SG11201510417RA - Tixsi1-xn layers and the production thereof - Google Patents
Tixsi1-xn layers and the production thereofInfo
- Publication number
- SG11201510417RA SG11201510417RA SG11201510417RA SG11201510417RA SG11201510417RA SG 11201510417R A SG11201510417R A SG 11201510417RA SG 11201510417R A SG11201510417R A SG 11201510417RA SG 11201510417R A SG11201510417R A SG 11201510417RA SG 11201510417R A SG11201510417R A SG 11201510417RA
- Authority
- SG
- Singapore
- Prior art keywords
- tixsi1
- layers
- production
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/027—Graded interfaces
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0682—Silicides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3485—Sputtering using pulsed power to the target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
- Coating By Spraying Or Casting (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE201310011071 DE102013011071A1 (de) | 2013-07-03 | 2013-07-03 | TixSi1-xN Schichten mit CryAl1-yN Haftschicht und ihre Herstellung |
DE102013011073.4A DE102013011073A1 (de) | 2013-07-03 | 2013-07-03 | TlxSi1-xN Schichten und ihre Herstellung |
PCT/EP2014/001792 WO2015000581A1 (de) | 2013-07-03 | 2014-07-01 | Tixsi1-xn schichten und ihre herstellung |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201510417RA true SG11201510417RA (en) | 2016-01-28 |
Family
ID=51167846
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201510417RA SG11201510417RA (en) | 2013-07-03 | 2014-07-01 | Tixsi1-xn layers and the production thereof |
Country Status (18)
Country | Link |
---|---|
US (1) | US9840768B2 (pt) |
EP (1) | EP3017079B2 (pt) |
JP (1) | JP6122975B2 (pt) |
KR (2) | KR101891900B1 (pt) |
CN (1) | CN105392911B (pt) |
BR (1) | BR112015032169B1 (pt) |
CA (1) | CA2916784C (pt) |
ES (1) | ES2630316T5 (pt) |
HK (1) | HK1219516A1 (pt) |
IL (1) | IL243136A (pt) |
MX (1) | MX361325B (pt) |
MY (1) | MY187100A (pt) |
PH (1) | PH12015502753A1 (pt) |
PL (1) | PL3017079T5 (pt) |
PT (1) | PT3017079T (pt) |
RU (1) | RU2674179C2 (pt) |
SG (1) | SG11201510417RA (pt) |
WO (1) | WO2015000581A1 (pt) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102345375B1 (ko) * | 2016-03-30 | 2021-12-29 | 가부시키가이샤 몰디노 | 피복 절삭 공구 |
US11224921B2 (en) | 2017-09-27 | 2022-01-18 | Moldino Tool Engineering, Ltd. | Coated cutting tool |
CN115125486B (zh) * | 2022-07-27 | 2024-01-02 | 安徽工业大学 | 一种含有多层结构的高强韧纳米复合涂层及其制备方法 |
Family Cites Families (42)
Publication number | Priority date | Publication date | Assignee | Title |
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JPH07197246A (ja) * | 1993-12-28 | 1995-08-01 | Mitsubishi Materials Corp | 成膜中にパーティクル発生の少ないスパッタリング用Tiシリサイド焼結ターゲット材 |
JPH0867971A (ja) * | 1994-08-30 | 1996-03-12 | Mitsubishi Materials Corp | モザイク状Tiシリサイドターゲット材 |
DE19625577A1 (de) | 1996-06-27 | 1998-01-02 | Vaw Motor Gmbh | Aluminium-Gußteil und Verfahren zu seiner Herstellung |
JP3417907B2 (ja) † | 2000-07-13 | 2003-06-16 | 日立ツール株式会社 | 多層皮膜被覆工具 |
JP3996809B2 (ja) * | 2002-07-11 | 2007-10-24 | 住友電工ハードメタル株式会社 | 被覆切削工具 |
