SG121753A1 - Lithographic apparatus, apparatus cleaning method,device manufacturing method and device manufactur ed thereby - Google Patents

Lithographic apparatus, apparatus cleaning method,device manufacturing method and device manufactur ed thereby

Info

Publication number
SG121753A1
SG121753A1 SG200300099A SG200300099A SG121753A1 SG 121753 A1 SG121753 A1 SG 121753A1 SG 200300099 A SG200300099 A SG 200300099A SG 200300099 A SG200300099 A SG 200300099A SG 121753 A1 SG121753 A1 SG 121753A1
Authority
SG
Singapore
Prior art keywords
manufactur
device manufacturing
cleaning method
lithographic apparatus
lithographic
Prior art date
Application number
SG200300099A
Other languages
English (en)
Inventor
Gert-Jan Heerens
Sjoerd Nicolaas Lamber Donders
Franciscus Andreas Co Spanjers
Van Aschwin Lodewijk Hend Meer
Thomas Josephus M Castenmiller
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG121753A1 publication Critical patent/SG121753A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200300099A 2002-01-18 2003-01-15 Lithographic apparatus, apparatus cleaning method,device manufacturing method and device manufactur ed thereby SG121753A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02250345A EP1329770A1 (en) 2002-01-18 2002-01-18 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
SG121753A1 true SG121753A1 (en) 2006-05-26

Family

ID=8185648

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200300099A SG121753A1 (en) 2002-01-18 2003-01-15 Lithographic apparatus, apparatus cleaning method,device manufacturing method and device manufactur ed thereby

Country Status (7)

