CN111605892A - Photomask box and holder thereof - Google Patents
Photomask box and holder thereof Download PDFInfo
- Publication number
- CN111605892A CN111605892A CN201910263385.3A CN201910263385A CN111605892A CN 111605892 A CN111605892 A CN 111605892A CN 201910263385 A CN201910263385 A CN 201910263385A CN 111605892 A CN111605892 A CN 111605892A
- Authority
- CN
- China
- Prior art keywords
- mask
- elastic body
- strip
- holder
- reticle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000000087 stabilizing effect Effects 0.000 claims description 10
- 239000004696 Poly ether ether ketone Substances 0.000 claims description 9
- 229920002530 polyetherether ketone Polymers 0.000 claims description 9
- 229920001971 elastomer Polymers 0.000 claims description 6
- 239000004033 plastic Substances 0.000 claims description 5
- 229920002379 silicone rubber Polymers 0.000 claims description 3
- 229920002725 thermoplastic elastomer Polymers 0.000 claims description 3
- 239000004945 silicone rubber Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000013016 damping Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 239000000969 carrier Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D81/00—Containers, packaging elements, or packages, for contents presenting particular transport or storage problems, or adapted to be used for non-packaging purposes after removal of contents
- B65D81/02—Containers, packaging elements, or packages, for contents presenting particular transport or storage problems, or adapted to be used for non-packaging purposes after removal of contents specially adapted to protect contents from mechanical damage
- B65D81/05—Containers, packaging elements, or packages, for contents presenting particular transport or storage problems, or adapted to be used for non-packaging purposes after removal of contents specially adapted to protect contents from mechanical damage maintaining contents at spaced relation from package walls, or from other contents
- B65D81/107—Containers, packaging elements, or packages, for contents presenting particular transport or storage problems, or adapted to be used for non-packaging purposes after removal of contents specially adapted to protect contents from mechanical damage maintaining contents at spaced relation from package walls, or from other contents using blocks of shock-absorbing material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D25/00—Details of other kinds or types of rigid or semi-rigid containers
- B65D25/02—Internal fittings
- B65D25/10—Devices to locate articles in containers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D77/00—Packages formed by enclosing articles or materials in preformed containers, e.g. boxes, cartons, sacks or bags
- B65D77/22—Details
- B65D77/24—Inserts or accessories added or incorporated during filling of containers
- B65D77/26—Elements or devices for locating or protecting articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D85/00—Containers, packaging elements or packages, specially adapted for particular articles or materials
- B65D85/30—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
- G03F7/2063—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam for the production of exposure masks or reticles
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Library & Information Science (AREA)
- Toxicology (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The invention provides a photomask box and a fixing piece thereof. The fixing piece mainly comprises a supporting body, at least one strip-shaped supporting piece, an elastic body and at least one fixing hole. The elastic body is provided with at least one opening, and the elastic body covers the supporting body and enables each strip-shaped supporting piece to exceed each opening and extend upwards to form a protruding part. The at least one fixing hole is arranged on the supporting body and the elastic body. And the fixing piece is arranged in a photomask box through the at least one fixing hole.
Description
Technical Field
The invention provides a mask box and a holder thereof, in particular to a holder for covering a support body by an elastic body and a mask box using the holder.
Background
In the semiconductor manufacturing industry, masks used in photolithography and other etching techniques are different in size according to the size of the substrate used in the manufacturing process.
Among the various semiconductor processes, the substrate and mask used in the process of manufacturing thin film transistor liquid crystal display (TFT-LCD) generally have large sizes, so that the substrate and mask can be used to manufacture larger semiconductor devices and applied to large-sized panels.
For such large-sized masks, special carriers are often required to assist in providing storage and transport thereof. Since the large-sized mask is substantially a fragile plate-shaped sheet, the periphery of four corners of the interior of the conventional large-sized mask storage box is often provided with rubber or silicon-made retainers. When the upper cover and the lower cover of the large-size mask box are closed, eight points of the four corners are abutted against the large-size mask. Provides certain stability and damping capability, and reduces the problem that the large-size photomask is damaged due to collision or shaking.
