TWI680086B - Reticle pod and retainer thereof - Google Patents

Reticle pod and retainer thereof Download PDF

Info

Publication number
TWI680086B
TWI680086B TW108106377A TW108106377A TWI680086B TW I680086 B TWI680086 B TW I680086B TW 108106377 A TW108106377 A TW 108106377A TW 108106377 A TW108106377 A TW 108106377A TW I680086 B TWI680086 B TW I680086B
Authority
TW
Taiwan
Prior art keywords
box
mask
photomask
elastic body
strip
Prior art date
Application number
TW108106377A
Other languages
Chinese (zh)
Other versions
TW202031570A (en
Inventor
盛劍平
Jain-Ping Sheng
周睿棋
Jui-Chi Chou
邱銘乾
Ming-Chien Chiu
Original Assignee
家登精密工業股份有限公司
Gudeng Precision Industrial Co., Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 家登精密工業股份有限公司, Gudeng Precision Industrial Co., Ltd filed Critical 家登精密工業股份有限公司
Priority to TW108106377A priority Critical patent/TWI680086B/en
Priority to KR1020190037614A priority patent/KR102205065B1/en
Priority to CN201910263385.3A priority patent/CN111605892A/en
Priority to CN201911235658.XA priority patent/CN111290215A/en
Priority to KR1020190161342A priority patent/KR102269715B1/en
Priority to US16/706,612 priority patent/US11333967B2/en
Application granted granted Critical
Publication of TWI680086B publication Critical patent/TWI680086B/en
Publication of TW202031570A publication Critical patent/TW202031570A/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65DCONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D81/00Containers, packaging elements, or packages, for contents presenting particular transport or storage problems, or adapted to be used for non-packaging purposes after removal of contents
    • B65D81/02Containers, packaging elements, or packages, for contents presenting particular transport or storage problems, or adapted to be used for non-packaging purposes after removal of contents specially adapted to protect contents from mechanical damage
    • B65D81/05Containers, packaging elements, or packages, for contents presenting particular transport or storage problems, or adapted to be used for non-packaging purposes after removal of contents specially adapted to protect contents from mechanical damage maintaining contents at spaced relation from package walls, or from other contents
    • B65D81/107Containers, packaging elements, or packages, for contents presenting particular transport or storage problems, or adapted to be used for non-packaging purposes after removal of contents specially adapted to protect contents from mechanical damage maintaining contents at spaced relation from package walls, or from other contents using blocks of shock-absorbing material
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70733Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741Handling masks outside exposure position, e.g. reticle libraries
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65DCONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D25/00Details of other kinds or types of rigid or semi-rigid containers
    • B65D25/02Internal fittings
    • B65D25/10Devices to locate articles in containers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65DCONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D77/00Packages formed by enclosing articles or materials in preformed containers, e.g. boxes, cartons, sacks or bags
    • B65D77/22Details
    • B65D77/24Inserts or accessories added or incorporated during filling of containers
    • B65D77/26Elements or devices for locating or protecting articles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65DCONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D85/00Containers, packaging elements or packages, specially adapted for particular articles or materials
    • B65D85/30Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2051Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2059Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
    • G03F7/2063Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam for the production of exposure masks or reticles
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Library & Information Science (AREA)
  • Toxicology (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

本發明提供了一種光罩盒及其固持件。其中,該固持件主要包含一支持本體、至少一條狀支持件、一彈性本體以及至少一固定孔。其中該至少一條狀支持件設於該支持本體上,該彈性本體具有至少一開口,且該彈性本體包覆該支持本體並使每個該條狀支持件超出每個該開口向上延伸一距離。該至少一固定孔則設於該支持本體及該彈性本體上。而該固持件透過該至少一固定孔設於一光罩盒內。The invention provides a photomask box and a holding member thereof. The holding member mainly includes a supporting body, at least one strip-shaped supporting member, an elastic body, and at least one fixing hole. Wherein, the at least one strip-shaped supporting member is disposed on the supporting body, the elastic body has at least one opening, and the elastic body covers the supporting body and each strip-shaped supporting member extends upward a distance beyond each of the openings. The at least one fixing hole is disposed on the supporting body and the elastic body. The holding member is disposed in a photomask box through the at least one fixing hole.

