JP4628784B2 - レチクルキャリア - Google Patents
レチクルキャリア Download PDFInfo
- Publication number
- JP4628784B2 JP4628784B2 JP2004519643A JP2004519643A JP4628784B2 JP 4628784 B2 JP4628784 B2 JP 4628784B2 JP 2004519643 A JP2004519643 A JP 2004519643A JP 2004519643 A JP2004519643 A JP 2004519643A JP 4628784 B2 JP4628784 B2 JP 4628784B2
- Authority
- JP
- Japan
- Prior art keywords
- reticle
- base portion
- cover portion
- positioning
- carrier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000000452 restraining effect Effects 0.000 claims description 19
- 238000000206 photolithography Methods 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 239000000969 carrier Substances 0.000 description 3
- 238000011109 contamination Methods 0.000 description 3
- 230000013011 mating Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000000284 resting effect Effects 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/54—Accessories
- G03B21/56—Projection screens
- G03B21/60—Projection screens characterised by the nature of the surface
- G03B21/62—Translucent screens
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Epidemiology (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Library & Information Science (AREA)
- Public Health (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Packaging Frangible Articles (AREA)
Description
この発明はフォトリソグラフィック集積回路製造で使用されるレチクルのキャリアに関する。さらに詳しくは、この発明はレチクルキャリア内においてレチクルを自己位置決めするための特徴に関する。
集積回路は、一般に、フォトリソグラフィとして知られているプロセスを用いて製造される。フォトリソグラフィにおいては、まず、フォトレジスト層がウェハー基板上に付けられる。その後、紫外線などの放射エネルギが、所望のパターンを有するマスクあるいはレチクルの形態のテンプレートを介して、フォトレジスト層上に投影される。次に、フォトレジスト層を現像され、露光された部分あるいは露光されない部分のいずれかが除去され、基板上にレジストマスクが形成される。このレジストマスクは、その後の蒸着やエッチング処理のときに、その下にある領域を保護するために使用することができる。
この発明は、レチクル拘束部材による係合のために、キャリアの中でレチクルを適切に位置決めし、同時に、レチクル拘束部材がレチクルの表面に損傷を与える可能性を最小限に抑えるための手段を提供している。また、この発明においては、レチクル支持部材上におけるレチクルのマニュアル位置決めの精度は低くてもよく、従って、より大きな誤差マージンが可能である。
添付の図面には、この発明のレチクルキャリアの実施の形態、その特徴及びコンポーネントが描かれている。前後、左右、上部及び底部、上側及び下側、水平及び垂直という言及は説明の便宜上のものであり、この発明あるいはそのコンポーネントを何か一つの位置的あるいは空間的方向に制限するものではない。添付の図面及び明細書で指定されている寸法は、この発明の範囲を逸脱することなく、この発明の実施の形態の設計や意図する用途によって変更可能である。
Claims (3)
- フォトリソグラフィによる半導体処理に使用されるレチクルのキャリアであって、
少なくとも一対の離間したレチクルサポートを有するベース部分と、
前記ベース部分とシール係合されるカバー部分と、
を有し、前記レチクルはほぼ平面状であるとともに四つの側部に連結された四つの角並びに対向する上側及び下側の表面を有し、レチクルサポートは、レチクルがその上に載せられたときに、レチクルの下側の表面へ接触してそれを支持するように配置及び適合されており、
前記カバー部分は内側表面を有し、その内側表面には複数の離間したレチクル拘束部材と、内側表面から突き出しており且つレチクル拘束部材に連結されていない一対の分離したレチクル位置決めタブとが設けられ、前記レチクル位置決めタブのそれぞれが斜めエッジ部分及び斜めエッジ部分に連結された垂直エッジ部分を有し、この斜めエッジ部分は、前記カバー部分が前記ベース部分と合わせられたときに、レチクルを横方向へ摺動付勢して前記レチクル拘束部材と係合させるように方向付けられており、垂直エッジ部分は、前記カバー部分が前記ベース部分と合わせられたときに、レチクルの二つの角の間に位置する一つの側部おいてレチクルと係合することによってレチクルをレチクル拘束部材と係合させるように方向付けられているキャリア。 - 前記レチクル拘束部材の各々が直角に配置された一対の弾性アームを有し、各弾性アームがレチクルの上側エッジと係合するように適合されたレチクル係合部分を有している請求項1記載のレチクルキャリア。
- 前記カバー部分を前記ベース部分へ固定するための少なくとも一つのラッチ機構をさらに有する請求項1記載のレチクルキャリア。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/190,347 US6825916B2 (en) | 2002-07-05 | 2002-07-05 | Reticle carrier with positioning cover |
PCT/US2003/020071 WO2004006012A2 (en) | 2002-07-05 | 2003-06-26 | A carried for a reticle used in photolithographic semiconductor |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006506658A JP2006506658A (ja) | 2006-02-23 |
JP4628784B2 true JP4628784B2 (ja) | 2011-02-09 |
Family
ID=29999857
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004519643A Expired - Lifetime JP4628784B2 (ja) | 2002-07-05 | 2003-06-26 | レチクルキャリア |
Country Status (9)
Country | Link |
---|---|
US (2) | US6825916B2 (ja) |
EP (1) | EP1535112A4 (ja) |
JP (1) | JP4628784B2 (ja) |
