ES2000400A6 - Sistema fotoiniciador para materiales polimerizables por radicales - Google Patents

Sistema fotoiniciador para materiales polimerizables por radicales

Info

Publication number
ES2000400A6
ES2000400A6 ES8602105A ES8602105A ES2000400A6 ES 2000400 A6 ES2000400 A6 ES 2000400A6 ES 8602105 A ES8602105 A ES 8602105A ES 8602105 A ES8602105 A ES 8602105A ES 2000400 A6 ES2000400 A6 ES 2000400A6
Authority
ES
Spain
Prior art keywords
free
photo
initiator systems
radical polymerisations
free radical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES8602105A
Other languages
English (en)
Inventor
Leslie R Gatechair
Gary M Blumenstein
Peter J Schirmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of ES2000400A6 publication Critical patent/ES2000400A6/es
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/725—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing inorganic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

SISTEMA FOTOINICIADOR PARA MATERIALES POLIMERIZABLES POR RADICALES. LOS COMPUESTOS FOTOPOLIMERIZABLES A PARTIR DE (A) UN MATERIAL POLIMERIZABLE POR RADICALES Y UNA COMBINACION DE FOTOINICIADOR (B) UNA SAL DE FERROCENIO Y (C) UN FOTOINICIADOR DEL TIPO DISOCIADOR-ALFA CONSTITUYEN UN SISTEMA CON UNA ELEVADA SENSIBILIDAD A LA LUZ Y PERMITEN SER EMPLEADOS PARA LA ELABORACION DE REVESTIMIENTOS DE PROTECCION O PARA PROCEDIMIENTOS DE GRABACION FOTOGRAFICA. A MODO DE COMPONENTE (C) RESULTAN ESPECIALMENTE INDICADOS LOS CETALES CETONAS AROMATICAS.
ES8602105A 1985-09-23 1986-09-23 Sistema fotoiniciador para materiales polimerizables por radicales Expired ES2000400A6 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/779,343 US4707432A (en) 1985-09-23 1985-09-23 Ferrocenium/alpha-cleavage photoinitiator systems for free radical polymerizable compositions

Publications (1)

Publication Number Publication Date
ES2000400A6 true ES2000400A6 (es) 1988-02-16

Family

ID=25116120

Family Applications (1)

Application Number Title Priority Date Filing Date
ES8602105A Expired ES2000400A6 (es) 1985-09-23 1986-09-23 Sistema fotoiniciador para materiales polimerizables por radicales

Country Status (12)

Country Link
US (1) US4707432A (es)
EP (1) EP0221010B1 (es)
JP (1) JPH0695212B2 (es)
KR (1) KR900005848B1 (es)
AT (1) ATE42644T1 (es)
AU (1) AU588627B2 (es)
BR (1) BR8604523A (es)
CA (1) CA1262200A (es)
DE (1) DE3663093D1 (es)
ES (1) ES2000400A6 (es)
SU (1) SU1560070A3 (es)
ZA (1) ZA867185B (es)

Families Citing this family (57)

