TWI686666B - Substrate container - Google Patents
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- TWI686666B TWI686666B TW105111037A TW105111037A TWI686666B TW I686666 B TWI686666 B TW I686666B TW 105111037 A TW105111037 A TW 105111037A TW 105111037 A TW105111037 A TW 105111037A TW I686666 B TWI686666 B TW I686666B
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Abstract
Description
本發明概言之係關於一種用於儲存、運輸、運送及加工例如光遮罩(photomask)、光罩(reticle)、印刷電路板、及基板等易碎裝置之容器。更具體而言,本發明係關於包含一護膜(pellicle)安裝凹槽及複數個視窗安裝凹槽之可運輸及可運送光罩載具。 The present invention relates generally to a container for storing, transporting, transporting, and processing fragile devices such as photomasks, reticles, printed circuit boards, and substrates. More specifically, the present invention relates to a transportable and transportable reticle carrier including a pellicle mounting groove and a plurality of window mounting grooves.
在積體電路及其他半導體裝置製造中經常遇到之製程步驟其中之一係為光刻。概括地,光刻涉及使用一經圖案化模板將一經特別製備之晶圓表面選擇性地暴露於一輻射源,以形成一經蝕刻表面層。通常,經圖案化模板係為一光罩,其係一種包含欲再現於晶圓上之圖案之非常平的玻璃板。典型之光罩基板材料係為光學透明石英。由於現代積體電路之關鍵元件之微小尺寸,應使光罩之操作表面(即,經圖案化表面)保持不受污染物影響,該等污染物可能會損壞該表面或在加工期間使投影至光阻劑層上之影像失真,此二種情形皆會產生品質不可接受之一最終產品。在某些實例中,光罩之經圖案化表面由一護膜覆蓋,該護膜包含一光學透明薄膜,該光學透明薄膜通常係由硝化纖維(nitrocellulose)形成、被附裝至一框架並由該框架支撐、且被附裝至光罩。該護膜有助於隔絕污染物並減少可能因此等污染物遷移至影像平面而引起之印刷缺陷。 One of the process steps often encountered in the manufacture of integrated circuits and other semiconductor devices is photolithography. In summary, photolithography involves using a patterned template to selectively expose a specially prepared wafer surface to a radiation source to form an etched surface layer. Typically, the patterned template is a photomask, which is a very flat glass plate containing the pattern to be reproduced on the wafer. A typical photomask substrate material is optically transparent quartz. Due to the small size of the key components of modern integrated circuits, the operating surface of the reticle (ie, the patterned surface) should be kept free of contaminants, which may damage the surface or cause projection to during processing The image on the photoresist layer is distorted. Both of these situations will result in a final product with unacceptable quality. In some examples, the patterned surface of the photomask is covered by a protective film that includes an optically transparent film, which is usually formed of nitrocellulose, is attached to a frame, and is The frame is supported and attached to the reticle. The protective film helps to isolate contaminants and reduce printing defects that may be caused by such contaminants migrating to the image plane.
通常,光罩係在一小型潔淨室型環境內被儲存及/或運輸,該環境係在具有一基底及一蓋之一SMIF容器或盒內形成。該蓋與該基底配合,以形成一被氣密性密封之殼體來用於保持光罩。在某些實例中,該被氣密性密封之殼體包含一或多個視窗,該或該等視窗係設置於該殼體之外表面上。在加工期間,可經由該視窗自殼體外部監視內部之光罩,以檢驗對該光罩之加工及作用、判斷該光罩是否被恰當地對準、以及採取其他品質控制措施。 Generally, the photomask is stored and/or transported in a small clean room type environment, which is formed in a SMIF container or box having a base and a lid. The cover cooperates with the base to form a hermetically sealed housing for holding the photomask. In some examples, the hermetically sealed housing includes one or more windows, which are disposed on the outer surface of the housing. During processing, the internal mask can be monitored from the outside of the housing through the window to verify the processing and function of the mask, determine whether the mask is properly aligned, and take other quality control measures.
