CN102854739A - Photomask clamp of photomask box - Google Patents
Photomask clamp of photomask box Download PDFInfo
- Publication number
- CN102854739A CN102854739A CN2012102266960A CN201210226696A CN102854739A CN 102854739 A CN102854739 A CN 102854739A CN 2012102266960 A CN2012102266960 A CN 2012102266960A CN 201210226696 A CN201210226696 A CN 201210226696A CN 102854739 A CN102854739 A CN 102854739A
- Authority
- CN
- China
- Prior art keywords
- photomask
- light shield
- box
- resin
- tool
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Packaging Frangible Articles (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The invention aims at providing a photomask clamper of photomask box. The photomask clamper of the photomask box is used for storing or transporting photomask substrates in the photomask box. The photomask clamper is disposed in the photomask box firmly and is capable of not contacting with a photomask face. And the photomask clamp can prevent the generation of static electricity caused by the damges or shifts of the photomask. The photomask clamper of the photomask box provided by the invention includes resin substrates mixed with carbon. The resin substrates are arranged in the four corners on the inner surface of the photomask box. The substrates are provided with branch parts through bending arms. The branch parts are provided with projection parts in the direction of the upper surface and inclination face arranged on one sides of the projection parts. The photomask is carried on the branch parts by the inclination faces through edge lines of the photomask. And the bending arms bend downward, thereby retaining the photomask with elastic forces.
Description
Technical field
The present invention is a kind of in order to preserve or to carry the box for the manufacture of the light shield substrate of semiconductor element or liquid crystal display cells etc., and be the light shield locking tool about a kind of box for photomask, it can be placed in the box securely, and can not contact the light shield face and namely give the face of mask pattern or the surface before the patterning, and then can prevent the damaged of light shield or cause generation static by skew.
Background technology
In the past; about employed light shield substrate in the manufacturing step of SIC (semiconductor integrated circuit) etc.; such as in order to employed light shield substrate in photoengraving step of making semiconductor element or liquid crystal display cells etc. etc.; extremely repel the pollution of substrate surface; and about when preserving or carrying this light shield substrate, taking in its box for photomask, use its fundamental purpose to be to prevent to adhere to dust or produce scar etc. at the light shield substrate.
The light shield substrate is fine photomechanical production product; adhering to dust or produce scar etc. at the light shield substrate can become the defective of light shield and be reproduced on the photoresistance; if this light shield substrate is packed into like this in the microelectronic component; then can destroy the normal function of device; and because adhering to of dust caused great damage; therefore must get rid of all pollutants, and do one's utmost to prevent adhering to of dust.
Therefore, for example adopt following formation, namely make the regulation that the face that do not contact beyond the end face etc. is processed in the processing of light shield substrate, or when taking in, process carefully in order to avoid dust is attached on the light shield substrate, take in carefully in order to avoid dust enters in the box for photomask in addition, and then dust is entered in the box for photomask after taking in.
In addition, giving on the light shield substrate of mask pattern, by frame supported light shield cuticula namely on the optics take nitrocellulose as representative transparent film adhere to dust or produce scar at the mask pattern face preventing.
And then transparent conductive resin in the past produces harmful gas etc. sometimes, and a kind of material that replaces it must be provided, and particularly can prevent the resin material that adheres to by charged caused dust.
Consider conduction specific insulation this point or prevent the generation of harmful gas or long-term use etc. and require to use carbon.
Therefore, utilize carbon to give electric conductivity by the resin take polycarbonate as main body, can stop the generation of harmful gas and keep the conduction specific insulation reasonable value (E3～9 Ω), although very useful in this, but sneaking into of carbon uses quantitative change many on the contrary, and box for photomask particularly becomes fragile with the fastener of light shield substrate contacts and causes producing particulate etc.
Especially about fastener, even if having in the box for photomask of relatively glutinous material comprising high density polyethylene or Low Density Polyethylene or acrylic resin etc., also exist in order to prevent from producing particulate and making in the contact site office with the light shield substrate to lock the characteristic box for photomask of tool tool.
For example, be the light shield supporter as the locking tool of box for photomask, there is the constitutor shown in the Japanese Patent Laid-Open 2001-301877.
