TW200536760A - Mask case - Google Patents
Mask case Download PDFInfo
- Publication number
- TW200536760A TW200536760A TW93114155A TW93114155A TW200536760A TW 200536760 A TW200536760 A TW 200536760A TW 93114155 A TW93114155 A TW 93114155A TW 93114155 A TW93114155 A TW 93114155A TW 200536760 A TW200536760 A TW 200536760A
- Authority
- TW
- Taiwan
- Prior art keywords
- photomask
- substrate
- mask
- inclined surface
- photomask substrate
- Prior art date
Links
- 239000000758 substrate Substances 0.000 claims abstract description 171
- 238000003825 pressing Methods 0.000 claims description 25
- 239000000428 dust Substances 0.000 abstract description 21
- 238000004519 manufacturing process Methods 0.000 abstract description 10
- 238000003860 storage Methods 0.000 description 17
- 238000010586 diagram Methods 0.000 description 9
- 239000004065 semiconductor Substances 0.000 description 6
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 238000000059 patterning Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 230000000994 depressogenic effect Effects 0.000 description 3
- 238000011109 contamination Methods 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 206010052428 Wound Diseases 0.000 description 1
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 230000003796 beauty Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 235000013372 meat Nutrition 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Packaging Frangible Articles (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004138617A JP4496842B2 (ja) | 2004-05-07 | 2004-05-07 | マスクケース |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200536760A true TW200536760A (en) | 2005-11-16 |
| TWI339635B TWI339635B (cs) | 2011-04-01 |
Family
ID=35468881
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW93114155A TW200536760A (en) | 2004-05-07 | 2004-05-19 | Mask case |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP4496842B2 (cs) |
| TW (1) | TW200536760A (cs) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102854739A (zh) * | 2011-06-29 | 2013-01-02 | 株式会社荒川树脂 | 光罩盒的光罩卡止具 |
| TWI770791B (zh) * | 2021-01-28 | 2022-07-11 | 家登精密工業股份有限公司 | 具有快拆式支撐機構之光罩盒 |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4667018B2 (ja) * | 2004-11-24 | 2011-04-06 | ミライアル株式会社 | レチクル搬送容器 |
| JP4581681B2 (ja) * | 2004-12-27 | 2010-11-17 | 株式会社ニコン | レチクル保護装置および露光装置 |
| JP2008032915A (ja) * | 2006-07-27 | 2008-02-14 | Hoya Corp | マスクケース |
| KR100858634B1 (ko) | 2007-09-20 | 2008-09-17 | 비아이 이엠티 주식회사 | 마스크 보관 케이스 |
| DE102007047186B4 (de) * | 2007-10-02 | 2014-01-09 | Carl Zeiss Sms Gmbh | Aufnahmevorrichtung zur Aufnahme einer Photolithographiemaske |
| KR101511599B1 (ko) * | 2007-12-20 | 2015-04-14 | 주식회사 에스앤에스텍 | 마스크 컨테이너 |
| JP5005778B2 (ja) * | 2010-02-15 | 2012-08-22 | 家登精密工業股▲ふん▼有限公司 | レチクルポッド |
| JP5318060B2 (ja) * | 2010-09-29 | 2013-10-16 | ヒロパックス株式会社 | 半導体ウエハーの収納容器 |
| US20200144086A1 (en) * | 2018-11-07 | 2020-05-07 | Entegris, Inc. | Reticle support for a container |
| EP4457857A1 (en) * | 2021-12-29 | 2024-11-06 | Entegris, Inc. | Inner reticle pod cover and baseplate shipper |
-
2004
- 2004-05-07 JP JP2004138617A patent/JP4496842B2/ja not_active Expired - Fee Related
- 2004-05-19 TW TW93114155A patent/TW200536760A/zh not_active IP Right Cessation
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102854739A (zh) * | 2011-06-29 | 2013-01-02 | 株式会社荒川树脂 | 光罩盒的光罩卡止具 |
| TWI770791B (zh) * | 2021-01-28 | 2022-07-11 | 家登精密工業股份有限公司 | 具有快拆式支撐機構之光罩盒 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4496842B2 (ja) | 2010-07-07 |
| JP2005321529A (ja) | 2005-11-17 |
| TWI339635B (cs) | 2011-04-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |