WO2004006012A3 - A carried for a reticle used in photolithographic semiconductor - Google Patents
A carried for a reticle used in photolithographic semiconductor Download PDFInfo
- Publication number
- WO2004006012A3 WO2004006012A3 PCT/US2003/020071 US0320071W WO2004006012A3 WO 2004006012 A3 WO2004006012 A3 WO 2004006012A3 US 0320071 W US0320071 W US 0320071W WO 2004006012 A3 WO2004006012 A3 WO 2004006012A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- reticle
- base portion
- cover portion
- positioning
- carrier
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/54—Accessories
- G03B21/56—Projection screens
- G03B21/60—Projection screens characterised by the nature of the surface
- G03B21/62—Translucent screens
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Library & Information Science (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Packaging Frangible Articles (AREA)
Abstract
Description
RETICLE CARRIER FIELD OF THE INVENTION The invention relates to carriers for reticles used in photolithographic integrated circuit production, and more specifically to features for self-positioning of a reticle within a reticle carrier. BACKGROUND OF THE INVENTION Integrated circuit devices are commonly manufactured using a process known as photolithography, hi photolithography, a photoresist layer is first deposited on a wafer substrate. Radiant energy, such as ultraviolet light, is then projected onto the photoresist layer through a template in the form of a mask or reticle having the desired pattern. The photoresist layer is then developed to remove either the exposed portions or the unexposed portions, to form a resist mask on the substrate. The resist mask can then be used to protect underlying areas during later deposition or etching processes. An important component of the photolithographic apparatus is the reticle, which provides the pattern and layout corresponding to the various integrated circuit features. Typically, the reticle is a transparent glass plate with a layer of opaque or semi-opaque material coated thereon forming the pattern. It is critically important that the surfaces of the reticle, especially the coated surface, be protected from damage or contamination, since any such defects or contamination may be projected onto the photoresist layer during exposure, thus leading to a finished integrated circuit device of unacceptably diminished or even unusable quality. Specialized carriers have been developed to protect a reticle from physical damage and contamination during storage and transport. These carriers typically comprise an enclosure having various reticle contact portions therein for supporting and restraining the reticle from movement. The reticle is usually manually positioned on support surfaces within the enclosure, and the reticle is then engaged and more closely restrained against movement by restraint members attached within the enclosure. These restraint members are typically designed to engage the reticle at its edges. A problem, however, has been that a person initially manually positioning the reticle on the support surfaces may fail to place the reticle in the proper position for engagement by the restraint members, or may inadvertently cause the reticle to be dislodged from its proper positioning before it is engaged by the restraint members. If the reticle is out of position a sufficient distance, the restraint members may then engage the reticle on its surfaces rather than at its edges, thereby causing scratching or other physical damage to the reticle. What is needed is some type of structure or device for ensuring proper self positioning of a reticle within a reticle carrier to prevent damage during engagement by restraint members. SUMMARY OF THE INVENTION The present invention provides a means of properly positioning a reticle in a carrier for engagement by reticle restraints while minimizing the opportunities for surface damage to the reticle inflicted by the reticle restraints. Also, with the present invention, manual positioning of the reticle on the reticle supports may be less precise, allowing for a greater margin for error. The present invention is a reticle carrier having features for self-positioning of the reticle. In a currently most preferred embodiment of the invention, the carrier has a base portion and a cover portion. The base portion has reticle supports along with positioning tabs to guide proper manual positioning of the reticle on three sides. The base portion has no positioning tabs on the fourth side of the reticle. The cover portion has downwardly projecting self-positioning tabs having diagonal