SU1560070A3 - Фотополимеризующа с композици - Google Patents
Фотополимеризующа с композици Download PDFInfo
- Publication number
- SU1560070A3 SU1560070A3 SU864028235A SU4028235A SU1560070A3 SU 1560070 A3 SU1560070 A3 SU 1560070A3 SU 864028235 A SU864028235 A SU 864028235A SU 4028235 A SU4028235 A SU 4028235A SU 1560070 A3 SU1560070 A3 SU 1560070A3
- Authority
- SU
- USSR - Soviet Union
- Prior art keywords
- ethylenically unsaturated
- initiator
- compound
- composition
- diphenylethanone
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 9
- 150000001875 compounds Chemical class 0.000 claims description 11
- 239000003999 initiator Substances 0.000 claims description 5
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 claims description 3
- RWGFKTVRMDUZSP-UHFFFAOYSA-N cumene Chemical compound CC(C)C1=CC=CC=C1 RWGFKTVRMDUZSP-UHFFFAOYSA-N 0.000 claims description 3
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 claims description 2
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 claims description 2
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 claims description 2
- 229910019142 PO4 Inorganic materials 0.000 claims description 2
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 claims description 2
- 239000010452 phosphate Substances 0.000 claims description 2
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Natural products C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 claims 1
- 150000003254 radicals Chemical class 0.000 abstract 2
- 238000010504 bond cleavage reaction Methods 0.000 abstract 1
- 238000003776 cleavage reaction Methods 0.000 abstract 1
- BOXSCYUXSBYGRD-UHFFFAOYSA-N cyclopenta-1,3-diene;iron(3+) Chemical class [Fe+3].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 BOXSCYUXSBYGRD-UHFFFAOYSA-N 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 239000011241 protective layer Substances 0.000 abstract 1
- 229920002635 polyurethane Polymers 0.000 description 3
- 239000004814 polyurethane Substances 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 229940126062 Compound A Drugs 0.000 description 2
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
- G03C1/725—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing inorganic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/124—Carbonyl compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/126—Halogen compound containing
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Polymerisation Methods In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Изобретение касаетс фотоматериалов, в частности фотополимеризующейс композиции дл получени печатных плат. Цель изобретени - повышение светочувствительности покрыти . Композици содержит, мас.ч:этиленненасыщенное соединение или смесь таких соединений 100
(*98N6-изопропилбензол)-(*98N5-циклопентадиенил) железо (2+)-гексафторфосфат (А) 0,2-3
инициатор 0,5-2, причем соотношение последнего к А составл ет от 1:3 до 2,5:1. В качестве инициатора используют 2,2-диметокси-, или 2,2-диэтокси-1,2-дифенилэтанон-1
или 2,2-диметил-2-гидроксиацетофенон, или 1-гидроксициклогексил-фенил-кетон. В этом случае относительна светочувствительность композиции повышаетс по сравнению с известной (инициатор трет-бутилгидроперекись) с 0,5-2 до 27 (по максимальному числс ступеней ступенчатого клина, под которым образовалась пленка полимера). 1 табл.
Description
Изобретение относитс к области фотополимеризующихс композиций (ФПЮ дл получени печатных плат.
Целью изобретени вл етс повышение светочувствительности покрыти .
Пример 1 . 100 мае.ч. эпокси- акрилата смешивают с 1 мае.ч. (ч изопропилбензол) -(ij -циклопентадие- нил)железо(П)-гексафтор(Ъосфата (А) и мае.ч. 2,2-диметокси-1,2-дифенил- этанона (В). Полученный раствор нанос т толщиной 1,25 мм на отражающую черную бумагу. На рассто нии 0,5 мм над покрытием монтируют ступенчатый клин с 50 ступен ми различной оптической поопусклемости. Пробы освещают через этот негатив с помощью стационарной ртутной лампы, причем выдел ема энерги равна 160 мДж/см1. Затем определ ют наивысшую ступень ступенчатого клина, под которой образовалась пленка полимера. Это максимальное -число ступеней вл етс критерием дл относительной светочувствительности ФПК. Чем выше число ступеней, тем чувствительнее готовый препарат. Дл данного примера число максимальных ступеней равно 13.
Примеры 2иЗ. Получают ФПК, как в примере 1, с той разницей, что измен ют количественное содержание и соотношение Л и В.
Примеры . Получают ФПК, как в примеое 1, г той разницей, что
ел
Ф
см
в качестве этиленненасыщенного соединени ИСПОЛЬЗУЮТ полиуретанакрилаты различных марок и варьируетс соотношение А и В.
Примеры 12 и 13. В качестве этиленненасыщенного соединени служит полиуретанметакрилат, при этом в примере 12 инициатором вл етс 2,2-ди- этокси-1 ,2-дифенилэтанон-1 (С), а в примере 13 - 2,2-диметил-2-гидрокси- ацетофенон (D).