The same technology has been widely used in various sizes of reticle storage or transport boxes. The mask is secured by similar techniques, reducing the chance of damage due to physical impact. However, similar holders still have certain disadvantages. Such as silicone rubber or rubber, which is in direct contact with the photomask for a certain period of time after long-term use, is prone to cause the problems of peeling off the photomask due to adhesion and even marking on the photomask. However, the effect of using other damping materials is not good when applied to the mask holding function.
Disclosure of Invention
To solve the problems mentioned in the background art, the present invention provides a mask box and a holder thereof. First, the fixing member mainly includes a supporting body, at least one strip-shaped supporting member, an elastic body and at least one fixing hole. The elastic body is provided with at least one opening, and the elastic body covers the supporting body and enables each strip-shaped supporting piece to exceed each opening and extend upwards to form a protruding part. And the at least one fixing hole is arranged on the supporting body and the elastic body. And finally, the fixing piece is arranged in a photomask box through the at least one fixing hole.
Based on the selection of the fixing member, the mask box of the present invention mainly comprises an upper cover, a lower cover and at least one fixing member. Wherein the lower cover and the upper cover are matched and sealed to form an inner surface, and the at least one holding piece is arranged on the inner surface.
In the mask box, each of the holders includes a support body, at least one strip-shaped support, an elastic body, and at least one fixing hole. The elastic body is provided with at least one opening, and the elastic body covers the supporting body and enables each strip-shaped supporting piece to exceed each opening and extend upwards to form a protruding part. And the at least one fixing hole is arranged on the supporting body and the elastic body.
The foregoing summary of the invention is provided to introduce a basic description of several aspects and features of the present invention. This summary is not an extensive overview of the invention, and is intended to neither identify key or critical elements of the invention nor delineate the scope of the invention, but to present some concepts of the invention in a simplified form.
Drawings
FIG. 1 is a schematic structural view of a holder according to an embodiment of the present invention;
FIG. 2 is a schematic structural diagram of a support body and a bar-shaped support member according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of an appearance structure of a mask box according to an embodiment of the present invention;
FIG. 4 is a schematic view of a position of a holder according to an embodiment of the present invention;
FIG. 5 is a cross-sectional view of a retaining mask according to an embodiment of the present invention.
The reference numbers illustrate:
10 holder
100 support body
101 strip support
101a strip support
101b strip support
102 elastic body
103 opening
104a fixing hole
104b fixing hole
105 stabilizing rib
106 stabilizer
200 light shield box
201 upper cover
202 lower cover
203 inner surface
204 mortise and tenon slot
R mask
Detailed Description
In order to understand the technical features and practical effects of the present invention and to implement the invention according to the content of the specification, a preferred embodiment as shown in the drawings is further described, and the following detailed description is made:
referring to fig. 1 and fig. 2, fig. 1 is a schematic structural diagram of a holder according to an embodiment of the invention; fig. 2 is a schematic structural diagram of a support body and a bar-shaped support member according to an embodiment of the present invention.
As shown in fig. 1, the holder 10 of the embodiment in fig. 1 mainly includes a support body 100, at least one bar-shaped support 101, an elastic body 102, and at least one fixing hole 104 a. Wherein, at least one strip-shaped supporting member 101 is disposed on the supporting body 100, and the elastic body 102 has at least one opening 103, and the elastic body 102 covers the supporting body 100 and makes each strip-shaped supporting member 101 extend upwards to form a protruding portion beyond each opening 103. In this way, when the bar-shaped support 101 abuts against the mask R (refer to fig. 5), no physical contact is generated with the elastic body 102.