edges positioned so as to be engageable with the fourth side of the reticle. These downwardly projecting self-positioning tabs are oriented so that when the cover portion is placed over the base portion and pressed downward into engagement, the diagonal edges of the self- positioning tabs will engage an upper corner on the fourth side of the reticle, if the reticle is not properly positioned. As the cover portion is moved further downward into engagement with the base portion, the reticle is urged into proper position by the diagonal edges of the self- positioning tabs. Accordingly, the present invention may be characterized in one embodiment as a carrier for a reticle used in photolithographic semiconductor processing, having a base portion and a cover portion. The base portion has a plurality of reticle supports and a plurality of reticle positioning members. The cover portion is adapted to sealingly mate with the base portion, and has an inner surface with a plurality of spaced apart reticle restraints and a pair of reticle positioning tabs projecting inwardly therefrom. Each reticle positioning tab has a diagonal edge portion, and is oriented so that the diagonal edge portion urges a reticle resting on the reticle supports into engagement with the reticle restraints when the cover portion is mated with the base portion. Additional objects, advantages, and novel features of the invention will be set forth in part in the description which follows, and in part will become apparent to those skilled in the art upon examination of the following or may be learned by practice of the invention. The objects and advantages of the invention may be realized and attained by means of the instrumentalities and combinations particularly pointed out in the appended claims. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a perspective view of a reticle carrier according to a preferred embodiment of the present invention. Figure 2 is a top plan view of the base portion of the reticle carrier of Fig. 1. Figure 3 is a sectional view of the base portion of the reticle carrier of Fig. 2. Figure 4 is a plan view of the inside of the cover portion of the reticle carrier of Fig. 1. Figure 5 is a sectional view of the cover portion of Figure 4. Figure 6 is a partial sectional view showing the operation of the positioning tabs of a preferred embodiment of the present invention. Figure 7 is another partial sectional view showing the operation of the positioning tabs of a preferred embodiment of the present invention. Figure 8 is yet another partial sectional view showing the operation of the positioning tabs of a preferred embodiment of the present invention. Figure 9 is still another partial sectional view showing the operation of the positioning tabs of a preferred embodiment of the present invention. Figure lOis an enlarged view of a positioning tab and reticle restraint according to the present invention. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The accompanying Figures depict embodiments of the reticle carrier of the present invention, and features and components thereof. Any references to front and back, right and left, top and bottom, upper and lower, and horizontal and vertical are intended for convenience of description, not to limit the present invention or its components to any one positional or spacial orientation. Any dimensions specified in the attached Figures and this specification may vary with a potential design and the intended use of an embodiment of the invention without departing from the scope of the invention. In Figures 1 - 10, there is shown a preferred embodiment of the self-positioning reticle carrier 100 of the present invention. Reticle carrier 100 generally comprises an enclosure 101 formed by mating base portion 120 with cover portion 140. Base portion 120, shown best in Figures 2 and 3, has reticle supports 122 projecting upwardly from planar backing portion 121. Reticle side positioning members 126 and back positioning members 128 are provided to guide manual positioning of a reticle and ensure proper lateral and rearward placement of the reticle on reticle supports 122. Gasket 123 is provided at the periphery of backing portion 121, and is positioned so as to sealingly engage mating surface 148 of cover portion 140. Cover portion 140, shown best in Figures 4 and 5, has reticle restraints 142 spaced apart on inner surface 141. Each reticle restraint 142 has a pair of resilient arms 143 which may be arranged in a right angle projecting from mounting ring 198. As shown best in Figure 10, at the end of each resilient arm 143 is reticle engagement portion 