鑒於光罩易於因滑動摩擦及磨蝕而使經圖案化表面上之精密特徵受到損壞,因而非常不希望在製造、加工、運送、搬運、運輸、或儲存期間在光罩與其他表面之間發生非必要及無意的接觸。此外,顆粒對光罩表面之任何污染皆可能在一定程度上危害光罩,該程度足以會嚴重地影響在加工期間使用此一光罩而獲得之任何最終產品。微粒可能係在加工、運輸及運送期間在容納光罩之受控環境內產生。光罩與容器間以及容器之各組件間之滑動摩擦亦會成為污染性顆粒之來源。此外,現在已知,氣體及微量水分可能會自光罩容器中所使用之聚合物材料逸出,此可在光罩上引起塵霾及長晶並損壞光罩。 Since photomasks are susceptible to damage to the precision features on the patterned surface due to sliding friction and abrasion, it is highly undesirable to cause non-contact between the photomask and other surfaces during manufacturing, processing, transportation, handling, transportation, or storage. Necessary and unintentional contact. In addition, any contamination of the surface of the photomask by the particles may harm the photomask to a certain extent, which is sufficient to seriously affect any final product obtained by using this photomask during processing. Particles may be generated in a controlled environment containing a photomask during processing, transportation and transportation. The sliding friction between the reticle and the container and the components of the container can also become a source of contaminating particles. In addition, it is now known that gas and trace moisture may escape from the polymer material used in the photomask container, which may cause haze and crystal growth on the photomask and damage the photomask.
光刻正朝著利用極紫外線(extreme ultraviolet;EUV)光源之方向發展,該等光源具有較短波長,以允許製作尺寸較小之積體電路(經常係在一真空環境中),因此會對被設計成儲存、運輸及運送旨在為極紫外線光刻所用之一光罩之一容器或盒強加顯著之功能性要求。舉例而言,在習用光刻中並不大至足以造成一問題之小微粒在極紫外線光刻中便可能會成為一項顯著問題。此外,極紫外線光刻可係在一真空下執行,此可能使自容器組件進行除氣及/或水分解吸成為一項問題,特別係在該等組件為聚 合物時。 Lithography is moving towards the use of extreme ultraviolet (EUV) light sources, which have shorter wavelengths to allow the production of smaller integrated circuits (often in a vacuum environment), so It is designed to store, transport and ship a container or box designed to impose significant functional requirements for a photomask used in extreme ultraviolet lithography. For example, small particles that are not large enough to cause a problem in conventional lithography may become a significant problem in extreme ultraviolet lithography. In addition, extreme ultraviolet lithography can be performed under a vacuum, which may make degassing and/or water decomposition and absorption from the container components become a problem, especially when these components are polymer Compound.
極紫外線光刻所用之盒通常利用一內側盒及一外側盒。實例可見於Kolbow等人之第8,231,005號美國專利(「Kolbow」)、Gregerson等人之第7,607,543號美國專利(「Gregerson」)、及Lystad等人之第2015/0266660號美國專利公開案(「Lystad」)中,各該專利皆為本申請案之所有人所有,且其揭露內容除其中所有之專利請求項及明確定義外以引用方式全文併入本文中。 The box used for extreme ultraviolet lithography usually uses an inner box and an outer box. Examples can be found in Kolbow et al. U.S. Patent No. 8,231,005 (``Kolbow''), Gregerson et al. U.S. Patent No. 7,607,543 (``Gregerson''), and Lystad et al. U.S. Patent Publication No. 2015/0266660 (``Lystad "), each of these patents is owned by the owner of the application, and its disclosure content is incorporated by reference in its entirety except for all the patent claims and clear definitions.
本發明之一或多個實施例係關於一種用於一光罩容器中之一內側盒總成之底板。在各種實施例中,該底板包含一或多個視窗及一護膜安裝凹槽,該護膜安裝凹槽用以將一護膜容納於該底板中。該護膜安裝凹槽可位於該底板之一朝上之表面中,且在一或多個實施例中,該護膜安裝凹槽係由一凹槽側壁及一底部側壁界定,該凹槽側壁及該底部側壁界定用於緊貼地容置該護膜之一形狀。 One or more embodiments of the invention relate to a bottom plate for an inner box assembly in a reticle container. In various embodiments, the bottom plate includes one or more windows and a protective film mounting groove. The protective film mounting groove is used to receive a protective film in the bottom plate. The protective film mounting groove may be located in one of the upward facing surfaces of the bottom plate, and in one or more embodiments, the protective film mounting groove is defined by a groove side wall and a bottom side wall, the groove side wall And the bottom side wall defines a shape for tightly accommodating the protective film.
