200536760 九、發明說明： 【發明所屬之技術領域】 本發明係關於保存或搬運用於製造半導體元件或液晶顯 示元件等之光罩基板之盒子，可確實地定置之同時可以不 接觸光罩面即施有光罩圖案之面或圖案化前之表面的方式 保存之光罩盒。 工 【先前技術】 從先前，用於半導體積體電路等製造步驟之光罩基板， 關於例如用於製造半導體元件或液晶顯示元件等之微影步 驟等所使用的光罩基板，極端地厭惡基板表面之污染，關 於其保存或搬運之際收納之光罩盒係防止塵埃附著或傷及 光罩基板為主要目的使用者。' 即，於光罩基板附著之塵埃或傷等係，成為光罩缺陷者， 會再現於光阻上，就此組入微電子裝置而破壞裝置之正常 功能者’為防止該等採取各種對策。 例如，光罩基板的使用上，不觸及端面以外之面等使用 上的規定，或於收納時不使塵埃附著於光罩基板的方式小 心使用，再者不使塵埃進入光罩盒内的方式小心收納，進 一步採取於收納後不使塵埃進入光罩盒内之構造者。 再者，於施有光罩圖案之光罩基板，將光罩保護膜即將 以硝化纖維所代表光學上透明的薄膜以框架支持防止塵埃 附著或傷到光罩圖案面者。 於此情形，為極力避免與光罩圖案面之接觸有例如特開 2001_301877之第7圖及第8圖所示構成者。 91310.doc 200536760200536760 IX. Description of the invention: [Technical field to which the invention belongs] The present invention relates to a box for storing or transporting a photomask substrate used for manufacturing a semiconductor element or a liquid crystal display element, etc., which can be reliably fixed without contacting the photomask surface. A mask box stored as a patterned surface or a surface before patterning. [Prior art] From the past, photomask substrates used in manufacturing steps of semiconductor integrated circuits and the like, and photomask substrates used in, for example, photolithography steps for manufacturing semiconductor elements or liquid crystal display elements, have been extremely disgusted with substrates. Contamination of the surface. The mask box that is stored during storage or transportation is a user whose main purpose is to prevent dust from attaching or damaging the mask substrate. 'That is, the dust or wounds attached to the mask substrate become the defect of the mask, which will be reproduced on the photoresist, and the microelectronic device is incorporated to destroy the normal function of the device.' Various measures are taken to prevent this. For example, use of the photomask substrate does not touch the use rules such as the surface other than the end face, or use it in a manner that does not allow dust to adhere to the photomask substrate during storage, and not to allow dust to enter the photomask box. Store carefully, and take a structure that prevents dust from entering the mask box after storage. Furthermore, on the mask substrate to which the mask pattern is applied, the mask protective film is to be supported by an optically transparent film represented by nitrocellulose as a frame to prevent dust from adhering or damaging the mask pattern surface. In this case, in order to avoid contact with the mask pattern surface as much as possible, for example, there are those shown in Figs. 7 and 8 of JP-A-2001-301877. 91310.doc 200536760
與重大的損傷之虞。 口此，作為可防止與光罩基板之接觸的同時，可防止光 罩基板於收納時之偏移之構造有特開2〇〇3_222992。 該接合具之光罩支持體系， 數之保持枝部，以該部分载置 於該構成，關於該接合具，使用具有傾斜面之接合具， 本體開口部方向之接合具係將傾斜面向合中心冑漸漸變低 的方式配設，裡面方向之接合具係將傾斜面向開口部方向 漸漸變低的方式配設，該體之裡面方向之接合具係將傾斜 面向盒中央部漸漸變低的方式配設，關閉蓋體之際將光罩 之稜線部分同時由上下方向及前後左右方向按壓之光罩 盒。 [專利文獻1]特開2001-301877 [專利文獻2]特開2003_222992 [發明所欲解決之課題] 首先，關於特開2001-301877，係使作為與光罩之接觸部 为之帽子部之接觸面積極小者，惟至少於該部分會與光罩 面接觸者，係無法避免該部分之污染或損傷者。 91310.doc 200536760 案之光罩基板配置光 發生接觸者。 罩保護 即’係會於例如施以光罩圖 膜之外之處之索引標誌部分等 進一步，係以帽子部之點支持，於搬運時等衝擊使内部 之光罩搖晃，有由保持枝部偏移之虞。 。因此，因偏移使帽子部之接觸面積擴大的同時不僅有破 損之虞，與定位光罩基板之定位構件例如肋片等或保持枝 部等接觸，因該部分背擦削，而有產生塵埃之虞。 對此，關於特開2003_222992則與此相異，係將光罩之棱 線部分由上下方向以具有傾斜面之接合具由前後左右方向 按Μ之構成’故係不與光罩之表面部分接觸者，由於從上 下方向前後左右方向按壓内部之光罩難被搬運時等之衝擊 搖晃，進一步即使偏移係與光罩之稜線部分之接觸部分偏 移不會與光罩面接觸者。 仁疋，由上下方向向前後左右方向之共計8點定位於接合 位置者，雖對某種程度的衝擊可防止光罩之偏移，惟以極 大的力搖晃之情形則有光罩發生偏移之虞。 又’對前後方向之按壓係以上下面共計4處，對左右按壓 係以上下面共計4處’對光罩之一稜線，於其他相對之反對 面之一稜線各個置入2處按壓者，對向傾斜方向有發生若干 偏移之虞者。 因此，於極端地搖晃之情形等，則與定位光罩基板之定 位構件例如肋片等或接合具等接觸，肋片等或接合具等被 削磨有產生塵埃之可能。 進一步則於具有傾斜面之接合具按壓光罩之稜線部分之 91310.doc 200536760 /•月/於4接合具使用軟質構件之情形，該傾斜面以關閉 蓋體之按壓力凹陷，雖些微傾斜面有接觸光罩面之虞。 因此’有可能與施於光罩表面之端部之素引標記接觸之 虞。 ”特別是’關於光罩，於製造半導體元件或液晶顯示元件 等之際，要求極細的圖案，因應此與先前相比極細微的塵 埃之存在亦成問題，再者要求極力減少與光罩面之接觸。 —即，於光罩基板上施以光罩圖案者係，於圖案面不能有 木者’再者於光罩基板之圖案化前之光罩基板之空白基 板則’要求其表面之平坦性與平滑性，亦係不能有污染者土。 特別是於LSI用空白基板，於其遮光膜除了絡翠層構造， 有，有表面反射構造、表背面低反射構造者，低反射膜係 由氧化絡所成以干涉降低反射率。 於如此之Μ白基板則，由於極度厭，惡表面污染係端面 以外部可以接觸者。 因此，如此之基板收納於光罩盒必需於無塵室中，戴用 經認證之指套或手套，不觸及端面以外的方式作業，於收 納後亦要求不觸及端面以外的同時，需要不使基於伴隨著 運送日守之震動之基板之微動而削去容器之一部分產生塵埃 的某種措施，藉由該等空白基板的狀態及施以光罩圖案之 狀態之任一光罩基板均要求極力避免於容器内之塵埃發生 者。 、 進一步不僅空白基板或施以光罩圖案之光罩基板之配設 光罩保護膜孓部分，包含施以索引標誌之部分之光罩美板 91310.doc 200536760 之^面外之表背面完 王不會接觸之構造被期望。 【發明内容】 [解決課題之手段] 本發明係為解決上述等 义深通者，提供可不接觸光罩基板之 表面部分來收納，可抑制 J控制於收納時之光罩基板之微動之光 罩盒。 、申請專利範圍第1項所關發明係，-種光Μ，其特徵在 ;可乂於具有本體與關閉本體開口之蓋體之收納光罩基 板之光罩盒内載置接合光罩基板之接合具係具有於光罩基 :之各角σ|5方向’於各個之一個角部附近向二方向載置接 口光罩基板之接合具的同時，該接合具具有適合於光罩基 板之稜線面之傾斜面，藉由所關發明可解決上述課題。 又申明專利範圍第2項所關發明係，一種光罩盒，其特 徵在於·於蓋體具有蓋體之蓋體接合具，其係於本體之接 口具載置接合光罩基板後，由上部按壓該光罩基板者，於 蓋體接合具連設具有曲線面，使該曲線面與光罩基板之稜 線面接觸之部分呈肉厚形狀，與此連設之部分具有稍微薄 肉厚之繞曲部者，藉由所關發明可解決上述課題。 其次，申請專利範圍第3項所關發明係，申請專利範圍第 1項及第2項所關發明之組合，係一種光罩盒，其特徵在於， 於本體内載置接合光罩基板之接合具係，具有於光罩基板 之各角部方向於各個之一個角部附近向二方向載置接合光 罩基板之接合具之同時，該接合具各個具有適合於光罩基 板之稜線面之傾斜面，進一步蓋體之蓋體接合具，具有與 91310.doc 10- 200536760 :體接σ具基部連設之曲線面，於篕體具有使該曲線面與 光罩基板之稜線面接觸之部分呈肉厚形狀，與此連設之部 分具有梢微薄肉厚之繞曲部之蓋體之蓋體接合具，於本體 之接口具載置接合光罩基板後藉由關閉蓋體將該光罩按壓 收納之光罩盒，以所關發明可防止所收納光罩基板之偏移 或微動等。 於此it形，申請專利範圍第4項所關發明係，於本體具有 /、w亥接口具之傾斜面並列配設之肋片，該肋片對光罩基板 之載置方向傾斜角，較具有適合於光罩基板之稜線面之傾 斜面之5亥接合具之傾斜面之傾斜角為陡的同時該肋片配設 於至少不會與在於載置位置之光罩基板接觸之位置，藉由 所關發明可防止收納時之光罩與肋片之接觸。 該等之外，亦可如申請專利範圍第5項所關發明，該接合 八係呈略L子狀之接合具，於構成略L字狀之各個突出部之 兩端部具有本體突起按壓部的同時，具㈣合光罩基板之 稜線面之傾斜面之光罩盒，或如申請專利範圍第6項所關發 明於突出部之兩端部具有本體突起按壓部，具有適合光罩 基板之稜線面之第三傾斜面，與該第三傾斜面連設具有較 第傾斜面緩和之角度之第二傾斜面者，亦可為如申請專 利範圍第7項所關發明連設於第二傾斜面具有較第二傾斜 面Γ7角度之第一傾斜面者’或進一步如申請專利範圍第8 項所關發明該接合具連設於第—傾斜面具有上面最下面之 光罩盒。 或者如申請專利範圍第9項所關發明取代略L字狀之接合 91310.doc 200536760 具，亦可使用將兩個略棒狀之接合具以大致9〇度相對配設 之接合具者。 又，如申凊專利範圍第1 〇項所關發明亦可為取代略L字狀 之接合具，使用略四角形狀之接合具之光罩盒，相鄰之略 四角形狀之兩邊構成本體突起按壓部，與此連設之傾斜面 具有適合光罩基板之稜線面之傾斜面者。 [發明之效果] 精由如此之構成，由於接合具係接觸光罩基板之稜線面 保持接合，接合具可不觸及光罩基板地載置接合光罩基板 春 者，其具有於圖案化前之光罩基板之所謂空白基板或施以 圖案化之光罩之任一情形均可防止因接合具與光罩基板之 面接觸之損傷或污染之第一效果。 再者，藉由使用本發明所關接合具之光罩盒，可將收納 之光罩基板以一個角部方向由兩方向按壓，對一個光罩基 板可由八方向按壓，具有可防止光罩基板於收納時之偏移 或微動之第二效果。 此事為，成為可防止因光罩基板之邊移或微動而與容器 _ 本體之一部分接觸，將該部分削磨而產生塵埃之發生，可 以極高的機率防止光罩盒内之塵埃附著於光罩基板，可防 止對光罩基板之損傷。 再者，藉由使用於本發明所關蓋體使用蓋體接合具之光 ‘ 罩盒，可防止於蓋體關閉時於蓋體接合具按壓光罩基板之 . 際與光罩基板之稜線面接觸之部分附近之蓋體接合具之變 形，具有可防止因蓋體接合具之變形部分對該光罩基板面 91310.doc -12- 200536760 之接觸之第三效果。 【實施方式】 [實施發明之最佳形態] 其次於圖1表示本發明之最佳形態之例。 示元 之狀 首先，為保存或搬運用於制 “ +導體70件或液晶藏 件等之光罩基板9之光罩各丨，太同 ^ 本圖係表示將光罩9收無 態之圖。 