From the maintenance branch section of the outstanding necessary amount of inside surface of body and lid and at the member of this part mounting light shield substrate as the light shield supporter of this locking tool, keep branch section about this, announcement has the cadre and comprises the maintenance branch section of the platen section with clinoplane or have the maintenance branch section of cap section the cadre.
Perhaps, as in order to prevent and the formation that contacts and prevent the skew of light shield substrate when taking in of light shield substrate that Japanese Patent Laid-Open 2003-222992 or Japanese Patent Laid-Open 2005-321529 are arranged.
The formation relevant with Japanese Patent Laid-Open 2003-222892 is following box for photomask: use the locking tool with dip plane about this locking tool, the locking tool of the peristome direction of body so that the dip plane towards the box central part gradually the mode of step-down arrange, the locking tool of dark side direction so that the dip plane towards box peristome direction gradually the mode of step-down arrange, and then the locking tool of the peristome direction of lid so that the dip plane towards the dark side direction of box gradually step-down mode and arrange, the locking tool of the dark side direction of lid so that the dip plane towards the box central portion gradually the mode of step-down arrange, and when closed lid from above-below direction and the crest line part that left and right directions is pressed light shield in the past.
In addition, formation shown in the Japanese Patent Laid-Open 2005-321529 is a kind of box for photomask that locks tool that has, it is made of following box for photomask, this box for photomask is on each bight direction of light shield substrate, have in order to respectively near a bight along both direction mounting or press the locking tool that locks of light shield substrate, and this locking tool comprises the dip plane of the crest line face that is suitable for respectively the light shield substrate.
[patent documentation 1] Japanese Patent Laid-Open 2001-301877
[patent documentation 2] Japanese Patent Laid-Open 2003-222992
[patent documentation 3] Japanese Patent Laid-Open 2005-321529
Summary of the invention
[inventing problem to be solved]
At first, the electroconductive resin that utilizes carbon to give electric conductivity by the resin take polycarbonate as main body produces on harmful gas and the anti-long-term use this point very useful in prevention, the specific insulation that conducts electricity on the contrary can produce change because of the ratio of sneaking into of carbon, and the fragility of material itself also can produce change.
Therefore, require to use the polycarbonate resin with best conduction specific insulation.
Especially, make material show fragility because containing at least carbon, and must prevent from locking the light shield substrate the locking tool breakage or prevent from producing particulate and doing one's utmost to eliminate the thus skew of caused light shield substrate in box for photomask etc. in the contact portion that locks tool and light shield substrate.
When this situation, in Japanese Patent Laid-Open 2001-301877, to be made as cap section with the contact portion of light shield or have the platen section of clinoplane and do one's utmost to reduce surface of contact, but on this part, contact with the face of light shield at least, thereby the pollution of this part or to produce scar be inevitable.
Following possibility is especially arranged: become with cap section and support or support from four direction with the platen section with clinoplane, because the impact in when carrying etc. causes inner light shield to rock, so that light shield is from keeping the skew of branch section, thereby the surface of contact of cap section enlarges and contacts with each several part, produces dust because this part is subject to grinding.
Especially, the power that should suppress especially is the power that the blockade power by lid produces, but not is tight inhibition person regularly.
Therefore, in any case also can produce skew of light shield substrate etc.
Secondly, Japanese Patent Laid-Open 2003-222992 is different therewith, its be locking tool with dip plane from above-below direction forward after right and left press the formation of the crest line part of light shield, so for not contacting the surface portion person of light shield, because of from above-below direction forward after left and right directions press, be difficult to thus because of the impact in when carrying etc. inner light shield be rocked, even if produce in addition skew, can be because not contacting with the face of light shield with the contact portion skew of the crest line part of light shield yet.
In any case so also can produce a little skew in when carrying etc., can't negate to follow this skew and the possibility that partly produces dust at the crest line of light shield.
About Japanese Patent Laid-Open 2005-321529, it comprises have the locking tool that locks from both direction near a bight, and this locking tool has the formation of the dip plane of the crest line face that is suitable for respectively the light shield substrate, when comprising high density polyethylene or Low Density Polyethylene or acrylic resin etc. and have the situation of box for photomask of relatively glutinous material, can closely press and can under atomic thin levels such as skew, prevent the generation of particulate etc., if but the polycarbonate resin material that the carbon that has on the contrary not only hard but also crisp character is sneaked into then might produce particulate etc.