該一或多個視窗其中之每一者包含一貫穿該底板之開孔及一透明基板。該透明基板可係在該底板之一朝下之表面中被安裝至該底板之一視窗安裝凹槽中。該視窗安裝凹槽可包含一第一凹槽及一第二凹槽,該第一凹槽係由一第一凹槽側壁及一第一底部側壁界定,該第二凹槽係在該第一底部側壁中由一第二凹槽側壁及一第二底部側壁界定。在各種實施例中,該第二凹槽側壁及該第二底部側壁在該視窗安裝凹槽中界定用於緊貼地容置該透明基板之一形狀。在一或多個實施例中,該一或多個視窗之各該開孔自該視窗安裝凹槽之該第二底部側壁貫穿該底板延伸至該朝上之表面。 Each of the one or more windows includes an opening through the bottom plate and a transparent substrate. The transparent substrate can be installed into a window installation groove of the bottom plate in a downward-facing surface of the bottom plate. The window mounting groove may include a first groove and a second groove, the first groove is defined by a first groove side wall and a first bottom side wall, and the second groove is located at the first The bottom side wall is defined by a second groove side wall and a second bottom side wall. In various embodiments, the second groove side wall and the second bottom side wall define a shape in the window mounting groove for tightly accommodating the transparent substrate. In one or more embodiments, each opening of the one or more windows extends from the second bottom side wall of the window mounting groove through the bottom plate to the upwardly facing surface.
在各種實施例中,該底板包含一視窗固持構件,以用於將該透明基板固持於該視窗安裝凹槽中。該視窗固持構件可包含一對長度方向拱形部分及一對寬度方向部分。在各種實施例中,該視窗固持構件係藉由將該對寬度方向部分至少其中之一定位於該第一凹槽之一底切部分中並將該對寬度方向部分其中之另一者固定於該視窗安裝凹槽中而被安裝於該第一凹槽中,藉此使該長度方向拱形部分接觸該透明基板以將該透明基板固持於第二凹槽中。 In various embodiments, the bottom plate includes a window holding member for holding the transparent substrate in the window mounting groove. The window holding member may include a pair of longitudinal arched portions and a pair of widthwise portions. In various embodiments, the window holding member is by positioning at least one of the pair of widthwise portions in an undercut portion of the first groove and fixing the other of the pair of widthwise portions to the The window installation groove is installed in the first groove, so that the longitudinal arch portion contacts the transparent substrate to hold the transparent substrate in the second groove.
各種實施例皆受益於一護膜安裝凹槽,該護膜安裝凹槽使得能夠在一光罩容器之一內側盒總成內使用一護膜。因此,本發明之實施例受益於在內側盒總成中改良了顆粒防護,進而延長了光罩壽命。舉例而言,在以光刻法再現積體電路期間,護膜將有助於防止光遮罩表面上之灰塵微粒被成像至光罩中。 Various embodiments benefit from a protective film mounting groove that enables the use of a protective film in an inner box assembly of a reticle container. Therefore, embodiments of the present invention benefit from improved particle protection in the inner box assembly, thereby extending the life of the reticle. For example, during the reproduction of an integrated circuit by photolithography, the protective film will help prevent dust particles on the surface of the photomask from being imaged into the photomask.
此外,一或多個實施例藉由補償底板中因添加護膜安裝凹槽所致的材料厚度減小而提供諸多優點。材料厚度之減小會使內側盒總成中之視窗固持選擇方案減少。因此,一或多個實施例提供其他與護膜凹槽相容之視窗固持選擇方案,進而使得內側盒總成能夠繼續在底板中納入視窗,以用於進行品質控制、製程監視以及用於其他作用。另外,一或多個實施例提供使一視窗固持機構較當前之螺釘固持方法更易於進行安裝及/或拆卸以及清潔之優點。 In addition, one or more embodiments provide many advantages by compensating for the reduction in material thickness caused by the addition of a protective film mounting groove in the bottom plate. The reduction in material thickness will reduce the window retention options in the inner box assembly. Therefore, one or more embodiments provide other window holding options that are compatible with the protective film groove, thereby enabling the inner box assembly to continue to incorporate windows in the bottom plate for quality control, process monitoring, and other effect. In addition, one or more embodiments provide the advantage of making a window holding mechanism easier to install and/or disassemble and clean than current screw holding methods.