KR (1) | KR100976900B1 (ja) |
CN (1) | CN1666144B (ja) |
AU (1) | AU2003281423A1 (ja) |
MY (1) | MY139765A (ja) |
TW (1) | TWI317967B (ja) |
WO (1) | WO2004006012A2 (ja) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6847434B2 (en) * | 2000-02-10 | 2005-01-25 | Asml Holding N.V. | Method and apparatus for a pellicle frame with porous filtering inserts |
US6825916B2 (en) * | 2002-07-05 | 2004-11-30 | Entegris, Inc. | Reticle carrier with positioning cover |
US6822731B1 (en) * | 2003-06-18 | 2004-11-23 | Asml Holding N.V. | Method and apparatus for a pellicle frame with heightened bonding surfaces |
US20050246391A1 (en) * | 2004-04-29 | 2005-11-03 | Gross John N | System & method for monitoring web pages |
JP4667018B2 (ja) * | 2004-11-24 | 2011-04-06 | ミライアル株式会社 | レチクル搬送容器 |
US7607543B2 (en) * | 2005-02-27 | 2009-10-27 | Entegris, Inc. | Reticle pod with isolation system |
TWI391304B (zh) | 2005-09-27 | 2013-04-01 | Entegris Inc | 光罩盒 |
US7581372B2 (en) * | 2006-08-17 | 2009-09-01 | Microtome Precision, Inc. | High cleanliness article transport system |
TWI317339B (en) * | 2006-12-22 | 2009-11-21 | Ind Tech Res Inst | A latch mechanism of clean container |
TWI308550B (en) * | 2006-12-29 | 2009-04-11 | Ind Tech Res Inst | A clean container with elastic fixing structure |
CN101219720B (zh) * | 2007-01-10 | 2010-11-03 | 财团法人工业技术研究院 | 具弹性定位结构的洁净容器 |
TWM336941U (en) * | 2007-11-15 | 2008-07-21 | Gudeng Prec Ind Co Ltd | Storage apparatus for storing semiconductor element or reticle |
US9669984B2 (en) | 2011-07-22 | 2017-06-06 | Asml Holding N.V. | Lithographic apparatus and device manufacturing method |
TWI429570B (zh) * | 2012-03-23 | 2014-03-11 | Gudeng Prec Ind Co Ltd | 具有扣合結構之光罩盒 |
JP2016151633A (ja) * | 2015-02-17 | 2016-08-22 | 信越化学工業株式会社 | ペリクル収納容器 |
TWI690468B (zh) * | 2015-07-13 | 2020-04-11 | 美商恩特葛瑞斯股份有限公司 | 具有強化圍阻的基板容器 |
KR102502727B1 (ko) * | 2015-11-09 | 2023-02-23 | 삼성전자주식회사 | 레티클 및 그를 포함하는 노광 장치 |
WO2018044678A1 (en) * | 2016-08-27 | 2018-03-08 | Entegris, Inc. | Reticle pod having side containment of reticle |
TWI634383B (zh) * | 2017-01-26 | 2018-09-01 | 家登精密工業股份有限公司 | 光罩盒 |
TWI680086B (zh) * | 2019-02-25 | 2019-12-21 | 家登精密工業股份有限公司 | 光罩盒及其固持件 |
CN115004111A (zh) * | 2019-12-31 | 2022-09-02 | 恩特格里斯公司 | 具有穿过光罩隔室壁的保持部的光罩盒 |
US20220404696A1 (en) * | 2021-06-18 | 2022-12-22 | Entegris, Inc. | Bonded layer on extreme ultraviolet plate |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL8800255A (nl) * | 1988-02-03 | 1989-09-01 | Philips Nv | Optische registratiedrager. |
JP3389977B2 (ja) * | 1995-09-01 | 2003-03-24 | 住友電装株式会社 | 板材収容箱 |
JPH1010705A (ja) * | 1996-06-25 | 1998-01-16 | Nikon Corp | レチクルケース |
KR19990026922U (ko) * | 1997-12-22 | 1999-07-15 | 구본준 | 반도체 노광장비의 마스크장착장치 |
US6216873B1 (en) * | 1999-03-19 | 2001-04-17 | Asyst Technologies, Inc. | SMIF container including a reticle support structure |
JP4025973B2 (ja) * | 2002-01-31 | 2007-12-26 | 株式会社荒川樹脂 | マスクケース |
US6825916B2 (en) * | 2002-07-05 | 2004-11-30 | Entegris, Inc. | Reticle carrier with positioning cover |
-
2002
- 2002-07-05 US US10/190,347 patent/US6825916B2/en not_active Expired - Lifetime
-
2003
- 2003-06-26 AU AU2003281423A patent/AU2003281423A1/en not_active Abandoned
- 2003-06-26 CN CN03815723.3A patent/CN1666144B/zh not_active Expired - Lifetime
- 2003-06-26 EP EP03742205A patent/EP1535112A4/en not_active Withdrawn
- 2003-06-26 WO PCT/US2003/020071 patent/WO2004006012A2/en active Application Filing
- 2003-06-26 JP JP2004519643A patent/JP4628784B2/ja not_active Expired - Lifetime
