KR890017278A - 광개시제 공중합체 - Google Patents
광개시제 공중합체 Download PDFInfo
- Publication number
- KR890017278A KR890017278A KR1019890006412A KR890006412A KR890017278A KR 890017278 A KR890017278 A KR 890017278A KR 1019890006412 A KR1019890006412 A KR 1019890006412A KR 890006412 A KR890006412 A KR 890006412A KR 890017278 A KR890017278 A KR 890017278A
- Authority
- KR
- South Korea
- Prior art keywords
- alkyl
- photoinitiator
- alkoxy
- phenyl
- copolymer
- Prior art date
Links
- 229920001577 copolymer Polymers 0.000 title claims 8
- 125000000217 alkyl group Chemical group 0.000 claims 8
- 125000003545 alkoxy group Chemical group 0.000 claims 5
- 150000001875 compounds Chemical class 0.000 claims 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 4
- 229910052801 chlorine Inorganic materials 0.000 claims 3
- 239000000460 chlorine Substances 0.000 claims 3
- 229910052736 halogen Inorganic materials 0.000 claims 3
- 150000002367 halogens Chemical class 0.000 claims 3
- 125000004423 acyloxy group Chemical group 0.000 claims 2
- 125000003342 alkenyl group Chemical group 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 2
- 230000005855 radiation Effects 0.000 claims 2
- 238000003847 radiation curing Methods 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 1
- JRNVZBWKYDBUCA-UHFFFAOYSA-N N-chlorosuccinimide Chemical compound ClN1C(=O)CCC1=O JRNVZBWKYDBUCA-UHFFFAOYSA-N 0.000 claims 1
- 239000000654 additive Substances 0.000 claims 1
- 125000002947 alkylene group Chemical group 0.000 claims 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 claims 1
- 125000001589 carboacyl group Chemical group 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 239000011248 coating agent Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 125000001261 isocyanato group Chemical group *N=C=O 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000178 monomer Substances 0.000 claims 1
- 125000005504 styryl group Chemical group 0.000 claims 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F216/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
- C08F216/12—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an ether radical
- C08F216/14—Monomers containing only one unsaturated aliphatic radical
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F218/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an acyloxy radical of a saturated carboxylic acid, of carbonic acid or of a haloformic acid
- C08F218/02—Esters of monocarboxylic acids
- C08F218/04—Vinyl esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F226/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F228/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F230/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing phosphorus
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F246/00—Copolymers in which the nature of only the monomers in minority is defined
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paints Or Removers (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
Abstract
내용 없음
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
Claims (8)
- 일반식(I)일반식(Ⅱ)의 적어도 두개의 상이한 단량체단위를 (I)/(Ⅱ)의 비율이 1내지 100이 되게 공중합시켜서 얻은 분자량 500내지 1,000,000을 가지는 광개시제 공중합체.여기서, Ra와 Rb는 상호 독립적으로 각각, H,Cl,CN,C1-6-알킬 또는 페닐이고, X는 CO-,COO-,O-,CO-,(CH2)nY,COO(CH2)nY,CO(OCH2CH|2)nY이고, 여기서 n=1 내지 10 그리고 Y는 단일결합, -O-,-S-,-CO-,-COO-,-OCO-,NH- 또는 -N(C1-6알킬)-이고, IN은 기본 광개시제 구조의 하나로또는이고, 여기서 R은 -CR3R4R5또는이고, R1은 R2는 H, 할로겐, C1-12알킬 또는 C1-12알콕시이고, R3과 R4는 상호 독립적으로 각각 H, C1-12알킬 또는 C1-12알케닐, C1-12알콕시 또는 함께 C2-6알킬렌이고, R5는 -OH, C1-6알콕시, C1-6알카노일옥시, -N(C1-6알킬)|2,, -SO2R7또는 -OSO2R7이고 R6은 C1-6알킬, C1-6알카노일, 페닐 또는 벤조일이고 각 경우에 임의적으로 할로겐, C1-6알킬 또는 C1-6알콕시로 치환되고 R7은 C1-6알킬 또는 페닐이고, A는 상술한 기본광개시제 구조 IN의 하나 또는 H, C1-12알킬, C1-12알케닐, 페닐, 스티릴, 할로겐, NCO, NCS, N3, SO3H, SO2Cl, CRc=CRdRe또는이고, 여기서, Rc,Rd및 Re는 각각 H 또는 CH3이고, 또 SiRfRgRh이고, 여기서, Rf,Rg및 Rh는 각각 염소, C1-12알킬, C1-12알콕시 또는 C1-12알카노일옥시이다.