以上概要並非旨在闡述本發明之每一所示實施例或每一實施方案。 The above summary is not intended to illustrate each illustrated embodiment or every implementation of the present invention.
100:光罩容器 100: photomask container
104:外側盒總成 104: Outer box assembly
108:內側盒總成 108: inner box assembly
112:中心軸線 112: Central axis
116:光罩 116: Mask
120:上部部分 120: upper part
124:下部部分 124: lower part
128:蓋 128: cover
132:基底 132: Base
136:對準銷 136: Alignment pin
140:導引凹槽 140: Guide groove
144:邊緣 144: Edge
148:頂表面 148: top surface
152:側向表面 152: Lateral surface
156:突出部 156: protrusion
160:通孔 160: through hole
164:表面 164: Surface
165:朝上之表面 165: Face up
168:側向表面 168: Lateral surface
170:光罩支撐構件 170: Mask support member
172:視窗 172: Windows
204:基底/底板 204: base/floor
208:朝下之表面 208: Face down
216:護膜安裝凹槽 216: Protective film installation groove
220:凹槽側壁 220: groove side wall
224:底部側壁 224: bottom side wall
225:護膜 225: Protective film
226:夾持區域 226: Clamping area
228:視窗 228: Windows
229:視窗 229: Windows
232:開孔 232: opening
233:開孔 233: opening
236:透明基板 236: Transparent substrate
240:視窗安裝凹槽 240: Windows installation groove
241:唇緣 241: Lips
242:唇緣 242: lips
244:第一凹槽 244: first groove
248:第一凹槽側壁 248: sidewall of the first groove
252:寬度方向邊緣 252: Width edge
256:長度方向邊緣 256: lengthwise edge
260:第一底部側壁 260: First bottom side wall
264:底切部分 264: Undercut part
268:懸伸部 268: Overhang
272:第二凹槽 272: Second groove
276:第二凹槽側壁 276: second groove side wall
280:第二底部側壁 280: second bottom side wall
284:視窗固持構件 284: Window holding member
288:長度方向拱形部分 288: Lengthwise arched part
292:寬度方向部分 292: Width part
304:視窗固持構件 304: Window holding member
404:視窗固持構件 404: Window holding member
408:螺釘 408: screw
412:較薄區域 412: thinner area
416:較厚區域 416: thicker area
本申請案所包含之附圖被併入本說明書中且形成本說明書之一部分。該等附圖例示本發明之實施例,且連固該說明一起用於解釋本發明之原理。該等附圖僅係對某些實施例之例示而並非限制本發明。 The drawings included in this application are incorporated into this specification and form part of this specification. The drawings illustrate embodiments of the present invention, and the description is used together to explain the principle of the present invention. The drawings are only illustrative of certain embodiments and do not limit the present invention.