Пример 14. ФПК получает смешиванием этиленненасыщенных соединений и фотоинициирующей системы при следующем соотношении, мае.ч.:
Полиуретанакрилат80
Полиэтиленгликольдимет-
ак| илатс15
N-Винилпирролидон5
(.1 -Изопропилбензол) (1/-циклопентадиенил)желеэо (11)-гексафторфосфат 3
2,2-Диметокси-1,2-дийенилэтанон-12
Раствор нанос т на черную бумагу, как описано в примере 1, и освещают через 50-ступенчатый негатив-маску с энергией излучени 160 мДж/см2. Значение относительной светочувствитель- ности равно 21 .
Примеры 15-25. Готов т смесь этиленненасыщенных соединений, как в примере 14, с той разницей, что варьируетс количественное содержа- ние соединени А, а в качестве инициатора служит одно из соединений из р да: 2,2-диметокси-1,2-дифенилэта- нон-1 (В); 2,2-диэтокси-1 ,2-дифенил- этанон-1 (С); 2,2-диметил-2-гидрокси- ацетофенон (D) ; 1 -гидроксициклогек- сил-фенил-кетон (Е).
Примеры 26-28 (прототип). Готов т смесь этиленненасыщенных соединений и соединени А, как в примере 14, с той разницей, что в качестве инициатора служит трет-бутилгидропе- рекись (ТБГП).
Результаты относительной светочувствительности представлены в таблице
Как следует из таблицы, относительна светочувствительность ФПК, включающих соединени В, С, D и Е, значительно выше, чем ЩК-прототипа,
Claims (1)
- Формула изобретениФотополимеризующа с композици , включающа этиленненасыщенное соединение или смесь этиленненасыщенных соединений, ( -изопропилбензол)-( ч$- циклопентадиенил)железо (II} -гексафтор фосфат (А} и инициатор, отличающа с тем, что, с целью повышени светочувствительности, она содержит в качестве инициатора соединение из р да: 2,2-диметокси-1,2-ди- фенилэтанон- , 2,2-диэтокси-1 ,2-ди- фенилэтанон-1, 2,2-диметил-2-гидрок- сиацетофенон, 1-гидроксициклогексил- фенил-кетон при следующем соотношении компонентов, мае.ч.: Этиленненасыщенное соединение или смесь этиленненасыщенных соединений1 00 (ц -Изопропипбензол) -(ч5- циклопентадиенил)железо (II) -гексафторфосйат 0,2-3 Инициатор 0,5-2 причем соотношение А и инициатора составл ет 3:1 - 1:2,5.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/779,343 US4707432A (en) | 1985-09-23 | 1985-09-23 | Ferrocenium/alpha-cleavage photoinitiator systems for free radical polymerizable compositions |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SU1560070A3 true SU1560070A3 (ru) | 1990-04-23 |
Family
ID=25116120
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SU864028235A SU1560070A3 (ru) | 1985-09-23 | 1986-09-22 | Фотополимеризующа с композици |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US4707432A (ru) |
| EP (1) | EP0221010B1 (ru) |
| JP (1) | JPH0695212B2 (ru) |
| KR (1) | KR900005848B1 (ru) |
| AT (1) | ATE42644T1 (ru) |
| AU (1) | AU588627B2 (ru) |
| BR (1) | BR8604523A (ru) |
| CA (1) | CA1262200A (ru) |
| DE (1) | DE3663093D1 (ru) |
| ES (1) | ES2000400A6 (ru) |
| SU (1) | SU1560070A3 (ru) |
| ZA (1) | ZA867185B (ru) |
Families Citing this family (57)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR910000199B1 (ko) * | 1986-04-15 | 1991-01-23 | 시바-가이기 코오포레이숀 | 액체 광개시제 혼합물 |
| US4808638A (en) * | 1986-10-14 | 1989-02-28 | Loctite Corporation | Thiolene compositions on based bicyclic 'ene compounds |
| AU8155887A (en) * | 1986-10-14 | 1988-05-06 | Loctite Corporation | Visible light curable free radical compositions containing pi-arene metal complexes |
| ES2039691T3 (es) * | 1987-06-05 | 1993-10-01 | Ciba-Geigy Ag | Mezclas polimerizables cationicamente, que contienen endurecedores seleccionados. |
| DE3888400D1 (de) * | 1987-06-12 | 1994-04-21 | Ciba Geigy | Photoresistzusammensetzungen. |
| US4801392A (en) * | 1987-07-02 | 1989-01-31 | The Mead Corporation | Magnetic recording compositions containing ionic dye compounds as initiators |
| JPS6454440A (en) * | 1987-08-24 | 1989-03-01 | Toyo Boseki | Photopolymerizable composition |
| US5147900A (en) * | 1987-08-28 | 1992-09-15 | Minnesosta Mining And Manufacturing Company | Energy-induced dual curable compositions |
| US4950696A (en) * | 1987-08-28 | 1990-08-21 | Minnesota Mining And Manufacturing Company | Energy-induced dual curable compositions |