The at least one fixing hole 104b and the at least one fixing hole 104a are sequentially disposed on the supporting body 100 (fig. 2) and the elastic body 102 (fig. 1). The holder 10 is disposed in the mask box 200 through the at least one fixing hole (104a and 104b) (refer to fig. 4 and 5).
In this embodiment, the material of the elastic body 102 may be silicon rubber or rubber, and the material of the supporting body 100 may be plastic. Furthermore, in the embodiment, the plastic material selected for the support body 100 is Polyetheretherketone (PEEK); while the Rubber of the elastomeric body 102 is a thermoplastic Rubber (TPR). As shown in fig. 1, the elastic body 102 of the present embodiment is further provided with at least one combination of at least one stabilizing wing 106 of at least one stabilizing rib 105 at the periphery thereof.
In the embodiment shown in fig. 1, the plastic material selected for the support body 100 and the upper strip-shaped support member 101 is Polyetheretherketone (PEEK), so that the support body can not only support the mask R (see fig. 5), but also resist wear and prevent the generation of micro particles. In addition, since the support body 100 is covered by the elastic body 102, the damage of the mask R supported by at least one strip-shaped support member 101 of the support body 100 due to shaking and collision can be effectively reduced by the damping characteristic of the material of the elastic body 102.
Referring to fig. 3 and fig. 4, fig. 3 is a schematic view of an appearance structure of a mask box according to an embodiment of the invention; fig. 4 is a schematic view of the arrangement position of the holder according to the embodiment of the present invention.
As shown in FIG. 3, in the embodiment of FIG. 3, a reticle pod 200 employing the holder 10 of the embodiment of FIG. 1 is shown. The reticle pod 200 generally includes an upper cover 201, a lower cover 202, and at least one holder 10 of FIG. 1. As shown in fig. 3 and 4, the lower cover 202 and the upper cover 201 are mated to form an inner surface 203 (fig. 4 only takes the inner surface 203 of the upper cover 201 as an example), and the at least one holder 10 is disposed on the inner surface 203.
In the present embodiment, the mask box 200 is a mask storage box, and more particularly, a large-sized mask box, and the large-sized mask box can be further used for carrying the mask R (e.g., the plate-shaped sheet shown in fig. 5). The mask R has a dimension of 800 mm and 960 mm, respectively. Of course, in other possible implementations, the reticle and reticle Pod may also be a reticle transfer Pod or an extreme ultraviolet light Pod (EUV Pod).
In the embodiment of fig. 4, a large-sized reticle box as the reticle box 200 has at least one mortise 204 on each of four peripheral edges of an inner surface 203, and each holder 10 is fixed in each mortise 204 through at least one fixing hole (104a or 104 b).
Referring to fig. 5, fig. 5 is a cross-sectional structure diagram of a supporting mask according to an embodiment of the invention. As shown in fig. 5, in the present embodiment, when the upper cover 201 and the lower cover 202 of the mask box 200 are closed and the holders 10 disposed on the four peripheral edges of the inner surface 203 thereof vertically hold the mask R, the strip-shaped supports 101a of the upper cover 201 and the strip-shaped supports 101b of the lower cover 202 hold the mask R. Since the material of the bar-shaped supports 101a and 101b of the present embodiment is Polyetheretherketone (PEEK), the problem of easy generation of fine particles due to contact with the mask R can be avoided.
In addition, due to the material characteristics of Polyetheretherketone (PEEK), the problems of adhesion to the mask R, even peeling, etc. in the conventional technique can be directly avoided. As can be seen from the cross section of fig. 5, when the holder 10 is fixed in the mortise 204, the elastic body 102 can provide an effective damping means for the support body 100 and the bar-shaped support 101b, thereby greatly reducing the problem of damage to the mask R caused by shaking or collision during transportation.
