SG132647A1 - Lithographic apparatus and device manufacturing method - Google Patents
Lithographic apparatus and device manufacturing methodInfo
- Publication number
- SG132647A1 SG132647A1 SG200608170-7A SG2006081707A SG132647A1 SG 132647 A1 SG132647 A1 SG 132647A1 SG 2006081707 A SG2006081707 A SG 2006081707A SG 132647 A1 SG132647 A1 SG 132647A1
- Authority
- SG
- Singapore
- Prior art keywords
- lithographic apparatus
- device manufacturing
- gap
- immersion
- covering
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Public Health (AREA)
- Epidemiology (AREA)
- Environmental & Geological Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photovoltaic Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/285,774 US7633073B2 (en) | 2005-11-23 | 2005-11-23 | Lithographic apparatus and device manufacturing method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG132647A1 true SG132647A1 (en) | 2007-06-28 |
Family
ID=37712481
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200608170-7A SG132647A1 (en) | 2005-11-23 | 2006-11-23 | Lithographic apparatus and device manufacturing method |
Country Status (7)
Country | Link |
---|---|
US (5) | US7633073B2 (zh) |
EP (1) | EP1791027A1 (zh) |
JP (4) | JP4616241B2 (zh) |
KR (4) | KR100852485B1 (zh) |
CN (2) | CN102636964B (zh) |
SG (1) | SG132647A1 (zh) |
TW (1) | TWI356282B (zh) |
Families Citing this family (12)
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US7633073B2 (en) * | 2005-11-23 | 2009-12-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
EP2535744A3 (en) * | 2006-04-03 | 2013-10-09 | Nikon Corporation | Incidence surfaces and optical windows that are solvophobic to immersion liquids used in an immersion microlithography system |
TWI514090B (zh) | 2007-07-13 | 2015-12-21 | Mapper Lithography Ip Bv | 微影系統及用於支撐晶圓的晶圓台 |
US8705010B2 (en) | 2007-07-13 | 2014-04-22 | Mapper Lithography Ip B.V. | Lithography system, method of clamping and wafer table |
NL2003575A (en) | 2008-10-29 | 2010-05-03 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
NL2003638A (en) * | 2008-12-03 | 2010-06-07 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
NL2008183A (en) * | 2011-02-25 | 2012-08-28 | Asml Netherlands Bv | A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method. |
JP5973064B2 (ja) | 2012-05-29 | 2016-08-23 | エーエスエムエル ネザーランズ ビー.ブイ. | 支持装置、リソグラフィ装置及びデバイス製造方法 |
CN104540480B (zh) * | 2013-01-11 | 2016-09-28 | 莱镁医疗器材股份有限公司 | 减少口腔空气空间的口部装置、系统 |
DE102015221209A1 (de) | 2015-10-29 | 2017-05-04 | Carl Zeiss Smt Gmbh | Optische Baugruppe mit einem Schutzelement und optische Anordnung damit |
CN109037136B (zh) * | 2017-06-12 | 2021-10-26 | 上海新昇半导体科技有限公司 | 支撑台、改善晶圆或外延生长晶圆表面的顶针痕迹的方法 |
CN110908246A (zh) * | 2018-09-18 | 2020-03-24 | 长鑫存储技术有限公司 | 浸润式曝光机装置及曝光方法 |
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-
2005
- 2005-11-23 US US11/285,774 patent/US7633073B2/en active Active
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2006
- 2006-11-22 TW TW095143290A patent/TWI356282B/zh active
- 2006-11-22 CN CN201210070251.8A patent/CN102636964B/zh active Active
- 2006-11-22 JP JP2006315814A patent/JP4616241B2/ja active Active
- 2006-11-22 US US11/603,228 patent/US7928407B2/en not_active Expired - Fee Related
- 2006-11-22 CN CN2006101718607A patent/CN1971429B/zh active Active
- 2006-11-22 EP EP06255960A patent/EP1791027A1/en not_active Withdrawn
- 2006-11-23 KR KR1020060116526A patent/KR100852485B1/ko active IP Right Grant
- 2006-11-23 SG SG200608170-7A patent/SG132647A1/en unknown
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2008
- 2008-01-18 KR KR1020080005661A patent/KR100866583B1/ko active IP Right Grant
- 2008-06-25 KR KR1020080060253A patent/KR101234684B1/ko active IP Right Grant
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2009
- 2009-11-06 US US12/613,846 patent/US8138486B2/en active Active
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2010
- 2010-04-20 JP JP2010096638A patent/JP5161261B2/ja active Active
- 2010-07-22 JP JP2010164859A patent/JP5161273B2/ja active Active
- 2010-12-10 JP JP2010275375A patent/JP5161293B2/ja active Active
- 2010-12-29 US US12/980,406 patent/US20110090474A1/en not_active Abandoned
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Also Published As
Publication number | Publication date |
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US20070114452A1 (en) | 2007-05-24 |
CN102636964B (zh) | 2016-03-02 |
KR101234684B1 (ko) | 2013-02-19 |
KR20080066645A (ko) | 2008-07-16 |
US20100044593A1 (en) | 2010-02-25 |
JP5161273B2 (ja) | 2013-03-13 |
US8138486B2 (en) | 2012-03-20 |
KR100866583B1 (ko) | 2008-11-03 |
KR20110138198A (ko) | 2011-12-26 |
US7928407B2 (en) | 2011-04-19 |
JP2011071545A (ja) | 2011-04-07 |
US20110090474A1 (en) | 2011-04-21 |
CN1971429B (zh) | 2012-07-04 |
EP1791027A1 (en) | 2007-05-30 |
JP2007150308A (ja) | 2007-06-14 |
US8481978B2 (en) | 2013-07-09 |
CN1971429A (zh) | 2007-05-30 |
TW200725194A (en) | 2007-07-01 |
KR100852485B1 (ko) | 2008-08-18 |
JP4616241B2 (ja) | 2011-01-19 |
US20070114451A1 (en) | 2007-05-24 |
JP2010171455A (ja) | 2010-08-05 |
JP5161261B2 (ja) | 2013-03-13 |
JP2010245569A (ja) | 2010-10-28 |
JP5161293B2 (ja) | 2013-03-13 |
KR20070054585A (ko) | 2007-05-29 |
KR101234686B1 (ko) | 2013-02-19 |
US20110183257A1 (en) | 2011-07-28 |
US7633073B2 (en) | 2009-12-15 |
CN102636964A (zh) | 2012-08-15 |
TWI356282B (en) | 2012-01-11 |
KR20080015037A (ko) | 2008-02-15 |
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