction side of the frame center portion 21a, and supports the transport mechanism 23. A gap is provided between the frame side portion 21b and the frame center portion 21a. The frame side portion 21c is disposed on the +Y direction side of the frame center portion 21a, and supports the transport mechanism 23. A gap is provided between the frame side portion 21c and the frame center portion 21a. The frame center portion 21a, the frame side portion 21b, and the frame side portion 21c are in the long axis direction in the X direction, and the dimensions of the respective portions in the X direction are substantially the same.

The table portion 22 has a loading side table 25, a processing table 27, and a carry-out side table 28. The loading side table 25, the processing table 27, and the unloading side table 28 are arranged in the frame center portion 21a from the upstream side in the substrate conveyance direction to the downstream side (in the +X direction).

The loading side table 25 is made of, for example, SUS or the like, and is a substantially square plate-like member viewed from a plan view. By forming the shape of the loading side table 25 in a substantially square shape in a plan view, the substrate can be conveyed in any direction even when the substrate having the long axis and the short axis direction is conveyed. In the present embodiment, the area on the loading side table 25 is the substrate loading area 25S. The substrate loading area 25S is an area in which the substrate S transported from the outside of the apparatus is carried in.

The loading side table 25 is provided with a plurality of air ejection holes 25a and a plurality of lift pin exit holes 25b. The air ejection hole 25a and the lift pin exit hole 25b are provided so as to penetrate the loading side table 25, respectively.

The air ejection hole 25a is a hole that ejects air onto the table surface 25c of the loading side table 25, and is arranged in a matrix shape as viewed in a plan view. An air supply source (not shown) is connected to the air ejection hole 25a. At the loading side table 25, the substrate S can be floated in the +Z direction by the air ejected from the air ejection hole 25a.

The lift pin exit hole 25b is a substrate loading position provided on the carry-in side table 25. The lift pin exits the hole 25b so that the air supplied to the table surface 25c does not leak.

One calibration device 25d is provided at each of both end portions of the loading side table 25 in the Y direction. The calibration device 25d is a device that positions the substrate S carried into the loading side table 25. Each of the aligning devices 25d has a long hole portion and a positioning member provided in the long hole portion, and the substrate is carried by mechanically sandwiching the substrate carried into the loading side table 25 to position the substrate.

The elevating mechanism 26 is provided on the -Z direction side of the loading side table 25, that is, on the back side of the loading side table 25. The elevating mechanism 26 is provided so as to be viewed from a plan view in a substrate loading position 25L that is superimposed on the loading side table 25 (refer to FIG. 6). The elevating mechanism 26 has a lifting member 26a and a plurality of lifting pins 26b. The elevating member 26a is connected to a drive mechanism (not shown), and the elevating member 26a is moved in the Z direction by the drive of the drive mechanism. The plurality of lift pins 26b are erected from the upper surface portion of the elevating member 26a toward the carry-in side table 25. Each of the lift pins 26b is disposed at a position overlapping the lift pin exit hole 25b as viewed in plan view. When the elevating member 26a is moved in the Z direction, the lift pins 26b are ejected from the lift pin exit holes 25b on the table surface 25c. The end portions of the lift pins 26b in the +Z direction are provided so as to be aligned with the positions in the Z direction, and the substrate S conveyed from the outside of the apparatus can be kept horizontal.

The processing table 27 is a plate-shaped member that is rectangular in plan view when the light-absorbing material having a hard aluminum oxide film as a main component is used as a main component of the hard aluminum oxide film, and is provided on the +X direction side with respect to the loading side table 25. The portion of the processing table 27 covered with the light absorbing material suppresses reflection of light such as laser light. The processing table 27 has a long axis in the Y direction. The size of the processing table 27 in the Y direction is substantially the same as the size of the loading side table 25 in the Y direction. In the present embodiment, the region on the processing table 27 is a coating treatment region 27S on which a photoresist is applied.

The processing table 27 is provided with a plurality of air ejection holes 27a for discharging air onto the table surface 27c, and a plurality of air suction holes 27b for sucking air on the table surface 27c. These air ejection holes 27a and air suction holes 27b are provided to penetrate the processing table 27. Inside the processing table 27, a plurality of groove portions (not shown) for applying a resistance to the pressure of the gas passing through the air ejection hole 27a and the air suction hole 27b are provided. The plurality of groove portions are connected to the air ejection hole 27a and the air suction hole 27b inside the table portion.

In the processing table 27, the pitch of the air ejection holes 27a is narrower than the pitch of the air ejection holes 25a provided in the loading side table 25, and the air ejection holes 27a are provided closer than the loading side table 25. Therefore, the amount of floating of the substrate can be adjusted at a higher accuracy than the other stages, and the amount of floating of the substrate can be controlled, for example, to 100 μm or less, and preferably 50 μm or less.

The unloading side table 28 is provided on the +X direction side with respect to the processing table 27, and is composed of substantially the same material and size as the loading side table 25 provided in the substrate loading area 25S. The shape of the carry-out side stand 28 is also substantially square as viewed from a plan view. In the present embodiment, the area on the carry-out side table 28 is the substrate carry-out area 28S. The substrate carry-out area 28S is a substrate carry-out area 28S in which the substrate S coated with the photoresist is carried out to the outside of the apparatus.