In addition, in order to further prevent the retainer 10 from falling or peeling off from the mortise 204, the elastic body 102 is further provided with a stabilizing rib 105, in addition to being fixed by the elastic body 102 and the hole 104 on the supporting body 100 (see fig. 2). As shown in fig. 5, in the present embodiment, the stabilizing rib 105 is embedded in the sidewall of the mortise 204, so as to greatly increase the friction between the elastic body 102 and the mortise 204, and make the retainer 10 less likely to fall off or peel off from the mortise 204 due to external force.
In addition, the design of the stabilizing rib 105 further facilitates release operations in industrial manufacturing, providing a substantially progressive technical feature, whether in use or manufacture. Similarly, stabilizer 106 shown in FIG. 1 also functions in the same manner.
The above description is only a preferred embodiment of the present invention, and the scope of the present invention should not be limited thereby, and the invention is intended to be covered by the appended claims and their equivalents.
Claims (11)
1. A holder, comprising:
a support body;
the support body is provided with at least one strip-shaped support piece;
the elastic body is provided with at least one opening, and the elastic body covers the supporting body and enables each strip-shaped supporting piece to exceed each opening and extend upwards to form a protruding part; and
at least one fixing hole is arranged on the supporting body and the elastic body;
wherein, the fixing piece is arranged in a photomask box through the at least one fixing hole.
2. The retainer of claim 1, wherein the resilient body is made of rubber.
3. The holder according to claim 2, wherein the support body and the at least one strip-shaped support are made of plastic.
4. A holder according to claim 3, wherein the plastic is polyetheretherketone.
5. Holder according to claim 4, characterized in that the rubber is silicone rubber or thermoplastic rubber.
6. The retainer of claim 1, wherein the resilient body further comprises at least one stabilizing rib, at least one stabilizing wing, or a combination thereof disposed about the periphery thereof.
7. A reticle pod comprising:
an upper cover;
a lower cover matched and sealed with the upper cover to form an inner surface; and
at least one holder disposed on the inner surface, each holder comprising: a support body; the support body is provided with at least one strip-shaped support piece; the elastic body is provided with at least one opening, and the elastic body covers the supporting body and enables each strip-shaped supporting piece to exceed each opening and extend upwards to form a protruding part; and at least one fixing hole arranged on the supporting body and the elastic body.
8. The reticle pod of claim 7, wherein the reticle pod is a reticle transport pod, a reticle storage pod or an extreme ultraviolet reticle pod.
9. The mask box of claim 8, wherein the mask storage box further carries a mask, and the mask dimension is 800 mm long and 920-960 mm wide.
10. The reticle pod of claim 8, wherein the inner surface of the reticle storage cassette is provided with at least one mortise around each periphery thereof, and each of the retainers is fixed in each of the mortises through the at least one fixing hole.
11. The mask cartridge of claim 10 wherein the elastomeric body further comprises at least one stabilizing rib, at least one stabilizing wing, or a combination thereof disposed about the periphery thereof.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW108106377A TWI680086B (en) | 2019-02-25 | 2019-02-25 | Reticle pod and retainer thereof |