145, which has notch 160 for engaging an upper comer of a reticle, as will be further described hereinbelow. Each mounting ring 198 is frictionally secured on a boss 190 projecting from inner surface 141. Tab 192 is provided to rotationally secure each reticle restraint 142. The position of reticle restraints 142 on inner surface 141 and the length of resilent arms 143 maybe concertedly selected so that each reticle engagement portion 145 engages and restrains an upper comer of a reticle 200 positioned on reticle supports 122. In addition, the geometry and location of reticle restraints 142 may be selected so that each reticle restraint is slightly deflected and thereby exerts a downwardly directed bias on reticle 200 when cover portion 140 is completely engaged with base portion 120. Latch portions 144 are provided at opposite sides of cover portion 140 to securely fasten cover portion 140 to base portion 120. Each latch portion 144 has a pair of inwardly projecting latch tabs 146 connected by resilient connector portion 153. Each latch tab 146 has a gripping portion 149, allowing the latch tab to be grasped and pulled outwardly, so that each latch tab may clear edge 119 of base portion 120 during installation of cover portion 140 on base portion 120. Latch tabs 146 are received by latch recesses 130 in base portion 120. Each latch portion 144 is disposed in a recess 155 in cover portion 140. Recess cover 156 is provided to retain latch portion 144 within recess 155. The unique self-positioning feature of the present invention is provided in a currently most preferred embodiment by a pair of positioning tabs 150, which project inwardly from inner surface 141 of cover portion 140, as shown best in Figures 4 and 5. Each positioning tab 150 has a diagonally oriented edge portion 152, which is disposed so as to engage the upper comer 210 of a reticle resting on reticle supports 122, when cover portion 140 is engaged with base portion 120. Each diagonally oriented edge portion 152 meets a vertically oriented edge portion 172 at comer 170. The operation of the invention may now be understood with reference to Figures 2 - 9. Reticle 200 may be manually positioned on reticle supports 122. Side positioning tabs 126 guide the lateral placement of reticle 200 so that each comer 212 fo[pi]ned by upper reticle surface 202 and side reticle surfaces 206 will be engaged by notches 160 in resilient arms 143 when cover portion 140 is fully engaged with base portion 120. Reticle 200 is preferably placed with back surface 208 in contact with back positioning tabs 128, but may be placed so that back surface 208 is spaced apart from back positioning tabs 128. Latch tabs 146 are then pulled outwardly, and cover portion 140 is placed over base portion 120 as shown in Figure 6. As cover portion 140 is moved downward as shown in Figure 7, if back surface 208 is spaced apart from back positioning tabs 128, the diagonal leading edges 152 of self-positioning tabs 150 engage comer 210, which is formed by upper reticle surface 202 and front reticle surface 204. Comer 210 slides along diagonal leading edge 152 as cover portion 140 is moved downward as shown in Figures 7 and 8, causing reticle 200 to be urged toward back positioning tabs 128. When cover portion 140 is nearly fully engaged with base portion 120, comer 210 slides past comer 170 so that vertically oriented edge portion 172 is engaged with front surface 204 as shown in Figure 9. When in this position, the reticle 200 is properly positioned so that comers 210 and 214 will be engaged by notches 160 in the resilient arms 143 corresponding to the front and back sides of the reticle 200, respectively. Cover portion 140 may then be fully engaged with base portion 120, placing mating surface 148 in contact with gasket 123. Latch tabs 146 may then be allowed to move inwardly, engaging latch recesses 130, thus sealingly , securing cover portion 140 to base portion 120. Of course, many alternative embodiments of the present self-positioning reticle carrier are possible and are within the scope of the invention, as will be appreciated by those of skill in the art. Such embodiments would include, but are not limited to, varying numbers and locations and configurations of positioning tabs. Although the description above contains many specificities, these should not be construed as limiting the scope of the invention but as merely providing illustrations of some of the presently preferred embodiments of the invention. Thus, the scope of the invention should be determined by the appended claims and their legal equivalents, rather than by the examples given.