| US5086086A (en) * | 1987-08-28 | 1992-02-04 | Minnesota Mining And Manufacturing Company | Energy-induced curable compositions |
| US4952612A (en) * | 1987-08-28 | 1990-08-28 | Minnesota Mining And Manufacturing Company | Energy-induced curable compositions |
| EP0320237B1 (en) * | 1987-12-08 | 1993-04-28 | Mitsui Petrochemical Industries, Ltd. | Active energy ray-curable composition and optical recording medium having cured product of the composition |
| JP2658123B2 (ja) * | 1988-02-08 | 1997-09-30 | 東レ株式会社 | 感光性平版印刷版原版 |
| US4985340A (en) * | 1988-06-01 | 1991-01-15 | Minnesota Mining And Manufacturing Company | Energy curable compositions: two component curing agents |
| JP2757375B2 (ja) * | 1988-06-02 | 1998-05-25 | 東洋紡績株式会社 | 光重合性組成物 |
| DE3918105A1 (de) * | 1988-06-02 | 1989-12-14 | Toyo Boseki | Photopolymerisierbare zusammensetzung |
| JPH022562A (ja) * | 1988-06-13 | 1990-01-08 | Toyobo Co Ltd | 光重合性組成物 |
| JPH021859A (ja) * | 1988-06-13 | 1990-01-08 | Toyobo Co Ltd | 感光性樹脂組成物 |
| JP3035740B2 (ja) * | 1988-06-22 | 2000-04-24 | 東洋紡績株式会社 | 感光性樹脂組成物 |
| DE3832032A1 (de) * | 1988-09-21 | 1990-03-22 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| US5102775A (en) * | 1988-09-30 | 1992-04-07 | Kansai Paint Co., Ltd. | Visible light sensitive electrodeposition coating composition and image-forming method using the same |
| JPH02114266A (ja) * | 1988-10-24 | 1990-04-26 | Toyobo Co Ltd | 光重合性組成物 |
| US4954414A (en) * | 1988-11-08 | 1990-09-04 | The Mead Corporation | Photosensitive composition containing a transition metal coordination complex cation and a borate anion and photosensitive materials employing the same |
| EP0413087A1 (en) * | 1989-07-20 | 1991-02-20 | International Business Machines Corporation | Photosensitive composition and use thereof |
| JP2775880B2 (ja) * | 1989-08-21 | 1998-07-16 | ブラザー工業株式会社 | 転写記録媒体 |
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| DE2966764D1 (en) * | 1978-10-27 | 1984-04-12 | Ici Plc | Polymerisable compositions, derived coatings and other polymerised products |
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| DE3366408D1 (en) * | 1982-05-19 | 1986-10-30 | Ciba Geigy Ag | Photopolymerisation with organometal salts |
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| DE3561155D1 (ru) * | 1984-02-10 | 1988-01-21 | Ciba-Geigy Ag | |
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- 1985-09-23 US US06/779,343 patent/US4707432A/en not_active Expired - Lifetime
-
1986
- 1986-09-17 DE DE8686810416T patent/DE3663093D1/de not_active Expired
- 1986-09-17 AT AT86810416T patent/ATE42644T1/de not_active IP Right Cessation
- 1986-09-17 EP EP86810416A patent/EP0221010B1/de not_active Expired
- 1986-09-19 CA CA000518625A patent/CA1262200A/en not_active Expired
- 1986-09-22 SU SU864028235A patent/SU1560070A3/ru active
- 1986-09-22 JP JP61224048A patent/JPH0695212B2/ja not_active Expired - Lifetime
- 1986-09-22 BR BR8604523A patent/BR8604523A/pt not_active IP Right Cessation
- 1986-09-22 ZA ZA867185A patent/ZA867185B/xx unknown
- 1986-09-23 ES ES8602105A patent/ES2000400A6/es not_active Expired
- 1986-09-23 AU AU63083/86A patent/AU588627B2/en not_active Ceased
- 1986-09-23 KR KR1019860007939A patent/KR900005848B1/ko not_active IP Right Cessation
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| Title |
|---|
| Европейский патент № 01267J2, кл. G 03 С 1/68, опублик. 28.11.84. * |
Also Published As
| Publication number | Publication date |
|---|---|
| ZA867185B (en) | 1987-05-27 |
| BR8604523A (pt) | 1987-05-19 |
| KR900005848B1 (ko) | 1990-08-13 |
| ES2000400A6 (es) | 1988-02-16 |
| AU6308386A (en) | 1987-03-26 |
| JPH0695212B2 (ja) | 1994-11-24 |
| EP0221010A1 (de) | 1987-05-06 |
| EP0221010B1 (de) | 1989-04-26 |
| AU588627B2 (en) | 1989-09-21 |
| CA1262200A (en) | 1989-10-03 |
| KR870003402A (ko) | 1987-04-17 |
| JPS6290648A (ja) | 1987-04-25 |
| US4707432A (en) | 1987-11-17 |
| DE3663093D1 (en) | 1989-06-01 |
| ATE42644T1 (de) | 1989-05-15 |
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