SG132661A1 - Illumination system - Google Patents

Illumination system

Info

Publication number
SG132661A1
SG132661A1 SG200608342-2A SG2006083422A SG132661A1 SG 132661 A1 SG132661 A1 SG 132661A1 SG 2006083422 A SG2006083422 A SG 2006083422A SG 132661 A1 SG132661 A1 SG 132661A1
Authority
SG
Singapore
Prior art keywords
illumination system
coherence
radiation
remove
substantially homogenize
Prior art date
Application number
SG200608342-2A
Other languages
English (en)
Inventor
Huibert Visser
Jacob Fredrik Frisc Klinkhamer
Lev Ryzhikov
Scott Coston
Adel Joobeur
Henri Johannes Petrus Vink
Yevgeniy Konstantinovich Shmarev
Original Assignee
Asml Netherlands Bv
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv, Asml Holding Nv filed Critical Asml Netherlands Bv
Publication of SG132661A1 publication Critical patent/SG132661A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0905—Dividing and/or superposing multiple light beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200608342-2A 2005-12-02 2006-11-29 Illumination system SG132661A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/292,275 US20070127005A1 (en) 2005-12-02 2005-12-02 Illumination system

Publications (1)

Publication Number Publication Date
SG132661A1 true SG132661A1 (en) 2007-06-28

Family

ID=37745983

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200608342-2A SG132661A1 (en) 2005-12-02 2006-11-29 Illumination system

Country Status (7)

Country Link
US (4) US20070127005A1 (fr)
EP (1) EP1793278A3 (fr)
JP (2) JP4805797B2 (fr)
KR (1) KR100835325B1 (fr)
CN (1) CN101013267B (fr)
SG (1) SG132661A1 (fr)
TW (1) TWI358615B (fr)

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DE102009009366A1 (de) 2009-02-18 2010-08-19 Limo Patentverwaltung Gmbh & Co. Kg Vorrichtung zur Homogenisierung von Laserstrahlung
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Also Published As

Publication number Publication date
TW200727090A (en) 2007-07-16
US8164740B2 (en) 2012-04-24
JP2007179039A (ja) 2007-07-12
US20090091734A1 (en) 2009-04-09
CN101013267A (zh) 2007-08-08
EP1793278A3 (fr) 2007-12-05
US20090168072A1 (en) 2009-07-02
US8159651B2 (en) 2012-04-17
US20070247606A1 (en) 2007-10-25
US20070127005A1 (en) 2007-06-07
JP4805797B2 (ja) 2011-11-02
TWI358615B (en) 2012-02-21
CN101013267B (zh) 2011-07-27
EP1793278A2 (fr) 2007-06-06
KR20070058361A (ko) 2007-06-08
JP2010199605A (ja) 2010-09-09
KR100835325B1 (ko) 2008-06-04

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