US6906295B2 (en) * | 2003-02-20 | 2005-06-14 | National Material L.P. | Foodware with multilayer stick resistant ceramic coating and method of making |
AU2003903853A0 (en) | 2003-07-25 | 2003-08-07 | Antoine Bittar | Barriers, materials and processes for solar selective surfaces |
US7097922B2 (en) * | 2004-05-03 | 2006-08-29 | General Motors Corporation | Multi-layered superhard nanocomposite coatings |
JP2005344148A (ja) * | 2004-06-01 | 2005-12-15 | Sumitomo Electric Ind Ltd | 耐摩耗性被膜およびこれを用いた表面被覆切削工具 |
US7790003B2 (en) * | 2004-10-12 | 2010-09-07 | Southwest Research Institute | Method for magnetron sputter deposition |
US7348074B2 (en) | 2005-04-01 | 2008-03-25 | Oc Oerlikon Balzers Ag | Multilayer hard coating for tools |
SE0500994L (sv) * | 2005-04-29 | 2006-10-30 | Seco Tools Ab | Tunt slitstarkt skikt |
CN101326303B (zh) * | 2005-10-18 | 2012-07-18 | 西南研究院 | 抗侵蚀涂层 |
GB0608582D0 (en) † | 2006-05-02 | 2006-06-07 | Univ Sheffield Hallam | High power impulse magnetron sputtering vapour deposition |
GB2452190B (en) * | 2006-05-17 | 2011-12-28 | G & H Technologies Llc | Wear resistant depositied coating, method of coating deposition and applications therefor |
RU2327811C1 (ru) * | 2006-11-14 | 2008-06-27 | Государственное образовательное учреждение высшего профессионального образования "Ульяновский государственный технический университет" | Способ получения многослойного покрытия для режущего инструмента |
SE0602814L (sv) * | 2006-12-27 | 2008-06-28 | Sandvik Intellectual Property | Skärverktyg med multiskiktbeläggning |
US7923130B2 (en) | 2007-05-30 | 2011-04-12 | Sumitomo Electric Hardmetal Corp. | Surface-coated cutting tool |
WO2009047867A1 (ja) * | 2007-10-12 | 2009-04-16 | Hitachi Tool Engineering, Ltd. | 硬質皮膜被覆部材、及びその製造方法 |
EP2072637B1 (en) † | 2007-12-21 | 2018-08-15 | Sandvik Intellectual Property AB | Coated cutting tool and a method of making a coated cutting tool |
PL2310549T3 (pl) * | 2008-07-09 | 2018-06-29 | Oerlikon Surface Solutions Ltd., Pfäffikon | System powłokowy, powlekany przedmiot obrabiany oraz sposób wytwarzania powlekanego przedmiotu obrabianego |
ATE535629T1 (de) * | 2008-07-29 | 2011-12-15 | Sulzer Metaplas Gmbh | Gepulstes hochleistungs-magnetronsputterverfahren sowie hochleistungs-elektroenergiequelle |
JP5156971B2 (ja) | 2009-03-17 | 2013-03-06 | Smc株式会社 | 溶損防止用被覆部材 |
SE533883C2 (sv) | 2009-06-01 | 2011-02-22 | Seco Tools Ab | Nanolaminerat belagt skärverktyg |
JPWO2010150335A1 (ja) * | 2009-06-22 | 2012-12-06 | 株式会社タンガロイ | 被覆立方晶窒化硼素焼結体工具 |
EP2336383A1 (en) † | 2009-12-04 | 2011-06-22 | Sandvik Intellectual Property AB | Multilayered coated cutting tool |
JP5190971B2 (ja) * | 2009-12-16 | 2013-04-24 | 住友電気工業株式会社 | 被膜、切削工具および被膜の製造方法 |
RU2542185C2 (ru) | 2010-01-11 | 2015-02-20 | Искар Лтд. | Режущий инструмент с покрытием |
JP2011167793A (ja) * | 2010-02-18 | 2011-09-01 | Mitsubishi Materials Corp | 表面被覆切削工具 |
RU2428509C1 (ru) * | 2010-04-13 | 2011-09-10 | Государственное образовательное учреждение высшего профессионального образования "Ульяновский государственный технический университет" | Способ получения многослойного покрытия для режущего инструмента |
