TW200613903A - Photosensitive resin composition, and cured product and use thereof - Google Patents
Photosensitive resin composition, and cured product and use thereofInfo
- Publication number
- TW200613903A TW200613903A TW094116779A TW94116779A TW200613903A TW 200613903 A TW200613903 A TW 200613903A TW 094116779 A TW094116779 A TW 094116779A TW 94116779 A TW94116779 A TW 94116779A TW 200613903 A TW200613903 A TW 200613903A
- Authority
- TW
- Taiwan
- Prior art keywords
- resin composition
- photosensitive resin
- meth
- compound
- epoxy
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
- H05K3/287—Photosensitive compositions
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004156492 | 2004-05-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200613903A true TW200613903A (en) | 2006-05-01 |
Family
ID=37684662
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094116779A TW200613903A (en) | 2004-05-26 | 2005-05-23 | Photosensitive resin composition, and cured product and use thereof |
Country Status (5)
Country | Link |
---|---|
US (1) | US20070166642A1 (zh) |
EP (1) | EP1759244A2 (zh) |
CN (1) | CN1965267A (zh) |
TW (1) | TW200613903A (zh) |
WO (1) | WO2005116760A2 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI554830B (zh) * | 2011-08-10 | 2016-10-21 | 日立化成股份有限公司 | 感光性樹脂組成物、感光性膜、永久抗蝕劑及永久抗蝕劑的製造方法 |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW200630447A (en) | 2004-11-19 | 2006-09-01 | Showa Denko Kk | Resin cured film for flexible printed wiring board and production process thereof |
JP5399603B2 (ja) * | 2005-10-07 | 2014-01-29 | 昭和電工株式会社 | シリコーンパウダーを含む熱硬化性樹脂組成物 |
JP4839092B2 (ja) * | 2006-01-30 | 2011-12-14 | 矢崎総業株式会社 | 電線マーキング用インクジェットインク |
JP4994922B2 (ja) * | 2007-04-06 | 2012-08-08 | 太陽ホールディングス株式会社 | ソルダーレジスト組成物およびその硬化物 |
KR100940174B1 (ko) * | 2007-04-27 | 2010-02-03 | 다이요 잉키 세이조 가부시키가이샤 | 인쇄 배선판의 제조 방법 및 인쇄 배선판 |
CN101520602B (zh) * | 2008-02-28 | 2011-09-07 | 新力美科技股份有限公司 | 可辐射固化显影的聚胺酯以及含其的可辐射固化显影的光阻组成物 |
KR101048329B1 (ko) * | 2008-10-06 | 2011-07-14 | 주식회사 엘지화학 | 우레탄계 다관능성 모노머, 그의 제조방법 및 이를 포함하는 감광성 수지 조성물 |
JP4318743B1 (ja) * | 2008-10-07 | 2009-08-26 | 昭和高分子株式会社 | 紫外線硬化型再剥離性粘着剤組成物及びこれを用いた粘着シート |
JP5404028B2 (ja) * | 2008-12-25 | 2014-01-29 | 東京応化工業株式会社 | 被エッチング基体の製造方法 |
JP5515394B2 (ja) * | 2009-04-30 | 2014-06-11 | 株式会社ピーアイ技術研究所 | 感光性変性ポリイミド樹脂組成物及びその用途 |
TWI395027B (zh) * | 2009-05-01 | 2013-05-01 | Ind Tech Res Inst | 框膠組成物 |
EP2444435A4 (en) * | 2009-06-15 | 2013-07-03 | Toyo Ink Sc Holdings Co Ltd | URETHANE RESIN, LIQUID THAT IS HARDENABLE WITH ACTIN POWER RAYS AND PROTECTIVE BACKFILM FOR A SOLAR CELL |
KR101481071B1 (ko) * | 2010-03-08 | 2015-01-13 | 주식회사 엘지화학 | 내열성 및 기계적 성질이 우수한 감광성 수지 조성물 및 인쇄회로기판용 보호필름 |
CA2755151C (en) * | 2010-10-18 | 2014-06-17 | Valspar Sourcing, Inc. | Anti-graffiti coatings |
KR101332436B1 (ko) * | 2010-12-06 | 2013-11-22 | 제일모직주식회사 | 이방 전도성 필름 |
CN102181019B (zh) * | 2011-03-18 | 2014-08-13 | 湖北工业大学 | 紫外光固化耐银离子迁移型等离子显示器电路保护剂及其制备方法 |
WO2013084282A1 (ja) | 2011-12-05 | 2013-06-13 | 日立化成株式会社 | 樹脂硬化膜パターンの形成方法、感光性樹脂組成物及び感光性エレメント |
KR102025036B1 (ko) * | 2011-12-05 | 2019-09-24 | 히타치가세이가부시끼가이샤 | 터치패널용 전극의 보호막의 형성 방법, 감광성 수지 조성물 및 감광성 엘리먼트, 및, 터치패널의 제조 방법 |