Country Link
US (1) US6856376B2 (zh)
EP (1) EP1329770A1 (zh)
JP (1) JP4148784B2 (zh)
KR (1) KR100748449B1 (zh)
CN (1) CN1249526C (zh)
SG (1) SG121753A1 (zh)
TW (1) TW591695B (zh)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7598509B2 (en) * 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
TWI612556B (zh) * 2003-05-23 2018-01-21 Nikon Corp 曝光裝置、曝光方法及元件製造方法
US7385670B2 (en) * 2004-10-05 2008-06-10 Asml Netherlands B.V. Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus
US20060243300A1 (en) * 2005-04-27 2006-11-02 Patrick Klingbeil Method for cleaning lithographic apparatus
KR20080015778A (ko) * 2005-06-29 2008-02-20 가부시키가이샤 니콘 노광 장치, 기판 처리 방법, 및 디바이스 제조 방법
US7819980B2 (en) * 2005-08-16 2010-10-26 Taiwan Semiconductor Manufacturing Company, Ltd. System and method for removing particles in semiconductor manufacturing
JP2007111682A (ja) * 2005-10-24 2007-05-10 Sony Corp 洗浄方法及び洗浄装置
JP2010501999A (ja) * 2006-12-08 2010-01-21 キヤノン株式会社 露光装置
JP5257822B2 (ja) * 2006-12-28 2013-08-07 株式会社ニコン 清掃方法、露光方法及びデバイス製造方法、清掃部材及びメンテナンス方法
US7894037B2 (en) * 2007-07-30 2011-02-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
NL1036769A1 (nl) * 2008-04-23 2009-10-26 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, cleaning system and method for cleaning a patterning device.
JP2010186167A (ja) * 2009-01-15 2010-08-26 Lasertec Corp 洗浄方法及び洗浄装置
US20100192973A1 (en) * 2009-01-19 2010-08-05 Yoshifumi Ueno Extreme ultraviolet light source apparatus and cleaning method
CN101819030B (zh) * 2009-02-27 2012-05-30 北京京东方光电科技有限公司 磁控溅射靶材表面粗糙度的监测方法和系统
WO2010149438A1 (en) * 2009-06-23 2010-12-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102011007472A1 (de) * 2011-04-15 2012-10-18 Aktiebolaget Skf Vorrichtung und Verfahren zum Reinigen einer Oberfläche
CN102841507B (zh) * 2011-06-23 2014-06-25 虎尾科技大学 激光直写式纳米周期性结构图案制造设备
US20130092186A1 (en) 2011-10-18 2013-04-18 Taiwan Semiconductor Manufacturing Company, Ltd. Removal of particles on back side of wafer
CN103567160B (zh) * 2012-07-27 2015-07-15 北京京东方光电科技有限公司 一种自动清洁印刷电路板的装置及其使用方法
JP5995616B2 (ja) * 2012-09-05 2016-09-21 株式会社ディスコ ウエーハの加工方法
US8869075B2 (en) 2012-12-18 2014-10-21 Globalfoundries Inc. Locally optimized coloring for cleaning lithographic hotspots
US10459353B2 (en) 2013-03-15 2019-10-29 Taiwan Semiconductor Manufacturing Company, Ltd. Lithography system with an embedded cleaning module
DE102014020027B3 (de) 2013-03-15 2023-03-09 Taiwan Semiconductor Manufacturing Company, Ltd. Lithographiesystem mit eingebettetem reinigungsmodul sowie verfahren
WO2016160322A1 (en) 2015-04-01 2016-10-06 Sxaymiq Technologies Llc Electrostatic cleaning device
KR102427325B1 (ko) 2015-06-03 2022-08-01 삼성전자주식회사 노광 장치 및 노광 장치 세정 방법
JP6777977B2 (ja) * 2015-09-15 2020-10-28 キヤノン株式会社 インプリント装置、インプリント方法及び物品の製造方法
CN106315113B (zh) * 2016-08-23 2018-10-12 重庆墨希科技有限公司 连续自动去除绑定区域石墨烯的装置和方法
CN106842811A (zh) * 2017-03-20 2017-06-13 深圳市华星光电技术有限公司 一种光罩及清洁装置
JP6942562B2 (ja) * 2017-08-25 2021-09-29 キヤノン株式会社 リソグラフィ装置、および物品の製造方法
WO2019042682A1 (en) * 2017-08-28 2019-03-07 Asml Holding N.V. APPARATUS AND METHOD FOR CLEANING A SUPPORT WITHIN A LITHOGRAPHIC APPARATUS
CN107831638B (zh) * 2017-11-15 2020-05-01 上海华虹宏力半导体制造有限公司 一种检测掩膜版与掩膜台接触面污染的方法
CN111512238B (zh) * 2017-12-28 2024-01-30 Asml荷兰有限公司 从设备部件中移除污染物颗粒的设备和方法
CN110231756A (zh) * 2018-08-10 2019-09-13 上海微电子装备（集团）股份有限公司 曝光装置、曝光方法、半导体器件及其制造方法
US11145427B2 (en) * 2019-07-31 2021-10-12 Taiwan Semiconductor Manufacturing Company, Ltd. Tool and method for particle removal
US11256181B2 (en) * 2019-07-31 2022-02-22 Taiwan Semiconductor Manufacturing Company, Ltd. Apparatus and method for removing particles in semiconductor manufacturing
CN114077163B (zh) * 2020-08-14 2023-03-31 长鑫存储技术有限公司 光罩传送装置及曝光系统
TWI798053B (zh) * 2022-04-12 2023-04-01 福懋科技股份有限公司 粉塵清潔設備及其粉塵清潔方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4744833A (en) * 1987-06-11 1988-05-17 International Business Machines Corporation Electrostatic removal of contaminants
TW285721B (zh) * 1994-12-27 1996-09-11 Siemens Ag
JPH09260245A (ja) * 1996-03-21 1997-10-03 Canon Inc マスクの異物除去装置
US5673208A (en) 1996-04-11 1997-09-30 Micron Technology, Inc. Focus spot detection method and system
JPH10335236A (ja) * 1997-05-28 1998-12-18 Nikon Corp 露光装置、その光洗浄方法及び半導体デバイスの製造方法
JPH10303097A (ja) * 1997-04-23 1998-11-13 Nikon Corp 投影露光装置、露光方法、半導体デバイスの製造方法、および投影光学系の製造方法
US6395102B1 (en) * 1997-08-25 2002-05-28 Texas Instruments Incorporated Method and apparatus for in-situ reticle cleaning at photolithography tool
KR100300030B1 (ko) * 1997-12-30 2001-10-19 김영환 노광장비의레티클세정장치
US6159333A (en) * 1998-10-08 2000-12-12 Applied Materials, Inc. Substrate processing system configurable for deposition or cleaning
JP3772056B2 (ja) * 1998-10-12 2006-05-10 株式会社東芝 半導体基板の洗浄方法
KR20000030975A (ko) * 1998-10-29 2000-06-05 김영환 반도체 소자의 세정 방법
US6511575B1 (en) * 1998-11-12 2003-01-28 Canon Kabushiki Kaisha Treatment apparatus and method utilizing negative hydrogen ion
US6249932B1 (en) * 1999-01-29 2001-06-26 Taiwan Semiconductor Manufacturing Company, Ltd. Apparatus and method for removing fine particles
US6676800B1 (en) * 2000-03-15 2004-01-13 Applied Materials, Inc. Particle contamination cleaning from substrates using plasmas, reactive gases, and mechanical agitation
US7451774B2 (en) * 2000-06-26 2008-11-18 Applied Materials, Inc. Method and apparatus for wafer cleaning
US6453496B1 (en) * 2000-07-25 2002-09-24 Anam Semiconductor, Inc. Apparatus for removing contaminant particles on a photomask
US6500268B1 (en) * 2000-08-18 2002-12-31 Silicon Genesis Corporation Dry cleaning method
US6526997B1 (en) * 2000-08-18 2003-03-04 Francois J. Henley Dry cleaning method for the manufacture of integrated circuits
US6524431B1 (en) * 2000-11-10 2003-02-25 Helix Technology Inc. Apparatus for automatically cleaning mask
US6589354B2 (en) * 2001-01-04 2003-07-08 Paul B. Reid Method and apparatus for in-situ lithography mask cleaning
WO2002053300A1 (en) * 2001-01-04 2002-07-11 Applied Materials, Inc. Method and apparatus for critical flow particle removal
DE60226093T2 (de) * 2001-05-18 2009-06-10 FUJIFILM Corp., Minato Urmedium-Reinigungsmethode

Also Published As

Publication number Publication date
CN1249526C (zh) 2006-04-05
KR100748449B1 (ko) 2007-08-10
TW200306614A (en) 2003-11-16
EP1329770A1 (en) 2003-07-23
US6856376B2 (en) 2005-02-15
US20030184720A1 (en) 2003-10-02
CN1448796A (zh) 2003-10-15
JP4148784B2 (ja) 2008-09-10
KR20030080182A (ko) 2003-10-11
JP2003224067A (ja) 2003-08-08
TW591695B (en) 2004-06-11

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