- 에틸렌성 불포화 화합물 또는 이러한 화합물은 함유하는 계의 광중합반응용 광개시제로 사용되는 제1항에 의한 공중합체로서의 용도.
- 적어도 제1항에 의한 광개시제 공중합체 하나를 중합할 혼합물에 가하는 것을 특징으로 하는 에틸렌성 불포화 화합물을 함유하는 공중합성 계의 제조방법.
- 제3항에 있어서, 제1항의 광개시제 공중합체 0.1 내지 20중량%를 중합하는 혼합물에 가하는 것을 특징으로 하는 제조방법.
- 적어도 제1항에 의한 광개시제 공중합체 하나를 함유하는 것을 특징으로 하는 적어도 하나의 에틸렌성 불포화, 광중합성 화합물 및 필요시, 다른 공지 또는 통상의 첨가제를 함유하는 광중합성 계.
- 제1항에 의한 공중합체를 광개시제와 막형성 성분으로서 방사선 경화계에서동시에 사용하는 방사선 경화제.
- 실질적으로 제1항에 의한 공중합체 하나 또는 그이상으로 되는 방사선 경화제.
- 제5항 또는 제7항에 의한 계를 사용함을 특징으로 하는 기질을 공중합성 계로 피복하고 파장 250∼600nm의 UV광선으로 조사하여 경화가 되는 기질상에 방사선 경화된 피막의 제조방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEP3816304.7 | 1988-05-13 | ||
DE3816304A DE3816304A1 (de) | 1988-05-13 | 1988-05-13 | Fotoinitiator-copolymere |
Publications (2)
Publication Number | Publication Date |
---|---|
KR890017278A true KR890017278A (ko) | 1989-12-15 |
KR0141602B1 KR0141602B1 (ko) | 1998-07-01 |
Family
ID=6354278
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019890006412A KR0141602B1 (ko) | 1988-05-13 | 1989-05-13 | 광개시제 공중합체 |
Country Status (8)
Country | Link |
---|---|
EP (1) | EP0341560B1 (ko) |
JP (1) | JP2769628B2 (ko) |
KR (1) | KR0141602B1 (ko) |
AU (1) | AU627177B2 (ko) |
CA (1) | CA1336091C (ko) |
DD (1) | DD283825A5 (ko) |
DE (2) | DE3816304A1 (ko) |
FI (1) | FI892302A (ko) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4302123A1 (de) * | 1993-01-27 | 1994-07-28 | Herberts Gmbh | Verfahren zum Bedrucken von Glashohlkörpern |
GB9522683D0 (en) | 1995-11-06 | 1996-01-10 | Coates Brothers Plc | Photoinitiator |
AU4743696A (en) * | 1995-12-29 | 1997-07-28 | Minnesota Mining And Manufacturing Company | Use of pendant photoreactive moieties on polymer precursors to prepare hydrophilic pressure sensitive adhesives |
JPH1017635A (ja) * | 1996-07-08 | 1998-01-20 | Japan Synthetic Rubber Co Ltd | 注型重合用放射線硬化性樹脂組成物 |
US6025408A (en) * | 1997-03-27 | 2000-02-15 | First Chemical Corporation | Liquid thioxanthone photoinitiators |
US6458864B1 (en) | 1998-05-29 | 2002-10-01 | Ciba Specialty Chemicals Corporation | Photoinitiators having chain transfer groups polymerized to obtain macrophotoinitiators useful to give block copolymers |
KR20070042503A (ko) * | 2004-04-21 | 2007-04-23 | 앳슈랜드 라이센싱 앤드 인텔렉츄얼 프라퍼티 엘엘씨 | 내장 광개시제를 갖는 복사-경화성 마이클 부가 수지 |
JP5441574B2 (ja) * | 2009-09-08 | 2014-03-12 | 富士フイルム株式会社 | 水性インク組成物、インクセット、およびインクジェット画像形成方法 |
EP2617783A1 (en) | 2012-01-20 | 2013-07-24 | Cytec Surface Specialties, S.A. | Photo-reactive Binder |
EP2617705A1 (en) * | 2012-01-20 | 2013-07-24 | Cytec Surface Specialties, S.A. | Amino Photo-Reactive Binder |