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Publication number Priority date Publication date Assignee Title
KR910000199B1 (ko) * 1986-04-15 1991-01-23 시바-가이기 코오포레이숀 액체 광개시제 혼합물
US4808638A (en) * 1986-10-14 1989-02-28 Loctite Corporation Thiolene compositions on based bicyclic 'ene compounds
AU8155887A (en) * 1986-10-14 1988-05-06 Loctite Corporation Visible light curable free radical compositions containing pi-arene metal complexes
ES2039691T3 (es) * 1987-06-05 1993-10-01 Ciba-Geigy Ag Mezclas polimerizables cationicamente, que contienen endurecedores seleccionados.
DE3888400D1 (de) * 1987-06-12 1994-04-21 Ciba Geigy Photoresistzusammensetzungen.
US4801392A (en) * 1987-07-02 1989-01-31 The Mead Corporation Magnetic recording compositions containing ionic dye compounds as initiators
JPS6454440A (en) * 1987-08-24 1989-03-01 Toyo Boseki Photopolymerizable composition
US5147900A (en) * 1987-08-28 1992-09-15 Minnesosta Mining And Manufacturing Company Energy-induced dual curable compositions
US4950696A (en) * 1987-08-28 1990-08-21 Minnesota Mining And Manufacturing Company Energy-induced dual curable compositions
US5086086A (en) * 1987-08-28 1992-02-04 Minnesota Mining And Manufacturing Company Energy-induced curable compositions
US4952612A (en) * 1987-08-28 1990-08-28 Minnesota Mining And Manufacturing Company Energy-induced curable compositions
EP0320237B1 (en) * 1987-12-08 1993-04-28 Mitsui Petrochemical Industries, Ltd. Active energy ray-curable composition and optical recording medium having cured product of the composition
JP2658123B2 (ja) * 1988-02-08 1997-09-30 東レ株式会社 感光性平版印刷版原版
US4985340A (en) * 1988-06-01 1991-01-15 Minnesota Mining And Manufacturing Company Energy curable compositions: two component curing agents
JP2757375B2 (ja) * 1988-06-02 1998-05-25 東洋紡績株式会社 光重合性組成物
DE3918105A1 (de) * 1988-06-02 1989-12-14 Toyo Boseki Photopolymerisierbare zusammensetzung
JPH022562A (ja) * 1988-06-13 1990-01-08 Toyobo Co Ltd 光重合性組成物
JPH021859A (ja) * 1988-06-13 1990-01-08 Toyobo Co Ltd 感光性樹脂組成物
JP3035740B2 (ja) * 1988-06-22 2000-04-24 東洋紡績株式会社 感光性樹脂組成物
DE3832032A1 (de) * 1988-09-21 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
US5102775A (en) * 1988-09-30 1992-04-07 Kansai Paint Co., Ltd. Visible light sensitive electrodeposition coating composition and image-forming method using the same
JPH02114266A (ja) * 1988-10-24 1990-04-26 Toyobo Co Ltd 光重合性組成物
US4954414A (en) * 1988-11-08 1990-09-04 The Mead Corporation Photosensitive composition containing a transition metal coordination complex cation and a borate anion and photosensitive materials employing the same
EP0413087A1 (en) * 1989-07-20 1991-02-20 International Business Machines Corporation Photosensitive composition and use thereof
JP2775880B2 (ja) * 1989-08-21 1998-07-16 ブラザー工業株式会社 転写記録媒体
DE69119764T2 (de) * 1990-04-23 1997-01-16 Minnesota Mining & Mfg Energiehärtbare, kationisch oder radikalisch polymerisierbare druckempfindliche zusammensetzungen
US5102924A (en) * 1990-08-16 1992-04-07 Minnesota Mining And Manufacturing Company Polymeric mixtures and process therefor
US5238744A (en) * 1990-08-16 1993-08-24 Minnesota Mining And Manufacturing Company Tough polymeric mixtures
CA2048232A1 (en) * 1990-09-05 1992-03-06 Jerry W. Williams Energy curable pressure-sensitive compositions
US5667934A (en) * 1990-10-09 1997-09-16 International Business Machines Corporation Thermally stable photoimaging composition
US5652280A (en) * 1991-11-12 1997-07-29 University Of Georgia Research Foundation, Inc. Anionic photoinitiation
AU3141193A (en) * 1991-11-12 1993-06-15 University Of Georgia Research Foundation, Inc., The Anionic photoinitiation
US5252694A (en) * 1992-01-22 1993-10-12 Minnesota Mining And Manufacturing Company Energy-polymerization adhesive, coating, film and process for making the same
US5262232A (en) * 1992-01-22 1993-11-16 Minnesota Mining And Manufacturing Company Vibration damping constructions using acrylate-containing damping materials
US5667893A (en) * 1992-10-09 1997-09-16 Minnesota Mining And Manufacturing Company Substrate coated or impregnated with flexible epoxy composition