In addition, in this formation, exist the dip plane to have the formation of the deflection division of thin wall thickness, although also can realize preventing skew, in this formation, also leave the possibility that produces a little skew.
Therefore, can prevent that about preventing harmful gas and having charged suitable conduction specific insulation and anti-long-term use from namely adopting light shield box for photomask and the light shield substrate contacts of the polycarbonate resin that comprises more high-quality material to lock tool, expectation provides a kind of and prevents the skew of this light shield substrate and can prevent that the light shield of the box for photomask of dust locks tool.
[technological means of dealing with problems]
As mentioned above, box for photomask as the best, particularly lock tool as the light shield of box for photomask, the invention of technical scheme 1 is that the light shield that comprises the box for photomask of the resin of the conduction specific insulation about sneaking at least carbon and having 10 3 power to 10 power Ω locks tool; And this locking tool is included in four jiaos locking tool of the receivable light shield of receiving of mounting on each bight direction of four jiaos of inside surface of box for photomask, this locking tool locks the tool matrix from it and has a section via bend arm, have the jut of upper surface direction and be arranged on the dip plane of the one side of this jut in this one, by contacting and light shield is positioned in the section with the crest line of the light shield of mounting with the dip plane, and keep light shield by the direction deflection down of this bend arm with elastic force.
Can address the above problem by formation like this.
Perhaps, also can use the light shield of following box for photomask to lock tool as the invention of technical scheme 2: the front end of bend arm has the branch section of opening 90 degree towards 2 directions, have the jut of upper surface direction and be arranged on dip plane on the one side of this jut in each one, and contact and light shield is positioned in this one with the crest line on one jiao of both sides that are arranged on of the light shield that clips mounting respectively by each dip plane.
When this situation, also can use the light shield of following box for photomask to lock tool as the invention of technical scheme 3: the lower surface at bend arm has stop pin, when the bend arm deflection, the bottom surface sections of the front end in contact box for photomask by this stop pin or lock the further deflection that tool matrix bottom stops bend arm.
Replace this scheme, also can be as the invention of technical scheme 4 and give prominence to the formation stop pin at the transverse direction of bend arm, when the bend arm deflection, the locking tool matrix of the outshot contact box for photomask by this stop pin stops the light shield of box for photomask of the further deflection of bend arm to lock tool.
In addition, it can be the resin take polycarbonate as main body such as the resin of sneaking at least carbon as the invention of technical scheme 5, also can be the resin take ABS resin as main body such as the resin of sneaking at least carbon as the invention of technical scheme 6, also can be as using as the invention of technical scheme 7 with acrylic resin as the resin of main body as the resin of sneaking at least carbon.
Except these, also can be as using as the invention of technical scheme 8 with any one of fluororesin, polyphenylene oxide resin, cyclic olefin polymerization resin as the resin of main body as the resin of sneaking at least carbon.
In addition, also can be as using any one resin as main body with polyethylene terephthalate resin, polyvinyl resin, acrylic resin as the invention of technical scheme 9.
When these situations, about sneaking into the carbon to these resins, also can be as the invention of technical scheme 10 and use the carbon fiber person.
[effect of invention]
Because as above, consisting of, so can prevent that locking tool from the light shield of box for photomask and box for photomask produces harmful gas.
Therefore, the rotten or light shield cuticula iso-metamorphism of light shield itself can be prevented, the protection to the light shield substrate can be realized.
In addition, it is to have to prevent charged suitable conduction specific insulation person that the light shield of box for photomask of the present invention locks tool, not only can prevent the generation of particulate or adheres to, and also can prevent from being present in adhering to of airborne various dust-likes etc.
In addition, it is the person that sneaked into the material with carbon element that the light shield of box for photomask of the present invention locks tool, can improve intensity or permanance and has for a long time permanance.
Especially, strength increase when using the situation of this kind material and indurating, but can become fragile on the contrary, and might be by producing particulate with contacting of light shield substrate.