Description

光罩盒及其固持件Photomask box and its holder

本發明提供了一種光罩盒及其固持件,尤指一種由彈性本體包覆支持本體的固持件及使用其的光罩盒。The invention provides a photomask box and a holding member thereof, in particular to a holding member that covers the supporting body by an elastic body and a photomask box using the same.

在半導體製程的產業中,涉及黃光微影等蝕刻技術所使用的光罩,會依照製程使用的基板尺寸而有不同,而採用不同尺寸的光罩。In the semiconductor process industry, the photomasks used in etching technologies such as yellow light lithography will vary according to the size of the substrate used in the process, and photomasks of different sizes are used.

在眾多種類的半導體製程中,用於製造薄膜電晶體液晶顯示器(Thin film transistor liquid crystal display, TFT-LCD)製程上所選用的基板和光罩通常具有較大的尺寸,才能夠用來製成較大的半導體元件,並應用在大尺寸的面板中。In many types of semiconductor processes, the substrates and photomasks used in the manufacture of thin film transistor liquid crystal display (TFT-LCD) processes usually have larger sizes before they can be used to make Large semiconductor components and used in large size panels.

針對如此大尺寸的光罩,往往會需要特別的載具來協助提供其儲存與傳輸。有鑑於大尺寸光罩實質上屬於易碎的板狀薄片,因此傳統的大尺寸光罩儲存盒內部四角周緣多會設有橡膠或矽膠製的固持件。透過大尺寸光罩盒上蓋及下蓋蓋合時,以四個角上下共八個點抵持大尺寸光罩。提供一定的穩定和阻尼能力,減少大尺寸光罩因碰撞或晃動導致受損的問題。For such large size photomasks, special carriers are often required to assist in providing storage and transmission. In view of the fact that the large-size photomask is a fragile plate-like sheet, the traditional large-size photomask storage box is often provided with rubber or silicone retaining members at the four corners of the periphery. When the upper cover and the lower cover of the large-size photomask box are closed, the large-size photomask is resisted by a total of eight points at four corners. Provides certain stability and damping capabilities, reducing the problem of large-size photomasks being damaged due to collision or shaking.

同樣的技術手段後來也被廣泛的應用在各種尺寸的光罩儲存或傳送盒中。透過類似的技術手段保定光罩,減少其因物理碰撞而受損的機會。然而,類似的固持件仍具有一定的缺點。如矽膠或橡膠在使用久了之後,和光罩直接接觸一段時間,容易造成黏滯於光罩上剝落,甚至是印痕於光罩的問題。然而,改用其他阻尼材料的效果,應用在光罩的固持作用時,其功效亦不佳。The same technology was later widely used in photomask storage or transfer boxes of various sizes. Baoding photomasks are reduced by similar techniques to reduce their chance of being damaged by a physical collision. However, similar holders still have certain disadvantages. For example, after long-term use of silicone rubber or rubber, it comes into direct contact with the photomask for a period of time, which easily causes sticking to the photomask and peeling, and even marks on the photomask. However, the effect of using other damping materials is not good when applied to the holding effect of the photomask.

為解決先前技術所提到的問題,本發明提供了一種光罩盒及其固持件。首先,所述固持件主要包含一支持本體、至少一條狀支持件、一彈性本體以及至少一固定孔。其中,該至少一條狀支持件設於該支持本體上,該彈性本體具有至少一開口,該彈性本體包覆該支持本體並使每個該條狀支持件超出每個該開口向上延伸一距離。而該至少一固定孔設於該支持本體及該彈性本體上。最後該固持件透過該至少一固定孔設於一光罩盒內。In order to solve the problems mentioned in the prior art, the present invention provides a photomask box and a holder thereof. First, the retaining member mainly includes a supporting body, at least one strip-shaped supporting member, an elastic body, and at least one fixing hole. Wherein, the at least one strip-shaped support is provided on the support body, the elastic body has at least one opening, the elastic body covers the support body and each strip-shaped support extends upward a distance beyond each of the openings. The at least one fixing hole is provided on the supporting body and the elastic body. Finally, the holding member is disposed in a photomask box through the at least one fixing hole.