WO2015010729A1 (en) | 2013-07-23 | 2015-01-29 | Allnex Belgium S.A. | Polymeric photoinitiators |
KR200488154Y1 (ko) | 2017-05-31 | 2018-12-21 | 이효리 | 애완동물 배변 봉투 수납 소지구 |
JP2021024933A (ja) * | 2019-08-02 | 2021-02-22 | 三菱ケミカル株式会社 | 共重合体、硬化性重合体組成物、硬化物、積層体 |
CN114591241B (zh) * | 2022-03-14 | 2024-02-13 | 内蒙古扬帆新材料有限公司 | 一种含有吡唑啉和α-氨基酮的分子内敏化大分子光引发剂及其制备方法和应用 |
EP4310105A1 (en) * | 2022-07-20 | 2024-01-24 | Arkema France | Acrylic copolymers imparting low yellowing after photocuring |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4318791A (en) * | 1977-12-22 | 1982-03-09 | Ciba-Geigy Corporation | Use of aromatic-aliphatic ketones as photo sensitizers |
IT1176018B (it) * | 1984-04-12 | 1987-08-12 | Lamberti Flli Spa | Chetoni aromatico alifatici polimerici o polimerizzabili adatti all'impiego come fotoiniziatori di polimerizzazione |
DE3738567A1 (de) * | 1987-03-12 | 1988-09-22 | Merck Patent Gmbh | Coreaktive fotoinitiatoren |
-
1988
- 1988-05-13 DE DE3816304A patent/DE3816304A1/de not_active Withdrawn
-
1989
- 1989-05-03 DE DE58907593T patent/DE58907593D1/de not_active Expired - Fee Related
- 1989-05-03 EP EP89107971A patent/EP0341560B1/de not_active Expired - Lifetime
- 1989-05-10 AU AU34724/89A patent/AU627177B2/en not_active Ceased
- 1989-05-11 CA CA000599373A patent/CA1336091C/en not_active Expired - Fee Related
- 1989-05-12 FI FI892302A patent/FI892302A/fi not_active IP Right Cessation
- 1989-05-12 DD DD89328569A patent/DD283825A5/de not_active IP Right Cessation
- 1989-05-12 JP JP1117654A patent/JP2769628B2/ja not_active Expired - Fee Related
- 1989-05-13 KR KR1019890006412A patent/KR0141602B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
FI892302A (fi) | 1989-11-14 |
CA1336091C (en) | 1995-06-27 |
DE58907593D1 (de) | 1994-06-09 |
FI892302A0 (fi) | 1989-05-12 |
EP0341560A3 (de) | 1991-01-16 |
EP0341560B1 (de) | 1994-05-04 |
DD283825A5 (de) | 1990-10-24 |
JPH01319504A (ja) | 1989-12-25 |
EP0341560A2 (de) | 1989-11-15 |
JP2769628B2 (ja) | 1998-06-25 |
DE3816304A1 (de) | 1989-11-23 |
AU627177B2 (en) | 1992-08-20 |
KR0141602B1 (ko) | 1998-07-01 |
AU3472489A (en) | 1989-11-16 |
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Legal Events
Date | Code | Title | Description |
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A201 | Request for examination | ||
N231 | Notification of change of applicant | ||
E902 | Notification of reason for refusal | ||
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