Therefore, follow in this and consist of light shield locking tool with bend arm and can have elastic force ground mounting light shield substrate, and control the fine motion of light shield and closely maintenance by the deflection of bend arm, and can closely contact with the light shield crest line with the dip plane of projection and be kept.
Thus, can prevent that causing light shield to lock tool by light shield produces scar, and can prevent particulate.
In addition, if mounting or when removing light shield the deflection of bend arm reach fixing above deflection, then can produce fracture or fracture, but can prevent fixing above deflection by stop pin, thereby can prevent the breakage of crooked arm.
Can bring into play aforesaid various useful effect by the present invention.
Description of drawings
Fig. 1 is the figure of an example of the expression box for photomask that uses locking tool of the present invention.
Fig. 2 is the figure of another example of expression locking tool of the present invention.
Fig. 3 is the sectional view of locking tool shown in Figure 2.
Fig. 4 is the front view of locking tool shown in Figure 2.
Fig. 5 is the figure of another example of expression locking tool of the present invention.
Fig. 6 is the side view of locking tool shown in Figure 5.
[explanation of symbol]
1 box for photomask body
2 box for photomask lids
3 hinge parts
4 lock tool
40 lock the tool matrix
41 bend arms
42 sections
43 juts
44 dip plane
45 stop pin
Embodiment
Fig. 1 is the routine person that the light shield of expression box for photomask of the present invention locks tool, and it is that each bight direction of the body interior of the box for photomask that opens and closes at the body 1 that can make via hinge 3 quadrilateral shape roughly and cap 2 has respectively the tool of locking.
That is four jiaos the light shield that, locks the receivable light shield of receiving of mounting on each bight direction of four jiaos that tool 4 is included in box for photomask locks tool.
In graphic, four jiaos of light shield are positioned in light shield and lock on the tool.
Therefore, in order in the processing of light shield substrate, not contact the face beyond the end face, and press the light shield that is accommodated in the box for photomask at four jiaos especially.
In addition, with regard to the generation that stops harmful gas and keep with regard to the aspect such as rational conduction specific insulation, this light shield locks the carbon that tool 4 comprises take polycarbonate as main body and sneaks into resin.
In addition, vessel 1 and lid 2 grades are also for comprising the member of the polycarbonate resin that carbon sneaks into.
Thus, can prevent from also getting rid of adhering to of few dust etc. etc. by charged and cause and adhere to dust.
On the contrary, the polycarbonate resin of sneaking into because of carbon is more crisp, must adopt special formation so lock tool.
That is, even if produce minimum vibrations during the box when carrying or processing contact or take in this light shield with the hard light shield or rock etc., between the locking tool that light shield contacts with it, lock tool and also can be scratched and cause producing particulate etc., must prevent from rocking or shaking.
Therefore, expectation can closely keep by elastic force.
With regard in this respect, locking tool 4 of the present invention is to comprise the special constitutor with these characteristics.
In addition, be not limited to polycarbonate, also can serve as reasons comprises the material institute constitutor that the carbon that can realize stoping the generation of harmful gas and keep the aspects such as rational conduction specific insulation is sneaked into resin.
Fig. 2 is the enlarged drawing of this locking tool 4, and it has the branch section 42 of opening 90 degree from locking tool matrix 40 via bend arm 41 towards both direction.
In addition, the upper surface direction at this this locking tool 4 has the jut 43 that has dip plane 44 towards the interior side direction of the branch section 42 of opening 90 degree.
In addition, though bend arm 41 root with branch section 42 is not illustrated, below direction have stop pin 45, and the branch section 42 with jut 43 can pass through bend arm 41 direction deflection down.
Therefore, by bend arm 41, branch section 42 moves towards the below direction at least, and then, control as the movement towards the below direction more than the fixation degree of the sinking more than the fixation degree by stop pin 45.
By formation like this, when being accommodated in light shield in the box for photomask, four jiaos of light shield are positioned in the branch section 42 of this locking tool 4, and lock by locking tool under the dip plane 44 of the projection 43 of this one 42 and state that the crest line of light shield contacts.
When this situation, keep with elastic force by bend arm 41, and when the situation of the lid 2 of closed box, the locking tool of lid 2 is pressed light shield and can be kept light shield by elastic force from upper surface.
