SG11201510417RA - Tixsi1-xn layers and the production thereof - Google Patents
Tixsi1-xn layers and the production thereofInfo
- Publication number
- SG11201510417RA SG11201510417RA SG11201510417RA SG11201510417RA SG11201510417RA SG 11201510417R A SG11201510417R A SG 11201510417RA SG 11201510417R A SG11201510417R A SG 11201510417RA SG 11201510417R A SG11201510417R A SG 11201510417RA SG 11201510417R A SG11201510417R A SG 11201510417RA
- Authority
- SG
- Singapore
- Prior art keywords
- tixsi1
- layers
- production
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/027—Graded interfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0682—Silicides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3485—Sputtering using pulsed power to the target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102013011073.4A DE102013011073A1 (en) | 2013-07-03 | 2013-07-03 | TlxSi1-xN layers and their preparation |
| DE201310011071 DE102013011071A1 (en) | 2013-07-03 | 2013-07-03 | TixSi1-xN layers with CryAl1-yN adhesion layer and their preparation |
| PCT/EP2014/001792 WO2015000581A1 (en) | 2013-07-03 | 2014-07-01 | Tixsi1-xn layers and the production thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201510417RA true SG11201510417RA (en) | 2016-01-28 |
Family
ID=51167846
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201510417RA SG11201510417RA (en) | 2013-07-03 | 2014-07-01 | Tixsi1-xn layers and the production thereof |
Country Status (18)
| Country | Link |
|---|---|
| US (1) | US9840768B2 (en) |
| EP (1) | EP3017079B2 (en) |
| JP (1) | JP6122975B2 (en) |
| KR (2) | KR101891900B1 (en) |
| CN (1) | CN105392911B (en) |
| BR (1) | BR112015032169B1 (en) |
| CA (1) | CA2916784C (en) |
| ES (1) | ES2630316T5 (en) |
| HK (1) | HK1219516A1 (en) |
| IL (1) | IL243136A (en) |
| MX (1) | MX361325B (en) |
| MY (1) | MY187100A (en) |
| PH (1) | PH12015502753A1 (en) |
| PL (1) | PL3017079T5 (en) |
| PT (1) | PT3017079T (en) |
| RU (1) | RU2674179C2 (en) |
| SG (1) | SG11201510417RA (en) |
| WO (1) | WO2015000581A1 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11465214B2 (en) | 2016-03-30 | 2022-10-11 | Moldino Tool Engineering, Ltd. | Coated cutting tool |
| KR102336097B1 (en) * | 2017-09-27 | 2021-12-06 | 가부시키가이샤 몰디노 | clad cutting tool |
| CN115125486B (en) * | 2022-07-27 | 2024-01-02 | 安徽工业大学 | High-strength and high-toughness nano composite coating containing multilayer structure and preparation method thereof |
Family Cites Families (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07197246A (en) * | 1993-12-28 | 1995-08-01 | Mitsubishi Materials Corp | Ti silicide sintered target material for sputtering hardly generating particle during film formation |
| JPH0867971A (en) * | 1994-08-30 | 1996-03-12 | Mitsubishi Materials Corp | Mosaic titanium silicide target material |
| DE19625577A1 (en) | 1996-06-27 | 1998-01-02 | Vaw Motor Gmbh | Aluminum casting and process for its manufacture |
| JP3417907B2 (en) † | 2000-07-13 | 2003-06-16 | 日立ツール株式会社 | Multi-layer coating tool |
| JP3996809B2 (en) | 2002-07-11 | 2007-10-24 | 住友電工ハードメタル株式会社 | Coated cutting tool |
| US6906295B2 (en) * | 2003-02-20 | 2005-06-14 | National Material L.P. | Foodware with multilayer stick resistant ceramic coating and method of making |
