TW200539281A - Wiring structure for integrated circuit with reduced intralevel capacitance - Google Patents

Wiring structure for integrated circuit with reduced intralevel capacitance Download PDF

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Publication number
TW200539281A
TW200539281A TW094110922A TW94110922A TW200539281A TW 200539281 A TW200539281 A TW 200539281A TW 094110922 A TW094110922 A TW 094110922A TW 94110922 A TW94110922 A TW 94110922A TW 200539281 A TW200539281 A TW 200539281A
Authority
TW
Taiwan
Prior art keywords
dielectric
layer
dielectric layer
item
patent application
Prior art date
Application number
TW094110922A
Other languages
English (en)
Chinese (zh)
Inventor
Richard S Wise
Bomy A Chen
Mark C Hakey
hong-wen Yan
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Publication of TW200539281A publication Critical patent/TW200539281A/zh

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/01—Manufacture or treatment
    • H10D64/011—Manufacture or treatment of electrodes ohmically coupled to a semiconductor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/495—Capacitive arrangements or effects of, or between wiring layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/071—Manufacture or treatment of dielectric parts thereof
    • H10W20/072—Manufacture or treatment of dielectric parts thereof of dielectric parts comprising air gaps
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/45—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their insulating parts
    • H10W20/46—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their insulating parts comprising air gaps
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/45—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their insulating parts
    • H10W20/47—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their insulating parts comprising two or more dielectric layers having different properties, e.g. different dielectric constants
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/071—Manufacture or treatment of dielectric parts thereof
    • H10W20/074—Manufacture or treatment of dielectric parts thereof of dielectric parts comprising thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers
    • H10W20/076—Manufacture or treatment of dielectric parts thereof of dielectric parts comprising thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers in via holes or trenches
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/01—Manufacture or treatment
    • H10W20/071—Manufacture or treatment of dielectric parts thereof
    • H10W20/074—Manufacture or treatment of dielectric parts thereof of dielectric parts comprising thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers
    • H10W20/076—Manufacture or treatment of dielectric parts thereof of dielectric parts comprising thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers in via holes or trenches
    • H10W20/0765—Manufacture or treatment of dielectric parts thereof of dielectric parts comprising thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers in via holes or trenches the thin functional dielectric layers being temporary, e.g. sacrificial layers

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Memories (AREA)
  • Semiconductor Integrated Circuits (AREA)
TW094110922A 2004-04-21 2005-04-06 Wiring structure for integrated circuit with reduced intralevel capacitance TW200539281A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/709,204 US20050239284A1 (en) 2004-04-21 2004-04-21 Wiring structure for integrated circuit with reduced intralevel capacitance

Publications (1)

Publication Number Publication Date
TW200539281A true TW200539281A (en) 2005-12-01

Family

ID=35137032

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094110922A TW200539281A (en) 2004-04-21 2005-04-06 Wiring structure for integrated circuit with reduced intralevel capacitance

Country Status (9)

Country Link
US (2) US20050239284A1 (https=)
EP (1) EP1743366B1 (https=)
JP (1) JP5305651B2 (https=)
KR (1) KR20070008599A (https=)
CN (1) CN1943023B (https=)
AT (1) ATE504079T1 (https=)
DE (1) DE602005027195D1 (https=)
TW (1) TW200539281A (https=)
WO (1) WO2005104212A2 (https=)

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CN101471324B (zh) * 2007-12-26 2010-07-07 和舰科技(苏州)有限公司 一种超低k互连结构及其制造方法
US8497203B2 (en) 2010-08-13 2013-07-30 International Business Machines Corporation Semiconductor structures and methods of manufacture
US8492270B2 (en) 2010-09-20 2013-07-23 International Business Machines Corporation Structure for nano-scale metallization and method for fabricating same
US8957519B2 (en) 2010-10-22 2015-02-17 International Business Machines Corporation Structure and metallization process for advanced technology nodes
US8735279B2 (en) 2011-01-25 2014-05-27 International Business Machines Corporation Air-dielectric for subtractive etch line and via metallization
CN103094183B (zh) * 2011-10-29 2015-07-29 中芯国际集成电路制造(上海)有限公司 半导体器件的制造方法
CN103117244B (zh) * 2011-11-16 2015-04-01 中芯国际集成电路制造(上海)有限公司 Ic内连线和层间介质层之间的空气间隔形成方法
CN102931127A (zh) * 2012-10-10 2013-02-13 哈尔滨工程大学 一种抗辐射加固浅槽隔离结构形成方法
US9431294B2 (en) * 2014-10-28 2016-08-30 GlobalFoundries, Inc. Methods of producing integrated circuits with an air gap
US10770539B2 (en) * 2018-09-25 2020-09-08 Nxp B.V. Fingered capacitor with low-K and ultra-low-K dielectric layers
US11094632B2 (en) * 2019-09-27 2021-08-17 Nanya Technology Corporation Semiconductor device with air gap and method for preparing the same
WO2022006010A1 (en) * 2020-06-30 2022-01-06 Lam Research Corporation Reducing intralevel capacitance in semiconductor devices

