SG11202003686WA - Emitter-base mesh structure in heterojunction bipolar transistors for rf applications - Google Patents

Emitter-base mesh structure in heterojunction bipolar transistors for rf applications

Info

Publication number
SG11202003686WA
SG11202003686WA SG11202003686WA SG11202003686WA SG11202003686WA SG 11202003686W A SG11202003686W A SG 11202003686WA SG 11202003686W A SG11202003686W A SG 11202003686WA SG 11202003686W A SG11202003686W A SG 11202003686WA SG 11202003686W A SG11202003686W A SG 11202003686WA
Authority
SG
Singapore
Prior art keywords
emitter
applications
mesh structure
bipolar transistors
heterojunction bipolar
Prior art date
Application number
SG11202003686WA
Other languages
English (en)
Inventor
Ranadeep Dutta
Original Assignee
Qualcomm Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Qualcomm Inc filed Critical Qualcomm Inc
Publication of SG11202003686WA publication Critical patent/SG11202003686WA/en

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00Bipolar junction transistors [BJT]
    • H10D10/80Heterojunction BJTs
    • H10D10/821Vertical heterojunction BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00Bipolar junction transistors [BJT]
    • H10D10/01Manufacture or treatment
    • H10D10/021Manufacture or treatment of heterojunction BJTs [HBT]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/124Shapes, relative sizes or dispositions of the regions of semiconductor bodies or of junctions between the regions
    • H10D62/126Top-view geometrical layouts of the regions or the junctions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/133Emitter regions of BJTs
    • H10D62/135Non-interconnected multi-emitter structures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/133Emitter regions of BJTs
    • H10D62/136Emitter regions of BJTs of heterojunction BJTs 
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/137Collector regions of BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/177Base regions of bipolar transistors, e.g. BJTs or IGBTs
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F2200/00Indexing scheme relating to amplifiers
    • H03F2200/453Controlling being realised by adding a replica circuit or by using one among multiple identical circuits as a replica circuit
SG11202003686WA 2017-12-07 2018-11-07 Emitter-base mesh structure in heterojunction bipolar transistors for rf applications SG11202003686WA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15/834,100 US20190181251A1 (en) 2017-12-07 2017-12-07 Mesh structure for heterojunction bipolar transistors for rf applications
PCT/US2018/059532 WO2019112741A1 (en) 2017-12-07 2018-11-07 Emitter-base mesh structure in heterojunction bipolar transistors for rf applications

Publications (1)

Publication Number Publication Date
SG11202003686WA true SG11202003686WA (en) 2020-06-29

Family

ID=64477288

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202003686WA SG11202003686WA (en) 2017-12-07 2018-11-07 Emitter-base mesh structure in heterojunction bipolar transistors for rf applications

Country Status (9)

Country Link
US (1) US20190181251A1 (https=)
EP (1) EP3721477A1 (https=)
JP (1) JP7201684B2 (https=)
KR (1) KR102645071B1 (https=)
CN (1) CN111448665B (https=)
BR (1) BR112020011108B1 (https=)
SG (1) SG11202003686WA (https=)
TW (1) TWI813598B (https=)
WO (1) WO2019112741A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2020257974A1 (zh) * 2019-06-24 2020-12-30 华为技术有限公司 异质结双极型晶体管及其制备方法
JP2021048250A (ja) * 2019-09-18 2021-03-25 株式会社村田製作所 半導体装置
JP2021132100A (ja) * 2020-02-19 2021-09-09 株式会社村田製作所 高周波電力増幅素子
CN113594239B (zh) * 2021-07-20 2022-09-27 弘大芯源(深圳)半导体有限公司 一种具有网格结构的双极功率晶体管
CN113921598B (zh) * 2021-08-25 2023-06-20 厦门市三安集成电路有限公司 一种hbt器件的金属连线方法