第1圖繪示先前技術之一光罩容器;第2圖繪示根據本發明一或多個實施例,一光罩容器之一內側盒總成之一基底之俯視立體圖;第3圖繪示根據本發明一或多個實施例,一內側盒總成之一基底之分解立體圖,該內側盒總成包含一護膜及一光罩;第4圖繪示根據本發明一或多個實施例,一光罩容器之一內側盒總成之一基底之仰視立體圖;第5圖繪示根據本發明一或多個實施例,一視窗安裝凹槽之剖視圖,該視窗安裝凹槽包含一透明基板及一視窗固持構件;第6圖繪示根據本發明一或多個實施例,一視窗安裝凹槽之剖視圖,該視窗安裝凹槽包含一透明基板及一視窗固持構件;第7圖繪示根據本發明一或多個實施例,一視窗安裝凹槽之剖視圖,該視窗安裝凹槽包含一透明基板及一視窗固持構件;以及第8圖繪示根據本發明一或多個實施例,一視窗安裝凹槽之剖視圖,該視窗安裝凹槽包含一透明基板及一視窗固持構件。 Figure 1 shows a photomask container of the prior art; Figure 2 shows a top perspective view of a base of an inner box assembly of a photomask container according to one or more embodiments of the present invention; Figure 3 shows a According to one or more embodiments of the present invention, an exploded perspective view of a base of an inner box assembly including a protective film and a reticle; FIG. 4 illustrates one or more embodiments according to the present invention , A bottom perspective view of a base of an inner box assembly of a reticle container; FIG. 5 illustrates a cross-sectional view of a window mounting groove according to one or more embodiments of the present invention, the window mounting groove including a transparent substrate And a window holding member; FIG. 6 shows a cross-sectional view of a window mounting groove according to one or more embodiments of the present invention, the window mounting groove includes a transparent substrate and a window holding member; FIG. 7 shows according to One or more embodiments of the present invention, a cross-sectional view of a window mounting groove including a transparent substrate and a window holding member; and FIG. 8 illustrates a window according to one or more embodiments of the present invention A cross-sectional view of the installation groove. The window installation groove includes a transparent substrate and a window holding member.
儘管本發明之實施例適於作出各種潤飾及替代形式,但已在附圖中以舉例方式顯示並將詳細地說明該等實施例之細節。然而,應理解,意圖並非係將本發明限制於所述之特定實施例。相反,意圖係涵蓋歸屬於 本發明精神及範圍內之所有潤飾、等效形式及替代方案。 Although the embodiments of the present invention are suitable for making various retouching and alternative forms, they have been shown by way of example in the drawings and the details of these embodiments will be explained in detail. However, it should be understood that the intention is not to limit the invention to the particular embodiments described. On the contrary, intent covers attribution All retouching, equivalent forms and alternatives within the spirit and scope of the present invention.