基於本發明固持件的選用,本發明應用之光罩盒主要包含一上蓋、一下蓋以及至少一固持件。其中該下蓋與該上蓋配對密合形成一內表面,而該至少一固持件設於該內表面。Based on the selection of the holding member of the present invention, the photomask box applied by the present invention mainly includes an upper cover, a lower cover and at least one holding member. Wherein, the lower cover and the upper cover are paired closely to form an inner surface, and the at least one retaining member is disposed on the inner surface.

在所述光罩盒中,每個該固持件包含一支持本體、至少一條狀支持件、一彈性本體以及至少一固定孔。該至少一條狀支持件設於該支持本體上,該彈性本體具有至少一開口,該彈性本體包覆該支持本體並使每個該條狀支持件超出每個該開口向上延伸一距離。而該至少一固定孔設於該支持本體及該彈性本體上。In the photomask box, each of the holding members includes a supporting body, at least one strip-shaped supporting member, an elastic body, and at least one fixing hole. The at least one strip-shaped support member is disposed on the support body, and the elastic body has at least one opening, and the elastic body covers the support body and each strip-shaped support member extends upward a distance beyond each of the openings. The at least one fixing hole is provided on the supporting body and the elastic body.

以上對本發明的簡述,目的在於對本發明之數種面向和技術特徵作一基本說明。發明簡述並非對本發明的詳細表述,因此其目的不在特別列舉本發明的關鍵性或重要元件,也不是用來界定本發明的範圍,僅為以簡明的方式呈現本發明的數種概念而已。The foregoing brief description of the present invention aims to provide a basic description of several aspects and technical features of the present invention. The brief description of the present invention is not a detailed description of the present invention. Therefore, its purpose is not to specifically list the key or important elements of the present invention, nor to define the scope of the present invention, but merely to present several concepts of the present invention in a concise manner.

為能瞭解本發明的技術特徵及實用功效,並可依照說明書的內容來實施,茲進一步以如圖式所示的較佳實施例,詳細說明如後:In order to understand the technical features and practical effects of the present invention, and can be implemented in accordance with the contents of the description, the preferred embodiment shown in the drawings is further described in detail as follows:

請同時參照圖1與圖2,圖1係本發明實施例固持件的結構示意圖;圖2係本發明實施例支持本體和條狀支持件的結構示意圖。Please refer to FIG. 1 and FIG. 2 at the same time. FIG. 1 is a schematic structural diagram of a holding member according to an embodiment of the present invention; FIG.

如圖1所示,圖1中本實施例之固持件10主要包含支持本體100、至少一條狀支持件101、彈性本體102以及至少一固定孔104a。其中,至少一條狀支持件101設於支持本體100上,而彈性本體102具有至少一開口103,該彈性本體102包覆支持本體100並使每個條狀支持件101超出每個開口103向上延伸一距離。如此一來,當條狀支持件101抵住光罩R(可先參照圖5)時,便不會與彈性本體102產生物理接觸。As shown in FIG. 1, the retaining member 10 of this embodiment in FIG. 1 mainly includes a supporting body 100, at least one strip-shaped supporting member 101, an elastic body 102, and at least one fixing hole 104 a. Wherein, at least one strip-shaped support member 101 is disposed on the support body 100, and the elastic body 102 has at least one opening 103, the elastic body 102 covers the support body 100 and extends each strip-shaped support member 101 beyond each opening 103 A distance. In this way, when the strip-shaped supporting member 101 abuts against the photomask R (refer to FIG. 5 first), there is no physical contact with the elastic body 102.

而至少一固定孔104b及至少一固定孔104a依序設於支持本體100(圖2)及彈性本體102(圖1)上。而固持件10透過前述的至少一固定孔(104a及104b)設於光罩盒200內(可先參照圖4及圖5)。The at least one fixing hole 104b and the at least one fixing hole 104a are sequentially disposed on the support body 100 (FIG. 2) and the elastic body 102 (FIG. 1). The holding member 10 is disposed in the photomask box 200 through the aforementioned at least one fixing hole (104a and 104b) (refer to FIGS. 4 and 5 first).