即，光罩盒，其係為收納或搬運，於半導體基體電路等 製造步驟使用之光罩基板，例如用於半導體元件或液晶顯 示裝置等之微影步驟等之光罩基板，圖案化前之光罩基板 之所謂空白基板或施以圖案化之光罩。 於本圖所示構成係，以收納光罩9之狀態將蓋體2關閉之 狀態。 此情形，光罩盒内之光罩係，藉由本體丄之略[字狀之接 合具3載置光罩9之四隅1一步由於該接合具3具有傾斜面 30,以該傾斜面30與光罩9之稜線部分“接觸者。 因此，於本體1 ’光罩9之四隅各個由兩方向即由側部方 向向中心部方向按壓的同時由開口部或關節方向向中心部 方向藉由該接合具3限制光罩9之位置者。 再者，本體具有肋片7。 進一步，於蓋體2，與於具有開口部之壁部及具有關節部 之壁部之兩壁部平行地配設蓋體接合具4，此於關閉蓋體之 際，呈由上部方向按壓光罩9。 此時盍體接合具4亦因同樣地具有傾斜面4〇故於該傾斜 91310.doc -13· 200536760 面40接觸光罩9之稜線部91者。 因此，關於光罩9之表背面均未與接合具3及蓋體接合具* 接觸，成僅於光罩9之稜線部91接觸者。 人猎此，成為可完全不觸及光罩9之表背面地收納及保持於 盒内者。 、、 ^此事，不問光罩9之圖案化之前後，於使用光罩之情形雖 係盡量需要之事情，於先前與接合具之關係上要求僅圖案 化之部分極力不接觸的構成，惟於現狀係亦施有索弓丨標記 者，忒索引標記係，亦於圖案化，係施於光罩面之四隅等， 故有必要避免於該等部分設任何接觸物。 、 々特別是，光罩之大小或施以空白之範圍，圖案面之範圍 等為夕種，再者考慮製造上的誤差等則，對於光罩之表背 面所有的部分不能與盒之扣盒具接觸者，藉由本構成 成此。 再者，本體接合具3係可將光罩9之稜線91向中心部方向 由8方向按壓者，盒内之光罩9,被接合於該處，防止偏動 之情形。 此事係，防止盒内之光罩9些微移動者。 即，需防止因其收納時或保管時之盒本身之使用上之搖 晃之收納光罩基板9之微動，使盒之接合具3、4或肋片7等 與收納之光罩基板9接觸，藉此盒之接合具3、4或肋片7等 被削磨產生塵埃，惟藉由本構成可完全防止該等。 現在，於防止無法視認之程度之細微塵埃，附著於光罩 面上掙扎之現狀下，防止因光罩之震動所削出之極為細微 91310.doc • 14- 200536760 的塵埃之產生係成可防止因塵埃附著於光罩之遮光膜面 上、光罩保護膜上對光阻膜上之再現之際之缺陷。 圖2係表示將本光罩盒之蓋體2開啟，視認本體丨之狀態之 圖’表示本體1之接合具3之配設狀態之圖。 具有本體1之關閉滑板6之開口部方向，將光罩基板9載置 之情形之光罩基板9之兩角部各個配設有接合具3，進一步 於具有關節5之方向將光罩基板9載置之情形之光罩基板9 之兩角部亦各個配設有接合具3。 此時，該光罩基板9係藉由略L字之該接合具3接合，該略 L字之該接合具3係，將各個之突出部之上面構成為傾斜面 3〇，成以該傾斜面30與光罩9之稜線部分91接觸，成為可將 光罩基板9以該稜線部分91接合。 再者，藉由如此之構成於該光罩基板9之4隅各個按壓兩 處以決定位置，可確實地定位載置。 此時以共計八處按壓，即使將盒搖晃之情形，該光罩基 板9不會在接合具3上發生偏移或搖晃等。 再者，由本體1之各壁部方向向中央方向，於該光罩基板 9之兩端部方各個具有肋片7，藉由共計八處肋片7,將該光 罩基板9之載置處確認表示者。 因此，於本圖所示肋片7係不接觸收納時之光罩基板9之 方式配設，特別是為圖插入及取出之方便者，進一步增加 本體強度者。 於本圖所示肋片7之配置位置係一例，並非限定於本圖之 位置等者，惟至少需要以不與收納時之光罩基板9接觸的方 91310.doc -15- 200536760 式配設。 又於光罩基板9之表面中央部有施以光罩圖案之部分 92 ’於該部分有配設光罩保護膜者，進一步於四隅附有索 引標記93。 態之一例之圖，將 〇 圖3係表示蓋體2之蓋體接合具4配設狀 内表面露出之狀態之圖 本光罩盒之蓋體2開啟將蓋體 首先，將蓋體2關閉之情形於本體載置之光罩基板9之棱 線91接觸之位置各個配設有蓋體接合具4，該蓋體接合具4 係配置於内置光罩基板9之稜線91之相對方向。 該盍體接合具4,將其上部面以傾斜面4〇構成，其傾斜面 40與光罩基板9之稜線91接觸。 本圖所示蓋體接合具4係，一個一個各個配設於與具有蓋 體2之關閉滑板導通路61之開口部方向之壁部平行之該盒 之兩側壁方向的同時’一個一個各個配設於舆具有蓋體2 之關節之關節方向之壁部平行之該盒之兩侧壁方向。 因此，於共計四處於蓋體2配設蓋體接合具4，於關閉蓋 體2之情形，由上部方向以該蓋體接合具4按壓光罩基板9 之稜線91，防止光罩基板9之偏移或微動者。 關於本圖所示蓋體接合具4之配設處或方向等係表示本 發明之一例者，並非限定於本圖所示形態者。 圖4係表示光罩基板9藉由本^之接合具3與蓋體2之接 合具4所接合之狀態之剖面圖，表示首先於本體r接合具3 之傾斜面30載置基板9,由上部藉由蓋體接合具4按壓口光罩 基板9之狀態。 91310.doc • 16 - 200536760 首先光罩基板9係，具有表背面的同時具有側面9〇。 與該側面90各個之表背面間具有稜線9丨。 \ 對此’於本體1之接合具3係與本體突起按壓部3丨連設之 · 第3傾斜面32、與此連設之第2傾斜面33、進一步與此連設 之第1傾斜面34、及上面最下面35所構成。 首先，以上面最下面35作為基準考慮則，該上面最下面 35係，位於構成接合具3之本體之最下部之面，不問其為平 面或傾斜面。 例如，裡頭側即具有關節5之方向之接合具3係於載置光 ⑩ 罩基板9之際，於將光罩基板9滑入該接合具3之際，該光罩 基板9之稜線91觸及該面之下，沿著該面，依序沿著第丄之 傾斜面34乃至第3傾斜面32，可將光罩基板9引導至定位置。 接著孩上面最下面35之第1傾斜面34係由具有稍微傾斜 角之傾斜面所成，該光罩基板9之稜線沿著該面，進一步依 序Λ著第2傾斜面33、第3傾斜面32，可將光罩基板9引導至 定位置。 本圖所示第1傾斜面34之構成係約20度，惟並非限定於該鲁 角度者。 至少具有不與光罩面接觸且可將該光罩基板9引導至定 位置之角度即可。 接續該第1傾斜面34之箆2偭♦ ☆ 炙弟2傾斜面33係具有較第1傾斜面 34緩合之傾斜面，只要是至少光罩載置時不會觸及光罩s . 之％度之角度即可’只要是因應需要可將光罩面之稜線91 由下部支持之角度即可。 、 91310.doc -17- 200536760 於本圖將該第2傾斜面33係具有5度之傾斜角之構成，惟 並非限定於該角度者，只要具有適當最佳角度即可。 再者，以第3傾斜面32支持所有光罩面之稜線面之情形， 無需由下部支持。 其次，雖接續該第2傾斜面33具有第3傾斜面32，該傾斜 面係與光罩基板9之稜線面91接觸之面，具有與略光罩基板 9之稜線面91之角度同樣的角度為最佳。 例如兩者之角度為一致之情形正是第3傾斜面32與光罩 基板9之稜線面91面接，於該部分成支持光罩基板9者。 再者’即使疋稍微相異之角度，可以第3傾斜面3 2與光罩 基板9之棱線面91之一部分或以棱線面之角部支持光罩基 板9之情形，稍微相違係充分可容許者。 於本圖所示第3傾斜面32之傾斜角度係表示以約5〇度構 成之例，惟原本只要係具有40度乃至60度左右之傾斜角 者即可，例如為45度等角度當然亦可。 因此’至少適合光罩基板9之稜線面91之角度即具有與光 罩基板9之稜線面91之角度相同或該角度之加減15度前後 程度之範圍内之角度之傾斜角度者即可。 其-人’蓋體2之蓋體接合具4係，連設於蓋體接合具基部 41具有曲線面42，於該曲線面與光罩基板之稜線面接觸之 部分420作成肉厚形狀，於與此連設之部分具有薄肉厚部之 繞曲部43以構成。 因此’於接觸光罩基板9之稜線面91之部分，該蓋體接合 具4 ’成難以變形者，藉由連接於此之繞曲部43，成經由彈 91310.doc -18- 200536760 力由上部按壓光罩基板9之稜線面9 1者。 此事係’作為按壓構件使用蓋體接合具4之情形例如使用 稍微軟質之樹脂構件則，與光罩基板9之稜線面9丨接觸之部 分由於按壓構件會凹陷，該凹陷部分之兩端方向面變形易 成突出形狀，有不小心與光罩基板9之面接觸之可能性，並 非沒有藉此污染或傷及光罩面之虞，各可防止所關弊端。 因此’於光罩基板9之四隅施以索引標記93之情形該等蓋 體接合具4亦不會接觸。 圖5係’圖4所示本體丨之接合具3之上面圖。 如示於本圖於圖4所示接合具3係呈略l字形狀，於該略L 子之兩突出部各個向一定方向具有傾斜面3〇即本體突起按 壓部31、第3傾斜面32、第2傾斜面33、第丨傾斜面34、上面 最下面35，可於該方向接合載置之玻璃基板9之稜線面9ι。 圖6係，圖4之側面圖，於略1字形狀之各個之突出部，由 其兩端部方向具有本體突起按壓部31、第3傾斜面32、第2 傾斜面33、第1傾斜面34及上面最下面35。 因此，光罩基板9之角部剛好成載置於該兩本體突起按壓 4 31之間，光罩面9不會接觸該接合具3之同時，可以一個 接合具3進行兩方向的位置限制。 圖7係表示圖4所示本體丨之接合具3之底部方向之形狀之 圖’係表示本接合具之一例之圖。 例如於本體具有接合嵌人用接合突起之情形，藉由於接 合具3之底部具有钱入孔38,可將接合具3配設於本體五的同 時如本圖所示於三處敌人則可防止接合具3之偏移或微動。 91310.doc 200536760 圖8係本體之接合呈 丧口具之剖面圖，而圖9係表示圖4之其他側 面圖。 _表示本⑴之接合具3之其他例之圖，係於略L字形 Μ’之各们之大出部，由其兩端部方向由本體突起按壓部 31、第3傾斜面32、篦^ 弟2頂斜面33、及上面最下面35所成之 構成。 如此構成，亦可有效地保持光罩基板9，更不會觸及光罩 面。 圖11係，表示本體丨之接合具3之其他例之圖，係於略1 子幵y狀之各個之突出部，由其兩端部方向由本體突起按壓 部31、第3傾斜面32、及第2傾斜面33所成之構成。 如此構成，亦可有效地保持光罩基板9，更不會觸及光罩 面。 因此，圖4所示構成為最佳惟並非限定於此者，至少只要 有可有效地保持光罩基板9之本體突起按壓部3丨，及應予光 罩基板9之稜線面接觸之第3傾斜面32者即可。 圖12係表示取代略l字形狀之接合具之各個之突出部，將 其各別分斷為兩個略棒狀之接合具3以大致9〇度相對配設 之狀態之圖。 略L字型狀之接合具，藉由製造成本或製造步驟可簡單地 製造’惟並非限定於此者，於本圖所示分斷之兩個接合具3 以大致90度相對配設者亦可。 於此情形亦同樣地於各個之接合具3具有本體突起按壓 部31、第3傾斜面32、第2傾斜面33、第1傾斜面34及上面最 91310.doc -20- 200536760 下面35者最佳，惟並非限定於此，由本體突起按壓部3工、 第3傾斜面32、第2傾斜面33及上面最下面35所成者，或具 有本體突起按壓部31、第3傾斜面32者亦可。 圖13係，圖12之側面圖，表示具有本體突起按壓部31、 第3傾斜面32、第2傾斜面33'第丨傾斜面34及上面最下面35 之構成。 圖14係代替略L字形狀之接合具3之各個之突出部，以俯 視略四角形狀構成之其他例之圖。With serious damage. In view of this, as a structure that can prevent contact with the photomask substrate and also prevent the photomask substrate from being shifted during storage, JP 2000-222992 is provided. The mask supporting system of the bonding tool includes a number of holding branches, and the part is placed on the structure. For the bonding tool, a bonding tool having an inclined surface is used, and the bonding system in the direction of the opening of the body will be inclined toward the center of the joint.