Especially, because by locking tool 4 light shield closely being kept, so can not produce light shield in container vibrations or rock, and can prevent and lock and produce scraping etc. between the tool.
Can get rid of thus the generation of particulate.
In box for photomask in the past, also the elastic force with elastic components such as rubber suppresses maintenance, but the amplitude that should press is less.
When this situation, especially lock tool 4 be not for polycarbonate resin be in the past high density polyethylene or during the situation of Low Density Polyethylene or acrylic resin etc., because resin itself has stickiness or intensity, so the generation of particulate etc. also can roughly be inhibited by carrying or a little impact etc.
Yet, when using polycarbonate resin, be both hard and crisp character because locking tool, so even if be suppressed rightly, in this locking tool in the past, still can produce particulate.
PE (polyethylene, polyvinyl resin), PP (polypropylene, acrylic resin) etc. might produce few harmful gas certainly.
Given this aspect can realize by bend arm 41 raising of elastic force, and can prevent by the dip plane 44 towards the jut 43 of 2 direction settings skew or the vibrations of light shield.
Fig. 3 is the sectional view of locking tool shown in Figure 2, an example of the state of expression stop pin 45, an and example of the state that contacts with the crest line of light shield of this dip plane 44 of jut 43 that locks the branch section 42 of tool 4.
As this figure, the state of being taken on the dip plane 44 for the jut 43 that four jiaos of light shield is positioned in the branch section 42 that locks tool 4 when being accommodated in light shield in the box for photomask, and supported with elastic force by bend arm 41.
And then, prevent sinking more than the necessary degree by stop pin 45, thereby prevent the breakage of bend arm 41.
In addition, formation shown in this figure is to be illustrated in the formation that has stop pin 45 in the section 42, but also can replace this formation, and be to give prominence to the formation stop pin from for example bottom or the container bottoms of below direction towards branch section bottom surface direction, and control the formation of the sinking of branch section by stop pin.
For example the bottom of the top of stop pin and branch section usually has fixed intervals and consists of discretely, sinks because of the deflection of bend arm 41 but also can be a section, and the bottom of this one contacts the top of stop pin and prevents further sinking thus.
Perhaps, can be the formation that has stop pin from other positions towards branch section or bend arm etc., or also can be from branch section or bend arm etc. and have the formation of stop pin towards other directions.
When arbitrary situation, so long as following formation gets final product: although branch section 42 sinks because of the deflection of bend arm 41, but by the above sinking of these stop pin 45 control fixation degrees, can prevent from thus comprising the breakage of the bend arm etc. of polycarbonate resin etc., or control surpasses moving up and down of necessary degree and prevents unnecessary the contacting or vibration at light shield itself and other positions.
In addition, the 46th, have in order to the chimeric part that is installed in the hole of projection set on the box for photomask body of this locking tool.
In addition, in order to avoid at least and the contacting of light shield, the top of this part consists of in the mode that is positioned at lower position.
Fig. 4 is the front view of locking tool 4 shown in Figure 2, has a section 42 via bend arm 41 at the central portion of matrix 40, and this one 42 is divided into two strands with 90 degree roughly, and comprises respectively the jut 43 with dip plane 44.
In addition, hereto being divided into two strands and the formation that has respectively a jut 43 as branch section 42 describes, but be not limited thereto, also can be following formation: the leading section that is connected with a bend arm 41 i.e. branch section comprises the jut 43 with dip plane 44 without separating into two bursts of grades but at Qi Chu, this dip plane 44 is with 90 in opposite directions dip plane of degree roughly, and is to have the dip plane that the crest line section with each 2 limit of the two side portions in the bight of light shield consists of abreast.
Perhaps, also can be and be divided into more than two strands and have at least jut and a dip plane person corresponding with the crest line section on each 2 limit of the two side portions in the bight of light shield.
Fig. 5 is the figure of the example of other stop pin of expression.
This formation has from as an example of the leading section that is connected with bend arm 41 and two side directions of the branch section 42 of expression are given prominence to the stop pin 45 of formation, and this stop pin 45 has the length that arrives the degree that locks tool matrix 40, usually between stop pin 45 and matrix 40, has fixing interval, but when leading section for example during branch section 42 sinking fixation degree, stop pin 45 can contact matrixes 40 and control further sink.