Similarly to the loading side table 25, the unloading side table 28 is provided with an air ejection hole 28a and a lift pin exit hole 28b. The elevating mechanism 29 is provided on the -Z direction side of the carry-out side stand 28, that is, the back side of the carry-out side stand 28. The elevating mechanism 29 is provided so as to be viewed from a plan view direction in a substrate carrying-out position that is superimposed on the unloading side table 28. The elevating member 29a and the elevating pin 29b of the elevating mechanism 29 have the same structure as the respective portions of the elevating mechanism 26 provided on the loading side table 25. When the substrate S on the carry-out side table 28 is carried out to the external device, the elevating mechanism 29 can lift the substrate S by the lift pins 29b for the transfer of the substrate S.

The transport mechanism 23 has a mechanism for holding the substrate S and transporting it in the +X direction, and a pair is provided on the frame side portion 21b and the frame side portion 21c. The pair of transport mechanisms 23 have a line symmetry with respect to the center of the base portion 22 in the Y direction, and have the same structure except for the line symmetry. Therefore, the transport mechanism 23 provided in the frame side portion 21b will be described below by way of example.

The transport mechanism 23 includes a transporter 23a, a substrate holding portion 23b, and a rail 23c. The structure of the transporter 23a is internally provided with, for example, a linear motor, and the linear motor is driven to move the transporter 23a on the rail 23c.

The substrate holding portion 23b is a holding portion that holds the side edge portion Sa on the -Y direction side of the substrate S.

The side edge portion Sa of the substrate S is a portion exposed to the land portion 22 and is a side portion along the substrate conveyance direction. On the surface on the +X direction side of the transporter 23a, for example, four substrate holding portions 23b are provided along the Y direction, and are attached to the transporter 23a via the mounting member 23d.

The rail 23c is provided on the frame side portion 21b, and extends on the side of the loading side table 25, the processing table 27, and the unloading side table 28, and can be transported by sliding on the rail 23c. The machine 23a moves along each of the above stages.

Each of the transport mechanisms 23 provided at the frame side portion 21b and the frame side portion 21c can independently transport the substrate S. For example, as shown in Fig. 3, the transport mechanism 23 provided in the frame side portion 21b and the transport mechanism 23 provided on the frame side portion 21c can hold different substrates S. In this case, each can be Since the transport mechanism 23 carries the substrates interactively, the production capacity can be improved.

On the other hand, when the substrate having the area of about half of the substrate S is to be transported, for example, one of the two transport mechanisms 23 is held, and by moving the two transport mechanisms 23 in the +X direction, it is possible to simultaneously Carry two substrates.

The detailed structure of the transport mechanism 23 will be described with reference to the fifth (a) and fifth (b) drawings. The fifth (a) is a plan view showing the structure of the transport mechanism 23, and the fifth (b) is a side view showing the structure of the transport mechanism 23.

As shown in FIGS. 5(a) and 5(b), the substrate holding portion 23b includes a pad pressing member 23e, an adsorption pad 23f, and a shaft member 23g.

The pad pressing member 23e is a plate-like member made of a material having rigidity. The end portion (base end portion) on the -Y direction side of the pad pressing member 23e is supported by the shaft member 23g, and is attached to the attachment member 23d via the shaft member 23g. The end portion (front end portion) on the +Y direction side of the pad pressing member 23e is wider than the base end portion in the X-axis direction.

A plurality of suction pads 23f are provided at the front end portion of the pad pressing member 23e. The surface of the adsorption pad 23f is an adsorption surface. The adsorption pad 23f is provided such that the adsorption surface abuts against the back surface of the substrate S, and the adsorption surface is brought into contact with the back surface of the substrate S to adsorb the substrate S. The adsorption amount of the adsorption pad 23f is set to be changeable, and the holding height of, for example, the substrate S can be adjusted by changing the adsorption amount. A material constituting the adsorption pad 23f, for example, a material such as SUS, a ceramic chuck, a rubber, an FRP, or a perfluoro-based elastomer. In the present embodiment, for example, three of the front end portions of the pad pressing member 23e are arranged in the X direction.

The shaft member 23g is supported by, for example, a side wall on the +X direction side of the attachment member 23d, and an actuator (not shown) is attached to the shaft member 23g, and the X-axis can be supported by the side wall by the actuator. Rotates as a rotation axis. As shown in Fig. 5(b), the front end portion of the pad pressing member 23e is circularly moved about the shaft member 23g by rotating the shaft member 23g. By the rotation of the shaft member 23g, the pad pressing member 23e can be moved in a direction different from the conveying direction (+X direction) of the substrate S.

The auxiliary mechanism 24 is attached to a mounting member 23d of each of the transport mechanisms 23 provided at the frame side portion 21d and the frame side portion 21c, and has a structure for pressing the surface of the substrate S. The auxiliary mechanism 24 has a structure that is line-symmetric with respect to the center of the table portion 22 in the Y direction, and has the same configuration except for the line symmetry. The auxiliary mechanism 24 provided to the frame side portion 21b will be described below by way of example.

The detailed structure of the assist mechanism 24 will be described with reference to Figs. 5(a) and 5(b).

The auxiliary mechanism 24 has a support member 24a, a spacer holding member 24b, a pressing pad 24c, a shaft member 24d, and a support plate 24e.

The support member 24a is a rod-shaped member having a predetermined length, and one end portion (base end portion) is supported by the shaft member 24d, and a pad holding member 24b is attached to the other end portion (front end portion). The pad holding member 24b has a rectangular shape as viewed in a plan view, and can independently rotate the Z-axis as a rotation axis with respect to the support member 24a.

The pressing pad 24c is placed on the surface of the pad holding member 24b on the -Z direction side. The -Z direction side of the pressing pad 24c is a flat surface, and the substrate S is pressed against the flat surface. The shape of the pressing pad 24c as viewed from a plan view is substantially the same shape as the suction pad 23f. The material constituting the pressing pad 24c is a material that does not damage the surface of the substrate S when the substrate S is pressed, or does not cause a sudden change in the surface temperature of the substrate S, for example, the same material or hardness as the substrate S is lower than the substrate S. The material is preferred.