胄 It is arranged in a gradually lowering manner, and the engaging device in the inner direction is arranged in such a manner that the inclined surface is gradually lowered toward the opening portion. Let's set a mask box that presses the ridge line part of the mask from the up-down direction and the front-back and left-right direction when the cover is closed. [Patent Document 1] JP 2001-301877 [Patent Document 2] JP 2003-222992 [Problems to be Solved by the Invention] First, JP 2001-301877 refers to contact with a hat portion as a contact portion with a photomask Those with a small positive face, but at least those who will contact the mask surface, cannot avoid pollution or damage to the part. 91310.doc 200536760 The substrate of the photomask is placed in light. The mask protection means that it will be further extended, for example, at the index mark portion where the mask film is applied, and it will be supported by the point of the hat. When the impact is caused during transportation, the inner mask will be shaken, and the branch will be offset. Risk. . Therefore, the contact area of the hat part may be enlarged due to the displacement, and not only may it be damaged, but it may come into contact with the positioning member such as a rib or the holding branch part of the photomask substrate, and dust may be generated due to the back scraping of this part. Risk. In this regard, JP 2003_222992 is different from this. The ridge line portion of the mask is formed from the up and down direction by the joint with an inclined surface. It is formed by pressing M in the front and back and left and right directions. Therefore, it does not contact the surface portion of the mask. In addition, since the inner mask is pressed from the up-down direction to the front-left-right direction and is difficult to be shaken when being transported, it will not be in contact with the mask surface even if the offset is offset from the contact portion of the ridgeline portion of the mask. Renmin, those who are positioned at the joint position from a total of 8 points in the forward, backward, leftward, and rightward direction, although the mask can be prevented from shifting to a certain degree of impact, but the mask is shifted if it is shaken with great force Risk. Also, "the pressing direction in the front-back direction is 4 places above and below, and the pressing direction in the left-right direction is 4 places above and below." There may be some deviations in the tilt direction. Therefore, in the case of extreme shaking, it may come into contact with a positioning member such as a fin or a bonding tool for positioning the reticle substrate, and the fin or the bonding tool may be ground to generate dust. Further, in a case where a bonding member having an inclined surface presses a ridge portion of the photomask 91310.doc 200536760 / • month / in the case of using a soft member in the 4 bonding device, the inclined surface is depressed by a pressing force to close the cover, although the slightly inclined surface There is a risk of touching the mask surface. Therefore, there is a possibility that it may come into contact with the prime mark applied to the end of the mask surface. "Specifically, regarding photomasks, when manufacturing semiconductor devices or liquid crystal display devices, they require extremely fine patterns. Therefore, the existence of extremely fine dust compared to previous ones has become a problem. Furthermore, it is required to reduce the surface of the photomask as much as possible. -That is, those who apply a mask pattern on the mask substrate are not allowed to have wood on the pattern surface, or a blank substrate of the mask substrate before the patterning of the mask substrate is required to have a flat surface. And smoothness, it must not be contaminated soil. Especially for LSI blank substrates, in addition to the light-shielding structure of the light-shielding film, there are surface reflection structure, low reflection structure on the front and back, the low-reflection film is made of oxidation The interference caused by the network reduces the reflectance. For such M white substrates, due to the extreme disgust, the bad surface pollution system can be accessed from the outside of the end surface. Therefore, such substrates must be stored in a photomask box in a clean room. Use certified finger cots or gloves that do not touch the end face. After storage, it is required not to touch the end face. At the same time, it is necessary to prevent the vibration caused by the accompanying sun guard. Some measures to generate dust by cutting off a part of the container by the micro-movement of the substrate require that any photomask substrate in the state of the blank substrates and the state in which the photomask pattern is applied must avoid the occurrence of dust in the container. Further, not only A blank substrate or a mask substrate with a mask pattern. The mask protective film 孓 part, including the mask with the index mark. The beauty plate 91310.doc 200536760 ^ outside the surface and the back surface will not touch the structure [Summary of the Invention] [Means for Solving the Problems] The present invention is intended to solve the above-mentioned problems, and it can be stored without contacting the surface portion of the photomask substrate, and can suppress the micro movement of the photomask substrate when J is controlled during storage. Photomask box. The invention related to item 1 of the scope of patent application is a kind of light M, which is characterized in that it can be placed in a photomask box containing a photomask substrate with a body and a cover closing the body opening. The bonding tool for bonding the photomask substrate is provided on the photomask base: at each angle σ | 5 direction ', the bonding tool of the interface photomask substrate is placed in two directions near one corner of each of them The bonding device has an inclined surface suitable for the ridge line surface of the photomask substrate, and the above-mentioned problems can be solved by the related invention. It is also stated that the invention related to the second item of the patent scope is a photomask box, which is characterized by a cover body A cover bonding tool with a cover body is connected to the interface device of the main body. After the photomask substrate is mounted, the photomask substrate is pressed from the upper part. The cover bonding device is provided with a curved surface so that the curved surface and the light are connected. The part where the ridge line surface of the cover substrate is in contact with the flesh is thick, and the part which is connected to this has a slightly thin flesh, and the above-mentioned problem can be solved by the related invention. Second, the invention