在本實施例中,彈性本體102的材質可以是矽膠或橡膠,至於支持本體100的材質可以是塑膠。更進一步來說,本實施例中支持本體100所選用的塑膠材質為聚醚醚酮(Polyaryletherketone, PEEK);而彈性本體102之橡膠為熱塑性橡膠(Thermo-Plastic-Rubber, TPR)。如圖1所示,本實施例中的彈性本體102周緣上更設有至少一穩定肋105的至少一穩定翼106的其組合。In this embodiment, the material of the elastic body 102 may be silicone or rubber, and the material of the supporting body 100 may be plastic. Furthermore, in this embodiment, the plastic material selected for supporting the body 100 is polyaryletherketone (PEEK); and the rubber of the elastic body 102 is a thermoplastic rubber (Thermo-Plastic-Rubber, TPR). As shown in FIG. 1, a combination of at least one stabilization wing 106 of at least one stabilization rib 105 is further provided on the periphery of the elastic body 102 in this embodiment.

在圖1的實施例中,由於支持本體100及其上條狀支持件101所選用的塑膠材質為聚醚醚酮(Polyaryletherketone, PEEK)之故,因此可以發揮既能抵持光罩R(參照圖5)且又耐磨,避免產生微小粒子的功效。此外,由於支持本體100被彈性本體102所包覆,透過彈性本體102本身材質的阻尼特性,可以有效的減緩支持本體100之至少一條狀支持件101抵持的光罩R因晃動、碰撞,進而產生的損害。In the embodiment of FIG. 1, since the plastic material selected for the supporting body 100 and the strip-shaped supporting member 101 thereof is a polyaryletherketone (PEEK), it can be used to resist the photomask R (see FIG. 5) It is also wear-resistant, avoiding the effect of generating tiny particles. In addition, since the supporting body 100 is covered by the elastic body 102, the damping characteristics of the material of the elastic body 102 itself can effectively slow down the photomask R resisted by the at least one support 101 of the supporting body 100 due to shaking and collision, thereby Damage caused.

請同時參照圖3與圖4,圖3係本發明實施例光罩盒的外觀結構示意圖;圖4係本發明實施例固持件的設置位置示意圖。Please refer to FIG. 3 and FIG. 4 at the same time. FIG. 3 is a schematic diagram of an appearance structure of a photomask box according to an embodiment of the present invention; and FIG.

如圖3所示,圖3的實施例中展示了應用圖1實施例固持件10的光罩盒200。該光罩盒200主要包含上蓋201、下蓋202以及圖1中的至少一固持件10。接著如圖3及4所示,下蓋202與該上蓋201配對密合形成內表面203(圖4僅舉上蓋201的內表面203為例),而至少一固持件10設於內表面203。As shown in FIG. 3, the embodiment of FIG. 3 shows a photomask box 200 to which the holder 10 of the embodiment of FIG. 1 is applied. The photomask box 200 mainly includes an upper cover 201, a lower cover 202, and at least one holding member 10 in FIG. 1. Next, as shown in FIGS. 3 and 4, the lower cover 202 and the upper cover 201 are mated to form an inner surface 203 (only the inner surface 203 of the upper cover 201 is taken as an example in FIG. 4).

在本實施例中,光罩盒200為光罩儲存盒,更進一步來說為大尺寸光罩盒,且該大尺寸光罩盒更可以用於承載光罩R(如圖5中所示的板狀薄片)。所述光罩R尺寸規格係長幅800毫米(mm)且寬幅介於920-960毫米(mm)之間。當然,在其他有可能的實施樣態中,該光罩盒還可以是光罩傳送盒或極紫外光光罩盒(EUV Pod)。In this embodiment, the photomask box 200 is a photomask storage box, and furthermore is a large-size photomask box, and the large-size photomask box can be further used to carry a photomask R (as shown in FIG. 5). Plate-like sheet). The R dimension of the photomask is 800 millimeters (mm) long and 920-960 millimeters (mm) wide. Of course, in other possible implementation forms, the mask box may also be a mask transfer box or an extreme ultraviolet mask box (EUV Pod).