The shaft member 24d is supported by the support plate 24e, and is attached to the attachment member 23d via the support plate 24e. An actuator (not shown) is attached to the shaft member 24d, and the actuator can rotate the Z axis as a center.

As shown in Fig. 5(a), the front end portion of the support member 24a is circularly moved around the shaft member 24d by rotating the shaft member 24d. The shaft member 24d is provided with a moving mechanism (not shown) that moves the support member 24a in the Z direction. With this moving mechanism, the support member 24a can be moved in the ±Z direction.

(coating section)

The structure of the coating unit 3 will be described with reference to Figs. 2 to 4 .

The coating portion 3 is a portion for applying a photoresist on the substrate S, and has a gate frame 31 and a nozzle 32.

The portal frame 31 has a pillar member 31a and a bridge member 31b that are disposed to cross the processing table 27 in the Y direction. Each of the pillar members 31a is provided on the Y-direction side of the processing table 27, and each pillar member 31a is supported by the frame side portion 21b and the frame side portion 21c. Each of the strut members 31a is disposed such that the height positions of the upper end portions thereof coincide. The bridging member 31b is bridged between the upper end portions of the respective strut members 31a, and is movable up and down with respect to the strut members 31a.

The portal frame 31 is coupled to the moving mechanism 34, and has a moving mechanism 34 having a frame member 35 and a drive mechanism 36. Further, for example, one rail member 35 is provided in each of the frame side portion 21b and the groove portion 21d of the frame side portion 21c, and each of them extends in the X direction. Each of the rail members 35 is provided to extend toward the -X direction side from the management portion 4, respectively. The drive mechanism 36 is an actuator that is coupled to the portal frame 31 and that moves the coating portion 3 along the rail member 35. The door frame 31 can also be moved in the Z direction by a moving mechanism (not shown).

The nozzle 32 is formed in an elongated shape in which one direction is a long axis, and is a surface provided on the -Z direction side of the bridge member 31b of the portal frame 31. In the tip end of the nozzle 32 in the -Z direction, a slit-shaped opening portion 32a is provided along the longitudinal direction of the nozzle 32, and the photoresist is discharged from the opening portion 32a. In the nozzle 32, the longitudinal direction of the opening 32a is parallel to the Y direction, and the opening 32a is disposed to face the processing table 27. The dimension of the opening portion 32a in the long-axis direction is smaller than the dimension of the substrate S in the Y direction, and the photoresist is not applied to the peripheral region of the substrate S. A flow path (not shown) through which the photoresist flows to the opening 32a is provided inside the nozzle 32. A photoresist supply source (not shown) is connected to the flow path. The photoresist supply source has, for example, a pump (not shown), and when the photoresist is pushed out to the opening 32a by the pump, the photoresist is discharged from the opening 32a. The strut member 31a is provided with a moving mechanism (not shown), and the moving mechanism allows the nozzle 32 held by the bridging member 31b to move in the Z direction. The nozzle 32 is provided with a moving mechanism (not shown), and the moving mechanism allows the nozzle 32 to move in the Z direction with respect to the bridging member 31b. Mounted under the bridging member 31b of the portal frame 31: a distance in the Z direction between the opening 32a of the nozzle 32, that is, the front end 32c of the nozzle 32 and the opposing surface facing the nozzle leading end 32c. The measured sensor 33. For example, three of the inductors 33 are disposed along the Y direction.

(Management)

The configuration of the management unit 4 will be described.

The management unit 4 is a portion for managing the nozzle 32 in order to limit the amount of discharge of the photoresist (liquid) discharged to the substrate S, and is provided in the substrate transport unit 2 with respect to the application unit. 3 - X direction side. The management unit 4 includes a preliminary discharge mechanism 41, a dipping tank 42, a nozzle cleaning device 43, an accommodating portion 44 for accommodating these structures, and a holding member 45 for holding the accommodating portion.

The preliminary discharge mechanism 41, the immersion tank 42, and the nozzle cleaning device 43 are arranged in the -X direction side in this order. The preliminary discharge mechanism 41 is a portion for preliminarily discharging the photoresist, and the preliminary discharge mechanism 41 is placed at the position closest to the nozzle 32 in a state where the application portion 3 is placed on the coating treatment region 27S, and is immersed. The tank 42 is a liquid tank in which a solvent such as a diluent is stored. The nozzle cleaning device 43 is a device for flushing the vicinity of the opening 32a of the nozzle 32, and includes a cleaning mechanism (not shown) that moves in the Y direction, and a cleaning mechanism that moves the cleaning mechanism. Mobile agency. The moving mechanism is disposed closer to the -X direction side than the cleaning mechanism. The nozzle cleaning device 43 has a larger dimension in the X direction than the preliminary discharge mechanism 41 and the immersion tank 42 by the portion in which the moving mechanism is provided. The arrangement of the preliminary discharge mechanism 41, the immersion tank 42, and the nozzle cleaning device 43 is not limited to the arrangement of the present embodiment, and other arrangements may be used.

The dimension of the accommodating portion 44 in the Y direction is smaller than the distance between the pillar members 31a of the door frame 31, and the door frame 31 can move in the X direction beyond the accommodating portion 44. The door frame 31 is capable of being received across the respective portions of the preliminary discharge mechanism 41, the immersion tank 42, and the nozzle cleaning device 43 provided in the accommodating portion 44.

The holding member 45 is connected to the management unit moving mechanism 46. The management unit moving mechanism 46 has a rail member 47 and a drive mechanism 48. The rail members 47 are respectively provided in the frame side portion 21b and the groove portion 21e of the frame side portion 21c, and respectively extend in the X direction. Each of the rail members 47 is disposed between the rail members 35 connected to the portal frame 31 of the coating unit 3. The end portion of each of the rail members 47 in the -X direction is provided, for example, to the end portion of the frame side portion 21b and the frame side portion 21c in the -X direction. The drive mechanism 48 is an actuator that is connected to the holding member 45 to move the management unit 4 along the rail member 47.

(coating action)

Next, the operation of the coating apparatus 1 having the above configuration will be described.

Fig. 6 is a plan view showing the operation of the coating device 1. The operation of applying the photoresist R to the substrate S will be described with reference to the respective drawings. In this operation, the substrate S is carried into the substrate loading region 25S so that the short axis direction is parallel to the conveyance direction, the substrate S is floated and transported, and the photoresist is applied to the coating treatment region 27S. The substrate S to which the photoresist has been applied is carried out from the substrate carry-out area 28S. The illustration of the management unit 4 is omitted in Fig. 6, and the structure of the loading side table 25 is easily determined. The structure of the nozzle 32 and the inductor 33 is easily judged by displaying the door frame 31 in a broken line. The detailed operation of each part will be described below.

The coating device 1 is placed on standby before the substrate is carried into the substrate carrying-in region 25S. Specifically, the transporter 23a is disposed on the -Y direction side of the substrate loading position 25L of the loading side table 25, and the height position of the suction pad 23f is positioned at the floating height position of the substrate S, and the air is carried from the loading side table 25. The ejection hole 25a, the air ejection hole 27a of the processing table 27, the air suction hole 27b, and the air ejection hole 28a of the delivery side table 28 respectively eject or attract air, and supply air to the surface of the table portion 22 so as to float on the surface of the table portion 22. The state of the degree.

In this state, as shown in FIG. 6, when the substrate S is transported to the substrate loading position 25L from the outside, the lifting member 26a is moved in the +Z direction, and the lift pin 26b is lifted, for example, as shown in FIG. The lifting pin exit hole 25b protrudes from the table surface 25c. By the operation of the elevating member 26a, the lift pin 26b lifts the substrate S and performs the transfer operation of the substrate S. On the other hand, the long hole from the aligning device 25d causes the positioning member to protrude from the table surface 25c.

After receiving the substrate S, the elevating member 26a is lowered to accommodate the lift pin 26b in the lift pin exit hole 25b. At this time, since the air layer is formed on the stage surface 25c, the substrate S is held in a state of being floated with respect to the table surface 25c by the air. When the substrate S reaches the surface of the air layer, the positioning of the substrate S is performed by the positioning member of the calibration device 25d. After the positioning, each of the suction pads 23f disposed on the -Y direction side of the substrate loading position is adsorbed on the back surface of the substrate S, and the substrate S is pressed in the -Z direction by the pressing pad 24c.

When the suction pad 23f is attracted to the substrate S, the shaft member 23g is rotated so that the tip end portion of the pad pressing member 23e and the suction pad 23f approach the substrate S. By the rotation of the shaft member 23g, the suction pad 23f is circularly moved around the shaft member 23g, and abuts against the back surface of the substrate S. Once the suction pad 23f is brought into contact with the back surface of the substrate S, the adsorption amount of the adsorption pad 23f is adjusted while the substrate S is adsorbed. In a state (holding state) in which the suction pad 23f is adsorbed on the back surface of the substrate S, the substrate holding portion 23b is placed at the holding position 23P shown in FIGS. 5(a) and 5(b).

When the substrate S is pressed by the pressing pad 24c, the rotating shaft member 24d is disposed such that the pressing pad 24c is disposed so as to be superimposed on the three adsorption pads 23f from the top view direction, for example, the adsorption pad 23f disposed in the center in the X direction. s position. The pad holding member 24b is rotated such that the long axis direction of the pad holding member 24b coincides with the long axis direction of the substrate S.

In this state, the assist mechanism 24 is placed at the rising position 24R shown in Fig. 5(b). Then, the support member 24a is moved in the -Z direction so that the pressing pad 24c abuts against the substrate S, and the substrate S is pressed. The auxiliary mechanism 24 is placed at the pressing position 24P shown in FIGS. 5(a) and 5(b) in a state where the substrate S is pressed by the pressing pad 24c.

The back surface of the substrate S is adsorbed by the suction pad 23f, and after the surface of the substrate S is pressed by the pressing pad 24c, the carrier 23a is moved along the rail 23c. Then, the substrate S starts moving in the +X direction in accordance with the movement of the conveyor 23a. When the substrate S starts moving, a force in a direction opposite to the moving direction acts on the substrate S, so the substrate S is in a state where the position is easily shifted. On the other hand, in the present embodiment, the substrate S is adsorbed by the suction pad 23f, and the substrate S is pressed by the pressing pad 24c. Therefore, even when force is applied to the substrate S, the position is not easily shifted when the movement starts.

After the substrate S starts moving, for example, after the moving speed of the substrate S is substantially constant, the pressing of the substrate S by the pressing pad 24c is released. Specifically, the support member 24a is moved in the +Z direction so that the pressing pad 24c is separated from the substrate S. The state in which the support member 24a is moved in the +Z direction is placed in the raised position 24R as shown in Fig. 5(b). After the pressing pad 24c is separated from the substrate S, the shaft member 24d is rotated to dispose the pad holding member 24b in the mounting member 23d. While the pad holding member 24b is rotated, the position is adjusted so that the pad holding member 24b is housed in the frame of the attachment member 23d. In the state (retracted state) in which the pad holding member 24b is housed in the frame of the attachment member 23d, the assist mechanism 24 is disposed at the retracted position 24Q shown in Fig. 5(a). The shaft member 24d and an actuator (not shown) function as a retracting mechanism for retracting the assist mechanism 24. These operations are performed while the substrate S is being transported by the transporter 23a.