related to the third item of the scope of patent application The invention relates to a combination of inventions related to the first and second patent applications, which is a photomask box characterized in that a bonding system for bonding a photomask substrate is placed in the body and has corners of the photomask substrate. At the same time, the bonding tool for bonding the photomask substrate is placed in two directions in the vicinity of each corner, and each of the bonding tools has an inclined surface suitable for the ridge line surface of the photomask substrate, and a cover bonding tool for the cover body. There is a curved surface connected to 91310.doc 10-200536760: the body joint σ has a base portion, and the body has a portion where the curved surface is in contact with the ridge line surface of the photomask substrate, and the connected portion has The cover bonding tool of the cover body with a thin and thin and thick curved portion is placed on the interface of the main body, and the photomask substrate is bonded to the photomask box by closing the cover. The photomask can be stored according to the related invention. Prevent misalignment, fretting, etc. of the stored photomask substrate. In this it shape, the invention related to item 4 of the scope of patent application is a rib arranged side by side on the inclined surface of the body with /, whai interface, the angle of the rib to the mounting direction of the photomask substrate is relatively, The inclination angle of the inclined surface of the 5H1 jig having an inclined surface suitable for the ridgeline surface of the photomask substrate is steep, and the rib is arranged at a position that will not contact at least the photomask substrate at the placement position. The related invention can prevent contact between the photomask and the ribs during storage. In addition to the above, as in the invention related to item 5 of the scope of the patent application, the joint eight series is a slightly L-shaped joint, and the two ends of each protrusion constituting the L-shape have a body protrusion pressing part At the same time, a mask box with an inclined surface that couples the ridge line surface of the mask substrate, or the invention as described in item 6 of the scope of the patent application, has a body protrusion pressing portion at both ends of the protruding portion, and has a suitable structure for the mask substrate. The third inclined surface of the ridge line, and the second inclined surface having a gentler angle than the first inclined surface is connected to the third inclined surface, and the second inclined surface may also be provided on the second inclined surface as the invention related to item 7 of the patent application scope. If the surface has a first inclined surface at an angle Γ7 from the second inclined surface, or the invention is related to the eighth aspect of the patent application, the adapter is connected to the first inclined surface and has a top and bottom mask box. Or if the invention related to item 9 of the patent application replaces the slightly L-shaped joint 91310.doc 200536760, it is also possible to use a joint that has two slightly rod-shaped joints arranged at approximately 90 degrees. In addition, if the invention related to item 10 of the patent scope of the patent application can be used instead of the L-shaped adapter, a mask box with a slightly quadrangular adapter is used, and the two sides of the adjacent slightly quadrangular shape constitute a protruding protrusion of the body. The inclined surface provided next thereto has an inclined surface suitable for the ridgeline surface of the mask substrate. [Effects of the invention] Since the bonding device is in contact with the ridge surface of the photomask substrate to maintain the bonding, the bonding device can mount the bonding photomask substrate without touching the photomask substrate, and it has light before patterning. Either the so-called blank substrate of the cover substrate or the patterned photomask can prevent the first effect of damage or contamination caused by the contact between the bonding tool and the surface of the photomask substrate. In addition, by using the photomask box of the adapter related to the present invention, the photomask substrate to be stored can be pressed in two directions at one corner, and one photomask substrate can be pressed in eight directions, and the photomask substrate can be prevented. The second effect of shifting or fretting during storage. This is to prevent contact with a part of the container _ body due to the edge movement or slight movement of the photomask substrate, and to grind the part to generate dust, which can prevent the dust in the photomask box from attaching to it. Photomask substrate to prevent damage to the photomask substrate. Furthermore, by using the cover's light cover box used in the cover of the present invention, it is possible to prevent the cover substrate from pressing the cover substrate when the cover is closed. The deformation of the cover bonding tool near the contacting portion has a third effect of preventing contact with the mask substrate surface due to the deformed portion of the cover bonding tool 91310.doc -12- 200536760. [Embodiment] [Best Mode for Carrying Out the Invention] Next, an example of the best mode of the present invention is shown in FIG. The state of the display element First, in order to store or transport the masks 9 for the mask substrate 9 used to make "+ conductor 70 pieces or liquid crystal storage pieces, etc., too, this is the same ^ This figure shows the state that the mask 9 is closed. That is, a photomask box is a photomask substrate used for storage or transportation in a manufacturing process of a semiconductor substrate circuit, for example, a photomask substrate used in a lithography step of a semiconductor element or a liquid crystal display device, etc., before patterning. The so-called blank substrate of the mask