以圖4的實施例來說,作為光罩盒200的大尺寸光罩盒,其內表面203四周緣各設有至少一卡榫槽204,且每個固持件10透過至少一固定孔(104a或104b)固定於每個卡榫槽204中。In the embodiment shown in FIG. 4, as a large-size photomask box 200, at least one tongue groove 204 is provided on the peripheral edge of the inner surface 203, and each of the holding members 10 passes through at least one fixing hole (104 a Or 104b) is fixed in each tongue groove 204.

請參照圖5,圖5係本發明實施例抵持光罩之剖面結構圖。如圖5所示,在本實施例中,當光罩盒200的上蓋201及下蓋202蓋合,並使設於其內表面203四周緣的固持件10上下夾持光罩R的時候,會由上蓋201的條狀支持件101a及下蓋202的條狀支持件101b來夾持光罩R。由於本實施例之條狀支持件101a及條狀支持件101b的材質採用聚醚醚酮(Polyaryletherketone, PEEK)之故,可以避免因與光罩R接觸而容易產生微小粒子的問題。Please refer to FIG. 5, which is a cross-sectional structural view of a resist mask according to an embodiment of the present invention. As shown in FIG. 5, in this embodiment, when the upper cover 201 and the lower cover 202 of the photomask box 200 are closed and the holders 10 provided on the periphery of the inner surface 203 of the photomask 200 are clamped up and down, The mask R is held by the strip-shaped support 101a of the upper cover 201 and the strip-shaped support 101b of the lower cover 202. Since the material of the strip-shaped supporting member 101a and the strip-shaped supporting member 101b in this embodiment is polyetheretherketone (PEEK), the problem that micro particles are easily generated due to contact with the photomask R can be avoided.

此外,由於聚醚醚酮(Polyaryletherketone, PEEK)的材料特性,更可直接避免如傳統技術裡面產生黏滯於光罩R上,甚至是剝落等問題。而由圖5的剖面更可看到,當固持件10被固定於卡榫槽204中時,彈性本體102可以對支持本體100和條狀支持件101b提供有效的阻尼手段,大幅減少因為搬運時晃動或碰撞進而損傷光罩R的問題。In addition, due to the material characteristics of Polyaryletherketone (PEEK), problems such as sticking to the mask R and even peeling in the traditional technology can be directly avoided. As can be seen from the cross-section of FIG. 5, when the retaining member 10 is fixed in the tenon groove 204, the elastic body 102 can provide an effective damping means for the supporting body 100 and the strip-shaped supporting member 101 b, which greatly reduces The problem that the mask R is damaged due to shaking or collision.

此外,本實施例為了進一步防止固持件10自卡榫槽204掉落或剝落,除了透過彈性本體102及支持本體100(如圖2)上的孔洞104加以固定之外,更在彈性本體102上設有穩定肋105。如圖5所示,在本實施例中,穩定肋105會鑲嵌在卡榫槽204的側壁中,大幅增加彈性本體102和卡榫槽204的摩擦力,讓固持件10更不容易因為外力而自卡榫槽204中脫落或剝落。In addition, in this embodiment, in order to further prevent the retaining member 10 from falling or peeling from the tenon groove 204, in addition to being fixed through the elastic body 102 and the hole 104 on the supporting body 100 (see FIG. 2), the elastic body 102 is further fixed on the elastic body 102. A stabilization rib 105 is provided. As shown in FIG. 5, in this embodiment, the stabilizing rib 105 is embedded in the side wall of the tenon slot 204, which greatly increases the friction between the elastic body 102 and the tenon slot 204, making it more difficult for the holder 10 to be affected by external forces. Dropped or peeled from the tongue groove 204.

此外,穩定肋105的設計更有助於工業製造上的脫模作業,無論是使用或製造都能帶來相當程度進步性的技術特徵。同樣的,如圖1所示的穩定翼106亦具有同樣的功能。In addition, the design of the stabilizing rib 105 is more conducive to demolding operations in industrial manufacturing, and it can bring a considerable degree of progressive technical features whether it is used or manufactured. Similarly, the stabilizer wing 106 shown in FIG. 1 also has the same function.