When the leading end of the substrate S in the conveyance direction reaches the position of the opening 32a of the nozzle 32, as shown in Fig. 6, the photoresist is discharged from the opening 32a of the nozzle 32 toward the substrate S. The discharge operation of the photoresist is performed by fixing the position of the nozzle 32 and transporting the substrate S by the transporter 23a. As the substrate S moves, the photoresist film R is applied onto the substrate S as shown in FIG. The resist film R is formed in a predetermined region of the substrate S by passing the substrate S through the lower surface of the opening 32a of the photoresist.

The substrate S on which the photoresist film R is formed is conveyed toward the carry-out side table 28 by the transporter 23a. The substrate S is transported to the substrate carry-out position 28U as shown in FIG. 6 in a state in which the carry-out side table 28 is floated on the table surface 28c.

When the substrate S reaches the substrate carry-out position 28U, the holding state of the suction pad 23f is released. Specifically, the shaft member 23g is rotated in the opposite direction such that the tip end portion of the pad pressing member 23e and the suction pad 23f are separated from the substrate S. By the rotation of the shaft member 23g, the pad pressing member 23e and the suction pad 23f are accommodated in a state (retracted state) in a position that is not exposed in the +Y direction with respect to the attachment member 23d. In the retracted state of the substrate holding portion 23b, the substrate holding portion 23b is disposed at the retracted position 23Q shown in FIGS. 5(a) and 5(b). The shaft member 23g and an actuator (not shown) function as a retracting mechanism for retracting the substrate holding portion 23b.

After the substrate holding portion 23b is brought into the retracted state, the elevating member 29a of the elevating mechanism 29 is moved in the +Z direction. By the movement of the elevating member 29a, the lift pin 29b protrudes from the lift pin exit hole 28b toward the back surface of the substrate S, and the substrate S is lifted by the lift pin 29b. In this state, for example, an external transfer arm provided at the +X direction side of the carry-out side stand 28 is connected to the carry-out side stand 28 to receive the substrate S. After the substrate S is transferred to the transport arm, the transporter 23a is returned to the substrate loading position 25L of the loading side table 25, and stands by until the next substrate S is to be transported.

At this time, since the substrate holding portion 23b is in the retracted state, the conveyance mechanism 23 is moved in a state where the pad pressing member 23e or the suction pad 23f is not exposed in the +Y direction with respect to the attachment member 23d. Therefore, the pad pressing member 23e or the suction pad 23f does not collide or come into contact with other component members or the like of the coating device 1, and the conveying mechanism 23 returns to the substrate loading position 25L.

When the lower substrate S is transported, the substrate S is held by the transport mechanism 23 provided on the frame side portion 21c, for example. While the next substrate S has not yet been transported, the application portion 3 performs a preliminary discharge operation for holding the discharge state of the nozzles 32. As shown in Fig. 7, the door frame 31 is moved to the position of the management unit 4 in the -X direction by the rail member 35.

After the door frame 31 is moved to the position of the management unit 4, the position of the door frame 31 is adjusted to connect the front end of the nozzle 32 to the nozzle cleaning device 43, and the nozzle cleaning device 43 is used to clean the nozzle front end 32c. .

After the nozzle tip end 32c is washed, the nozzle 32 is connected to the preliminary discharge mechanism 41. In the preliminary discharge mechanism 41, the opening 32a of the tip end of the nozzle 32 is moved to a predetermined position in the Z direction while the distance between the opening 32a and the preliminary discharge surface is measured, and the nozzle 32 is oriented in the -X direction. When moving, the photoresist is prepared to be discharged from the opening 32a.

After the preliminary discharge operation, the portal frame 31 is returned to the original position. When the next substrate S is to be transported by the transport mechanism 23 provided on the frame side portion 21c, the nozzle 32 is moved to a predetermined position in the Z direction. By applying the coating operation of the photoresist film R and the preliminary discharge operation to the substrate S, a high-quality photoresist film R is formed on the substrate S.

Alternatively, if necessary, for example, after reaching the management unit 4 every predetermined number of times, the nozzle 32 is connected to the dipping tank 42. In the immersion tank 42, the nozzle 32 is prevented from drying by exposing the opening 32a of the nozzle 32 to the vapor atmosphere of the solvent (diluent) stored in the immersion tank 42.

According to the present embodiment, the transport mechanism 23 that holds the substrate holding portion 23b of the substrate S and transports the substrate S in the state in which the substrate S is held is provided in the substrate transport unit 2, and the substrate S is pressed against the holding portion. Since the auxiliary mechanism 24 is provided, the substrate S can be held by the auxiliary mechanism 24 in addition to the substrate holding portion 23b of the transport mechanism 23. Therefore, the substrate S can be held more firmly, whereby the offset of the substrate S can be suppressed. Further, it is possible to prevent the poor coating from being caused by the offset of the substrate S, and it is possible to keep the stage portion 22 of the substrate carrying portion 2 clean.

In the present embodiment, when the substrate S is sucked and held by the suction pad 23f of the substrate conveying portion 23b, the auxiliary mechanism 24 is pressed against the substrate S, so that the suction of the suction pad 23f can be made more reliable. Since the substrate S is firmly held, the offset of the holding position of the substrate S can be more surely prevented.

