TW200715043A - Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks - Google Patents

Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks

Info

Publication number
TW200715043A
TW200715043A TW095125942A TW95125942A TW200715043A TW 200715043 A TW200715043 A TW 200715043A TW 095125942 A TW095125942 A TW 095125942A TW 95125942 A TW95125942 A TW 95125942A TW 200715043 A TW200715043 A TW 200715043A
Authority
TW
Taiwan
Prior art keywords
light
blanks
semi
etching
gray tone
Prior art date
Application number
TW095125942A
Other languages
English (en)
Inventor
Fumihiko Yamada
Toshiharu Ozaki
Takaei Sasaki
Original Assignee
Ulvac Coating Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Coating Corp filed Critical Ulvac Coating Corp
Publication of TW200715043A publication Critical patent/TW200715043A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Liquid Crystal (AREA)
  • ing And Chemical Polishing (AREA)
  • Weting (AREA)
TW095125942A 2005-07-15 2006-07-14 Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks TW200715043A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005207293 2005-07-15

Publications (1)

Publication Number Publication Date
TW200715043A true TW200715043A (en) 2007-04-16

Family

ID=37668747

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095125942A TW200715043A (en) 2005-07-15 2006-07-14 Blanks for gray tone mask, gray tone mask using said blanks, and process for producing said blanks

Country Status (5)

Country Link
JP (1) JP4898680B2 (zh)
KR (1) KR20080018263A (zh)
CN (1) CN101061430A (zh)
TW (1) TW200715043A (zh)
WO (1) WO2007010866A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5105407B2 (ja) * 2007-03-30 2012-12-26 Ｈｏｙａ株式会社 フォトマスクブランク、フォトマスク及びフォトマスクの製造方法
CN101438386B (zh) 2007-05-11 2012-03-07 Lg伊诺特有限公司 有多个半透过部分的半色调掩模及其制造方法
JP4934236B2 (ja) * 2007-09-29 2012-05-16 Ｈｏｙａ株式会社 グレートーンマスクブランク、グレートーンマスクの製造方法及びグレートーンマスク、並びにパターン転写方法
JP5531702B2 (ja) * 2010-03-23 2014-06-25 旭硝子株式会社 遮光膜付ガラス基板および液晶表示装置
JP2014523633A (ja) * 2011-05-27 2014-09-11 エムシー１０ インコーポレイテッド 電子的、光学的、且つ／又は機械的装置及びシステム並びにこれらの装置及びシステムを製造する方法
CN102569038A (zh) * 2011-12-29 2012-07-11 映瑞光电科技(上海)有限公司 图形化衬底的制作方法
CN108630788A (zh) * 2018-03-15 2018-10-09 华灿光电（浙江）有限公司 一种发光二极管的芯片的修复方法
FR3081721B1 (fr) * 2018-06-01 2022-04-15 Arkema France Procede de preparation d'un sel de lithium de bis(fluorosulfonyl)imide

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52136526A (en) * 1976-05-10 1977-11-15 Akai Electric Method of forming twoocolor stripe filter
JPS5779174A (en) * 1980-11-06 1982-05-18 Konishiroku Photo Ind Co Ltd Etching solution for chromium film and chromium oxide film
JP3453435B2 (ja) * 1993-10-08 2003-10-06 大日本印刷株式会社 位相シフトマスクおよびその製造方法
JP3250973B2 (ja) * 1997-06-27 2002-01-28 ホーヤ株式会社 ハーフトーン型位相シフトマスクブランク及びハーフトーン型位相シフトマスク
JP4071849B2 (ja) * 1997-10-08 2008-04-02 アルバック成膜株式会社 ブランクス及びブラックマトリクス
JPH11223931A (ja) * 1998-02-04 1999-08-17 Hoya Corp 位相シフトマスク及び位相シフトマスクブランク
JP2002189281A (ja) * 2000-12-19 2002-07-05 Hoya Corp グレートーンマスク及びその製造方法
JP3645882B2 (ja) * 2002-03-01 2005-05-11 Ｈｏｙａ株式会社 ハーフトーン型位相シフトマスクブランクの製造方法
JP4210166B2 (ja) * 2003-06-30 2009-01-14 Ｈｏｙａ株式会社 グレートーンマスクの製造方法
US7029803B2 (en) * 2003-09-05 2006-04-18 Schott Ag Attenuating phase shift mask blank and photomask
JP4385690B2 (ja) * 2003-09-09 2009-12-16 凸版印刷株式会社 液晶表示素子製造用露光マスク及びその製造方法
JP2005208660A (ja) * 2004-01-22 2005-08-04 Schott Ag 超高透過率の位相シフト型のマスクブランク

Also Published As

Publication number Publication date
JPWO2007010866A1 (ja) 2009-01-29
CN101061430A (zh) 2007-10-24
KR20080018263A (ko) 2008-02-27
JP4898680B2 (ja) 2012-03-21
WO2007010866A1 (ja) 2007-01-25

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