惟以上所述者,僅為本發明之較佳實施例而已,當不能以此限定本發明實施之範圍,即依本發明申請專利範圍及說明內容所作之簡單變化與修飾,皆仍屬本發明涵蓋之範圍內。However, the above are only the preferred embodiments of the present invention. When the scope of implementation of the present invention cannot be limited in this way, that is, the simple changes and modifications made in accordance with the scope of the patent application and the description of the present invention still belong to the present invention. Covered.

10‧‧‧固持件10‧‧‧ holding parts

100‧‧‧支持本體 100‧‧‧ Support Ontology

101‧‧‧條狀支持件 101‧‧‧ strip support

101a‧‧‧條狀支持件 101a‧‧‧ strip support

101b‧‧‧條狀支持件 101b‧‧‧ strip support

102‧‧‧彈性本體 102‧‧‧elastic body

103‧‧‧開口 103‧‧‧ opening

104a‧‧‧固定孔 104a‧‧‧Fixing holes

104b‧‧‧固定孔 104b‧‧‧Fixing holes

105‧‧‧穩定肋 105‧‧‧ stabilizer

106‧‧‧穩定翼 106‧‧‧ Stable Wing

200‧‧‧光罩盒 200‧‧‧Mask box

201‧‧‧上蓋 201‧‧‧ Upper cover

202‧‧‧下蓋 202‧‧‧ lower cover

203‧‧‧內表面 203‧‧‧Inner surface

204‧‧‧卡榫槽 204‧‧‧ Tenon groove

R‧‧‧光罩 R‧‧‧Photomask

圖1係本發明實施例固持件的結構示意圖。
圖2係本發明實施例支持本體和條狀支持件的結構示意圖。
圖3係本發明實施例光罩盒的外觀結構示意圖。
圖4係本發明實施例固持件的設置位置示意圖。
圖5係本發明實施例抵持光罩之剖面結構圖。
FIG. 1 is a schematic structural diagram of a holding member according to an embodiment of the present invention.
FIG. 2 is a schematic structural diagram of a supporting body and a strip-shaped supporting member according to an embodiment of the present invention.
FIG. 3 is a schematic diagram of an appearance structure of a photomask box according to an embodiment of the present invention.
FIG. 4 is a schematic view of a setting position of a holding member according to an embodiment of the present invention.
FIG. 5 is a sectional structural view of a resist mask according to an embodiment of the present invention.

Claims (12)