| AU2003903853A0 (en) | 2003-07-25 | 2003-08-07 | Antoine Bittar | Barriers, materials and processes for solar selective surfaces |
| US7097922B2 (en) * | 2004-05-03 | 2006-08-29 | General Motors Corporation | Multi-layered superhard nanocomposite coatings |
| JP2005344148A (en) * | 2004-06-01 | 2005-12-15 | Sumitomo Electric Ind Ltd | Wear-resistant film, and surface-coated cutting tool using the same |
| US7790003B2 (en) * | 2004-10-12 | 2010-09-07 | Southwest Research Institute | Method for magnetron sputter deposition |
| US7348074B2 (en) * | 2005-04-01 | 2008-03-25 | Oc Oerlikon Balzers Ag | Multilayer hard coating for tools |
| SE0500994L (en) * | 2005-04-29 | 2006-10-30 | Seco Tools Ab | Thin durable layer |
| CN101326303B (en) * | 2005-10-18 | 2012-07-18 | 西南研究院 | Erosion resistant coatings |
| GB0608582D0 (en) † | 2006-05-02 | 2006-06-07 | Univ Sheffield Hallam | High power impulse magnetron sputtering vapour deposition |
| CA2885593C (en) * | 2006-05-17 | 2018-03-06 | G & H Technologies Llc | Wear resistant coating |
| RU2327811C1 (en) * | 2006-11-14 | 2008-06-27 | Государственное образовательное учреждение высшего профессионального образования "Ульяновский государственный технический университет" | Method for preparation of multi-layer coating for cutting tool |
| SE0602814L (en) * | 2006-12-27 | 2008-06-28 | Sandvik Intellectual Property | Cutting tool with multilayer coating |
| US7923130B2 (en) | 2007-05-30 | 2011-04-12 | Sumitomo Electric Hardmetal Corp. | Surface-coated cutting tool |
| CN101855035B (en) * | 2007-10-12 | 2013-03-27 | 日立工具股份有限公司 | Member covered with hard coating film and process for the production of the member |
| EP2072637B1 (en) † | 2007-12-21 | 2018-08-15 | Sandvik Intellectual Property AB | Coated cutting tool and a method of making a coated cutting tool |
| US8491989B2 (en) * | 2008-07-09 | 2013-07-23 | Oberlikon Trading AG, Truebbach | Coating system, coated workpiece and method for manufacturing the same |
| ATE535629T1 (en) * | 2008-07-29 | 2011-12-15 | Sulzer Metaplas Gmbh | PULSED HIGH POWER MAGNETRON SPUTTERING PROCESS AND HIGH POWER ELECTRICAL ENERGY SOURCE |
| JP5156971B2 (en) | 2009-03-17 | 2013-03-06 | Ｓｍｃ株式会社 | Coating member for preventing melting damage |
| SE533883C2 (en) | 2009-06-01 | 2011-02-22 | Seco Tools Ab | Nanolaminated coated cutting tool |
| WO2010150335A1 (en) * | 2009-06-22 | 2010-12-29 | 株式会社タンガロイ | Tool having coated cubic boron nitride sintered body |
| EP2336383A1 (en) † | 2009-12-04 | 2011-06-22 | Sandvik Intellectual Property AB | Multilayered coated cutting tool |
| JP5190971B2 (en) * | 2009-12-16 | 2013-04-24 | 住友電気工業株式会社 | Coating, cutting tool, and manufacturing method of coating |
| PL2524066T3 (en) | 2010-01-11 | 2019-02-28 | Iscar Ltd. | Coated cutting tool |
| JP2011167793A (en) * | 2010-02-18 | 2011-09-01 | Mitsubishi Materials Corp | Surface coated cutting tool |
| RU2428509C1 (en) * | 2010-04-13 | 2011-09-10 | Государственное образовательное учреждение высшего профессионального образования "Ульяновский государственный технический университет" | Procedure for production of multi-layer coating for cutting tool |