According to the present embodiment, since the auxiliary mechanism 24 is provided to be movable in the conveyance direction of the substrate S, the auxiliary mechanism 24 can be moved in accordance with the movement of the substrate S.

In the present embodiment, since the auxiliary mechanism 24 is mounted on the attachment member 23d of the transport mechanism 23, the transport mechanism 23 and the auxiliary mechanism 24 can be integrally moved. Thereby, since the moving speed of the conveyance mechanism 23 and the moving speed of the auxiliary mechanism 24 are not adjusted, the positional displacement of both mechanisms can be prevented, and it is more easy to achieve stable holding of the board|substrate S.

According to the present embodiment, since the auxiliary mechanism 24 has the shaft member 24d as the retracting mechanism, when other components or the like are provided on the movement route, for example, other constituent members can be avoided. Thereby, collision or contact between the auxiliary mechanism 24 and the constituent member can be avoided, and the disadvantages of damage, malfunction, and the like of the coating device 1 can be avoided.

According to the present embodiment, the transport mechanism 23 for transporting the substrate S is provided to be movable in the transport direction of the substrate S, and the substrate holding portion 23b provided in the transport mechanism 23 is provided to be movable in a direction opposite to the transport direction, so that even In the case where the other component members are provided in the moving region of the substrate holding portion 23b in the conveyance direction, the constituent members can be avoided. Thereby, disadvantages such as damage, failure, and the like of the constituent members of the coating device 1 can be avoided.

[Second Embodiment]

Next, a second embodiment of the present invention will be described.

Similarly to the first embodiment, in the following drawings, since the size of each member can be recognized, the size ratio is appropriately changed. The same constituent elements as those of the first embodiment are denoted by the same reference numerals, and their description will be omitted. In the present embodiment, the configuration of the auxiliary mechanism is different from that of the first embodiment, and this point will be mainly described.

Fig. 8(a) is a side view showing a partial structure of the coating device 101 of the present embodiment, and Fig. 8(b) is a plan view showing a partial structure of the coating device 101.

As shown in FIGS. 8( a ) and 8 ( b ), the coating device 101 of the present embodiment does not have the structure in which the auxiliary mechanism 124 contacts the substrate S and presses the substrate S, and the gas is ejected from the substrate S. The substrate S is pressed in a non-contact manner.

Specifically, the auxiliary mechanism 124 is connected to, for example, a gas supply unit (not shown), and is provided in plural along the side edge portion Sa of the substrate S. The auxiliary mechanism 124 is not mounted on the transport mechanism 23 and is provided separately from the transport mechanism 23. The auxiliary mechanism 124 is provided with a gas discharge port 124a. The gas discharge port 124a is disposed on the surface side of the substrate S so as to face the side edge portion Sa. Other configurations are the same as those of the first embodiment.

In the above-described configuration, the gas is supplied from the gas discharge port 124a by driving the gas supply unit connected to the auxiliary unit 124, and the gas is ejected onto the surface (surface) on the +Z direction side of the substrate S. The substrate S is pressed toward the -Z direction side by the ejection of the gas. The surface (back surface) on the -Z direction side of the substrate S is supported by the substrate holding portion 23b of the transport mechanism 23, and the substrate S is pressed toward the substrate holding portion 23b by the negative pressure of the gas.

According to the present embodiment, the auxiliary mechanism 124 has the gas discharge port 124a that ejects the gas to the substrate S, and the substrate S is pressed in a non-contact manner by the gas ejection, so that the contact with the substrate S can be reduced. Thereby, it is possible to prevent the deformation of the substrate S or the occurrence of scratches.

According to the present embodiment, since the plurality of gas discharge ports 124a are provided in the conveyance direction of the substrate S, the substrate S can be pressed in a non-contact manner at a desired position on the movement path of the conveyance substrate S. Thereby, the substrate S can be held more stably.

It is also possible to provide the auxiliary mechanism 124 so as to be movable in the conveyance direction of the substrate S. By making the moving mechanism 124 movable, even if the number of the auxiliary mechanisms 124 is not singular, for example, the substrate S can be pressed toward the substrate holding portion 23b at a desired timing during the conveyance of the substrate S.

[Third embodiment]

Next, a third embodiment of the present invention will be described.

Similarly to the first embodiment, in the following drawings, since the size of each member can be recognized, the size ratio is appropriately changed. The same constituent elements as those of the first embodiment are denoted by the same reference numerals, and their description will be omitted. In the present embodiment, the configuration of the auxiliary mechanism is different from that of the first embodiment, and this point will be mainly described.

Fig. 9(a) is a side view showing a partial structure of the coating device 201 of the present embodiment, and Fig. 9(b) is a plan view showing a partial structure of the coating device 201.

As shown in FIGS. 9( a ) and 9 ( b ), the coating device 201 of the present embodiment does not have the structure in which the auxiliary mechanism 124 contacts the substrate S and presses the substrate S, and the back side of the substrate S is attracted. The space (on the side of the stage portion 22) attracts the structure of the substrate S in a non-contact manner. When the substrate S is sucked toward the table portion 22 side, the substrate S is pressed toward the substrate holding portion 23b for holding the back surface side of the substrate S.

The auxiliary mechanism 224 is not mounted on the transport mechanism 23 and is provided separately from the transport mechanism 23 . The auxiliary mechanism 224 is a suction mechanism (not shown) connected to, for example, a pump, and is provided in plural along the side edge portion Sa of the substrate S. A suction port 224a is provided in the auxiliary mechanism 224. The suction port 224a is disposed on the back side of the substrate S so as to face the side edge portion Sa, and is provided at an interval from the substrate S. Other configurations are the same as those of the first embodiment.