一種固持件,包含:
一支持本體;
至少一條狀支持件,設於該支持本體上;
一彈性本體,具有至少一開口,該彈性本體包覆該支持本體並使每個該條狀支持件超出每個該開口向上延伸一距離;以及
至少一固定孔,設於該支持本體及該彈性本體上;
其中,該固持件透過該至少一固定孔設於一光罩盒內。
A retaining member comprising:
A supporting ontology;
At least one strip-shaped support member provided on the support body;
An elastic body having at least one opening, the elastic body covering the support body and allowing each of the strip-shaped support members to extend upward a distance beyond each of the openings; and at least one fixing hole provided in the support body and the elastic On the body
Wherein, the holding member is disposed in a photomask box through the at least one fixing hole.
如請求項1所述的固持件,其中該彈性本體的材質為矽膠或橡膠。The holder according to claim 1, wherein the material of the elastic body is silicon rubber or rubber. 如請求項2所述的固持件,其中該支持本體及該至少一條狀支持件的材質為塑膠。The holding member according to claim 2, wherein the support body and the at least one support member are made of plastic. 如請求項3所述的固持件,其中該塑膠為聚醚醚酮(Polyaryletherketone, PEEK)。The holder according to claim 3, wherein the plastic is polyaryletherketone (PEEK). 如請求項4所述的固持件,其中該橡膠為熱塑性橡膠(Thermo-Plastic-Rubber, TPR)。The holder according to claim 4, wherein the rubber is a thermoplastic rubber (Thermo-Plastic-Rubber, TPR). 如請求項1所述的固持件,其中該彈性本體周緣上更設有至少一穩定肋、至少一穩定翼或其組合。The holding member according to claim 1, wherein at least one stabilizing rib, at least one stabilizing wing, or a combination thereof is further provided on the periphery of the elastic body. 一種光罩盒,包含:
一上蓋;
一下蓋,與該上蓋配對密合形成一內表面;以及
至少一固持件,設於該內表面,每個該固持件包含:
一支持本體;
至少一條狀支持件,設於該支持本體上;
一彈性本體,具有至少一開口,該彈性本體包覆該支持本體並使每個該條狀支持件超出每個該開口向上延伸一距離;以及
至少一固定孔,設於該支持本體及該彈性本體上。
A mask box containing:
One cover
The lower cover is mated with the upper cover to form an inner surface; and at least one retaining member is disposed on the inner surface, and each of the retaining members includes:
A supporting ontology;
At least one strip-shaped support member provided on the support body;
An elastic body having at least one opening, the elastic body covering the support body and allowing each of the strip-shaped support members to extend upward a distance beyond each of the openings; and at least one fixing hole provided in the support body and the elastic On the body.
如請求項7所述的光罩盒,其中該光罩盒為光罩傳送盒、光罩儲存盒或極紫外光光罩盒。The mask box according to claim 7, wherein the mask box is a mask transfer box, a mask storage box, or an extreme ultraviolet mask box. 如請求項8所述的光罩盒,其中該光罩儲存盒為大尺寸光罩盒。The photomask box according to claim 8, wherein the photomask storage box is a large-size photomask box. 如請求項9所述的光罩盒,其中該大尺寸光罩盒之該內表面四周緣各設有至少一卡榫槽,且每個該固持件透過該至少一固定孔固定於每個該卡榫槽中。The photomask box according to claim 9, wherein at least one tenon groove is provided on each of the peripheral edges of the inner surface of the large-size photomask box, and each of the holding members is fixed to each of the plurality of through the at least one fixing hole. In the tongue and groove. 如請求項9所述的光罩盒,其中該大尺寸光罩盒更承載一光罩,該光罩尺寸規格係長幅800毫米(mm)且寬幅介於920-960毫米(mm)之間。The mask box according to claim 9, wherein the large-size mask box further carries a mask, and the size of the mask is 800 mm (mm) in length and 920-960 mm (mm) in width. . 如請求項10所述的光罩盒,其中該彈性本體周緣上更設有至少一穩定肋、至少一穩定翼或其組合。The photomask box according to claim 10, wherein at least one stabilizing rib, at least one stabilizing wing, or a combination thereof is further provided on the periphery of the elastic body.
TW108106377A 2018-12-06 2019-02-25 Reticle pod and retainer thereof TWI680086B (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
TW108106377A TWI680086B (en) 2019-02-25 2019-02-25 Reticle pod and retainer thereof
KR1020190037614A KR102205065B1 (en) 2019-02-25 2019-04-01 Reticle pod and retainer thereof
CN201910263385.3A CN111605892A (en) 2019-02-25 2019-04-02 Photomask box and holder thereof
CN201911235658.XA CN111290215A (en) 2018-12-06 2019-12-05 Light shield container
KR1020190161342A KR102269715B1 (en) 2018-12-06 2019-12-06 Reticle container
US16/706,612 US11333967B2 (en) 2018-12-06 2019-12-06 Reticle container

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW108106377A TWI680086B (en) 2019-02-25 2019-02-25 Reticle pod and retainer thereof

Publications (2)

Publication Number Publication Date
TWI680086B true TWI680086B (en) 2019-12-21
TW202031570A TW202031570A (en) 2020-09-01

Family

ID=69582744

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108106377A TWI680086B (en) 2018-12-06 2019-02-25 Reticle pod and retainer thereof

Country Status (3)

Country Link
KR (1) KR102205065B1 (en)
CN (1) CN111605892A (en)
TW (1) TWI680086B (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWM292568U (en) * 2005-12-02 2006-06-21 Shu-Yuan Huang Improved structure of enhancer pole of base supporting tray
JP2009150452A (en) * 2007-12-19 2009-07-09 Tokai Rubber Ind Ltd Vibration control connecting rod
US8684341B2 (en) * 2007-06-20 2014-04-01 Yamashita Rubber Kabushiki Kaisha Torque rod
CN207327753U (en) * 2017-08-31 2018-05-08 无锡市明傲耐磨科技有限公司 The buffer bar of the double hardness post-cure rubber structures of concave inlaid