substrate or the patterned mask. In the structure shown in this figure, the cover 2 is closed in a state in which the mask 9 is stored. In this case, the mask in the mask box That is, the main body 丄 a little [step 4 of the letter-shaped adapter 3 to place the photomask 9]. Since the adapter 3 has an inclined surface 30, the inclined surface 30 and the edge portion of the photomask 9 are "contacted." Therefore, the position of the mask 9 is restricted by the joint 3 while the four parts of the main body 1 'the mask 9 are pressed from two directions, that is, from the side direction to the center direction, and from the opening or joint direction to the center portion. . Furthermore, the body has ribs 7. Further, the cover body 2 is provided with a cover body joint tool 4 in parallel with the wall portion having the opening portion and the two wall portions having the joint portion. When the cover body is closed, the light is pressed from the upper direction. Hood 9. At this time, the carcass bonding tool 4 also has the inclined surface 40, so that the inclined surface 91 contacts the ridgeline portion 91 of the mask 9 at the inclined surface 91310.doc -13 · 200536760. Therefore, neither the front surface nor the back surface of the photomask 9 is in contact with the bonding tool 3 and the cover bonding tool *, and only contacts the ridgeline part 91 of the photomask 9. A person hunts this and becomes a person who can store and hold in the box without touching the front and back surfaces of the mask 9 at all. This matter, regardless of the patterning of the photomask 9, although it is necessary to use the photomask in the case of using the photomask, in the previous relationship with the bonding device, it is required that only the patterned part be made without contact, but In the current situation, there are also cable bows, and the index marks are also patterned. They are applied to the surface of the mask. Therefore, it is necessary to avoid any contact with these parts. 々 In particular, the size of the mask or the blank range, the range of the pattern surface, etc. are eve species, and considering manufacturing errors, etc., all parts of the back surface of the mask cannot be connected to the box. With contacts, this is done with this composition. Furthermore, the main body bonding tool 3 can press the ridgeline 91 of the mask 9 in the direction of the center portion from 8 directions, and the mask 9 in the box is bonded there to prevent deviation. This is to prevent the light mask in the box from moving slightly. That is, it is necessary to prevent the micro movement of the storage mask substrate 9 caused by the shaking of the storage mask substrate 9 during the storage or storage of the box, and to make the bonding tools 3, 4 or ribs 7 of the box contact the storage mask substrate 9, As a result, the joints 3, 4 of the box, and the ribs 7 are ground to generate dust, but this structure can completely prevent these. At present, under the current situation of preventing fine dust that cannot be seen, and struggling on the surface of the mask, preventing the extremely fine dust cut by the vibration of the mask 91310.doc • 14- 200536760 The generation of dust is prevented Defects caused by dust adhering to the light-shielding film surface of the photomask and the photoresist film on the photomask protective film. Fig. 2 is a view showing a state in which the cover body 2 of the photomask box is opened and the body 丨 is visually recognized; In the direction of the opening portion of the slide plate 6 with the body 1 and the photomask substrate 9 is placed, two corner portions of the photomask substrate 9 are provided with bonding tools 3, and the photomask substrate 9 is further oriented in the direction of the joint 5. The two corner portions of the mask substrate 9 in the case of mounting are also provided with bonding tools 3. At this time, the mask substrate 9 is bonded by the L-shaped bonding tool 3, and the L-shaped bonding tool 3 is formed by forming the upper surface of each protruding portion as an inclined surface 30 so as to be inclined The surface 30 is in contact with the ridgeline portion 91 of the mask 9 so that the reticle substrate 9 can be joined by the ridgeline portion 91. In addition, by arranging each of the photomask substrates 9 and 4 in this manner to determine the position, it is possible to reliably position and place it. At this time, the mask is pressed at a total of eight places, and even if the case is shaken, the mask base plate 9 does not shift or shake on the bonding tool 3. In addition, ribs 7 are provided at the two ends of the mask substrate 9 from the direction of each wall portion of the main body 1 to the central direction. The mask substrate 9 is placed with a total of eight ribs 7. We confirm indication person. Therefore, the ribs 7 shown in the figure are arranged in such a manner that they do not contact the photomask substrate 9 during storage, especially for the convenience of inserting and removing the figure, and further increasing the strength of the body. The arrangement position of the rib 7 shown in the figure is an example, and is not limited to the position and the like in the figure, but at least it needs to be arranged in a manner that does not contact the photomask substrate 9 during storage 91310.doc -15- 200536760 . A mask pattern portion 92 is provided on the central portion of the surface of the mask substrate 9, and a mask protection film is provided on this portion, and an index mark 93 is attached to the four corners. Figure 3 is an example of the state. Figure 3 is a diagram showing a state in which the inner surface of the cover joint assembly 4 of the cover 2 is exposed. The cover 2 of the photomask box is opened. First, the cover 2 is closed. In the case where a ridge line 91 of the mask substrate 9 placed on the body contacts each other, a lid bonding tool 4 is provided, and the lid bonding tool 4 is disposed in a direction opposite to the ridge 