第1圖繪示先前技術之一光罩容器100。光罩容器100包含一外側盒總成104及一內側盒總成108,外側盒總成104及內側盒總成108對準一中心軸線112,內側盒總成108容納一光罩116。本文中所使用之術語光罩116係指一薄的平面基板、光罩、或印刷電路板。外側盒總成104包含一上部部分120及一下部部分124,上部部分120與下部部分124協作以界定一殼體。內側盒總成108包含一蓋128及一基底132,且可設置於外側盒總成104內。蓋128及基底132可由自蓋128延伸之複數個對準銷136對準。各該對準銷136可位於一各自之導引凹槽140內,導引凹槽140係形成於基底132之一邊緣144上。儘管本文所示光罩盒具有一大體正方形輪廓,但應理解,其他盒可具有其他形狀,例如,一多邊形、圓形或其他適合形狀。
FIG. 1 shows a
內側盒總成之該蓋128可具有自一單一塊體(例如,一金屬,例如不銹鋼)機加工而成之一體式構造。蓋128界定與一底表面或面向內部之表面相對之一頂表面148,該底表面或面向內部之表面由一側向表面152與頂表面148間隔開,側向表面152實質上沿著一平面延伸。在一實施例中,蓋128可具備至少一個突出部156,突出部156自側向表面152向外延伸且自頂表面148延伸至底表面。在突出部156中之一位置處形成有一通孔160,以用於容置對準銷136。通孔160之一軸線實質上垂直於頂表面148。本發明更涵蓋:蓋128可不具備突出部156,且通孔160可係實質上鄰近側向表面152而被鑽出。對準銷136之尺寸可被定為與通孔160達成一干涉配合。
The
內側盒總成之該基底132亦可具有一體式金屬構造且包含一朝上之表面或面向內部之表面164,朝上之表面或面向內部之表面164與一
朝下之表面或底表面相對且一側向表面168在其之間延伸,側向表面168實質上沿著一平面伸展。基底132包含複數個光罩支撐構件170以在內側盒總成108內靠近光罩116之隅角其中之每一者來支撐光罩116,光罩支撐構件170自面向內部之表面164上延伸出。基底132可具備至少一個導引凹槽140,導引凹槽140自側向表面168之平面向內縮進且延伸貫穿表面164及底表面。在一實施例中,導引凹槽140在基底132上被定位成使得當蓋128嚙合基底132時,對準銷136位於導引凹槽140內之一精確位置處,進而在對準銷136與導引凹槽140之間形成一緊密配合嚙合。基底132另外包含複數個視窗172,視窗172分別包含設置於基底132中之一透明基板,以經由視窗172自內側盒總成108外部監視光罩。
The
在功能上,蓋128及基底132彼此密封地配合,以界定一被氣密性密封之殼體,而蓋128與基底132之間無顯著軸向移動。蓋128及基底132之一體式結構之構形消除或減少了被進行夾緊接觸之表面之存在,藉此減少或消除在此等被夾緊表面之間截留之微粒以及隨之而來的微粒可能隨時間發生之散落問題。一體式構造亦能消除複數個製造步驟並減小與蓋128及基底132相關聯之容差積累。
Functionally, the
參照第2圖至第4圖,其繪示根據本發明一或多個實施例,一光罩容器之一內側盒總成之一基底204。在一或多個實施例中,基底204具有一體式金屬構造且包含一朝上之表面165,朝上之表面165與一朝下之表面208相對且一側向表面168在其之間延伸。基底204另外包含複數個光罩支撐構件170,以用於支撐一光罩116,光罩支撐構件170自朝上之表面165上延伸出。在某些實施例中,基底204包含一或多個導引凹槽140,以使基底204與一蓋對準,導引凹槽140自側向表面168向內縮進。
Referring to FIGS. 2 to 4, it illustrates a
在一或多個實施例中,基底204包含界定於朝上之表面165中之一護膜安裝凹槽216。護膜安裝凹槽216包含一凹槽側壁220及一底部側壁224,凹槽側壁220及底部側壁224界定用於將一護膜至少部分地容置並支撐於護膜安裝凹槽216內之一形狀。在一或多個實施例中,基底204另外在圍繞護膜安裝凹槽216周邊之各個點處包含複數個夾持區域226,以便於將一護膜插入至凹槽216及/或自護膜安裝凹槽216移除。在各種實施例中,凹槽側壁220及底部側壁224界定與一護膜之形狀相符合之一形狀,以將該護膜定位於護膜安裝凹槽216中。
In one or more embodiments, the
第3圖係為根據一或多個實施例之底板204、一護膜225及一光罩116之分解圖。護膜225位於光罩116下方且可被向下降低至處於護膜安裝凹槽216內。在各種實施例中,護膜安裝凹槽216之深度實質上相同於護膜225之高度,俾使護膜在被降入護膜安裝凹槽216中時實質上齊平於朝上之表面165,且光罩116接觸光罩支撐構件170,以將光罩恰在底板204與護膜225之組合上支撐於定位上。在某些實施例中,護膜安裝凹槽216之深度可有所變化,俾使護膜安裝凹槽216之深度大於或小於護膜225之高度。
FIG. 3 is an exploded view of the
參照第2圖至第6圖,在各種實施例中,基底204另外包含複數個視窗228、229。視窗228、229其中之每一者包含一貫穿基底204之開孔232、233及一透明基板236。在各種實施例中,該等開孔232、233其中之每一者貫穿底板204延伸至朝上之表面165。在一或多個實施例中,透明基板236係由透明玻璃、塑膠或其他對於在一極紫外線環境中進行之加工而言適合之材料製成。
Referring to FIGS. 2 to 6, in various embodiments, the
在各種實施例中,透明基板236分別在朝下之表面208上設置於基底204之複數個視窗安裝凹槽240中。在例如第5圖及第6圖所示之某些
實施例中,視窗安裝凹槽240分別包含一第一凹槽244,第一凹槽244係由一第一凹槽側壁248及一第一底部側壁260界定,第一凹槽側壁248具有一對寬度方向邊緣252及一對長度方向邊緣256。在某些實施例中,寬度方向邊緣252其中之一或多者包含一底切部分264,底切部分264係由第一凹槽側壁248內之一側向凹槽形成,該側向凹槽界定一懸伸部(overhang)268。
In various embodiments, the