In the above configuration, the suction mechanism connected to the assist mechanism 224 is driven, and the space on the -Z direction side of the substrate S is sucked by the suction port 224a. The substrate S is attracted to the -Z direction side by the attraction force. By holding the surface (back surface) on the -Z direction side of the substrate S by the substrate holding portion 23b of the transport mechanism 23, and sucking the substrate S by the suction force, the substrate S is pressed toward the substrate holding portion 23b side.

According to the present embodiment, the auxiliary mechanism 224 sucks the same surface of the substrate S as the face (back surface) held by the transport mechanism 23, so that the space can be secured on the face opposite to the face on which the substrate S is held.

In the present embodiment, the suction port 224a of the auxiliary mechanism 224 may be provided with an adsorption port, and the adsorption portion may be brought into contact with the back surface of the substrate S to perform suction. In this case, as a constituent material of the adsorption portion that is in contact with the substrate S, it is preferable to use a material capable of holding the substrate S (temperature, presence or absence of scratches, etc.), for example, a material exemplified in the first embodiment.

It is also possible to provide the auxiliary mechanism 224 so as to be movable along the conveyance direction of the substrate S. By making the moving mechanism 224 movable, even if the number of the auxiliary mechanisms 224 is not singular, for example, the substrate S can be pressed toward the substrate holding portion 23b at a desired timing during the conveyance of the substrate S.

The technical scope of the present invention is not limited to the above-described embodiments, and can be appropriately modified without departing from the scope of the present invention.

For example, in the first embodiment described above, the structure in which the auxiliary mechanism 24 is mounted on the attachment member 23d of the transport mechanism 23 is not limited thereto, and the auxiliary mechanism 24 may be provided independently of the transport mechanism 23. In this case, the assist mechanism 24 can also be moved in accordance with the movement of the transport mechanism 23.

The auxiliary mechanism 24 is not limited to being movable in accordance with the movement of the transport mechanism 23. For example, the auxiliary mechanism 24 may be fixed without being moved. For example, it may be fixed between the table portion 22 and the frame side portion 21b, or between the table portion 22 and the frame side portion 21c. The table portion 22 can be applied not only to the loading side table 25 but also to the processing table 27 or the unloading side table 28.

In the above-described embodiment, the substrate S is pressed by the auxiliary mechanism 24 to the substrate holding portion 23b when the substrate S starts to be transported, and the substrate S is not limited thereto. For example, the substrate S may be turned toward when the substrate S is transported. The substrate holding portion 23b is pressed. When the substrate S is conveyed, that is, when the movement of the substrate S is stopped, a force is applied to the moving direction of the substrate S. It is also considered that if the holding position of the substrate S is shifted by this force, the substrate S may be prevented from being carried out. On the other hand, when the conveyance of the substrate S is completed, the substrate S is pressed by the assist mechanism 24, and by suppressing the shift of the holding position of the substrate S, it is advantageous in that the substrate S can be smoothly carried out.

In the conveyance of the substrate S, for example, the timing of moving from the loading side table 25 toward the processing table 27 or the timing of moving from the processing table 27 to the carry-out side table 28, etc., the movement speed may be changed by the assist each time. The mechanism 24 presses the substrate S. Thereby, the offset of the holding position of the substrate S can be more reliably suppressed.

As a timing at which the auxiliary mechanism 24 presses the substrate S, for example, the substrate S may be transported while the substrate S is always pressed by the auxiliary mechanism 24. Thereby, the offset of the holding position of the substrate S can be more reliably prevented.

After the substrate S is carried in, the substrate S is pressed by the assist mechanism 24, and the pressing may be released before the substrate S is transported. For example, in the above-described embodiment, when the substrate S is pressed and held by the suction pad 23f, the auxiliary mechanism 24 presses the substrate S, whereby the adsorption by the suction pad 23f can be ensured, and the holding can be more firmly maintained. Substrate S.

It is also possible to release the pressing of the substrate S during the conveyance of the substrate S. Thereby, the shift of the holding position of the substrate S can be prevented, and the conveyance control of the substrate S can be easily performed.

It is also possible to release the pressing before the application of the photoresist R. Thereby, the displacement of the holding position of the substrate S can be avoided, and the control of the substrate conveyance at the time of coating can be easily performed.

In each of the above embodiments, the retracting mechanism (for example, the shaft member 23g) and the assisting mechanism 24 having the transport mechanism 23 in common are provided, and the retracting mechanism and the assisting mechanism 24 have an independent effect. Therefore, as long as the structure of one of the retracting mechanism and the auxiliary mechanism 24 of the transport mechanism 3 is provided, the effect corresponding to one of the above embodiments can be obtained.

In the above-described embodiment, the transport mechanism 23 is disposed on both sides of the frame side portion 21b and the frame side portion 21c, and is not limited thereto, and may be disposed only on one of the frame side portion 21b and the frame side portion 21c, for example. Agency 23.

In the above-described embodiment, the coating device 1 that transports the substrate S and transports it is exemplified, and the retracting mechanism including the transport mechanism 23 is not limited thereto, and the coating is carried out by applying the substrate. The cloth device can also be applied to a coating device other than the floating transport type, for example, a coating device that transports a substrate by a transport mechanism such as a transport roller.

In each of the above-described embodiments, the substrate holding portion 23b of the transport mechanism 23 is rotated around the center of the shaft member 23g, and the suction pad 23f is brought into contact with the substrate S. The present invention is not limited thereto, and the substrate holding portion 23b may be, for example, Z. The axial direction is raised and lowered to contact the adsorption pad 23f.