91 of the built-in mask substrate 9. This carcass bonding tool 4 is formed by an upper surface of which is an inclined surface 40, and the inclined surface 40 is in contact with the ridge line 91 of the mask substrate 9. The cover joint assembly 4 shown in the figure is arranged one by one at the same time as the two side walls of the box parallel to the wall portion of the opening direction of the closed slide guide path 61 having the cover 2 It is arranged in the direction of the two side walls of the box in which the wall part of the joint direction of the joint with the cover 2 is parallel. Therefore, the cover bonding tool 4 is provided in the cover 2 in total, and when the cover 2 is closed, the ridge 91 of the photomask substrate 9 is pressed by the cover bonding tool 4 from the upper direction to prevent the Offset or nudge. The arrangement or direction of the lid joint tool 4 shown in the figure is an example of the present invention, and is not limited to the form shown in the figure. FIG. 4 is a cross-sectional view showing a state where the photomask substrate 9 is joined by the bonding tool 3 of this embodiment and the bonding tool 4 of the cover 2, and shows that the substrate 9 is first placed on the inclined surface 30 of the main body r bonding tool 3, and The mask substrate 9 is pressed by the lid bonding tool 4. 91310.doc • 16-200536760 Firstly, the photomask substrate 9 series has a front surface and a back surface and a side surface 90. There are ridge lines 9 丨 between the front and back surfaces of each of the side surfaces 90. \ To this', the joint 3 on the main body 1 is connected to the main body pressing part 3 丨 the third inclined surface 32, the second inclined surface 33 connected to this, and the first inclined surface connected to this 34, and the top and bottom 35. First, considering the uppermost lower surface 35 as a reference, the uppermost lower surface 35 is located on the lowermost surface of the body constituting the jig 3, regardless of whether it is a flat surface or an inclined surface. For example, when the bonding tool 3 with the joint 5 in the direction of the back side is mounted on the mask substrate 9, when the mask substrate 9 is slid into the bonding tool 3, the ridgeline 91 of the mask substrate 9 touches Below this surface, along this surface, along the first inclined surface 34 to the third inclined surface 32 in order, the photomask substrate 9 can be guided to a fixed position. Next, the first inclined surface 34 of the uppermost bottom 35 is formed by an inclined surface having a slight inclination angle. The ridge line of the photomask substrate 9 is further along this surface, and the second inclined surface 33 and the third inclined surface are sequentially Λ. The surface 32 can guide the photomask substrate 9 to a predetermined position. The structure of the first inclined surface 34 shown in this figure is about 20 degrees, but it is not limited to the Lu angle. It is sufficient to have at least an angle that does not make contact with the mask surface and can guide the mask substrate 9 to a fixed position.箆 2 偭 that follows the first inclined surface 34 ♦ ☆ The second inclined surface 33 has an inclined surface which is gentler than the first inclined surface 34, as long as it is at least not to touch the photomask s when the photomask is placed.% The angle of degree can be used as long as it is an angle that can support the ridgeline 91 of the mask surface from the lower part according to the needs. 91310.doc -17- 200536760 In this figure, the second inclined surface 33 has a structure having an inclination angle of 5 degrees, but it is not limited to this angle, as long as it has an appropriate optimal angle. In addition, when the ridge surface of all the mask surfaces is supported by the third inclined surface 32, it is not necessary to support it by the lower portion. Next, although the second inclined surface 33 has a third inclined surface 32, the inclined surface is a surface contacting the ridgeline surface 91 of the mask substrate 9 and has the same angle as the angle of the ridgeline surface 91 of the mask substrate 9 For the best. For example, when the angles of the two are the same, it is the third inclined surface 32 that is in contact with the ridgeline surface 91 of the mask substrate 9, and the mask substrate 9 is supported at this portion. Furthermore, even if the angles are slightly different, the third inclined surface 32 and a part of the ridgeline surface 91 of the mask substrate 9 or the corner substrate of the ridgeline surface can be used to support the mask substrate 9, which is slightly inconsistent. Permissible. The inclination angle of the third inclined surface 32 shown in the figure is an example of a structure consisting of about 50 degrees. However, as long as it has an inclination angle of about 40 to 60 degrees, for example, an angle such as 45 degrees is of course also can. Therefore, the angle 'at least suitable for the angle of the ridgeline surface 91 of the mask substrate 9 is an inclination angle having the same angle as the angle of the ridgeline surface 91 of the mask substrate 9 or an angle within the range of plus or minus 15 degrees. Its-human 'lid body 2 has a lid bonding tool 4 series, which is connected to the lid bonding tool base 41 and has a curved surface 42. A portion 420 of the curved surface that is in contact with the ridge line surface of the photomask substrate is made into a thick shape. The part connected to this has a thin-meat thick-rolled portion 43 to constitute. Therefore, at the portion contacting the ridgeline surface 91 of the photomask substrate 9, the cover joint 4 becomes a person who is difficult to deform, and is connected to the winding portion 43 to form a force through the spring 91310.doc -18- 200536760. The ridge line surface 91 of the photomask substrate 9 is pressed on the upper side. This is the case where the cover adapter 4 is used as the pressing member. For example, if