在某些實施例中,視窗安裝凹槽240分別包含位於第一底部側壁260中之一第二凹槽272。第二凹槽272係由一第二凹槽側壁276及一第二底部側壁280界定。在一或多個實施例中,第二凹槽側壁276及第二底部側壁280界定用於將透明基板236至少部分地緊密容置於第二凹槽272內之一形狀。
In some embodiments, the
在一或多個實施例中,可根據視窗228、229之尺寸/類型而形成具有各種尺寸之開孔232、233。舉例而言,如第2圖至第6圖中所示,視窗228係為用於在加工期間檢查光罩定位之對準視窗。因此,開孔232較開孔233大,以透過底板204更好地向內側盒總成中進行觀察。然而,開孔232、233其中之每一者之面積大小至少小於第二底部側壁280之面積,俾使開孔232、233及第二底部側壁280在視窗安裝凹槽240中界定一唇緣241、242,唇緣241、242足以支撐透明基板236。舉例而言,如第5圖至第6圖中所示,各該視窗安裝凹槽240中之透明基板236係由具有一邊緣之一唇緣支撐,該邊緣支撐透明基板236之對應邊緣。
In one or more embodiments,
在一或多個實施例中,基底204包含複數個視窗固持構件284。視窗固持構件284之形狀及尺寸適合於以搭扣配合、彈簧配合、螺旋配合方式或以其他方式牢固地定位於第一凹槽244內,以將透明基板236在第二凹槽272中固持於定位上。舉例而言,參照第5圖至第6圖,各該視窗固
持構件284具有一對長度方向拱形部分288及一對寬度方向部分292。該對寬度方向部分292位於各該視窗安裝凹槽240之底切部分264中,藉此藉由懸伸部268將視窗固持構件284固定於定位上。一旦處於定位上,長度方向拱形部分288便彎曲以接觸透明基板236,進而將透明基板236在第二凹槽272中固持於定位上。
In one or more embodiments, the
在一或多個實施例中,視窗固持構件284可藉由使該構件之寬度方向部分292其中之一或多者適當地彎曲至底切部分264中而被安裝至第一凹槽中。在一或多個實施例中,視窗固持構件284係使用具有彈簧性質之材料構造而成,俾使一旦視窗固持構件284不再彎曲至底切部分264中,視窗固持構件284便彈回至其原始形狀,藉此使長度方向拱形部分288接觸透明基板236。因此,在各種實施例中,視窗固持構件284係由彈簧鋼(例如中碳鋼或高碳鋼)構造而成。在某些實施例中,該視窗固持構件係由一聚合物構造而成,該聚合物例如係為全氟烷氧基樹脂(perfluoroalkoxy alkane)、聚四氟乙烯(polytetrafluoroethylene)、或硬度足以進行彎曲並維持一所需形式之其他適合聚合物。
In one or more embodiments, the
視窗固持構件可被建造成具有各種形狀或設計。舉例而言,參照第7圖,其繪示一視窗固持構件304之剖視圖。視窗固持構件304係由一彈簧鋼絲彈性材料構造而成。參照第8圖,其繪示一視窗固持構件404。在一或多個實施例中,視窗固持構件404係部分地由螺釘固持,其寬度方向邊緣其中之一位於第一凹槽244之一底切部分264且其寬度方向邊緣其中之另一者係藉由一螺釘408而在底板204中被固定於定位上。
The window holding member can be constructed to have various shapes or designs. For example, referring to FIG. 7, a cross-sectional view of a
在一或多個實施例中,由於護膜安裝凹槽216,視窗安裝凹槽240被定位成使得一部分位於底板204之一較薄區域412上且另一部分位
於底板204之一較厚區域416上。由於缺乏底板材料,較薄區域412阻止了對例如螺釘408等習用固持方法之使用。因此,在各種實施例中,底切部分264位於對應於較薄區域412之凹槽側壁中。在某些實施例中,視窗固持構件404具有一第一寬度方向邊緣且具有一第二寬度方向邊緣,該第一寬度方向邊緣位於對應於較薄區域412之底切部分264中,該第二寬度方向邊緣係藉由一螺釘408而在底板204中被固定於定位上,螺釘408位於底板204之較厚區域416中。
In one or more embodiments, due to the
對本發明各種實施例之說明係為進行例示起見而提供,而並非旨在係為詳盡的或限於所揭露之實施例。此項技術中之通常知識者將明瞭諸多潤飾及變化形式,此並不背離所述實施例之範圍及精神。選擇本文中所使用之術語係為瞭解釋該等實施例之原理、實際應用、或對市場上所存在技術之技術性改良、或者係為了使此項技術中之其他通常知識者能夠理解本文中所揭露之實施例。 The description of various embodiments of the present invention is provided for illustrative purposes, and is not intended to be exhaustive or limited to the disclosed embodiments. Those of ordinary skill in the art will understand many retouches and variations, without departing from the scope and spirit of the described embodiments. The terminology used in this article was chosen to explain the principles, practical applications, or technical improvements to the technologies present on the market, or to enable others with ordinary knowledge in this technology to understand this article The disclosed embodiment.