US5744557A (en) * 1993-06-16 1998-04-28 Minnesota Mining And Manufacturing Company Energy-curable cyanate/ethylenically unsaturated compositions
US5453450A (en) * 1993-06-16 1995-09-26 Minnesota Mining And Manufacturing Company Stabilized curable adhesives
US5494943A (en) * 1993-06-16 1996-02-27 Minnesota Mining And Manufacturing Company Stabilized cationically-curable compositions
DE4324322B4 (de) * 1993-07-20 2005-11-24 Delo Industrieklebstoffe Gmbh & Co. Kg Flexibilisierte, lichtinitiiert härtende Epoxidharzmassen, ihre Herstellung und Verwendung
US5496685A (en) * 1993-09-17 1996-03-05 Chase Elastomer Corporation Photosensitive compositions and elements for flexographic printing
CA2134156A1 (en) * 1993-11-22 1995-05-23 Thomas P. Klun Coatable compositions, abrasive articles made therefrom, and methods of making and using same
DE4340949A1 (de) * 1993-12-01 1995-06-08 Thera Ges Fuer Patente Lichtinitiiert kationisch härtende Epoxidmasse und ihre Verwendung
US5856022A (en) * 1994-06-15 1999-01-05 Minnesota Mining And Manufacturing Company Energy-curable cyanate/ethylenically unsaturated compositions
US5721289A (en) * 1994-11-04 1998-02-24 Minnesota Mining And Manufacturing Company Stable, low cure-temperature semi-structural pressure sensitive adhesive
US5827602A (en) * 1995-06-30 1998-10-27 Covalent Associates Incorporated Hydrophobic ionic liquids
TW369554B (en) * 1995-10-19 1999-09-11 Three Bond Co Ltd Photocurable composition
US5922783A (en) * 1997-02-27 1999-07-13 Loctite Corporation Radiation-curable, cyanoacrylate-containing compositions
US6187374B1 (en) 1998-09-02 2001-02-13 Xim Products, Inc. Coatings with increased adhesion
DE19940921A1 (de) 1999-08-27 2001-03-01 Agfa Gevaert Ag Photopolymerisierbares Gemisch und damit hergestelltes Aufzeichnungsmaterial
JP2001089639A (ja) * 1999-09-24 2001-04-03 Mitsubishi Heavy Ind Ltd エネルギー線硬化樹脂組成物
US6734221B1 (en) 2000-09-08 2004-05-11 Loctite (R&D) Limited Radiation-curable, cyanoacrylate-containing compositions
US6867241B2 (en) * 2002-01-31 2005-03-15 Henkel Corporation Radiation-curable, cyanoacrylate-containing compositions
AU2002357674A1 (en) * 2002-02-05 2003-09-02 Henkel Corporation Luminescing and/or fluorescing radiation-curable, cyanoacrylate-containing compositions
US6777460B2 (en) * 2002-12-23 2004-08-17 3M Innovative Properties Company Curing agents for cationically curable compositions
US20060062922A1 (en) * 2004-09-23 2006-03-23 Molecular Imprints, Inc. Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
US20060167127A1 (en) * 2005-01-26 2006-07-27 Nguyen Phu Q Radiation-curable coating composition
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US4245029A (en) * 1979-08-20 1981-01-13 General Electric Company Photocurable compositions using triarylsulfonium salts
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DE3366408D1 (en) * 1982-05-19 1986-10-30 Ciba Geigy Ag Photopolymerisation with organometal salts
US5089536A (en) * 1982-11-22 1992-02-18 Minnesota Mining And Manufacturing Company Energy polmerizable compositions containing organometallic initiators
US4537854A (en) * 1983-09-14 1985-08-27 General Electric Company Photoresist compositions and method
DE3561155D1 (es) * 1984-02-10 1988-01-21 Ciba-Geigy Ag
US4525553A (en) * 1984-02-21 1985-06-25 Loctite (Ireland) Limited Acrylic polymerization catalysts containing ferricenium salts

Also Published As

Publication number Publication date
ZA867185B (en) 1987-05-27
BR8604523A (pt) 1987-05-19
KR900005848B1 (ko) 1990-08-13
SU1560070A3 (ru) 1990-04-23
AU6308386A (en) 1987-03-26
JPH0695212B2 (ja) 1994-11-24
EP0221010A1 (de) 1987-05-06
EP0221010B1 (de) 1989-04-26
AU588627B2 (en) 1989-09-21
CA1262200A (en) 1989-10-03
KR870003402A (ko) 1987-04-17
JPS6290648A (ja) 1987-04-25
US4707432A (en) 1987-11-17
DE3663093D1 (en) 1989-06-01
ATE42644T1 (de) 1989-05-15

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Legal Events

Date Code Title Description
SA6 Expiration date (snapshot 920101)

Free format text: 2006-09-23