WO2013084283A1 (ja) | 2011-12-05 | 2013-06-13 | 日立化成株式会社 | タッチパネル用電極の保護膜の形成方法、感光性樹脂組成物及び感光性エレメント |
CN103305133B (zh) * | 2013-06-18 | 2015-02-18 | 北京京东方光电科技有限公司 | 一种封框胶及其制备方法、液晶显示面板和液晶显示器 |
KR101562964B1 (ko) * | 2013-09-02 | 2015-10-26 | 주식회사 케이씨씨 | 신뢰성이 우수한 감광성 수지 조성물 및 그 제조방법 |
US9540529B2 (en) * | 2015-01-13 | 2017-01-10 | Xerox Corporation | Solder mask compositions for aerosol jet printing |
JP6930894B2 (ja) * | 2017-10-26 | 2021-09-01 | オリンパス株式会社 | ガス低温滅菌を受ける医療機器用の樹脂組成物、可撓管、音響レンズ、および外皮、ならびにガス低温滅菌を受ける医療機器 |
JP7255241B2 (ja) * | 2018-03-09 | 2023-04-11 | 三菱ケミカル株式会社 | 活性エネルギー線硬化性剥離型粘着剤組成物および剥離型粘着シート |
CN109467651B (zh) * | 2018-11-07 | 2021-01-15 | 华东理工大学华昌聚合物有限公司 | 光固化环氧乙烯基酯树脂及其合成方法 |
CN109776756A (zh) * | 2019-01-21 | 2019-05-21 | 深圳市道尔顿电子材料有限公司 | 一种双重改性环氧丙烯酸酯及其光刻胶 |
CN110563925B (zh) * | 2019-09-16 | 2022-02-01 | 上海昭和高分子有限公司 | 一种酸酐改性环氧丙烯酸树脂、碱显像高耐热聚氨酯树脂及其阻焊油墨 |
CN114716777B (zh) * | 2020-12-22 | 2023-07-11 | 广东生益科技股份有限公司 | 一种透明树脂组合物、包含其的挠性覆铜板及其应用 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5089376A (en) * | 1986-12-08 | 1992-02-18 | Armstrong World Industries, Inc. | Photoimagable solder mask coating |
US5420171A (en) * | 1991-12-31 | 1995-05-30 | Tech Spray, Inc. | UV curable temporary solder mask |
JP3223678B2 (ja) * | 1993-12-24 | 2001-10-29 | 三菱電機株式会社 | はんだ付け用フラックスおよびクリームはんだ |
US6197149B1 (en) * | 1997-04-15 | 2001-03-06 | Hitachi Chemical Company, Ltd. | Production of insulating varnishes and multilayer printed circuit boards using these varnishes |
US6432614B1 (en) * | 1998-07-31 | 2002-08-13 | Dai Nippon Printing Co., Ltd. | Photosensitive resin composition and color filter |
CA2365144A1 (en) * | 1999-03-19 | 2000-09-28 | Nippon Kayaku Kabushiki Kaisha | Urethane oligomer, resin compositions thereof, and cured article thereof |
US6268111B1 (en) * | 1999-10-20 | 2001-07-31 | Rohm And Haas Company | Photoimageable composition having photopolymerizeable binder oligomer |
AU2001284499A1 (en) * | 2000-09-11 | 2002-03-26 | Showa Denko K K | Photosensitive composition, cured article thereof, and printed circuit board using the same |
CN1282036C (zh) * | 2001-07-04 | 2006-10-25 | 昭和电工株式会社 | 抗蚀性可固化树脂组合物及其固化产品 |
TW200630447A (en) * | 2004-11-19 | 2006-09-01 | Showa Denko Kk | Resin cured film for flexible printed wiring board and production process thereof |
-
2005
- 2005-05-23 TW TW094116779A patent/TW200613903A/zh unknown
- 2005-05-25 US US11/579,920 patent/US20070166642A1/en not_active Abandoned
- 2005-05-25 CN CNA2005800168355A patent/CN1965267A/zh active Pending
- 2005-05-25 WO PCT/JP2005/009999 patent/WO2005116760A2/en not_active Application Discontinuation
- 2005-05-25 EP EP05745837A patent/EP1759244A2/en not_active Withdrawn
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI554830B (zh) * | 2011-08-10 | 2016-10-21 | 日立化成股份有限公司 | 感光性樹脂組成物、感光性膜、永久抗蝕劑及永久抗蝕劑的製造方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2005116760A2 (en) | 2005-12-08 |
CN1965267A (zh) | 2007-05-16 |
WO2005116760A3 (en) | 2007-01-25 |
US20070166642A1 (en) | 2007-07-19 |
EP1759244A2 (en) | 2007-03-07 |
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