In addition, also can be following formation: from matrix 40 towards the outstanding stop pin 45 that forms of branch section 42 directions as the leading section that is connected with bend arm 41, usually between stop pin 45 and branch section, has fixing interval, but when leading section for example during the heavy fixation degree of branch subordinate, by control further sinking from these matrix 40 outstanding stop pin 45 that form.
Fig. 6 is the side view of locking tool 4 shown in Figure 5, and an example of the state of expression stop pin 45, and another example of the state that contacts with the crest line of light shield of this dip plane 44 of jut 43 that locks the branch section 42 of tool 4.
State same as described above, that the situation of this figure is also taken on the dip plane 44 for the jut 43 that four jiaos of light shield is positioned in the branch section 42 that locks tool 4 when being accommodated in light shield in the box for photomask, and pass through bend arm 41 and with resilient support.
In the formation shown in this figure, be formed with stop pin 45 in that the side surface direction of branch section is outstanding, and this stop pin 45 corresponding to the deflection of bend arm 41 towards below direction deflection.
When this situation, be contacted with the upper side of the matrix 40 shown in the line by stop pin 45, thereby can control further sinking.
By above formation, prevent the above sinking of necessary degree of bend arm 41, thereby prevent its breakage.
By consisting of in the above described manner, can consist of use by with polycarbonate as main body utilize carbon give electric conductivity resin box for photomask or use by utilizing carbon to give the box for photomask of the resin of electric conductivity with resin similar with it as main body, especially, even if the electroconductive resin take these resins as main body is used for locking tool, also can produce breakage and can stably keep light shield.
When this situation, especially about the conduction specific insulation of these resins of sneaking into carbon, for the higher transparent conductive resin of resistance value that surpasses 10 10 power Ω up to now, make resistance value be less than 10 10 powers by sneaking into carbon, and the carbon of the conduction specific insulation by having 10 3 power to 10 power Ω is sneaked into resin and is improved electric conductivity, becomes thus black and can prevent charged etc.
In addition, can prevent the generation of harmful gas etc.
Yet carbon is sneaked into and is become more at most more crisp.
Therefore, in order to obtain best electric conductivity, best for having the conduction specific insulation about 10 3 power to 10 power Ω.
The incorporation rate of carbon consists of if so, although then also can because the quality of this carbon is different, approximately need to be sneaked into about 10%.
Therefore, comparatively ideal is to use with this polycarbonate with the conduction specific insulation about 10 3 power to 10 power Ω to sneak into resin as the carbon of main body, but material can show more crisply like this.
Therefore, in order to tackle this kind fragility, the best is above-mentioned formation, can use safely thus.
In addition, use by utilize the electroconductive resin of carbon as the resin of main body with polycarbonate, this kind resin is the resin of sneaking into the conductive materials such as carbon or carbon fiber, polycarbonate resin or ABS (Acrylonitrile Butadiene Styrene, acrylonitrile-butadiene-styrene (ABS)) resin etc. meets.
As matrix resin, polycarbonate resin meets, and in addition, also can be the product of sneaking into of having sneaked into a little ABS resin or PFTE (Polytetrafluoroethylene, teflon) (fluororesin).
Yet, worry to produce few harmful gas.
In addition, certainly also can be use acrylic resin person.
Perhaps, also can be take ABS resin as matrix resin and sneak into the resin of the conductive materials such as carbon or carbon fiber.
In addition, replace polycarbonate, also can be PPO (Polyphenylene oxide)/PPE (Polyphenylene ether) (polyphenylene oxide resin) or COP resin (Cycloolefin polymer, the cyclic olefin polymerization resin), PET (Polyethyleneterephthalate, polyethylene terephthalate resin) etc.
In addition, be not limited to these, also can be as required the resin of in the resin that the less PE of the generation of harmful gas (tygon) or PP (polypropylene) etc. commonly use, sneaking into the conductive materials such as carbon or carbon fiber.
As mentioned above, best for using the material that generation is less and electric conductivity is higher of harmful gas.