116‧‧‧光罩 116‧‧‧ Mask
140‧‧‧導引凹槽 140‧‧‧Guide groove
165‧‧‧朝上之表面 165‧‧‧ facing up
168‧‧‧側向表面 168‧‧‧Lateral surface
170‧‧‧光罩支撐構件 170‧‧‧Mask support member
204‧‧‧基底/底板 204‧‧‧Base/Bottom plate
216‧‧‧護膜安裝凹槽 216‧‧‧membrane installation groove
224‧‧‧底部側壁 224‧‧‧Bottom side wall
225‧‧‧護膜 225‧‧‧Film
226‧‧‧夾持區域 226‧‧‧ clamping area
228‧‧‧視窗 228‧‧‧window
229‧‧‧視窗 229‧‧‧window
232‧‧‧開孔 232‧‧‧opening
233‧‧‧開孔 233‧‧‧opening
Claims (22)
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TW105111037A TWI686666B (en) | 2016-04-08 | 2016-04-08 | Substrate container |
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TW105111037A TWI686666B (en) | 2016-04-08 | 2016-04-08 | Substrate container |
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TW201736945A TW201736945A (en) | 2017-10-16 |
TWI686666B true TWI686666B (en) | 2020-03-01 |
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JP7291684B2 (en) * | 2018-10-29 | 2023-06-21 | 家登精密工業股▲ふん▼有限公司 | Reticle holding system |
TWI707197B (en) * | 2018-12-27 | 2020-10-11 | 美商微相科技股份有限公司 | Photomask protective film assembly with moisture absorption and its surface treatment method |
TWI730423B (en) * | 2019-09-24 | 2021-06-11 | 美商微相科技股份有限公司 | Mask box structure |
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US4953312A (en) * | 1988-10-04 | 1990-09-04 | Pico-Glass, S.P.A. | Panel to be applied to back of a picture frame for retaining the picture and its protective panel |
US7607543B2 (en) * | 2005-02-27 | 2009-10-27 | Entegris, Inc. | Reticle pod with isolation system |
US8220630B1 (en) * | 2011-01-11 | 2012-07-17 | Gudeng Precision Industrial Co, Ltd | EUV pod with fastening structure |
TW201523126A (en) * | 2013-10-31 | 2015-06-16 | Entegris Inc | A modular reticle pod system |
US20150266660A1 (en) * | 2012-10-19 | 2015-09-24 | Entegris, Inc. | Reticle pod with cover to baseplate alignment system |
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US4953312A (en) * | 1988-10-04 | 1990-09-04 | Pico-Glass, S.P.A. | Panel to be applied to back of a picture frame for retaining the picture and its protective panel |
US7607543B2 (en) * | 2005-02-27 | 2009-10-27 | Entegris, Inc. | Reticle pod with isolation system |
US8220630B1 (en) * | 2011-01-11 | 2012-07-17 | Gudeng Precision Industrial Co, Ltd | EUV pod with fastening structure |
US20150266660A1 (en) * | 2012-10-19 | 2015-09-24 | Entegris, Inc. | Reticle pod with cover to baseplate alignment system |
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