TW108106377 | 2019-02-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN111605892A true CN111605892A (en) | 2020-09-01 |
Family
ID=69582744
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201910263385.3A Pending CN111605892A (en) | 2019-02-25 | 2019-04-02 | Photomask box and holder thereof |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR102205065B1 (en) |
CN (1) | CN111605892A (en) |
TW (1) | TWI680086B (en) |
Citations (10)
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JPH05175321A (en) * | 1991-07-12 | 1993-07-13 | Canon Inc | Board container and lid opener |
US20040004704A1 (en) * | 2002-07-05 | 2004-01-08 | Entegris, Inc. | Reticle carrier |
TWI224719B (en) * | 2003-05-28 | 2004-12-01 | Gudeng Prec Ind Co Ltd | Reinforced structure device of mask frame |
JP2008265761A (en) * | 2007-04-16 | 2008-11-06 | Miraial Kk | Reticle case |
CN101364557A (en) * | 2007-08-09 | 2009-02-11 | 亿尚精密工业股份有限公司 | Load moving container and bearing structure applicable to the same |
TW201111244A (en) * | 2009-09-25 | 2011-04-01 | Gudeng Prec Industral Co Ltd | Reticle pod |
TWM467088U (en) * | 2013-04-12 | 2013-12-01 | Ming-Sheng Chen | Mask support structure |
CN203486280U (en) * | 2013-08-05 | 2014-03-19 | 玮懋科技材料股份公司 | Photomask receiving box structure |
CN204167279U (en) * | 2014-10-10 | 2015-02-18 | 家登精密工业股份有限公司 | Box for photomask |
CN210113201U (en) * | 2019-02-25 | 2020-02-25 | 家登精密工业股份有限公司 | Photomask box and holder thereof |
Family Cites Families (7)
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DE60134179D1 (en) * | 2000-07-10 | 2008-07-03 | Entegris Inc | SMIF CONTAINERS WITH ELECTROSTATIC CHARGES OF LEADING SUPPORT STRUCTURE FOR RETICIAL WASTE |
EP1928764B1 (en) * | 2005-09-27 | 2011-11-02 | Entegris, Inc. | Reticle pod |
TWM292568U (en) * | 2005-12-02 | 2006-06-21 | Shu-Yuan Huang | Improved structure of enhancer pole of base supporting tray |
JP4722883B2 (en) * | 2007-06-20 | 2011-07-13 | 山下ゴム株式会社 | Torque rod |
JP4881848B2 (en) * | 2007-12-19 | 2012-02-22 | 東海ゴム工業株式会社 | Anti-vibration connecting rod |
TWI623810B (en) * | 2017-01-26 | 2018-05-11 | 家登精密工業股份有限公司 | Reticle pod |
CN207327753U (en) * | 2017-08-31 | 2018-05-08 | 无锡市明傲耐磨科技有限公司 | The buffer bar of the double hardness post-cure rubber structures of concave inlaid |
-
2019
- 2019-02-25 TW TW108106377A patent/TWI680086B/en active
- 2019-04-01 KR KR1020190037614A patent/KR102205065B1/en active IP Right Grant
- 2019-04-02 CN CN201910263385.3A patent/CN111605892A/en active Pending
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05175321A (en) * | 1991-07-12 | 1993-07-13 | Canon Inc | Board container and lid opener |
US20040004704A1 (en) * | 2002-07-05 | 2004-01-08 | Entegris, Inc. | Reticle carrier |
TWI224719B (en) * | 2003-05-28 | 2004-12-01 | Gudeng Prec Ind Co Ltd | Reinforced structure device of mask frame |
JP2008265761A (en) * | 2007-04-16 | 2008-11-06 | Miraial Kk | Reticle case |
CN101364557A (en) * | 2007-08-09 | 2009-02-11 | 亿尚精密工业股份有限公司 | Load moving container and bearing structure applicable to the same |
TW201111244A (en) * | 2009-09-25 | 2011-04-01 | Gudeng Prec Industral Co Ltd | Reticle pod |
TWM467088U (en) * | 2013-04-12 | 2013-12-01 | Ming-Sheng Chen | Mask support structure |
CN203486280U (en) * | 2013-08-05 | 2014-03-19 | 玮懋科技材料股份公司 | Photomask receiving box structure |
CN204167279U (en) * | 2014-10-10 | 2015-02-18 | 家登精密工业股份有限公司 | Box for photomask |
CN210113201U (en) * | 2019-02-25 | 2020-02-25 | 家登精密工业股份有限公司 | Photomask box and holder thereof |
Also Published As
Publication number | Publication date |
---|---|
KR102205065B1 (en) | 2021-01-20 |
TWI680086B (en) | 2019-12-21 |
TW202031570A (en) | 2020-09-01 |
KR20200104192A (en) | 2020-09-03 |
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