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN03815723.3A CN1666144B (en) | 2002-07-05 | 2003-06-26 | Reticle carrier |
AU2003281423A AU2003281423A1 (en) | 2002-07-05 | 2003-06-26 | A carried for a reticle used in photolithographic semiconductor |
EP03742205A EP1535112A4 (en) | 2002-07-05 | 2003-06-26 | Reticle carrier |
JP2004519643A JP4628784B2 (en) | 2002-07-05 | 2003-06-26 | Reticle carrier |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/190,347 US6825916B2 (en) | 2002-07-05 | 2002-07-05 | Reticle carrier with positioning cover |
US10/190,347 | 2002-07-05 |
Publications (3)
Publication Number | Publication Date |
---|---|
WO2004006012A2 WO2004006012A2 (en) | 2004-01-15 |
WO2004006012A3 true WO2004006012A3 (en) | 2004-03-25 |
WO2004006012B1 WO2004006012B1 (en) | 2004-05-27 |
Family
ID=29999857
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2003/020071 WO2004006012A2 (en) | 2002-07-05 | 2003-06-26 | A carried for a reticle used in photolithographic semiconductor |
Country Status (9)
Country | Link |
---|---|
US (2) | US6825916B2 (en) |
EP (1) | EP1535112A4 (en) |
JP (1) | JP4628784B2 (en) |
KR (1) | KR100976900B1 (en) |
CN (1) | CN1666144B (en) |
AU (1) | AU2003281423A1 (en) |
MY (1) | MY139765A (en) |
TW (1) | TWI317967B (en) |
WO (1) | WO2004006012A2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102045631B1 (en) | 2017-01-26 | 2019-11-15 | 구뎅 프리시젼 인더스트리얼 코포레이션 리미티드 | Reticle pod |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6847434B2 (en) * | 2000-02-10 | 2005-01-25 | Asml Holding N.V. | Method and apparatus for a pellicle frame with porous filtering inserts |
US6825916B2 (en) * | 2002-07-05 | 2004-11-30 | Entegris, Inc. | Reticle carrier with positioning cover |
US6822731B1 (en) * | 2003-06-18 | 2004-11-23 | Asml Holding N.V. | Method and apparatus for a pellicle frame with heightened bonding surfaces |
US20050246391A1 (en) * | 2004-04-29 | 2005-11-03 | Gross John N | System & method for monitoring web pages |
JP4667018B2 (en) * | 2004-11-24 | 2011-04-06 | ミライアル株式会社 | Reticle transfer container |
US7607543B2 (en) * | 2005-02-27 | 2009-10-27 | Entegris, Inc. | Reticle pod with isolation system |
KR101442264B1 (en) * | 2005-09-27 | 2014-09-22 | 엔테그리스, 아이엔씨. | Reticle Pod |
US7581372B2 (en) * | 2006-08-17 | 2009-09-01 | Microtome Precision, Inc. | High cleanliness article transport system |
TWI317339B (en) * | 2006-12-22 | 2009-11-21 | Ind Tech Res Inst | A latch mechanism of clean container |
TWI308550B (en) * | 2006-12-29 | 2009-04-11 | Ind Tech Res Inst | A clean container with elastic fixing structure |
CN101219720B (en) * | 2007-01-10 | 2010-11-03 | 财团法人工业技术研究院 | Clean container with elastic positioning structure |
TWM336941U (en) * | 2007-11-15 | 2008-07-21 | Gudeng Prec Ind Co Ltd | Storage apparatus for storing semiconductor element or reticle |
US9669984B2 (en) | 2011-07-22 | 2017-06-06 | Asml Holding N.V. | Lithographic apparatus and device manufacturing method |
TWI429570B (en) * | 2012-03-23 | 2014-03-11 | Gudeng Prec Ind Co Ltd | Reticle carrier having fastening structures |
JP2016151633A (en) * | 2015-02-17 | 2016-08-22 | 信越化学工業株式会社 | Pellicle-housing container |