Certainly, also can be the resin material person that use is added with adjuvant originally.
Claims (5)
1. the light shield of a box for photomask locks tool, it is characterized in that: it is that the light shield of box for photomask that comprises the resin of the conduction specific insulation about sneaking at least carbon and having 10 3 power to 10 power Ω locks tool (4); And
This locking tool (4) is included in four jiaos locking tool (4) of the receivable light shield of receiving of mounting on each bight direction of four jiaos of inside surface of box for photomask,
This locking tool (4) locks tool matrix (40) from it and has a section (42) via bend arm (41), the jut (43) and the dip plane (44) that is arranged on the one side of this jut (43) that have the upper surface direction in this one (42), by contacting and light shield be positioned in the section (42) with dip plane (44) crest line with the light shield of mounting
By this bend arm, direction deflection down and keep light shield with elastic force.
2. the light shield of box for photomask according to claim 1 locks tool, it is characterized in that: have stop pin (45) at bend arm (41), when bend arm (41) deflection, stop the further deflection of bend arm (41) by this stop pin (45) contact box for photomask.
3. the light shield of box for photomask according to claim 1 locks tool, it is characterized in that: the front end of bend arm (41) has the branch section (42) of opening 90 degree towards 2 directions, have the jut (43) of upper surface direction and be arranged on dip plane (44) on the one side of this jut (43) in each one (42), and
Contact with one jiao of crest line that is arranged on both sides of the light shield that clips mounting respectively by each dip plane (44), and light shield is positioned in this one (42).
4. the light shield of box for photomask according to claim 1 locks tool, and it is characterized in that: the resin of sneaking at least carbon is the resin take polycarbonate as main body.
5. the light shield of box for photomask according to claim 1 locks tool, it is characterized in that: the resin of sneaking at least carbon is the resin take ABS resin or PE, PP as main body.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011-144096 | 2011-06-29 | ||
| JP2011144096A JP5843190B2 (en) | 2011-06-29 | 2011-06-29 | Mask lock for mask case |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102854739A true CN102854739A (en) | 2013-01-02 |
Family
ID=47401439
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2012102266960A Pending CN102854739A (en) | 2011-06-29 | 2012-06-29 | Photomask clamp of photomask box |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5843190B2 (en) |
| CN (1) | CN102854739A (en) |
| TW (1) | TWI535642B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112670219A (en) * | 2019-10-16 | 2021-04-16 | 家登精密工业股份有限公司 | Photomask holding system |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106338884B (en) * | 2016-08-26 | 2020-01-17 | 武汉华星光电技术有限公司 | Photomask inspection machine and inspection method thereof |
| TWI623810B (en) | 2017-01-26 | 2018-05-11 | 家登精密工業股份有限公司 | Reticle pod |
| US11822257B2 (en) | 2021-03-12 | 2023-11-21 | Gudeng Precision Industrial Co., Ltd. | Reticle storage pod and method for securing reticle |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200536760A (en) * | 2004-05-07 | 2005-11-16 | Arakawa Jushi Co Ltd | Mask case |
| CN200992329Y (en) * | 2006-12-13 | 2007-12-19 | 億尚精密工业股份有限公司 | Light-shade placing device |
| CN201091030Y (en) * | 2007-09-30 | 2008-07-23 | 家登精密工业股份有限公司 | Mask box and mask conveying box and supporting piece thereof |
| CN201156159Y (en) * | 2008-02-18 | 2008-11-26 | 家登精密工业股份有限公司 | Light shielding kit and positioning fiece |
| EP2020682A1 (en) * | 2007-07-31 | 2009-02-04 | Shin-Etsu Chemical Co., Ltd. | Storage container for photomask-forming synthetic quartz glass substrate |