a slightly soft resin member is used, the contact portion of the reticle surface 9 丨 of the photomask substrate 9 will be depressed, and both ends of the depressed portion will be oriented. The surface deforms easily into a protruding shape, and there is a possibility of accidentally coming into contact with the surface of the mask substrate 9, which is not without contaminating or hurting the mask surface, and each can prevent the related disadvantages. Therefore, when the index mark 93 is applied to the four corners of the photomask substrate 9, the cover jigs 4 will not touch. Fig. 5 is a top view of the joint 3 of the main body 丨 shown in Fig. 4. As shown in this figure, the coupling device 3 has a slightly l-shape. Each of the two protruding portions of the slightly protruding portion has an inclined surface 30 in a certain direction, that is, the main body pressing portion 31 and the third inclined surface 32. The second inclined surface 33, the first inclined surface 34, and the uppermost lower surface 35 can be bonded to the edge surface 9m of the glass substrate 9 placed in this direction. FIG. 6 is a side view of FIG. 4, and each of the protrusions having a substantially letter shape has a body protrusion pressing portion 31, a third inclined surface 32, a second inclined surface 33, and a first inclined surface in the direction of both ends. 34 and top bottom 35. Therefore, the corner portion of the photomask substrate 9 is just placed between the two body projections 4 31, and the photomask surface 9 does not contact the bonding tool 3, and the position of the bonding tool 3 in both directions can be restricted. Fig. 7 is a view showing the shape of the bottom direction of the joint 3 of the main body 丨 shown in Fig. 4 'is a view showing an example of the present joint. For example, in the case where the main body has an engaging protrusion for engaging and embedding, since the bottom of the engaging tool 3 has a money insertion hole 38, the engaging tool 3 can be arranged on the main body 5 and at the same time, as shown in this figure, it can be prevented from three enemies. Offset or slight movement of the jig 3. 91310.doc 200536760 FIG. 8 is a cross-sectional view of the joint of the body, and FIG. 9 is another side view of FIG. 4. _ Is a diagram showing another example of the joint tool 3 of the present invention, which is a large out part of each of the L-shaped M ′s, and the pressing part 31, the third inclined surface 32, and Brother 2 has a top slope 33 and a top bottom 35. With this configuration, the photomask substrate 9 can be effectively held without touching the photomask surface. FIG. 11 is a view showing another example of the joint 3 of the main body 丨, which is a protrusion part of a shape substantially y, and the pressing part 31, the third inclined surface 32, And the second inclined surface 33. With this configuration, the photomask substrate 9 can be effectively held without touching the photomask surface. Therefore, the structure shown in FIG. 4 is the best but not limited to this, at least as long as there is a body protrusion pressing part 3 丨 which can effectively hold the photomask substrate 9 and a third part which should be in contact with the ridge line surface of the photomask substrate 9 Only the inclined surface 32 is required. Fig. 12 is a view showing a state in which each of the protruding parts in the shape of a substantially L-shaped fitting is divided into two substantially stick-shaped fittings 3 at a relative angle of approximately 90 degrees. The L-shaped joint can be easily manufactured by manufacturing cost or manufacturing steps, but it is not limited to this. The two joints 3 that are divided as shown in this figure are arranged at approximately 90 degrees. can. In this case, similarly, each of the joints 3 has a body protrusion pressing portion 31, a third inclined surface 32, a second inclined surface 33, a first inclined surface 34, and the uppermost part 91310.doc -20- 200536760. It is good, but not limited to this, the body protruding pressing part 3, the third inclined surface 32, the second inclined surface 33, and the uppermost bottom 35, or the body protruding pressing part 31, the third inclined surface 32 Yes. Fig. 13 is a side view of Fig. 12 showing a structure including a body protrusion pressing portion 31, a third inclined surface 32, a second inclined surface 33 ', an inclined surface 34, and an uppermost lower surface 35. Fig. 14 is a diagram showing another example of a configuration having a substantially quadrangular shape in plan view in place of each of the protruding portions of the L-shaped adapter 3;
如此構成，亦同樣地具有本體突起按壓部3丨、第3傾斜面 32、第2傾斜面33、第1傾斜面34及上面最下面35,可於光 罩基板9之稜線91接合。 此情形，例如曲折部39具有角以構成之情形，或者具有 圓角以構成者亦可，只要具有對應光罩基板之角部之圓角 度之圓角度者則，於載置時可體裁佳地設置之同時，可防 止偏移或微動。This structure also has the body protrusion pressing portion 3 丨, the third inclined surface 32, the second inclined surface 33, the first inclined surface 34, and the uppermost surface 35, and can be joined to the ridgeline 91 of the mask substrate 9. In this case, for example, the zigzag portion 39 may be formed with corners, or may be formed with rounded corners. As long as it has a rounded angle corresponding to the rounded angle of the corner portion of the photomask substrate, it may be well-formed when placed. At the same time of setting, it can prevent shifting or fretting.