RU2419680C1 (ru) * | 2010-04-20 | 2011-05-27 | Государственное образовательное учреждение высшего профессионального образования "Ульяновский государственный технический университет" | Способ получения многослойного покрытия для режущего инструмента |
BR112012027155A2 (pt) * | 2010-04-23 | 2019-09-24 | Seco Tools Ab | revestimento por deposição física de vapor para usinagem de metal |
US8409695B2 (en) | 2010-05-28 | 2013-04-02 | Kennametal Inc. | Multilayer nitride hard coatings |
EP2591869B1 (en) * | 2010-07-06 | 2015-09-09 | Tungaloy Corporation | Coated polycrystalline cbn tool |
DE102010034321B4 (de) | 2010-08-09 | 2017-04-06 | Technische Universität Dresden | Verfahren zur Herstellung einer Hartstoffbeschichtung auf metallischen, keramischen oder hartmetallischen Bauteilen sowie eine mit dem Verfahren hergestellte Hartstoffbeschichtung |
KR20140002661A (ko) | 2010-11-26 | 2014-01-08 | 스미또모 덴꼬오 하드메탈 가부시끼가이샤 | 표면 피복 소결체 |
CN103608483A (zh) † | 2011-04-20 | 2014-02-26 | 欧瑞康贸易股份公司(特吕巴赫) | 提供溅射颗粒的增强电离的高功率脉冲磁控溅射方法以及用于其实施的装置 |
DE102011018363A1 (de) † | 2011-04-20 | 2012-10-25 | Oerlikon Trading Ag, Trübbach | Hochleistungszerstäubungsquelle |
DE102011117177A1 (de) | 2011-10-28 | 2013-05-02 | Oerlikon Trading Ag, Trübbach | Verfahren zur Bereitstellung sequenzieller Leistungspulse |
DE102011053372A1 (de) | 2011-09-07 | 2013-03-07 | Walter Ag | Werkzeug mit chromhaltiger Funktionsschicht |
EP2789006B1 (de) * | 2011-12-05 | 2018-10-31 | Oerlikon Surface Solutions AG, Pfäffikon | Reaktiver sputterprozess |
DE102012209293B3 (de) † | 2012-06-01 | 2013-06-20 | Helmholtz-Zentrum Dresden - Rossendorf E.V. | Sputterverfahren |
-
2014
- 2014-07-01 PL PL14737148T patent/PL3017079T5/pl unknown
- 2014-07-01 CN CN201480037761.2A patent/CN105392911B/zh active Active
- 2014-07-01 CA CA2916784A patent/CA2916784C/en not_active Expired - Fee Related
- 2014-07-01 JP JP2015563197A patent/JP6122975B2/ja active Active
- 2014-07-01 SG SG11201510417RA patent/SG11201510417RA/en unknown
- 2014-07-01 BR BR112015032169-0A patent/BR112015032169B1/pt active IP Right Grant
- 2014-07-01 WO PCT/EP2014/001792 patent/WO2015000581A1/de active Application Filing
- 2014-07-01 MX MX2015017033A patent/MX361325B/es active IP Right Grant
- 2014-07-01 KR KR1020167002703A patent/KR101891900B1/ko active IP Right Grant
- 2014-07-01 EP EP14737148.8A patent/EP3017079B2/de active Active
- 2014-07-01 ES ES14737148T patent/ES2630316T5/es active Active
- 2014-07-01 MY MYPI2015704719A patent/MY187100A/en unknown
- 2014-07-01 PT PT147371488T patent/PT3017079T/pt unknown
- 2014-07-01 KR KR1020177026135A patent/KR102178189B1/ko active IP Right Grant
- 2014-07-01 RU RU2016102845A patent/RU2674179C2/ru active
- 2014-07-01 US US14/902,826 patent/US9840768B2/en active Active
-
2015
- 2015-12-09 PH PH12015502753A patent/PH12015502753A1/en unknown
- 2015-12-15 IL IL243136A patent/IL243136A/en active IP Right Grant
-
2016
- 2016-06-29 HK HK16107568.9A patent/HK1219516A1/zh unknown
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