KR102090073B1 (en) * | 2015-07-13 | 2020-03-17 | 엔테그리스, 아이엔씨. | Base container with improved containment |
KR102502727B1 (en) * | 2015-11-09 | 2023-02-23 | 삼성전자주식회사 | reticle and exposure apparatus including the same |
EP3504591B1 (en) | 2016-08-27 | 2022-05-11 | Entegris, Inc. | Reticle pod having side containment of reticle |
TWI680086B (en) * | 2019-02-25 | 2019-12-21 | 家登精密工業股份有限公司 | Reticle pod and retainer thereof |
CN115004111A (en) * | 2019-12-31 | 2022-09-02 | 恩特格里斯公司 | Reticle pod with retention through reticle compartment walls |
US20220404696A1 (en) * | 2021-06-18 | 2022-12-22 | Entegris, Inc. | Bonded layer on extreme ultraviolet plate |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6216873B1 (en) * | 1999-03-19 | 2001-04-17 | Asyst Technologies, Inc. | SMIF container including a reticle support structure |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL8800255A (en) * | 1988-02-03 | 1989-09-01 | Philips Nv | OPTICAL REGISTRATION CARRIER. |
JP3389977B2 (en) * | 1995-09-01 | 2003-03-24 | 住友電装株式会社 | Board storage box |
JPH1010705A (en) * | 1996-06-25 | 1998-01-16 | Nikon Corp | Reticle case |
KR19990026922U (en) * | 1997-12-22 | 1999-07-15 | 구본준 | Mask mounting device of semiconductor exposure equipment |
JP4025973B2 (en) * | 2002-01-31 | 2007-12-26 | 株式会社荒川樹脂 | Mask case |
US6825916B2 (en) * | 2002-07-05 | 2004-11-30 | Entegris, Inc. | Reticle carrier with positioning cover |
-
2002
- 2002-07-05 US US10/190,347 patent/US6825916B2/en not_active Expired - Lifetime
-
2003
- 2003-06-26 KR KR1020057000112A patent/KR100976900B1/en active IP Right Grant
- 2003-06-26 EP EP03742205A patent/EP1535112A4/en not_active Withdrawn
- 2003-06-26 WO PCT/US2003/020071 patent/WO2004006012A2/en active Application Filing
- 2003-06-26 CN CN03815723.3A patent/CN1666144B/en not_active Expired - Lifetime
- 2003-06-26 AU AU2003281423A patent/AU2003281423A1/en not_active Abandoned
- 2003-06-26 JP JP2004519643A patent/JP4628784B2/en not_active Expired - Lifetime
- 2003-06-30 MY MYPI20032445A patent/MY139765A/en unknown
- 2003-07-03 TW TW092118184A patent/TWI317967B/en not_active IP Right Cessation
-
2004
- 2004-11-30 US US10/999,371 patent/US7139066B2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6216873B1 (en) * | 1999-03-19 | 2001-04-17 | Asyst Technologies, Inc. | SMIF container including a reticle support structure |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102045631B1 (en) | 2017-01-26 | 2019-11-15 | 구뎅 프리시젼 인더스트리얼 코포레이션 리미티드 | Reticle pod |
Also Published As
Publication number | Publication date |
---|---|
KR100976900B1 (en) | 2010-08-18 |
WO2004006012B1 (en) | 2004-05-27 |
AU2003281423A1 (en) | 2004-01-23 |
EP1535112A2 (en) | 2005-06-01 |
TWI317967B (en) | 2009-12-01 |
US20050134831A1 (en) | 2005-06-23 |
EP1535112A4 (en) | 2008-01-16 |
CN1666144B (en) | 2011-02-16 |
KR20050025310A (en) | 2005-03-14 |
US20040004704A1 (en) | 2004-01-08 |
US7139066B2 (en) | 2006-11-21 |
CN1666144A (en) | 2005-09-07 |
AU2003281423A8 (en) | 2004-01-23 |
TW200402763A (en) | 2004-02-16 |
JP4628784B2 (en) | 2011-02-09 |
US6825916B2 (en) | 2004-11-30 |
JP2006506658A (en) | 2006-02-23 |
MY139765A (en) | 2009-10-30 |
WO2004006012A2 (en) | 2004-01-15 |
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