S. . . Substrate

Sa. . . Side edge

R. . . Photoresist

1, 101, 201. . . Coating device

2. . . Substrate handling unit

3. . . Coating department

twenty two. . . Taiwan Department

twenty three. . . Transport mechanism

23b. . . Substrate holding unit

23P. . . Hold position

23Q. . . Retreat position

24, 124, 224. . . Auxiliary institution

24a. . . Support member

24b. . . Pad retaining member

24c. . . Press pad

24d. . . Shaft member

24e. . . Support plate

24R. . . Rising position

24P. . . Press position

24Q. . . Retreat position

124a. . . Gas outlet

Fig. 1 is a perspective view showing the structure of a coating apparatus according to a first embodiment of the present invention.

Fig. 2 is a front elevational view showing the structure of the coating device of the present embodiment.

Fig. 3 is a plan view showing the structure of the coating device of the embodiment.

Fig. 4 is a side view showing the structure of the coating device of the embodiment.

Fig. 5 is a view showing the structure of a transport mechanism of the coating device of the present embodiment.

Fig. 6 is a view showing the operation of the coating device of the embodiment.

Fig. 7 is a view showing the operation of the coating device of the present embodiment.

Fig. 8 is a view showing a partial structure of a coating device according to a second embodiment of the present invention.

Fig. 9 is a view showing a partial structure of a coating device according to a third embodiment of the present invention.

Claims (25)

A coating apparatus including a substrate conveying unit that transports a substrate and transports the substrate, and a coating unit that applies a liquid to the substrate while being conveyed by the substrate conveying unit. The coating device is provided with a holding unit that holds the substrate, and a transport mechanism that transports the substrate while holding the substrate, and presses the substrate to the holding Auxiliary agency of the Ministry. The coating apparatus according to claim 1, wherein the transporting means holds one of the substrates along a direction in which the substrate is conveyed. A coating apparatus according to claim 1, wherein the auxiliary mechanism is provided at a conveyance start position of the substrate. The coating apparatus according to claim 1, wherein the auxiliary mechanism is provided to be movable in a conveyance direction of the substrate. A coating apparatus according to claim 4, wherein the auxiliary mechanism is mounted on the transport mechanism. The coating device of claim 4, wherein the auxiliary mechanism has a retracting mechanism. The coating apparatus according to claim 1, wherein the auxiliary mechanism presses a surface of the substrate different from a surface held by the transport mechanism. The coating device according to claim 6, wherein the auxiliary mechanism includes a pressing portion that presses the substrate, and the pressing portion is made of a material that can hold a pressing surface of the substrate. The coating device according to claim 7, wherein the auxiliary mechanism presses a position overlapping the holding portion as viewed in a plan view. The coating apparatus according to claim 1, wherein the auxiliary mechanism has a gas ejecting portion that ejects a gas toward the substrate, and the substrate is pressed in a non-contact manner by the ejecting of the gas. The coating apparatus according to claim 10, wherein the gas ejecting portion is provided in plural in a conveying direction of the substrate. The coating device according to claim 1, wherein the auxiliary mechanism sucks a face other than a face held by the transport mechanism among the substrates. The coating device according to claim 12, wherein the auxiliary mechanism has a suction portion that contacts the substrate and attracts the suction portion, and the suction portion is a material that can hold the suction surface of the substrate. Composition. The coating device according to claim 12, wherein the auxiliary mechanism has an adsorption portion that is adsorbed on the substrate. The coating apparatus according to claim 12, wherein the auxiliary mechanism has a gas suction portion that sucks a gas between the substrate and the substrate, and attracts the substrate in a non-contact manner by suction of the gas. . The coating device according to the first aspect of the invention, wherein at least one of an upstream side and a downstream side of the coating portion is provided with a table portion provided with a floating mechanism for floating the substrate, wherein the table is provided The portion has a substantially square shape as viewed from a plan view. A coating method is a method of applying a coating liquid to a substrate while the substrate is floated and transported, and is characterized by a holding portion of a transport mechanism that transports the substrate. The substrate is held, and the substrate held by the holding portion is pressed toward the holding portion, and the liquid substrate is applied while the substrate is held while the substrate is held. The coating method of claim 17, wherein the substrate is conveyed while the substrate is pressed. The coating method according to claim 17, wherein the pressing of the substrate toward the holding portion is released before the substrate is conveyed. The coating method according to claim 19, wherein when the substrate is conveyed, the pressing of the substrate toward the holding portion is released. The coating method according to claim 20, wherein the pressing of the substrate toward the holding portion is released before the application of the liquid material. A coating apparatus includes a substrate conveying unit that conveys a substrate, and a coating unit that applies a liquid material to the coating unit of the substrate while being conveyed by the substrate conveying unit. A transport mechanism provided in the substrate transport unit and having a holding portion for holding the substrate and transporting the substrate while holding the substrate; the transport mechanism being provided to the substrate The conveyance direction moves, and the holding portion is provided to be movable in a direction different from the conveyance direction. The coating apparatus according to claim 22, wherein the substrate conveying unit includes a floating mechanism that floats the substrate. The coating device according to claim 22, wherein the holding portion includes a retracting mechanism that returns to the substrate conveying portion in a retracted state after the substrate is conveyed. The coating apparatus according to claim 22, wherein at least one of an upstream side and a downstream side of the coating portion is provided with a table portion including a floating mechanism for floating the substrate, and the table portion It has a substantially square shape as seen from a plan view.