TW200610204A - Semiconductor device and manufacturing method thereof - Google Patents

Semiconductor device and manufacturing method thereof

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Publication number
TW200610204A
TW200610204A TW094125987A TW94125987A TW200610204A TW 200610204 A TW200610204 A TW 200610204A TW 094125987 A TW094125987 A TW 094125987A TW 94125987 A TW94125987 A TW 94125987A TW 200610204 A TW200610204 A TW 200610204A
Authority
TW
Taiwan
Prior art keywords
connection terminal
external connection
electronic component
mounting electrode
chip
Prior art date
Application number
TW094125987A
Other languages
English (en)
Other versions
TWI272734B (en
Inventor
Hiroyuki Nakanishi
Shinji Suminoe
Original Assignee
Sharp Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Kk filed Critical Sharp Kk
Publication of TW200610204A publication Critical patent/TW200610204A/zh
Application granted granted Critical
Publication of TWI272734B publication Critical patent/TWI272734B/zh

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    • HELECTRICITY
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    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H01L23/3114Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed the device being a chip scale package, e.g. CSP
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  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
TW094125987A 2004-07-29 2005-07-29 Semiconductor device and manufacturing method thereof TWI272734B (en)

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US8067814B2 (en) 2007-06-01 2011-11-29 Panasonic Corporation Semiconductor device and method of manufacturing the same
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KR101315173B1 (ko) * 2009-12-28 2013-10-08 후지쯔 가부시끼가이샤 배선 구조 및 그 형성 방법
JP2011204894A (ja) * 2010-03-25 2011-10-13 Casio Computer Co Ltd 半導体装置およびその製造方法
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JP2015153844A (ja) 2014-02-13 2015-08-24 日亜化学工業株式会社 発光装置
US9385279B2 (en) 2014-05-30 2016-07-05 Nichia Corporation Light-emitting device and method for manufacturing the same
JP6361374B2 (ja) 2014-08-25 2018-07-25 日亜化学工業株式会社 発光装置及びその製造方法
JP6319026B2 (ja) 2014-09-29 2018-05-09 日亜化学工業株式会社 発光装置及びその製造方法
JP6356354B2 (ja) * 2015-07-22 2018-07-11 アルプス電気株式会社 高周波モジュール
JP2017050350A (ja) * 2015-08-31 2017-03-09 日亜化学工業株式会社 発光装置及びその製造方法
JP6764666B2 (ja) * 2016-03-18 2020-10-07 新光電気工業株式会社 半導体装置及び半導体装置の製造方法
JP6662944B2 (ja) * 2018-05-02 2020-03-11 ローム株式会社 電圧生成装置

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TWI272734B (en) 2007-02-01
JP2006041401A (ja) 2006-02-09
KR20060048884A (ko) 2006-05-18

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