- 2003-06-26 KR KR1020057000112A patent/KR100976900B1/ko active IP Right Grant
- 2003-06-30 MY MYPI20032445A patent/MY139765A/en unknown
- 2003-07-03 TW TW092118184A patent/TWI317967B/zh not_active IP Right Cessation
-
2004
- 2004-11-30 US US10/999,371 patent/US7139066B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
WO2004006012A2 (en) | 2004-01-15 |
KR100976900B1 (ko) | 2010-08-18 |
WO2004006012A3 (en) | 2004-03-25 |
EP1535112A4 (en) | 2008-01-16 |
US20050134831A1 (en) | 2005-06-23 |
US20040004704A1 (en) | 2004-01-08 |
US6825916B2 (en) | 2004-11-30 |
EP1535112A2 (en) | 2005-06-01 |
TW200402763A (en) | 2004-02-16 |
JP2006506658A (ja) | 2006-02-23 |
TWI317967B (en) | 2009-12-01 |
AU2003281423A8 (en) | 2004-01-23 |
AU2003281423A1 (en) | 2004-01-23 |
US7139066B2 (en) | 2006-11-21 |
KR20050025310A (ko) | 2005-03-14 |
WO2004006012B1 (en) | 2004-05-27 |
MY139765A (en) | 2009-10-30 |
CN1666144A (zh) | 2005-09-07 |
CN1666144B (zh) | 2011-02-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4628784B2 (ja) | レチクルキャリア | |
JP6825083B2 (ja) | レチクルの側面抑制を有するレチクルポッド | |
TWI690771B (zh) | 光罩壓抵單元及應用其之極紫外光光罩容器 | |
TWI237305B (en) | Exposure apparatus and positioning apparatus of substrate receiving cassette | |
JP4940364B2 (ja) | リソグラフィシステム | |
US7420655B2 (en) | Reticle-carrying container | |
US20050168718A1 (en) | Apparatus for kinematic registration of a reticle | |
JP2008103703A (ja) | 基板保持装置、該基板保持装置を備える露光装置、およびデバイス製造方法 | |
TW201911464A (zh) | 具有微粒凹口之夾盤的晶圓台 | |
CN221543054U (zh) | 光刻机光罩上下料装置 | |
CN219891545U (zh) | 一种待刻蚀结构与刻蚀系统 | |
JP4885755B2 (ja) | ガイド部材の位置決め方法、及び基板の位置決め方法 | |
US6882408B2 (en) | Reticle transferring support and transferring method thereof | |
KR20040059389A (ko) | 포토 마스크 검사용 안착장치 | |
KR200280375Y1 (ko) | 스텝퍼의 웨이퍼 홀더 | |
JPH04260319A (ja) | 露光装置 | |
JPH10229116A (ja) | 基板ホルダ | |
KR19980031832A (ko) | 반도체 웨이퍼 트랜스퍼 아암 | |
KR20060039584A (ko) | 노광장치용 웨이퍼 홀더 | |
KR20030092239A (ko) | 반도체 장치의 노광 장치 | |
JPH05182888A (ja) | 両面同時露光装置に於る上、下マスクのアライメント機構 | |
KR20050073102A (ko) | 포토마스크 보관상자 | |
JP2001345253A (ja) | 簡易マスクアライメント治具及び簡易マスクアライメント方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A529 | Written submission of copy of amendment under article 34 pct |
Free format text: JAPANESE INTERMEDIATE CODE: A529 Effective date: 20050301 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20060626 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20090423 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090428 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20090724 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20090731 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20090827 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20090904 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20090925 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20091005 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20091023 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20100126 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100526 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100715 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20100810 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20101019 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20101110 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131119 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 Ref document number: 4628784 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
EXPY | Cancellation because of completion of term |