SG189644A1 - Glass substrate for magnetic recording medium and magnetic recording medium - Google Patents
Glass substrate for magnetic recording medium and magnetic recording medium Download PDFInfo
- Publication number
- SG189644A1 SG189644A1 SG2012076501A SG2012076501A SG189644A1 SG 189644 A1 SG189644 A1 SG 189644A1 SG 2012076501 A SG2012076501 A SG 2012076501A SG 2012076501 A SG2012076501 A SG 2012076501A SG 189644 A1 SG189644 A1 SG 189644A1
- Authority
- SG
- Singapore
- Prior art keywords
- glass substrate
- polishing
- magnetic recording
- recording medium
- peripheral surface
- Prior art date
Links
- 239000011521 glass Substances 0.000 title claims abstract description 191
- 239000000758 substrate Substances 0.000 title claims abstract description 188
- 230000002093 peripheral effect Effects 0.000 claims abstract description 118
- 238000011109 contamination Methods 0.000 claims abstract description 41
- 229910052684 Cerium Inorganic materials 0.000 claims abstract description 28
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims abstract description 28
- 238000005498 polishing Methods 0.000 description 196
- 238000004140 cleaning Methods 0.000 description 71
- 239000010410 layer Substances 0.000 description 41
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 32
- 239000002002 slurry Substances 0.000 description 27
- 238000012360 testing method Methods 0.000 description 27
- 238000000034 method Methods 0.000 description 26
- 239000003795 chemical substances by application Substances 0.000 description 18
- 239000002245 particle Substances 0.000 description 17
- 125000006850 spacer group Chemical group 0.000 description 16
- 229910000420 cerium oxide Inorganic materials 0.000 description 13
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 13
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 11
- 239000003599 detergent Substances 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 10
- 239000003513 alkali Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- 239000008119 colloidal silica Substances 0.000 description 7
- 239000011241 protective layer Substances 0.000 description 6
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 239000002585 base Substances 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 238000001035 drying Methods 0.000 description 5
- 238000011156 evaluation Methods 0.000 description 5
- 230000001050 lubricating effect Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 238000002360 preparation method Methods 0.000 description 5
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 238000005339 levitation Methods 0.000 description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 4
- 229920002635 polyurethane Polymers 0.000 description 4
- 239000004814 polyurethane Substances 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 229910000838 Al alloy Inorganic materials 0.000 description 3
- 229910018979 CoPt Inorganic materials 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 230000002159 abnormal effect Effects 0.000 description 3
- 239000003082 abrasive agent Substances 0.000 description 3
- 239000003929 acidic solution Substances 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000005728 strengthening Methods 0.000 description 3
- 238000004506 ultrasonic cleaning Methods 0.000 description 3
- 229910052845 zircon Inorganic materials 0.000 description 3
- 229910001928 zirconium oxide Inorganic materials 0.000 description 3
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 3
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 2
- 239000011668 ascorbic acid Substances 0.000 description 2
- 229960005070 ascorbic acid Drugs 0.000 description 2
- 235000010323 ascorbic acid Nutrition 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000010702 perfluoropolyether Substances 0.000 description 2
- 239000011164 primary particle Substances 0.000 description 2
- 230000002250 progressing effect Effects 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 229910019236 CoFeB Inorganic materials 0.000 description 1
- 241000196324 Embryophyta Species 0.000 description 1
- -1 FeAlSi Inorganic materials 0.000 description 1
- 229910005435 FeTaN Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 238000006124 Pilkington process Methods 0.000 description 1
- 229910000929 Ru alloy Inorganic materials 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 238000003426 chemical strengthening reaction Methods 0.000 description 1
- 239000005345 chemically strengthened glass Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000006063 cullet Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 238000007499 fusion processing Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 235000015250 liver sausages Nutrition 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 239000003002 pH adjusting agent Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 239000006058 strengthened glass Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 239000004034 viscosity adjusting agent Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Surface Treatment Of Glass (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011226261A JP5067498B1 (ja) | 2011-10-13 | 2011-10-13 | 磁気記録媒体用ガラス基板及び磁気記録媒体 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG189644A1 true SG189644A1 (en) | 2013-05-31 |
Family
ID=47277778
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG2012076501A SG189644A1 (en) | 2011-10-13 | 2012-10-12 | Glass substrate for magnetic recording medium and magnetic recording medium |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5067498B1 (zh) |
| CN (1) | CN102945676B (zh) |
| MY (1) | MY162801A (zh) |
| SG (1) | SG189644A1 (zh) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105163906B (zh) * | 2013-06-29 | 2018-11-06 | Hoya株式会社 | 玻璃基板的制造方法和磁盘的制造方法以及玻璃基板用研磨液组合物 |
| WO2015041011A1 (ja) * | 2013-09-17 | 2015-03-26 | Hoya株式会社 | 情報記録媒体用ガラス基板の製造方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005044488A (ja) * | 2003-07-09 | 2005-02-17 | Fuji Electric Device Technology Co Ltd | 磁気記録媒体用基板及び磁気記録媒体の製造方法並びに基板洗浄装置 |
| JP4557222B2 (ja) * | 2005-03-24 | 2010-10-06 | Ｈｏｙａ株式会社 | 磁気ディスク用ガラス基板の製造方法及び磁気ディスクの製造方法 |
| JP2010102819A (ja) * | 2008-09-26 | 2010-05-06 | Hoya Corp | 磁気ディスク用基板及び磁気ディスク |
| MY186233A (en) * | 2008-09-30 | 2021-06-30 | Hoya Corp | Glass substrate for a magnetic disk and magnetic disk |
| JP4949432B2 (ja) * | 2009-05-15 | 2012-06-06 | 花王株式会社 | ハードディスク用基板の製造方法 |
| JP5035405B2 (ja) * | 2009-11-26 | 2012-09-26 | 旭硝子株式会社 | 磁気記録媒体用ガラス基板の製造方法 |
-
2011
- 2011-10-13 JP JP2011226261A patent/JP5067498B1/ja not_active Expired - Fee Related
-
2012
- 2012-10-11 MY MYPI2012004540A patent/MY162801A/en unknown
- 2012-10-12 SG SG2012076501A patent/SG189644A1/en unknown
- 2012-10-12 CN CN 201210385812 patent/CN102945676B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN102945676B (zh) | 2013-10-02 |
| MY162801A (en) | 2017-07-14 |
| JP2013089262A (ja) | 2013-05-13 |
| CN102945676A (zh) | 2013-02-27 |
| JP5067498B1 (ja) | 2012-11-07 |
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