具有與原本之光罩基板之角部之圓角度相異之圓角度者 亦可。 者’例如光罩基板將角部以圓形狀構成之情形，有方 角部之—部分產生不接觸之部分，但由於可由其他部分名 持與弟3傾斜面接觸之部分故可以不動狀態保持於定位置 ;本圖所不h形亦至少只要具有本體突起按壓部3卜 傾斜面32者即可。 圖15係表示圖14之側面圖。 藉由如此構成’可以請斜面32與光罩基板9之棱線面 91310.doc 21 · 200536760 91接觸之狀態保持之同時，於光罩基板9之表背面呈無任何 接觸者。 此情形例如圖16所示別於光罩基板9之角部之圓形狀，於 全體以略弧狀構成本體突起按壓部31與傾斜面3〇者亦可。 圖17係表示本體之肋片7與本體丨之接合具3之位置關係 之一例之圖。 光罩基板9之稜線面91係與本體丨之接合具3之第3傾斜面 32接觸，藉由第2傾斜面33於光罩基板9之間具有一定間隔。 此情形，本體突起按壓部31與光罩基板9具有一定間隔W。 再者，雖明示肋片7惟該肋片7係光罩基板9之載置處之明 示之同時，於光罩基板9向容器内載置之際可圖方便，但是 先前係因該肋片7之震動與偏動之光罩基板9接觸而削磨， 產生成為塵埃之削邊，附著於光罩保護膜之虞高者。It is also possible to have a circular angle different from the circular angle of the corner of the original mask substrate. For example, in the case where the corner portion of the photomask substrate is formed in a round shape, there are square corners—parts that are not in contact with each other. However, since the parts that are in contact with the inclined surface of the brother 3 can be held by other parts, they can be kept stationary. Position; this figure does not need to be h-shaped, at least as long as it has a body protrusion pressing portion 3 and an inclined surface 32. FIG. 15 is a side view showing FIG. 14. With this configuration, while maintaining the contact state between the inclined surface 32 and the ridge line surface of the mask substrate 9, 91310.doc 21 · 200536760 91, there can be no contact on the front and back surfaces of the mask substrate 9. In this case, for example, as shown in FIG. 16, a circular shape different from a corner portion of the photomask substrate 9 may be used, and the body protrusion pressing portion 31 and the inclined surface 30 may be formed in a slightly arc shape in the entirety. Fig. 17 is a diagram showing an example of the positional relationship between the ribs 7 of the main body and the joint 3 of the main body. The ridgeline surface 91 of the photomask substrate 9 is in contact with the third inclined surface 32 of the joint 3 of the main body 丨, and the second inclined surface 33 has a certain interval between the photomask substrates 9. In this case, the body protrusion pressing portion 31 and the photomask substrate 9 have a certain interval W. Furthermore, although the fin 7 is explicitly shown, the fin 7 is a place where the photomask substrate 9 is placed, and it is convenient and convenient when the photomask substrate 9 is placed in the container. The vibration of 7 and the deflected mask substrate 9 are in contact with each other and are ground, resulting in a shaved edge that becomes dust and attached to the mask protective film.
相對於本圖所示肋片7具有約85度之角度，本圖之第3傾 斜面32係具有略45度乃置50度左右之角度，於兩者之上部 部分雖具有力光罩冑置方向之一點一致之部>，於載置光 罩基板9之高度角度陡之肋片7,由光罩基板9具有距離，即 使假如光罩基板9因震動等而偏動，仍可藉由第3傾斜面U 抑制向肋片方向移動，故於載置光罩基板9時不會與肋片7 接觸，可防止塵埃之產生。 再者，不僅藉由第3傾斜面32可充分容許光罩基板9之製 造時尺寸誤差等者，於此情形亦可防止與肋片7之接觸。 【圖式簡單說明】 圖1表示關閉關於本發明之光罩盒之蓋體之狀態之一實 91310.doc -22- 200536760 施形態之圖。 圖2係表示將圖1之光罩盒之蓋體開啟，視認本體之狀態 之圖。 圖3係表示將圖1之蓋體開啟，視認蓋體之狀態之圖。 圖4係表示光罩基板藉由本體之接合具與蓋體之接合具 所接合之狀態之一例之剖面圖 圖5係示於圖4之本體之接合具之上面圖。 圖6係示於圖4之本體之接合具之側面圖。 圖7係表示示於圖4之本體之接合具之底部方向之形狀之 圖。 圖8係示於圖4之本體之接合具之剖面圖。 圖9係示於圖4之本體之接合具之其他側面圖。 圖10係表示本體之接合具之其他之一例之圖。 圖11係表示本體之接合具之其他之一例之圖。 圖12係表示本體之接合具之其他之一例之圖。 圖13係示於圖12之本體之接合具之側面圖。 圖14係表示本體之接合具之其他之一例之圖。 圖15係示於圖12之本體之接合具之側面圖。 圖16表示本體之接合具之其他之一例之圖。 圖17係表示本體之肋片與接合具之位置關係之一例之 圖。 【主要元件符號說明】 1 本體 2 盍體· 91310.doc -23- 200536760 3 接合具 4 蓋體接合具 5 關節 6 關閉滑板 7 肋片 9 光罩基板 30 傾斜面 31 突起按壓部 32 第3傾斜面 33 第2傾斜面 34 第1傾斜面 35 上面最下面 39 曲折部 40 傾斜面 41 蓋體接合具基部 42 曲線面 43 繞曲部 61 關閉滑板導通路 90 側面 91 稜線面 92 施以光罩圖案之部分 93 索引標記 420 肉厚部 91310.doc -24-Relative to the rib 7 shown in this figure, the angle of about 85 degrees, the third inclined surface 32 in this figure has an angle of slightly 45 degrees or about 50 degrees, although the upper part of the two has a force mask set The part where the direction is the same > The rib 7 on which the height angle of the photomask substrate 9 is placed is steep, and the photomask substrate 9 has a distance, even if the photomask substrate 9 is deflected due to vibration or the like Since the third inclined surface U is restrained from moving in the direction of the fins, it does not contact the fins 7 when the photomask substrate 9 is placed, and the generation of dust can be prevented. Furthermore, not only the dimensional error during the manufacture of the photomask substrate 9 can be sufficiently tolerated by the third inclined surface 32, but also the contact with the rib 7 can be prevented in this case. [Brief Description of the Drawings] FIG. 1 is a diagram showing a state of closing the cover body of the photomask box of the present invention. 91310.doc -22- 200536760 Fig. 2 is a view showing a state where the cover of the photomask box of Fig. 1 is opened and the main body is visually recognized. FIG. 3 is a view showing a state where the cover body of FIG. 1 is opened and the cover body is visually recognized. Fig. 4 is a cross-sectional view showing an example of a state in which a photomask substrate is joined by a bonding tool of a main body and a bonding tool of a cover. Fig. 5 is a top view of the bonding tool of the main body of Fig. 4. Fig. 6 is a side view of the jig of the main body shown in Fig. 4. Fig. 7 is a view showing a shape in the bottom direction of the adapter of the main body shown in Fig. 4; FIG. 8 is a cross-sectional view of the adapter of the main body shown in FIG. 4. FIG. 9 is another side view of the adapter of the main body of FIG. 4. FIG. FIG. 10 is a view showing another example of the bonding device of the main body. FIG. 11 is a diagram showing another example of the bonding device of the main body. FIG. 12 is a diagram showing another example of the bonding device of the main body. FIG. 13 is a side view of the adapter of the main body shown in FIG. 12. FIG. 14 is a diagram showing another example of the bonding device of the main body. Fig. 15 is a side view of the jig of the main body shown in Fig. 12. FIG. 16 is a view showing another example of the bonding device of the main body. Fig. 17 is a diagram showing an example of the positional relationship between the ribs of the body and the adapter. [Description of main component symbols] 1 Main body 2 Carcass · 91310.doc -23- 200536760 3 Jointing tool 4 Lid jointing tool 5 Joint 6 Closing slide 7 Rib 9 Photomask substrate 30 Inclined surface 31 Protrusion pressing part 32 Third inclination Surface 33 Second inclined surface 34 First inclined surface 35 Uppermost bottom 39 Zigzag portion 40 Inclined surface 41 Cover joint base 42 Curve surface 43 Curved portion 61 Close skateboard guide path 90 Side surface 91 Edge line surface 92 Portion with mask pattern 93 Index mark 420 Thick portion of meat 91310.doc -24-