| RU2419680C1 (en) * | 2010-04-20 | 2011-05-27 | Государственное образовательное учреждение высшего профессионального образования "Ульяновский государственный технический университет" | Procedure for production of multi-layer coating for cutting tool |
| KR101779236B1 (en) * | 2010-04-23 | 2017-09-18 | 쎄코 툴스 에이비 | Pvd coating for metal machining |
| US8409695B2 (en) | 2010-05-28 | 2013-04-02 | Kennametal Inc. | Multilayer nitride hard coatings |
| JP5392408B2 (en) * | 2010-07-06 | 2014-01-22 | 株式会社タンガロイ | Coated cBN sintered body tool |
| DE102010034321B4 (en) | 2010-08-09 | 2017-04-06 | Technische Universität Dresden | Process for the production of a hard material coating on metallic, ceramic or hard metallic components as well as a hard material coating produced by the process |
| CN103228383B (en) | 2010-11-26 | 2016-08-03 | 住友电工硬质合金株式会社 | Surface is coated to sintered body |
| DE102011117177A1 (en) † | 2011-10-28 | 2013-05-02 | Oerlikon Trading Ag, Trübbach | Method for providing sequential power pulses |
| EP2699709A1 (en) † | 2011-04-20 | 2014-02-26 | Oerlikon Trading AG, Trübbach | High power impulse magnetron sputtering method providing enhanced ionization of the sputtered particles and apparatus for its implementation |
| DE102011018363A1 (en) † | 2011-04-20 | 2012-10-25 | Oerlikon Trading Ag, Trübbach | Hochleistungszerstäubungsquelle |
| DE102011053372A1 (en) | 2011-09-07 | 2013-03-07 | Walter Ag | Tool with chromium-containing functional layer |
| CA2858251C (en) * | 2011-12-05 | 2019-12-10 | Oerlikon Trading Ag, Trubbach | Reactive sputtering process |
| DE102012209293B3 (en) † | 2012-06-01 | 2013-06-20 | Helmholtz-Zentrum Dresden - Rossendorf E.V. | Coating a substrate, comprises arranging substrate to be coated over cutting surface of target, atomizing coating material by sputtering under e.g. inert gas, and modifying distribution of target components by high energy pulsed magnetron |
-
2014
- 2014-07-01 US US14/902,826 patent/US9840768B2/en active Active
- 2014-07-01 SG SG11201510417RA patent/SG11201510417RA/en unknown
- 2014-07-01 EP EP14737148.8A patent/EP3017079B2/en active Active
- 2014-07-01 KR KR1020167002703A patent/KR101891900B1/en active IP Right Grant
- 2014-07-01 CA CA2916784A patent/CA2916784C/en not_active Expired - Fee Related
- 2014-07-01 CN CN201480037761.2A patent/CN105392911B/en active Active
- 2014-07-01 MY MYPI2015704719A patent/MY187100A/en unknown
- 2014-07-01 BR BR112015032169-0A patent/BR112015032169B1/en active IP Right Grant
- 2014-07-01 PL PL14737148T patent/PL3017079T5/en unknown
- 2014-07-01 KR KR1020177026135A patent/KR102178189B1/en active IP Right Grant
- 2014-07-01 JP JP2015563197A patent/JP6122975B2/en active Active
- 2014-07-01 RU RU2016102845A patent/RU2674179C2/en active
- 2014-07-01 WO PCT/EP2014/001792 patent/WO2015000581A1/en active Application Filing
- 2014-07-01 MX MX2015017033A patent/MX361325B/en active IP Right Grant
- 2014-07-01 ES ES14737148T patent/ES2630316T5/en active Active
- 2014-07-01 PT PT147371488T patent/PT3017079T/en unknown
-
2015
- 2015-12-09 PH PH12015502753A patent/PH12015502753A1/en unknown
- 2015-12-15 IL IL243136A patent/IL243136A/en active IP Right Grant
-
2016
- 2016-06-29 HK HK16107568.9A patent/HK1219516A1/en unknown
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