| CN201214503Y (en) * | 2008-05-21 | 2009-04-01 | 家登精密工业股份有限公司 | Light shield box and support member thereof |
| CN101546115A (en) * | 2008-03-24 | 2009-09-30 | 台湾积体电路制造股份有限公司 | Photomask storage apparatus |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0325903Y2 (en) * | 1985-09-28 | 1991-06-05 | ||
| JP4667018B2 (en) * | 2004-11-24 | 2011-04-06 | ミライアル株式会社 | Reticle transfer container |
| JP3120494U (en) * | 2006-01-16 | 2006-04-06 | 家登精密工業股▲ふん▼有限公司 | Reticle pod holding structure |
| JP2008090206A (en) * | 2006-10-05 | 2008-04-17 | Hoya Corp | Management system for mask blank |
| JP2009229639A (en) * | 2008-03-21 | 2009-10-08 | E-Sun Precision Industrial Co Ltd | Photomask case |
| JP2010199354A (en) * | 2009-02-26 | 2010-09-09 | Shin Etsu Polymer Co Ltd | Substrate storing container |
-
2011
- 2011-06-29 JP JP2011144096A patent/JP5843190B2/en active Active
- 2011-09-26 TW TW100134651A patent/TWI535642B/en not_active IP Right Cessation
-
2012
- 2012-06-29 CN CN2012102266960A patent/CN102854739A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200536760A (en) * | 2004-05-07 | 2005-11-16 | Arakawa Jushi Co Ltd | Mask case |
| CN200992329Y (en) * | 2006-12-13 | 2007-12-19 | 億尚精密工业股份有限公司 | Light-shade placing device |
| EP2020682A1 (en) * | 2007-07-31 | 2009-02-04 | Shin-Etsu Chemical Co., Ltd. | Storage container for photomask-forming synthetic quartz glass substrate |
| CN201091030Y (en) * | 2007-09-30 | 2008-07-23 | 家登精密工业股份有限公司 | Mask box and mask conveying box and supporting piece thereof |
| CN201156159Y (en) * | 2008-02-18 | 2008-11-26 | 家登精密工业股份有限公司 | Light shielding kit and positioning fiece |
| CN101546115A (en) * | 2008-03-24 | 2009-09-30 | 台湾积体电路制造股份有限公司 | Photomask storage apparatus |
| CN201214503Y (en) * | 2008-05-21 | 2009-04-01 | 家登精密工业股份有限公司 | Light shield box and support member thereof |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112670219A (en) * | 2019-10-16 | 2021-04-16 | 家登精密工业股份有限公司 | Photomask holding system |
| CN112670219B (en) * | 2019-10-16 | 2024-05-10 | 家登精密工业股份有限公司 | Photomask holding system |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201300295A (en) | 2013-01-01 |
| JP2013011723A (en) | 2013-01-17 |
| JP5843190B2 (en) | 2016-01-13 |
| TWI535642B (en) | 2016-06-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102854739A (en) | Photomask clamp of photomask box | |
| KR100769413B1 (en) | Substrate container | |
| WO2009058763A1 (en) | Nanostructure-film lcd devices | |
| KR20090020688A (en) | Reusable resilient cushion for wafer container | |
| CN111500006B (en) | Composite material and semiconductor container using same | |
| CN1852845A (en) | Substrate containing case | |
| KR101708087B1 (en) | Substrate storage container | |
| JP2005178839A (en) | Tray for storing substrate | |
| CN208767325U (en) | A kind of support plate for double-sided coating | |
| KR102111868B1 (en) | Separator | |
| Kretz et al. | Atomistic insight into the formation of metal-graphene one-dimensional contacts | |
| US20070068846A1 (en) | Wafer packing | |
| JP5881436B2 (en) | Substrate storage container | |
| JP2013239507A (en) | Substrate housing container | |
| JP6491590B2 (en) | Substrate storage container | |
| Franceschetti et al. | Screening of point charges in Si quantum dots | |
| Ali et al. | Enhanced visible-light-driven photocatalytic activity in SiPGaS/arsenene-based van der Waals heterostructures | |
| CN101219720A (en) | Clean container with elastic positioning structure | |
| TWI333924B (en) | Substrate container,method of dissipating static electricity therefrom, and method of making the same | |
| JPS6310570A (en) | Organic semiconductor device | |
| CN202282335U (en) | Vertical furnace tube | |
| Miekisz | How low temperature causes long-range order | |
| CN207572362U (en) | Package substrate | |
| JP2001253491A (en) | Case for storing and transporting member for fabricating semiconductor device | |
| TW202144266A (en) | Substrate storage container |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20130102 |