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3089590B2 (en) * 1991-07-12 2000-09-18 キヤノン株式会社 Plate-shaped container and lid opening device
DE60134179D1 (en) * 2000-07-10 2008-07-03 Entegris Inc SMIF CONTAINERS WITH ELECTROSTATIC CHARGES OF LEADING SUPPORT STRUCTURE FOR RETICIAL WASTE
US6825916B2 (en) * 2002-07-05 2004-11-30 Entegris, Inc. Reticle carrier with positioning cover
TWI224719B (en) * 2003-05-28 2004-12-01 Gudeng Prec Ind Co Ltd Reinforced structure device of mask frame
WO2007038504A2 (en) * 2005-09-27 2007-04-05 Entegris, Inc. Reticle pod
JP2008265761A (en) * 2007-04-16 2008-11-06 Miraial Kk Reticle case
CN101364557A (en) * 2007-08-09 2009-02-11 亿尚精密工业股份有限公司 Load moving container and bearing structure applicable to the same
TWI411563B (en) * 2009-09-25 2013-10-11 Gudeng Prec Industral Co Ltd Reticle pod
TWM467088U (en) * 2013-04-12 2013-12-01 Ming-Sheng Chen Mask support structure
CN203486280U (en) * 2013-08-05 2014-03-19 玮懋科技材料股份公司 Photomask receiving box structure
CN204167279U (en) * 2014-10-10 2015-02-18 家登精密工业股份有限公司 Box for photomask
TWI634383B (en) * 2017-01-26 2018-09-01 家登精密工業股份有限公司 Reticle pod
TWM582489U (en) * 2019-02-25 2019-08-21 家登精密工業股份有限公司 Reticle pod and retainer thereof

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWM292568U (en) * 2005-12-02 2006-06-21 Shu-Yuan Huang Improved structure of enhancer pole of base supporting tray
US8684341B2 (en) * 2007-06-20 2014-04-01 Yamashita Rubber Kabushiki Kaisha Torque rod
JP2009150452A (en) * 2007-12-19 2009-07-09 Tokai Rubber Ind Ltd Vibration control connecting rod
CN207327753U (en) * 2017-08-31 2018-05-08 无锡市明傲耐磨科技有限公司 The buffer bar of the double hardness post-cure rubber structures of concave inlaid

Also Published As

Publication number Publication date
KR102205065B1 (en) 2021-01-20
CN111605892A (en) 2020-09-01
KR20200104192A (en) 2020-09-03
TW202031570A (en) 2020-09-01

Similar Documents

Publication Publication Date Title
US9022216B2 (en) Reticle pod with drain structure
US8220630B1 (en) EUV pod with fastening structure
TWI742065B (en) Substrate container with window retention spring and method for placing transparent substrate into substrate container
KR102679292B1 (en) Pellicle frame and pellicle
US3615006A (en) Storage container
JP2010079109A (en) Container for housing mask blank, method of housing mask blank, and mask blank package
JP2006301525A (en) Pellicle frame
KR20230088663A (en) Pellicle storage container
TWI680086B (en) Reticle pod and retainer thereof
JP2008216846A (en) Pellicle storage container
TWM582489U (en) Reticle pod and retainer thereof
US8573264B2 (en) Reticle pod having function of gas exchange
TWI686666B (en) Substrate container
JP2011131940A (en) Substrate-storing body container, film coated glass substrate-storing body, mask blank-storing body, and transfer mask-storing body
JP2009277688A (en) Precise substrate storage container
KR20160074402A (en) Pellicle container for lithography
JP2022010209A (en) Pellicle
KR20140065874A (en) Blankmask and photomask packing box
JP2001298078A (en) Housing case
JP2007153414A (en) Retainer, and board housing container
KR102268164B1 (en) Apparatus and method of manufacturing a flexible device
JP2013145328A (en) Pellicle accommodating container and pellicle storing method
KR102130850B1 (en) Mask blank storing case, mask blank storing method, and mask blank package
JP6975702B2 (en) Pellicle frame and pellicle
KR100964585B1 (en) Carrier plate