TW200628989A - Pattern-forming material and pattern-forming method - Google Patents

Pattern-forming material and pattern-forming method

Info

Publication number
TW200628989A
TW200628989A TW094141994A TW94141994A TW200628989A TW 200628989 A TW200628989 A TW 200628989A TW 094141994 A TW094141994 A TW 094141994A TW 94141994 A TW94141994 A TW 94141994A TW 200628989 A TW200628989 A TW 200628989A
Authority
TW
Taiwan
Prior art keywords
pattern
light
forming material
forming
diffusion
Prior art date
Application number
TW094141994A
Other languages
English (en)
Chinese (zh)
Inventor
Shinichiro Serizawa
Yoshiharu Sasaki
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of TW200628989A publication Critical patent/TW200628989A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
TW094141994A 2004-12-01 2005-11-30 Pattern-forming material and pattern-forming method TW200628989A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004348428A JP2006154622A (ja) 2004-12-01 2004-12-01 パターン形成材料及びパターン形成方法

Publications (1)

Publication Number Publication Date
TW200628989A true TW200628989A (en) 2006-08-16

Family

ID=36564968

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094141994A TW200628989A (en) 2004-12-01 2005-11-30 Pattern-forming material and pattern-forming method

Country Status (3)

Country Link
JP (1) JP2006154622A (ja)
TW (1) TW200628989A (ja)
WO (1) WO2006059534A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110284139A (zh) * 2018-03-19 2019-09-27 三星显示有限公司 蚀刻剂组合物和使用其制造金属图案和阵列基板的方法

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4993458B2 (ja) * 2006-12-04 2012-08-08 旭化成イーマテリアルズ株式会社 感光性樹脂組成物及びその用途
EP2096493A4 (en) * 2006-12-19 2010-11-17 Hitachi Chemical Co Ltd PHOTOSENSITIVE ELEMENT
US8092980B2 (en) 2007-01-31 2012-01-10 Hitachi Chemical Company, Ltd. Photosensitive element
KR101734425B1 (ko) * 2013-09-24 2017-05-11 주식회사 엘지화학 드라이 필름 솔더 레지스트의 제조 방법과, 이에 사용되는 필름 적층체
KR20220130832A (ko) * 2014-04-25 2022-09-27 쇼와덴코머티리얼즈가부시끼가이샤 감광성 엘리먼트, 적층체, 영구 마스크 레지스터 및 그 제조 방법 및 반도체 패키지의 제조 방법
JP6227617B2 (ja) * 2014-06-30 2017-11-08 太陽インキ製造株式会社 感光性ドライフィルムおよびそれを用いたプリント配線板の製造方法
JP5882510B2 (ja) * 2014-06-30 2016-03-09 太陽インキ製造株式会社 感光性ドライフィルムおよびそれを用いたプリント配線板の製造方法
JP2016086000A (ja) * 2014-10-22 2016-05-19 太陽インキ製造株式会社 ドライフィルムおよびプリント配線板
JP6299940B1 (ja) * 2017-03-31 2018-03-28 日立化成株式会社 感光性エレメント及び感光性エレメントロール
WO2018179367A1 (ja) * 2017-03-31 2018-10-04 日立化成株式会社 感光性エレメント
JP7040137B2 (ja) * 2018-03-06 2022-03-23 東レ株式会社 ドライフィルムレジスト支持体用二軸配向ポリエステルフィルム

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JPS62139547A (ja) * 1985-12-13 1987-06-23 Daicel Chem Ind Ltd 帯電防止性を有する感光積層体
JP2697176B2 (ja) * 1989-08-28 1998-01-14 ダイアホイルヘキスト株式会社 ドライフィルム用二軸配向ポリエステルフィルム
JPH06130657A (ja) * 1991-08-20 1994-05-13 Mitsubishi Rayon Co Ltd ドライフィルムレジスト
JP3789144B2 (ja) * 1994-06-14 2006-06-21 三菱化学ポリエステルフィルム株式会社 フォトレジスト用積層ポリエステルフィルム
JPH1039504A (ja) * 1996-07-24 1998-02-13 Nitto Chem Ind Co Ltd ドライフィルムレジスト
JP3820101B2 (ja) * 2000-12-14 2006-09-13 帝人株式会社 二軸配向積層ポリエステルフィルム
JP2004106322A (ja) * 2002-09-18 2004-04-08 Toray Ind Inc ドライフィルムフォトレジスト用積層ポリエステルフィルム
JP4096682B2 (ja) * 2002-10-04 2008-06-04 三菱化学株式会社 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、画像形成材、及び画像形成方法
JP4305732B2 (ja) * 2003-04-17 2009-07-29 日立化成工業株式会社 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造方法及びプリント配線板の製造方法
JP2004325596A (ja) * 2003-04-22 2004-11-18 Fuji Photo Film Co Ltd ドライフィルムフォトレジスト
JP2004335639A (ja) * 2003-05-06 2004-11-25 Fuji Photo Film Co Ltd 投影露光装置
JP4244156B2 (ja) * 2003-05-07 2009-03-25 富士フイルム株式会社 投影露光装置
JP4159094B2 (ja) * 2003-10-15 2008-10-01 東京応化工業株式会社 感光性樹脂組成物およびこれを用いた感光性ドライフィルム
JP2005227398A (ja) * 2004-02-10 2005-08-25 Fuji Photo Film Co Ltd 感光性転写シート
JP4515123B2 (ja) * 2004-03-18 2010-07-28 旭化成イーマテリアルズ株式会社 感光性樹脂積層体及びその用途
JP4485239B2 (ja) * 2004-04-01 2010-06-16 富士フイルム株式会社 パターン形成方法
JP2005292734A (ja) * 2004-04-05 2005-10-20 Fuji Photo Film Co Ltd 感光性転写シート、感光性積層体、画像パターン形成方法、及び配線パターン形成方法
JP4493385B2 (ja) * 2004-04-15 2010-06-30 旭化成イーマテリアルズ株式会社 感光性樹脂組成物及びその用途
JP2005331695A (ja) * 2004-05-19 2005-12-02 Fuji Photo Film Co Ltd 感光性転写シート、感光性積層体、画像パターン形成方法、及び配線パターン形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110284139A (zh) * 2018-03-19 2019-09-27 三星显示有限公司 蚀刻剂组合物和使用其制造金属图案和阵列基板的方法
CN110284139B (zh) * 2018-03-19 2022-05-27 三星显示有限公司 蚀刻剂组合物和使用其制造金属图案和阵列基板的方法

Also Published As

Publication number Publication date
JP2006154622A (ja) 2006-06-15
WO2006059534A1 (ja) 2006-06-08

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