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US5372969A (en) * 1991-12-31 1994-12-13 Texas Instruments Incorporated Low-RC multi-level interconnect technology for high-performance integrated circuits
US5739579A (en) * 1992-06-29 1998-04-14 Intel Corporation Method for forming interconnections for semiconductor fabrication and semiconductor device having such interconnections
US5792706A (en) * 1996-06-05 1998-08-11 Advanced Micro Devices, Inc. Interlevel dielectric with air gaps to reduce permitivity
US5783481A (en) * 1996-06-05 1998-07-21 Advanced Micro Devices, Inc. Semiconductor interlevel dielectric having a polymide for producing air gaps
US5880026A (en) * 1996-12-23 1999-03-09 Texas Instruments Incorporated Method for air gap formation by plasma treatment of aluminum interconnects
JP2962272B2 (ja) * 1997-04-18 1999-10-12 日本電気株式会社 半導体装置の製造方法
US6242336B1 (en) * 1997-11-06 2001-06-05 Matsushita Electronics Corporation Semiconductor device having multilevel interconnection structure and method for fabricating the same
US6211561B1 (en) * 1998-11-16 2001-04-03 Conexant Systems, Inc. Interconnect structure and method employing air gaps between metal lines and between metal layers
JP4134405B2 (ja) * 1998-11-20 2008-08-20 沖電気工業株式会社 半導体素子の製造方法及び半導体素子
TW411570B (en) * 1999-02-02 2000-11-11 Nanya Technology Corp Manufacturing method of self-aligned contact
US6177329B1 (en) * 1999-04-15 2001-01-23 Kurt Pang Integrated circuit structures having gas pockets and method for forming integrated circuit structures having gas pockets
US6342722B1 (en) * 1999-08-05 2002-01-29 International Business Machines Corporation Integrated circuit having air gaps between dielectric and conducting lines
GB0001179D0 (en) * 2000-01-19 2000-03-08 Trikon Holdings Ltd Methods & apparatus for forming a film on a substrate
TW444342B (en) * 2000-02-17 2001-07-01 United Microelectronics Corp Manufacturing method of metal interconnect having inner gap spacer
TW465039B (en) * 2000-11-06 2001-11-21 United Microelectronics Corp Void-type metal interconnect and method for making the same
US6380106B1 (en) * 2000-11-27 2002-04-30 Chartered Semiconductor Manufacturing Inc. Method for fabricating an air gap metallization scheme that reduces inter-metal capacitance of interconnect structures
US6936533B2 (en) * 2000-12-08 2005-08-30 Samsung Electronics, Co., Ltd. Method of fabricating semiconductor devices having low dielectric interlayer insulation layer
US6448177B1 (en) * 2001-03-27 2002-09-10 Intle Corporation Method of making a semiconductor device having a dual damascene interconnect spaced from a support structure
KR100460771B1 (ko) * 2001-06-30 2004-12-09 주식회사 하이닉스반도체 듀얼다마신 공정에 의한 다층 배선의 형성 방법
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Also Published As

Publication number Publication date
KR20070008599A (ko) 2007-01-17
ATE504079T1 (de) 2011-04-15
JP5305651B2 (ja) 2013-10-02
CN1943023A (zh) 2007-04-04
JP2007534178A (ja) 2007-11-22
US20050239284A1 (en) 2005-10-27
WO2005104212A3 (en) 2006-07-20
WO2005104212A2 (en) 2005-11-03
CN1943023B (zh) 2010-09-29
US7329602B2 (en) 2008-02-12
EP1743366A4 (en) 2009-11-11
DE602005027195D1 (de) 2011-05-12
EP1743366A2 (en) 2007-01-17
US20060035460A1 (en) 2006-02-16
EP1743366B1 (en) 2011-03-30

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