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3319139A (en) * 1964-08-18 1967-05-09 Hughes Aircraft Co Planar transistor device having a reentrant shaped emitter region with base connection in the reentrant portion
NL6813997A (https=) * 1968-09-30 1970-04-01
JPS5818964A (ja) * 1981-07-28 1983-02-03 Fujitsu Ltd 半導体装置
JPS59210668A (ja) * 1983-05-16 1984-11-29 Fujitsu Ltd 半導体装置
JPS60165759A (ja) * 1984-02-07 1985-08-28 Nippon Denso Co Ltd 集積回路素子
US4654687A (en) * 1985-03-28 1987-03-31 Francois Hebert High frequency bipolar transistor structures
US5140399A (en) * 1987-04-30 1992-08-18 Sony Corporation Heterojunction bipolar transistor and the manufacturing method thereof
JPH01189961A (ja) * 1988-01-26 1989-07-31 Mitsubishi Electric Corp 半導体装置
US5502338A (en) * 1992-04-30 1996-03-26 Hitachi, Ltd. Power transistor device having collector voltage clamped to stable level over wide temperature range
JPH08279562A (ja) * 1994-07-20 1996-10-22 Mitsubishi Electric Corp 半導体装置、及びその製造方法
DE10004111A1 (de) * 2000-01-31 2001-08-09 Infineon Technologies Ag Bipolartransistor
JP2001230261A (ja) 2000-02-16 2001-08-24 Nec Corp 半導体装置及びその製造方法
JP2002076014A (ja) * 2000-08-30 2002-03-15 Mitsubishi Electric Corp 高周波用半導体装置
US8159048B2 (en) * 2004-01-30 2012-04-17 Triquint Semiconductor, Inc. Bipolar junction transistor geometry
JP3847756B2 (ja) * 2004-02-25 2006-11-22 松下電器産業株式会社 高周波増幅回路
JP4089662B2 (ja) * 2004-07-21 2008-05-28 ソニー株式会社 バイポーラトランジスタとその製造方法
JP2006049693A (ja) 2004-08-06 2006-02-16 Matsushita Electric Ind Co Ltd 半導体装置
JP2006332117A (ja) * 2005-05-23 2006-12-07 Sharp Corp トランジスタ構造および電子機器
US7566920B2 (en) * 2005-07-13 2009-07-28 Panasonic Corporation Bipolar transistor and power amplifier
JP2010080925A (ja) 2008-08-26 2010-04-08 Sanyo Electric Co Ltd 半導体装置
US8415764B2 (en) * 2009-06-02 2013-04-09 Taiwan Semiconductor Manufacturing Company, Ltd. High-voltage BJT formed using CMOS HV processes
EP2458639A1 (en) * 2010-11-25 2012-05-30 Nxp B.V. Bipolar transistor with base trench contacts insulated from the emitter.
TWI512905B (zh) * 2012-06-13 2015-12-11 Win Semiconductors Corp 化合物半導體元件晶圓整合結構
TWI540722B (zh) * 2013-04-17 2016-07-01 穩懋半導體股份有限公司 異質接面雙極電晶體佈局結構
US8994075B1 (en) * 2013-10-11 2015-03-31 Rf Micro Devices, Inc. Heterojunction bipolar transistor geometry for improved power amplifier performance
US20160020307A1 (en) * 2014-07-16 2016-01-21 Win Semiconductors Corp. Heterojunction Bipolar Transistor
US20160141220A1 (en) * 2014-11-18 2016-05-19 Sumitomo Electric Industries, Ltd. Hetero-bipolar transistor and method for producing the same
WO2016132594A1 (ja) * 2015-02-17 2016-08-25 株式会社村田製作所 ヘテロ接合バイポーラトランジスタ
TWI585907B (zh) * 2016-05-13 2017-06-01 穩懋半導體股份有限公司 化合物半導體積體電路之先進抗濕氣結構

Also Published As

Publication number Publication date
KR20200090174A (ko) 2020-07-28
US20190181251A1 (en) 2019-06-13
EP3721477A1 (en) 2020-10-14
TWI813598B (zh) 2023-09-01
JP7201684B2 (ja) 2023-01-10
BR112020011108B1 (pt) 2024-01-23
KR102645071B1 (ko) 2024-03-06
CN111448665A (zh) 2020-07-24
CN111448665B (zh) 2024-04-16
TW201937729A (zh) 2019-09-16
BR112020011108A2 (pt) 2020-11-17
JP2021506114A (ja) 2021-02-18
WO2019112741A1 (en) 2019-06-13

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